ATE360629T1 - Photoaktivierbare stickstoffbasen - Google Patents
Photoaktivierbare stickstoffbasenInfo
- Publication number
- ATE360629T1 ATE360629T1 AT02782851T AT02782851T ATE360629T1 AT E360629 T1 ATE360629 T1 AT E360629T1 AT 02782851 T AT02782851 T AT 02782851T AT 02782851 T AT02782851 T AT 02782851T AT E360629 T1 ATE360629 T1 AT E360629T1
- Authority
- AT
- Austria
- Prior art keywords
- base
- nitrogen bases
- photoactivable
- photoactivable nitrogen
- benzylically
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title 2
- 229910052757 nitrogen Inorganic materials 0.000 title 1
- 150000001409 amidines Chemical class 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 125000001743 benzylic group Chemical group 0.000 abstract 1
- -1 bicyclic amines Chemical class 0.000 abstract 1
- 238000006555 catalytic reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Polyesters Or Polycarbonates (AREA)
- Epoxy Resins (AREA)
- Luminescent Compositions (AREA)
- Polyurethanes Or Polyureas (AREA)
- Indole Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360629T1 true ATE360629T1 (de) | 2007-05-15 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02782851T ATE360629T1 (de) | 2001-10-17 | 2002-10-08 | Photoaktivierbare stickstoffbasen |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (de) |
| EP (1) | EP1436297B1 (de) |
| JP (1) | JP4454309B2 (de) |
| KR (1) | KR100938769B1 (de) |
| CN (1) | CN1571788B (de) |
| AT (1) | ATE360629T1 (de) |
| AU (1) | AU2002346968B2 (de) |
| BR (1) | BR0213354A (de) |
| CA (1) | CA2459374C (de) |
| DE (1) | DE60219812T8 (de) |
| MX (1) | MXPA04003564A (de) |
| RU (1) | RU2332419C2 (de) |
| WO (1) | WO2003033500A1 (de) |
| ZA (1) | ZA200401523B (de) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| WO2006008251A2 (en) * | 2004-07-21 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| RU2414471C2 (ru) * | 2005-02-02 | 2011-03-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Бензотриазоловые поглотители уф-лучей со смещенным в длинноволновую область спектром поглощения и их применение |
| WO2008037635A1 (en) * | 2006-09-29 | 2008-04-03 | Ciba Holding Inc. | Photolatent bases for systems based on blocked isocyanates |
| JP5606308B2 (ja) * | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| JP5339907B2 (ja) * | 2007-06-14 | 2013-11-13 | 積水化学工業株式会社 | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
| KR101588912B1 (ko) | 2008-03-31 | 2016-01-26 | 산아프로 가부시키가이샤 | 광염기 발생제 |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| US8840993B2 (en) | 2010-06-30 | 2014-09-23 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| US8968868B2 (en) | 2010-06-30 | 2015-03-03 | 3M Innovative Properties Company | Curable-on-demand composition comprising dual reactive silane functionality |
| CN102985503A (zh) | 2010-06-30 | 2013-03-20 | 3M创新有限公司 | 包含双重反应性硅烷官能团的可固化组合物 |
| EP2792694A4 (de) | 2011-12-16 | 2015-07-15 | Three Bond Fine Chemical Co Ltd | Härtbare harzzusammensetzung |
| US9006336B2 (en) | 2011-12-29 | 2015-04-14 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| EP2797985B1 (de) | 2011-12-29 | 2015-09-23 | 3M Innovative Properties Company | Bei bedarf härtbare polysiloxanbeschichtungszusammensetzung |
| CN104470983A (zh) | 2011-12-29 | 2015-03-25 | 3M创新有限公司 | 可固化聚硅氧烷组合物 |
| CN104093785B (zh) | 2011-12-29 | 2016-08-24 | 3M创新有限公司 | 可固化聚硅氧烷组合物和由其制得的压敏粘合剂 |
| US9018322B2 (en) | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| WO2015008709A1 (ja) | 2013-07-18 | 2015-01-22 | セメダイン株式会社 | 光硬化性組成物 |
| CN105829485B (zh) | 2013-12-13 | 2018-10-12 | 思美定株式会社 | 具有粘合性的光固化性组合物 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| JP6474489B2 (ja) * | 2014-10-29 | 2019-02-27 | テーザ・ソシエタス・ヨーロピア | 活性化可能なゲッター材料を含む接着剤 |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| US10526440B2 (en) * | 2015-04-29 | 2020-01-07 | 3M Innovative Properties Company | Method of making a polymer network from a polythiol and a polyepoxide |
| AU2016256186B2 (en) | 2015-04-29 | 2020-01-16 | Bsn Medical Gmbh | Multi-step process for no production |
| EP3288517B1 (de) | 2015-04-29 | 2019-07-17 | BSN Medical GmbH | Medizinische badevorrichtung |
| WO2018085546A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition |
| US11198757B2 (en) | 2016-11-03 | 2021-12-14 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and coumarin and related methods |
| CA3042860A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| JP7109438B2 (ja) | 2016-12-05 | 2022-07-29 | アーケマ・インコーポレイテッド | 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物 |
| CN111655749B (zh) | 2018-02-02 | 2023-03-03 | 巴斯夫欧洲公司 | 低有机化合物释放的聚氨酯 |
| CN112004851A (zh) * | 2018-04-26 | 2020-11-27 | 汉高股份有限及两合公司 | 用作可固化组合物中的潜在催化剂的季氮化合物 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| WO2020065588A1 (en) | 2018-09-27 | 2020-04-02 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476B (zh) * | 2022-08-30 | 2026-01-02 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
| WO2026077954A1 (en) * | 2024-10-08 | 2026-04-16 | Chemetall Gmbh | Photo-latent bases |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (de) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Beschichtungszusammensetzung enthaltend einen blockierten basischen Katalysator |
| WO1992017475A1 (en) * | 1991-03-28 | 1992-10-15 | Pfizer Inc. | Heterocyclic-cyclic amine derivatives |
| JP2654339B2 (ja) * | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| EP0702707A1 (de) | 1993-05-26 | 1996-03-27 | Akzo Nobel N.V. | Beschichtungszusammensetzung einschliesslich eines uv-entblockbaren basischen katalysators |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| AU713498B2 (en) | 1996-02-22 | 1999-12-02 | Ciba Specialty Chemicals Holding Inc. | Anionic photocatalyst |
| BR9807502B1 (pt) * | 1997-01-22 | 2008-11-18 | compostos orgÂnicos, processo para sua preparaÇço, bem como composiÇço e aplicaÇço dos mesmos. | |
| JP4155603B2 (ja) | 1997-02-26 | 2008-09-24 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基 |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| JP4308326B2 (ja) * | 1997-03-18 | 2009-08-05 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | α−アミノアルケン類に基づく光励起性の窒素含有塩基類 |
| EP0898202B1 (de) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen |
| DE59903270D1 (de) | 1998-08-21 | 2002-12-05 | Ciba Sc Holding Ag | Photoaktivierbare stickstoffhaltige basen |
| AU2001260325B2 (en) | 2000-05-26 | 2005-03-10 | Akzo Nobel N.V. | Photoactivatable coating composition |
-
2002
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 EP EP02782851A patent/EP1436297B1/de not_active Expired - Lifetime
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en not_active Ceased
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003033500B1 (en) | 2003-12-11 |
| US20040242867A1 (en) | 2004-12-02 |
| DE60219812T8 (de) | 2008-05-21 |
| AU2002346968B2 (en) | 2008-04-10 |
| EP1436297A1 (de) | 2004-07-14 |
| DE60219812T2 (de) | 2008-01-24 |
| RU2332419C2 (ru) | 2008-08-27 |
| JP2005511536A (ja) | 2005-04-28 |
| CA2459374A1 (en) | 2003-04-24 |
| US7538104B2 (en) | 2009-05-26 |
| RU2004115329A (ru) | 2005-10-27 |
| DE60219812D1 (de) | 2007-06-06 |
| KR20050034614A (ko) | 2005-04-14 |
| BR0213354A (pt) | 2004-10-26 |
| US20090076200A1 (en) | 2009-03-19 |
| EP1436297B1 (de) | 2007-04-25 |
| US8252784B2 (en) | 2012-08-28 |
| CN1571788B (zh) | 2012-08-01 |
| ZA200401523B (en) | 2004-12-14 |
| CA2459374C (en) | 2011-02-08 |
| KR100938769B1 (ko) | 2010-01-27 |
| JP4454309B2 (ja) | 2010-04-21 |
| CN1571788A (zh) | 2005-01-26 |
| WO2003033500A1 (en) | 2003-04-24 |
| MXPA04003564A (es) | 2004-07-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |