ATE360629T1 - Photoaktivierbare stickstoffbasen - Google Patents
Photoaktivierbare stickstoffbasenInfo
- Publication number
- ATE360629T1 ATE360629T1 AT02782851T AT02782851T ATE360629T1 AT E360629 T1 ATE360629 T1 AT E360629T1 AT 02782851 T AT02782851 T AT 02782851T AT 02782851 T AT02782851 T AT 02782851T AT E360629 T1 ATE360629 T1 AT E360629T1
- Authority
- AT
- Austria
- Prior art keywords
- base
- nitrogen bases
- photoactivable
- photoactivable nitrogen
- benzylically
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title 2
- 229910052757 nitrogen Inorganic materials 0.000 title 1
- 150000001409 amidines Chemical class 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 125000001743 benzylic group Chemical group 0.000 abstract 1
- -1 bicyclic amines Chemical class 0.000 abstract 1
- 238000006555 catalytic reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Polyurethanes Or Polyureas (AREA)
- Epoxy Resins (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Plural Heterocyclic Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360629T1 true ATE360629T1 (de) | 2007-05-15 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02782851T ATE360629T1 (de) | 2001-10-17 | 2002-10-08 | Photoaktivierbare stickstoffbasen |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (de) |
| EP (1) | EP1436297B1 (de) |
| JP (1) | JP4454309B2 (de) |
| KR (1) | KR100938769B1 (de) |
| CN (1) | CN1571788B (de) |
| AT (1) | ATE360629T1 (de) |
| AU (1) | AU2002346968B2 (de) |
| BR (1) | BR0213354A (de) |
| CA (1) | CA2459374C (de) |
| DE (1) | DE60219812T8 (de) |
| MX (1) | MXPA04003564A (de) |
| RU (1) | RU2332419C2 (de) |
| WO (1) | WO2003033500A1 (de) |
| ZA (1) | ZA200401523B (de) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| US20070249484A1 (en) * | 2004-07-21 | 2007-10-25 | Johannes Benkhoff | Process for the Photoactivation and use of a Catalyst by an Inverted Two-Stage Procedure |
| US7695643B2 (en) * | 2005-02-02 | 2010-04-13 | Ciba Specialty Chemicals Corporation | Long wavelength shifted benzotriazole UV-absorbers and their use |
| BRPI0717655B1 (pt) * | 2006-09-29 | 2018-12-18 | Basf Se | bases fotolatentes para sistema à base de isocianatos bloqueados |
| KR101944734B1 (ko) * | 2007-04-03 | 2019-02-07 | 바스프 에스이 | 광활성화가능한 질소 염기 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| CN101679829B (zh) * | 2007-06-14 | 2013-10-30 | 积水化学工业株式会社 | 光固化型粘合剂组合物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| JP5697992B2 (ja) * | 2008-01-28 | 2015-04-08 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 |
| EP2270114B1 (de) * | 2008-03-31 | 2014-07-09 | San-Apro Limited | Photobasengenerator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| WO2012003160A1 (en) | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable composition comprising dual reactive silane functionality |
| US8840993B2 (en) | 2010-06-30 | 2014-09-23 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| WO2012003152A1 (en) | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable-on-demand composition comprising dual reactive silane functionality |
| EP2792694A4 (de) | 2011-12-16 | 2015-07-15 | Three Bond Fine Chemical Co Ltd | Härtbare harzzusammensetzung |
| EP2798011A4 (de) * | 2011-12-29 | 2015-08-26 | 3M Innovative Properties Co | Härtbare polysiloxanzusammensetzungen und haftklebstoffe daraus |
| US9006357B2 (en) | 2011-12-29 | 2015-04-14 | 3M Innovative Properties Company | Curable polysiloxane composition |
| CN104080838B (zh) | 2011-12-29 | 2016-08-17 | 3M创新有限公司 | 可按需固化的聚硅氧烷涂料组合物 |
| JP2015503660A (ja) | 2011-12-29 | 2015-02-02 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサンコーティング組成物 |
| US9018322B2 (en) | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| EP3023462A4 (de) | 2013-07-18 | 2017-04-12 | Cemedine Co., Ltd. | Lichthärtbare zusammensetzungen |
| JP6409784B2 (ja) | 2013-12-13 | 2018-10-24 | セメダイン株式会社 | 接着性を有する光硬化性組成物 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| CN107148458A (zh) * | 2014-10-29 | 2017-09-08 | 德莎欧洲公司 | 包含可活化的吸气剂材料的胶粘剂混合物 |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| US10526440B2 (en) | 2015-04-29 | 2020-01-07 | 3M Innovative Properties Company | Method of making a polymer network from a polythiol and a polyepoxide |
| EP3288517B1 (de) | 2015-04-29 | 2019-07-17 | BSN Medical GmbH | Medizinische badevorrichtung |
| WO2016174043A1 (de) | 2015-04-29 | 2016-11-03 | Bsn Medical Gmbh | Mehrstufiges verfahren zur no-herstellung |
| EP3535333A1 (de) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Zusammensetzung mit einem polythiol, einem polyepoxid, einer fotolatenten basis und einem amin und verfahren im zusammenhang mit der zusammensetzung |
| WO2018085190A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| WO2018085534A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| JP7109438B2 (ja) | 2016-12-05 | 2022-07-29 | アーケマ・インコーポレイテッド | 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物 |
| US11814469B2 (en) | 2018-02-02 | 2023-11-14 | Basf Se | Polyurethanes having low emissions of organic compounds |
| KR20210003869A (ko) * | 2018-04-26 | 2021-01-12 | 헨켈 아게 운트 코. 카게아아 | 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| EP3856849A1 (de) | 2018-09-27 | 2021-08-04 | 3M Innovative Properties Company | Zusammensetzung mit aminofunktionellen silanen und verfahren zum auftragen eines dichtungsmittels auf ein substrat |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476B (zh) * | 2022-08-30 | 2026-01-02 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (de) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Beschichtungszusammensetzung enthaltend einen blockierten basischen Katalysator |
| AU658194B2 (en) * | 1991-03-28 | 1995-04-06 | Eisai Co. Ltd. | Heterocyclic-cyclic amine derivatives |
| JP2654339B2 (ja) | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| CA2163875A1 (en) | 1993-05-26 | 1994-12-08 | Huig Klinkenberg | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| BR9707687A (pt) | 1996-02-22 | 1999-07-27 | Dsm Nv | Fotocatalisador aniônico |
| WO1998032756A1 (en) * | 1997-01-22 | 1998-07-30 | Ciba Specialty Chemicals Holding Inc. | Substituted aminoalkylidenamino triazines as herbicides |
| WO1998038195A1 (en) | 1997-02-26 | 1998-09-03 | Ciba Specialty Chemicals Holding Inc. | PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| DE69806739T2 (de) * | 1997-03-18 | 2003-03-13 | Ciba Speciality Chemicals Holding Inc., Basel | Photoaktivierbare, stickstoff enthaltende basen auf basis von alpha-aminoalkenen |
| EP0898202B1 (de) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen |
| DE59903270D1 (de) | 1998-08-21 | 2002-12-05 | Ciba Sc Holding Ag | Photoaktivierbare stickstoffhaltige basen |
| KR100728462B1 (ko) | 2000-05-26 | 2007-06-13 | 아크조 노벨 엔.브이. | 광활성가능한 코팅조성물 |
-
2002
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en not_active Ceased
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 EP EP02782851A patent/EP1436297B1/de not_active Expired - Lifetime
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1436297A1 (de) | 2004-07-14 |
| JP2005511536A (ja) | 2005-04-28 |
| DE60219812T8 (de) | 2008-05-21 |
| DE60219812T2 (de) | 2008-01-24 |
| WO2003033500B1 (en) | 2003-12-11 |
| US20040242867A1 (en) | 2004-12-02 |
| MXPA04003564A (es) | 2004-07-23 |
| CA2459374C (en) | 2011-02-08 |
| CN1571788B (zh) | 2012-08-01 |
| US7538104B2 (en) | 2009-05-26 |
| ZA200401523B (en) | 2004-12-14 |
| RU2332419C2 (ru) | 2008-08-27 |
| EP1436297B1 (de) | 2007-04-25 |
| US8252784B2 (en) | 2012-08-28 |
| KR20050034614A (ko) | 2005-04-14 |
| BR0213354A (pt) | 2004-10-26 |
| WO2003033500A1 (en) | 2003-04-24 |
| AU2002346968B2 (en) | 2008-04-10 |
| JP4454309B2 (ja) | 2010-04-21 |
| KR100938769B1 (ko) | 2010-01-27 |
| DE60219812D1 (de) | 2007-06-06 |
| RU2004115329A (ru) | 2005-10-27 |
| CN1571788A (zh) | 2005-01-26 |
| CA2459374A1 (en) | 2003-04-24 |
| US20090076200A1 (en) | 2009-03-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |