ATE360629T1 - Photoaktivierbare stickstoffbasen - Google Patents
Photoaktivierbare stickstoffbasenInfo
- Publication number
- ATE360629T1 ATE360629T1 AT02782851T AT02782851T ATE360629T1 AT E360629 T1 ATE360629 T1 AT E360629T1 AT 02782851 T AT02782851 T AT 02782851T AT 02782851 T AT02782851 T AT 02782851T AT E360629 T1 ATE360629 T1 AT E360629T1
- Authority
- AT
- Austria
- Prior art keywords
- base
- nitrogen bases
- photoactivable
- photoactivable nitrogen
- benzylically
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Epoxy Resins (AREA)
- Polyurethanes Or Polyureas (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Photoreceptors In Electrophotography (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Polyesters Or Polycarbonates (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Indole Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360629T1 true ATE360629T1 (de) | 2007-05-15 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02782851T ATE360629T1 (de) | 2001-10-17 | 2002-10-08 | Photoaktivierbare stickstoffbasen |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (de) |
| EP (1) | EP1436297B1 (de) |
| JP (1) | JP4454309B2 (de) |
| KR (1) | KR100938769B1 (de) |
| CN (1) | CN1571788B (de) |
| AT (1) | ATE360629T1 (de) |
| AU (1) | AU2002346968B2 (de) |
| BR (1) | BR0213354A (de) |
| CA (1) | CA2459374C (de) |
| DE (1) | DE60219812T8 (de) |
| MX (1) | MXPA04003564A (de) |
| RU (1) | RU2332419C2 (de) |
| WO (1) | WO2003033500A1 (de) |
| ZA (1) | ZA200401523B (de) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| RU2381835C2 (ru) * | 2004-07-21 | 2010-02-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Способ фотоактивации и применение катализатора посредством обращенной двустадийной процедуры |
| US8262949B2 (en) * | 2006-06-27 | 2012-09-11 | Basf Se | Long wavelength shifted benzotriazole uv-absorbers and their use |
| BRPI0717655B1 (pt) * | 2006-09-29 | 2018-12-18 | Basf Se | bases fotolatentes para sistema à base de isocianatos bloqueados |
| MX2009010309A (es) | 2007-04-03 | 2009-10-16 | Basf Se | Bases nitrogenadas fotoactivables. |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| CN101679829B (zh) * | 2007-06-14 | 2013-10-30 | 积水化学工业株式会社 | 光固化型粘合剂组合物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| JP5697992B2 (ja) * | 2008-01-28 | 2015-04-08 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 |
| EP2270114B1 (de) * | 2008-03-31 | 2014-07-09 | San-Apro Limited | Photobasengenerator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP5925201B2 (ja) * | 2010-06-30 | 2016-05-25 | スリーエム イノベイティブ プロパティズ カンパニー | 二重反応性シラン官能基を含むオンデマンド型硬化性組成物 |
| EP2588550A1 (de) | 2010-06-30 | 2013-05-08 | 3M Innovative Properties Company | Härtbare polysiloxanbeschichtungszusammensetzung |
| WO2012003160A1 (en) | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable composition comprising dual reactive silane functionality |
| JP6036703B2 (ja) | 2011-12-16 | 2016-11-30 | 株式会社スリーボンド | 硬化性樹脂組成物 |
| WO2013106193A1 (en) | 2011-12-29 | 2013-07-18 | 3M Innovative Properties Company | Curable polysiloxane composition |
| US9035008B2 (en) | 2011-12-29 | 2015-05-19 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| WO2013101477A1 (en) | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| KR20140119048A (ko) * | 2011-12-29 | 2014-10-08 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 경화성 폴리실록산 조성물 및 그로부터 제조된 감압 접착제 |
| US9018322B2 (en) * | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| KR102305831B1 (ko) | 2013-07-18 | 2021-09-27 | 세메다인 가부시키 가이샤 | 광경화성 조성물, 경화물 및 그의 제조 방법, 그리고 관련 제품 및 그의 제조 방법 |
| KR102330121B1 (ko) | 2013-12-13 | 2021-11-23 | 세메다인 가부시키 가이샤 | 접착성을 갖는 광경화성 조성물 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| CN107148458A (zh) * | 2014-10-29 | 2017-09-08 | 德莎欧洲公司 | 包含可活化的吸气剂材料的胶粘剂混合物 |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| CN107708647B (zh) | 2015-04-29 | 2021-02-19 | Bsn医疗有限公司 | 医疗洗浴设备 |
| CN107809996A (zh) | 2015-04-29 | 2018-03-16 | Bsn医疗有限公司 | 一氧化氮产生的多步骤方法 |
| US10526440B2 (en) | 2015-04-29 | 2020-01-07 | 3M Innovative Properties Company | Method of making a polymer network from a polythiol and a polyepoxide |
| CA3042864A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition |
| EP3535341A1 (de) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Polythiol-dichtungszusammensetzungen |
| WO2018085534A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| JP7109438B2 (ja) | 2016-12-05 | 2022-07-29 | アーケマ・インコーポレイテッド | 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物 |
| US11814469B2 (en) | 2018-02-02 | 2023-11-14 | Basf Se | Polyurethanes having low emissions of organic compounds |
| BR112019010869A2 (pt) * | 2018-04-26 | 2020-03-03 | Henkel Ag & Co. Kgaa | Composto de nitrogênio quaternário para uso como um catalisador latente em composições curáveis |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| EP3856849A1 (de) | 2018-09-27 | 2021-08-04 | 3M Innovative Properties Company | Zusammensetzung mit aminofunktionellen silanen und verfahren zum auftragen eines dichtungsmittels auf ein substrat |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (de) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Beschichtungszusammensetzung enthaltend einen blockierten basischen Katalysator |
| JP2654339B2 (ja) | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| CA2163875A1 (en) | 1993-05-26 | 1994-12-08 | Huig Klinkenberg | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| EP0882072B2 (de) | 1996-02-22 | 2005-10-26 | Ciba SC Holding AG | Anionische photokatalysator |
| CN1138777C (zh) | 1997-01-22 | 2004-02-18 | 西巴特殊化学品控股有限公司 | 基于α-氨基酮的可光活化的含氮碱 |
| CA2281860C (en) | 1997-02-26 | 2007-04-10 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on .alpha.-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| DE69806739T2 (de) * | 1997-03-18 | 2003-03-13 | Ciba Speciality Chemicals Holding Inc., Basel | Photoaktivierbare, stickstoff enthaltende basen auf basis von alpha-aminoalkenen |
| EP0898202B1 (de) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen |
| WO2000010964A1 (de) | 1998-08-21 | 2000-03-02 | Ciba Specialty Chemicals Holding Inc. | Photoaktivierbare stickstoffhaltige basen |
| EP1285012B1 (de) | 2000-05-26 | 2007-01-10 | Akzo Nobel Coatings International B.V. | Photoaktivierbare beschichtungszusammensetzung |
-
2002
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en active IP Right Grant
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 EP EP02782851A patent/EP1436297B1/de not_active Expired - Lifetime
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko active IP Right Grant
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1436297A1 (de) | 2004-07-14 |
| DE60219812T8 (de) | 2008-05-21 |
| RU2332419C2 (ru) | 2008-08-27 |
| DE60219812T2 (de) | 2008-01-24 |
| CA2459374C (en) | 2011-02-08 |
| JP4454309B2 (ja) | 2010-04-21 |
| WO2003033500B1 (en) | 2003-12-11 |
| JP2005511536A (ja) | 2005-04-28 |
| US20090076200A1 (en) | 2009-03-19 |
| US20040242867A1 (en) | 2004-12-02 |
| CA2459374A1 (en) | 2003-04-24 |
| US7538104B2 (en) | 2009-05-26 |
| CN1571788B (zh) | 2012-08-01 |
| EP1436297B1 (de) | 2007-04-25 |
| DE60219812D1 (de) | 2007-06-06 |
| RU2004115329A (ru) | 2005-10-27 |
| MXPA04003564A (es) | 2004-07-23 |
| BR0213354A (pt) | 2004-10-26 |
| KR20050034614A (ko) | 2005-04-14 |
| US8252784B2 (en) | 2012-08-28 |
| ZA200401523B (en) | 2004-12-14 |
| WO2003033500A1 (en) | 2003-04-24 |
| CN1571788A (zh) | 2005-01-26 |
| AU2002346968B2 (en) | 2008-04-10 |
| KR100938769B1 (ko) | 2010-01-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |