ATE360629T1 - Photoaktivierbare stickstoffbasen - Google Patents
Photoaktivierbare stickstoffbasenInfo
- Publication number
- ATE360629T1 ATE360629T1 AT02782851T AT02782851T ATE360629T1 AT E360629 T1 ATE360629 T1 AT E360629T1 AT 02782851 T AT02782851 T AT 02782851T AT 02782851 T AT02782851 T AT 02782851T AT E360629 T1 ATE360629 T1 AT E360629T1
- Authority
- AT
- Austria
- Prior art keywords
- base
- nitrogen bases
- photoactivable
- photoactivable nitrogen
- benzylically
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title 2
- 229910052757 nitrogen Inorganic materials 0.000 title 1
- 150000001409 amidines Chemical class 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 125000001743 benzylic group Chemical group 0.000 abstract 1
- -1 bicyclic amines Chemical class 0.000 abstract 1
- 238000006555 catalytic reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Epoxy Resins (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Polyesters Or Polycarbonates (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Plural Heterocyclic Compounds (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360629T1 true ATE360629T1 (de) | 2007-05-15 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02782851T ATE360629T1 (de) | 2001-10-17 | 2002-10-08 | Photoaktivierbare stickstoffbasen |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (de) |
| EP (1) | EP1436297B1 (de) |
| JP (1) | JP4454309B2 (de) |
| KR (1) | KR100938769B1 (de) |
| CN (1) | CN1571788B (de) |
| AT (1) | ATE360629T1 (de) |
| AU (1) | AU2002346968B2 (de) |
| BR (1) | BR0213354A (de) |
| CA (1) | CA2459374C (de) |
| DE (1) | DE60219812T8 (de) |
| MX (1) | MXPA04003564A (de) |
| RU (1) | RU2332419C2 (de) |
| WO (1) | WO2003033500A1 (de) |
| ZA (1) | ZA200401523B (de) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| JP2008506826A (ja) * | 2004-07-21 | 2008-03-06 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化方法及び逆転した２段階工程による触媒の使用 |
| WO2006082145A1 (en) * | 2005-02-02 | 2006-08-10 | Ciba Specialty Chemicals Holding Inc. | Long wavelength shifted benzotriazole uv-absorbers and their use |
| CN101522745B (zh) * | 2006-09-29 | 2013-06-19 | 西巴控股有限公司 | 以封闭异氰酸酯为基础的体系的光潜碱 |
| JP5606308B2 (ja) | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| JP5339907B2 (ja) * | 2007-06-14 | 2013-11-13 | 積水化学工業株式会社 | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| US20110190412A1 (en) * | 2008-01-28 | 2011-08-04 | Basf Se | Photolatent amidine bases for redox curing of radically curable formulations |
| EP2270114B1 (de) * | 2008-03-31 | 2014-07-09 | San-Apro Limited | Photobasengenerator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| CN102971380B (zh) | 2010-06-30 | 2015-08-19 | 3M创新有限公司 | 包含双反应性硅烷官能团的可按需固化组合物 |
| JP5818890B2 (ja) | 2010-06-30 | 2015-11-18 | スリーエム イノベイティブ プロパティズ カンパニー | 二重反応性シラン官能基を含む硬化性組成物 |
| US8840993B2 (en) | 2010-06-30 | 2014-09-23 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| KR101958343B1 (ko) | 2011-12-16 | 2019-03-15 | 쓰리본드 화인 케미칼 가부시키가이샤 | 경화성 수지조성물 |
| JP2015504945A (ja) | 2011-12-29 | 2015-02-16 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサン組成物 |
| EP2838935A1 (de) | 2011-12-29 | 2015-02-25 | 3M Innovative Properties Company | Härtbare polysiloxanbeschichtungszusammensetzung |
| KR20140119048A (ko) * | 2011-12-29 | 2014-10-08 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 경화성 폴리실록산 조성물 및 그로부터 제조된 감압 접착제 |
| JP6336398B2 (ja) | 2011-12-29 | 2018-06-06 | スリーエム イノベイティブ プロパティズ カンパニー | オンデマンド型硬化性ポリシロキサンコーティング組成物 |
| US9018322B2 (en) | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| WO2015008709A1 (ja) | 2013-07-18 | 2015-01-22 | セメダイン株式会社 | 光硬化性組成物 |
| CN105829485B (zh) | 2013-12-13 | 2018-10-12 | 思美定株式会社 | 具有粘合性的光固化性组合物 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| CN107148458A (zh) * | 2014-10-29 | 2017-09-08 | 德莎欧洲公司 | 包含可活化的吸气剂材料的胶粘剂混合物 |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| WO2016176548A1 (en) | 2015-04-29 | 2016-11-03 | 3M Innovative Properties Company | Composition including a polythiol and a polyepoxide and methods relating to the composition |
| US10813831B2 (en) | 2015-04-29 | 2020-10-27 | Bsn Medical Gmbh | Medical bathing device |
| BR112017023057B1 (pt) | 2015-04-29 | 2023-03-28 | Bsn Medical Gmbh | Processo para preparação de no e processo cosmético |
| JP2019534363A (ja) | 2016-11-03 | 2019-11-28 | スリーエム イノベイティブ プロパティズ カンパニー | シーラントを航空機用部品に適用する方法 |
| WO2018085190A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| US11198757B2 (en) | 2016-11-03 | 2021-12-14 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and coumarin and related methods |
| EP3548969A1 (de) | 2016-12-05 | 2019-10-09 | Arkema, Inc. | Initiatormischungen und lichthärtbare zusammensetzungen mit solchen initiatormischungen für 3d-druck |
| WO2019149583A1 (de) * | 2018-02-02 | 2019-08-08 | Basf Se | Polyurethane mit geringen emissionen organischer verbindungen |
| CN112004851A (zh) * | 2018-04-26 | 2020-11-27 | 汉高股份有限及两合公司 | 用作可固化组合物中的潜在催化剂的季氮化合物 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| CN112752803A (zh) | 2018-09-27 | 2021-05-04 | 3M创新有限公司 | 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法 |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476B (zh) * | 2022-08-30 | 2026-01-02 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
| WO2026077954A1 (en) * | 2024-10-08 | 2026-04-16 | Chemetall Gmbh | Photo-latent bases |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (de) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Beschichtungszusammensetzung enthaltend einen blockierten basischen Katalysator |
| ES2188584T3 (es) * | 1991-03-28 | 2003-07-01 | Eisai Co Ltd | Derivados heterociclicos de amina. |
| JP2654339B2 (ja) | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| CN1126484A (zh) | 1993-05-26 | 1996-07-10 | 阿克佐诺贝尔公司 | 含uv-可脱保护碱性催化剂的涂料组合物 |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| DE69703480T3 (de) | 1996-02-22 | 2006-07-06 | Ciba Speciality Chemicals Holding Inc. | Anionischer photokatalysator |
| ES2181162T3 (es) | 1997-01-22 | 2003-02-16 | Ciba Sc Holding Ag | Bases fotoactivables que contienen nitrogeno, basadas en alfa-amino-cetonas. |
| JP4155603B2 (ja) | 1997-02-26 | 2008-09-24 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基 |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| DE69806739T2 (de) | 1997-03-18 | 2003-03-13 | Ciba Speciality Chemicals Holding Inc., Basel | Photoaktivierbare, stickstoff enthaltende basen auf basis von alpha-aminoalkenen |
| EP0898202B1 (de) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen |
| AU5620499A (en) | 1998-08-21 | 2000-03-14 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable bases containing nitrogen |
| EP1285012B1 (de) | 2000-05-26 | 2007-01-10 | Akzo Nobel Coatings International B.V. | Photoaktivierbare beschichtungszusammensetzung |
-
2002
- 2002-10-08 EP EP02782851A patent/EP1436297B1/de not_active Expired - Lifetime
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en not_active Ceased
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003033500A1 (en) | 2003-04-24 |
| KR20050034614A (ko) | 2005-04-14 |
| US20040242867A1 (en) | 2004-12-02 |
| ZA200401523B (en) | 2004-12-14 |
| KR100938769B1 (ko) | 2010-01-27 |
| BR0213354A (pt) | 2004-10-26 |
| CN1571788B (zh) | 2012-08-01 |
| DE60219812D1 (de) | 2007-06-06 |
| JP2005511536A (ja) | 2005-04-28 |
| AU2002346968B2 (en) | 2008-04-10 |
| DE60219812T2 (de) | 2008-01-24 |
| US8252784B2 (en) | 2012-08-28 |
| JP4454309B2 (ja) | 2010-04-21 |
| EP1436297B1 (de) | 2007-04-25 |
| RU2004115329A (ru) | 2005-10-27 |
| MXPA04003564A (es) | 2004-07-23 |
| US20090076200A1 (en) | 2009-03-19 |
| CA2459374A1 (en) | 2003-04-24 |
| WO2003033500B1 (en) | 2003-12-11 |
| CA2459374C (en) | 2011-02-08 |
| EP1436297A1 (de) | 2004-07-14 |
| CN1571788A (zh) | 2005-01-26 |
| DE60219812T8 (de) | 2008-05-21 |
| US7538104B2 (en) | 2009-05-26 |
| RU2332419C2 (ru) | 2008-08-27 |
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