BR0213354A - Bases nitrogenadas fotoativáveis - Google Patents
Bases nitrogenadas fotoativáveisInfo
- Publication number
- BR0213354A BR0213354A BR0213354-7A BR0213354A BR0213354A BR 0213354 A BR0213354 A BR 0213354A BR 0213354 A BR0213354 A BR 0213354A BR 0213354 A BR0213354 A BR 0213354A
- Authority
- BR
- Brazil
- Prior art keywords
- base
- photoactivable
- nitrogenous bases
- benzylically
- polymerizable
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyesters Or Polycarbonates (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Luminescent Compositions (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Indole Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Plural Heterocyclic Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Epoxy Resins (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Abstract
"BASES NITROGENADAS FOTOATIVáVEIS". A presente invenção refere-se a compostos de fórmula I (I) em que R~ 1~, é um radical aromático ou heteroaromático que é capaz de absorver luz na faixa de comprimentos de onda de 200 nm a 650 nm e é não-substituído ou é substituído uma ou mais vezes por C~ 1~,-C~ 18~alquila, C~ 2~-C~ 18~ alquenila, C~ 2~-C~ 18~alquinila, C~ 1~-C~ 18~haloalquila, NO~ 2~, NR~ 10~R~ 11~, CN, OR~ 12~, SR~ 12~, C(O)R~ 13~, C(O)OR~ 14~, halogênio ou um radical de fórmula II e que, quando da absorção, acarreta uma fotoeliminação que leva à geração de um grupo amidina, R~ 2~ e R~ 3~, independentemente um do outro, são hidrogênio, C~ 1~-C~ 18~alquila ou fenila que é não-substituída ou é substituída uma ou mais vezes por C~ 1-C~ 18~alquila, CN, OR~ 2~, SR~ 12~, halogênio ou C~ 1~-C~ 18~haloalquila; R~ 5~ é C~ 1~-C~ 18~alquila ou NR~ 8~R~ 9~; R~ 4~, R~ 6~, R~ 7~, R~ 8~, R~ 9~, R~ 10~ e R~ 11~, independentemente um do outro, são hidrogênio ou C~ 1~-C~ 18~alquila; ou R~ 4~ e R~ 6~ juntos formam uma ponte C~ 2~-C~ 12~alquileno que é não-substituído ou é substituído por um ou mais radicais C~ 1~-C~ 4~alquila; ou R~ 5~ e R~ 7~, independentemente de R~ 4~ e R~ 6~, juntos formam uma ponte C~ 2~ -C~ 12~alquileno que é não-substituído ou é substituído por um ou mais radicais C~ 1~-C~ 4~aLquila; ou se R~ 5~ por um radical NR~ 8~R~ 9~, R~ 7~ e R~ 9~ juntos formam uma ponte C~ 2~ -C~ 12~alquileno que é não-substituído ou é substituído por um ou mais radicais C~ 1~-C~ 4~alquila; e R~ 12~, R~ 13~ e R~ 14~, independentemente um do outro, são hidrogênio ou C~ 1~-C~ 18~ alquila; são adequados como fotoiniciadores para compostos que reagem sob catálise de uma base.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 | ||
| PCT/EP2002/011238 WO2003033500A1 (en) | 2001-10-17 | 2002-10-08 | Photoactivable nitrogen bases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR0213354A true BR0213354A (pt) | 2004-10-26 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0213354-7A BR0213354A (pt) | 2001-10-17 | 2002-10-08 | Bases nitrogenadas fotoativáveis |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (pt) |
| EP (1) | EP1436297B1 (pt) |
| JP (1) | JP4454309B2 (pt) |
| KR (1) | KR100938769B1 (pt) |
| CN (1) | CN1571788B (pt) |
| AT (1) | ATE360629T1 (pt) |
| AU (1) | AU2002346968B2 (pt) |
| BR (1) | BR0213354A (pt) |
| CA (1) | CA2459374C (pt) |
| DE (1) | DE60219812T8 (pt) |
| MX (1) | MXPA04003564A (pt) |
| RU (1) | RU2332419C2 (pt) |
| WO (1) | WO2003033500A1 (pt) |
| ZA (1) | ZA200401523B (pt) |
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| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| US20070249484A1 (en) * | 2004-07-21 | 2007-10-25 | Johannes Benkhoff | Process for the Photoactivation and use of a Catalyst by an Inverted Two-Stage Procedure |
| ATE497502T1 (de) * | 2006-06-27 | 2011-02-15 | Basf Se | Zu langen wellenlängen verschobene benzotriazol- uv-absorber und deren verwendung |
| BRPI0717655B1 (pt) * | 2006-09-29 | 2018-12-18 | Basf Se | bases fotolatentes para sistema à base de isocianatos bloqueados |
| KR101514093B1 (ko) | 2007-04-03 | 2015-04-21 | 바스프 에스이 | 광활성화가능한 질소 염기 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| WO2008152956A1 (ja) * | 2007-06-14 | 2008-12-18 | Sekisui Chemical Co., Ltd. | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
| EP2270114B1 (en) * | 2008-03-31 | 2014-07-09 | San-Apro Limited | Photobase generator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP6151639B2 (ja) | 2010-06-30 | 2017-06-21 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサンコーティング組成物 |
| US8968869B2 (en) | 2010-06-30 | 2015-03-03 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| CN102985503A (zh) | 2010-06-30 | 2013-03-20 | 3M创新有限公司 | 包含双重反应性硅烷官能团的可固化组合物 |
| WO2013089100A1 (ja) | 2011-12-16 | 2013-06-20 | 株式会社スリーボンド | 硬化性樹脂組成物 |
| WO2013101742A1 (en) | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| WO2013106193A1 (en) | 2011-12-29 | 2013-07-18 | 3M Innovative Properties Company | Curable polysiloxane composition |
| CN104093785B (zh) | 2011-12-29 | 2016-08-24 | 3M创新有限公司 | 可固化聚硅氧烷组合物和由其制得的压敏粘合剂 |
| JP2015503660A (ja) | 2011-12-29 | 2015-02-02 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサンコーティング組成物 |
| US9018322B2 (en) | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| CN105392845B (zh) | 2013-07-18 | 2020-10-20 | 思美定株式会社 | 光固化性组合物 |
| US9718999B2 (en) | 2013-12-13 | 2017-08-01 | Cemedine Co., Ltd | Photocurable composition having adhesive properties |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| WO2016066435A1 (de) | 2014-10-29 | 2016-05-06 | Tesa Se | Klebemassen mit aktivierbaren gettermaterialien |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
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| EP3288893B8 (de) | 2015-04-29 | 2019-04-10 | BSN medical GmbH | Mehrstufiges verfahren zur no-herstellung |
| CA2984033C (en) | 2015-04-29 | 2023-08-15 | Bsn Medical Gmbh | Medical bathing equipment |
| WO2018085190A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| EP3535333A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition |
| EP3535621A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| CA3044541A1 (en) | 2016-12-05 | 2018-06-14 | Arkema Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
| JP7416698B2 (ja) | 2018-02-02 | 2024-01-17 | ビーエーエスエフ ソシエタス・ヨーロピア | 有機化合物の放出量が少ないポリウレタン |
| BR112019010869A2 (pt) * | 2018-04-26 | 2020-03-03 | Henkel Ag & Co. Kgaa | Composto de nitrogênio quaternário para uso como um catalisador latente em composições curáveis |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| EP3856849A1 (en) | 2018-09-27 | 2021-08-04 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| JP2654339B2 (ja) | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| CN1126484A (zh) | 1993-05-26 | 1996-07-10 | 阿克佐诺贝尔公司 | 含uv-可脱保护碱性催化剂的涂料组合物 |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| ES2153177T5 (es) | 1996-02-22 | 2006-04-16 | Ciba Specialty Chemicals Holding Inc. | Fotocatalizador anionico. |
| AU719308B2 (en) * | 1997-01-22 | 2000-05-04 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on alpha-amino ketones |
| DE69839020T2 (de) | 1997-02-26 | 2009-03-19 | Ciba Holding Inc. | Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| CA2283446C (en) * | 1997-03-18 | 2008-05-06 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on .alpha.-amino alkenes |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| JP2002523393A (ja) | 1998-08-21 | 2002-07-30 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化が可能な窒素含有塩基 |
| CN1187388C (zh) | 2000-05-26 | 2005-02-02 | 阿克佐诺贝尔股份有限公司 | 光敏涂料组合物 |
-
2002
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en active IP Right Grant
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 EP EP02782851A patent/EP1436297B1/en not_active Expired - Lifetime
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko active IP Right Grant
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| RU2004115329A (ru) | 2005-10-27 |
| DE60219812T2 (de) | 2008-01-24 |
| ATE360629T1 (de) | 2007-05-15 |
| CN1571788B (zh) | 2012-08-01 |
| EP1436297B1 (en) | 2007-04-25 |
| KR100938769B1 (ko) | 2010-01-27 |
| CA2459374A1 (en) | 2003-04-24 |
| EP1436297A1 (en) | 2004-07-14 |
| KR20050034614A (ko) | 2005-04-14 |
| RU2332419C2 (ru) | 2008-08-27 |
| US7538104B2 (en) | 2009-05-26 |
| JP4454309B2 (ja) | 2010-04-21 |
| MXPA04003564A (es) | 2004-07-23 |
| WO2003033500A1 (en) | 2003-04-24 |
| JP2005511536A (ja) | 2005-04-28 |
| DE60219812T8 (de) | 2008-05-21 |
| US20040242867A1 (en) | 2004-12-02 |
| CN1571788A (zh) | 2005-01-26 |
| US20090076200A1 (en) | 2009-03-19 |
| WO2003033500B1 (en) | 2003-12-11 |
| CA2459374C (en) | 2011-02-08 |
| US8252784B2 (en) | 2012-08-28 |
| DE60219812D1 (de) | 2007-06-06 |
| AU2002346968B2 (en) | 2008-04-10 |
| ZA200401523B (en) | 2004-12-14 |
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