MXPA04003564A - Bases de nitrogeno fotoactivables. - Google Patents
Bases de nitrogeno fotoactivables.Info
- Publication number
- MXPA04003564A MXPA04003564A MXPA04003564A MXPA04003564A MXPA04003564A MX PA04003564 A MXPA04003564 A MX PA04003564A MX PA04003564 A MXPA04003564 A MX PA04003564A MX PA04003564 A MXPA04003564 A MX PA04003564A MX PA04003564 A MXPA04003564 A MX PA04003564A
- Authority
- MX
- Mexico
- Prior art keywords
- unsubstituted
- substituted
- 8alkyl
- ealkyl
- hydrogen
- Prior art date
Links
- 229910052757 nitrogen Inorganic materials 0.000 title abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title 2
- -1 heteroaromatic radical Chemical class 0.000 abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 150000003254 radicals Chemical class 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 125000000320 amidine group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 238000005815 base catalysis Methods 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Epoxy Resins (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Polyurethanes Or Polyureas (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 | ||
| PCT/EP2002/011238 WO2003033500A1 (en) | 2001-10-17 | 2002-10-08 | Photoactivable nitrogen bases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MXPA04003564A true MXPA04003564A (es) | 2004-07-23 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MXPA04003564A MXPA04003564A (es) | 2001-10-17 | 2002-10-08 | Bases de nitrogeno fotoactivables. |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (enExample) |
| EP (1) | EP1436297B1 (enExample) |
| JP (1) | JP4454309B2 (enExample) |
| KR (1) | KR100938769B1 (enExample) |
| CN (1) | CN1571788B (enExample) |
| AT (1) | ATE360629T1 (enExample) |
| AU (1) | AU2002346968B2 (enExample) |
| BR (1) | BR0213354A (enExample) |
| CA (1) | CA2459374C (enExample) |
| DE (1) | DE60219812T8 (enExample) |
| MX (1) | MXPA04003564A (enExample) |
| RU (1) | RU2332419C2 (enExample) |
| WO (1) | WO2003033500A1 (enExample) |
| ZA (1) | ZA200401523B (enExample) |
Families Citing this family (48)
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| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| BRPI0513709A (pt) * | 2004-07-21 | 2008-05-13 | Ciba Sc Holding Ag | processo para a fotoativação e uso de um catalisador por um procedimento de dois estágios invertido |
| DE602006020839D1 (de) * | 2005-02-02 | 2011-05-05 | Basf Se | Langwellige verschobene benzotriazol-uv-absorber und deren verwendung |
| US20090298962A1 (en) * | 2006-09-29 | 2009-12-03 | Katia Studer | Photolatent bases for systems based on blocked isocyanates |
| JP5606308B2 (ja) * | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| WO2008152956A1 (ja) * | 2007-06-14 | 2008-12-18 | Sekisui Chemical Co., Ltd. | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
| US8329771B2 (en) | 2008-03-31 | 2012-12-11 | San-Apro Limited | Photobase generator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP6151639B2 (ja) | 2010-06-30 | 2017-06-21 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサンコーティング組成物 |
| WO2012003160A1 (en) | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable composition comprising dual reactive silane functionality |
| WO2012003153A1 (en) * | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| KR101958343B1 (ko) | 2011-12-16 | 2019-03-15 | 쓰리본드 화인 케미칼 가부시키가이샤 | 경화성 수지조성물 |
| WO2013101535A1 (en) * | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable polysiloxane compositions and pressure sensitive adhesives made therefrom |
| EP2797985B1 (en) | 2011-12-29 | 2015-09-23 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| CN105164184A (zh) | 2011-12-29 | 2015-12-16 | 3M创新有限公司 | 可固化聚硅氧烷涂料组合物 |
| US9006357B2 (en) | 2011-12-29 | 2015-04-14 | 3M Innovative Properties Company | Curable polysiloxane composition |
| US9018322B2 (en) * | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| JP5927750B2 (ja) | 2013-07-18 | 2016-06-01 | セメダイン株式会社 | 光硬化性組成物 |
| KR102330121B1 (ko) | 2013-12-13 | 2021-11-23 | 세메다인 가부시키 가이샤 | 접착성을 갖는 광경화성 조성물 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328274B2 (en) * | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| WO2016066435A1 (de) * | 2014-10-29 | 2016-05-06 | Tesa Se | Klebemassen mit aktivierbaren gettermaterialien |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| WO2016176548A1 (en) | 2015-04-29 | 2016-11-03 | 3M Innovative Properties Company | Composition including a polythiol and a polyepoxide and methods relating to the composition |
| BR112017023170B1 (pt) | 2015-04-29 | 2022-08-16 | Bsn Medical Gmbh | Dispositivo de banho medicinal e seu uso |
| CN107809996A (zh) | 2015-04-29 | 2018-03-16 | Bsn医疗有限公司 | 一氧化氮产生的多步骤方法 |
| CA3042864A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition |
| CA3042861A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| CA3042860A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| CN110036342A (zh) | 2016-12-05 | 2019-07-19 | 阿科玛股份有限公司 | 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物 |
| CN111655749B (zh) * | 2018-02-02 | 2023-03-03 | 巴斯夫欧洲公司 | 低有机化合物释放的聚氨酯 |
| CN112004851A (zh) * | 2018-04-26 | 2020-11-27 | 汉高股份有限及两合公司 | 用作可固化组合物中的潜在催化剂的季氮化合物 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| WO2020065588A1 (en) | 2018-09-27 | 2020-04-02 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476A (zh) * | 2022-08-30 | 2022-11-25 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| RU2119920C1 (ru) * | 1991-03-28 | 1998-10-10 | Эйсай Ко., Лтд. | Гетероцикло-циклические производные аминов или их фармацевтически приемлемые соли, промежуточные соединения, фармацевтическая композиция, способ ингибирования холинэстеразы, способ получения соединений |
| JP2654339B2 (ja) * | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| CA2163875A1 (en) | 1993-05-26 | 1994-12-08 | Huig Klinkenberg | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| EP0882072B2 (en) | 1996-02-22 | 2005-10-26 | Ciba SC Holding AG | Anionic photocatalyst |
| KR100505529B1 (ko) * | 1997-01-22 | 2005-08-04 | 시바 스페셜티 케미칼스 홀딩 인크. | α-아미노 케톤을 기본으로 하는 광 활성화 질소 함유 염기 |
| DE69839020T2 (de) | 1997-02-26 | 2009-03-19 | Ciba Holding Inc. | Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| JP4308326B2 (ja) * | 1997-03-18 | 2009-08-05 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | α−アミノアルケン類に基づく光励起性の窒素含有塩基類 |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| DE59903270D1 (de) | 1998-08-21 | 2002-12-05 | Ciba Sc Holding Ag | Photoaktivierbare stickstoffhaltige basen |
| JP4906221B2 (ja) | 2000-05-26 | 2012-03-28 | アクゾ ノーベル ナムローゼ フェンノートシャップ | 光活性化可能なコーティング組成物 |
-
2002
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 EP EP02782851A patent/EP1436297B1/en not_active Expired - Lifetime
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en not_active Ceased
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2459374A1 (en) | 2003-04-24 |
| US20090076200A1 (en) | 2009-03-19 |
| ZA200401523B (en) | 2004-12-14 |
| KR20050034614A (ko) | 2005-04-14 |
| US8252784B2 (en) | 2012-08-28 |
| CN1571788A (zh) | 2005-01-26 |
| RU2332419C2 (ru) | 2008-08-27 |
| DE60219812D1 (de) | 2007-06-06 |
| JP2005511536A (ja) | 2005-04-28 |
| EP1436297A1 (en) | 2004-07-14 |
| JP4454309B2 (ja) | 2010-04-21 |
| EP1436297B1 (en) | 2007-04-25 |
| ATE360629T1 (de) | 2007-05-15 |
| KR100938769B1 (ko) | 2010-01-27 |
| BR0213354A (pt) | 2004-10-26 |
| US20040242867A1 (en) | 2004-12-02 |
| WO2003033500A1 (en) | 2003-04-24 |
| CN1571788B (zh) | 2012-08-01 |
| DE60219812T2 (de) | 2008-01-24 |
| AU2002346968B2 (en) | 2008-04-10 |
| US7538104B2 (en) | 2009-05-26 |
| DE60219812T8 (de) | 2008-05-21 |
| RU2004115329A (ru) | 2005-10-27 |
| CA2459374C (en) | 2011-02-08 |
| WO2003033500B1 (en) | 2003-12-11 |
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