JP4454309B2 - 光活性化窒素塩基 - Google Patents

光活性化窒素塩基 Download PDF

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Publication number
JP4454309B2
JP4454309B2 JP2003536239A JP2003536239A JP4454309B2 JP 4454309 B2 JP4454309 B2 JP 4454309B2 JP 2003536239 A JP2003536239 A JP 2003536239A JP 2003536239 A JP2003536239 A JP 2003536239A JP 4454309 B2 JP4454309 B2 JP 4454309B2
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Japan
Prior art keywords
alkyl
substituted
unsubstituted
formula
groups
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2003536239A
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English (en)
Japanese (ja)
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JP2005511536A (ja
JP2005511536A5 (enExample
Inventor
ボーダン,ジゼル
ディートリカー,クルト
ユング,トゥニヤ
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BASF Schweiz AG
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Ciba Holding AG
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Publication of JP2005511536A5 publication Critical patent/JP2005511536A5/ja
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Epoxy Resins (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Indole Compounds (AREA)
JP2003536239A 2001-10-17 2002-10-08 光活性化窒素塩基 Expired - Fee Related JP4454309B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
JP2005511536A JP2005511536A (ja) 2005-04-28
JP2005511536A5 JP2005511536A5 (enExample) 2009-07-30
JP4454309B2 true JP4454309B2 (ja) 2010-04-21

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003536239A Expired - Fee Related JP4454309B2 (ja) 2001-10-17 2002-10-08 光活性化窒素塩基

Country Status (14)

Country Link
US (2) US7538104B2 (enExample)
EP (1) EP1436297B1 (enExample)
JP (1) JP4454309B2 (enExample)
KR (1) KR100938769B1 (enExample)
CN (1) CN1571788B (enExample)
AT (1) ATE360629T1 (enExample)
AU (1) AU2002346968B2 (enExample)
BR (1) BR0213354A (enExample)
CA (1) CA2459374C (enExample)
DE (1) DE60219812T8 (enExample)
MX (1) MXPA04003564A (enExample)
RU (1) RU2332419C2 (enExample)
WO (1) WO2003033500A1 (enExample)
ZA (1) ZA200401523B (enExample)

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US20050234208A1 (en) 2004-04-14 2005-10-20 Matthias Koch Fast curing polydiorganosiloxanes
BRPI0513709A (pt) * 2004-07-21 2008-05-13 Ciba Sc Holding Ag processo para a fotoativação e uso de um catalisador por um procedimento de dois estágios invertido
DE602006020839D1 (de) * 2005-02-02 2011-05-05 Basf Se Langwellige verschobene benzotriazol-uv-absorber und deren verwendung
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
WO2008152956A1 (ja) * 2007-06-14 2008-12-18 Sekisui Chemical Co., Ltd. 光硬化型粘接着剤組成物
JP2009126974A (ja) * 2007-11-26 2009-06-11 Three Bond Co Ltd 樹脂組成物
CN101925616A (zh) * 2008-01-28 2010-12-22 巴斯夫欧洲公司 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
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JP5521999B2 (ja) * 2009-11-26 2014-06-18 住友化学株式会社 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法
JP6151639B2 (ja) 2010-06-30 2017-06-21 スリーエム イノベイティブ プロパティズ カンパニー 硬化性ポリシロキサンコーティング組成物
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WO2012003153A1 (en) * 2010-06-30 2012-01-05 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
KR101958343B1 (ko) 2011-12-16 2019-03-15 쓰리본드 화인 케미칼 가부시키가이샤 경화성 수지조성물
WO2013101535A1 (en) * 2011-12-29 2013-07-04 3M Innovative Properties Company Curable polysiloxane compositions and pressure sensitive adhesives made therefrom
EP2797985B1 (en) 2011-12-29 2015-09-23 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
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US9006357B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane composition
US9018322B2 (en) * 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
DE102014202609B4 (de) * 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
US9328274B2 (en) * 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
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WO2016066435A1 (de) * 2014-10-29 2016-05-06 Tesa Se Klebemassen mit aktivierbaren gettermaterialien
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
CN107809996A (zh) 2015-04-29 2018-03-16 Bsn医疗有限公司 一氧化氮产生的多步骤方法
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042861A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
CN110036342A (zh) 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
CN111655749B (zh) * 2018-02-02 2023-03-03 巴斯夫欧洲公司 低有机化合物释放的聚氨酯
CN112004851A (zh) * 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
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Also Published As

Publication number Publication date
CA2459374A1 (en) 2003-04-24
US20090076200A1 (en) 2009-03-19
ZA200401523B (en) 2004-12-14
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CN1571788A (zh) 2005-01-26
RU2332419C2 (ru) 2008-08-27
DE60219812D1 (de) 2007-06-06
MXPA04003564A (es) 2004-07-23
JP2005511536A (ja) 2005-04-28
EP1436297A1 (en) 2004-07-14
EP1436297B1 (en) 2007-04-25
ATE360629T1 (de) 2007-05-15
KR100938769B1 (ko) 2010-01-27
BR0213354A (pt) 2004-10-26
US20040242867A1 (en) 2004-12-02
WO2003033500A1 (en) 2003-04-24
CN1571788B (zh) 2012-08-01
DE60219812T2 (de) 2008-01-24
AU2002346968B2 (en) 2008-04-10
US7538104B2 (en) 2009-05-26
DE60219812T8 (de) 2008-05-21
RU2004115329A (ru) 2005-10-27
CA2459374C (en) 2011-02-08
WO2003033500B1 (en) 2003-12-11

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