CA2459374C - Photoactivable nitrogen bases - Google Patents

Photoactivable nitrogen bases Download PDF

Info

Publication number
CA2459374C
CA2459374C CA2459374A CA2459374A CA2459374C CA 2459374 C CA2459374 C CA 2459374C CA 2459374 A CA2459374 A CA 2459374A CA 2459374 A CA2459374 A CA 2459374A CA 2459374 C CA2459374 C CA 2459374C
Authority
CA
Canada
Prior art keywords
substituted
unsubstituted
formula
c18alkyl
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA2459374A
Other languages
English (en)
French (fr)
Other versions
CA2459374A1 (en
Inventor
Gisele Baudin
Kurt Dietliker
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CA2459374A1 publication Critical patent/CA2459374A1/en
Application granted granted Critical
Publication of CA2459374C publication Critical patent/CA2459374C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Epoxy Resins (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Indole Compounds (AREA)
CA2459374A 2001-10-17 2002-10-08 Photoactivable nitrogen bases Expired - Fee Related CA2459374C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
CH20011911/01 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (2)

Publication Number Publication Date
CA2459374A1 CA2459374A1 (en) 2003-04-24
CA2459374C true CA2459374C (en) 2011-02-08

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2459374A Expired - Fee Related CA2459374C (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Country Status (14)

Country Link
US (2) US7538104B2 (enExample)
EP (1) EP1436297B1 (enExample)
JP (1) JP4454309B2 (enExample)
KR (1) KR100938769B1 (enExample)
CN (1) CN1571788B (enExample)
AT (1) ATE360629T1 (enExample)
AU (1) AU2002346968B2 (enExample)
BR (1) BR0213354A (enExample)
CA (1) CA2459374C (enExample)
DE (1) DE60219812T8 (enExample)
MX (1) MXPA04003564A (enExample)
RU (1) RU2332419C2 (enExample)
WO (1) WO2003033500A1 (enExample)
ZA (1) ZA200401523B (enExample)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5283303B2 (ja) * 2003-12-25 2013-09-04 Dic株式会社 転写材用硬化性樹脂組成物、転写材および保護層の形成方法
US20050234208A1 (en) 2004-04-14 2005-10-20 Matthias Koch Fast curing polydiorganosiloxanes
BRPI0513709A (pt) * 2004-07-21 2008-05-13 Ciba Sc Holding Ag processo para a fotoativação e uso de um catalisador por um procedimento de dois estágios invertido
DE602006020839D1 (de) * 2005-02-02 2011-05-05 Basf Se Langwellige verschobene benzotriazol-uv-absorber und deren verwendung
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
WO2008152956A1 (ja) * 2007-06-14 2008-12-18 Sekisui Chemical Co., Ltd. 光硬化型粘接着剤組成物
JP2009126974A (ja) * 2007-11-26 2009-06-11 Three Bond Co Ltd 樹脂組成物
CN101925616A (zh) * 2008-01-28 2010-12-22 巴斯夫欧洲公司 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
US8329771B2 (en) 2008-03-31 2012-12-11 San-Apro Limited Photobase generator
DE102008043218A1 (de) 2008-09-24 2010-04-01 Evonik Goldschmidt Gmbh Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5521999B2 (ja) * 2009-11-26 2014-06-18 住友化学株式会社 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法
JP6151639B2 (ja) 2010-06-30 2017-06-21 スリーエム イノベイティブ プロパティズ カンパニー 硬化性ポリシロキサンコーティング組成物
WO2012003160A1 (en) 2010-06-30 2012-01-05 3M Innovative Properties Company Curable composition comprising dual reactive silane functionality
WO2012003153A1 (en) * 2010-06-30 2012-01-05 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
KR101958343B1 (ko) 2011-12-16 2019-03-15 쓰리본드 화인 케미칼 가부시키가이샤 경화성 수지조성물
WO2013101535A1 (en) * 2011-12-29 2013-07-04 3M Innovative Properties Company Curable polysiloxane compositions and pressure sensitive adhesives made therefrom
EP2797985B1 (en) 2011-12-29 2015-09-23 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
CN105164184A (zh) 2011-12-29 2015-12-16 3M创新有限公司 可固化聚硅氧烷涂料组合物
US9006357B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane composition
US9018322B2 (en) * 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
DE102014202609B4 (de) * 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
US9328274B2 (en) * 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
US9328275B2 (en) 2014-03-07 2016-05-03 Prc Desoto International, Inc. Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions
WO2016066435A1 (de) * 2014-10-29 2016-05-06 Tesa Se Klebemassen mit aktivierbaren gettermaterialien
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
CN107809996A (zh) 2015-04-29 2018-03-16 Bsn医疗有限公司 一氧化氮产生的多步骤方法
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042861A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
CN110036342A (zh) 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
CN111655749B (zh) * 2018-02-02 2023-03-03 巴斯夫欧洲公司 低有机化合物释放的聚氨酯
CN112004851A (zh) * 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
EP3848179A1 (de) 2020-01-10 2021-07-14 Carl Zeiss Vision International GmbH Inkjet-verfahren zur herstellung eines brillenglases
CN111795960B (zh) * 2020-08-10 2022-08-09 齐齐哈尔大学 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用
CN115389476A (zh) * 2022-08-30 2022-11-25 广西大学 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0448154A1 (en) 1990-03-20 1991-09-25 Akzo Nobel N.V. Coating composition including a blocked basic catalyst
RU2119920C1 (ru) * 1991-03-28 1998-10-10 Эйсай Ко., Лтд. Гетероцикло-циклические производные аминов или их фармацевтически приемлемые соли, промежуточные соединения, фармацевтическая композиция, способ ингибирования холинэстеразы, способ получения соединений
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法
CA2163875A1 (en) 1993-05-26 1994-12-08 Huig Klinkenberg Coating composition including a uv-deblockable basic catalyst
JP3206310B2 (ja) * 1994-07-01 2001-09-10 ダイキン工業株式会社 表面改質されたフッ素樹脂成形品
US5998496A (en) 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
EP0882072B2 (en) 1996-02-22 2005-10-26 Ciba SC Holding AG Anionic photocatalyst
KR100505529B1 (ko) * 1997-01-22 2005-08-04 시바 스페셜티 케미칼스 홀딩 인크. α-아미노 케톤을 기본으로 하는 광 활성화 질소 함유 염기
DE69839020T2 (de) 1997-02-26 2009-03-19 Ciba Holding Inc. Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten
JPH10306141A (ja) 1997-03-06 1998-11-17 Toray Ind Inc 半導体装置およびエポキシ樹脂組成物
JP4308326B2 (ja) * 1997-03-18 2009-08-05 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド α−アミノアルケン類に基づく光励起性の窒素含有塩基類
EP0898202B1 (en) 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
DE59903270D1 (de) 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
JP4906221B2 (ja) 2000-05-26 2012-03-28 アクゾ ノーベル ナムローゼ フェンノートシャップ 光活性化可能なコーティング組成物

Also Published As

Publication number Publication date
CA2459374A1 (en) 2003-04-24
US20090076200A1 (en) 2009-03-19
ZA200401523B (en) 2004-12-14
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CN1571788A (zh) 2005-01-26
RU2332419C2 (ru) 2008-08-27
DE60219812D1 (de) 2007-06-06
MXPA04003564A (es) 2004-07-23
JP2005511536A (ja) 2005-04-28
EP1436297A1 (en) 2004-07-14
JP4454309B2 (ja) 2010-04-21
EP1436297B1 (en) 2007-04-25
ATE360629T1 (de) 2007-05-15
KR100938769B1 (ko) 2010-01-27
BR0213354A (pt) 2004-10-26
US20040242867A1 (en) 2004-12-02
WO2003033500A1 (en) 2003-04-24
CN1571788B (zh) 2012-08-01
DE60219812T2 (de) 2008-01-24
AU2002346968B2 (en) 2008-04-10
US7538104B2 (en) 2009-05-26
DE60219812T8 (de) 2008-05-21
RU2004115329A (ru) 2005-10-27
WO2003033500B1 (en) 2003-12-11

Similar Documents

Publication Publication Date Title
CA2459374C (en) Photoactivable nitrogen bases
AU2002346968A1 (en) Photoactivable nitrogen bases
CA2681201C (en) Photoactivable nitrogen bases
CA2276613C (en) Photoactivatable nitrogen-containing bases based on .alpha.-amino ketones
CA2283446C (en) Photoactivatable nitrogen-containing bases based on .alpha.-amino alkenes
US6489374B1 (en) Photoactivatable bases containing nitrogen

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed

Effective date: 20151008