CN1571788B - 光活化性氮碱 - Google Patents

光活化性氮碱 Download PDF

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Publication number
CN1571788B
CN1571788B CN028206002A CN02820600A CN1571788B CN 1571788 B CN1571788 B CN 1571788B CN 028206002 A CN028206002 A CN 028206002A CN 02820600 A CN02820600 A CN 02820600A CN 1571788 B CN1571788 B CN 1571788B
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CN
China
Prior art keywords
alkyl
group
general formula
phenyl
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN028206002A
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English (en)
Chinese (zh)
Other versions
CN1571788A (zh
Inventor
G·博丹
K·迪特利克
T·容
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN1571788A publication Critical patent/CN1571788A/zh
Application granted granted Critical
Publication of CN1571788B publication Critical patent/CN1571788B/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Epoxy Resins (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Indole Compounds (AREA)
CN028206002A 2001-10-17 2002-10-08 光活化性氮碱 Expired - Lifetime CN1571788B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
CH20011911/01 2001-10-17
CH20011911/2001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (2)

Publication Number Publication Date
CN1571788A CN1571788A (zh) 2005-01-26
CN1571788B true CN1571788B (zh) 2012-08-01

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
CN028206002A Expired - Lifetime CN1571788B (zh) 2001-10-17 2002-10-08 光活化性氮碱

Country Status (14)

Country Link
US (2) US7538104B2 (enExample)
EP (1) EP1436297B1 (enExample)
JP (1) JP4454309B2 (enExample)
KR (1) KR100938769B1 (enExample)
CN (1) CN1571788B (enExample)
AT (1) ATE360629T1 (enExample)
AU (1) AU2002346968B2 (enExample)
BR (1) BR0213354A (enExample)
CA (1) CA2459374C (enExample)
DE (1) DE60219812T8 (enExample)
MX (1) MXPA04003564A (enExample)
RU (1) RU2332419C2 (enExample)
WO (1) WO2003033500A1 (enExample)
ZA (1) ZA200401523B (enExample)

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BRPI0513709A (pt) * 2004-07-21 2008-05-13 Ciba Sc Holding Ag processo para a fotoativação e uso de um catalisador por um procedimento de dois estágios invertido
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US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
WO2008152956A1 (ja) * 2007-06-14 2008-12-18 Sekisui Chemical Co., Ltd. 光硬化型粘接着剤組成物
JP2009126974A (ja) * 2007-11-26 2009-06-11 Three Bond Co Ltd 樹脂組成物
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JP5521999B2 (ja) * 2009-11-26 2014-06-18 住友化学株式会社 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法
JP6151639B2 (ja) 2010-06-30 2017-06-21 スリーエム イノベイティブ プロパティズ カンパニー 硬化性ポリシロキサンコーティング組成物
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WO2012003153A1 (en) * 2010-06-30 2012-01-05 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
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WO2013101535A1 (en) * 2011-12-29 2013-07-04 3M Innovative Properties Company Curable polysiloxane compositions and pressure sensitive adhesives made therefrom
EP2797985B1 (en) 2011-12-29 2015-09-23 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
CN105164184A (zh) 2011-12-29 2015-12-16 3M创新有限公司 可固化聚硅氧烷涂料组合物
US9006357B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane composition
US9018322B2 (en) * 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
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US9328274B2 (en) * 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
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WO2016066435A1 (de) * 2014-10-29 2016-05-06 Tesa Se Klebemassen mit aktivierbaren gettermaterialien
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
CN107809996A (zh) 2015-04-29 2018-03-16 Bsn医疗有限公司 一氧化氮产生的多步骤方法
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042861A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
CN110036342A (zh) 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
CN111655749B (zh) * 2018-02-02 2023-03-03 巴斯夫欧洲公司 低有机化合物释放的聚氨酯
CN112004851A (zh) * 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
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WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
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Also Published As

Publication number Publication date
CA2459374A1 (en) 2003-04-24
US20090076200A1 (en) 2009-03-19
ZA200401523B (en) 2004-12-14
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CN1571788A (zh) 2005-01-26
RU2332419C2 (ru) 2008-08-27
DE60219812D1 (de) 2007-06-06
MXPA04003564A (es) 2004-07-23
JP2005511536A (ja) 2005-04-28
EP1436297A1 (en) 2004-07-14
JP4454309B2 (ja) 2010-04-21
EP1436297B1 (en) 2007-04-25
ATE360629T1 (de) 2007-05-15
KR100938769B1 (ko) 2010-01-27
BR0213354A (pt) 2004-10-26
US20040242867A1 (en) 2004-12-02
WO2003033500A1 (en) 2003-04-24
DE60219812T2 (de) 2008-01-24
AU2002346968B2 (en) 2008-04-10
US7538104B2 (en) 2009-05-26
DE60219812T8 (de) 2008-05-21
RU2004115329A (ru) 2005-10-27
CA2459374C (en) 2011-02-08
WO2003033500B1 (en) 2003-12-11

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Granted publication date: 20120801