BR0213354A - Bases nitrogenadas fotoativáveis - Google Patents
Bases nitrogenadas fotoativáveisInfo
- Publication number
- BR0213354A BR0213354A BR0213354-7A BR0213354A BR0213354A BR 0213354 A BR0213354 A BR 0213354A BR 0213354 A BR0213354 A BR 0213354A BR 0213354 A BR0213354 A BR 0213354A
- Authority
- BR
- Brazil
- Prior art keywords
- base
- photoactivable
- nitrogenous bases
- benzylically
- polymerizable
- Prior art date
Links
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 title 1
- 150000001409 amidines Chemical class 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 125000001743 benzylic group Chemical group 0.000 abstract 1
- -1 bicyclic amines Chemical class 0.000 abstract 1
- 238000006555 catalytic reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Photoreceptors In Electrophotography (AREA)
- Light Receiving Elements (AREA)
- Polyurethanes Or Polyureas (AREA)
- Epoxy Resins (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Luminescent Compositions (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Indole Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 | ||
| PCT/EP2002/011238 WO2003033500A1 (en) | 2001-10-17 | 2002-10-08 | Photoactivable nitrogen bases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR0213354A true BR0213354A (pt) | 2004-10-26 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0213354-7A BR0213354A (pt) | 2001-10-17 | 2002-10-08 | Bases nitrogenadas fotoativáveis |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (enExample) |
| EP (1) | EP1436297B1 (enExample) |
| JP (1) | JP4454309B2 (enExample) |
| KR (1) | KR100938769B1 (enExample) |
| CN (1) | CN1571788B (enExample) |
| AT (1) | ATE360629T1 (enExample) |
| AU (1) | AU2002346968B2 (enExample) |
| BR (1) | BR0213354A (enExample) |
| CA (1) | CA2459374C (enExample) |
| DE (1) | DE60219812T8 (enExample) |
| MX (1) | MXPA04003564A (enExample) |
| RU (1) | RU2332419C2 (enExample) |
| WO (1) | WO2003033500A1 (enExample) |
| ZA (1) | ZA200401523B (enExample) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| EP1789188A2 (en) * | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| RU2414471C2 (ru) * | 2005-02-02 | 2011-03-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Бензотриазоловые поглотители уф-лучей со смещенным в длинноволновую область спектром поглощения и их применение |
| US20090298962A1 (en) * | 2006-09-29 | 2009-12-03 | Katia Studer | Photolatent bases for systems based on blocked isocyanates |
| JP5606308B2 (ja) * | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| JP5339907B2 (ja) * | 2007-06-14 | 2013-11-13 | 積水化学工業株式会社 | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| JP5697992B2 (ja) * | 2008-01-28 | 2015-04-08 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 |
| US8329771B2 (en) | 2008-03-31 | 2012-12-11 | San-Apro Limited | Photobase generator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| EP2665788A1 (en) | 2010-06-30 | 2013-11-27 | 3M Innovative Properties Company | Curable composition comprising dual reactive silane functionality |
| WO2012003108A1 (en) | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| CN102971381A (zh) * | 2010-06-30 | 2013-03-13 | 3M创新有限公司 | 可按需固化的聚硅氧烷涂层组合物 |
| EP2792694A4 (en) | 2011-12-16 | 2015-07-15 | Three Bond Fine Chemical Co Ltd | Curable resin composition |
| WO2013101535A1 (en) | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable polysiloxane compositions and pressure sensitive adhesives made therefrom |
| WO2013101742A1 (en) | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| CN104470983A (zh) | 2011-12-29 | 2015-03-25 | 3M创新有限公司 | 可固化聚硅氧烷组合物 |
| US9006336B2 (en) | 2011-12-29 | 2015-04-14 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| US9018322B2 (en) * | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| US20160152783A1 (en) | 2013-07-18 | 2016-06-02 | Cemedine Co., Ltd. | Photocurable composition |
| WO2015088021A1 (ja) | 2013-12-13 | 2015-06-18 | セメダイン株式会社 | 接着性を有する光硬化性組成物 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US20170327717A1 (en) | 2014-10-29 | 2017-11-16 | Tesa Se | Adhesive compounds containing getter materials that can be activated |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| BR112017023446A2 (pt) | 2015-04-29 | 2018-07-31 | 3M Innovative Properties Co | método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido |
| JP6942058B2 (ja) | 2015-04-29 | 2021-09-29 | ビーエスエヌ メディカル ゲーエムベーハー | Ｎｏ生成のための多段階プロセス |
| BR112017023170B1 (pt) | 2015-04-29 | 2022-08-16 | Bsn Medical Gmbh | Dispositivo de banho medicinal e seu uso |
| EP3535332A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Method of applying a sealant to an aircraft component |
| WO2018085190A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| WO2018085534A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| US20190369494A1 (en) | 2016-12-05 | 2019-12-05 | Arkemea Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
| EP3746494B1 (de) * | 2018-02-02 | 2024-05-29 | Basf Se | Polyurethane mit geringen emissionen organischer verbindungen |
| KR20210003869A (ko) * | 2018-04-26 | 2021-01-12 | 헨켈 아게 운트 코. 카게아아 | 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| EP3856849A1 (en) | 2018-09-27 | 2021-08-04 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476B (zh) * | 2022-08-30 | 2026-01-02 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
| WO2026077954A1 (en) * | 2024-10-08 | 2026-04-16 | Chemetall Gmbh | Photo-latent bases |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| PL171914B1 (pl) * | 1991-03-28 | 1997-06-30 | Eisai Co Ltd | Sposób wytwarzania pochodnych aminy heterocyklicznej PL PL PL PL PL PL PL |
| JP2654339B2 (ja) | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| WO1994028075A1 (en) | 1993-05-26 | 1994-12-08 | Akzo Nobel N.V. | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| EP0882072B2 (en) | 1996-02-22 | 2005-10-26 | Ciba SC Holding AG | Anionic photocatalyst |
| WO1998032756A1 (en) | 1997-01-22 | 1998-07-30 | Ciba Specialty Chemicals Holding Inc. | Substituted aminoalkylidenamino triazines as herbicides |
| AU726375B2 (en) | 1997-02-26 | 2000-11-02 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| CN1128799C (zh) * | 1997-03-18 | 2003-11-26 | 西巴特殊化学品控股有限公司 | 基于α－氨基烯烃的可被光活化的含氮碱 |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| US6489374B1 (en) | 1998-08-21 | 2002-12-03 | Ciba Specialty Chemicals Corporation | Photoactivatable bases containing nitrogen |
| CN1187388C (zh) | 2000-05-26 | 2005-02-02 | 阿克佐诺贝尔股份有限公司 | 光敏涂料组合物 |
-
2002
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 EP EP02782851A patent/EP1436297B1/en not_active Expired - Lifetime
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en not_active Ceased
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2459374A1 (en) | 2003-04-24 |
| EP1436297A1 (en) | 2004-07-14 |
| AU2002346968B2 (en) | 2008-04-10 |
| RU2004115329A (ru) | 2005-10-27 |
| CN1571788B (zh) | 2012-08-01 |
| KR20050034614A (ko) | 2005-04-14 |
| EP1436297B1 (en) | 2007-04-25 |
| KR100938769B1 (ko) | 2010-01-27 |
| DE60219812T2 (de) | 2008-01-24 |
| CN1571788A (zh) | 2005-01-26 |
| RU2332419C2 (ru) | 2008-08-27 |
| DE60219812D1 (de) | 2007-06-06 |
| DE60219812T8 (de) | 2008-05-21 |
| US20040242867A1 (en) | 2004-12-02 |
| WO2003033500A1 (en) | 2003-04-24 |
| MXPA04003564A (es) | 2004-07-23 |
| CA2459374C (en) | 2011-02-08 |
| US8252784B2 (en) | 2012-08-28 |
| JP4454309B2 (ja) | 2010-04-21 |
| JP2005511536A (ja) | 2005-04-28 |
| US7538104B2 (en) | 2009-05-26 |
| ZA200401523B (en) | 2004-12-14 |
| ATE360629T1 (de) | 2007-05-15 |
| WO2003033500B1 (en) | 2003-12-11 |
| US20090076200A1 (en) | 2009-03-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |