KR100938769B1 - 광활성화 가능한 질소 염기 - Google Patents

광활성화 가능한 질소 염기 Download PDF

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Publication number
KR100938769B1
KR100938769B1 KR1020047005628A KR20047005628A KR100938769B1 KR 100938769 B1 KR100938769 B1 KR 100938769B1 KR 1020047005628 A KR1020047005628 A KR 1020047005628A KR 20047005628 A KR20047005628 A KR 20047005628A KR 100938769 B1 KR100938769 B1 KR 100938769B1
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South Korea
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alkyl
formula
radical
substituted
unsubstituted
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Korean (ko)
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KR20050034614A (ko
Inventor
보댕지젤
디틀리커쿠르트
융툰야
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시바 홀딩 인크
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Epoxy Resins (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Indole Compounds (AREA)
KR1020047005628A 2001-10-17 2002-10-08 광활성화 가능한 질소 염기 Expired - Fee Related KR100938769B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
CH20011911/01 2001-10-17

Publications (2)

Publication Number Publication Date
KR20050034614A KR20050034614A (ko) 2005-04-14
KR100938769B1 true KR100938769B1 (ko) 2010-01-27

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KR1020047005628A Expired - Fee Related KR100938769B1 (ko) 2001-10-17 2002-10-08 광활성화 가능한 질소 염기

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Country Link
US (2) US7538104B2 (enExample)
EP (1) EP1436297B1 (enExample)
JP (1) JP4454309B2 (enExample)
KR (1) KR100938769B1 (enExample)
CN (1) CN1571788B (enExample)
AT (1) ATE360629T1 (enExample)
AU (1) AU2002346968B2 (enExample)
BR (1) BR0213354A (enExample)
CA (1) CA2459374C (enExample)
DE (1) DE60219812T8 (enExample)
MX (1) MXPA04003564A (enExample)
RU (1) RU2332419C2 (enExample)
WO (1) WO2003033500A1 (enExample)
ZA (1) ZA200401523B (enExample)

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US20050234208A1 (en) 2004-04-14 2005-10-20 Matthias Koch Fast curing polydiorganosiloxanes
BRPI0513709A (pt) * 2004-07-21 2008-05-13 Ciba Sc Holding Ag processo para a fotoativação e uso de um catalisador por um procedimento de dois estágios invertido
DE602006020839D1 (de) * 2005-02-02 2011-05-05 Basf Se Langwellige verschobene benzotriazol-uv-absorber und deren verwendung
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
WO2008152956A1 (ja) * 2007-06-14 2008-12-18 Sekisui Chemical Co., Ltd. 光硬化型粘接着剤組成物
JP2009126974A (ja) * 2007-11-26 2009-06-11 Three Bond Co Ltd 樹脂組成物
CN101925616A (zh) * 2008-01-28 2010-12-22 巴斯夫欧洲公司 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
US8329771B2 (en) 2008-03-31 2012-12-11 San-Apro Limited Photobase generator
DE102008043218A1 (de) 2008-09-24 2010-04-01 Evonik Goldschmidt Gmbh Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5521999B2 (ja) * 2009-11-26 2014-06-18 住友化学株式会社 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法
JP6151639B2 (ja) 2010-06-30 2017-06-21 スリーエム イノベイティブ プロパティズ カンパニー 硬化性ポリシロキサンコーティング組成物
WO2012003160A1 (en) 2010-06-30 2012-01-05 3M Innovative Properties Company Curable composition comprising dual reactive silane functionality
WO2012003153A1 (en) * 2010-06-30 2012-01-05 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
KR101958343B1 (ko) 2011-12-16 2019-03-15 쓰리본드 화인 케미칼 가부시키가이샤 경화성 수지조성물
WO2013101535A1 (en) * 2011-12-29 2013-07-04 3M Innovative Properties Company Curable polysiloxane compositions and pressure sensitive adhesives made therefrom
EP2797985B1 (en) 2011-12-29 2015-09-23 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
CN105164184A (zh) 2011-12-29 2015-12-16 3M创新有限公司 可固化聚硅氧烷涂料组合物
US9006357B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane composition
US9018322B2 (en) * 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
DE102014202609B4 (de) * 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
US9328274B2 (en) * 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
US9328275B2 (en) 2014-03-07 2016-05-03 Prc Desoto International, Inc. Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions
WO2016066435A1 (de) * 2014-10-29 2016-05-06 Tesa Se Klebemassen mit aktivierbaren gettermaterialien
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
CN107809996A (zh) 2015-04-29 2018-03-16 Bsn医疗有限公司 一氧化氮产生的多步骤方法
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042861A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
CN110036342A (zh) 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
CN111655749B (zh) * 2018-02-02 2023-03-03 巴斯夫欧洲公司 低有机化合物释放的聚氨酯
CN112004851A (zh) * 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
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WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
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JP2001515500A (ja) * 1997-03-18 2001-09-18 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド α−アミノアルケン類に基づく光励起性の窒素含有塩基類

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Also Published As

Publication number Publication date
CA2459374A1 (en) 2003-04-24
US20090076200A1 (en) 2009-03-19
ZA200401523B (en) 2004-12-14
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CN1571788A (zh) 2005-01-26
RU2332419C2 (ru) 2008-08-27
DE60219812D1 (de) 2007-06-06
MXPA04003564A (es) 2004-07-23
JP2005511536A (ja) 2005-04-28
EP1436297A1 (en) 2004-07-14
JP4454309B2 (ja) 2010-04-21
EP1436297B1 (en) 2007-04-25
ATE360629T1 (de) 2007-05-15
BR0213354A (pt) 2004-10-26
US20040242867A1 (en) 2004-12-02
WO2003033500A1 (en) 2003-04-24
CN1571788B (zh) 2012-08-01
DE60219812T2 (de) 2008-01-24
AU2002346968B2 (en) 2008-04-10
US7538104B2 (en) 2009-05-26
DE60219812T8 (de) 2008-05-21
RU2004115329A (ru) 2005-10-27
CA2459374C (en) 2011-02-08
WO2003033500B1 (en) 2003-12-11

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