ATE194872T1 - Fotoerzeugung von aminen aus alpha- aminoacetophenonen - Google Patents

Fotoerzeugung von aminen aus alpha- aminoacetophenonen

Info

Publication number
ATE194872T1
ATE194872T1 AT97810948T AT97810948T ATE194872T1 AT E194872 T1 ATE194872 T1 AT E194872T1 AT 97810948 T AT97810948 T AT 97810948T AT 97810948 T AT97810948 T AT 97810948T AT E194872 T1 ATE194872 T1 AT E194872T1
Authority
AT
Austria
Prior art keywords
formula
radical
phenyl
inter alia
aminoacetophenones
Prior art date
Application number
AT97810948T
Other languages
English (en)
Inventor
Jean-Luc Birbaum
Martin Kunz
Akira Kimura
Hisatoshi Kura
Hidetaka Oka
Hiroko Nakashima
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE194872T1 publication Critical patent/ATE194872T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
AT97810948T 1997-08-22 1997-12-04 Fotoerzeugung von aminen aus alpha- aminoacetophenonen ATE194872T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97810593 1997-08-22

Publications (1)

Publication Number Publication Date
ATE194872T1 true ATE194872T1 (de) 2000-08-15

Family

ID=8230353

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97810948T ATE194872T1 (de) 1997-08-22 1997-12-04 Fotoerzeugung von aminen aus alpha- aminoacetophenonen

Country Status (13)

Country Link
US (1) US6057380A (de)
JP (1) JP3250072B2 (de)
KR (1) KR100264256B1 (de)
CN (1) CN1086399C (de)
AT (1) ATE194872T1 (de)
AU (1) AU750819B2 (de)
BR (1) BR9706264A (de)
CA (1) CA2224441C (de)
DE (1) DE69702605T2 (de)
RU (1) RU2210798C2 (de)
SG (1) SG63787A1 (de)
TW (1) TW436491B (de)
ZA (1) ZA9710985B (de)

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BRPI0717655B1 (pt) * 2006-09-29 2018-12-18 Basf Se bases fotolatentes para sistema à base de isocianatos bloqueados
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US9333786B2 (en) * 2007-07-18 2016-05-10 Datalase, Ltd. Laser-sensitive coating formulations
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TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
JP5697992B2 (ja) * 2008-01-28 2015-04-08 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基
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US9267042B2 (en) 2008-10-27 2016-02-23 Datalase Ltd. Coating composition for marking substrates
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EP2428199A1 (de) 2010-09-09 2012-03-14 3M Innovative Properties Company Härtbare Zusammensetzung, derer Herstellungsverfahren und Verwendung
RU2584165C2 (ru) * 2010-11-12 2016-05-20 Колопласт А/С Новые полимерные фотоинициаторы
KR101958343B1 (ko) 2011-12-16 2019-03-15 쓰리본드 화인 케미칼 가부시키가이샤 경화성 수지조성물
DE102012205951B4 (de) * 2012-04-12 2016-09-01 Chemetall Gmbh Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems
JP5949123B2 (ja) * 2012-05-11 2016-07-06 住友化学株式会社 偏光板
WO2013171888A1 (ja) * 2012-05-17 2013-11-21 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
JP6105858B2 (ja) * 2012-05-17 2017-03-29 太陽インキ製造株式会社 パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板
JP6078535B2 (ja) * 2012-05-17 2017-02-08 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
CN102660190A (zh) * 2012-05-23 2012-09-12 江苏海田技术有限公司 一种uv印铁底油
JP6306296B2 (ja) * 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
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JP2015043793A (ja) * 2013-08-27 2015-03-12 ディーダブルエス エス・アール・エル 人工歯の製造方法
US9718999B2 (en) 2013-12-13 2017-08-01 Cemedine Co., Ltd Photocurable composition having adhesive properties
US10005851B2 (en) * 2014-08-01 2018-06-26 Adeka Corporation Polymerization initiator and radically polymerizable composition containing same
CN104371518A (zh) * 2014-11-13 2015-02-25 青岛厚科信息工程有限公司 一种耐候性好的涂料
CN104371389A (zh) * 2014-11-17 2015-02-25 青岛厚科信息工程有限公司 一种含有新型光引发剂的涂料
CN104449373A (zh) * 2014-11-17 2015-03-25 青岛厚科信息工程有限公司 一种转化形油漆
CN104403563A (zh) * 2014-11-24 2015-03-11 青岛市市南区隆德中医药研究所 一种保光性好的涂料
JP6520134B2 (ja) * 2015-01-16 2019-05-29 セメダイン株式会社 光硬化性組成物
EP3288998A4 (de) * 2015-04-29 2018-09-12 3M Innovative Properties Company Verfahren zur herstellung eines polymernetzwerks aus einem polythiol und polyepoxid
EP3535621A1 (de) 2016-11-03 2019-09-11 3M Innovative Properties Company Zusammensetzungen mit einem fotolatenten amin, camphorquinon und einem coumarin und zugehörige verfahren
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
US11286400B2 (en) 2018-07-12 2022-03-29 Ppg Industries Ohio, Inc. Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN110105799B (zh) * 2019-05-07 2021-10-01 广东华润涂料有限公司 木器用涂料组合物以及由其制成的木制品
WO2024053609A1 (ja) * 2022-09-05 2024-03-14 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置

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DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
EP0138754B1 (de) * 1983-08-15 1988-05-25 Ciba-Geigy Ag Photohärtbare Gemische
DE3880868D1 (en) * 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
DE69324942T2 (de) * 1992-02-14 1999-10-07 Shipley Co., Inc. Strahlungsempfindliche Zusammensetzungen und Verfahren
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
DE10139936B4 (de) * 2001-08-14 2005-04-28 Siemens Ag Verfahren und Anordnung zur Steuerung von Datenpaketen

Also Published As

Publication number Publication date
AU4765897A (en) 1999-03-04
SG63787A1 (en) 1999-03-30
CN1086399C (zh) 2002-06-19
CN1209442A (zh) 1999-03-03
RU2210798C2 (ru) 2003-08-20
US6057380A (en) 2000-05-02
ZA9710985B (en) 1999-02-22
KR19990022661A (ko) 1999-03-25
DE69702605D1 (de) 2000-08-24
DE69702605T2 (de) 2001-03-29
BR9706264A (pt) 1999-07-27
JP3250072B2 (ja) 2002-01-28
AU750819B2 (en) 2002-07-25
CA2224441A1 (en) 1999-02-22
TW436491B (en) 2001-05-28
JPH1171450A (ja) 1999-03-16
KR100264256B1 (ko) 2000-09-01
CA2224441C (en) 2003-01-21

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