DE69702605T2 - Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen - Google Patents

Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen

Info

Publication number
DE69702605T2
DE69702605T2 DE69702605T DE69702605T DE69702605T2 DE 69702605 T2 DE69702605 T2 DE 69702605T2 DE 69702605 T DE69702605 T DE 69702605T DE 69702605 T DE69702605 T DE 69702605T DE 69702605 T2 DE69702605 T2 DE 69702605T2
Authority
DE
Germany
Prior art keywords
formula
radical
amines
alpha
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69702605T
Other languages
English (en)
Other versions
DE69702605D1 (de
Inventor
Jean-Luc Birbaum
Martin Kunz
Akira Kimura
Hisatoshi Kura
Hidetaka Oka
Hiroko Nakashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE69702605D1 publication Critical patent/DE69702605D1/de
Application granted granted Critical
Publication of DE69702605T2 publication Critical patent/DE69702605T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Catalysts (AREA)
DE69702605T 1997-08-22 1997-12-04 Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen Expired - Lifetime DE69702605T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97810593 1997-08-22

Publications (2)

Publication Number Publication Date
DE69702605D1 DE69702605D1 (de) 2000-08-24
DE69702605T2 true DE69702605T2 (de) 2001-03-29

Family

ID=8230353

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69702605T Expired - Lifetime DE69702605T2 (de) 1997-08-22 1997-12-04 Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen

Country Status (13)

Country Link
US (1) US6057380A (de)
JP (1) JP3250072B2 (de)
KR (1) KR100264256B1 (de)
CN (1) CN1086399C (de)
AT (1) ATE194872T1 (de)
AU (1) AU750819B2 (de)
BR (1) BR9706264A (de)
CA (1) CA2224441C (de)
DE (1) DE69702605T2 (de)
RU (1) RU2210798C2 (de)
SG (1) SG63787A1 (de)
TW (1) TW436491B (de)
ZA (1) ZA9710985B (de)

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US7914641B2 (en) * 2005-10-03 2011-03-29 Mitsui Chemicals, Inc. Sealing material for flat panel display
JPWO2007111092A1 (ja) 2006-03-24 2009-08-06 コニカミノルタエムジー株式会社 透明バリア性シートおよび透明バリア性シートの製造方法
JP5254958B2 (ja) * 2006-05-17 2013-08-07 アメリカン・ダイ・ソース・インコーポレーテッド 平版印刷版コーティング用新規材料、それを含有する平版印刷版およびコーティング、調製方法ならびに使用
WO2007146209A2 (en) 2006-06-09 2007-12-21 Dentsply International Inc. Photopolymerizable compositions
JP5345537B2 (ja) * 2006-09-29 2013-11-20 チバ ホールディング インコーポレーテッド ブロックイソシアネートをベースとする系のための光潜在性塩基
JP5339907B2 (ja) * 2007-06-14 2013-11-13 積水化学工業株式会社 光硬化型粘接着剤組成物
CN101755019A (zh) * 2007-07-18 2010-06-23 巴斯夫欧洲公司 涂料组合物
WO2009010405A1 (en) * 2007-07-18 2009-01-22 Basf Se Laser-sensitive coating formulation
TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
WO2009095282A2 (en) * 2008-01-28 2009-08-06 Basf Se Photolatent amidine bases for redox curing of radically curable formulations
RU2011120235A (ru) 2008-10-23 2012-11-27 Дейталейз Лимитед Теплопоглощающие добавки
EP2342295A1 (de) 2008-10-27 2011-07-13 DataLase Ltd Beschichtungszusammensetzung zur kennzeichnung von substraten
KR101637213B1 (ko) 2008-12-02 2016-07-07 와코 쥰야꾸 고교 가부시키가이샤 광염기 발생제
EP2428199A1 (de) 2010-09-09 2012-03-14 3M Innovative Properties Company Härtbare Zusammensetzung, derer Herstellungsverfahren und Verwendung
EP2638076B1 (de) * 2010-11-12 2018-03-28 Coloplast A/S Neue fotoinitiatoren
KR101958343B1 (ko) 2011-12-16 2019-03-15 쓰리본드 화인 케미칼 가부시키가이샤 경화성 수지조성물
DE102012205951B4 (de) * 2012-04-12 2016-09-01 Chemetall Gmbh Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems
JP5949123B2 (ja) * 2012-05-11 2016-07-06 住友化学株式会社 偏光板
JP6105858B2 (ja) * 2012-05-17 2017-03-29 太陽インキ製造株式会社 パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板
KR102073440B1 (ko) * 2012-05-17 2020-02-04 다이요 잉키 세이조 가부시키가이샤 알칼리 현상형의 열경화성 수지 조성물, 프린트 배선판
WO2013171888A1 (ja) * 2012-05-17 2013-11-21 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
CN102660190A (zh) * 2012-05-23 2012-09-12 江苏海田技术有限公司 一种uv印铁底油
JP6306296B2 (ja) * 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
CN105392845B (zh) 2013-07-18 2020-10-20 思美定株式会社 光固化性组合物
JP2015043793A (ja) * 2013-08-27 2015-03-12 ディーダブルエス エス・アール・エル 人工歯の製造方法
EP3081612B1 (de) 2013-12-13 2018-11-14 Cemedine Co., Ltd. Lichthärtbare zusammensetzung mit hafteigenschaften
US10005851B2 (en) * 2014-08-01 2018-06-26 Adeka Corporation Polymerization initiator and radically polymerizable composition containing same
CN104371518A (zh) * 2014-11-13 2015-02-25 青岛厚科信息工程有限公司 一种耐候性好的涂料
CN104371389A (zh) * 2014-11-17 2015-02-25 青岛厚科信息工程有限公司 一种含有新型光引发剂的涂料
CN104449373A (zh) * 2014-11-17 2015-03-25 青岛厚科信息工程有限公司 一种转化形油漆
CN104403563A (zh) * 2014-11-24 2015-03-11 青岛市市南区隆德中医药研究所 一种保光性好的涂料
JP6520134B2 (ja) * 2015-01-16 2019-05-29 セメダイン株式会社 光硬化性組成物
CN107531886B (zh) * 2015-04-29 2020-08-07 3M创新有限公司 由多硫醇和聚环氧化合物制备聚合物网络的方法
CN109952349A (zh) * 2016-11-03 2019-06-28 3M创新有限公司 将密封剂施用到飞机部件的方法
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
US11286400B2 (en) 2018-07-12 2022-03-29 Ppg Industries Ohio, Inc. Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate
EP3856849A1 (de) 2018-09-27 2021-08-04 3M Innovative Properties Company Zusammensetzung mit aminofunktionellen silanen und verfahren zum auftragen eines dichtungsmittels auf ein substrat
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN110105799B (zh) 2019-05-07 2021-10-01 广东华润涂料有限公司 木器用涂料组合物以及由其制成的木制品
WO2024053609A1 (ja) * 2022-09-05 2024-03-14 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置

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DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
EP0138754B1 (de) * 1983-08-15 1988-05-25 Ciba-Geigy Ag Photohärtbare Gemische
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
DE69324942T2 (de) * 1992-02-14 1999-10-07 Shipley Co Strahlungsempfindliche Zusammensetzungen und Verfahren
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
DE10139936B4 (de) * 2001-08-14 2005-04-28 Siemens Ag Verfahren und Anordnung zur Steuerung von Datenpaketen

Also Published As

Publication number Publication date
CN1209442A (zh) 1999-03-03
KR19990022661A (ko) 1999-03-25
DE69702605D1 (de) 2000-08-24
KR100264256B1 (ko) 2000-09-01
AU4765897A (en) 1999-03-04
US6057380A (en) 2000-05-02
JP3250072B2 (ja) 2002-01-28
ATE194872T1 (de) 2000-08-15
TW436491B (en) 2001-05-28
RU2210798C2 (ru) 2003-08-20
CA2224441A1 (en) 1999-02-22
ZA9710985B (en) 1999-02-22
CA2224441C (en) 2003-01-21
CN1086399C (zh) 2002-06-19
SG63787A1 (en) 1999-03-30
JPH1171450A (ja) 1999-03-16
BR9706264A (pt) 1999-07-27
AU750819B2 (en) 2002-07-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC