JP2001153854A - 不純物濃度モニター方法およびシステム - Google Patents
不純物濃度モニター方法およびシステムInfo
- Publication number
- JP2001153854A JP2001153854A JP33818799A JP33818799A JP2001153854A JP 2001153854 A JP2001153854 A JP 2001153854A JP 33818799 A JP33818799 A JP 33818799A JP 33818799 A JP33818799 A JP 33818799A JP 2001153854 A JP2001153854 A JP 2001153854A
- Authority
- JP
- Japan
- Prior art keywords
- impurity concentration
- fluid
- impurity
- concentration
- measured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012535 impurity Substances 0.000 title claims abstract description 99
- 238000000034 method Methods 0.000 title claims abstract description 54
- 238000012544 monitoring process Methods 0.000 title claims abstract description 39
- 239000012530 fluid Substances 0.000 claims abstract description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 47
- 239000012528 membrane Substances 0.000 claims abstract description 39
- 239000003480 eluent Substances 0.000 claims abstract description 17
- 125000000524 functional group Chemical group 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 238000005259 measurement Methods 0.000 claims description 21
- 150000001450 anions Chemical class 0.000 claims description 16
- 238000005342 ion exchange Methods 0.000 claims description 14
- 238000005349 anion exchange Methods 0.000 claims description 5
- 238000005341 cation exchange Methods 0.000 claims description 4
- 239000003814 drug Substances 0.000 claims 1
- 229940079593 drug Drugs 0.000 claims 1
- 239000012498 ultrapure water Substances 0.000 abstract description 31
- 229910021642 ultra pure water Inorganic materials 0.000 abstract description 30
- 238000004140 cleaning Methods 0.000 description 16
- 239000000523 sample Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 9
- 238000010828 elution Methods 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 238000001179 sorption measurement Methods 0.000 description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 238000005070 sampling Methods 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 239000013522 chelant Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000011002 quantification Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012510 hollow fiber Substances 0.000 description 2
- 238000004255 ion exchange chromatography Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 238000004454 trace mineral analysis Methods 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical group OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- -1 oxoacid ions Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
- Automatic Analysis And Handling Materials Therefor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33818799A JP2001153854A (ja) | 1999-11-29 | 1999-11-29 | 不純物濃度モニター方法およびシステム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33818799A JP2001153854A (ja) | 1999-11-29 | 1999-11-29 | 不純物濃度モニター方法およびシステム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001153854A true JP2001153854A (ja) | 2001-06-08 |
| JP2001153854A5 JP2001153854A5 (enExample) | 2006-09-21 |
Family
ID=18315753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33818799A Pending JP2001153854A (ja) | 1999-11-29 | 1999-11-29 | 不純物濃度モニター方法およびシステム |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001153854A (enExample) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003004600A (ja) * | 2001-06-15 | 2003-01-08 | Santoku Kagaku Kogyo Kk | 微量分析用液体サンプリング装置および微量分析用液体試料のサンプリング方法、分析機器への導入方法 |
| JP2006064591A (ja) * | 2004-08-27 | 2006-03-09 | Nomura Micro Sci Co Ltd | 水中成分定量用サンプリング装置、およびサンプリング方法 |
| JP2006276005A (ja) * | 2005-02-22 | 2006-10-12 | Asml Netherlands Bv | 流体濾過方法、それによって濾過された流体、リソグラフィ装置、及び素子製造方法 |
| WO2009011952A1 (en) * | 2007-04-23 | 2009-01-22 | Advanced Liquid Logic, Inc. | Device and method for sample collection and concentration |
| JP2015040733A (ja) * | 2013-08-21 | 2015-03-02 | 株式会社日立ハイテクノロジーズ | フローセル固定装置及び核酸分析装置 |
| WO2019221186A1 (ja) * | 2018-05-17 | 2019-11-21 | オルガノ株式会社 | 金属不純物含有量の分析方法及び金属不純物含有量の分析キット |
| WO2020080461A1 (ja) * | 2018-10-17 | 2020-04-23 | オルガノ株式会社 | 水質管理方法、イオン吸着装置、情報処理装置および情報処理システム |
| JP2020134434A (ja) * | 2019-02-25 | 2020-08-31 | オルガノ株式会社 | 超純水中の有機物評価方法、および超純水製造システムにおける有機物特定方法 |
| WO2022102326A1 (ja) * | 2020-11-12 | 2022-05-19 | オルガノ株式会社 | 金属不純物含有量の分析方法 |
| WO2022168571A1 (ja) * | 2021-02-05 | 2022-08-11 | オルガノ株式会社 | 不純物取得システム、水質検査システムおよび液体製造供給システム |
| KR20250048366A (ko) | 2022-08-17 | 2025-04-08 | 오르가노 가부시키가이샤 | 불순물 취득 시스템, 품질 검사 시스템 및 액체 제조 공급 시스템 |
-
1999
- 1999-11-29 JP JP33818799A patent/JP2001153854A/ja active Pending
Cited By (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003004600A (ja) * | 2001-06-15 | 2003-01-08 | Santoku Kagaku Kogyo Kk | 微量分析用液体サンプリング装置および微量分析用液体試料のサンプリング方法、分析機器への導入方法 |
| JP2006064591A (ja) * | 2004-08-27 | 2006-03-09 | Nomura Micro Sci Co Ltd | 水中成分定量用サンプリング装置、およびサンプリング方法 |
| JP2006276005A (ja) * | 2005-02-22 | 2006-10-12 | Asml Netherlands Bv | 流体濾過方法、それによって濾過された流体、リソグラフィ装置、及び素子製造方法 |
| WO2009011952A1 (en) * | 2007-04-23 | 2009-01-22 | Advanced Liquid Logic, Inc. | Device and method for sample collection and concentration |
| JP2015040733A (ja) * | 2013-08-21 | 2015-03-02 | 株式会社日立ハイテクノロジーズ | フローセル固定装置及び核酸分析装置 |
| US12025603B2 (en) | 2018-05-17 | 2024-07-02 | Organo Corporation | Method for analyzing metal impurity content and kit for analyzing metal impurity content |
| JP7196165B2 (ja) | 2018-05-17 | 2022-12-26 | オルガノ株式会社 | 金属不純物含有量の分析方法及び金属不純物含有量の分析キット |
| WO2019221186A1 (ja) * | 2018-05-17 | 2019-11-21 | オルガノ株式会社 | 金属不純物含有量の分析方法及び金属不純物含有量の分析キット |
| TWI794494B (zh) * | 2018-05-17 | 2023-03-01 | 日商奧璐佳瑙股份有限公司 | 金屬不純物含有量之分析方法及分析對象水用之分析套件 |
| KR20200119297A (ko) * | 2018-05-17 | 2020-10-19 | 오르가노 코포레이션 | 금속 불순물 함유량의 분석방법 및 금속 불순물 함유량의 분석 키트 |
| CN111868516A (zh) * | 2018-05-17 | 2020-10-30 | 奥加诺株式会社 | 金属杂质含量的分析方法以及金属杂质含量的分析试剂盒 |
| KR102483138B1 (ko) * | 2018-05-17 | 2022-12-30 | 오르가노 코포레이션 | 금속 불순물 함유량의 분석방법 및 금속 불순물 함유량의 분석 키트 |
| JPWO2019221186A1 (ja) * | 2018-05-17 | 2021-05-27 | オルガノ株式会社 | 金属不純物含有量の分析方法及び金属不純物含有量の分析キット |
| KR20240023199A (ko) * | 2018-10-17 | 2024-02-20 | 오르가노 코포레이션 | 수질관리방법, 이온흡착장치, 정보처리장치 및 정보처리시스템 |
| WO2020080461A1 (ja) * | 2018-10-17 | 2020-04-23 | オルガノ株式会社 | 水質管理方法、イオン吸着装置、情報処理装置および情報処理システム |
| US12275652B2 (en) | 2018-10-17 | 2025-04-15 | Organo Corporation | Water quality management method, ion adsorption device, information processing device and information processing system |
| KR102782289B1 (ko) * | 2018-10-17 | 2025-03-17 | 오르가노 코포레이션 | 수질관리방법, 이온흡착장치, 정보처리장치 및 정보처리시스템 |
| KR102764080B1 (ko) * | 2018-10-17 | 2025-02-07 | 오르가노 코포레이션 | 수질관리방법, 이온흡착장치, 정보처리장치 및 정보처리시스템 |
| KR20210072055A (ko) | 2018-10-17 | 2021-06-16 | 오르가노 코포레이션 | 수질관리방법, 이온흡착장치, 정보처리장치 및 정보처리시스템 |
| CN112789502A (zh) * | 2018-10-17 | 2021-05-11 | 奥加诺株式会社 | 水质管理方法、离子吸附装置、信息处理装置以及信息处理系统 |
| JP6754512B1 (ja) * | 2018-10-17 | 2020-09-09 | オルガノ株式会社 | 水質管理方法、イオン吸着装置、情報処理装置および情報処理システム |
| KR20240023198A (ko) * | 2018-10-17 | 2024-02-20 | 오르가노 코포레이션 | 수질관리방법, 이온흡착장치, 정보처리장치 및 정보처리시스템 |
| JP2020134434A (ja) * | 2019-02-25 | 2020-08-31 | オルガノ株式会社 | 超純水中の有機物評価方法、および超純水製造システムにおける有機物特定方法 |
| JP7195177B2 (ja) | 2019-02-25 | 2022-12-23 | オルガノ株式会社 | 超純水中の有機物評価方法、および超純水製造システムにおける有機物特定方法 |
| KR20230104263A (ko) | 2020-11-12 | 2023-07-07 | 오르가노 코포레이션 | 금속 불순물 함유량의 분석 방법 |
| WO2022102326A1 (ja) * | 2020-11-12 | 2022-05-19 | オルガノ株式会社 | 金属不純物含有量の分析方法 |
| KR20230136200A (ko) | 2021-02-05 | 2023-09-26 | 오르가노 코포레이션 | 불순물 취득 시스템, 수질 검사 시스템 및 액체 제조 공급 시스템 |
| US20240101448A1 (en) * | 2021-02-05 | 2024-03-28 | Organo Corporation | Impurity acquisition system, water quality testing system, and liquid production and supply system |
| JP7635009B2 (ja) | 2021-02-05 | 2025-02-25 | オルガノ株式会社 | 不純物取得システム、水質検査システムおよび液体製造供給システム |
| JP2022120536A (ja) * | 2021-02-05 | 2022-08-18 | オルガノ株式会社 | 不純物取得システム、水質検査システムおよび液体製造供給システム |
| WO2022168571A1 (ja) * | 2021-02-05 | 2022-08-11 | オルガノ株式会社 | 不純物取得システム、水質検査システムおよび液体製造供給システム |
| KR20250048366A (ko) | 2022-08-17 | 2025-04-08 | 오르가노 가부시키가이샤 | 불순물 취득 시스템, 품질 검사 시스템 및 액체 제조 공급 시스템 |
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