FI84942B - Foerfarande foer framstaellning av en vaermestabil, positiv eller negativ bild pao ytan av ett substrat. - Google Patents
Foerfarande foer framstaellning av en vaermestabil, positiv eller negativ bild pao ytan av ett substrat. Download PDFInfo
- Publication number
- FI84942B FI84942B FI852190A FI852190A FI84942B FI 84942 B FI84942 B FI 84942B FI 852190 A FI852190 A FI 852190A FI 852190 A FI852190 A FI 852190A FI 84942 B FI84942 B FI 84942B
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- FI
- Finland
- Prior art keywords
- image
- film
- weight
- acid
- resin
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Paints Or Removers (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cosmetics (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Paper (AREA)
- Materials For Medical Uses (AREA)
- Dental Preparations (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Claims (11)
1. Förfarande för framställning av en värmestabil, positiv eller negativ bild pä ytan av ett substrat, kännetecknat av att förfarandet innefattar: (a) framställning av en ljuskänslig beläggningskomposition, vilken komposition innehäller ett aminoplastharts och en reaktiv vätehaltig förening eller ett fenoplastharts och en latent formaldehyd genererande förening som syrahärdande hartssystem, och naftokinondiazidsufonsyraester eller en därur härledd polymer som fotosyragenerator, lösta i ett lämpligt lösningsmedel; (b) beläggning av en substratyta med beläggningskompositio-nen; (c) torkning av den belagda substratytan för bildande av en beröringstorr ljuskänslig film pä substratytan; 51 84942 (d) ästadkommande av en sur latent bild i filmen genom att exponera filmen för ljuskemisk besträlning; och (e) antingen (i) bildande av ett bildnegativ pä substratytan genom upp-hettning av filmens sura latenta bild till mellan 70-120eC, äterexponering filmen för ljuskemisk besträlning och fram-kallning av filmen med en vattenbaserad lösning; eller (il) bildande av en positiv bild pä substratytan genom av-lägsning av den sura latenta bilden i filmen medelst en vattenhaltig lösning och äterlämnande av den resterande filmen pä substratytan, äterexponering av den resterande filmen för ljuskemisk besträlning för bildning av en andra sur latent bild i en äterstäende filmen, och upphettning av den andra sura latenta bilden i den äterstäende filmen tili mellan 70-120°C.
2. Förfarande enligt patentkravet 1, kännetecknat av att aminoplasthartset innefattar ett eller flera av melamin-, bensoguanamin- och ureahartser.
3. Förfarande enligt patentkravet 1 eller 2, kännetecknat av att den reaktiva vätehaltiga föreningen innefattar ett alkalilösligt harts, väri detta alkalilösliga harts är ett eller flera av följande: fenolnovolak, kresolnovolak, poly-glutarimid, polyvinylfenol och en kopolymer av (met)akryl-syra och styren bildad ur ätminstone 15 vikt-% (met)akryl-syra.
4. Förfarande enligt patentkravet 1, kännetecknat av att det syrahärdande hartssystemet innefattar novolakharts och en förening, som latent genererar formaldehyd.
5. Förfarande enligt patentkravet 4, kännetecknat av att den latent formaldehyd genererande föreningen innefattar 2-hydroxietyloxazolidin och/eller oxazolidinyletylmetak-rylat. 52 84942
6. Förfarande enligt nägot av patentkraven 1-3, känneteck-nat av att den ljuskänsliga beläggningskompositionen in-nefattar 3-50 vlktdelar av nämnda aminoplastharts, 90-40 viktdelar av nämnda reaktiva vätehaltiga förening och 2- 30 viktdelar av nämnda fotosyragenerator.
7. Förfarande enligt patentkravet 1, kännetecknat av att nämnda syrahärdande hartssystem innefattar fenoplastharts samt en formaldehyd genererande förening och att nämnda fenoplastharts är närvarande i den ljuskänsliga beläggningskompositionen i en mängd av 50-95 viktdelar, nämnda formaldehyd genererande förening är närvarande i en mängd av 40- 3 viktdelar och nämnda fotosyragenerator är närvarande i en mängd av 2-30 viktdelar.
8. Förfarande enligt nägot av patentkraven 1-5, kännetecknat av att den ljuskänsliga beläggningskompositionen innefattar 20-30 vikt-% av nämnda fotosyragenerator och 80-75 vikt-% av nämnda syrahärdande hartssystem, räknat pä kom-positionens totalhalt av fastämnen.
9. Förfarande enligt patentkravet 1, kännetecknat av att beläggningskompositionen är ett i lämpligt lösningsmedel löst novolakharts som fotoresist och en naftokinondiazid säsom ljussyragenerator och att denna komposition innehäl-ler 5-50 viktdelar syrahärdande aminoplast och formaldehyd genererande förening, varvid dessa viktdelar är baserade pä 100 delar novolakharts.
10. Förfarande enligt nägot av patentkraven 1-9, kännetecknat av att skärpan av den formade bilden är cirka 0,7 mikrometer.
11. Förfarande enligt nägot av patentkraven 1-10, för bildande av en värmestabil, positiv eller negativ skiktbild pä substratytan, kännetecknat av att en positiv eller negativ bild ästadkommes pä ytan av ett substrat och att förfa-randet upprepas för ästadkommande av en skiktbild.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US61651884A | 1984-06-01 | 1984-06-01 | |
US61651884 | 1984-06-01 |
Publications (4)
Publication Number | Publication Date |
---|---|
FI852190A0 FI852190A0 (fi) | 1985-05-31 |
FI852190L FI852190L (fi) | 1985-12-02 |
FI84942B true FI84942B (fi) | 1991-10-31 |
FI84942C FI84942C (sv) | 1992-02-10 |
Family
ID=24469821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI852190A FI84942C (sv) | 1984-06-01 | 1985-05-31 | Förfarande för framställning av en värmestabil, positiv eller negativ bild på ytan av ett substrat |
Country Status (18)
Country | Link |
---|---|
EP (1) | EP0164248B1 (sv) |
JP (1) | JPS60263143A (sv) |
KR (1) | KR920005773B1 (sv) |
AT (1) | ATE68272T1 (sv) |
AU (1) | AU595160B2 (sv) |
BR (1) | BR8502638A (sv) |
CA (1) | CA1283799C (sv) |
DE (1) | DE3584316D1 (sv) |
DK (1) | DK241885A (sv) |
FI (1) | FI84942C (sv) |
HK (1) | HK17492A (sv) |
IE (1) | IE57143B1 (sv) |
IL (1) | IL75373A (sv) |
MX (1) | MX170270B (sv) |
MY (1) | MY103545A (sv) |
NO (1) | NO173574C (sv) |
SG (1) | SG108091G (sv) |
ZA (1) | ZA854172B (sv) |
Families Citing this family (136)
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DE3582697D1 (de) * | 1984-06-07 | 1991-06-06 | Hoechst Ag | Positiv arbeitende strahlungsempfindliche beschichtungsloesung. |
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-
1985
- 1985-05-30 DK DK241885A patent/DK241885A/da not_active Application Discontinuation
- 1985-05-30 MX MX205451A patent/MX170270B/es unknown
- 1985-05-30 AT AT85303807T patent/ATE68272T1/de not_active IP Right Cessation
- 1985-05-30 NO NO852154A patent/NO173574C/no unknown
- 1985-05-30 DE DE8585303807T patent/DE3584316D1/de not_active Revoked
- 1985-05-30 IE IE1350/85A patent/IE57143B1/en not_active IP Right Cessation
- 1985-05-30 EP EP85303807A patent/EP0164248B1/en not_active Revoked
- 1985-05-31 BR BR8502638A patent/BR8502638A/pt not_active IP Right Cessation
- 1985-05-31 FI FI852190A patent/FI84942C/sv not_active IP Right Cessation
- 1985-05-31 CA CA000482900A patent/CA1283799C/en not_active Expired - Fee Related
- 1985-05-31 IL IL75373A patent/IL75373A/xx unknown
- 1985-05-31 KR KR1019850003801A patent/KR920005773B1/ko not_active IP Right Cessation
- 1985-06-01 JP JP60117715A patent/JPS60263143A/ja active Pending
- 1985-06-03 AU AU43251/85A patent/AU595160B2/en not_active Ceased
- 1985-06-03 ZA ZA854172A patent/ZA854172B/xx unknown
-
1988
- 1988-07-28 MY MYPI88000853A patent/MY103545A/en unknown
-
1991
- 1991-12-24 SG SG1080/91A patent/SG108091G/en unknown
-
1992
- 1992-03-05 HK HK174/92A patent/HK17492A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
BR8502638A (pt) | 1986-02-12 |
IE851350L (en) | 1985-12-01 |
ATE68272T1 (de) | 1991-10-15 |
HK17492A (en) | 1992-03-13 |
MX170270B (es) | 1993-08-11 |
AU595160B2 (en) | 1990-03-29 |
IL75373A0 (en) | 1985-09-29 |
DK241885D0 (da) | 1985-05-30 |
EP0164248A2 (en) | 1985-12-11 |
DE3584316D1 (de) | 1991-11-14 |
IL75373A (en) | 1990-06-10 |
CA1283799C (en) | 1991-05-07 |
ZA854172B (en) | 1986-07-30 |
FI852190L (fi) | 1985-12-02 |
IE57143B1 (en) | 1992-05-06 |
FI84942C (sv) | 1992-02-10 |
FI852190A0 (fi) | 1985-05-31 |
NO173574B (no) | 1993-09-20 |
EP0164248A3 (en) | 1987-06-03 |
AU4325185A (en) | 1985-12-05 |
KR920005773B1 (ko) | 1992-07-18 |
SG108091G (en) | 1992-04-16 |
DK241885A (da) | 1985-12-02 |
EP0164248B1 (en) | 1991-10-09 |
NO852154L (no) | 1985-12-02 |
JPS60263143A (ja) | 1985-12-26 |
NO173574C (no) | 1993-12-29 |
MY103545A (en) | 1993-07-31 |
KR860000330A (ko) | 1986-01-28 |
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