ES8100356A1 - Procedimiento e instalacion para depositar en continuo sobre la superficie de un sustrato llevado a alta temperatura una capa de una materia solida - Google Patents

Procedimiento e instalacion para depositar en continuo sobre la superficie de un sustrato llevado a alta temperatura una capa de una materia solida

Info

Publication number
ES8100356A1
ES8100356A1 ES488517A ES488517A ES8100356A1 ES 8100356 A1 ES8100356 A1 ES 8100356A1 ES 488517 A ES488517 A ES 488517A ES 488517 A ES488517 A ES 488517A ES 8100356 A1 ES8100356 A1 ES 8100356A1
Authority
ES
Spain
Prior art keywords
gaseous
reactant
substrate
layer
high temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES488517A
Other languages
English (en)
Spanish (es)
Other versions
ES488517A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societa Italiana Vetro SIV SpA
Original Assignee
Societa Italiana Vetro SIV SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Societa Italiana Vetro SIV SpA filed Critical Societa Italiana Vetro SIV SpA
Publication of ES488517A0 publication Critical patent/ES488517A0/es
Publication of ES8100356A1 publication Critical patent/ES8100356A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/241—Doped oxides with halides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/244—Doped oxides with Sb
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
ES488517A 1979-02-14 1980-02-13 Procedimiento e instalacion para depositar en continuo sobre la superficie de un sustrato llevado a alta temperatura una capa de una materia solida Expired ES8100356A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH141279A CH628600A5 (fr) 1979-02-14 1979-02-14 Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.

Publications (2)

Publication Number Publication Date
ES488517A0 ES488517A0 (es) 1980-11-01
ES8100356A1 true ES8100356A1 (es) 1980-11-01

Family

ID=4209839

Family Applications (1)

Application Number Title Priority Date Filing Date
ES488517A Expired ES8100356A1 (es) 1979-02-14 1980-02-13 Procedimiento e instalacion para depositar en continuo sobre la superficie de un sustrato llevado a alta temperatura una capa de una materia solida

Country Status (22)

Country Link
US (2) US4294868A (US07714131-20100511-C00001.png)
JP (1) JPS55130842A (US07714131-20100511-C00001.png)
KR (1) KR830002475B1 (US07714131-20100511-C00001.png)
AU (1) AU538579B2 (US07714131-20100511-C00001.png)
BE (1) BE881708A (US07714131-20100511-C00001.png)
BR (1) BR8000891A (US07714131-20100511-C00001.png)
CA (1) CA1136007A (US07714131-20100511-C00001.png)
CH (1) CH628600A5 (US07714131-20100511-C00001.png)
CS (1) CS274254B2 (US07714131-20100511-C00001.png)
DD (1) DD149058A5 (US07714131-20100511-C00001.png)
DE (1) DE3005797C2 (US07714131-20100511-C00001.png)
ES (1) ES8100356A1 (US07714131-20100511-C00001.png)
FR (1) FR2448943A1 (US07714131-20100511-C00001.png)
GB (1) GB2044137B (US07714131-20100511-C00001.png)
IT (1) IT1140560B (US07714131-20100511-C00001.png)
MX (1) MX154318A (US07714131-20100511-C00001.png)
NL (1) NL179043C (US07714131-20100511-C00001.png)
PL (1) PL126146B1 (US07714131-20100511-C00001.png)
SE (1) SE446091B (US07714131-20100511-C00001.png)
SU (1) SU1371499A3 (US07714131-20100511-C00001.png)
TR (1) TR20840A (US07714131-20100511-C00001.png)
ZA (1) ZA80824B (US07714131-20100511-C00001.png)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1134153B (it) * 1979-11-21 1986-07-31 Siv Soc Italiana Vetro Ugello per depositare in continuo su un substrato uno strato di una materia solida
CA1172918A (en) * 1980-02-15 1984-08-21 William E. Hofmann Process for making glass surfaces abrasion-resistant and article produced thereby
BE889217A (fr) * 1980-06-19 1981-12-15 Bfg Glassgroup Procede et dispositif de formation d'un revetement uniforme a plusieurs constituants
CH643469A5 (fr) * 1981-12-22 1984-06-15 Siv Soc Italiana Vetro Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide.
US4451000A (en) * 1982-06-11 1984-05-29 Hollis Engineering, Inc. Soldering apparatus exhaust system
US4477494A (en) * 1982-07-12 1984-10-16 Glass Containers Corporation Process for forming rust resistant tin oxide coatings on glass containers
US4524718A (en) * 1982-11-22 1985-06-25 Gordon Roy G Reactor for continuous coating of glass
GB2139612B (en) * 1983-05-13 1987-03-11 Glaverbel Coating a hot vitreous substrate
EP0173715B1 (en) * 1984-02-13 1992-04-22 SCHMITT, Jerome J. III Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
US4928627A (en) * 1985-12-23 1990-05-29 Atochem North America, Inc. Apparatus for coating a substrate
US5122394A (en) * 1985-12-23 1992-06-16 Atochem North America, Inc. Apparatus for coating a substrate
JPH0645881B2 (ja) * 1986-03-28 1994-06-15 日本鋼管株式会社 連続処理ラインにおける鋼板の浸珪処理方法
JPS63139033A (ja) * 1986-11-28 1988-06-10 Nec Corp プラズマディスプレイ用透明導電膜の製造方法
DE3869793D1 (de) * 1987-01-27 1992-05-14 Asahi Glass Co Ltd Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.
GB2209176A (en) * 1987-08-28 1989-05-04 Pilkington Plc Coating glass
US4853257A (en) * 1987-09-30 1989-08-01 Ppg Industries, Inc. Chemical vapor deposition of tin oxide on float glass in the tin bath
US5136975A (en) * 1990-06-21 1992-08-11 Watkins-Johnson Company Injector and method for delivering gaseous chemicals to a surface
GB9300400D0 (en) * 1993-01-11 1993-03-03 Glaverbel A device and method for forming a coating by pyrolysis
US5453383A (en) * 1994-06-14 1995-09-26 General Mills, Inc. Method of applying sugar coating by using steam assisted discharge nozzle
US5534314A (en) * 1994-08-31 1996-07-09 University Of Virginia Patent Foundation Directed vapor deposition of electron beam evaporant
FR2724923B1 (fr) * 1994-09-27 1996-12-20 Saint Gobain Vitrage Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s)
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
GB2302101B (en) * 1995-06-09 1999-03-10 Glaverbel A glazing panel having solar screening properties
GB2302102B (en) * 1995-06-09 1999-03-10 Glaverbel A glazing panel having solar screening properties and a process for making such a panel
US6231971B1 (en) * 1995-06-09 2001-05-15 Glaverbel Glazing panel having solar screening properties
CA2178032A1 (en) * 1995-06-09 1996-12-10 Robert Terneu Glazing panel having solar screening properties
GB9515198D0 (en) * 1995-07-25 1995-09-20 Pilkington Plc A method of coating glass
MY129739A (en) * 1996-01-09 2007-04-30 Nippon Sheet Glass Co Ltd Coated glass for buildings
US5698262A (en) 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
GB9616983D0 (en) * 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
US6238738B1 (en) 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US7096692B2 (en) 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US6103015A (en) * 1998-01-19 2000-08-15 Libbey-Owens-Ford Co. Symmetrical CVD coater with lower upstream exhaust toe
US5904958A (en) * 1998-03-20 1999-05-18 Rexam Industries Corp. Adjustable nozzle for evaporation or organic monomers
US6268019B1 (en) * 1998-06-04 2001-07-31 Atofina Chemicals, Inc. Preparation of fluorine modified, low haze, titanium dioxide films
DE19923591A1 (de) * 1999-05-21 2000-11-23 Fleissner Maschf Gmbh Co Vorrichtung mit einem Düsenbalken zur Erzeugung von Flüssigkeitsstrahlen zur Strahlbeaufschlagung der Fasern einer Warenbahn
GB9913315D0 (en) 1999-06-08 1999-08-11 Pilkington Plc Improved process for coating glass
DE10046557B4 (de) * 2000-09-19 2006-07-27 Datron-Electronic Gmbh Vorrichtung zum dosierten Ausbringen eines aus mehreren unterschiedlich viskosen Medien bestehenden Materialstranges mittels Koextrusion und mehrfunktionale Kombinationsdichtung
JP4124046B2 (ja) * 2003-07-10 2008-07-23 株式会社大阪チタニウムテクノロジーズ 金属酸化物被膜の成膜方法および蒸着装置
KR101309334B1 (ko) * 2004-08-02 2013-09-16 비코 인스트루먼츠 인코포레이티드 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터
US8398770B2 (en) * 2007-09-26 2013-03-19 Eastman Kodak Company Deposition system for thin film formation
US8709160B2 (en) * 2008-08-22 2014-04-29 United Technologies Corporation Deposition apparatus having thermal hood
US8404047B2 (en) * 2008-09-16 2013-03-26 United Technologies Corporation Electron beam vapor deposition apparatus and method
US8343591B2 (en) * 2008-10-24 2013-01-01 United Technologies Corporation Method for use with a coating process
US20100104773A1 (en) * 2008-10-24 2010-04-29 Neal James W Method for use in a coating process
US20100189929A1 (en) * 2009-01-28 2010-07-29 Neal James W Coating device and deposition apparatus
US20100247809A1 (en) * 2009-03-31 2010-09-30 Neal James W Electron beam vapor deposition apparatus for depositing multi-layer coating
TR201903701T4 (tr) * 2011-03-23 2019-04-22 Pilkington Group Ltd İnce film kaplamaların çöktürülmesi için düzenek ve bu düzeneğin kullanılması için çöktürme usulü.
GB201114242D0 (en) 2011-08-18 2011-10-05 Pilkington Group Ltd Tantalum oxide coatings
GB2510615A (en) * 2013-02-08 2014-08-13 Glyndwr University Gas blade injection system
US10704144B2 (en) 2015-10-12 2020-07-07 Universal Display Corporation Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient
DK3430183T3 (da) * 2016-03-18 2022-03-07 Basf Se Metaldoteret tinoxid til anvendelser inden for elektrokatalyse
JP6529628B2 (ja) * 2018-04-17 2019-06-12 東芝三菱電機産業システム株式会社 成膜装置
JPWO2023139925A1 (US07714131-20100511-C00001.png) * 2022-01-19 2023-07-27

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1307216A (en) * 1969-04-23 1973-02-14 Pilkington Brothers Ltd Treating glass
US3814327A (en) * 1971-04-06 1974-06-04 Gen Electric Nozzle for chemical reaction processes
CH544156A (de) * 1971-04-16 1973-11-15 Bbc Brown Boveri & Cie Verfahren zur Herstellung von oxydischen Halbleiterschichten und Vorrichtung zur Durchführung des Verfahrens
DE2121319A1 (de) * 1971-04-30 1973-01-18 Rocholl Martin Ggottfried Dipl Verfahren zum beschichten von glasscheiben mit einem optisch transparenten flaechenheizleiter
US3951100A (en) * 1972-12-15 1976-04-20 Ppg Industries, Inc. Chemical vapor deposition of coatings
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
FR2210675B1 (US07714131-20100511-C00001.png) * 1972-12-15 1978-05-12 Ppg Industries Inc
DD109033A1 (US07714131-20100511-C00001.png) * 1973-12-11 1974-10-12

Also Published As

Publication number Publication date
GB2044137A (en) 1980-10-15
AU538579B2 (en) 1984-08-23
PL221965A1 (US07714131-20100511-C00001.png) 1980-11-17
US4351267A (en) 1982-09-28
SE446091B (sv) 1986-08-11
ES488517A0 (es) 1980-11-01
CH628600A5 (fr) 1982-03-15
FR2448943A1 (fr) 1980-09-12
AU5513980A (en) 1980-08-21
KR830001668A (ko) 1983-05-18
CS274254B2 (en) 1991-04-11
JPS6133904B2 (US07714131-20100511-C00001.png) 1986-08-05
IT1140560B (it) 1986-10-01
GB2044137B (en) 1983-08-03
JPS55130842A (en) 1980-10-11
TR20840A (tr) 1982-10-19
DD149058A5 (de) 1981-06-24
NL8000897A (nl) 1980-08-18
SE8001131L (sv) 1980-08-15
PL126146B1 (en) 1983-07-30
IT8019855A0 (it) 1980-02-12
DE3005797C2 (de) 1984-10-31
CA1136007A (en) 1982-11-23
CS98280A2 (en) 1990-09-12
KR830002475B1 (ko) 1983-10-26
DE3005797A1 (de) 1980-08-28
ZA80824B (en) 1981-02-25
BR8000891A (pt) 1980-10-21
BE881708A (fr) 1980-05-30
NL179043C (nl) 1986-07-01
SU1371499A3 (ru) 1988-01-30
MX154318A (es) 1987-07-08
FR2448943B1 (US07714131-20100511-C00001.png) 1982-12-03
US4294868A (en) 1981-10-13

Similar Documents

Publication Publication Date Title
ES8100356A1 (es) Procedimiento e instalacion para depositar en continuo sobre la superficie de un sustrato llevado a alta temperatura una capa de una materia solida
EP0363437A4 (en) Heating system for reaction chamber of chemical vapor deposition equipment
GB1470614A (en) Process for deposition of polycrystalline silicon
JPS57167631A (en) Plasma vapor-phase growing method
FR2592031A1 (fr) Procede et dispositif pour former un revetement sur du verre
GB1236913A (en) Manufacture of silicon carbide
AU582976B2 (en) Plant for cooling by spraying means
JPS6450429A (en) Formation of insulating film
ES8404298A1 (es) Procedimiento para el revestimiento de hojas o cintas vitreas.
KR960034479A (ko) 산화물박막의 제조방법 및 그것에 사용되는 화학증착장치
JPS5766625A (en) Manufacture of film
US4651673A (en) CVD apparatus
EP0164132A3 (de) Vakuumaufdampfeinrichtung
ES461297A1 (es) Un metodo de formacion de un articulo de nitruro de silicio.
GB1498925A (en) Method of manufacturing semiconductor devices in which a layer of semiconductor material is provided on a substrate apparatus for use in carrying out said method and semiconductor devices thus manufactured
ES8205899A1 (es) Un aparato perfeccionado para tratar un substrato relativamente movil y un metodo de modificar la apariencia superficialvisual de dicho substrato.
JPS5260570A (en) Vapor phase growing device
JPS5677375A (en) Plasma vapor deposition apparatus
JPS54106100A (en) Vapor phase chemically depositing method for silicon carbide
JPS6439370A (en) Thin film forming device
JPS6484717A (en) Semiconductor thin film vapor growth apparatus
DE3661262D1 (en) Method for producing an aerosol jet
JPS6441211A (en) Semiconductor growth device
JPS57111211A (en) Preparation of polycrystalline znse bulk
JPS5713738A (en) Vapor-phase growing apparatus

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19970519