DE3869793D1 - Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase. - Google Patents
Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.Info
- Publication number
- DE3869793D1 DE3869793D1 DE8888101028T DE3869793T DE3869793D1 DE 3869793 D1 DE3869793 D1 DE 3869793D1 DE 8888101028 T DE8888101028 T DE 8888101028T DE 3869793 T DE3869793 T DE 3869793T DE 3869793 D1 DE3869793 D1 DE 3869793D1
- Authority
- DE
- Germany
- Prior art keywords
- supply pipe
- reactive deposition
- gas
- gas supply
- gas phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1506287 | 1987-01-27 | ||
JP2168387A JPS63190171A (ja) | 1987-02-03 | 1987-02-03 | 改良されたcvd用ガス導入ノズル |
JP2737187 | 1987-02-10 | ||
JP62027370A JPH0643631B2 (ja) | 1987-02-10 | 1987-02-10 | 常圧cvd用ガス導入ノズル |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3869793D1 true DE3869793D1 (de) | 1992-05-14 |
Family
ID=27456318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8888101028T Expired - Fee Related DE3869793D1 (de) | 1987-01-27 | 1988-01-25 | Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4880163A (de) |
EP (1) | EP0276796B1 (de) |
DE (1) | DE3869793D1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9312634D0 (en) * | 1993-06-18 | 1993-08-04 | Tsl Group Plc | Improvements in vitreous silica manufacture |
US5781693A (en) * | 1996-07-24 | 1998-07-14 | Applied Materials, Inc. | Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween |
US6090210A (en) * | 1996-07-24 | 2000-07-18 | Applied Materials, Inc. | Multi-zone gas flow control in a process chamber |
CN1211264A (zh) | 1996-12-16 | 1999-03-17 | 康宁股份有限公司 | 制造锗掺杂的二氧化硅用的原料及制造方法 |
JP2001526174A (ja) * | 1997-12-19 | 2001-12-18 | コーニング インコーポレイテッド | 金属酸化物スートを作製するためのバーナおよび方法 |
US5904958A (en) * | 1998-03-20 | 1999-05-18 | Rexam Industries Corp. | Adjustable nozzle for evaporation or organic monomers |
DE10018857C1 (de) * | 2000-04-14 | 2001-11-29 | Heraeus Quarzglas | Vorrichtung zur Herstellung eines Quarzglaskörpers |
JP4074461B2 (ja) * | 2002-02-06 | 2008-04-09 | 東京エレクトロン株式会社 | 成膜方法および成膜装置、半導体装置の製造方法 |
US7322313B2 (en) * | 2002-08-30 | 2008-01-29 | Sekisui Chemical Co., Ltd. | Plasma processing system |
KR101309334B1 (ko) * | 2004-08-02 | 2013-09-16 | 비코 인스트루먼츠 인코포레이티드 | 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터 |
KR100629358B1 (ko) * | 2005-05-24 | 2006-10-02 | 삼성전자주식회사 | 샤워 헤드 |
PL378286A1 (pl) * | 2005-12-06 | 2007-06-11 | International Tobacco Machinery Poland Ltd | Urządzenie do kondycjonowania materiału pochodzenia roślinnego |
US8398770B2 (en) * | 2007-09-26 | 2013-03-19 | Eastman Kodak Company | Deposition system for thin film formation |
CN101143356B (zh) * | 2007-11-01 | 2010-05-19 | 上海誉辉化工有限公司 | 泡沫施加装置 |
DE102009043840A1 (de) | 2009-08-24 | 2011-03-03 | Aixtron Ag | CVD-Reaktor mit streifenförmig verlaufenden Gaseintrittszonen sowie Verfahren zum Abscheiden einer Schicht auf einem Substrat in einem derartigen CVD-Reaktor |
TWI565825B (zh) * | 2012-06-07 | 2017-01-11 | 索泰克公司 | 沉積系統之氣體注入組件及相關使用方法 |
JP6320824B2 (ja) * | 2014-03-31 | 2018-05-09 | 株式会社東芝 | ガス供給管、およびガス処理装置 |
US10745804B2 (en) * | 2017-01-31 | 2020-08-18 | Ofs Fitel, Llc | Parallel slit torch for making optical fiber preform |
US10400332B2 (en) * | 2017-03-14 | 2019-09-03 | Eastman Kodak Company | Deposition system with interlocking deposition heads |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2713894A (en) * | 1955-07-26 | R sage | ||
US2685916A (en) * | 1952-01-31 | 1954-08-10 | Gen Electric | Gas burner |
US3381114A (en) * | 1963-12-28 | 1968-04-30 | Nippon Electric Co | Device for manufacturing epitaxial crystals |
US3606974A (en) * | 1969-04-04 | 1971-09-21 | Nelson M Steel | Material treating apparatus |
US3726659A (en) * | 1970-10-02 | 1973-04-10 | Owens Illinois Inc | Method and apparatus for forming a finish on a glass container |
DD106417A1 (de) * | 1972-12-27 | 1974-06-12 | ||
US4081136A (en) * | 1977-01-21 | 1978-03-28 | The United States Of America As Represented By The Secretary Of The Air Force | Dual manifold high performance throttleable injector |
US4359493A (en) * | 1977-09-23 | 1982-11-16 | Ppg Industries, Inc. | Method of vapor deposition |
CH628600A5 (fr) * | 1979-02-14 | 1982-03-15 | Siv Soc Italiana Vetro | Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede. |
JPS55120142A (en) * | 1979-03-10 | 1980-09-16 | Pioneer Electronic Corp | Cvd device |
IT1134153B (it) * | 1979-11-21 | 1986-07-31 | Siv Soc Italiana Vetro | Ugello per depositare in continuo su un substrato uno strato di una materia solida |
JPS5934231B2 (ja) * | 1980-12-19 | 1984-08-21 | 旭硝子株式会社 | Cvd装置の吐出装置 |
US4678679A (en) * | 1984-06-25 | 1987-07-07 | Energy Conversion Devices, Inc. | Continuous deposition of activated process gases |
-
1988
- 1988-01-25 EP EP88101028A patent/EP0276796B1/de not_active Expired
- 1988-01-25 DE DE8888101028T patent/DE3869793D1/de not_active Expired - Fee Related
- 1988-01-27 US US07/149,084 patent/US4880163A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0276796A2 (de) | 1988-08-03 |
EP0276796A3 (en) | 1988-10-26 |
EP0276796B1 (de) | 1992-04-08 |
US4880163A (en) | 1989-11-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |