DE3869793D1 - Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase. - Google Patents

Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.

Info

Publication number
DE3869793D1
DE3869793D1 DE8888101028T DE3869793T DE3869793D1 DE 3869793 D1 DE3869793 D1 DE 3869793D1 DE 8888101028 T DE8888101028 T DE 8888101028T DE 3869793 T DE3869793 T DE 3869793T DE 3869793 D1 DE3869793 D1 DE 3869793D1
Authority
DE
Germany
Prior art keywords
supply pipe
reactive deposition
gas
gas supply
gas phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888101028T
Other languages
English (en)
Inventor
Shigeyoshi Kobayashi
Susumu Yaba
Tomoya Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2168387A external-priority patent/JPS63190171A/ja
Priority claimed from JP62027370A external-priority patent/JPH0643631B2/ja
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of DE3869793D1 publication Critical patent/DE3869793D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE8888101028T 1987-01-27 1988-01-25 Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase. Expired - Fee Related DE3869793D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP1506287 1987-01-27
JP2168387A JPS63190171A (ja) 1987-02-03 1987-02-03 改良されたｃｖｄ用ガス導入ノズル
JP2737187 1987-02-10
JP62027370A JPH0643631B2 (ja) 1987-02-10 1987-02-10 常圧ｃｖｄ用ガス導入ノズル

Publications (1)

Publication Number Publication Date
DE3869793D1 true DE3869793D1 (de) 1992-05-14

Family

ID=27456318

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888101028T Expired - Fee Related DE3869793D1 (de) 1987-01-27 1988-01-25 Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.

Country Status (3)

Country Link
US (1) US4880163A (de)
EP (1) EP0276796B1 (de)
DE (1) DE3869793D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9312634D0 (en) * 1993-06-18 1993-08-04 Tsl Group Plc Improvements in vitreous silica manufacture
US5781693A (en) * 1996-07-24 1998-07-14 Applied Materials, Inc. Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
US6090210A (en) * 1996-07-24 2000-07-18 Applied Materials, Inc. Multi-zone gas flow control in a process chamber
CN1211264A (zh) 1996-12-16 1999-03-17 康宁股份有限公司 制造锗掺杂的二氧化硅用的原料及制造方法
JP2001526174A (ja) * 1997-12-19 2001-12-18 コーニング インコーポレイテッド 金属酸化物スートを作製するためのバーナおよび方法
US5904958A (en) * 1998-03-20 1999-05-18 Rexam Industries Corp. Adjustable nozzle for evaporation or organic monomers
DE10018857C1 (de) * 2000-04-14 2001-11-29 Heraeus Quarzglas Vorrichtung zur Herstellung eines Quarzglaskörpers
JP4074461B2 (ja) * 2002-02-06 2008-04-09 東京エレクトロン株式会社 成膜方法および成膜装置、半導体装置の製造方法
US7322313B2 (en) * 2002-08-30 2008-01-29 Sekisui Chemical Co., Ltd. Plasma processing system
KR101309334B1 (ko) * 2004-08-02 2013-09-16 비코 인스트루먼츠 인코포레이티드 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터
KR100629358B1 (ko) * 2005-05-24 2006-10-02 삼성전자주식회사 샤워 헤드
PL378286A1 (pl) * 2005-12-06 2007-06-11 International Tobacco Machinery Poland Ltd Urządzenie do kondycjonowania materiału pochodzenia roślinnego
US8398770B2 (en) * 2007-09-26 2013-03-19 Eastman Kodak Company Deposition system for thin film formation
CN101143356B (zh) * 2007-11-01 2010-05-19 上海誉辉化工有限公司 泡沫施加装置
DE102009043840A1 (de) 2009-08-24 2011-03-03 Aixtron Ag CVD-Reaktor mit streifenförmig verlaufenden Gaseintrittszonen sowie Verfahren zum Abscheiden einer Schicht auf einem Substrat in einem derartigen CVD-Reaktor
TWI565825B (zh) * 2012-06-07 2017-01-11 索泰克公司 沉積系統之氣體注入組件及相關使用方法
JP6320824B2 (ja) * 2014-03-31 2018-05-09 株式会社東芝 ガス供給管、およびガス処理装置
US10745804B2 (en) * 2017-01-31 2020-08-18 Ofs Fitel, Llc Parallel slit torch for making optical fiber preform
US10400332B2 (en) * 2017-03-14 2019-09-03 Eastman Kodak Company Deposition system with interlocking deposition heads

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2713894A (en) * 1955-07-26 R sage
US2685916A (en) * 1952-01-31 1954-08-10 Gen Electric Gas burner
US3381114A (en) * 1963-12-28 1968-04-30 Nippon Electric Co Device for manufacturing epitaxial crystals
US3606974A (en) * 1969-04-04 1971-09-21 Nelson M Steel Material treating apparatus
US3726659A (en) * 1970-10-02 1973-04-10 Owens Illinois Inc Method and apparatus for forming a finish on a glass container
DD106417A1 (de) * 1972-12-27 1974-06-12
US4081136A (en) * 1977-01-21 1978-03-28 The United States Of America As Represented By The Secretary Of The Air Force Dual manifold high performance throttleable injector
US4359493A (en) * 1977-09-23 1982-11-16 Ppg Industries, Inc. Method of vapor deposition
CH628600A5 (fr) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.
JPS55120142A (en) * 1979-03-10 1980-09-16 Pioneer Electronic Corp Cvd device
IT1134153B (it) * 1979-11-21 1986-07-31 Siv Soc Italiana Vetro Ugello per depositare in continuo su un substrato uno strato di una materia solida
JPS5934231B2 (ja) * 1980-12-19 1984-08-21 旭硝子株式会社 Ｃｖｄ装置の吐出装置
US4678679A (en) * 1984-06-25 1987-07-07 Energy Conversion Devices, Inc. Continuous deposition of activated process gases

Also Published As

Publication number Publication date
EP0276796A2 (de) 1988-08-03
EP0276796A3 (en) 1988-10-26
EP0276796B1 (de) 1992-04-08
US4880163A (en) 1989-11-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee