JPS55120142A - Cvd device - Google Patents

Cvd device

Info

Publication number
JPS55120142A
JPS55120142A JP2797679A JP2797679A JPS55120142A JP S55120142 A JPS55120142 A JP S55120142A JP 2797679 A JP2797679 A JP 2797679A JP 2797679 A JP2797679 A JP 2797679A JP S55120142 A JPS55120142 A JP S55120142A
Authority
JP
Japan
Prior art keywords
substrate
susceptor
nozzle
speed
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2797679A
Other languages
Japanese (ja)
Other versions
JPS6136698B2 (en
Inventor
Sumio Imaoka
Yoshiki Tanigawa
Yoshitaka Tawara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Priority to JP2797679A priority Critical patent/JPS55120142A/en
Publication of JPS55120142A publication Critical patent/JPS55120142A/en
Publication of JPS6136698B2 publication Critical patent/JPS6136698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45589—Movable means, e.g. fans

Abstract

PURPOSE:To uniformly form a CVD film on a substrate by a CVD device by reciprocating a nozzle for supplying stock gas substantially in parallel with the moving direction of a susceptor for carrying and heating the substrate. CONSTITUTION:A susceptor 2 for carrying and heating a substrate 1 at predetermined temperature moves at constant speed v. A nozzle 3 having a plurality of slit-like injection ports is provided oppositely with the susceptor 2, and reciprocated substantially in parallel with the moving direction of the susceptor 2 in predetermined period. When the end of the nozzle 3 moves at speed v, the relative speed between the substrate 1 and the nozzle 3 becomes v+V, If v<V, the influence of the moving speed of the susceptor can be ignored. Thus, the supply of stock gas to the substrate 1 is equalized to uniformly form the thickness of the CVD film formed on the substrate.
JP2797679A 1979-03-10 1979-03-10 Cvd device Granted JPS55120142A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2797679A JPS55120142A (en) 1979-03-10 1979-03-10 Cvd device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2797679A JPS55120142A (en) 1979-03-10 1979-03-10 Cvd device

Publications (2)

Publication Number Publication Date
JPS55120142A true JPS55120142A (en) 1980-09-16
JPS6136698B2 JPS6136698B2 (en) 1986-08-20

Family

ID=12235888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2797679A Granted JPS55120142A (en) 1979-03-10 1979-03-10 Cvd device

Country Status (1)

Country Link
JP (1) JPS55120142A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276796A2 (en) * 1987-01-27 1988-08-03 Asahi Glass Company Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
CN103237921A (en) * 2010-08-30 2013-08-07 Beneq有限公司 Apparatus
WO2014009606A1 (en) * 2012-07-09 2014-01-16 Beneq Oy Apparatus and method for processing substrate

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276796A2 (en) * 1987-01-27 1988-08-03 Asahi Glass Company Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
CN103237921A (en) * 2010-08-30 2013-08-07 Beneq有限公司 Apparatus
US9909212B2 (en) 2010-08-30 2018-03-06 Beneq Oy Apparatus for processing substrate surface
WO2014009606A1 (en) * 2012-07-09 2014-01-16 Beneq Oy Apparatus and method for processing substrate
US10023957B2 (en) 2012-07-09 2018-07-17 Beneq Oy Apparatus and method for processing substrate

Also Published As

Publication number Publication date
JPS6136698B2 (en) 1986-08-20

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