JPS52136573A - Cvd apparatus - Google Patents

Cvd apparatus

Info

Publication number
JPS52136573A
JPS52136573A JP5345876A JP5345876A JPS52136573A JP S52136573 A JPS52136573 A JP S52136573A JP 5345876 A JP5345876 A JP 5345876A JP 5345876 A JP5345876 A JP 5345876A JP S52136573 A JPS52136573 A JP S52136573A
Authority
JP
Japan
Prior art keywords
cvd apparatus
susceptor
evenness
thickness
achieve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5345876A
Other languages
Japanese (ja)
Other versions
JPS5528546B2 (en
Inventor
Itaru Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP5345876A priority Critical patent/JPS52136573A/en
Publication of JPS52136573A publication Critical patent/JPS52136573A/en
Publication of JPS5528546B2 publication Critical patent/JPS5528546B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Abstract

PURPOSE:To achieve the evenness in the temperature distribution of a susceptor by making the thickness of the susceptor larger toward its circumferential part or selectively forming grooves.
JP5345876A 1976-05-10 1976-05-10 Cvd apparatus Granted JPS52136573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5345876A JPS52136573A (en) 1976-05-10 1976-05-10 Cvd apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5345876A JPS52136573A (en) 1976-05-10 1976-05-10 Cvd apparatus

Publications (2)

Publication Number Publication Date
JPS52136573A true JPS52136573A (en) 1977-11-15
JPS5528546B2 JPS5528546B2 (en) 1980-07-29

Family

ID=12943405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5345876A Granted JPS52136573A (en) 1976-05-10 1976-05-10 Cvd apparatus

Country Status (1)

Country Link
JP (1) JPS52136573A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0147967A2 (en) * 1983-12-09 1985-07-10 Applied Materials, Inc. Induction heated reactor system for chemical vapor deposition
JPS63180921U (en) * 1987-05-13 1988-11-22

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6146044Y2 (en) * 1980-07-07 1986-12-24
JPS5763776U (en) * 1980-10-02 1982-04-15
JPS6121331Y2 (en) * 1980-10-31 1986-06-26
JPS59174963U (en) * 1983-05-11 1984-11-22 三菱自動車工業株式会社 handle dynamic damper

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0147967A2 (en) * 1983-12-09 1985-07-10 Applied Materials, Inc. Induction heated reactor system for chemical vapor deposition
JPS63180921U (en) * 1987-05-13 1988-11-22

Also Published As

Publication number Publication date
JPS5528546B2 (en) 1980-07-29

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