IT8019855A0 - Procedimento per depositare in continuo, sulla superficie di un substrato portato ad alta temperatura, uno strato di una materia solida, e installazione per la realizzazione di questo procedimento. - Google Patents

Procedimento per depositare in continuo, sulla superficie di un substrato portato ad alta temperatura, uno strato di una materia solida, e installazione per la realizzazione di questo procedimento.

Info

Publication number
IT8019855A0
IT8019855A0 IT8019855A IT1985580A IT8019855A0 IT 8019855 A0 IT8019855 A0 IT 8019855A0 IT 8019855 A IT8019855 A IT 8019855A IT 1985580 A IT1985580 A IT 1985580A IT 8019855 A0 IT8019855 A0 IT 8019855A0
Authority
IT
Italy
Prior art keywords
procedure
installation
carrying
layer
high temperature
Prior art date
Application number
IT8019855A
Other languages
English (en)
Other versions
IT1140560B (it
Inventor
Kalbskopf Reinhard
Baumberger Otto
Original Assignee
Siv Soc Italiana Vetro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siv Soc Italiana Vetro filed Critical Siv Soc Italiana Vetro
Publication of IT8019855A0 publication Critical patent/IT8019855A0/it
Application granted granted Critical
Publication of IT1140560B publication Critical patent/IT1140560B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/241—Doped oxides with halides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/244—Doped oxides with Sb
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
IT19855/80A 1979-02-14 1980-02-12 Procedimento per depositare in continuo,sulla superficie di un substrato portato ad alta temperatura,uno strato di una materia solida,e installazione per la realizzazione di questo procedimento IT1140560B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH141279A CH628600A5 (fr) 1979-02-14 1979-02-14 Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.

Publications (2)

Publication Number Publication Date
IT8019855A0 true IT8019855A0 (it) 1980-02-12
IT1140560B IT1140560B (it) 1986-10-01

Family

ID=4209839

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19855/80A IT1140560B (it) 1979-02-14 1980-02-12 Procedimento per depositare in continuo,sulla superficie di un substrato portato ad alta temperatura,uno strato di una materia solida,e installazione per la realizzazione di questo procedimento

Country Status (22)

Country Link
US (2) US4294868A (it)
JP (1) JPS55130842A (it)
KR (1) KR830002475B1 (it)
AU (1) AU538579B2 (it)
BE (1) BE881708A (it)
BR (1) BR8000891A (it)
CA (1) CA1136007A (it)
CH (1) CH628600A5 (it)
CS (1) CS274254B2 (it)
DD (1) DD149058A5 (it)
DE (1) DE3005797C2 (it)
ES (1) ES8100356A1 (it)
FR (1) FR2448943A1 (it)
GB (1) GB2044137B (it)
IT (1) IT1140560B (it)
MX (1) MX154318A (it)
NL (1) NL179043C (it)
PL (1) PL126146B1 (it)
SE (1) SE446091B (it)
SU (1) SU1371499A3 (it)
TR (1) TR20840A (it)
ZA (1) ZA80824B (it)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1134153B (it) * 1979-11-21 1986-07-31 Siv Soc Italiana Vetro Ugello per depositare in continuo su un substrato uno strato di una materia solida
CA1172918A (en) * 1980-02-15 1984-08-21 William E. Hofmann Process for making glass surfaces abrasion-resistant and article produced thereby
BE889217A (fr) * 1980-06-19 1981-12-15 Bfg Glassgroup Procede et dispositif de formation d'un revetement uniforme a plusieurs constituants
CH643469A5 (fr) * 1981-12-22 1984-06-15 Siv Soc Italiana Vetro Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide.
US4451000A (en) * 1982-06-11 1984-05-29 Hollis Engineering, Inc. Soldering apparatus exhaust system
US4477494A (en) * 1982-07-12 1984-10-16 Glass Containers Corporation Process for forming rust resistant tin oxide coatings on glass containers
US4524718A (en) * 1982-11-22 1985-06-25 Gordon Roy G Reactor for continuous coating of glass
GB2139612B (en) * 1983-05-13 1987-03-11 Glaverbel Coating a hot vitreous substrate
EP0173715B1 (en) * 1984-02-13 1992-04-22 SCHMITT, Jerome J. III Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
US4928627A (en) * 1985-12-23 1990-05-29 Atochem North America, Inc. Apparatus for coating a substrate
US5122394A (en) * 1985-12-23 1992-06-16 Atochem North America, Inc. Apparatus for coating a substrate
JPH0645881B2 (ja) * 1986-03-28 1994-06-15 日本鋼管株式会社 連続処理ラインにおける鋼板の浸珪処理方法
JPS63139033A (ja) * 1986-11-28 1988-06-10 Nec Corp プラズマディスプレイ用透明導電膜の製造方法
DE3869793D1 (de) * 1987-01-27 1992-05-14 Asahi Glass Co Ltd Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.
GB2209176A (en) * 1987-08-28 1989-05-04 Pilkington Plc Coating glass
US4853257A (en) * 1987-09-30 1989-08-01 Ppg Industries, Inc. Chemical vapor deposition of tin oxide on float glass in the tin bath
US5136975A (en) * 1990-06-21 1992-08-11 Watkins-Johnson Company Injector and method for delivering gaseous chemicals to a surface
GB9300400D0 (en) * 1993-01-11 1993-03-03 Glaverbel A device and method for forming a coating by pyrolysis
US5453383A (en) * 1994-06-14 1995-09-26 General Mills, Inc. Method of applying sugar coating by using steam assisted discharge nozzle
US5534314A (en) * 1994-08-31 1996-07-09 University Of Virginia Patent Foundation Directed vapor deposition of electron beam evaporant
FR2724923B1 (fr) * 1994-09-27 1996-12-20 Saint Gobain Vitrage Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s)
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
GB2302101B (en) * 1995-06-09 1999-03-10 Glaverbel A glazing panel having solar screening properties
GB2302102B (en) * 1995-06-09 1999-03-10 Glaverbel A glazing panel having solar screening properties and a process for making such a panel
US6231971B1 (en) * 1995-06-09 2001-05-15 Glaverbel Glazing panel having solar screening properties
CA2178032A1 (en) * 1995-06-09 1996-12-10 Robert Terneu Glazing panel having solar screening properties
GB9515198D0 (en) * 1995-07-25 1995-09-20 Pilkington Plc A method of coating glass
MY129739A (en) * 1996-01-09 2007-04-30 Nippon Sheet Glass Co Ltd Coated glass for buildings
US5698262A (en) 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
GB9616983D0 (en) * 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
US6238738B1 (en) 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US7096692B2 (en) 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US6103015A (en) * 1998-01-19 2000-08-15 Libbey-Owens-Ford Co. Symmetrical CVD coater with lower upstream exhaust toe
US5904958A (en) * 1998-03-20 1999-05-18 Rexam Industries Corp. Adjustable nozzle for evaporation or organic monomers
US6268019B1 (en) * 1998-06-04 2001-07-31 Atofina Chemicals, Inc. Preparation of fluorine modified, low haze, titanium dioxide films
DE19923591A1 (de) * 1999-05-21 2000-11-23 Fleissner Maschf Gmbh Co Vorrichtung mit einem Düsenbalken zur Erzeugung von Flüssigkeitsstrahlen zur Strahlbeaufschlagung der Fasern einer Warenbahn
GB9913315D0 (en) 1999-06-08 1999-08-11 Pilkington Plc Improved process for coating glass
DE10046557B4 (de) * 2000-09-19 2006-07-27 Datron-Electronic Gmbh Vorrichtung zum dosierten Ausbringen eines aus mehreren unterschiedlich viskosen Medien bestehenden Materialstranges mittels Koextrusion und mehrfunktionale Kombinationsdichtung
JP4124046B2 (ja) * 2003-07-10 2008-07-23 株式会社大阪チタニウムテクノロジーズ 金属酸化物被膜の成膜方法および蒸着装置
KR101309334B1 (ko) * 2004-08-02 2013-09-16 비코 인스트루먼츠 인코포레이티드 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터
US8398770B2 (en) * 2007-09-26 2013-03-19 Eastman Kodak Company Deposition system for thin film formation
US8709160B2 (en) * 2008-08-22 2014-04-29 United Technologies Corporation Deposition apparatus having thermal hood
US8404047B2 (en) * 2008-09-16 2013-03-26 United Technologies Corporation Electron beam vapor deposition apparatus and method
US8343591B2 (en) * 2008-10-24 2013-01-01 United Technologies Corporation Method for use with a coating process
US20100104773A1 (en) * 2008-10-24 2010-04-29 Neal James W Method for use in a coating process
US20100189929A1 (en) * 2009-01-28 2010-07-29 Neal James W Coating device and deposition apparatus
US20100247809A1 (en) * 2009-03-31 2010-09-30 Neal James W Electron beam vapor deposition apparatus for depositing multi-layer coating
TR201903701T4 (tr) * 2011-03-23 2019-04-22 Pilkington Group Ltd İnce film kaplamaların çöktürülmesi için düzenek ve bu düzeneğin kullanılması için çöktürme usulü.
GB201114242D0 (en) 2011-08-18 2011-10-05 Pilkington Group Ltd Tantalum oxide coatings
GB2510615A (en) * 2013-02-08 2014-08-13 Glyndwr University Gas blade injection system
US10704144B2 (en) 2015-10-12 2020-07-07 Universal Display Corporation Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient
DK3430183T3 (da) * 2016-03-18 2022-03-07 Basf Se Metaldoteret tinoxid til anvendelser inden for elektrokatalyse
JP6529628B2 (ja) * 2018-04-17 2019-06-12 東芝三菱電機産業システム株式会社 成膜装置
JPWO2023139925A1 (it) * 2022-01-19 2023-07-27

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1307216A (en) * 1969-04-23 1973-02-14 Pilkington Brothers Ltd Treating glass
US3814327A (en) * 1971-04-06 1974-06-04 Gen Electric Nozzle for chemical reaction processes
CH544156A (de) * 1971-04-16 1973-11-15 Bbc Brown Boveri & Cie Verfahren zur Herstellung von oxydischen Halbleiterschichten und Vorrichtung zur Durchführung des Verfahrens
DE2121319A1 (de) * 1971-04-30 1973-01-18 Rocholl Martin Ggottfried Dipl Verfahren zum beschichten von glasscheiben mit einem optisch transparenten flaechenheizleiter
US3951100A (en) * 1972-12-15 1976-04-20 Ppg Industries, Inc. Chemical vapor deposition of coatings
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
FR2210675B1 (it) * 1972-12-15 1978-05-12 Ppg Industries Inc
DD109033A1 (it) * 1973-12-11 1974-10-12

Also Published As

Publication number Publication date
GB2044137A (en) 1980-10-15
AU538579B2 (en) 1984-08-23
PL221965A1 (it) 1980-11-17
US4351267A (en) 1982-09-28
SE446091B (sv) 1986-08-11
ES488517A0 (es) 1980-11-01
CH628600A5 (fr) 1982-03-15
FR2448943A1 (fr) 1980-09-12
AU5513980A (en) 1980-08-21
KR830001668A (ko) 1983-05-18
CS274254B2 (en) 1991-04-11
JPS6133904B2 (it) 1986-08-05
IT1140560B (it) 1986-10-01
GB2044137B (en) 1983-08-03
JPS55130842A (en) 1980-10-11
TR20840A (tr) 1982-10-19
DD149058A5 (de) 1981-06-24
NL8000897A (nl) 1980-08-18
SE8001131L (sv) 1980-08-15
PL126146B1 (en) 1983-07-30
DE3005797C2 (de) 1984-10-31
CA1136007A (en) 1982-11-23
CS98280A2 (en) 1990-09-12
KR830002475B1 (ko) 1983-10-26
DE3005797A1 (de) 1980-08-28
ZA80824B (en) 1981-02-25
BR8000891A (pt) 1980-10-21
ES8100356A1 (es) 1980-11-01
BE881708A (fr) 1980-05-30
NL179043C (nl) 1986-07-01
SU1371499A3 (ru) 1988-01-30
MX154318A (es) 1987-07-08
FR2448943B1 (it) 1982-12-03
US4294868A (en) 1981-10-13

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