CN1265458C - 具有形成在多层布线结构中电容器的半导体器件 - Google Patents

具有形成在多层布线结构中电容器的半导体器件 Download PDF

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Publication number
CN1265458C
CN1265458C CN03152279.3A CN03152279A CN1265458C CN 1265458 C CN1265458 C CN 1265458C CN 03152279 A CN03152279 A CN 03152279A CN 1265458 C CN1265458 C CN 1265458C
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CN
China
Prior art keywords
wiring
wiring layer
semiconductor device
capacitor
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN03152279.3A
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English (en)
Chinese (zh)
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CN1484310A (zh
Inventor
松永健
中岛雄一
宫本浩二
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Toshiba Corp
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Toshiba Corp
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Publication of CN1484310A publication Critical patent/CN1484310A/zh
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Publication of CN1265458C publication Critical patent/CN1265458C/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5223—Capacitor integral with wiring layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
CN03152279.3A 2002-07-26 2003-07-28 具有形成在多层布线结构中电容器的半导体器件 Expired - Fee Related CN1265458C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002218399A JP4037711B2 (ja) 2002-07-26 2002-07-26 層間絶縁膜内に形成されたキャパシタを有する半導体装置
JP2002218399 2002-07-26

Publications (2)

Publication Number Publication Date
CN1484310A CN1484310A (zh) 2004-03-24
CN1265458C true CN1265458C (zh) 2006-07-19

Family

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Family Applications (1)

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CN03152279.3A Expired - Fee Related CN1265458C (zh) 2002-07-26 2003-07-28 具有形成在多层布线结构中电容器的半导体器件

Country Status (3)

Country Link
US (2) US7242094B2 (enExample)
JP (1) JP4037711B2 (enExample)
CN (1) CN1265458C (enExample)

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US8405216B2 (en) * 2005-06-29 2013-03-26 Taiwan Semiconductor Manufacturing Company, Ltd. Interconnect structure for integrated circuits
JP5165868B2 (ja) * 2005-08-10 2013-03-21 三星電子株式会社 誘電膜上のパッシベーション膜と共に金属−絶縁体−金属キャパシタ（ｍｅｔａｌ−ｉｎｓｕｌａｔｏｒ−ｍｅｔａｌｍｉｍｃａｐａｃｉｔｏｒｓ）を形成する方法
JP4764160B2 (ja) * 2005-12-21 2011-08-31 株式会社東芝 半導体装置
JP2008270277A (ja) * 2007-04-16 2008-11-06 Nec Electronics Corp 位置ずれ検出パターン、位置ずれ検出方法および半導体装置
JP2008311504A (ja) 2007-06-15 2008-12-25 Toshiba Corp 半導体集積回路
KR100897824B1 (ko) * 2007-08-29 2009-05-18 주식회사 동부하이텍 엠아이엠(ｍｉｍ) 캐패시터와 그의 제조방법
JP2009130207A (ja) * 2007-11-26 2009-06-11 Nec Electronics Corp 半導体装置および半導体装置の製造方法
US7868453B2 (en) * 2008-02-15 2011-01-11 International Business Machines Corporation Solder interconnect pads with current spreading layers
JP5446120B2 (ja) * 2008-04-23 2014-03-19 富士通セミコンダクター株式会社 半導体装置の製造方法及び半導体装置
US8431463B2 (en) * 2008-08-08 2013-04-30 Texas Instruments Incorporated Capacitor contact formed concurrently with bond pad metallization
JP2011049303A (ja) * 2009-08-26 2011-03-10 Toshiba Corp 電気部品およびその製造方法
US8552485B2 (en) * 2011-06-15 2013-10-08 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor structure having metal-insulator-metal capacitor structure
US9577025B2 (en) * 2014-01-31 2017-02-21 Qualcomm Incorporated Metal-insulator-metal (MIM) capacitor in redistribution layer (RDL) of an integrated device
US10164003B2 (en) * 2016-01-14 2018-12-25 Taiwan Semiconductor Manufacturing Company Ltd. MIM capacitor and method of forming the same
US9704796B1 (en) * 2016-02-11 2017-07-11 Qualcomm Incorporated Integrated device comprising a capacitor that includes multiple pins and at least one pin that traverses a plate of the capacitor
US9871095B2 (en) * 2016-03-17 2018-01-16 Taiwan Semiconductor Manufacturing Company Ltd. Stacked capacitor with enhanced capacitance and method of manufacturing the same
US10446487B2 (en) * 2016-09-30 2019-10-15 Invensas Bonding Technologies, Inc. Interface structures and methods for forming same
WO2018169968A1 (en) 2017-03-16 2018-09-20 Invensas Corporation Direct-bonded led arrays and applications
KR102449358B1 (ko) * 2017-08-31 2022-09-30 삼성전기주식회사 커패시터 부품
CN107622995B (zh) * 2017-10-09 2019-12-06 上海先进半导体制造股份有限公司 功率器件、mim电容及其制备方法
US11169326B2 (en) 2018-02-26 2021-11-09 Invensas Bonding Technologies, Inc. Integrated optical waveguides, direct-bonded waveguide interface joints, optical routing and interconnects
US11256004B2 (en) 2018-03-20 2022-02-22 Invensas Bonding Technologies, Inc. Direct-bonded lamination for improved image clarity in optical devices
US11515291B2 (en) 2018-08-28 2022-11-29 Adeia Semiconductor Inc. Integrated voltage regulator and passive components
US10804230B2 (en) * 2018-10-17 2020-10-13 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor package and method of manufacturing the same
CN112582398B (zh) * 2019-09-30 2024-07-26 台湾积体电路制造股份有限公司 半导体器件及其形成方法
US11762200B2 (en) 2019-12-17 2023-09-19 Adeia Semiconductor Bonding Technologies Inc. Bonded optical devices
DE102020132547A1 (de) * 2020-06-04 2021-12-09 Taiwan Semiconductor Manufacturing Co., Ltd. Speichervorrichtung, ic-bauteil und verfahren
CN112331659B (zh) * 2020-11-06 2021-10-26 长江存储科技有限责任公司 半导体器件制备方法、半导体器件及三维存储器
CN118448346A (zh) * 2023-02-03 2024-08-06 联华电子股份有限公司 半导体线路图案以及其制作方法

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JP4226804B2 (ja) * 2001-06-25 2009-02-18 株式会社東芝 半導体装置及びその製造方法
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Publication number Publication date
US20070228573A1 (en) 2007-10-04
US20040207043A1 (en) 2004-10-21
JP2004063667A (ja) 2004-02-26
JP4037711B2 (ja) 2008-01-23
CN1484310A (zh) 2004-03-24
US7242094B2 (en) 2007-07-10

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Granted publication date: 20060719