CN103282829B - 感光性树脂组合物 - Google Patents
感光性树脂组合物 Download PDFInfo
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- CN103282829B CN103282829B CN201180062574.6A CN201180062574A CN103282829B CN 103282829 B CN103282829 B CN 103282829B CN 201180062574 A CN201180062574 A CN 201180062574A CN 103282829 B CN103282829 B CN 103282829B
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/062—Polyethers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Polymerisation Methods In General (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Graft Or Block Polymers (AREA)
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| JP6063200B2 (ja) * | 2012-10-15 | 2017-01-18 | 旭化成株式会社 | 感光性樹脂組成物 |
| KR101675822B1 (ko) * | 2013-08-07 | 2016-11-15 | 코오롱인더스트리 주식회사 | 드라이 필름 포토 레지스트용 감광성 수지 조성물 |
| JP6207943B2 (ja) * | 2013-09-19 | 2017-10-04 | 旭化成株式会社 | 感光性樹脂組成物及び感光性樹脂積層体 |
| JP6486672B2 (ja) * | 2013-12-20 | 2019-03-20 | 旭化成株式会社 | 感光性エレメント、及びその製造方法 |
| JP2015152854A (ja) * | 2014-02-18 | 2015-08-24 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法 |
| TWI671594B (zh) * | 2014-05-13 | 2019-09-11 | 日商日立化成股份有限公司 | 感光性樹脂組成物、感光性元件、抗蝕劑圖案的形成方法及印刷配線板的製造方法 |
| WO2015174468A1 (ja) * | 2014-05-13 | 2015-11-19 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| WO2016047691A1 (ja) * | 2014-09-24 | 2016-03-31 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂積層体、樹脂パターンの製造方法、硬化膜及び表示装置 |
| TWI561920B (en) * | 2014-12-22 | 2016-12-11 | Chi Mei Corp | Photosensitive polysiloxane composition, protecting film, and element having the protecting film |
| JP6584105B2 (ja) | 2015-03-19 | 2019-10-02 | 株式会社日立製作所 | 微生物固定化担体及び微生物固定化担体の製造方法 |
| TWI706222B (zh) * | 2015-04-08 | 2020-10-01 | 日商旭化成股份有限公司 | 感光性樹脂組合物 |
| JP2017003966A (ja) * | 2015-06-12 | 2017-01-05 | Jsr株式会社 | 感光性組成物、及びメッキ造形物の製造方法 |
| CN114296315A (zh) * | 2015-09-11 | 2022-04-08 | 旭化成株式会社 | 感光性树脂组合物 |
| KR101890899B1 (ko) * | 2015-10-21 | 2018-08-22 | 닛산 가가쿠 가부시키가이샤 | 광도파로 형성용 조성물 |
| JP6567952B2 (ja) * | 2015-10-26 | 2019-08-28 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法 |
| JP6809873B2 (ja) * | 2015-12-28 | 2021-01-06 | 旭化成株式会社 | 積層体 |
| KR20180077743A (ko) * | 2016-12-29 | 2018-07-09 | 주식회사 동진쎄미켐 | 네가티브 감광성 수지 조성물 |
| TWI664497B (zh) * | 2017-01-30 | 2019-07-01 | 日商旭化成股份有限公司 | 感光性樹脂組合物、感光性樹脂積層體、形成有光阻圖案之基板及電路基板之製造方法 |
| CN110832034B (zh) * | 2017-08-18 | 2022-10-18 | 积水化学工业株式会社 | 湿固化型树脂组合物、电子部件用粘接剂和显示元件用粘接剂 |
| JP7162448B2 (ja) * | 2018-05-29 | 2022-10-28 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂組成物を用いた転写フィルム、樹脂パターン製造方法、及び硬化膜パターンの製造方法 |
| TWI770578B (zh) * | 2019-08-06 | 2022-07-11 | 日商旭化成股份有限公司 | 感光性樹脂組合物、及感光性元件 |
| CN115485621A (zh) * | 2020-04-28 | 2022-12-16 | 富士胶片株式会社 | 感光性转印材料、树脂图案的制造方法、电路配线的制造方法及触摸面板的制造方法 |
| TWI830425B (zh) * | 2021-10-25 | 2024-01-21 | 日商旭化成股份有限公司 | 感光性元件、及光阻圖案之形成方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009022724A1 (ja) * | 2007-08-15 | 2009-02-19 | Asahi Kasei E-Materials Corporation | 感光性樹脂組成物及びその積層体 |
| EP2042309A2 (en) * | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Method of producing a negative planographic printing plate |
| CN101449208A (zh) * | 2006-08-03 | 2009-06-03 | 旭化成电子材料元件株式会社 | 感光性树脂组合物以及层压体 |
| CN101652715A (zh) * | 2007-04-04 | 2010-02-17 | 旭化成电子材料株式会社 | 感光性树脂组合物及层叠体 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3824550A1 (de) * | 1988-07-20 | 1990-01-25 | Basf Ag | Lichtempfindliche, negativ arbeitende aufzeichnungsschicht |
| JP3315562B2 (ja) * | 1995-06-15 | 2002-08-19 | 共栄社化学株式会社 | 硬化性樹脂組成物 |
| JP4329182B2 (ja) * | 1999-09-30 | 2009-09-09 | 日立化成デュポンマイクロシステムズ株式会社 | アルカリネガ現像型感光性樹脂組成物、パターンの製造法及び電子部品 |
| JP4716347B2 (ja) * | 2001-04-05 | 2011-07-06 | 旭化成イーマテリアルズ株式会社 | ドライフィルムレジスト |
| WO2003077035A1 (fr) * | 2002-03-12 | 2003-09-18 | Asahi Kasei Kabushiki Kaisha | Composition de resine photosensible et utilisation de celle-ci |
| US20040058276A1 (en) * | 2002-09-23 | 2004-03-25 | Dueber Thomas E. | Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto |
| JP4147920B2 (ja) * | 2002-11-29 | 2008-09-10 | 日立化成工業株式会社 | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP4207044B2 (ja) * | 2003-11-19 | 2009-01-14 | 日立化成工業株式会社 | 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2006317924A (ja) * | 2005-04-14 | 2006-11-24 | Mitsubishi Chemicals Corp | カラーフィルタ用硬化性樹脂組成物、カラーフィルタ、および液晶表示装置 |
| WO2006120887A1 (ja) * | 2005-05-12 | 2006-11-16 | Nippon Kayaku Kabushiki Kaisha | 感光性樹脂組成物、その硬化物及びそれを含有するフィルム |
| KR101190945B1 (ko) * | 2005-10-25 | 2012-10-12 | 히다치 가세고교 가부시끼가이샤 | 감광성 수지 조성물, 이것을 이용한 감광성 엘리먼트, 레지스트 패턴의 형성방법 및 프린트 배선판의 제조방법 |
| JP2007264483A (ja) * | 2006-03-29 | 2007-10-11 | Fujifilm Corp | パターン形成材料及びパターン形成方法 |
| WO2009128369A1 (ja) * | 2008-04-14 | 2009-10-22 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びその積層体 |
| JP5411521B2 (ja) * | 2009-02-09 | 2014-02-12 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂積層体 |
| JP5549841B2 (ja) * | 2009-09-07 | 2014-07-16 | 日立化成株式会社 | 感光性樹脂組成物、永久レジスト用感光性フィルム、レジストパターンの形成方法、プリント配線板及びその製造方法、表面保護膜並びに層間絶縁膜 |
-
2011
- 2011-11-28 CN CN201180062574.6A patent/CN103282829B/zh active Active
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101449208A (zh) * | 2006-08-03 | 2009-06-03 | 旭化成电子材料元件株式会社 | 感光性树脂组合物以及层压体 |
| CN101652715A (zh) * | 2007-04-04 | 2010-02-17 | 旭化成电子材料株式会社 | 感光性树脂组合物及层叠体 |
| WO2009022724A1 (ja) * | 2007-08-15 | 2009-02-19 | Asahi Kasei E-Materials Corporation | 感光性樹脂組成物及びその積層体 |
| EP2042309A2 (en) * | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Method of producing a negative planographic printing plate |
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| Publication number | Publication date |
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| JPWO2012086371A1 (ja) | 2014-05-22 |
| KR20130098406A (ko) | 2013-09-04 |
| KR102019580B1 (ko) | 2019-09-06 |
| JP2015096960A (ja) | 2015-05-21 |
| KR20150017384A (ko) | 2015-02-16 |
| KR20170120190A (ko) | 2017-10-30 |
| CN103282829A (zh) | 2013-09-04 |
| TWI530757B (zh) | 2016-04-21 |
| JP5707420B2 (ja) | 2015-04-30 |
| MY179988A (en) | 2020-11-19 |
| TW201232173A (en) | 2012-08-01 |
| WO2012086371A1 (ja) | 2012-06-28 |
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