CN101622201B - 含氟基溶剂的溶液的纯化方法 - Google Patents

含氟基溶剂的溶液的纯化方法 Download PDF

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Publication number
CN101622201B
CN101622201B CN2008800060429A CN200880006042A CN101622201B CN 101622201 B CN101622201 B CN 101622201B CN 2008800060429 A CN2008800060429 A CN 2008800060429A CN 200880006042 A CN200880006042 A CN 200880006042A CN 101622201 B CN101622201 B CN 101622201B
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CN
China
Prior art keywords
solution
fluorine
water
based solvent
purification process
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Expired - Fee Related
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CN2008800060429A
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English (en)
Chinese (zh)
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CN101622201A (zh
Inventor
中里大辅
小布施裕美
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3M Innovative Properties Co
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3M Innovative Properties Co
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Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D11/00—Solvent extraction
    • B01D11/04—Solvent extraction of solutions which are liquid
    • B01D11/0492—Applications, solvents used
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/26—Treatment of water, waste water, or sewage by extraction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/40—Devices for separating or removing fatty or oily substances or similar floating material
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C02F2101/14—Fluorine or fluorine-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Treatment By Sorption (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Detergent Compositions (AREA)
CN2008800060429A 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法 Expired - Fee Related CN101622201B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007044315A JP5085954B2 (ja) 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置
JP044315/2007 2007-02-23
PCT/US2008/052896 WO2008103536A1 (en) 2007-02-23 2008-02-04 Purification process of fluorine-based solvent-containing solution

Publications (2)

Publication Number Publication Date
CN101622201A CN101622201A (zh) 2010-01-06
CN101622201B true CN101622201B (zh) 2012-07-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008800060429A Expired - Fee Related CN101622201B (zh) 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法

Country Status (7)

Country Link
US (1) US20100126934A1 (https=)
EP (1) EP2114831A4 (https=)
JP (1) JP5085954B2 (https=)
KR (1) KR101381494B1 (https=)
CN (1) CN101622201B (https=)
TW (1) TWI427057B (https=)
WO (1) WO2008103536A1 (https=)

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JP5620056B2 (ja) * 2008-10-10 2014-11-05 スリーエム イノベイティブプロパティズカンパニー フッ素系溶剤の精製方法
JP5368131B2 (ja) * 2009-02-20 2013-12-18 大日本スクリーン製造株式会社 溶剤再生装置及びその方法
WO2011155407A1 (ja) * 2010-06-07 2011-12-15 セントラル硝子株式会社 保護膜形成用薬液
US9607864B2 (en) * 2012-05-23 2017-03-28 Stmicroelectronics, Inc. Dual medium filter for ion and particle filtering during semiconductor processing
CN103730409B (zh) * 2012-10-16 2016-12-28 中芯国际集成电路制造(上海)有限公司 半导体器件的制作方法、清洗方法和清洗系统
JP6149421B2 (ja) * 2013-02-20 2017-06-21 栗田工業株式会社 溶液の供給方法及び供給装置
CN103083998B (zh) * 2013-03-01 2014-12-03 成都广亚科技有限公司 一种溶剂净化装置及其处理方法
US20140322656A1 (en) * 2013-04-24 2014-10-30 Orthogonal, Inc. Method of patterning a device
KR102341140B1 (ko) * 2013-07-25 2021-12-21 쓰리엠 이노베이티브 프로퍼티즈 컴파니 질소 함유 하이드로플루오로에테르 및 이의 제조 방법
CN106459291B (zh) 2014-05-30 2019-07-12 Ａｇｃ株式会社 含氟聚合物的制造方法
JP2016168530A (ja) * 2015-03-12 2016-09-23 三井・デュポンフロロケミカル株式会社 フッ素含有溶剤分離方法、フッ素含有溶剤汚染物除去方法、及び装置
JP6542393B2 (ja) * 2016-01-05 2019-07-10 富士フイルム株式会社 処理液、基板の洗浄方法および半導体デバイスの製造方法
JP6480017B2 (ja) * 2016-01-05 2019-03-06 富士フイルム株式会社 処理液、基板の洗浄方法、及び、半導体デバイスの製造方法
WO2017119244A1 (ja) * 2016-01-05 2017-07-13 富士フイルム株式会社 処理液、基板の洗浄方法、および、半導体デバイスの製造方法
WO2018043697A1 (ja) * 2016-09-02 2018-03-08 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
TWI737823B (zh) * 2016-09-30 2021-09-01 日商富士軟片股份有限公司 半導體晶片的製造方法、套組
JP2018118183A (ja) * 2017-01-23 2018-08-02 光治郎 大川 被洗浄物洗浄装置
KR102478194B1 (ko) * 2017-06-26 2022-12-15 에이지씨 가부시키가이샤 진공 증착용의 마스크의 세정 방법 및 린스 조성물
JPWO2019093251A1 (ja) * 2017-11-10 2020-12-10 日本ゼオン株式会社 洗浄溶剤組成物の再生方法および再生装置、並びに、被洗浄物の洗浄方法および洗浄システム
JP7126830B2 (ja) * 2018-01-19 2022-08-29 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の再生方法、及び該方法を用いる再生装置
JPWO2020031732A1 (ja) * 2018-08-10 2021-09-24 日本ゼオン株式会社 フッ素系溶剤含有物の精製方法およびフッ素系溶剤含有精製物
CN111100750A (zh) * 2018-10-29 2020-05-05 台境企业股份有限公司 废氟素油的处理方法及系统
CN109365386A (zh) * 2018-12-06 2019-02-22 深圳市盈石科技有限公司 一种净洗装置及其净洗方法
JP2021000603A (ja) * 2019-06-21 2021-01-07 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の精製方法、及び該方法を用いる精製装置
IL290395B1 (en) 2019-09-03 2026-04-01 Fujifilm Electronic Mat Usa Inc Solvent purification systems and methods
JP2021041337A (ja) * 2019-09-10 2021-03-18 スリーエム イノベイティブ プロパティズ カンパニー アルコール含有フッ素化液体の再生方法、及び該方法を用いる再生システム
CN111863298B (zh) * 2020-06-10 2022-08-05 中国原子能科学研究院 一种purex流程污溶剂的深度净化方法
CN114284130B (zh) * 2020-09-27 2025-03-21 东莞新科技术研究开发有限公司 去除晶圆表面杂质的方法
KR20230156917A (ko) * 2021-03-12 2023-11-15 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화 유체 컨디셔닝 시스템
CN114560758B (zh) * 2022-02-22 2023-08-18 中船(邯郸)派瑞特种气体股份有限公司 一种电子级九氟丁基甲醚的纯化方法
CN116832582B (zh) * 2023-07-06 2024-03-08 山东众海机械有限公司 一种激光光纤金属切割高压空气提纯的工艺
US12351498B2 (en) 2023-07-14 2025-07-08 Claros Technologies Inc. Methods and systems of PFAS destruction using UV irradiation at 222 nanometers
US12545601B2 (en) 2023-07-14 2026-02-10 Claros Technologies Inc. Methods and systems of photosensitizer recovery for improved PFAS destruction
US12534390B2 (en) 2023-07-14 2026-01-27 Claros Technologies Inc. Methods and systems of nitrate removal in aqueous systems for improved PFAS destruction
WO2026008470A1 (en) 2024-07-02 2026-01-08 Syensqo Specialty Polymers Italy S.p.A. (per)fluoropolyether polymer composition

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Also Published As

Publication number Publication date
KR20090122220A (ko) 2009-11-26
EP2114831A4 (en) 2012-12-12
KR101381494B1 (ko) 2014-04-04
EP2114831A1 (en) 2009-11-11
WO2008103536A1 (en) 2008-08-28
JP2008208048A (ja) 2008-09-11
TWI427057B (zh) 2014-02-21
JP5085954B2 (ja) 2012-11-28
TW200900379A (en) 2009-01-01
US20100126934A1 (en) 2010-05-27
CN101622201A (zh) 2010-01-06

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