CN100339766C - 利用由可聚合链段表面改性的碳纳米管制备碳纳米管图案膜或碳纳米管复合材料的方法 - Google Patents
利用由可聚合链段表面改性的碳纳米管制备碳纳米管图案膜或碳纳米管复合材料的方法 Download PDFInfo
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- CN100339766C CN100339766C CNB2004100283384A CN200410028338A CN100339766C CN 100339766 C CN100339766 C CN 100339766C CN B2004100283384 A CNB2004100283384 A CN B2004100283384A CN 200410028338 A CN200410028338 A CN 200410028338A CN 100339766 C CN100339766 C CN 100339766C
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- carbon nano
- tube
- coating composition
- liquid coating
- acid
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- 229910021393 carbon nanotube Inorganic materials 0.000 title claims abstract description 163
- 239000002041 carbon nanotube Substances 0.000 title claims abstract description 163
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 156
- 238000002360 preparation method Methods 0.000 title claims description 45
- 239000002131 composite material Substances 0.000 title abstract description 5
- 238000000034 method Methods 0.000 claims abstract description 46
- 229920000642 polymer Polymers 0.000 claims abstract description 31
- 150000008064 anhydrides Chemical group 0.000 claims abstract description 20
- 238000013007 heat curing Methods 0.000 claims abstract description 11
- 230000008569 process Effects 0.000 claims abstract description 7
- -1 and Substances 0.000 claims description 113
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 68
- 239000007788 liquid Substances 0.000 claims description 58
- 230000004048 modification Effects 0.000 claims description 58
- 238000012986 modification Methods 0.000 claims description 58
- 239000008199 coating composition Substances 0.000 claims description 53
- 239000002253 acid Substances 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 33
- 239000003380 propellant Substances 0.000 claims description 23
- 239000003795 chemical substances by application Substances 0.000 claims description 19
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 14
- 239000004793 Polystyrene Substances 0.000 claims description 13
- 239000002585 base Substances 0.000 claims description 13
- 229920002223 polystyrene Polymers 0.000 claims description 13
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 12
- 239000003513 alkali Substances 0.000 claims description 12
- 239000003960 organic solvent Substances 0.000 claims description 12
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 12
- 238000001029 thermal curing Methods 0.000 claims description 12
- 239000000853 adhesive Substances 0.000 claims description 11
- 230000001070 adhesive effect Effects 0.000 claims description 11
- 238000001704 evaporation Methods 0.000 claims description 11
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 claims description 10
- 238000011161 development Methods 0.000 claims description 9
- 229920000515 polycarbonate Polymers 0.000 claims description 9
- 239000004417 polycarbonate Substances 0.000 claims description 9
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 239000007822 coupling agent Substances 0.000 claims description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 6
- 229920001195 polyisoprene Polymers 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- 239000012744 reinforcing agent Substances 0.000 claims description 6
- 229920003048 styrene butadiene rubber Polymers 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 5
- 239000000178 monomer Substances 0.000 claims description 5
- 229920002647 polyamide Polymers 0.000 claims description 5
- 229920000647 polyepoxide Polymers 0.000 claims description 5
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 4
- SURWYRGVICLUBJ-UHFFFAOYSA-N 2-ethyl-9,10-dimethoxyanthracene Chemical compound C1=CC=CC2=C(OC)C3=CC(CC)=CC=C3C(OC)=C21 SURWYRGVICLUBJ-UHFFFAOYSA-N 0.000 claims description 4
- GYMFBYTZOGMSQJ-UHFFFAOYSA-N 2-methylanthracene Chemical compound C1=CC=CC2=CC3=CC(C)=CC=C3C=C21 GYMFBYTZOGMSQJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004952 Polyamide Substances 0.000 claims description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 claims description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical class C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 3
- 229920000877 Melamine resin Polymers 0.000 claims description 3
- 239000004640 Melamine resin Substances 0.000 claims description 3
- 229920000459 Nitrile rubber Polymers 0.000 claims description 3
- 229930182556 Polyacetal Natural products 0.000 claims description 3
- 239000005062 Polybutadiene Substances 0.000 claims description 3
- 239000004695 Polyether sulfone Substances 0.000 claims description 3
- 239000004697 Polyetherimide Substances 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 3
- 239000004954 Polyphthalamide Substances 0.000 claims description 3
- 239000002174 Styrene-butadiene Substances 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 3
- 229920006362 Teflon® Polymers 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical class [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229920000800 acrylic rubber Polymers 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229920005549 butyl rubber Polymers 0.000 claims description 3
- 150000001718 carbodiimides Chemical class 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 3
- 150000002825 nitriles Chemical class 0.000 claims description 3
- 239000005011 phenolic resin Substances 0.000 claims description 3
- 229920002587 poly(1,3-butadiene) polymer Polymers 0.000 claims description 3
- 229920001643 poly(ether ketone) Polymers 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 3
- 229920000058 polyacrylate Polymers 0.000 claims description 3
- 229920001230 polyarylate Polymers 0.000 claims description 3
- 229920002480 polybenzimidazole Polymers 0.000 claims description 3
- 229920002857 polybutadiene Polymers 0.000 claims description 3
- 229920001748 polybutylene Polymers 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920000570 polyether Polymers 0.000 claims description 3
- 229920006393 polyether sulfone Polymers 0.000 claims description 3
- 229920001601 polyetherimide Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 239000011116 polymethylpentene Substances 0.000 claims description 3
- 229920000306 polymethylpentene Polymers 0.000 claims description 3
- 229920006324 polyoxymethylene Polymers 0.000 claims description 3
- 229920006380 polyphenylene oxide Polymers 0.000 claims description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 3
- 229920006375 polyphtalamide Polymers 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- 239000011115 styrene butadiene Substances 0.000 claims description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- QXBUYALKJGBACG-UHFFFAOYSA-N 10-methylphenothiazine Chemical compound C1=CC=C2N(C)C3=CC=CC=C3SC2=C1 QXBUYALKJGBACG-UHFFFAOYSA-N 0.000 claims description 2
- WBPXZSIKOVBSAS-UHFFFAOYSA-N 2-tert-butylanthracene Chemical compound C1=CC=CC2=CC3=CC(C(C)(C)C)=CC=C3C=C21 WBPXZSIKOVBSAS-UHFFFAOYSA-N 0.000 claims description 2
- IUDFGPVKKGCZPK-UHFFFAOYSA-N 9,10-dimethoxy-1,2-dimethylanthracene Chemical compound CC1=CC=C2C(OC)=C(C=CC=C3)C3=C(OC)C2=C1C IUDFGPVKKGCZPK-UHFFFAOYSA-N 0.000 claims description 2
- CPGPAVAKSZHMBP-UHFFFAOYSA-N 9-methylanthracene Chemical compound C1=CC=C2C(C)=C(C=CC=C3)C3=CC2=C1 CPGPAVAKSZHMBP-UHFFFAOYSA-N 0.000 claims description 2
- 238000001723 curing Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 230000000977 initiatory effect Effects 0.000 claims description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 2
- 125000000524 functional group Chemical group 0.000 abstract description 5
- 239000000758 substrate Substances 0.000 abstract description 3
- 125000000466 oxiranyl group Chemical group 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
- 239000002904 solvent Substances 0.000 description 37
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 35
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 238000002525 ultrasonication Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 239000007767 bonding agent Substances 0.000 description 10
- 238000004528 spin coating Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000011541 reaction mixture Substances 0.000 description 8
- 239000012953 triphenylsulfonium Substances 0.000 description 8
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 7
- 239000010439 graphite Substances 0.000 description 7
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 7
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 6
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 6
- 239000012965 benzophenone Substances 0.000 description 6
- 238000005660 chlorination reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 238000000016 photochemical curing Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 229910021115 PF 6 Inorganic materials 0.000 description 5
- 229910018286 SbF 6 Inorganic materials 0.000 description 5
- 230000021523 carboxylation Effects 0.000 description 5
- 238000006473 carboxylation reaction Methods 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 150000002460 imidazoles Chemical class 0.000 description 5
- 238000001291 vacuum drying Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 4
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical group FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical class OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
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- 239000000243 solution Substances 0.000 description 4
- 239000006228 supernatant Substances 0.000 description 4
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 229910017008 AsF 6 Inorganic materials 0.000 description 3
- 229910015892 BF 4 Inorganic materials 0.000 description 3
- GSNUFIFRDBKVIE-UHFFFAOYSA-N DMF Natural products CC1=CC=C(C)O1 GSNUFIFRDBKVIE-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Substances ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical class C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229940014800 succinic anhydride Drugs 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 3
- 125000001544 thienyl group Chemical group 0.000 description 3
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 3
- FIDRAVVQGKNYQK-UHFFFAOYSA-N 1,2,3,4-tetrahydrotriazine Chemical compound C1NNNC=C1 FIDRAVVQGKNYQK-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-NMQOAUCRSA-N 1,2-dideuteriooxyethane Chemical compound [2H]OCCO[2H] LYCAIKOWRPUZTN-NMQOAUCRSA-N 0.000 description 2
- UGDXXMCTNJHYKN-UHFFFAOYSA-N 1-cyclohexyl-2-cyclohexylsulfonyl-2-diazonioethenolate Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])C(=O)C1CCCCC1 UGDXXMCTNJHYKN-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- UERPUZBSSSAZJE-UHFFFAOYSA-N 3-chlorophthalic anhydride Chemical class ClC1=CC=CC2=C1C(=O)OC2=O UERPUZBSSSAZJE-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- WLHCBQAPPJAULW-UHFFFAOYSA-N 4-methylbenzenethiol Chemical compound CC1=CC=C(S)C=C1 WLHCBQAPPJAULW-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- GXGJIOMUZAGVEH-UHFFFAOYSA-N Chamazulene Chemical group CCC1=CC=C(C)C2=CC=C(C)C2=C1 GXGJIOMUZAGVEH-UHFFFAOYSA-N 0.000 description 2
- RAASUWZPTOJQAY-UHFFFAOYSA-N Dibenz[a,c]anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C3=CC=CC=C3C2=C1 RAASUWZPTOJQAY-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- NTYJJOPFIAHURM-UHFFFAOYSA-N Histamine Chemical compound NCCC1=CN=CN1 NTYJJOPFIAHURM-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical group CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 description 2
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Classifications
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- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
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Abstract
本发明公开了一种通过用可聚合的官能团,如环氧乙烷和酸酐基团对碳纳米管的表面进行改性,然后将表面改性的碳纳米管或者进行光蚀刻或者进行热固化处理来制备碳纳米管负片图案或具有互穿聚合物网络(IPN)的聚合碳纳米管复合材料的方法。通过本发明,可以很容易地在各种基材表面制备所需的碳纳米管图案,并且可以在没有其它聚合物的情况下制备硬化性能得到提高的聚合碳纳米管复合材料。
Description
根据35 USC§119(a),该非临时申请要求2003年2月26日提交的韩国专利申请2003-11898的优先权。
技术领域
本发明涉及利用表面具有可聚合链段的碳纳米管制备图案膜或碳纳米管复合材料的方法。更具体地,本发明涉及通过用可聚合的官能团,如环氧乙烷和酸酐基团对碳纳米管的表面进行改性,然后将表面改性的碳纳米管或者进行光蚀刻或者进行热固化处理来制备碳纳米管负片图案或具有互穿聚合物网络的聚合碳纳米管复合材料的方法。
背景技术
1991年,日本Maijo大学的Iijima博士通过电子显微观察发现了碳纳米管。从那时起,碳纳米管就得到了深入的研究。通常,碳纳米管就如同石墨片制成的中空圆柱体,其内径为1~20nm。
众所周知,石墨具有独特的结构。也就是说,构成石墨的碳原子之间的共价键以不同寻常的形式排列,这就使石墨具有刚性的平面六边形薄片形状。在薄片的上部和下部区域中充满自由分散的电子,它们保持与薄片平行移动。石墨片螺旋形卷曲形成碳纳米管,其中石墨片的弯曲部分与其他石墨片的弯曲部分偶合在一起。碳纳米管的电性能与其结构和直径函数相关(Phys.Rev.(1992),B46:1804和Phys.Rev.Lett.(1992),68:1579)。因而,改变碳纳米管的螺旋性或手性均会导致自由电子的运动发生变化。因此,自由电子被允许象在金属材料中一样自由移动,或者它们必须象在半导体材料中一样克服势垒。就这一点而论,势垒的范围随着碳纳米管的直径发生变化,对于最小的碳纳米管,它可能为1eV。令人惊奇的是,根据其结构与直径的不同,相同的材料可以具有从导体到非导体如此不同的电性能。碳纳米管的这些特殊的特征,包括机械刚性、化学稳定性、电导率的可变性以及伸长的中空圆柱形状,使得碳纳米管可用于制备平板显示器(FPD)、晶体管、贮能材料、纳米尺寸的电子元件等。
近来,中国北京大学的Zhongfan Liu报道了一种在金基材上排列碳纳米管的方法,其中碳纳米管的每一端均用硫进行改性(Langmuir(2000),16:3569)。美国Rice大学的Smalley报道了另一种方法,该方法包括如下步骤:在硅片上形成自组装的(self-assembled)三甲基甲硅烷基单层;利用电子束使该单层形成图案;将胺基连接到图案上;及将碳纳米管连接到胺基上(Chemical Physics Letters(1999),303:125)。但是,这种方法的问题在于自组装的三甲基甲硅烷基单层不稳定,并易于受到环境的影响。
与此同时,有人报道了通过将10~100重量份碳纳米管与100重量份聚乙烯醇共混而制备聚合物基体复合材料的方法,其中,所述复合材料的热性能与碳纳米管含量成比例地增加(Adv.Mater.,(1999),11:937)。然而,该方法的问题是,这种共混不足以实现碳纳米管与聚乙烯醇间的良好界面粘着性,因此需要额外的表面活性剂。在这一点上,已经有人报道了通过使用某些表面活性剂来增加碳纳米管与环氧树脂间的界面粘着性的实例(Chem.Mater.,(2000),12:1049)。
发明内容
本发明的特征在于其表面经化学改性而具有环氧乙烷或酸酐基团的碳纳米管。
本发明的特征还在于通过光固化表面改性的碳纳米管而得到图案膜的方法。
本发明的特征还在于通过热固化表面改性的碳纳米管而得到聚合的碳纳米管复合材料的方法。
一方面,本发明提供一种形成碳纳米管负片图案的方法,该方法包括以下步骤:
(a)将碳纳米管与一种或多种光酸或光碱发生剂一起分散到有机溶剂中,以形成液体涂布组合物,其中该碳纳米管的表面用式(1)的环氧乙烷基团改性和/或碳纳米管的表面用式(2)、(3)、(4)、(5)、(6)或(7)的酸酐基团改性:
其中,R是C1-15直链、支链或环状亚烷基;
(b)将液体涂布组合物涂布在基材上,并通过预烘干蒸发有机溶剂,以在基材上沉积涂膜;
(c)将涂膜经过具有所需图案的光掩膜曝光于紫外线,以引发涂膜曝光区域中表面改性的碳纳米管的光聚合;及
(d)用有机显影剂将曝光的涂膜显影,以除去涂膜的未曝光区域,从而得到碳纳米管负片图案。
另一方面,本发明提供一种制备聚合碳纳米管复合材料的方法,该方法包括以下步骤:
(a)将碳纳米管与一种或多种热固化剂一起分散到有机溶剂中,以形成液体涂布组合物,其中所述碳纳米管的表面用式(1)的环氧乙烷基团改性和/或碳纳米管的表面用式(2)、(3)、(4)、(5)、(6)或(7)的酸酐基团改性:
其中,R是C1-15直链、支链或环状亚烷基;
(b)将液体涂布组合物涂布在基材上并热固化,得到聚合碳纳米管复合材料。
再一方面,本发明提供根据上述方法制备的碳纳米管负片图案。
又一方面,本发明提供根据上述方法制备的聚合碳纳米管复合材料。
从以下对本发明的描述中,将会成功地获得本发明的所有上述特征和其他特征。
具体实施方式
本发明通过环氧乙烷或酸酐基团表面改性的碳纳米管的阳离子聚合或热固化,分别成功地获得了碳纳米管的不溶性膜或互穿的聚合物网络(IPN)。
以下对本发明的表面改性的碳纳米管进行详细的说明。
本发明使用的“环氧乙烷基团”意指具有式(1)结构的官能团:
本发明使用的“酸酐基团”意指具有式(2)~(7)结构的官能团:
其中,R是C1-15直链、支链或环状亚烷基;
根据本发明,在用环氧乙烷或酸酐基团改性之前应该先对碳纳米管的表面进行羧化。这种羧化可以根据本领域公知的任何常规方法来完成,例如,可以根据以下步骤来完成。首先,将碳纳米管在充满硝酸与硫酸(7∶3(v/v))混合酸溶液的超声波仪中回流24小时。然后,将该料浆通过0.2μm的聚碳酸酯过滤器过滤,收集剩余的固体物质,并再次在90℃的硝酸中回流45小时,之后在12000rpm下离心分离。离心结束时,收集上清液,并通过0.1μm的聚碳酸酯过滤器过滤。收集剩余的固体物质,并完全干燥,得到干燥的碳纳米管。将干燥的碳纳米管分散在蒸馏水或二甲基甲酰胺(dimethylformaldehyde,DMF)中,并把分散液通过0.1μm的聚碳酸酯过滤器过滤,以选择某一尺寸以上的碳纳米管。
随后,按如下所述用环氧乙烷或酸酐基团对这样羧化的碳纳米管进行改性。首先,将羧化的碳纳米管加入到诸如DMF、4-羟基-4-甲基-2-戊酮、乙二醇单乙基醚和2-甲氧基乙醇的有机溶剂中并通过超声作用使其均匀分散在其中,之后,为了促进环氧乙烷或酸酐的进攻,通过向碳纳米管分散液中加入亚硫酰氯并在60~80℃下搅拌20~30小时而用氯取代碳纳米管表面羧基的端羟基。在反应结束时,将反应混合物用无水THF稀释并离心分离。在排出棕色的上清液之后,收集剩余的沉淀物并用无水THF洗涤数次。所得黑色固体物质进行真空干燥得到氯化的碳纳米管。接着,将氯化的碳纳米管分散在有机溶剂(如氯仿和二甲基甲酰胺)中并在碱催化剂(如吡啶)的存在下与环氧乙烷化合物(如缩水甘油)进行回流反应,反应进行30~60小时,从而得到用环氧乙烷基团改性的碳纳米管。或者,将分散在诸如氯仿和二甲基甲酰胺中的氯化的碳纳米管与在其一端具有羟基的二甲酯衍生物进行反应,得到用二甲酯基团改性的碳纳米管,之后,通过在氢氧化钠的存在下与水反应,这种二甲酯基团转化为二羧酸。随后,二羧酸进行缩合反应得到用酸酐基团改性的碳纳米管。在改性结束时,用诸如甲醇的溶剂冲洗碳纳米管以洗掉残余的反应物。在碳纳米管的表面上存在有环氧乙烷或酸酐基团可以很容易地通过拉曼光谱检测出来。
用于本发明的碳纳米管是商购的,它们通常是通过电弧放电法、激光烧蚀法、高温丝等离子化学气相沉积法、微波等离子化学气相沉积法、热化学气相沉积法和热分解法制备的。但是,商品级碳纳米管一定污染有含碳副产物,如无定形碳和富勒烯(C60),以及管生长所必需的过渡金属催化剂,这样就应该对它们进行一定的纯化。在本发明中,可以使用任何通用的碳纳米管纯化方法,其中之一举例说明如下。首先,使碳纳米管在100℃的蒸馏水中回流8~24小时,优选12小时,然后过滤收集,把收集的碳纳米管完全干燥并用甲苯洗涤,从而除去含碳副产物。所得碳黑在470℃下加热20~30分钟,优选20分钟,之后用6M HCl溶液洗涤,以除去金属杂质。从而得到纯的碳纳米管。
以下详细描述通过对表面改性的碳纳米管进行光固化而形成碳纳米管负片图案的方法和通过对表面改性的碳纳米管进行热固化而制备聚合碳纳米管复合材料的方法。
根据本发明,用于光固化以提供碳纳米管负片图案的液体涂布组合物是通过将用环氧乙烷基团改性的碳纳米管和/或用酸酐基团改性的碳纳米管与一种或多种光酸或光碱发生剂一起分散在有机溶剂中制备的。或者,在制备用于热固化以提供碳纳米管复合材料的液体涂布组合物的情况下,用一种或多种热固化剂代替光酸或光碱发生剂。
用于本发明的光酸发生剂(以下称作PAG)为选自下列的一种或多种:式(8)~(18)的鎓基PAG;离子型PAG,如式(19)含羟基芳族磺酸二亚苯基碘鎓,式(20)羟基芳族磺酸重氮萘醌(diazonophotoquinone)(DNQ);及非离子型的PAG,如式(21)的硝基苄基磺酸:
式中,R1和R2各自独立地为C1-10直链、支链或环状烷基;Z是磺酰基或羰基。
式(8)化合物的非限定性实例包括1-环己基磺酰基-1-(1,1-二甲基乙基磺酰基)重氮甲烷、双(1,1-二甲基乙基磺酰基)重氮甲烷、双(1-甲基乙基磺酰基)甲烷、双(环己基磺酰基)重氮甲烷、1-环己基磺酰基-1-环己基羰基重氮甲烷、1-重氮-1-环己基磺酰基-3,3′-二甲基-2-丁酮、1-重氮-1-甲基磺酰基-4-苯基-2-丁酮、1-重氮-1-(1,1-二甲基乙基磺酰基)-3,3-二甲基-2-丁酮和1-乙酰基-1-(1-甲基乙基磺酰基)重氮甲烷。
式中,R3和R4各自独立地为氢原子、卤素原子、C1-10直链、支链或环状烷基、或C1-12苯基烷基,并且卤素原子可以取代至少一个连接到R3或R4上的氢原子。
式(9)化合物的非限定性实例包括双(环己基磺酰基)重氮甲烷、双(对甲苯磺酰基)重氮甲烷、甲基磺酰基-对甲苯磺酰基重氮甲烷、1-重氮-1-(对甲苯磺酰基)-3,3-二甲基-2-丁酮、双(对氯苯磺酰基)重氮甲烷和环己基磺酰基-对甲苯磺酰基重氮甲烷。
式中,R5和R6各自独立地为氢原子、卤素原子、C1-10直链、支链或环状烷基、C1-12苯基烷基或苯基,或甲苯基。
式(10)化合物的非限定性实例包括1-环己基磺酰基-1-环己基羰基重氮甲烷、1-对甲苯磺酰基-1-环己基羰基重氮甲烷、1-重氮-1-(对甲苯磺酰基)-3,3-二甲基-2-丁酮、1-重氮-1-苯磺酰基-3,3-二甲基-2-丁酮和1-重氮-1-(对甲苯磺酰基)-3-甲基-2-丁酮。
式中,R7、R8和R9各自独立地为C1-10直链、支链或环状烷基,或C1-12苯基烷基,或苯基,并且卤素原子、硝基或噻吩基可以取代至少一个连接到R7、R8和R9之一上的氢原子。
式(11)化合物的非限定性实例包括1,2,3-三(三氟甲磺酰氧基)苯、1,2,3-三(2,2,2-三氟乙烷磺酰氧基)苯、1,2,3-三(2-氯乙烷磺酰氧基)苯、1,2,3-三(对三氟苯磺酰氧基)苯、1,2,3-三(对硝基苯磺酰氧基)苯、1,2,3-三(2,3,4,5,6-五氟苯磺酰氧基)苯、1,2,3-三(对氟苯磺酰氧基)苯、1,2,3-三(甲磺酰氧基)苯、1,2,4-三(对三氟甲基氧苯磺酰氧基)苯、1,2,4-三(2,2,2-三氟乙烷磺酰氧基)苯、1,2,4-三(2-噻吩基磺酰氧基)苯、1,3,5-三(甲磺酰氧基)苯、1,3,5-三(三氟甲磺酰氧基)苯、1,3,5-三(2,2,2-三氟乙烷磺酰氧基)苯、1,3,5-三(对硝基苯磺酰氧基)苯、1,3,5-三(2,3,4,5,6-五氟苯磺酰氧基)苯、1,3,5-三(对氟苯磺酰氧基)苯和1,3,5-三(2-氯乙烷磺酰氧基)苯。
式中,R10~R13各自独立地为C1-10直链、支链或环状烷基,或C1-12苯基烷基,或苯基,并且卤素原子、硝基或噻吩基可以取代至少一个连接到R10~R13之一上的氢原子。
式(12)化合物的非限定性实例包括2,3,4-三(对氟苯磺酰氧基)二苯甲酮、2,3,4-三(三氟甲磺酰氧基)二苯甲酮、2,3,4-三(2-氯乙烷磺酰氧基)二苯甲酮、2,3,4-三(对三氟甲基苯磺酰氧基)二苯甲酮、2,3,4-三(对硝基苯磺酰氧基)二苯甲酮、2,3,4-三(对氟苯磺酰氧基)二苯甲酮、2,3,4-三(2,3,4,5,6-五氟苯磺酰氧基)苯乙酮、2,3,4-三(2-硝基苯磺酰氧基)苯乙酮、2,3,4-三(2,5-二氯苯磺酰氧基)苯乙酮、2,3,4-三(2,3,4-三氯苯磺酰氧基)苯乙酮、2,2′,4,4′-四(甲磺酰氧基)二苯甲酮、2,2′,4,4′-四(2,2,2-三氟乙烷磺酰氧基)二苯甲酮、2,2′,4,4′-四(2-氯乙烷磺酰氧基)二苯甲酮、2,2′,4,4′-四(2,5-二氯苯磺酰氧基)二苯甲酮、2,2′,4,4′-四(2,4,6-三甲基苯磺酰氧基)二苯甲酮和2,2′,4,4′-四(间三氟甲基苯磺酰氧基)二苯甲酮。
式中,R14、R15和R16各自独立地为C1-10直链、支链或环状烷基,或C1-12苯基烷基,或苯基,并且卤素原子、硝基或噻吩基可以取代至少一个连接到R14、R15和R16之一上的氢原子;X为甲磺酸盐、三氟甲磺酸盐、对甲苯磺酸盐、10-樟脑磺酸盐、环己烷氨基磺酸盐、全氟-1-丁烷磺酸盐、Cl、Br、SbF6、BF4、PF6或AsF6。
式(13)化合物的非限定性实例包括三氟甲磺酸三苯基锍、全氟辛烷磺酸三苯基锍、全氟辛烷磺酸二苯基对甲苯基锍、全氟辛烷磺酸三(对甲苯基)锍、三氟甲磺酸三(对氯苯)锍、三氟乙烷磺酸三(对甲苯基)锍、三氟甲磺酸三甲基锍、三氟甲磺酸二甲基苯基锍、三氟甲磺酸二甲基甲苯基锍、全氟辛烷磺酸二甲基甲苯基锍、对甲苯磺酸三苯基锍、甲磺酸三苯基锍、丁烷磺酸三苯基锍、正辛烷磺酸三苯基锍、1-萘磺酸三苯基锍、2-萘磺酸三苯基锍、10-樟脑磺酸三苯基锍、2,5-二氯苯磺酸三苯基锍、1,3,4-三氯苯磺酸二苯基甲苯基锍、对甲苯磺酸二甲基甲苯基锍、2,5-二氯苯磺酸二苯基甲苯基锍、氯化三苯基锍、溴化三苯基锍、四氟硼酸三苯基锍、六氟锑酸三苯基锍、六氟磷酸三苯基锍和六氟砷酸三苯基锍。
式中,X为甲磺酸盐、三氟甲磺酸盐、对甲苯磺酸盐、10-樟脑磺酸盐、环己烷氨基磺酸盐、全氟-1-丁烷磺酸盐、Cl、Br、SbF6、BF4、PF6或AsF6;D1和D2各自独立地为氢原子、C1-6烷基或乙烯基氧甲基。
式中,R17为C1-10烷基;MXn-为BF4 -、PF6 -、AsF6 -或SbF6 -。
式中,MXn-为PF6 -或SbF6 -。
式中,R18~R21各自独立地为C1-10烷基;MXn-为PF6 -或SbF6 -。
式中,R22、R23和R24各自独立地为C1-12烷基或烷氧基、或羟基;Ar1、Ar2和Ar3各自独立地为苯基、萘基或蒽基。
式中,Q1和Q2各自独立地为C1-12烷基或芳基,g和h各自独立地为1以上的整数。
式中,R25为C1-12烷基或芳基,其可以包含或不含至少一个杂原子;j为1~3的整数。
除了上述这种光酸发生剂以外,在本发明中也可以使用任何聚合光酸发生剂(Mw=500~1000000),由于它在其主链或侧链上具有锍或碘鎓盐或者在其侧链上具有有机的光酸产生基团,所以可以通过光反应生成酸。
或者,可以使用光碱发生剂取代光酸发生剂。用于本发明的光碱发生剂具有式(22)的结构:
式中,R26各自独立地为甲基、乙基、丙基或丁基,X为Br或I。
优选的式(22)的化合物可以例如,但不局限于三甲基二苯甲基碘化铵、三甲基二苯甲基三氟甲磺酸铵和三甲基芴基碘化铵。
根据本发明,为了确保这些光酸或光碱发生剂在整个紫外光的宽波长范围内的光反应活性,可以任选使用一种或多种光增强剂,比如2-乙基-9,10-二甲氧基蒽、9,10-二氯蒽、1-氯蒽、2-甲基蒽、9-甲基蒽、2-叔丁基蒽、蒽、1,2-苯并蒽、1,2,3,4-二苯并蒽、1,2,5,6-二苯并蒽、1,2,7,8-二苯并蒽、9,10-二甲氧基二甲基蒽、2-乙基-9,10-二甲氧基蒽、N-甲基吩噻嗪和异丙基噻吨酮。
另一方面,热固化剂的非限定性实例包括胺、酸酐、咪唑、芳基酚、如聚甲基丙烯酸的羧酸、聚酰胺基胺、聚酰胺、三氟化硼、三(β-甲基缩水甘油基)异氰酸酯、双(β-甲基缩水甘油基)对苯二酸酯和对苯酚磺酸。
胺可以分为非芳族与芳族两类。非芳族热固化剂的优选实例包括1,3-丙二胺、1,4-丁二胺、乙二胺、二乙氨基丙胺、二甲胺、三甲基六亚甲基二胺、二亚乙基乙三胺、三亚乙基四胺、二乙氨基丙胺、孟烷二胺、1,1-二甲基肼、N-(3-氨丙基)-1,3-丙烷二胺、亚精胺、精胺、3,3′-二氨基-N-甲基二丙胺、环丙胺、环戊胺、环己胺、环戊胺、环辛胺、环十二烷基胺、外-2-氨基莰烷、1-金刚烷胺、4,4′-亚甲基双(环己胺)、异佛尔酮二胺、乙醇胺、2-羟基乙基肼、3-氨基-1-丙醇、5-氨基-1-戊醇、丝氨醇、2-(2-氨乙基氨基)-乙醇、3-吡咯烷醇、哌啶、六亚甲基亚胺、哌嗪、N-氨基乙基哌嗪和1,4,7-三氮杂环壬烷。芳族热固化剂的优选实例包括苄基二甲基胺、苯胺、4,4′-二甲基苯胺、二苯基胺、N-苯基苄基胺、1,6-己二胺、间苯二胺、2-甲基戊五(二亚甲基)二胺、2-甲基-1,6-己二胺、3-甲基-1,6-己二胺、2,5-二甲基-1,6-己二胺、2,2-二甲基-1,5-戊二胺、5-甲基壬烷二胺、十二(二亚甲基)二胺、2,2,7,7-四甲基-1,8-辛二胺、间亚二甲苯基二胺、对二甲苯二胺、2-氨基苯酚、3-氟苯胺、4,4′-亚乙基二苯胺、烷基苯胺、4-环己基苯胺、3,3-亚甲基二苯胺、4,4′-亚甲基二苯胺、4-氯苯胺、4-丁氧基苯胺、4-戊氧基苯胺、4-己氧基苯胺、4,4′-氧二苯胺、4″,4-(六氟异亚丙基)-双(4-苯氧基苯胺)、N,N-二缩水甘油基-4-缩水甘油基氧苯胺、4-氨基苯酚、4,4′-硫代二苯胺、4-氨基苯乙基醇、2,2-二甲基苯胺、4-氟-2-(三氟甲基)苯胺、4-氟-3-(三氟甲基)苯胺、5,5′-(六氟异亚丙基)-2-氧甲苯胺、4′-氨基苯并-15-冠-5、1,4-苯二胺、2-氨基联苯、4,4′-亚甲基双(N,N-二缩水甘油基苯胺)、4,4′-(六氟异亚丙基)-二苯胺、4-苯氧基苯胺、3,3′-二甲氧基benidine、2-氨基萘、2,3-二氨基萘、1,8-二氨基萘、1-氨基蒽、2-氨基蒽、9-氨基菲、9,10-二氨基菲、3-氨基氟代蒽、1-氨基芘、6-氨基屈、苯肼、1,2-二苯基肼、4-(三氟甲基)苯肼、2,3,5,6-四氟苯肼、二苄基胺、N,N′-二苄基乙二胺、N-苄基-2-苯乙胺、1-氨基茚满、1,2,3,4-四氢-1-萘胺、2-甲基苄基胺、3,5-双(三氟甲基)苄胺、3,4,5-三甲氧基苄胺、二氢吲哚、3-氨基-1,2,4-三嗪、2-氯-4,6-二氨基-1,3,5-三嗪、2,4-二氨基-6-甲基-1,3,5-三嗪、2,4,6-三氨基嘧啶、2,4,5,6-四氨基嘧啶硫酸盐、二氨基二苯基砜、三(二甲基-氨甲基)苯酚和二甲基氨甲基苯酚。
酸酐基热固化剂的优选实例包括丁二酸酐、戊烯基丁二酸酐、己烯基丁二酸酐、辛烯基丁二酸酐、十二烯基丁二酸酐、十八烯基丁二酸酐、聚异丁烯基丁二酸酐、马来酸酐、戊二酸酐、顺-1,2-环己烷二羧酸酐、苯基马来酸酐、邻苯二甲酸酐、4,4′-(六氟异亚丙基)-二邻苯二甲酸酐、4-甲基邻苯二甲酸酐、3,6-二氟邻苯二甲酸酐、3,6-二氯邻苯二甲酸酐、4,5-二氯邻苯二甲酸酐、四氟邻苯二甲酸酐、四氯邻苯二甲酸酐、四溴邻苯二甲酸酐、3-羟基邻苯二甲酸酐、1,2,4-苯三羧酸酐、3-硝基邻苯二甲酸酐、1,2,4,5-苯四羧酸二酐、联苯酸酐、1,8-萘二酸酐、4-氯-1,8-萘二酸酐、4-溴-1,8-萘二酸酐、4-氨基-1,8-萘二酸酐、1,4,5,8-萘四羧酸二酐和3,4,9,10-二萘嵌苯四羧酸二酐。
咪唑基热固化剂的优选实例包括咪唑、1-甲基咪唑、2-甲基咪唑、4-甲基咪唑、2-乙基咪唑、2-丙基咪唑、2-异丙基咪唑、1-丁基咪唑、2-十一烷基咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、1-癸基-2-甲基咪唑、1,5-二环己基咪唑、2,2′-双(4,5-二甲基咪唑)、1-乙烯基咪唑、1-烯丙基咪唑、5-氯-1-甲基咪唑、5-氯-1-乙基-2-甲基咪唑、4,5-二氯咪唑、2,4,5-三溴咪唑、2-巯基咪唑、2-巯基-1-甲基咪唑、1-(3-氨丙基)咪唑、1-苯基咪唑、2-苯基咪唑、4-苯基咪唑、4-(咪唑-1-基)苯酚、1-苄基咪唑、4-甲基-2-苯基咪唑、1-苄基-2-甲基咪唑、4,5-二苯基咪唑、2,4,5-三苯基咪唑、1-(2,3,5,6-四氟苯基)咪唑、4,5-二苯基-2-咪唑硫醇、组胺、2-硝基咪唑、4-硝基咪唑、2-甲基-5-硝基咪唑、2-咪唑醛、4-甲基-5-咪唑醛、1,1′-羰基咪唑、1,1′-乙二酰二咪唑、1,1′-羰基双(2-甲基咪唑)、咪唑羧酸甲酯、1-(叔丁氧基羰基)咪唑、1-反-肉桂酰基咪唑、1-(2-萘酰基)咪唑和4-甲基-5-咪唑羧酸乙酯。
芳基酚基热固化剂的优选实例包括间甲酚、邻甲酚、对甲酚、2,4-二甲酚、2,5-二甲酚、3,4-二甲酚、3,5-二甲酚、百里酚、儿茶酚和焦酚。
羧酸基热固化剂的优选实例包括乙酸、甲酸、丙酸、丁酸、异丁酸、戊酸、异戊酸、新戊酸和己酸。
不管是对于光固化或是热固化,考虑到混合性、可分散性和可涂性,液体涂布组合物均优选使用一种或多种选自以下所述的溶剂制备:DMF、4-羟基-4-甲基-2-戊酮、乙二醇单乙醚、2-甲氧基乙醇、甲氧基丙基乙酸酯、乙基-3-乙氧基丙酸酯和环己酮。
优选碳纳米管在液体涂布组合物中的最终浓度为3~95wt%。对于光固化来说,考虑到液体涂布组合物的抗紫外性,光酸或光碱发生剂优选以0.1~15重量份的量加入到100重量份的碳纳米管中。当如上所述向液体涂布组合物中加入光增强剂时,光增强剂优选以0.3~2重量份的量加入到100重量份的碳纳米管中。另一方面,对于热固化来说,考虑到液体涂布组合物的适用期,热固化剂优选以1~35重量份的量加入到100重量份的碳纳米管中。
根据本发明,为了增加最终涂层的柔韧性,可以任选向液体涂布组合物中加入一种或多种偶联剂,如氨基丙基三乙氧基硅烷、苯基氨基丙基三甲氧基硅烷、脲基丙基三乙氧基硅烷、环氧丙氧丙基三甲氧基硅烷、异氰酸根合丙基三乙氧基硅烷、异丙基三异硬脂酰基钛酸酯和二异丙醇乙酰基烷氧基铝,以使得偶联剂以0.1~10重量份的量加入到100重量份的碳纳米管中。
另外,在液体涂布组合物中按100重量份碳纳米管计,还可以加入1~95重量份,优选3~60重量份的含环氧乙烷基团和/或酸酐基团的单体、低聚物或聚合物,无需考虑悬垂于表面改性的碳纳米管上的官能团的类型。它们在光聚合或热聚合过程中参与到与表面改性的碳纳米管的交联反应中,赋予所得涂膜均匀及其他的功能。适合于这一目的的含环氧乙烷基团的树脂可以是例如环氧基丙烯酸酯衍生物,具有缩水甘油基醚基团的商品环氧树脂等。
此外,在液体涂布组合物中按100重量份碳纳米管计,还可以加入1~30重量份的聚合物粘合剂,其中所述聚合物粘合剂是选自以下的粘合剂中的一种或多种:聚酯、聚碳酸酯、聚乙烯醇、聚乙烯醇缩丁醛、聚缩醛、多芳基化合物、聚酰胺、聚酰胺酰亚胺、聚醚酰亚胺、聚苯醚、聚苯硫醚、聚醚砜、聚醚酮、聚邻苯二甲酰胺、聚醚腈、聚苯并咪唑、聚碳二亚胺、聚硅氧烷、聚甲基丙烯酸甲酯、聚甲基丙烯酰胺、丁腈橡胶、丙烯橡胶(acryl rubber)、聚四氟乙烯、环氧树脂、酚树脂、三聚氰胺树脂、脲醛树脂、聚丁烯、聚戊烯、乙丙共聚物、三元乙丁共聚物、聚丁二烯、聚异戊二烯、三元乙丙共聚物、丁基橡胶、聚甲基戊烯、聚苯乙烯、苯乙烯-丁二烯共聚物、氢化苯乙烯-丁二烯共聚物、氢化聚异戊二烯、和氢化聚丁二烯。
除此之外,根据碳纳米管图案膜或聚合复合材料的最终用途,可以使用其他添加剂,包括染料、填料、阻燃剂和润湿剂。
然后,液体涂布组合物均均施用于基材表面上。基材的材质没有特别的限定,根据目的可以使用玻璃基材、硅基材或塑料基材。液体涂布组合物的施用可以通过本领域公知的任何通用涂覆法来完成,比如旋涂、浸涂、喷涂、流涂和丝网印刷,根据方便性与膜的均匀性,最优选旋涂。对于旋涂来说,基于液体涂布组合物的粘度与所所需的膜厚度,旋转速率确定为500~3500rpm。
为了通过光固化来制备负片图案,在涂布液体涂布组合物之后,在80~120℃,优选100℃下进行预烘焙1~2分钟以蒸发溶剂,使得涂膜沉积在基材上。紧接着,将涂膜经过具有所需图案的光掩膜曝光于紫外线,然后,如果需要的话,在70~120℃,优选100℃下进行1~3分钟的后固化。优选,把照射剂量控制在100~800mJ/cm2。在曝光时,在曝光的区域中,由光酸或光碱发生剂形成的酸或碱引起表面改性的碳纳米管的阳离子聚合,从而完成其表面上悬垂的环氧乙烷基团或酸酐基团之间的交联。从而使涂膜的暴露区域变成不可溶的,因此,与未曝光区域相比,它们很难溶于后面显影步骤所使用的任何显影剂中。曝光区域与未曝光区域之间的这种溶解性差别使得在显影后只有曝光区域保留在基材上,得到了所需的负片图案。
对于显影步骤来说,显影剂没有特别的限定,并且可以使用光蚀刻领域中通用的任何有机溶剂,但考虑到最终的图案膜的稳定性与均匀性,优选DMF、4-羟基-4-甲基-2-戊酮、乙二醇单乙醚和2-甲氧基乙醇。
或者,为了通过热固化来制备聚合的碳纳米管复合材料,涂有液体涂布组合物的基材或者在室温下静置24小时或更长时间,或者在100~150℃下热处理15~40分钟。
参考以下实施例可以更清楚地理解本发明。应当了解,以下实施例并不以任何方式限定本发明的范围。
制备例1
碳纳米管的纯化
在装有回流冷凝管的500毫升烧瓶中,使100毫克碳纳米管(ILJIN CNTAP级,Iljin Nanotech Co.,Ltd.,Korea)与50毫升蒸馏水在100℃下回流12小时。在过滤收集之后,将碳纳米管在60℃下干燥12小时并用甲苯洗涤,以除去残余的富勒烯。然后,收集剩余的碳黑并在470℃下加热20分钟,之后用大量6M HCl溶液洗涤,以得到不含金属杂质的碳纳米管。
制备例2
用羧基对纳米管进行表面改性
在装有硝酸与硫酸(7∶3(v/v))混合酸溶液的超声波仪中,将制备例1中得到的纯碳纳米管回流24小时。通过0.2μm聚碳酸酯过滤器过滤收集后,将碳纳米管在硝酸中于90℃下再次回流45小时。随后,在12000rpm下离心料浆,所得上清液通过0.1μm的聚碳酸酯过滤器过滤。通过过滤收集的碳纳米管在60℃下干燥12小时并分散在DMF中,之后通过0.1μm的聚碳酸酯过滤器过滤以分选粒度。
制备例3
用乙酰氯基团对碳纳米管进行表面改性
在火焰干燥的2颈Schlenk烧瓶中,在N2保护下,通过超声作用1小时而将制备例2得到的0.03g羧化碳纳米管均匀分散在20毫升DMF中。向该分散液中加入20毫升亚硫酰氯并将反应混合物在70℃下搅拌24小时。反应结束时,将反应混合物用无水THF稀释并离心分离。弃去所得棕色上清液,剩余的粒料用无水THF重复洗涤3次。经这样纯化得到的黑色固体物质在室温下进行真空干燥,得到乙酰氯化的碳纳米管。
制备例4
用环氧乙烷基团对碳纳米管进行表面改性
通过超声作用30分钟而将40毫克制备例3中得到的乙酰氯化的碳纳米管均匀分散在20毫升氯仿中,随后,向该分散液中加入4毫升吡啶和1毫升缩水甘油。然后把反应混合物回流搅拌48小时。反应结束时,将反应混合物用甲醇洗涤数次,以除去未反应的缩水甘油。所得黑色固体物质在室温下进行真空干燥,得到用缩水甘油基醚基团改性的碳纳米管。
制备例5
用酸酐基团对碳纳米管的表面进行改性
通过超声作用30分钟而将40毫克制备例3中得到的乙酰氯化的碳纳米管均匀分散在2毫升二甲基甲酰胺中。随后,向该分散液中加入10毫升吡啶和2克4-羟基邻苯二甲酸二甲酯。然后把反应混合物在70℃下搅拌18小时。反应结束时,将反应混合物用去离子水洗涤数次。之后向所得黑色固体物质中加入20毫升丙酮和0.2克溶于10毫升去离子水中的氢氧化钠,之后在60℃下搅拌18小时。反应结束时,将反应混合物依次用HCl水溶液、去离子水和乙酸乙酯洗涤,之后在室温下进行真空干燥。所得固体物质与5毫升乙酸及5毫升乙酸酐在125℃下反应8小时,之后用甲醇重复洗涤。经过这样纯化的固体物质在室温下进行真空干燥,得到用酸酐基团改性的碳纳米管。
实施例1
使用表面改性的碳纳米管形成负片图案(1)
使用由制备例4得到的用环氧乙烷基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例4的表面改性的碳纳米管光酸发生剂(五氟砷酸三苯基锍)溶剂(DMF) | 0.1克0.001克3.0克 |
在经超声作用1小时将各成分充分混合之后,通过在300rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为600J/cm2的紫外光下。紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为50μm的负片图案。
实施例2
使用表面改性的碳纳米管形成负片图案(2)
使用由制备例4得到的用环氧乙烷基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例4的表面改性的碳纳米管光酸发生剂(三氟砷酸三苯基锍)光酸发生剂(1-重氮-1-苯磺酰基-3,3-二甲基-2-丁酮)溶剂(DMF)溶剂(甲氧基丙基乙酸酯) | 0.1克0.0005克0.0005克2.0克1.0克 |
在经超声作用1小时将各成分充分混合之后,通过在500rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为600J/cm2的紫外光下,紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为50μm的负片图案。
实施例3
使用表面改性的碳纳米管形成负片图案(3)
使用由制备例4得到的用环氧乙烷基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例4的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)光酸发生剂(三氟砷酸三苯基锍)光酸发生剂(1-重氮-1-苯磺酰基-3,3-二甲基-2-丁酮)溶剂(DMF)溶剂(甲氧基丙基乙酸酯)溶剂(甲苯) | 0.01克0.15克0.0005克0.0005克1.5克1.0克0.5克 |
在经超声作用1小时将各成分充分混合之后,通过在500rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为600J/cm2的紫外光下,紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为40μm的负片图案。
实施例4
使用表面改性的碳纳米管形成负片图案(4)
使用由制备例4得到的用环氧乙烷基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例4的表面改性的碳纳米管聚合物粘合剂(聚乙烯醇:Mw=6000,水解度:80%)光碱发生剂(三氟甲磺酸三甲基二苯甲基铵)溶剂(DMF)溶剂(甲氧基丙基乙酸酯) | 0.01克0.15克0.001克1.5克1.0克 |
在经超声作用1小时将各成分充分混合之后,通过在400rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为600J/cm2的紫外光下,紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为50μm的负片图案。
实施例5
使用表面改性的碳纳米管形成负片图案(5)
使用由制备例5得到的用酸酐基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例5的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)光酸发生剂(三氟甲磺酸三苯基锍)光酸发生剂(1-重氮-1-苯磺酰基-3,3-二甲基-2-丁酮)溶剂(DMF)溶剂(甲氧基丙基乙酸酯) | 0.01克0.15克0.0005克0.0005克1.5克1.0克 |
在经超声作用1小时将各成分充分混合之后,通过在500rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为400J/cm2的紫外光下,紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为60μm的负片图案。
实施例6
使用表面改性的碳纳米管形成负片图案(6)
使用由制备例5得到的用酸酐基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例5的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)光酸发生剂(2,2′,4,4′-四(2,2,2-三氟乙磺酰氧基)二苯甲酮)光增强剂(异丙基噻吨酮)溶剂(DMF)溶剂(甲氧基丙基乙酸酯) | 0.01克0.15克0.001克0.0002克1.5克1.0克 |
在经超声作用1小时将各成分充分混合之后,通过在400rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为400J/cm2的紫外光下。紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为70μm的负片图案。
实施例7
使用表面改性的碳纳米管形成负片图案(7)
同时使用由制备例4得到的用环氧乙烷基团改性的碳纳米管和由制备例5得到的用酸酐基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例4的表面改性的碳纳米管来自于制备例5的表面改性的碳纳米管聚合物粘合剂(聚乙烯醇:Mw=6000,水解度:80%)光酸发生剂(1,2,3-三(对氟苯磺酰氧基)苯)溶剂(DMF)溶剂(甲氧基丙基乙酸酯) | 0.01克0.01克0.3克0.001克2.5克1.0克 |
在经超声作用1小时将各成分充分混合之后,通过在500rpm下进行旋涂而将液体涂布组合物施用于硅片上,之后在100℃下干燥1分钟以蒸发溶剂。所得涂膜上掩盖具有所需图案的光掩膜,然后暴露于照射剂量为500J/cm2的紫外光下。紧接着,将曝光后的膜在100℃下进行后固化2分钟,并用DMF显影20秒,得到线长为60μm的负片图案。
实施例8
使用表面改性的碳纳米管形成碳纳米管复合材料(1)
使用由制备例4得到的用环氧乙烷基团改性的碳纳米管制备具有如下组成的液体涂布组合物:
来自于制备例4的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)固化剂(乙二胺)溶剂(甲苯)溶剂(DMF) | 0.01克1.0克0.002克9.0克1.0克 |
在经超声作用1小时将各成分充分混合之后,将液体涂布组合物施用于用于铸膜的玻璃皿中(直径100mm,高度10mm)。将涂敷过的皿在80℃下置留3天以蒸发溶剂。因此得到厚度为0.4mm的碳纳米管复合材料试片,其机械性能列于下表1。
实施例9
使用表面改性的碳纳米管形成碳纳米管复合材料(2)
以实施例8相同的方式进行实施例9的步骤,不同之处是将液体涂布组合物变为以下所述:
来自于制备例4的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)固化剂(乙二胺)溶剂(甲苯)溶剂(DMF) | 0.02克1.0克0.002克9.0克1.0克 |
所得试片的机械性能示于下表1。
实施例10
使用表面改性的碳纳米管形成碳纳米管复合材料(3)
以实施例8相同的方式进行实施例10的步骤,不同之处是将液体涂布组合物变为以下所述:
来自于制备例4的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)固化剂(乙二胺) | 0.05克1.0克0.002克 |
溶剂(甲苯)溶剂(DMF) | 9.0克1.0克 |
所得试片的机械性能示于下表1。
对比例1
使用表面改性的碳纳米管形成碳纳米管复合材料(4)
以实施例8相同的方式进行对比例1的步骤,不同之处是将液体涂布组合物变为以下所述:
来自于制备例2的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)固化剂(乙二胺)溶剂(甲苯)溶剂(DMF) | 0.01克1.0克0.002克9.0克1.0克 |
所得试片的机械性能示于下表1。
对比例2
使用表面改性的碳纳米管形成碳纳米管复合材料(5)
以实施例8相同的方式进行对比例2的步骤,不同之处是将液体涂布组合物变为以下所述:
来自于制备例2的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)固化剂(乙二胺)溶剂(甲苯)溶剂(DMF) | 0.02克1.0克0.002克9.0克1.0克 |
所得试片的机械性能示于下表1。
对比例3
使用表面改性的碳纳米管形成碳纳米管复合材料(6)
以实施例8相同的方式进行对比例3的步骤,不同之处是将液体涂布组合物变为以下所述:
来自于制备例2的表面改性的碳纳米管聚合物粘合剂(聚苯乙烯:Mw=5000)固化剂(乙二胺)溶剂(甲苯) | 0.05克1.0克0.002克9.0克 |
溶剂(DMF) | 1.0克 |
所得试片的机械性能示于下表1。
表1:碳纳米管复合材料的机械性能
# | *弹性模量(Mpa) | **拉伸强度(Mpa) |
实施例8 | 2300±110 | 25.3±1.5 |
实施例9 | 2900±120 | 28.3±1.2 |
实施例10 | 3700±150 | 32.5±1.7 |
对比例1 | 2000±250 | 22.5±2.3 |
对比例2 | 2500±205 | 24.7±2.1 |
对比例3 | 3200±210 | 27.8±2.5 |
空白聚苯乙烯 | 1480±150 | 18.5±2.1 |
*根据ASTM R1876-99使用AGS-100G(SHIMADZU ScientificInstrμments Inc.,USA)测定
**根据ASTM D882-97使用AGS-100G(SHIMADZU ScientificInstrμments Inc.,USA)测定
如表1所示,与通过将碳纳米管与聚合物粘合剂共混得到的传统复合材料相比,由表面改性的碳纳米管热聚合得到的本发明的碳纳米管复合材料在机械强度方面显示出约10%或更多的增加。这些结果表明,在碳纳米管之间以及在碳纳米管与聚合物粘合剂之间形成的互穿聚合物网络对于提高本发明碳纳米管复合材料的机械性能极其有用。
本领域技术人员将可很容易地对本发明进行简单的改性和改变,并且应当理解,所有这些改性和改变均包括在本发明的范围之内。
Claims (16)
2.根据权利要求1的方法,其中所述液体涂布组合物包括3~95wt%的碳纳米管和以100重量份碳纳米管计0.1~15重量份的光酸或光碱发生剂。
3.根据权利要求1的方法,其中所述液体涂布组合物还包含以100重量份碳纳米管计0.3~2重量份的光增强剂,其中所述光增强剂为选自下列的一种或多种:2-乙基-9,10-二甲氧基蒽、9,10-二氯蒽、1-氯蒽、2-甲基蒽、9-甲基蒽、2-叔丁基蒽、蒽、1,2-苯并蒽、1,2,3,4-二苯并蒽、1,2,5,6-二苯并蒽、1,2,7,8-二苯并蒽、9,10-二甲氧基二甲基蒽、2-乙基-9,10-二甲氧基蒽、N-甲基吩噻嗪和异丙基噻吨酮。
4.根据权利要求1的方法,其中所述用于步骤(a)中的有机溶剂为选自下列的一种或多种:二甲基甲酰胺、4-羟基-4-甲基-2-戊酮、乙二醇单乙醚、2-甲氧基乙醇、甲氧基丙基乙酸酯、乙基-3-乙氧基丙酸酯和环己酮。
5.根据权利要求1的方法,其中所述液体涂布组合物按100重量份的碳纳米管计,还包含0.1~10重量份的偶联剂,其中该偶联剂为选自下列的一种或多种:氨基丙基三乙氧基硅烷、苯基氨基丙基三甲氧基硅烷、脲基丙基三乙氧基硅烷、环氧丙氧丙基三甲氧基硅烷、异氰酸根合丙基三乙氧基硅烷、异丙基三异硬脂酰基钛酸酯和二异丙醇乙酰基烷氧基铝。
6.根据权利要求1的方法,其中所述液体涂布组合物按100重量份的碳纳米管计,还包含1~95重量份的含环氧乙烷基团的单体、低聚物或聚合物,和/或含酸酐基团的单体、低聚物或聚合物。
7.根据权利要求1的方法,其中所述液体涂布组合物按100重量份的碳纳米管计,还包含1~30重量份的聚合物粘合剂,其中该聚合物粘合剂为选自下列的一种或多种:聚酯、聚碳酸酯、聚乙烯醇、聚乙烯醇缩丁醛、聚缩醛、多芳基化合物、聚酰胺、聚酰胺酰亚胺、聚醚酰亚胺、聚苯醚、聚苯硫醚、聚醚砜、聚醚酮、聚邻苯二甲酰胺、聚醚腈、聚苯并咪唑、聚碳二亚胺、聚硅氧烷、聚甲基丙烯酸甲酯、聚甲基丙烯酰胺、丁腈橡胶、丙烯橡胶、聚四氟乙烯、环氧树脂、酚树脂、三聚氰胺树脂、脲醛树脂、聚丁烯、聚戊烯、乙丙共聚物、三元乙丁共聚物、聚丁二烯、聚异戊二烯、三元乙丙共聚物、丁基橡胶、聚甲基戊烯、聚苯乙烯、苯乙烯-丁二烯共聚物、氢化苯乙烯-丁二烯共聚物、氢化聚异戊二烯和氢化聚丁二烯。
8.根据权利要求1的方法,其中该方法还包括在步骤(c)之后对曝光的涂膜进行后固化的步骤。
10.根据权利要求9的方法,其中所述液体涂布组合物包含3~95wt%的碳纳米管和以100重量份的碳纳米管计1~35重量份的热固化剂。
11.根据权利要求9的方法,其中用于所述步骤(a)中的有机溶剂为选自下列的一种或多种:二甲基甲酰胺、4-羟基-4-甲基-2-戊酮、乙二醇单乙醚、2-甲氧基乙醇、甲氧基丙基乙酸酯、乙基-3-乙氧基丙酸酯和环己酮。
12.根据权利要求9的方法,其中所述液体涂布组合物按100重量份的碳纳米管计,还包含0.1~10重量份的偶联剂,其中该偶联剂为选自下列的一种或多种:氨基丙基三乙氧基硅烷、苯基氨基丙基三甲氧基硅烷、脲基丙基三乙氧基硅烷、环氧丙氧丙基三甲氧基硅烷、异氰酸根合丙基三乙氧基硅烷、异丙基三异硬脂酰基钛酸酯和二异丙醇乙酰基烷氧基铝。
13.根据权利要求9的方法,其中所述液体涂布组合物按100重量份的碳纳米管计,还包含1~95重量份的含环氧乙烷基团的单体、低聚物或聚合物,和/或含酸酐基团的单体、低聚物或聚合物。
14.根据权利要求9的方法,其中所述液体涂布组合物按100重量份的碳纳米管计,还包含1~30重量份的聚合物粘合剂,其中所述聚合物粘合剂为选自下列的一种或多种:聚酯、聚碳酸酯、聚乙烯醇、聚乙烯醇缩丁醛、聚缩醛、多芳基化合物、聚酰胺、聚酰胺酰亚胺、聚醚酰亚胺、聚苯醚、聚苯硫醚、聚醚砜、聚醚酮、聚邻苯二甲酰胺、聚醚腈、聚苯并咪唑、聚碳二亚胺、聚硅氧烷、聚甲基丙烯酸甲酯、聚甲基丙烯酰胺、丁腈橡胶、丙烯橡胶、聚四氟乙烯、环氧树脂、酚树脂、三聚氰胺树脂、脲醛树脂、聚丁烯、聚戊烯、乙丙共聚物、三元乙丁共聚物、聚丁二烯、聚异戊二烯、三元乙丙共聚物、丁基橡胶、聚甲基戊烯、聚苯乙烯、苯乙烯-丁二烯共聚物、氢化苯乙烯-丁二烯共聚物、氢化聚异戊二烯、和氢化聚丁二烯。
15.一种碳纳米管负片图案,其是根据权利要求1的方法制备的。
16.一种聚合的碳纳米管复合材料,其是根据权利要求9的方法制备的。
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US8383317B2 (en) | 2013-02-26 |
EP1457821B1 (en) | 2014-01-01 |
US20100159219A1 (en) | 2010-06-24 |
KR100947702B1 (ko) | 2010-03-16 |
EP2166412B1 (en) | 2019-01-16 |
US8211957B2 (en) | 2012-07-03 |
US20080153991A1 (en) | 2008-06-26 |
JP2009093186A (ja) | 2009-04-30 |
US20040265755A1 (en) | 2004-12-30 |
EP2166412A1 (en) | 2010-03-24 |
JP2004255564A (ja) | 2004-09-16 |
CN1530404A (zh) | 2004-09-22 |
US7229747B2 (en) | 2007-06-12 |
JP4270452B2 (ja) | 2009-06-03 |
EP1457821A1 (en) | 2004-09-15 |
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