|
SE509200C2
(sv)
*
|
1994-05-16 |
1998-12-14 |
Goesta Ullmark |
Anordning för användning vid transplantation av benvävnadsmaterial i ett hålrum i ben
|
|
US5618347A
(en)
*
|
1995-04-14 |
1997-04-08 |
Kimberly-Clark Corporation |
Apparatus for spraying adhesive
|
|
US6037009A
(en)
*
|
1995-04-14 |
2000-03-14 |
Kimberly-Clark Worldwide, Inc. |
Method for spraying adhesive
|
|
US5782980A
(en)
*
|
1996-05-14 |
1998-07-21 |
Advanced Micro Devices, Inc. |
Low pressure chemical vapor deposition apparatus including a process gas heating subsystem
|
|
JP3967424B2
(ja)
*
|
1997-04-30 |
2007-08-29 |
東京エレクトロン株式会社 |
真空処理装置及び圧力調整方法
|
|
US5966499A
(en)
*
|
1997-07-28 |
1999-10-12 |
Mks Instruments, Inc. |
System for delivering a substantially constant vapor flow to a chemical process reactor
|
|
US6296711B1
(en)
|
1998-04-14 |
2001-10-02 |
Cvd Systems, Inc. |
Film processing system
|
|
US6136725A
(en)
*
|
1998-04-14 |
2000-10-24 |
Cvd Systems, Inc. |
Method for chemical vapor deposition of a material on a substrate
|
|
AU1218401A
(en)
*
|
1999-10-20 |
2001-04-30 |
Cvd Systems, Inc. |
Fluid processing system
|
|
DE10005820C1
(de)
*
|
2000-02-10 |
2001-08-02 |
Schott Glas |
Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks
|
|
FR2812665B1
(fr)
*
|
2000-08-01 |
2003-08-08 |
Sidel Sa |
Procede de depot de revetement par plasma, dispositif de mise en oeuvre du procede et revetement obtenu par un tel procede
|
|
KR100419416B1
(ko)
*
|
2001-11-21 |
2004-02-19 |
삼성전자주식회사 |
변형 화학기상 증착 공정의 원료물질 제어장치
|
|
KR100450974B1
(ko)
*
|
2001-12-06 |
2004-10-02 |
삼성전자주식회사 |
변형 화학기상 증착 공정의 원료물질 기화량 유지장치
|
|
US7030042B2
(en)
|
2002-08-28 |
2006-04-18 |
Micron Technology, Inc. |
Systems and methods for forming tantalum oxide layers and tantalum precursor compounds
|
|
US6784049B2
(en)
*
|
2002-08-28 |
2004-08-31 |
Micron Technology, Inc. |
Method for forming refractory metal oxide layers with tetramethyldisiloxane
|
|
US20050271893A1
(en)
*
|
2004-06-04 |
2005-12-08 |
Applied Microstructures, Inc. |
Controlled vapor deposition of multilayered coatings adhered by an oxide layer
|
|
US20040261703A1
(en)
*
|
2003-06-27 |
2004-12-30 |
Jeffrey D. Chinn |
Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
|
|
US9725805B2
(en)
*
|
2003-06-27 |
2017-08-08 |
Spts Technologies Limited |
Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
|
|
US7638167B2
(en)
*
|
2004-06-04 |
2009-12-29 |
Applied Microstructures, Inc. |
Controlled deposition of silicon-containing coatings adhered by an oxide layer
|
|
JP2005082880A
(ja)
*
|
2003-09-11 |
2005-03-31 |
Shoka Kagi Kofun Yugenkoshi |
有機ｅｌ発光装置の成膜設備
|
|
KR100589053B1
(ko)
*
|
2003-10-15 |
2006-06-12 |
삼성전자주식회사 |
소스 공급 장치, 소스 공급 방법 및 이를 이용한 원자층증착 방법
|
|
US20060207503A1
(en)
*
|
2005-03-18 |
2006-09-21 |
Paul Meneghini |
Vaporizer and method of vaporizing a liquid for thin film delivery
|
|
US20060060139A1
(en)
*
|
2004-04-12 |
2006-03-23 |
Mks Instruments, Inc. |
Precursor gas delivery with carrier gas mixing
|
|
US7879396B2
(en)
*
|
2004-06-04 |
2011-02-01 |
Applied Microstructures, Inc. |
High aspect ratio performance coatings for biological microfluidics
|
|
KR100773567B1
(ko)
|
2006-07-06 |
2007-11-07 |
세메스 주식회사 |
증착물질 공급 장치
|
|
US8900695B2
(en)
*
|
2007-02-23 |
2014-12-02 |
Applied Microstructures, Inc. |
Durable conformal wear-resistant carbon-doped metal oxide-comprising coating
|
|
US8236379B2
(en)
*
|
2007-04-02 |
2012-08-07 |
Applied Microstructures, Inc. |
Articles with super-hydrophobic and-or super-hydrophilic surfaces and method of formation
|
|
US20080248263A1
(en)
*
|
2007-04-02 |
2008-10-09 |
Applied Microstructures, Inc. |
Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby
|
|
JP5410235B2
(ja)
*
|
2009-10-15 |
2014-02-05 |
小島プレス工業株式会社 |
有機高分子薄膜の形成方法及び形成装置
|
|
US20130023129A1
(en)
|
2011-07-20 |
2013-01-24 |
Asm America, Inc. |
Pressure transmitter for a semiconductor processing environment
|
|
TWI458843B
(zh)
*
|
2011-10-06 |
2014-11-01 |
Ind Tech Res Inst |
蒸鍍裝置與有機薄膜的形成方法
|
|
US10714315B2
(en)
|
2012-10-12 |
2020-07-14 |
Asm Ip Holdings B.V. |
Semiconductor reaction chamber showerhead
|
|
US20160376700A1
(en)
|
2013-02-01 |
2016-12-29 |
Asm Ip Holding B.V. |
System for treatment of deposition reactor
|
|
KR102111020B1
(ko)
*
|
2013-05-02 |
2020-05-15 |
삼성디스플레이 주식회사 |
증착 장치
|
|
JP5859586B2
(ja)
*
|
2013-12-27 |
2016-02-10 |
株式会社日立国際電気 |
基板処理システム、半導体装置の製造方法および記録媒体
|
|
US11015245B2
(en)
|
2014-03-19 |
2021-05-25 |
Asm Ip Holding B.V. |
Gas-phase reactor and system having exhaust plenum and components thereof
|
|
US10858737B2
(en)
|
2014-07-28 |
2020-12-08 |
Asm Ip Holding B.V. |
Showerhead assembly and components thereof
|
|
US10941490B2
(en)
|
2014-10-07 |
2021-03-09 |
Asm Ip Holding B.V. |
Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
|
|
JP2016134569A
(ja)
*
|
2015-01-21 |
2016-07-25 |
株式会社東芝 |
半導体製造装置
|
|
US10276355B2
(en)
|
2015-03-12 |
2019-04-30 |
Asm Ip Holding B.V. |
Multi-zone reactor, system including the reactor, and method of using the same
|
|
US10458018B2
(en)
|
2015-06-26 |
2019-10-29 |
Asm Ip Holding B.V. |
Structures including metal carbide material, devices including the structures, and methods of forming same
|
|
US10211308B2
(en)
|
2015-10-21 |
2019-02-19 |
Asm Ip Holding B.V. |
NbMC layers
|
|
US11139308B2
(en)
|
2015-12-29 |
2021-10-05 |
Asm Ip Holding B.V. |
Atomic layer deposition of III-V compounds to form V-NAND devices
|
|
US10529554B2
(en)
|
2016-02-19 |
2020-01-07 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
|
|
US10343920B2
(en)
|
2016-03-18 |
2019-07-09 |
Asm Ip Holding B.V. |
Aligned carbon nanotubes
|
|
US10367080B2
(en)
|
2016-05-02 |
2019-07-30 |
Asm Ip Holding B.V. |
Method of forming a germanium oxynitride film
|
|
US11453943B2
(en)
|
2016-05-25 |
2022-09-27 |
Asm Ip Holding B.V. |
Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
|
|
US9859151B1
(en)
|
2016-07-08 |
2018-01-02 |
Asm Ip Holding B.V. |
Selective film deposition method to form air gaps
|
|
US10612137B2
(en)
|
2016-07-08 |
2020-04-07 |
Asm Ip Holdings B.V. |
Organic reactants for atomic layer deposition
|
|
US9887082B1
(en)
|
2016-07-28 |
2018-02-06 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
|
US9812320B1
(en)
|
2016-07-28 |
2017-11-07 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
|
KR102532607B1
(ko)
|
2016-07-28 |
2023-05-15 |
에이에스엠 아이피 홀딩 비.브이. |
기판 가공 장치 및 그 동작 방법
|
|
US11532757B2
(en)
|
2016-10-27 |
2022-12-20 |
Asm Ip Holding B.V. |
Deposition of charge trapping layers
|
|
US10714350B2
(en)
|
2016-11-01 |
2020-07-14 |
ASM IP Holdings, B.V. |
Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
|
KR102546317B1
(ko)
|
2016-11-15 |
2023-06-21 |
에이에스엠 아이피 홀딩 비.브이. |
기체 공급 유닛 및 이를 포함하는 기판 처리 장치
|
|
KR102762543B1
(ko)
|
2016-12-14 |
2025-02-05 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
US11581186B2
(en)
|
2016-12-15 |
2023-02-14 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus
|
|
US11447861B2
(en)
*
|
2016-12-15 |
2022-09-20 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
|
KR102700194B1
(ko)
|
2016-12-19 |
2024-08-28 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
US10269558B2
(en)
|
2016-12-22 |
2019-04-23 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
|
US11390950B2
(en)
|
2017-01-10 |
2022-07-19 |
Asm Ip Holding B.V. |
Reactor system and method to reduce residue buildup during a film deposition process
|
|
US10468261B2
(en)
|
2017-02-15 |
2019-11-05 |
Asm Ip Holding B.V. |
Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
|
|
US10529563B2
(en)
|
2017-03-29 |
2020-01-07 |
Asm Ip Holdings B.V. |
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
|
|
US10770286B2
(en)
|
2017-05-08 |
2020-09-08 |
Asm Ip Holdings B.V. |
Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
|
|
US12040200B2
(en)
|
2017-06-20 |
2024-07-16 |
Asm Ip Holding B.V. |
Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
|
|
US11306395B2
(en)
|
2017-06-28 |
2022-04-19 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
|
|
KR20190009245A
(ko)
|
2017-07-18 |
2019-01-28 |
에이에스엠 아이피 홀딩 비.브이. |
반도체 소자 구조물 형성 방법 및 관련된 반도체 소자 구조물
|
|
US11374112B2
(en)
|
2017-07-19 |
2022-06-28 |
Asm Ip Holding B.V. |
Method for depositing a group IV semiconductor and related semiconductor device structures
|
|
US11018002B2
(en)
|
2017-07-19 |
2021-05-25 |
Asm Ip Holding B.V. |
Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
|
|
US10541333B2
(en)
|
2017-07-19 |
2020-01-21 |
Asm Ip Holding B.V. |
Method for depositing a group IV semiconductor and related semiconductor device structures
|
|
US10590535B2
(en)
|
2017-07-26 |
2020-03-17 |
Asm Ip Holdings B.V. |
Chemical treatment, deposition and/or infiltration apparatus and method for using the same
|
|
TWI815813B
(zh)
|
2017-08-04 |
2023-09-21 |
荷蘭商Ａｓｍ智慧財產控股公司 |
用於分配反應腔內氣體的噴頭總成
|
|
US10692741B2
(en)
|
2017-08-08 |
2020-06-23 |
Asm Ip Holdings B.V. |
Radiation shield
|
|
US10770336B2
(en)
|
2017-08-08 |
2020-09-08 |
Asm Ip Holding B.V. |
Substrate lift mechanism and reactor including same
|
|
US11769682B2
(en)
|
2017-08-09 |
2023-09-26 |
Asm Ip Holding B.V. |
Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
|
|
US11139191B2
(en)
|
2017-08-09 |
2021-10-05 |
Asm Ip Holding B.V. |
Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
|
|
US11830730B2
(en)
|
2017-08-29 |
2023-11-28 |
Asm Ip Holding B.V. |
Layer forming method and apparatus
|
|
US11056344B2
(en)
|
2017-08-30 |
2021-07-06 |
Asm Ip Holding B.V. |
Layer forming method
|
|
US11295980B2
(en)
|
2017-08-30 |
2022-04-05 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
|
|
KR102491945B1
(ko)
|
2017-08-30 |
2023-01-26 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
US10658205B2
(en)
|
2017-09-28 |
2020-05-19 |
Asm Ip Holdings B.V. |
Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
|
|
US10403504B2
(en)
|
2017-10-05 |
2019-09-03 |
Asm Ip Holding B.V. |
Method for selectively depositing a metallic film on a substrate
|
|
US10923344B2
(en)
|
2017-10-30 |
2021-02-16 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor structure and related semiconductor structures
|
|
US11022879B2
(en)
|
2017-11-24 |
2021-06-01 |
Asm Ip Holding B.V. |
Method of forming an enhanced unexposed photoresist layer
|
|
CN111316417B
(zh)
|
2017-11-27 |
2023-12-22 |
阿斯莫Ip控股公司 |
与批式炉偕同使用的用于储存晶圆匣的储存装置
|
|
JP7206265B2
(ja)
|
2017-11-27 |
2023-01-17 |
エーエスエム アイピー ホールディング ビー．ブイ． |
クリーン・ミニエンバイロメントを備える装置
|
|
US10872771B2
(en)
|
2018-01-16 |
2020-12-22 |
Asm Ip Holding B. V. |
Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
|
|
TWI852426B
(zh)
|
2018-01-19 |
2024-08-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
沈積方法
|
|
CN111630203A
(zh)
|
2018-01-19 |
2020-09-04 |
Asm Ip私人控股有限公司 |
通过等离子体辅助沉积来沉积间隙填充层的方法
|
|
US11081345B2
(en)
|
2018-02-06 |
2021-08-03 |
Asm Ip Holding B.V. |
Method of post-deposition treatment for silicon oxide film
|
|
JP7124098B2
(ja)
|
2018-02-14 |
2022-08-23 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
周期的堆積プロセスにより基材上にルテニウム含有膜を堆積させる方法
|
|
US10896820B2
(en)
|
2018-02-14 |
2021-01-19 |
Asm Ip Holding B.V. |
Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
|
|
US10731249B2
(en)
|
2018-02-15 |
2020-08-04 |
Asm Ip Holding B.V. |
Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
|
|
KR102636427B1
(ko)
|
2018-02-20 |
2024-02-13 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 방법 및 장치
|
|
US10975470B2
(en)
|
2018-02-23 |
2021-04-13 |
Asm Ip Holding B.V. |
Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
|
|
US11473195B2
(en)
|
2018-03-01 |
2022-10-18 |
Asm Ip Holding B.V. |
Semiconductor processing apparatus and a method for processing a substrate
|
|
US11629406B2
(en)
|
2018-03-09 |
2023-04-18 |
Asm Ip Holding B.V. |
Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
|
|
US11114283B2
(en)
|
2018-03-16 |
2021-09-07 |
Asm Ip Holding B.V. |
Reactor, system including the reactor, and methods of manufacturing and using same
|
|
KR102646467B1
(ko)
|
2018-03-27 |
2024-03-11 |
에이에스엠 아이피 홀딩 비.브이. |
기판 상에 전극을 형성하는 방법 및 전극을 포함하는 반도체 소자 구조
|
|
US11088002B2
(en)
|
2018-03-29 |
2021-08-10 |
Asm Ip Holding B.V. |
Substrate rack and a substrate processing system and method
|
|
US11230766B2
(en)
|
2018-03-29 |
2022-01-25 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
KR102600229B1
(ko)
|
2018-04-09 |
2023-11-10 |
에이에스엠 아이피 홀딩 비.브이. |
기판 지지 장치, 이를 포함하는 기판 처리 장치 및 기판 처리 방법
|
|
TWI811348B
(zh)
|
2018-05-08 |
2023-08-11 |
荷蘭商Ａｓｍ 智慧財產控股公司 |
藉由循環沉積製程於基板上沉積氧化物膜之方法及相關裝置結構
|
|
US12025484B2
(en)
|
2018-05-08 |
2024-07-02 |
Asm Ip Holding B.V. |
Thin film forming method
|
|
US12272527B2
(en)
|
2018-05-09 |
2025-04-08 |
Asm Ip Holding B.V. |
Apparatus for use with hydrogen radicals and method of using same
|
|
KR102596988B1
(ko)
|
2018-05-28 |
2023-10-31 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 방법 및 그에 의해 제조된 장치
|
|
TWI840362B
(zh)
|
2018-06-04 |
2024-05-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
水氣降低的晶圓處置腔室
|
|
US11718913B2
(en)
|
2018-06-04 |
2023-08-08 |
Asm Ip Holding B.V. |
Gas distribution system and reactor system including same
|
|
US11286562B2
(en)
|
2018-06-08 |
2022-03-29 |
Asm Ip Holding B.V. |
Gas-phase chemical reactor and method of using same
|
|
US10797133B2
(en)
|
2018-06-21 |
2020-10-06 |
Asm Ip Holding B.V. |
Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
|
|
KR102568797B1
(ko)
|
2018-06-21 |
2023-08-21 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 시스템
|
|
JP7674105B2
(ja)
|
2018-06-27 |
2025-05-09 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
金属含有材料ならびに金属含有材料を含む膜および構造体を形成するための周期的堆積方法
|
|
CN112292477A
(zh)
|
2018-06-27 |
2021-01-29 |
Asm Ip私人控股有限公司 |
用于形成含金属的材料的循环沉积方法及包含含金属的材料的膜和结构
|
|
US10612136B2
(en)
|
2018-06-29 |
2020-04-07 |
ASM IP Holding, B.V. |
Temperature-controlled flange and reactor system including same
|
|
US10388513B1
(en)
|
2018-07-03 |
2019-08-20 |
Asm Ip Holding B.V. |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
|
|
US10755922B2
(en)
|
2018-07-03 |
2020-08-25 |
Asm Ip Holding B.V. |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
|
|
US11053591B2
(en)
|
2018-08-06 |
2021-07-06 |
Asm Ip Holding B.V. |
Multi-port gas injection system and reactor system including same
|
|
US11430674B2
(en)
|
2018-08-22 |
2022-08-30 |
Asm Ip Holding B.V. |
Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
|
|
KR102707956B1
(ko)
|
2018-09-11 |
2024-09-19 |
에이에스엠 아이피 홀딩 비.브이. |
박막 증착 방법
|
|
US11024523B2
(en)
|
2018-09-11 |
2021-06-01 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
US11049751B2
(en)
|
2018-09-14 |
2021-06-29 |
Asm Ip Holding B.V. |
Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
|
|
CN110970344B
(zh)
|
2018-10-01 |
2024-10-25 |
Asmip控股有限公司 |
衬底保持设备、包含所述设备的系统及其使用方法
|
|
US11232963B2
(en)
|
2018-10-03 |
2022-01-25 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
KR102592699B1
(ko)
|
2018-10-08 |
2023-10-23 |
에이에스엠 아이피 홀딩 비.브이. |
기판 지지 유닛 및 이를 포함하는 박막 증착 장치와 기판 처리 장치
|
|
KR102605121B1
(ko)
|
2018-10-19 |
2023-11-23 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치 및 기판 처리 방법
|
|
KR102546322B1
(ko)
|
2018-10-19 |
2023-06-21 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치 및 기판 처리 방법
|
|
USD948463S1
(en)
|
2018-10-24 |
2022-04-12 |
Asm Ip Holding B.V. |
Susceptor for semiconductor substrate supporting apparatus
|
|
US12378665B2
(en)
|
2018-10-26 |
2025-08-05 |
Asm Ip Holding B.V. |
High temperature coatings for a preclean and etch apparatus and related methods
|
|
US11087997B2
(en)
|
2018-10-31 |
2021-08-10 |
Asm Ip Holding B.V. |
Substrate processing apparatus for processing substrates
|
|
KR102748291B1
(ko)
|
2018-11-02 |
2024-12-31 |
에이에스엠 아이피 홀딩 비.브이. |
기판 지지 유닛 및 이를 포함하는 기판 처리 장치
|
|
US11572620B2
(en)
|
2018-11-06 |
2023-02-07 |
Asm Ip Holding B.V. |
Methods for selectively depositing an amorphous silicon film on a substrate
|
|
US11031242B2
(en)
|
2018-11-07 |
2021-06-08 |
Asm Ip Holding B.V. |
Methods for depositing a boron doped silicon germanium film
|
|
US10818758B2
(en)
|
2018-11-16 |
2020-10-27 |
Asm Ip Holding B.V. |
Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
|
|
US10847366B2
(en)
|
2018-11-16 |
2020-11-24 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
|
|
US12040199B2
(en)
|
2018-11-28 |
2024-07-16 |
Asm Ip Holding B.V. |
Substrate processing apparatus for processing substrates
|
|
US11217444B2
(en)
|
2018-11-30 |
2022-01-04 |
Asm Ip Holding B.V. |
Method for forming an ultraviolet radiation responsive metal oxide-containing film
|
|
KR102636428B1
(ko)
|
2018-12-04 |
2024-02-13 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치를 세정하는 방법
|
|
US11158513B2
(en)
|
2018-12-13 |
2021-10-26 |
Asm Ip Holding B.V. |
Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
|
|
TWI874340B
(zh)
|
2018-12-14 |
2025-03-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
形成裝置結構之方法、其所形成之結構及施行其之系統
|
|
TWI866480B
(zh)
|
2019-01-17 |
2024-12-11 |
荷蘭商Ａｓｍ Ｉｐ 私人控股有限公司 |
藉由循環沈積製程於基板上形成含過渡金屬膜之方法
|
|
KR102727227B1
(ko)
|
2019-01-22 |
2024-11-07 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
CN111524788B
(zh)
|
2019-02-01 |
2023-11-24 |
Asm Ip私人控股有限公司 |
氧化硅的拓扑选择性膜形成的方法
|
|
KR102638425B1
(ko)
|
2019-02-20 |
2024-02-21 |
에이에스엠 아이피 홀딩 비.브이. |
기판 표면 내에 형성된 오목부를 충진하기 위한 방법 및 장치
|
|
US11482533B2
(en)
|
2019-02-20 |
2022-10-25 |
Asm Ip Holding B.V. |
Apparatus and methods for plug fill deposition in 3-D NAND applications
|
|
JP7509548B2
(ja)
|
2019-02-20 |
2024-07-02 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
基材表面内に形成された凹部を充填するための周期的堆積方法および装置
|
|
KR102626263B1
(ko)
|
2019-02-20 |
2024-01-16 |
에이에스엠 아이피 홀딩 비.브이. |
처리 단계를 포함하는 주기적 증착 방법 및 이를 위한 장치
|
|
TWI842826B
(zh)
|
2019-02-22 |
2024-05-21 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
基材處理設備及處理基材之方法
|
|
US11742198B2
(en)
|
2019-03-08 |
2023-08-29 |
Asm Ip Holding B.V. |
Structure including SiOCN layer and method of forming same
|
|
KR102782593B1
(ko)
|
2019-03-08 |
2025-03-14 |
에이에스엠 아이피 홀딩 비.브이. |
SiOC 층을 포함한 구조체 및 이의 형성 방법
|
|
KR102858005B1
(ko)
|
2019-03-08 |
2025-09-09 |
에이에스엠 아이피 홀딩 비.브이. |
실리콘 질화물 층을 선택적으로 증착하는 방법, 및 선택적으로 증착된 실리콘 질화물 층을 포함하는 구조체
|
|
KR20200116033A
(ko)
|
2019-03-28 |
2020-10-08 |
에이에스엠 아이피 홀딩 비.브이. |
도어 개방기 및 이를 구비한 기판 처리 장치
|
|
KR102809999B1
(ko)
|
2019-04-01 |
2025-05-19 |
에이에스엠 아이피 홀딩 비.브이. |
반도체 소자를 제조하는 방법
|
|
US11447864B2
(en)
|
2019-04-19 |
2022-09-20 |
Asm Ip Holding B.V. |
Layer forming method and apparatus
|
|
KR20200125453A
(ko)
|
2019-04-24 |
2020-11-04 |
에이에스엠 아이피 홀딩 비.브이. |
기상 반응기 시스템 및 이를 사용하는 방법
|
|
KR20200130121A
(ko)
|
2019-05-07 |
2020-11-18 |
에이에스엠 아이피 홀딩 비.브이. |
딥 튜브가 있는 화학물질 공급원 용기
|
|
KR102869364B1
(ko)
|
2019-05-07 |
2025-10-10 |
에이에스엠 아이피 홀딩 비.브이. |
비정질 탄소 중합체 막을 개질하는 방법
|
|
KR20200130652A
(ko)
|
2019-05-10 |
2020-11-19 |
에이에스엠 아이피 홀딩 비.브이. |
표면 상에 재료를 증착하는 방법 및 본 방법에 따라 형성된 구조
|
|
JP7598201B2
(ja)
|
2019-05-16 |
2024-12-11 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
ウェハボートハンドリング装置、縦型バッチ炉および方法
|
|
JP7612342B2
(ja)
|
2019-05-16 |
2025-01-14 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
ウェハボートハンドリング装置、縦型バッチ炉および方法
|
|
USD975665S1
(en)
|
2019-05-17 |
2023-01-17 |
Asm Ip Holding B.V. |
Susceptor shaft
|
|
USD947913S1
(en)
|
2019-05-17 |
2022-04-05 |
Asm Ip Holding B.V. |
Susceptor shaft
|
|
USD935572S1
(en)
|
2019-05-24 |
2021-11-09 |
Asm Ip Holding B.V. |
Gas channel plate
|
|
USD922229S1
(en)
|
2019-06-05 |
2021-06-15 |
Asm Ip Holding B.V. |
Device for controlling a temperature of a gas supply unit
|
|
KR20200141003A
(ko)
|
2019-06-06 |
2020-12-17 |
에이에스엠 아이피 홀딩 비.브이. |
가스 감지기를 포함하는 기상 반응기 시스템
|
|
KR20200141931A
(ko)
|
2019-06-10 |
2020-12-21 |
에이에스엠 아이피 홀딩 비.브이. |
석영 에피택셜 챔버를 세정하는 방법
|
|
KR20200143254A
(ko)
|
2019-06-11 |
2020-12-23 |
에이에스엠 아이피 홀딩 비.브이. |
개질 가스를 사용하여 전자 구조를 형성하는 방법, 상기 방법을 수행하기 위한 시스템, 및 상기 방법을 사용하여 형성되는 구조
|
|
USD944946S1
(en)
|
2019-06-14 |
2022-03-01 |
Asm Ip Holding B.V. |
Shower plate
|
|
USD931978S1
(en)
|
2019-06-27 |
2021-09-28 |
Asm Ip Holding B.V. |
Showerhead vacuum transport
|
|
KR20210005515A
(ko)
|
2019-07-03 |
2021-01-14 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치용 온도 제어 조립체 및 이를 사용하는 방법
|
|
JP7499079B2
(ja)
|
2019-07-09 |
2024-06-13 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
同軸導波管を用いたプラズマ装置、基板処理方法
|
|
CN112216646A
(zh)
|
2019-07-10 |
2021-01-12 |
Asm Ip私人控股有限公司 |
基板支撑组件及包括其的基板处理装置
|
|
KR102895115B1
(ko)
|
2019-07-16 |
2025-12-03 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
KR20210010816A
(ko)
|
2019-07-17 |
2021-01-28 |
에이에스엠 아이피 홀딩 비.브이. |
라디칼 보조 점화 플라즈마 시스템 및 방법
|
|
KR102860110B1
(ko)
|
2019-07-17 |
2025-09-16 |
에이에스엠 아이피 홀딩 비.브이. |
실리콘 게르마늄 구조를 형성하는 방법
|
|
US11643724B2
(en)
|
2019-07-18 |
2023-05-09 |
Asm Ip Holding B.V. |
Method of forming structures using a neutral beam
|
|
CN112242295B
(zh)
|
2019-07-19 |
2025-12-09 |
Asmip私人控股有限公司 |
形成拓扑受控的无定形碳聚合物膜的方法
|
|
TWI839544B
(zh)
|
2019-07-19 |
2024-04-21 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
形成形貌受控的非晶碳聚合物膜之方法
|
|
TWI851767B
(zh)
|
2019-07-29 |
2024-08-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於利用n型摻雜物及/或替代摻雜物選擇性沉積以達成高摻雜物併入之方法
|
|
KR20210015655A
(ko)
|
2019-07-30 |
2021-02-10 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치 및 방법
|
|
CN112309900B
(zh)
|
2019-07-30 |
2025-11-04 |
Asmip私人控股有限公司 |
基板处理设备
|
|
CN112309899B
(zh)
|
2019-07-30 |
2025-11-14 |
Asmip私人控股有限公司 |
基板处理设备
|
|
US11587815B2
(en)
|
2019-07-31 |
2023-02-21 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
US11227782B2
(en)
|
2019-07-31 |
2022-01-18 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
US11587814B2
(en)
|
2019-07-31 |
2023-02-21 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
CN118422165A
(zh)
|
2019-08-05 |
2024-08-02 |
Asm Ip私人控股有限公司 |
用于化学源容器的液位传感器
|
|
KR20210018761A
(ko)
|
2019-08-09 |
2021-02-18 |
에이에스엠 아이피 홀딩 비.브이. |
냉각 장치를 포함한 히터 어셈블리 및 이를 사용하는 방법
|
|
USD965524S1
(en)
|
2019-08-19 |
2022-10-04 |
Asm Ip Holding B.V. |
Susceptor support
|
|
USD965044S1
(en)
|
2019-08-19 |
2022-09-27 |
Asm Ip Holding B.V. |
Susceptor shaft
|
|
JP2021031769A
(ja)
|
2019-08-21 |
2021-03-01 |
エーエスエム アイピー ホールディング ビー．ブイ． |
成膜原料混合ガス生成装置及び成膜装置
|
|
USD930782S1
(en)
|
2019-08-22 |
2021-09-14 |
Asm Ip Holding B.V. |
Gas distributor
|
|
KR20210024423A
(ko)
|
2019-08-22 |
2021-03-05 |
에이에스엠 아이피 홀딩 비.브이. |
홀을 구비한 구조체를 형성하기 위한 방법
|
|
USD949319S1
(en)
|
2019-08-22 |
2022-04-19 |
Asm Ip Holding B.V. |
Exhaust duct
|
|
USD979506S1
(en)
|
2019-08-22 |
2023-02-28 |
Asm Ip Holding B.V. |
Insulator
|
|
USD940837S1
(en)
|
2019-08-22 |
2022-01-11 |
Asm Ip Holding B.V. |
Electrode
|
|
KR20210024420A
(ko)
|
2019-08-23 |
2021-03-05 |
에이에스엠 아이피 홀딩 비.브이. |
비스(디에틸아미노)실란을 사용하여 peald에 의해 개선된 품질을 갖는 실리콘 산화물 막을 증착하기 위한 방법
|
|
US11286558B2
(en)
|
2019-08-23 |
2022-03-29 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
|
|
KR102806450B1
(ko)
|
2019-09-04 |
2025-05-12 |
에이에스엠 아이피 홀딩 비.브이. |
희생 캡핑 층을 이용한 선택적 증착 방법
|
|
CN110529736B
(zh)
*
|
2019-09-05 |
2021-09-14 |
安徽光智科技有限公司 |
一种化学气相沉积系统及供气装置和供气方法
|
|
KR102733104B1
(ko)
|
2019-09-05 |
2024-11-22 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
US12469693B2
(en)
|
2019-09-17 |
2025-11-11 |
Asm Ip Holding B.V. |
Method of forming a carbon-containing layer and structure including the layer
|
|
US11562901B2
(en)
|
2019-09-25 |
2023-01-24 |
Asm Ip Holding B.V. |
Substrate processing method
|
|
CN112593212B
(zh)
|
2019-10-02 |
2023-12-22 |
Asm Ip私人控股有限公司 |
通过循环等离子体增强沉积工艺形成拓扑选择性氧化硅膜的方法
|
|
KR20210042810A
(ko)
|
2019-10-08 |
2021-04-20 |
에이에스엠 아이피 홀딩 비.브이. |
활성 종을 이용하기 위한 가스 분배 어셈블리를 포함한 반응기 시스템 및 이를 사용하는 방법
|
|
TWI846953B
(zh)
|
2019-10-08 |
2024-07-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
基板處理裝置
|
|
TW202128273A
(zh)
|
2019-10-08 |
2021-08-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
氣體注入系統、及將材料沉積於反應室內之基板表面上的方法
|
|
KR102879443B1
(ko)
|
2019-10-10 |
2025-11-03 |
에이에스엠 아이피 홀딩 비.브이. |
포토레지스트 하부층을 형성하기 위한 방법 및 이를 포함한 구조체
|
|
US12009241B2
(en)
|
2019-10-14 |
2024-06-11 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly with detector to detect cassette
|
|
TWI834919B
(zh)
|
2019-10-16 |
2024-03-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
氧化矽之拓撲選擇性膜形成之方法
|
|
US11637014B2
(en)
|
2019-10-17 |
2023-04-25 |
Asm Ip Holding B.V. |
Methods for selective deposition of doped semiconductor material
|
|
KR102845724B1
(ko)
|
2019-10-21 |
2025-08-13 |
에이에스엠 아이피 홀딩 비.브이. |
막을 선택적으로 에칭하기 위한 장치 및 방법
|
|
KR20210050453A
(ko)
|
2019-10-25 |
2021-05-07 |
에이에스엠 아이피 홀딩 비.브이. |
기판 표면 상의 갭 피처를 충진하는 방법 및 이와 관련된 반도체 소자 구조
|
|
US11646205B2
(en)
|
2019-10-29 |
2023-05-09 |
Asm Ip Holding B.V. |
Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
|
|
KR102890638B1
(ko)
|
2019-11-05 |
2025-11-25 |
에이에스엠 아이피 홀딩 비.브이. |
도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템
|
|
US11501968B2
(en)
|
2019-11-15 |
2022-11-15 |
Asm Ip Holding B.V. |
Method for providing a semiconductor device with silicon filled gaps
|
|
KR102861314B1
(ko)
|
2019-11-20 |
2025-09-17 |
에이에스엠 아이피 홀딩 비.브이. |
기판의 표면 상에 탄소 함유 물질을 증착하는 방법, 상기 방법을 사용하여 형성된 구조물, 및 상기 구조물을 형성하기 위한 시스템
|
|
CN112951697B
(zh)
|
2019-11-26 |
2025-07-29 |
Asmip私人控股有限公司 |
基板处理设备
|
|
US11450529B2
(en)
|
2019-11-26 |
2022-09-20 |
Asm Ip Holding B.V. |
Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
|
|
CN120998766A
(zh)
|
2019-11-29 |
2025-11-21 |
Asm Ip私人控股有限公司 |
基板处理设备
|
|
CN120432376A
(zh)
|
2019-11-29 |
2025-08-05 |
Asm Ip私人控股有限公司 |
基板处理设备
|
|
JP7527928B2
(ja)
|
2019-12-02 |
2024-08-05 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
基板処理装置、基板処理方法
|
|
KR20210070898A
(ko)
|
2019-12-04 |
2021-06-15 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치
|
|
US11885013B2
(en)
|
2019-12-17 |
2024-01-30 |
Asm Ip Holding B.V. |
Method of forming vanadium nitride layer and structure including the vanadium nitride layer
|
|
US11527403B2
(en)
|
2019-12-19 |
2022-12-13 |
Asm Ip Holding B.V. |
Methods for filling a gap feature on a substrate surface and related semiconductor structures
|
|
KR20210089079A
(ko)
|
2020-01-06 |
2021-07-15 |
에이에스엠 아이피 홀딩 비.브이. |
채널형 리프트 핀
|
|
JP7730637B2
(ja)
|
2020-01-06 |
2025-08-28 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
ガス供給アセンブリ、その構成要素、およびこれを含む反応器システム
|
|
US11993847B2
(en)
|
2020-01-08 |
2024-05-28 |
Asm Ip Holding B.V. |
Injector
|
|
KR102882467B1
(ko)
|
2020-01-16 |
2025-11-05 |
에이에스엠 아이피 홀딩 비.브이. |
고 종횡비 피처를 형성하는 방법
|
|
KR102675856B1
(ko)
|
2020-01-20 |
2024-06-17 |
에이에스엠 아이피 홀딩 비.브이. |
박막 형성 방법 및 박막 표면 개질 방법
|
|
TWI889744B
(zh)
|
2020-01-29 |
2025-07-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
污染物捕集系統、及擋板堆疊
|
|
TW202513845A
(zh)
|
2020-02-03 |
2025-04-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
半導體裝置結構及其形成方法
|
|
KR20210100010A
(ko)
|
2020-02-04 |
2021-08-13 |
에이에스엠 아이피 홀딩 비.브이. |
대형 물품의 투과율 측정을 위한 방법 및 장치
|
|
US11776846B2
(en)
|
2020-02-07 |
2023-10-03 |
Asm Ip Holding B.V. |
Methods for depositing gap filling fluids and related systems and devices
|
|
TW202146691A
(zh)
|
2020-02-13 |
2021-12-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
氣體分配總成、噴淋板總成、及調整至反應室之氣體的傳導率之方法
|
|
KR20210103956A
(ko)
|
2020-02-13 |
2021-08-24 |
에이에스엠 아이피 홀딩 비.브이. |
수광 장치를 포함하는 기판 처리 장치 및 수광 장치의 교정 방법
|
|
TWI855223B
(zh)
|
2020-02-17 |
2024-09-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於生長磷摻雜矽層之方法
|
|
TWI895326B
(zh)
|
2020-02-28 |
2025-09-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
專用於零件清潔的系統
|
|
TW202139347A
(zh)
|
2020-03-04 |
2021-10-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
反應器系統、對準夾具、及對準方法
|
|
US11876356B2
(en)
|
2020-03-11 |
2024-01-16 |
Asm Ip Holding B.V. |
Lockout tagout assembly and system and method of using same
|
|
KR20210116240A
(ko)
|
2020-03-11 |
2021-09-27 |
에이에스엠 아이피 홀딩 비.브이. |
조절성 접합부를 갖는 기판 핸들링 장치
|
|
CN113394086A
(zh)
|
2020-03-12 |
2021-09-14 |
Asm Ip私人控股有限公司 |
用于制造具有目标拓扑轮廓的层结构的方法
|
|
US12173404B2
(en)
|
2020-03-17 |
2024-12-24 |
Asm Ip Holding B.V. |
Method of depositing epitaxial material, structure formed using the method, and system for performing the method
|
|
KR102755229B1
(ko)
|
2020-04-02 |
2025-01-14 |
에이에스엠 아이피 홀딩 비.브이. |
박막 형성 방법
|
|
TWI887376B
(zh)
|
2020-04-03 |
2025-06-21 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
半導體裝置的製造方法
|
|
TWI888525B
(zh)
|
2020-04-08 |
2025-07-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於選擇性蝕刻氧化矽膜之設備及方法
|
|
US11821078B2
(en)
|
2020-04-15 |
2023-11-21 |
Asm Ip Holding B.V. |
Method for forming precoat film and method for forming silicon-containing film
|
|
KR20210128343A
(ko)
|
2020-04-15 |
2021-10-26 |
에이에스엠 아이피 홀딩 비.브이. |
크롬 나이트라이드 층을 형성하는 방법 및 크롬 나이트라이드 층을 포함하는 구조
|
|
US11996289B2
(en)
|
2020-04-16 |
2024-05-28 |
Asm Ip Holding B.V. |
Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
|
|
TW202143328A
(zh)
|
2020-04-21 |
2021-11-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於調整膜應力之方法
|
|
US11898243B2
(en)
|
2020-04-24 |
2024-02-13 |
Asm Ip Holding B.V. |
Method of forming vanadium nitride-containing layer
|
|
TWI887400B
(zh)
|
2020-04-24 |
2025-06-21 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於穩定釩化合物之方法及設備
|
|
KR20210132600A
(ko)
|
2020-04-24 |
2021-11-04 |
에이에스엠 아이피 홀딩 비.브이. |
바나듐, 질소 및 추가 원소를 포함한 층을 증착하기 위한 방법 및 시스템
|
|
TW202146831A
(zh)
|
2020-04-24 |
2021-12-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
垂直批式熔爐總成、及用於冷卻垂直批式熔爐之方法
|
|
TW202208671A
(zh)
|
2020-04-24 |
2022-03-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
形成包括硼化釩及磷化釩層的結構之方法
|
|
KR102783898B1
(ko)
|
2020-04-29 |
2025-03-18 |
에이에스엠 아이피 홀딩 비.브이. |
고체 소스 전구체 용기
|
|
KR20210134869A
(ko)
|
2020-05-01 |
2021-11-11 |
에이에스엠 아이피 홀딩 비.브이. |
Foup 핸들러를 이용한 foup의 빠른 교환
|
|
JP7726664B2
(ja)
|
2020-05-04 |
2025-08-20 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
基板を処理するための基板処理システム
|
|
KR20210137395A
(ko)
|
2020-05-07 |
2021-11-17 |
에이에스엠 아이피 홀딩 비.브이. |
불소계 라디칼을 이용하여 반응 챔버의 인시츄 식각을 수행하기 위한 장치 및 방법
|
|
JP7736446B2
(ja)
|
2020-05-07 |
2025-09-09 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
同調回路を備える反応器システム
|
|
KR102788543B1
(ko)
|
2020-05-13 |
2025-03-27 |
에이에스엠 아이피 홀딩 비.브이. |
반응기 시스템용 레이저 정렬 고정구
|
|
TW202146699A
(zh)
|
2020-05-15 |
2021-12-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
形成矽鍺層之方法、半導體結構、半導體裝置、形成沉積層之方法、及沉積系統
|
|
TW202147383A
(zh)
|
2020-05-19 |
2021-12-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
基材處理設備
|
|
KR102795476B1
(ko)
|
2020-05-21 |
2025-04-11 |
에이에스엠 아이피 홀딩 비.브이. |
다수의 탄소 층을 포함한 구조체 및 이를 형성하고 사용하는 방법
|
|
KR20210145079A
(ko)
|
2020-05-21 |
2021-12-01 |
에이에스엠 아이피 홀딩 비.브이. |
기판을 처리하기 위한 플랜지 및 장치
|
|
KR102702526B1
(ko)
|
2020-05-22 |
2024-09-03 |
에이에스엠 아이피 홀딩 비.브이. |
과산화수소를 사용하여 박막을 증착하기 위한 장치
|
|
KR20210146802A
(ko)
|
2020-05-26 |
2021-12-06 |
에이에스엠 아이피 홀딩 비.브이. |
붕소 및 갈륨을 함유한 실리콘 게르마늄 층을 증착하는 방법
|
|
TWI876048B
(zh)
|
2020-05-29 |
2025-03-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
基板處理方法
|
|
TW202212620A
(zh)
|
2020-06-02 |
2022-04-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
處理基板之設備、形成膜之方法、及控制用於處理基板之設備之方法
|
|
KR20210156219A
(ko)
|
2020-06-16 |
2021-12-24 |
에이에스엠 아이피 홀딩 비.브이. |
붕소를 함유한 실리콘 게르마늄 층을 증착하는 방법
|
|
JP7703376B2
(ja)
|
2020-06-24 |
2025-07-07 |
エーエスエム・アイピー・ホールディング・ベー・フェー |
シリコンを備える層を形成するための方法
|
|
TWI873359B
(zh)
|
2020-06-30 |
2025-02-21 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
基板處理方法
|
|
US12431354B2
(en)
|
2020-07-01 |
2025-09-30 |
Asm Ip Holding B.V. |
Silicon nitride and silicon oxide deposition methods using fluorine inhibitor
|
|
KR102707957B1
(ko)
|
2020-07-08 |
2024-09-19 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 방법
|
|
TWI864307B
(zh)
|
2020-07-17 |
2024-12-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於光微影之結構、方法與系統
|
|
TWI878570B
(zh)
|
2020-07-20 |
2025-04-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於沉積鉬層之方法及系統
|
|
KR20220011092A
(ko)
|
2020-07-20 |
2022-01-27 |
에이에스엠 아이피 홀딩 비.브이. |
전이 금속층을 포함하는 구조체를 형성하기 위한 방법 및 시스템
|
|
US12322591B2
(en)
|
2020-07-27 |
2025-06-03 |
Asm Ip Holding B.V. |
Thin film deposition process
|
|
KR20220021863A
(ko)
|
2020-08-14 |
2022-02-22 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 방법
|
|
US12040177B2
(en)
|
2020-08-18 |
2024-07-16 |
Asm Ip Holding B.V. |
Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
|
|
TW202228863A
(zh)
|
2020-08-25 |
2022-08-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
清潔基板的方法、選擇性沉積的方法、及反應器系統
|
|
US11725280B2
(en)
|
2020-08-26 |
2023-08-15 |
Asm Ip Holding B.V. |
Method for forming metal silicon oxide and metal silicon oxynitride layers
|
|
TW202229601A
(zh)
|
2020-08-27 |
2022-08-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
形成圖案化結構的方法、操控機械特性的方法、裝置結構、及基板處理系統
|
|
KR20220033997A
(ko)
|
2020-09-10 |
2022-03-17 |
에이에스엠 아이피 홀딩 비.브이. |
갭 충진 유체를 증착하기 위한 방법 그리고 이와 관련된 시스템 및 장치
|
|
USD990534S1
(en)
|
2020-09-11 |
2023-06-27 |
Asm Ip Holding B.V. |
Weighted lift pin
|
|
KR20220036866A
(ko)
|
2020-09-16 |
2022-03-23 |
에이에스엠 아이피 홀딩 비.브이. |
실리콘 산화물 증착 방법
|
|
USD1012873S1
(en)
|
2020-09-24 |
2024-01-30 |
Asm Ip Holding B.V. |
Electrode for semiconductor processing apparatus
|
|
TWI889903B
(zh)
|
2020-09-25 |
2025-07-11 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
基板處理方法
|
|
US12009224B2
(en)
|
2020-09-29 |
2024-06-11 |
Asm Ip Holding B.V. |
Apparatus and method for etching metal nitrides
|
|
KR20220045900A
(ko)
|
2020-10-06 |
2022-04-13 |
에이에스엠 아이피 홀딩 비.브이. |
실리콘 함유 재료를 증착하기 위한 증착 방법 및 장치
|
|
CN114293174A
(zh)
|
2020-10-07 |
2022-04-08 |
Asm Ip私人控股有限公司 |
气体供应单元和包括气体供应单元的衬底处理设备
|
|
TW202229613A
(zh)
|
2020-10-14 |
2022-08-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
於階梯式結構上沉積材料的方法
|
|
KR102873665B1
(ko)
|
2020-10-15 |
2025-10-17 |
에이에스엠 아이피 홀딩 비.브이. |
반도체 소자의 제조 방법, 및 ether-cat을 사용하는 기판 처리 장치
|
|
KR20220053482A
(ko)
|
2020-10-22 |
2022-04-29 |
에이에스엠 아이피 홀딩 비.브이. |
바나듐 금속을 증착하는 방법, 구조체, 소자 및 증착 어셈블리
|
|
TW202223136A
(zh)
|
2020-10-28 |
2022-06-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
用於在基板上形成層之方法、及半導體處理系統
|
|
TW202229620A
(zh)
|
2020-11-12 |
2022-08-01 |
特文特大學 |
沉積系統、用於控制反應條件之方法、沉積方法
|
|
TW202229795A
(zh)
|
2020-11-23 |
2022-08-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
具注入器之基板處理設備
|
|
TW202235649A
(zh)
|
2020-11-24 |
2022-09-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
填充間隙之方法與相關之系統及裝置
|
|
KR20220076343A
(ko)
|
2020-11-30 |
2022-06-08 |
에이에스엠 아이피 홀딩 비.브이. |
기판 처리 장치의 반응 챔버 내에 배열되도록 구성된 인젝터
|
|
US12255053B2
(en)
|
2020-12-10 |
2025-03-18 |
Asm Ip Holding B.V. |
Methods and systems for depositing a layer
|
|
TW202233884A
(zh)
|
2020-12-14 |
2022-09-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
形成臨限電壓控制用之結構的方法
|
|
US11946137B2
(en)
|
2020-12-16 |
2024-04-02 |
Asm Ip Holding B.V. |
Runout and wobble measurement fixtures
|
|
TW202232639A
(zh)
|
2020-12-18 |
2022-08-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
具有可旋轉台的晶圓處理設備
|
|
TW202231903A
(zh)
|
2020-12-22 |
2022-08-16 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
過渡金屬沉積方法、過渡金屬層、用於沉積過渡金屬於基板上的沉積總成
|
|
TW202226899A
(zh)
|
2020-12-22 |
2022-07-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
具匹配器的電漿處理裝置
|
|
TW202242184A
(zh)
|
2020-12-22 |
2022-11-01 |
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 |
前驅物膠囊、前驅物容器、氣相沉積總成、及將固態前驅物裝載至前驅物容器中之方法
|
|
CN113117954B
(zh)
*
|
2021-03-05 |
2023-07-07 |
重庆峰跃科技有限公司 |
一种玻璃纤维布铺设漆面补平及压制装置
|
|
USD981973S1
(en)
|
2021-05-11 |
2023-03-28 |
Asm Ip Holding B.V. |
Reactor wall for substrate processing apparatus
|
|
USD1023959S1
(en)
|
2021-05-11 |
2024-04-23 |
Asm Ip Holding B.V. |
Electrode for substrate processing apparatus
|
|
USD980813S1
(en)
|
2021-05-11 |
2023-03-14 |
Asm Ip Holding B.V. |
Gas flow control plate for substrate processing apparatus
|
|
USD980814S1
(en)
|
2021-05-11 |
2023-03-14 |
Asm Ip Holding B.V. |
Gas distributor for substrate processing apparatus
|
|
USD990441S1
(en)
|
2021-09-07 |
2023-06-27 |
Asm Ip Holding B.V. |
Gas flow control plate
|
|
USD1099184S1
(en)
|
2021-11-29 |
2025-10-21 |
Asm Ip Holding B.V. |
Weighted lift pin
|
|
USD1060598S1
(en)
|
2021-12-03 |
2025-02-04 |
Asm Ip Holding B.V. |
Split showerhead cover
|