BR9704552A - Compostos de complexos moleculares como fotoiniciadores - Google Patents
Compostos de complexos moleculares como fotoiniciadoresInfo
- Publication number
- BR9704552A BR9704552A BR9704552A BR9704552A BR9704552A BR 9704552 A BR9704552 A BR 9704552A BR 9704552 A BR9704552 A BR 9704552A BR 9704552 A BR9704552 A BR 9704552A BR 9704552 A BR9704552 A BR 9704552A
- Authority
- BR
- Brazil
- Prior art keywords
- complex compounds
- molecular complex
- photoinitiators
- compound
- photopolymerisation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Molecular Biology (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Laminated Bodies (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Printing Methods (AREA)
- Paper (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH211596 | 1996-08-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9704552A true BR9704552A (pt) | 1998-09-01 |
Family
ID=4226232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9704552A BR9704552A (pt) | 1996-08-28 | 1997-08-28 | Compostos de complexos moleculares como fotoiniciadores |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US5942290A (enExample) |
| EP (1) | EP0826692B1 (enExample) |
| JP (1) | JP4200392B2 (enExample) |
| KR (1) | KR100530088B1 (enExample) |
| CN (1) | CN1101822C (enExample) |
| AT (1) | ATE233777T1 (enExample) |
| AU (1) | AU720186B2 (enExample) |
| BR (1) | BR9704552A (enExample) |
| CA (1) | CA2213886C (enExample) |
| DE (1) | DE59709426D1 (enExample) |
| NO (1) | NO309145B1 (enExample) |
| RU (1) | RU2181726C2 (enExample) |
| SG (1) | SG53043A1 (enExample) |
| TW (1) | TW401439B (enExample) |
| ZA (1) | ZA977692B (enExample) |
Families Citing this family (105)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19650562A1 (de) * | 1996-12-05 | 1998-06-10 | Basf Ag | Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate |
| US6251962B1 (en) * | 1997-02-19 | 2001-06-26 | Ciba Specialty Chemicals Corporation | (Co)polymers by photopolymerization |
| DE19810745C2 (de) | 1998-03-12 | 2000-05-04 | Bayer Ag | Flüssige Katalysatorformulierung aus Tetraphenylphosphoniumphenolat und Phenol und deren Verwendung |
| SE9904080D0 (sv) * | 1998-12-03 | 1999-11-11 | Ciba Sc Holding Ag | Fotoinitiatorberedning |
| KR100685153B1 (ko) * | 1998-12-03 | 2007-02-22 | 시바 스페셜티 케미칼스 홀딩 인크. | 광개시제 혼합물, 이를 포함하는 광중합성 조성물 및 이의 용도 |
| US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
| US6803392B1 (en) * | 1999-10-20 | 2004-10-12 | Ciba Specialty Chemicals Corporation | Photoinitiator formulations |
| ES2208250T3 (es) * | 1999-12-08 | 2004-06-16 | Ciba Specialty Chemicals Holding Inc. | Nuevos sistemas de fotoiniciadores de oxido de fosfina y composiciones reticulables de color bajo. |
| GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| JP4597323B2 (ja) * | 2000-07-07 | 2010-12-15 | リンテック株式会社 | 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート |
| US6737216B2 (en) * | 2000-12-08 | 2004-05-18 | E.I. Du Pont De Nemours And Company | Laser engravable flexographic printing element and a method for forming a printing plate from the element |
| US7300690B2 (en) * | 2001-03-29 | 2007-11-27 | General Electric Company | Radial tilt reduced media |
| EP1397393A1 (en) * | 2001-04-27 | 2004-03-17 | Ucb, S.A. | Photo-initiator compositions |
| EP1253155A1 (en) * | 2001-04-27 | 2002-10-30 | Ucb S.A. | Photo-initiator compositions |
| US6780546B2 (en) * | 2001-08-30 | 2004-08-24 | Inphase Technologies, Inc. | Blue-sensitized holographic media |
| US6716505B2 (en) * | 2001-08-31 | 2004-04-06 | General Electric Company | Storage medium for data with improved dimensional stability |
| TWI312786B (en) * | 2001-11-08 | 2009-08-01 | Ciba Sc Holding Ag | Novel difunctional photoinitiators |
| DE10315671A1 (de) * | 2003-04-04 | 2004-10-14 | Basf Ag | Verfahren zur Herstellung von Acylphosphinoxid-Feststoffen |
| CA2523569A1 (en) * | 2003-05-06 | 2004-11-18 | Ciba Specialty Chemicals Holding Inc. | Photo-cured and stabilized coatings |
| CA2522898A1 (en) * | 2003-05-23 | 2004-12-02 | Ciba Specialty Chemicals Holding Inc. | Strongly adherent surface coatings |
| JP4676434B2 (ja) * | 2003-08-29 | 2011-04-27 | チバ ホールディング インコーポレーテッド | 光ファイバコーティング |
| US8076386B2 (en) * | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| EP1765878B1 (en) * | 2004-04-15 | 2010-12-08 | Basf Se | Process for photocuring with light emitting diodes |
| US20090137771A1 (en) * | 2005-08-11 | 2009-05-28 | Satoshi Moriyama | Resin composition |
| US9522967B2 (en) * | 2006-06-09 | 2016-12-20 | Dentsply International Inc. | Photopolymerizable compositions featuring novel amine accelerator for improved color stability and reduced polymerization stress thereby |
| KR100917175B1 (ko) | 2006-07-05 | 2009-09-15 | 주식회사 엘지화학 | 신규한 아실포스핀 화합물 및 그의 제조방법 |
| BRPI0718332A2 (pt) * | 2006-12-11 | 2015-06-23 | Dow Global Technologies Inc | Composição de aldeído, composição de álcool, composição de poliéster poliol e poliuretano |
| US7985785B2 (en) | 2007-01-15 | 2011-07-26 | Fujifilm Corporation | Ink composition and inkjet recording method using the same |
| WO2008087981A1 (ja) * | 2007-01-17 | 2008-07-24 | Kuraray Medical Inc. | 組成物及び歯科用材料 |
| EP1958994B1 (en) | 2007-01-31 | 2010-12-08 | FUJIFILM Corporation | Ink set for inkjet recording and inkjet recording method |
| US20080233307A1 (en) * | 2007-02-09 | 2008-09-25 | Chisso Corporation | Photocurable inkjet ink |
| JP5416581B2 (ja) * | 2007-03-20 | 2014-02-12 | クラレノリタケデンタル株式会社 | 重合性単量体、重合性組成物及び歯科用材料 |
| JP4601009B2 (ja) | 2007-03-30 | 2010-12-22 | 富士フイルム株式会社 | インクジェット記録用インクセット及びインクジェット記録方法 |
| JP5255369B2 (ja) | 2007-09-25 | 2013-08-07 | 富士フイルム株式会社 | 光硬化性コーティング組成物、オーバープリント及びその製造方法 |
| US8076393B2 (en) | 2007-09-26 | 2011-12-13 | Fujifilm Corporation | Ink composition, inkjet recording method, and printed material |
| US8129447B2 (en) | 2007-09-28 | 2012-03-06 | Fujifilm Corporation | Ink composition and inkjet recording method using the same |
| JP5236238B2 (ja) | 2007-09-28 | 2013-07-17 | 富士フイルム株式会社 | インクジェット記録用ホワイトインク組成物 |
| JP5148235B2 (ja) | 2007-09-28 | 2013-02-20 | 富士フイルム株式会社 | インク組成物 |
| WO2009050116A2 (en) * | 2007-10-17 | 2009-04-23 | Basf Se | Adhesion promoting photoinitiators for uv cured coatings over metal surfaces |
| JP5457636B2 (ja) | 2008-01-22 | 2014-04-02 | 富士フイルム株式会社 | 光硬化性組成物、光硬化性インク組成物、光硬化物の製造方法、及び、インクジェット記録方法 |
| JP5414367B2 (ja) | 2008-06-02 | 2014-02-12 | 富士フイルム株式会社 | 顔料分散物及びそれを用いたインク組成物 |
| JP5465934B2 (ja) * | 2008-07-10 | 2014-04-09 | 株式会社松風 | 硬化性の改善された人工爪組成物 |
| US8378002B2 (en) | 2008-07-16 | 2013-02-19 | Fujifilm Corporation | Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method |
| JP5344892B2 (ja) | 2008-11-27 | 2013-11-20 | 富士フイルム株式会社 | インクジェット用インク組成物、及びインクジェット記録方法 |
| JP5350827B2 (ja) | 2009-02-09 | 2013-11-27 | 富士フイルム株式会社 | インク組成物、及び、インクジェット記録方法 |
| JP2010229284A (ja) | 2009-03-27 | 2010-10-14 | Fujifilm Corp | 光硬化性組成物 |
| JP5405174B2 (ja) | 2009-03-30 | 2014-02-05 | 富士フイルム株式会社 | インク組成物 |
| JP5424764B2 (ja) | 2009-07-28 | 2014-02-26 | 富士フイルム株式会社 | 顔料分散物、インク組成物、及び、インクジェット記録方法 |
| US8633258B2 (en) | 2010-06-30 | 2014-01-21 | Dsm Ip Assets B.V. | D1492 liquid BAPO photoinitiator and its use in radiation curable compositions |
| JP5750069B2 (ja) | 2011-03-24 | 2015-07-15 | 富士フイルム株式会社 | 液晶配向促進剤、液晶組成物、高分子材料およびフィルム |
| JP5774518B2 (ja) | 2011-07-27 | 2015-09-09 | 富士フイルム株式会社 | 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム |
| RU2586743C2 (ru) * | 2011-08-23 | 2016-06-10 | Зм Инновейтив Пропертиз Компани | Стоматологические композиции, содержащие агенты присоединения-фрагментации |
| CN103073658A (zh) * | 2011-10-26 | 2013-05-01 | 深圳市有为化学技术有限公司 | 新型芳香羟基酮和膦酰氧化物的光引发剂混合物及其与光吸收剂的复合体系 |
| US9801803B2 (en) | 2012-06-04 | 2017-10-31 | L'oreal | Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with UV-LED |
| DE102012212429A1 (de) | 2012-07-16 | 2014-01-16 | Voco Gmbh | Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials |
| EP2903995B1 (en) * | 2012-10-01 | 2019-01-16 | ETH Zürich | A process for the preparation of acylphosphanes |
| BR112016009482B8 (pt) * | 2013-11-05 | 2022-12-06 | Construction Research & Technology Gmbh | Composição de revestimento, uso de uma composição de revestimento, processo para preparação de uma composição de revestimento e método para cura de uma composição de revestimento |
| JP6169545B2 (ja) | 2014-09-09 | 2017-07-26 | 富士フイルム株式会社 | 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| JP6086888B2 (ja) | 2014-09-26 | 2017-03-01 | 富士フイルム株式会社 | インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| JP6169548B2 (ja) | 2014-09-26 | 2017-07-26 | 富士フイルム株式会社 | 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| US9636293B2 (en) | 2014-10-13 | 2017-05-02 | L'oréal | Latex nail compositions having low amounts of photo-initiator |
| US9649272B2 (en) | 2014-10-13 | 2017-05-16 | L'oréal | Latex nail compositions having low amounts of photo-initiator |
| US9820931B2 (en) | 2014-10-13 | 2017-11-21 | L'oreal | Latex nail compositions having low amounts of photo-initiator |
| CN104592298B (zh) * | 2014-12-31 | 2016-07-06 | 湖北固润科技股份有限公司 | 一种酰基膦高效光引发剂及其制备方法 |
| JP2018517034A (ja) | 2015-06-08 | 2018-06-28 | ディーエスエム アイピー アセッツ ビー.ブイ. | 付加造形用液状ハイブリッドUV/vis線硬化性樹脂組成物 |
| US9458334B1 (en) * | 2015-07-01 | 2016-10-04 | Electronics For Imaging, Inc. | Aqueous radiation curable ink composition |
| JP6880416B2 (ja) | 2015-10-01 | 2021-06-02 | ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. | 付加造形用液状ハイブリッドUV/vis線硬化性樹脂組成物 |
| CN106349285B (zh) * | 2016-08-29 | 2018-05-15 | 天津久日新材料股份有限公司 | 含羟基酰基膦氧化合物及其制备和应用 |
| WO2018084076A1 (ja) | 2016-11-04 | 2018-05-11 | 富士フイルム株式会社 | ウインドシールドガラス、ヘッドアップディスプレイシステム、およびハーフミラーフィルム |
| EP3581975B1 (en) | 2017-02-09 | 2024-04-03 | FUJIFILM Corporation | Half mirror, method for producing half mirror, and mirror provided with image display function |
| RU2684387C2 (ru) * | 2017-05-03 | 2019-04-08 | Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН) | Фотополимерная композиция для изготовления термостойких объектов методом лазерной стереолитографии |
| JP7111432B2 (ja) | 2017-06-02 | 2022-08-02 | コベストロ (ネザーランズ) ビー.ブイ. | 光ファイバー用耐熱放射線硬化性コーティング |
| CN114236845B (zh) | 2017-09-07 | 2024-11-05 | 富士胶片株式会社 | 投影图像显示用夹层玻璃及图像显示系统 |
| PL3687949T3 (pl) | 2017-11-03 | 2024-11-04 | Covestro (Netherlands) B.V. | Układy blokujące wodę zawierające włókna powleczone ciekłymi, utwardzanymi promieniowaniem kompozycjami sap |
| CN111566068B (zh) | 2018-02-23 | 2022-09-06 | 富士胶片株式会社 | 图像显示用夹层玻璃的制造方法、图像显示用夹层玻璃及图像显示系统 |
| BR112020024440A2 (pt) | 2018-06-01 | 2021-03-23 | Dsm Ip Assets B.V. | composições curáveis por radiação para revestir fibra ótica e os revestimentos produzidos a partir das mesmas |
| WO2020046865A1 (en) | 2018-08-30 | 2020-03-05 | Dsm Ip Assets, B.V. | Radiation curable compositions for coating optical fiber |
| EP3869245A4 (en) | 2018-10-17 | 2021-12-15 | FUJIFILM Corporation | PROJECTION IMAGE DISPLAY ELEMENT, WINDSHIELD GLASS, AND HEAD-UP DISPLAY SYSTEM |
| JP2022509797A (ja) | 2018-12-03 | 2022-01-24 | コベストロ (ネザーランズ) ビー.ヴィー. | 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング |
| WO2020122023A1 (ja) | 2018-12-10 | 2020-06-18 | 富士フイルム株式会社 | 投映像表示用部材、ウインドシールドガラスおよびヘッドアップディスプレイシステム |
| EP3936924B1 (en) | 2019-03-06 | 2025-01-15 | FUJIFILM Corporation | Laminated film for displaying projection image, laminated glass for displaying projection image, and image display system |
| WO2020190833A1 (en) | 2019-03-18 | 2020-09-24 | Basf Se | Uv curable compositions for dirt pick-up resistance |
| US10894858B2 (en) | 2019-05-24 | 2021-01-19 | Dsm Ip Assets B.V. | Radiation curable compositions for coating optical fiber with enhanced high-speed processability |
| WO2020239563A1 (en) | 2019-05-24 | 2020-12-03 | Dsm Ip Assets B.V. | Radiation curable compositions for coating optical fiber with enhanced high-speed processability |
| JP7712261B2 (ja) | 2019-07-31 | 2025-07-23 | コベストロ (ネザーランズ) ビー.ブイ. | 光ファイバーを被覆するための多官能性長アームオリゴマーを含む放射線硬化性組成物 |
| US12252561B2 (en) | 2019-08-30 | 2025-03-18 | Stratasys, Inc. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
| WO2021042013A1 (en) | 2019-08-30 | 2021-03-04 | Dsm Ip Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
| EP4036644B1 (en) | 2019-09-27 | 2025-04-23 | FUJIFILM Corporation | Projector for head-up display |
| EP4041779A1 (en) | 2019-10-10 | 2022-08-17 | IGM Resins Italia S.r.l. | Combination of photoinitiators and uses thereof |
| EP4083668B1 (en) | 2019-12-26 | 2025-10-29 | FUJIFILM Corporation | Light absorption anisotropic layer, laminate, optical film, image display device, back light module |
| EP4130812A4 (en) | 2020-03-30 | 2023-11-22 | FUJIFILM Corporation | REFLECTIVE FILM, WINDSHIELD GLASS AND HEAD-UP DISPLAY SYSTEM |
| WO2021202623A1 (en) | 2020-04-03 | 2021-10-07 | Dsm Ip Assets B.V. | Self-healing optical fibers and the compositions used to create the same |
| US20230117457A1 (en) | 2020-04-03 | 2023-04-20 | Covestro (Netherlands) B.V. | Methods of synthesizing multi-hydrogen bonding oligomers |
| WO2021202638A1 (en) | 2020-04-03 | 2021-10-07 | Dsm Ip Assets B.V. | Multi-layered optical devices |
| CN115698783A (zh) | 2020-06-03 | 2023-02-03 | 富士胶片株式会社 | 反射膜、夹层玻璃的制造方法及夹层玻璃 |
| WO2022002909A1 (en) | 2020-06-30 | 2022-01-06 | Covestro (Netherlands) B.V. | Viscosity index improvers in optical fiber coatings |
| CN116568545A (zh) | 2020-12-09 | 2023-08-08 | 富士胶片株式会社 | 反射膜、挡风玻璃及平视显示系统 |
| CN116888221A (zh) | 2021-02-22 | 2023-10-13 | 科思创(荷兰)有限公司 | 提供低光泽涂层的方法 |
| EP4411452A4 (en) | 2021-09-30 | 2025-02-05 | FUJIFILM Corporation | Head-up display system and transport |
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| WO2023205224A2 (en) | 2022-04-21 | 2023-10-26 | Covestro (Netherlands) B.V. | Low-volatility radiation curable compositions for coating optical fibers |
| US20250360534A1 (en) | 2022-05-25 | 2025-11-27 | Covestro (Netherlands) B.V. | Process for providing low gloss coatings |
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Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2722264C2 (de) * | 1977-05-17 | 1984-06-28 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren |
| US4318791A (en) * | 1977-12-22 | 1982-03-09 | Ciba-Geigy Corporation | Use of aromatic-aliphatic ketones as photo sensitizers |
| DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
| EP0007508B1 (de) * | 1978-07-14 | 1983-06-01 | BASF Aktiengesellschaft | Acylphosphinoxidverbindungen, ihre Herstellung und ihre Verwendung |
| IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
| DE3443221A1 (de) * | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
| US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| EP0413657B1 (de) * | 1989-08-04 | 1996-12-27 | Ciba SC Holding AG | Mono- und Diacylphosphinoxide |
| EP0446175A3 (en) * | 1990-03-09 | 1991-11-21 | Ciba-Geigy Ag | Mixture of photoinitiators |
| RU2091385C1 (ru) * | 1991-09-23 | 1997-09-27 | Циба-Гейги АГ | Бисацилфосфиноксиды, состав и способ нанесения покрытий |
| TW303379B (enExample) * | 1994-03-02 | 1997-04-21 | Ciba Sc Holding Ag | |
| TW381106B (en) * | 1994-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alkoxyphenyl-substituted bisacylphosphine oxides |
| WO1996007662A1 (en) * | 1994-09-08 | 1996-03-14 | Ciba Specialty Chemicals Holding Inc. | Novel acylphosphine oxides |
| DE19618720A1 (de) * | 1995-05-12 | 1996-11-14 | Ciba Geigy Ag | Bisacyl-bisphosphine, -oxide und -sulfide |
| SE520727C2 (sv) * | 1996-03-04 | 2003-08-19 | Ciba Sc Holding Ag | Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar |
-
1997
- 1997-08-14 SG SG1997002936A patent/SG53043A1/en unknown
- 1997-08-19 DE DE59709426T patent/DE59709426D1/de not_active Expired - Lifetime
- 1997-08-19 AT AT97810582T patent/ATE233777T1/de not_active IP Right Cessation
- 1997-08-19 EP EP97810582A patent/EP0826692B1/de not_active Expired - Lifetime
- 1997-08-21 US US08/915,776 patent/US5942290A/en not_active Expired - Lifetime
- 1997-08-22 AU AU35226/97A patent/AU720186B2/en not_active Ceased
- 1997-08-25 RU RU97114452/04A patent/RU2181726C2/ru not_active IP Right Cessation
- 1997-08-26 TW TW086112227A patent/TW401439B/zh active
- 1997-08-26 CA CA002213886A patent/CA2213886C/en not_active Expired - Fee Related
- 1997-08-26 JP JP24467497A patent/JP4200392B2/ja not_active Expired - Lifetime
- 1997-08-27 NO NO973945A patent/NO309145B1/no not_active IP Right Cessation
- 1997-08-27 KR KR1019970041366A patent/KR100530088B1/ko not_active Expired - Fee Related
- 1997-08-27 ZA ZA9707692A patent/ZA977692B/xx unknown
- 1997-08-27 CN CN97117698A patent/CN1101822C/zh not_active Expired - Lifetime
- 1997-08-28 BR BR9704552A patent/BR9704552A/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR19980019052A (ko) | 1998-06-05 |
| AU3522697A (en) | 1998-03-05 |
| NO973945D0 (no) | 1997-08-27 |
| RU2181726C2 (ru) | 2002-04-27 |
| CA2213886A1 (en) | 1998-02-28 |
| TW401439B (en) | 2000-08-11 |
| ZA977692B (en) | 1998-03-02 |
| AU720186B2 (en) | 2000-05-25 |
| EP0826692A2 (de) | 1998-03-04 |
| NO309145B1 (no) | 2000-12-18 |
| SG53043A1 (en) | 1998-09-28 |
| KR100530088B1 (ko) | 2006-04-06 |
| CA2213886C (en) | 2005-12-06 |
| MX9706542A (es) | 1998-07-31 |
| EP0826692B1 (de) | 2003-03-05 |
| US5942290A (en) | 1999-08-24 |
| ATE233777T1 (de) | 2003-03-15 |
| NO973945L (no) | 1998-03-02 |
| CN1101822C (zh) | 2003-02-19 |
| CN1175583A (zh) | 1998-03-11 |
| JP4200392B2 (ja) | 2008-12-24 |
| JPH1095788A (ja) | 1998-04-14 |
| DE59709426D1 (de) | 2003-04-10 |
| EP0826692A3 (de) | 1999-03-03 |
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