ATE233777T1 - Molekülkomplexverbindungen als photoinitiatoren - Google Patents

Molekülkomplexverbindungen als photoinitiatoren

Info

Publication number
ATE233777T1
ATE233777T1 AT97810582T AT97810582T ATE233777T1 AT E233777 T1 ATE233777 T1 AT E233777T1 AT 97810582 T AT97810582 T AT 97810582T AT 97810582 T AT97810582 T AT 97810582T AT E233777 T1 ATE233777 T1 AT E233777T1
Authority
AT
Austria
Prior art keywords
complex compounds
molecular complex
photoinitiators
compound
photopolymerisation
Prior art date
Application number
AT97810582T
Other languages
German (de)
English (en)
Inventor
David George Leppard
Thomas Lloyd James
Nils Hoeck
Manfred Koehler
Ronald Salathe
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE233777T1 publication Critical patent/ATE233777T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Molecular Biology (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Laminated Bodies (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Printing Methods (AREA)
  • Paper (AREA)
AT97810582T 1996-08-28 1997-08-19 Molekülkomplexverbindungen als photoinitiatoren ATE233777T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH211596 1996-08-28

Publications (1)

Publication Number Publication Date
ATE233777T1 true ATE233777T1 (de) 2003-03-15

Family

ID=4226232

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97810582T ATE233777T1 (de) 1996-08-28 1997-08-19 Molekülkomplexverbindungen als photoinitiatoren

Country Status (15)

Country Link
US (1) US5942290A (enExample)
EP (1) EP0826692B1 (enExample)
JP (1) JP4200392B2 (enExample)
KR (1) KR100530088B1 (enExample)
CN (1) CN1101822C (enExample)
AT (1) ATE233777T1 (enExample)
AU (1) AU720186B2 (enExample)
BR (1) BR9704552A (enExample)
CA (1) CA2213886C (enExample)
DE (1) DE59709426D1 (enExample)
NO (1) NO309145B1 (enExample)
RU (1) RU2181726C2 (enExample)
SG (1) SG53043A1 (enExample)
TW (1) TW401439B (enExample)
ZA (1) ZA977692B (enExample)

Families Citing this family (105)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
US6251962B1 (en) * 1997-02-19 2001-06-26 Ciba Specialty Chemicals Corporation (Co)polymers by photopolymerization
DE19810745C2 (de) 1998-03-12 2000-05-04 Bayer Ag Flüssige Katalysatorformulierung aus Tetraphenylphosphoniumphenolat und Phenol und deren Verwendung
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
KR100685153B1 (ko) * 1998-12-03 2007-02-22 시바 스페셜티 케미칼스 홀딩 인크. 광개시제 혼합물, 이를 포함하는 광중합성 조성물 및 이의 용도
US6048375A (en) * 1998-12-16 2000-04-11 Norton Company Coated abrasive
US6803392B1 (en) * 1999-10-20 2004-10-12 Ciba Specialty Chemicals Corporation Photoinitiator formulations
ES2208250T3 (es) * 1999-12-08 2004-06-16 Ciba Specialty Chemicals Holding Inc. Nuevos sistemas de fotoiniciadores de oxido de fosfina y composiciones reticulables de color bajo.
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
JP4597323B2 (ja) * 2000-07-07 2010-12-15 リンテック株式会社 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート
US6737216B2 (en) * 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
US7300690B2 (en) * 2001-03-29 2007-11-27 General Electric Company Radial tilt reduced media
EP1397393A1 (en) * 2001-04-27 2004-03-17 Ucb, S.A. Photo-initiator compositions
EP1253155A1 (en) * 2001-04-27 2002-10-30 Ucb S.A. Photo-initiator compositions
US6780546B2 (en) * 2001-08-30 2004-08-24 Inphase Technologies, Inc. Blue-sensitized holographic media
US6716505B2 (en) * 2001-08-31 2004-04-06 General Electric Company Storage medium for data with improved dimensional stability
TWI312786B (en) * 2001-11-08 2009-08-01 Ciba Sc Holding Ag Novel difunctional photoinitiators
DE10315671A1 (de) * 2003-04-04 2004-10-14 Basf Ag Verfahren zur Herstellung von Acylphosphinoxid-Feststoffen
CA2523569A1 (en) * 2003-05-06 2004-11-18 Ciba Specialty Chemicals Holding Inc. Photo-cured and stabilized coatings
CA2522898A1 (en) * 2003-05-23 2004-12-02 Ciba Specialty Chemicals Holding Inc. Strongly adherent surface coatings
JP4676434B2 (ja) * 2003-08-29 2011-04-27 チバ ホールディング インコーポレーテッド 光ファイバコーティング
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
EP1765878B1 (en) * 2004-04-15 2010-12-08 Basf Se Process for photocuring with light emitting diodes
US20090137771A1 (en) * 2005-08-11 2009-05-28 Satoshi Moriyama Resin composition
US9522967B2 (en) * 2006-06-09 2016-12-20 Dentsply International Inc. Photopolymerizable compositions featuring novel amine accelerator for improved color stability and reduced polymerization stress thereby
KR100917175B1 (ko) 2006-07-05 2009-09-15 주식회사 엘지화학 신규한 아실포스핀 화합물 및 그의 제조방법
BRPI0718332A2 (pt) * 2006-12-11 2015-06-23 Dow Global Technologies Inc Composição de aldeído, composição de álcool, composição de poliéster poliol e poliuretano
US7985785B2 (en) 2007-01-15 2011-07-26 Fujifilm Corporation Ink composition and inkjet recording method using the same
WO2008087981A1 (ja) * 2007-01-17 2008-07-24 Kuraray Medical Inc. 組成物及び歯科用材料
EP1958994B1 (en) 2007-01-31 2010-12-08 FUJIFILM Corporation Ink set for inkjet recording and inkjet recording method
US20080233307A1 (en) * 2007-02-09 2008-09-25 Chisso Corporation Photocurable inkjet ink
JP5416581B2 (ja) * 2007-03-20 2014-02-12 クラレノリタケデンタル株式会社 重合性単量体、重合性組成物及び歯科用材料
JP4601009B2 (ja) 2007-03-30 2010-12-22 富士フイルム株式会社 インクジェット記録用インクセット及びインクジェット記録方法
JP5255369B2 (ja) 2007-09-25 2013-08-07 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
US8076393B2 (en) 2007-09-26 2011-12-13 Fujifilm Corporation Ink composition, inkjet recording method, and printed material
US8129447B2 (en) 2007-09-28 2012-03-06 Fujifilm Corporation Ink composition and inkjet recording method using the same
JP5236238B2 (ja) 2007-09-28 2013-07-17 富士フイルム株式会社 インクジェット記録用ホワイトインク組成物
JP5148235B2 (ja) 2007-09-28 2013-02-20 富士フイルム株式会社 インク組成物
WO2009050116A2 (en) * 2007-10-17 2009-04-23 Basf Se Adhesion promoting photoinitiators for uv cured coatings over metal surfaces
JP5457636B2 (ja) 2008-01-22 2014-04-02 富士フイルム株式会社 光硬化性組成物、光硬化性インク組成物、光硬化物の製造方法、及び、インクジェット記録方法
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
JP5465934B2 (ja) * 2008-07-10 2014-04-09 株式会社松風 硬化性の改善された人工爪組成物
US8378002B2 (en) 2008-07-16 2013-02-19 Fujifilm Corporation Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method
JP5344892B2 (ja) 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP2010229284A (ja) 2009-03-27 2010-10-14 Fujifilm Corp 光硬化性組成物
JP5405174B2 (ja) 2009-03-30 2014-02-05 富士フイルム株式会社 インク組成物
JP5424764B2 (ja) 2009-07-28 2014-02-26 富士フイルム株式会社 顔料分散物、インク組成物、及び、インクジェット記録方法
US8633258B2 (en) 2010-06-30 2014-01-21 Dsm Ip Assets B.V. D1492 liquid BAPO photoinitiator and its use in radiation curable compositions
JP5750069B2 (ja) 2011-03-24 2015-07-15 富士フイルム株式会社 液晶配向促進剤、液晶組成物、高分子材料およびフィルム
JP5774518B2 (ja) 2011-07-27 2015-09-09 富士フイルム株式会社 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム
RU2586743C2 (ru) * 2011-08-23 2016-06-10 Зм Инновейтив Пропертиз Компани Стоматологические композиции, содержащие агенты присоединения-фрагментации
CN103073658A (zh) * 2011-10-26 2013-05-01 深圳市有为化学技术有限公司 新型芳香羟基酮和膦酰氧化物的光引发剂混合物及其与光吸收剂的复合体系
US9801803B2 (en) 2012-06-04 2017-10-31 L'oreal Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with UV-LED
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
EP2903995B1 (en) * 2012-10-01 2019-01-16 ETH Zürich A process for the preparation of acylphosphanes
BR112016009482B8 (pt) * 2013-11-05 2022-12-06 Construction Research & Technology Gmbh Composição de revestimento, uso de uma composição de revestimento, processo para preparação de uma composição de revestimento e método para cura de uma composição de revestimento
JP6169545B2 (ja) 2014-09-09 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6086888B2 (ja) 2014-09-26 2017-03-01 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6169548B2 (ja) 2014-09-26 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
CN104592298B (zh) * 2014-12-31 2016-07-06 湖北固润科技股份有限公司 一种酰基膦高效光引发剂及其制备方法
JP2018517034A (ja) 2015-06-08 2018-06-28 ディーエスエム アイピー アセッツ ビー.ブイ. 付加造形用液状ハイブリッドUV/vis線硬化性樹脂組成物
US9458334B1 (en) * 2015-07-01 2016-10-04 Electronics For Imaging, Inc. Aqueous radiation curable ink composition
JP6880416B2 (ja) 2015-10-01 2021-06-02 ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. 付加造形用液状ハイブリッドUV/vis線硬化性樹脂組成物
CN106349285B (zh) * 2016-08-29 2018-05-15 天津久日新材料股份有限公司 含羟基酰基膦氧化合物及其制备和应用
WO2018084076A1 (ja) 2016-11-04 2018-05-11 富士フイルム株式会社 ウインドシールドガラス、ヘッドアップディスプレイシステム、およびハーフミラーフィルム
EP3581975B1 (en) 2017-02-09 2024-04-03 FUJIFILM Corporation Half mirror, method for producing half mirror, and mirror provided with image display function
RU2684387C2 (ru) * 2017-05-03 2019-04-08 Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН) Фотополимерная композиция для изготовления термостойких объектов методом лазерной стереолитографии
JP7111432B2 (ja) 2017-06-02 2022-08-02 コベストロ (ネザーランズ) ビー.ブイ. 光ファイバー用耐熱放射線硬化性コーティング
CN114236845B (zh) 2017-09-07 2024-11-05 富士胶片株式会社 投影图像显示用夹层玻璃及图像显示系统
PL3687949T3 (pl) 2017-11-03 2024-11-04 Covestro (Netherlands) B.V. Układy blokujące wodę zawierające włókna powleczone ciekłymi, utwardzanymi promieniowaniem kompozycjami sap
CN111566068B (zh) 2018-02-23 2022-09-06 富士胶片株式会社 图像显示用夹层玻璃的制造方法、图像显示用夹层玻璃及图像显示系统
BR112020024440A2 (pt) 2018-06-01 2021-03-23 Dsm Ip Assets B.V. composições curáveis por radiação para revestir fibra ótica e os revestimentos produzidos a partir das mesmas
WO2020046865A1 (en) 2018-08-30 2020-03-05 Dsm Ip Assets, B.V. Radiation curable compositions for coating optical fiber
EP3869245A4 (en) 2018-10-17 2021-12-15 FUJIFILM Corporation PROJECTION IMAGE DISPLAY ELEMENT, WINDSHIELD GLASS, AND HEAD-UP DISPLAY SYSTEM
JP2022509797A (ja) 2018-12-03 2022-01-24 コベストロ (ネザーランズ) ビー.ヴィー. 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング
WO2020122023A1 (ja) 2018-12-10 2020-06-18 富士フイルム株式会社 投映像表示用部材、ウインドシールドガラスおよびヘッドアップディスプレイシステム
EP3936924B1 (en) 2019-03-06 2025-01-15 FUJIFILM Corporation Laminated film for displaying projection image, laminated glass for displaying projection image, and image display system
WO2020190833A1 (en) 2019-03-18 2020-09-24 Basf Se Uv curable compositions for dirt pick-up resistance
US10894858B2 (en) 2019-05-24 2021-01-19 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
WO2020239563A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
JP7712261B2 (ja) 2019-07-31 2025-07-23 コベストロ (ネザーランズ) ビー.ブイ. 光ファイバーを被覆するための多官能性長アームオリゴマーを含む放射線硬化性組成物
US12252561B2 (en) 2019-08-30 2025-03-18 Stratasys, Inc. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2021042013A1 (en) 2019-08-30 2021-03-04 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
EP4036644B1 (en) 2019-09-27 2025-04-23 FUJIFILM Corporation Projector for head-up display
EP4041779A1 (en) 2019-10-10 2022-08-17 IGM Resins Italia S.r.l. Combination of photoinitiators and uses thereof
EP4083668B1 (en) 2019-12-26 2025-10-29 FUJIFILM Corporation Light absorption anisotropic layer, laminate, optical film, image display device, back light module
EP4130812A4 (en) 2020-03-30 2023-11-22 FUJIFILM Corporation REFLECTIVE FILM, WINDSHIELD GLASS AND HEAD-UP DISPLAY SYSTEM
WO2021202623A1 (en) 2020-04-03 2021-10-07 Dsm Ip Assets B.V. Self-healing optical fibers and the compositions used to create the same
US20230117457A1 (en) 2020-04-03 2023-04-20 Covestro (Netherlands) B.V. Methods of synthesizing multi-hydrogen bonding oligomers
WO2021202638A1 (en) 2020-04-03 2021-10-07 Dsm Ip Assets B.V. Multi-layered optical devices
CN115698783A (zh) 2020-06-03 2023-02-03 富士胶片株式会社 反射膜、夹层玻璃的制造方法及夹层玻璃
WO2022002909A1 (en) 2020-06-30 2022-01-06 Covestro (Netherlands) B.V. Viscosity index improvers in optical fiber coatings
CN116568545A (zh) 2020-12-09 2023-08-08 富士胶片株式会社 反射膜、挡风玻璃及平视显示系统
CN116888221A (zh) 2021-02-22 2023-10-13 科思创(荷兰)有限公司 提供低光泽涂层的方法
EP4411452A4 (en) 2021-09-30 2025-02-05 FUJIFILM Corporation Head-up display system and transport
EP4423155B1 (en) 2021-10-29 2025-10-01 Covestro (Netherlands) B.V. Radical-curable composition
CN118302708A (zh) 2021-11-05 2024-07-05 富士胶片株式会社 虚像显示装置、平视显示系统及运输机
JPWO2023200018A1 (enExample) 2022-04-15 2023-10-19
WO2023205224A2 (en) 2022-04-21 2023-10-26 Covestro (Netherlands) B.V. Low-volatility radiation curable compositions for coating optical fibers
US20250360534A1 (en) 2022-05-25 2025-11-27 Covestro (Netherlands) B.V. Process for providing low gloss coatings
WO2024042074A1 (en) 2022-08-24 2024-02-29 Covestro (Netherlands) B.V. Process for providing low gloss coatings

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
US4318791A (en) * 1977-12-22 1982-03-09 Ciba-Geigy Corporation Use of aromatic-aliphatic ketones as photo sensitizers
DE2909994A1 (de) * 1979-03-14 1980-10-02 Basf Ag Acylphosphinoxidverbindungen, ihre herstellung und verwendung
EP0007508B1 (de) * 1978-07-14 1983-06-01 BASF Aktiengesellschaft Acylphosphinoxidverbindungen, ihre Herstellung und ihre Verwendung
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
EP0413657B1 (de) * 1989-08-04 1996-12-27 Ciba SC Holding AG Mono- und Diacylphosphinoxide
EP0446175A3 (en) * 1990-03-09 1991-11-21 Ciba-Geigy Ag Mixture of photoinitiators
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
TW303379B (enExample) * 1994-03-02 1997-04-21 Ciba Sc Holding Ag
TW381106B (en) * 1994-09-02 2000-02-01 Ciba Sc Holding Ag Alkoxyphenyl-substituted bisacylphosphine oxides
WO1996007662A1 (en) * 1994-09-08 1996-03-14 Ciba Specialty Chemicals Holding Inc. Novel acylphosphine oxides
DE19618720A1 (de) * 1995-05-12 1996-11-14 Ciba Geigy Ag Bisacyl-bisphosphine, -oxide und -sulfide
SE520727C2 (sv) * 1996-03-04 2003-08-19 Ciba Sc Holding Ag Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar

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KR19980019052A (ko) 1998-06-05
AU3522697A (en) 1998-03-05
NO973945D0 (no) 1997-08-27
BR9704552A (pt) 1998-09-01
RU2181726C2 (ru) 2002-04-27
CA2213886A1 (en) 1998-02-28
TW401439B (en) 2000-08-11
ZA977692B (en) 1998-03-02
AU720186B2 (en) 2000-05-25
EP0826692A2 (de) 1998-03-04
NO309145B1 (no) 2000-12-18
SG53043A1 (en) 1998-09-28
KR100530088B1 (ko) 2006-04-06
CA2213886C (en) 2005-12-06
MX9706542A (es) 1998-07-31
EP0826692B1 (de) 2003-03-05
US5942290A (en) 1999-08-24
NO973945L (no) 1998-03-02
CN1101822C (zh) 2003-02-19
CN1175583A (zh) 1998-03-11
JP4200392B2 (ja) 2008-12-24
JPH1095788A (ja) 1998-04-14
DE59709426D1 (de) 2003-04-10
EP0826692A3 (de) 1999-03-03

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