ATE513309T1 - Belichtungsvorrichtung und verfahren zur bauelementeherstellung - Google Patents

Belichtungsvorrichtung und verfahren zur bauelementeherstellung

Info

Publication number
ATE513309T1
ATE513309T1 AT04747523T AT04747523T ATE513309T1 AT E513309 T1 ATE513309 T1 AT E513309T1 AT 04747523 T AT04747523 T AT 04747523T AT 04747523 T AT04747523 T AT 04747523T AT E513309 T1 ATE513309 T1 AT E513309T1
Authority
AT
Austria
Prior art keywords
liquid
substrate
exposure device
producing components
exposure apparatus
Prior art date
Application number
AT04747523T
Other languages
German (de)
English (en)
Inventor
Hiroyuki Nagasaka
Takeshi Okuyama
Original Assignee
Nikon Corp
Nikon Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nikon Engineering Co Ltd filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE513309T1 publication Critical patent/ATE513309T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
AT04747523T 2003-07-09 2004-07-08 Belichtungsvorrichtung und verfahren zur bauelementeherstellung ATE513309T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003272617 2003-07-09
PCT/JP2004/010057 WO2005006415A1 (ja) 2003-07-09 2004-07-08 露光装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
ATE513309T1 true ATE513309T1 (de) 2011-07-15

Family

ID=34055983

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04747523T ATE513309T1 (de) 2003-07-09 2004-07-08 Belichtungsvorrichtung und verfahren zur bauelementeherstellung

Country Status (5)

Country Link
US (7) US7508490B2 (enExample)
EP (3) EP2264531B1 (enExample)
JP (11) JP4515385B2 (enExample)
AT (1) ATE513309T1 (enExample)
WO (1) WO2005006415A1 (enExample)

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