JP4515385B2 - 露光装置、露光方法、及びデバイス製造方法 - Google Patents

露光装置、露光方法、及びデバイス製造方法 Download PDF

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Publication number
JP4515385B2
JP4515385B2 JP2005511580A JP2005511580A JP4515385B2 JP 4515385 B2 JP4515385 B2 JP 4515385B2 JP 2005511580 A JP2005511580 A JP 2005511580A JP 2005511580 A JP2005511580 A JP 2005511580A JP 4515385 B2 JP4515385 B2 JP 4515385B2
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liquid
substrate
flow path
supply
recovery
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JPWO2005006415A1 (ja
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博之 長坂
猛 奥山
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Nikon Corp
Nikon Engineering Co Ltd
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Nikon Corp
Nikon Engineering Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2005511580A 2003-07-09 2004-07-08 露光装置、露光方法、及びデバイス製造方法 Expired - Fee Related JP4515385B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003272617 2003-07-09
JP2003272617 2003-07-09
PCT/JP2004/010057 WO2005006415A1 (ja) 2003-07-09 2004-07-08 露光装置及びデバイス製造方法

Related Child Applications (2)

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JP2009013527A Division JP4717933B2 (ja) 2003-07-09 2009-01-23 露光装置、及びデバイス製造方法
JP2009013528A Division JP4786724B2 (ja) 2003-07-09 2009-01-23 露光装置、液体回収装置、露光方法、及びデバイス製造方法

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JPWO2005006415A1 JPWO2005006415A1 (ja) 2006-09-28
JP4515385B2 true JP4515385B2 (ja) 2010-07-28

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JP2005511580A Expired - Fee Related JP4515385B2 (ja) 2003-07-09 2004-07-08 露光装置、露光方法、及びデバイス製造方法
JP2009013527A Expired - Lifetime JP4717933B2 (ja) 2003-07-09 2009-01-23 露光装置、及びデバイス製造方法
JP2009013528A Expired - Fee Related JP4786724B2 (ja) 2003-07-09 2009-01-23 露光装置、液体回収装置、露光方法、及びデバイス製造方法
JP2010255406A Expired - Fee Related JP5545868B2 (ja) 2003-07-09 2010-11-15 露光装置、及びデバイス製造方法
JP2012015912A Expired - Lifetime JP5722809B2 (ja) 2003-07-09 2012-01-27 露光装置、及びデバイス製造方法
JP2013226196A Expired - Fee Related JP5770814B2 (ja) 2003-07-09 2013-10-31 露光装置、及びデバイス製造方法
JP2013257535A Expired - Fee Related JP5937054B2 (ja) 2003-07-09 2013-12-13 露光装置、及びデバイス製造方法
JP2014246464A Expired - Fee Related JP5917667B2 (ja) 2003-07-09 2014-12-05 露光装置、及びデバイス製造方法
JP2015231233A Expired - Fee Related JP6234982B2 (ja) 2003-07-09 2015-11-27 露光装置、及びデバイス製造方法
JP2016219762A Expired - Fee Related JP6466894B2 (ja) 2003-07-09 2016-11-10 露光方法、及びデバイス製造方法
JP2018001628A Pending JP2018063451A (ja) 2003-07-09 2018-01-10 露光装置、及びデバイス製造方法

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JP2009013527A Expired - Lifetime JP4717933B2 (ja) 2003-07-09 2009-01-23 露光装置、及びデバイス製造方法
JP2009013528A Expired - Fee Related JP4786724B2 (ja) 2003-07-09 2009-01-23 露光装置、液体回収装置、露光方法、及びデバイス製造方法
JP2010255406A Expired - Fee Related JP5545868B2 (ja) 2003-07-09 2010-11-15 露光装置、及びデバイス製造方法
JP2012015912A Expired - Lifetime JP5722809B2 (ja) 2003-07-09 2012-01-27 露光装置、及びデバイス製造方法
JP2013226196A Expired - Fee Related JP5770814B2 (ja) 2003-07-09 2013-10-31 露光装置、及びデバイス製造方法
JP2013257535A Expired - Fee Related JP5937054B2 (ja) 2003-07-09 2013-12-13 露光装置、及びデバイス製造方法
JP2014246464A Expired - Fee Related JP5917667B2 (ja) 2003-07-09 2014-12-05 露光装置、及びデバイス製造方法
JP2015231233A Expired - Fee Related JP6234982B2 (ja) 2003-07-09 2015-11-27 露光装置、及びデバイス製造方法
JP2016219762A Expired - Fee Related JP6466894B2 (ja) 2003-07-09 2016-11-10 露光方法、及びデバイス製造方法
JP2018001628A Pending JP2018063451A (ja) 2003-07-09 2018-01-10 露光装置、及びデバイス製造方法

Country Status (5)

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US (7) US7508490B2 (enExample)
EP (3) EP2264532B1 (enExample)
JP (11) JP4515385B2 (enExample)
AT (1) ATE513309T1 (enExample)
WO (1) WO2005006415A1 (enExample)

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