ATE451720T1 - Silizium-photovervielfacher mit zellenmatrix - Google Patents

Silizium-photovervielfacher mit zellenmatrix

Info

Publication number
ATE451720T1
ATE451720T1 AT05749398T AT05749398T ATE451720T1 AT E451720 T1 ATE451720 T1 AT E451720T1 AT 05749398 T AT05749398 T AT 05749398T AT 05749398 T AT05749398 T AT 05749398T AT E451720 T1 ATE451720 T1 AT E451720T1
Authority
AT
Austria
Prior art keywords
layer
conductance type
cms
agent concentration
doping agent
Prior art date
Application number
AT05749398T
Other languages
German (de)
English (en)
Inventor
Boris Anatolievich Dolgoshein
Elena Viktorovna Popova
Sergey Nikolaevich Klemin
Leonid Anatolievich Filatov
Original Assignee
Boris Anatolievich Dolgoshein
Max Planck Gesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boris Anatolievich Dolgoshein, Max Planck Gesellschaft filed Critical Boris Anatolievich Dolgoshein
Application granted granted Critical
Publication of ATE451720T1 publication Critical patent/ATE451720T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/225Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/29Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Light Receiving Elements (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
AT05749398T 2004-05-05 2005-05-05 Silizium-photovervielfacher mit zellenmatrix ATE451720T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU2004113616/28A RU2290721C2 (ru) 2004-05-05 2004-05-05 Кремниевый фотоэлектронный умножитель (варианты) и ячейка для кремниевого фотоэлектронного умножителя
PCT/RU2005/000242 WO2005106971A1 (en) 2004-05-05 2005-05-05 Silicon photomultiplier (variants) and a cell therefor

Publications (1)

Publication Number Publication Date
ATE451720T1 true ATE451720T1 (de) 2009-12-15

Family

ID=35241944

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05749398T ATE451720T1 (de) 2004-05-05 2005-05-05 Silizium-photovervielfacher mit zellenmatrix

Country Status (9)

Country Link
US (1) US7759623B2 (enExample)
EP (2) EP1755171B8 (enExample)
JP (1) JP2007536703A (enExample)
KR (1) KR101113364B1 (enExample)
CN (1) CN1998091B (enExample)
AT (1) ATE451720T1 (enExample)
DE (1) DE602005018200D1 (enExample)
RU (1) RU2290721C2 (enExample)
WO (1) WO2005106971A1 (enExample)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2416840C2 (ru) 2006-02-01 2011-04-20 Конинклейке Филипс Электроникс, Н.В. Лавинный фотодиод в режиме счетчика гейгера
US20080012087A1 (en) * 2006-04-19 2008-01-17 Henri Dautet Bonded wafer avalanche photodiode and method for manufacturing same
TWI523209B (zh) 2006-07-03 2016-02-21 濱松赫德尼古斯股份有限公司 光二極體陣列
EP2047297B1 (en) * 2006-07-21 2017-07-05 Koninklijke Philips N.V. Method and system for improved tof pet reconstruction
US7652257B2 (en) * 2007-06-15 2010-01-26 General Electric Company Structure of a solid state photomultiplier
DE102007037020B3 (de) * 2007-08-06 2008-08-21 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Avalanche-Photodiode
WO2009019660A2 (en) * 2007-08-08 2009-02-12 Koninklijke Philips Electronics N.V. Silicon photomultiplier trigger network
ITTO20080045A1 (it) 2008-01-18 2009-07-19 St Microelectronics Srl Schiera di fotodiodi operanti in modalita' geiger reciprocamente isolati e relativo procedimento di fabbricazione
ITTO20080046A1 (it) 2008-01-18 2009-07-19 St Microelectronics Srl Schiera di fotodiodi operanti in modalita' geiger reciprocamente isolati e relativo procedimento di fabbricazione
KR100987057B1 (ko) * 2008-06-12 2010-10-11 한국과학기술원 광검출 효율이 향상된 실리콘 광전자 증배관 및 이를포함하는 감마선 검출기
RU2386192C1 (ru) * 2008-08-20 2010-04-10 Александр Иванович Патрашин Многокаскадный лавинный фотодетектор
DE102009017505B4 (de) 2008-11-21 2014-07-10 Ketek Gmbh Strahlungsdetektor, Verwendung eines Strahlungsdetektors und Verfahren zur Herstellung eines Strahlungsdetektors
IT1392366B1 (it) * 2008-12-17 2012-02-28 St Microelectronics Rousset Fotodiodo operante in modalita' geiger con resistore di soppressione integrato e controllabile, schiera di fotodiodi e relativo procedimento di fabbricazione
DE112009004341B4 (de) 2009-01-11 2015-12-10 Ketek Gmbh Halbleiter-Geigermodus-Mikrozellenphotodioden
IT1393781B1 (it) 2009-04-23 2012-05-08 St Microelectronics Rousset Fotodiodo operante in modalita' geiger con resistore di soppressione integrato e controllabile ad effetto jfet, schiera di fotodiodi e relativo procedimento di fabbricazione
KR101148335B1 (ko) * 2009-07-23 2012-05-21 삼성전기주식회사 실리콘 반도체를 이용한 광전자 증배관 및 그 구조 셀
CA2769121C (en) * 2009-08-03 2016-07-26 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. Highly efficient cmos technology compatible silicon photoelectric multiplier
KR101084940B1 (ko) * 2009-09-28 2011-11-17 삼성전기주식회사 실리콘 광전자 증배관
KR20110068070A (ko) * 2009-12-15 2011-06-22 삼성전기주식회사 실리콘 광전자 증배 소자를 이용한 저조도용 촬영 장치
WO2011122856A2 (ko) * 2010-03-30 2011-10-06 이화여자대학교 산학협력단 실리콘 광증배 소자
IT1399690B1 (it) 2010-03-30 2013-04-26 St Microelectronics Srl Fotodiodo a valanga operante in modalita' geiger ad elevato rapporto segnale rumore e relativo procedimento di fabbricazione
EP2561556B1 (en) 2010-04-23 2016-06-08 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Silicon photoelectric multiplier
WO2012019640A1 (en) 2010-08-10 2012-02-16 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Silicon photoelectric multiplier with multiple "isochronic" read-out
CN102024863B (zh) * 2010-10-11 2013-03-27 湘潭大学 高速增强型紫外硅选择性雪崩光电二极管及其制作方法
KR101711087B1 (ko) 2010-12-07 2017-02-28 한국전자통신연구원 실리콘 포토멀티플라이어 및 그 제조 방법
KR101749240B1 (ko) 2010-12-17 2017-06-21 한국전자통신연구원 반도체 포토멀티플라이어의 상부 광학 구조 및 그 제작 방법
KR101648023B1 (ko) * 2010-12-21 2016-08-12 한국전자통신연구원 트렌치 분리형 실리콘 포토멀티플라이어
CA2821578C (en) 2010-12-21 2016-03-22 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Silicon photoelectric multiplier with optical cross-talk suppression due to special properties of the substrate
US8368159B2 (en) 2011-07-08 2013-02-05 Excelitas Canada, Inc. Photon counting UV-APD
KR101283534B1 (ko) * 2011-07-28 2013-07-15 이화여자대학교 산학협력단 실리콘 광전자 증배 소자의 제조방법
US8871557B2 (en) 2011-09-02 2014-10-28 Electronics And Telecommunications Research Institute Photomultiplier and manufacturing method thereof
JP5791461B2 (ja) * 2011-10-21 2015-10-07 浜松ホトニクス株式会社 光検出装置
JP5984617B2 (ja) 2012-10-18 2016-09-06 浜松ホトニクス株式会社 フォトダイオードアレイ
JP5963642B2 (ja) 2012-10-29 2016-08-03 浜松ホトニクス株式会社 フォトダイオードアレイ
US20140159180A1 (en) * 2012-12-06 2014-06-12 Agency For Science, Technology And Research Semiconductor resistor structure and semiconductor photomultiplier device
KR101395102B1 (ko) 2013-02-14 2014-05-16 한국과학기술원 Pcb 기판을 이용한 실리콘 광전자증배관의 패키징 방법
JP5925711B2 (ja) 2013-02-20 2016-05-25 浜松ホトニクス株式会社 検出器、pet装置及びx線ct装置
EP2793273B1 (en) * 2013-04-17 2016-12-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Silicon photomultiplier with very low optical cross-talk and improved readout
US9410901B2 (en) * 2014-03-17 2016-08-09 Kla-Tencor Corporation Image sensor, an inspection system and a method of inspecting an article
TWI700823B (zh) * 2014-06-27 2020-08-01 日商半導體能源研究所股份有限公司 攝像裝置及電子裝置
DE102018119710A1 (de) * 2018-08-14 2020-02-20 Universität Leipzig Vorrichtung und verfahren zur bestimmung einer wellenlänge einer strahlung
CN109276268A (zh) * 2018-11-21 2019-01-29 京东方科技集团股份有限公司 X射线探测装置及其制造方法
US11428826B2 (en) 2019-09-09 2022-08-30 Semiconductor Components Industries, Llc Silicon photomultipliers with split microcells
RU2770147C1 (ru) * 2021-06-21 2022-04-14 Садыгов Зираддин Ягуб оглы Микропиксельный лавинный фотодиод
CN114093962B (zh) * 2021-11-22 2024-04-09 季华实验室 单光子雪崩二极管和光电探测器阵列

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2108781B1 (enExample) * 1970-10-05 1974-10-31 Radiotechnique Compelec
JPS5252593A (en) * 1975-10-27 1977-04-27 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light receiving diode
CA1177148A (en) * 1981-10-06 1984-10-30 Robert J. Mcintyre Avalanche photodiode array
JPS59119772A (ja) * 1982-12-24 1984-07-11 Fujitsu Ltd 半導体受光素子
NL187416C (nl) 1983-07-14 1991-09-16 Philips Nv Stralingsgevoelige halfgeleiderinrichting.
US4586068A (en) * 1983-10-07 1986-04-29 Rockwell International Corporation Solid state photomultiplier
JPS61154063A (ja) * 1984-12-26 1986-07-12 Toshiba Corp 光半導体装置およびその製造方法
JPH0799868B2 (ja) * 1984-12-26 1995-10-25 日本放送協会 固体撮像装置
JPS63124458A (ja) 1986-11-12 1988-05-27 Mitsubishi Electric Corp 受光素子
US5146296A (en) * 1987-12-03 1992-09-08 Xsirius Photonics, Inc. Devices for detecting and/or imaging single photoelectron
SU1702831A1 (ru) * 1989-10-11 1997-06-27 Институт ядерных исследований АН СССР Лавинный фотоприемник
US5923071A (en) * 1992-06-12 1999-07-13 Seiko Instruments Inc. Semiconductor device having a semiconductor film of low oxygen concentration
JPH07240534A (ja) * 1993-03-16 1995-09-12 Seiko Instr Inc 光電変換半導体装置及びその製造方法
RU2105388C1 (ru) * 1996-04-10 1998-02-20 Виктор Михайлович Горловин Лавинный фотоприемник
RU2086047C1 (ru) 1996-05-30 1997-07-27 Зираддин Ягуб-оглы Садыгов Лавинный фотоприемник
RU2102821C1 (ru) * 1996-10-10 1998-01-20 Зираддин Ягуб-оглы Садыгов Лавинный фотодиод
US5844291A (en) * 1996-12-20 1998-12-01 Board Of Regents, The University Of Texas System Wide wavelength range high efficiency avalanche light detector with negative feedback
JPH1126741A (ja) * 1997-07-04 1999-01-29 Toshiba Corp 固体撮像装置
US5880490A (en) * 1997-07-28 1999-03-09 Board Of Regents, The University Of Texas System Semiconductor radiation detectors with intrinsic avalanche multiplication in self-limiting mode of operation
IT246635Y1 (it) * 1999-04-09 2002-04-09 Claber Spa Solenoide di comando per elettrovalvola in particolare per il controllo di impianti di irrigazione
IT1317199B1 (it) * 2000-04-10 2003-05-27 Milano Politecnico Dispositivo fotorivelatore ultrasensibile con diaframma micrometricointegrato per microscopi confocali
US6541836B2 (en) * 2001-02-21 2003-04-01 Photon Imaging, Inc. Semiconductor radiation detector with internal gain
IES20010616A2 (en) 2001-06-28 2002-05-15 Nat Microelectronics Res Ct Microelectronic device and method of its manufacture
WO2004027879A2 (en) * 2002-09-19 2004-04-01 Quantum Semiconductor Llc Light-sensing device
US6838741B2 (en) * 2002-12-10 2005-01-04 General Electtric Company Avalanche photodiode for use in harsh environments
US20040245592A1 (en) 2003-05-01 2004-12-09 Yale University Solid state microchannel plate photodetector
WO2005048319A2 (en) 2003-11-06 2005-05-26 Yale University Large-area detector
US7160753B2 (en) * 2004-03-16 2007-01-09 Voxtel, Inc. Silicon-on-insulator active pixel sensors
JP4841834B2 (ja) 2004-12-24 2011-12-21 浜松ホトニクス株式会社 ホトダイオードアレイ
BRPI0610720B1 (pt) 2005-04-22 2018-01-16 Koninklijke Philips N. V. “pixel detector para uso em conjunto com um cintilador que converte uma partícula de radiação para uma rajada de luz, detector de radiação, sistema de geração de imagem de tomografia por emissão de pósitron de duração de trajetória (tof-pet), 5 método executado em conjunto com um cintilador que converte uma partícula de radiação para uma rajada de luz, e detector de radiação que inclui um cintilador e circuitos”
GB2426575A (en) 2005-05-27 2006-11-29 Sensl Technologies Ltd Photon detector using controlled sequences of reset and discharge of a capacitor to sense photons
GB2426576A (en) 2005-05-27 2006-11-29 Sensl Technologies Ltd Light sensor module comprising a plurality of elements in a close-tiled arrangement
US7268339B1 (en) * 2005-09-27 2007-09-11 Radiation Monitoring Devices, Inc. Large area semiconductor detector with internal gain
RU2416840C2 (ru) 2006-02-01 2011-04-20 Конинклейке Филипс Электроникс, Н.В. Лавинный фотодиод в режиме счетчика гейгера
TWI523209B (zh) 2006-07-03 2016-02-21 濱松赫德尼古斯股份有限公司 光二極體陣列
US8188563B2 (en) 2006-07-21 2012-05-29 The Regents Of The University Of California Shallow-trench-isolation (STI)-bounded single-photon CMOS photodetector
GB2446185A (en) 2006-10-30 2008-08-06 Sensl Technologies Ltd Optical assembly and method of assembly
GB2447264A (en) 2007-03-05 2008-09-10 Sensl Technologies Ltd Optical position sensitive detector

Also Published As

Publication number Publication date
US20080251692A1 (en) 2008-10-16
WO2005106971A1 (en) 2005-11-10
KR101113364B1 (ko) 2012-03-02
EP2144287B1 (en) 2016-12-07
EP1755171B8 (de) 2010-05-19
RU2290721C2 (ru) 2006-12-27
EP1755171B1 (en) 2009-12-09
JP2007536703A (ja) 2007-12-13
EP1755171A4 (de) 2008-02-27
DE602005018200D1 (de) 2010-01-21
EP2144287A1 (en) 2010-01-13
CN1998091B (zh) 2010-09-29
US7759623B2 (en) 2010-07-20
KR20070051782A (ko) 2007-05-18
EP1755171A1 (en) 2007-02-21
CN1998091A (zh) 2007-07-11

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