WO2005106971A1 - Silicon photomultiplier (variants) and a cell therefor - Google Patents
Silicon photomultiplier (variants) and a cell therefor Download PDFInfo
- Publication number
- WO2005106971A1 WO2005106971A1 PCT/RU2005/000242 RU2005000242W WO2005106971A1 WO 2005106971 A1 WO2005106971 A1 WO 2005106971A1 RU 2005000242 W RU2005000242 W RU 2005000242W WO 2005106971 A1 WO2005106971 A1 WO 2005106971A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- october
- slοy
- τiπa
- legiρuyuschey
- κοntsenτρatsiey
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/225—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/29—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- ⁇ The disadvantages of this device are the following: - Decrease in the efficiency of registration of payment due to the omission of payment for the exclusion; - insufficiently high efficiency of registration of long-wavelength light due to the small depth of the sensitive area; - there is an optical connection between the neighboring cells, which comes to the point that, when operating one of the cells in the Geygera, there is a chance that the device is inactive, Due to the large number of gain factors, this phenomenon limits the gain, the efficiency and the power factor. In addition, the presence of an optical connection creates an excessive noise factor, which worsens the ideal Poisson static and a shortage of noise; - The technological complexity of applying a resistive layer.
- SIGNIFICANT FOX (DR. 26) 3
- the non-medical result is the increased effective registration of the light in a wide range of long-term due to the increase in the increased duration of the disease.
- ⁇ e ⁇ niches ⁇ y ⁇ ezul ⁇ a ⁇ (va ⁇ ian ⁇ 2) on account d ⁇ s ⁇ igae ⁇ sya ⁇ g ⁇ , ch ⁇ ⁇ emnievy ⁇ ele ⁇ nny umn ⁇ zhi ⁇ el, s ⁇ de ⁇ zhaschy ⁇ dl ⁇ zh ⁇ u ⁇ - ⁇ i ⁇ a ⁇ v ⁇ dim ⁇ s ⁇ i on ⁇ - ⁇ uyu applied sl ⁇ y ⁇ ++ ⁇ i ⁇ a ⁇ v ⁇ dim ⁇ s ⁇ i with ⁇ ntsen ⁇ atsiey legi ⁇ uyuschey ⁇ imesi October 18 ⁇ 20 October cm "3 s ⁇ s ⁇ i ⁇ of from ⁇ dina ⁇ vy ⁇ and nezavisimy ⁇ d ⁇ ug ⁇ d ⁇ uga yachee ⁇ , ⁇ azhdaya of ⁇ y ⁇ v ⁇ lyuchae ⁇ a e ⁇ i ⁇ a ⁇ sialnsh sl ⁇ y ⁇
- SIGNIFICANT FOX (DR. 26) 4
- the product is used in conjunction with the product (instead of 1, the product is in use)
- FIG. 1 a configuration of a cell for a brown photo-electric multiplier is provided in accordance with the invention.
- the first option of a dark-colored multiplier is provided. It is provided with a second option of a small photoelectric multiplier.
- FIG. 4 a design of the cell is provided in accordance with the invention. (an invariant variation). ⁇ a ⁇ ig. 5
- the first option of a dark-colored multiplier (invariant version of the upgrade) is provided.
- FIG. 6 a second version of the secondary multiplier is presented (invariant version of the increase).
- Oxide oxide which is not sensitive to sensible sensibility, is located on the rear of the battery 5, connecting the 4 ⁇ + field bus 5 E ⁇ e ⁇ ivnaya ⁇ egis ⁇ atsii sve ⁇ a in shi ⁇ y ⁇ blas ⁇ i s ⁇ e ⁇ a (300 - 900 m ⁇ m) ⁇ i s ⁇ anenii niz ⁇ g ⁇ ⁇ ab ⁇ cheg ⁇ na ⁇ yazheniya and vys ⁇ y ⁇ dn ⁇ dn ⁇ s ⁇ i ele ⁇ iche- s ⁇ g ⁇ ⁇ lya d ⁇ s ⁇ igae ⁇ sya in ⁇ a ⁇ y s ⁇ u ⁇ u ⁇ e ⁇ u ⁇ em s ⁇ zdaniya vs ⁇ enn ⁇ g ⁇ ele ⁇ iche- s ⁇ g ⁇ ⁇ lya, ⁇ e v ⁇ zni ⁇ ae ⁇ blag ⁇ da ⁇ ya s ⁇ etsialn ⁇ s ⁇ mi ⁇ vann ⁇ m
- the concentration of impurities in the epitaxial layer is reduced in the direction of the use of the optically sensible amplifier. This is the remote access to the acoustic layer (optical sensory layer). It is sensitive to the size of the dark-colored multiplier, and it is noteworthy that it is susceptible to negative effects.
- the oxide of the battery is located on a polysilicon resistor 5, which connects the 4 ⁇ + layer with the 6 bus power supply. Between the cells are located the separating elements 10, which, in particular, add up to the practical optical components.
- the cells are identical, which are not detectable for faint light flashes and are prone to the number of cells that have been activated, that is, the intensity of the light.
- One of the main features of the operation in the geyser mode is the dependence of the amplification of the cell from the bias voltage linear, which reduces the consumption of the mains voltage.
- the general bus 6 (anode) is supplied with a good voltage; the value of the bus must be maintained; P ⁇ i ⁇ gl ⁇ schenii ⁇ van ⁇ a sve ⁇ a ⁇ b ⁇ azuyuschiesya n ⁇ si ⁇ eli za ⁇ yada s ⁇ bi- ⁇ ayu ⁇ sya not ⁇ l ⁇ of ⁇ blas ⁇ i ⁇ bedneniya, n ⁇ and not of ⁇ bednenn ⁇ y ⁇ e ⁇ e ⁇ dn ⁇ y ⁇ blas ⁇ i in ⁇ y due g ⁇ adien ⁇ a ⁇ ntsen ⁇ atsii ⁇ imesi susches ⁇ vue ⁇ vs ⁇ enn ⁇ e ele ⁇ - ⁇ iches ⁇ e ⁇ le, zas ⁇ avlyayuschee ele ⁇ ny dvsha ⁇ sya ⁇ an ⁇ du.
- the size of the airborne shutter 5 is selected from the condition of availability for extinguishing avalanche discharges. Technological disruption in manufacture. An important part is that the process is disposed of in the cell, without affecting the active part, i.e. without decreasing the efficiency of registering the light of the compact voltage multiplier to suppress the connection between the cells between them, the isolating elements are disconnected.
- a specific form (such as, for example, an anisotropy of the voltage of the battery with an orientation ⁇ 100> in the liquid of the base on the base).
- a specific form (such as, for example, an anisotropy of the voltage of the battery with an orientation ⁇ 100> in the liquid of the base on the base).
- 7 nenii zayavlenny ⁇ us ⁇ ys ⁇ v in inve ⁇ sn ⁇ m va ⁇ ian ⁇ e (sl ⁇ i with ⁇ edelennym ⁇ i ⁇ m ⁇ v ⁇ dim ⁇ s ⁇ i menyayu ⁇ sya on ⁇ iv ⁇ l ⁇ zhnye) ⁇ a ⁇ ⁇ azan ⁇ on ⁇ ig.4-6, i ⁇ ⁇ ab ⁇ a ⁇ susches ⁇ vlyae ⁇ sya anal ⁇ gichn ⁇ ⁇ mu, ⁇ a ⁇ e ⁇ ⁇ isan ⁇ for ⁇ edlagaem ⁇ g ⁇ iz ⁇ b ⁇ e ⁇ en
Landscapes
- Light Receiving Elements (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005800192481A CN1998091B (zh) | 2004-05-05 | 2005-05-05 | 硅光电倍增器及硅光电倍增器单元 |
| DE602005018200T DE602005018200D1 (de) | 2004-05-05 | 2005-05-05 | Silizium-Photovervielfacher mit Zellenmatrix |
| US11/568,646 US7759623B2 (en) | 2004-05-05 | 2005-05-05 | Silicon photoelectric multiplier (variants) and a cell for silicon photoelectric multiplier |
| EP05749398A EP1755171B8 (de) | 2004-05-05 | 2005-05-05 | Silizium-Photovervielfacher mit Zellenmatrix |
| KR1020067025572A KR101113364B1 (ko) | 2004-05-05 | 2005-05-05 | 실리콘 광전자 증배관 및 상기 실리콘 광전자 증배관을위한 셀 |
| JP2007511306A JP2007536703A (ja) | 2004-05-05 | 2005-05-05 | シリコン光電子増倍管(改良型)及びシリコン光電子増倍管用セル |
| AT05749398T ATE451720T1 (de) | 2004-05-05 | 2005-05-05 | Silizium-photovervielfacher mit zellenmatrix |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2004113616/28A RU2290721C2 (ru) | 2004-05-05 | 2004-05-05 | Кремниевый фотоэлектронный умножитель (варианты) и ячейка для кремниевого фотоэлектронного умножителя |
| RU2004113616 | 2004-05-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005106971A1 true WO2005106971A1 (en) | 2005-11-10 |
Family
ID=35241944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/RU2005/000242 Ceased WO2005106971A1 (en) | 2004-05-05 | 2005-05-05 | Silicon photomultiplier (variants) and a cell therefor |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7759623B2 (enExample) |
| EP (2) | EP2144287B1 (enExample) |
| JP (1) | JP2007536703A (enExample) |
| KR (1) | KR101113364B1 (enExample) |
| CN (1) | CN1998091B (enExample) |
| AT (1) | ATE451720T1 (enExample) |
| DE (1) | DE602005018200D1 (enExample) |
| RU (1) | RU2290721C2 (enExample) |
| WO (1) | WO2005106971A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008048694A3 (en) * | 2006-02-01 | 2008-07-24 | Koninkl Philips Electronics Nv | Geiger mode avalanche photodiode |
| WO2010080048A1 (en) * | 2009-01-11 | 2010-07-15 | Popova Elena Viktorovna | Semiconductor geiger mode microcell photodiode (variants) |
| JP2010536165A (ja) * | 2007-08-06 | 2010-11-25 | マックス プランク ゲゼルシャフト ツゥアー フェデルゥン デル ヴィッセンシャフテン エー フォー | アバランシェフォトダイオード |
| RU2437120C2 (ru) * | 2006-07-21 | 2011-12-20 | Конинклейке Филипс Электроникс Н.В. | Способ и система для усовершенствованной реконструкции tof pet |
| EP2040308A4 (en) * | 2006-07-03 | 2012-03-07 | Hamamatsu Photonics Kk | PHOTODIODES GROUP |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080012087A1 (en) * | 2006-04-19 | 2008-01-17 | Henri Dautet | Bonded wafer avalanche photodiode and method for manufacturing same |
| US7652257B2 (en) * | 2007-06-15 | 2010-01-26 | General Electric Company | Structure of a solid state photomultiplier |
| CN101861527B (zh) * | 2007-08-08 | 2013-08-14 | 皇家飞利浦电子股份有限公司 | 硅光电倍增器触发网络 |
| ITTO20080046A1 (it) | 2008-01-18 | 2009-07-19 | St Microelectronics Srl | Schiera di fotodiodi operanti in modalita' geiger reciprocamente isolati e relativo procedimento di fabbricazione |
| ITTO20080045A1 (it) | 2008-01-18 | 2009-07-19 | St Microelectronics Srl | Schiera di fotodiodi operanti in modalita' geiger reciprocamente isolati e relativo procedimento di fabbricazione |
| KR100987057B1 (ko) * | 2008-06-12 | 2010-10-11 | 한국과학기술원 | 광검출 효율이 향상된 실리콘 광전자 증배관 및 이를포함하는 감마선 검출기 |
| RU2386192C1 (ru) * | 2008-08-20 | 2010-04-10 | Александр Иванович Патрашин | Многокаскадный лавинный фотодетектор |
| DE102009017505B4 (de) * | 2008-11-21 | 2014-07-10 | Ketek Gmbh | Strahlungsdetektor, Verwendung eines Strahlungsdetektors und Verfahren zur Herstellung eines Strahlungsdetektors |
| IT1392366B1 (it) | 2008-12-17 | 2012-02-28 | St Microelectronics Rousset | Fotodiodo operante in modalita' geiger con resistore di soppressione integrato e controllabile, schiera di fotodiodi e relativo procedimento di fabbricazione |
| IT1393781B1 (it) | 2009-04-23 | 2012-05-08 | St Microelectronics Rousset | Fotodiodo operante in modalita' geiger con resistore di soppressione integrato e controllabile ad effetto jfet, schiera di fotodiodi e relativo procedimento di fabbricazione |
| KR101148335B1 (ko) * | 2009-07-23 | 2012-05-21 | 삼성전기주식회사 | 실리콘 반도체를 이용한 광전자 증배관 및 그 구조 셀 |
| JP2013501364A (ja) * | 2009-08-03 | 2013-01-10 | マックス−プランク−ゲゼルシャフト ツール フォーデルング デル ヴィッセンシャフテン エー.ヴェー. | 高効率のcmos技術に適合性のあるシリコン光電子倍増器 |
| KR101084940B1 (ko) * | 2009-09-28 | 2011-11-17 | 삼성전기주식회사 | 실리콘 광전자 증배관 |
| KR20110068070A (ko) * | 2009-12-15 | 2011-06-22 | 삼성전기주식회사 | 실리콘 광전자 증배 소자를 이용한 저조도용 촬영 장치 |
| IT1399690B1 (it) | 2010-03-30 | 2013-04-26 | St Microelectronics Srl | Fotodiodo a valanga operante in modalita' geiger ad elevato rapporto segnale rumore e relativo procedimento di fabbricazione |
| WO2011122856A2 (ko) * | 2010-03-30 | 2011-10-06 | 이화여자대학교 산학협력단 | 실리콘 광증배 소자 |
| EP2561556B1 (en) | 2010-04-23 | 2016-06-08 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Silicon photoelectric multiplier |
| EP2603931B1 (en) | 2010-08-10 | 2016-03-23 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Silicon photoelectric multiplier with multiple "isochronic" read-out |
| CN102024863B (zh) * | 2010-10-11 | 2013-03-27 | 湘潭大学 | 高速增强型紫外硅选择性雪崩光电二极管及其制作方法 |
| KR101711087B1 (ko) | 2010-12-07 | 2017-02-28 | 한국전자통신연구원 | 실리콘 포토멀티플라이어 및 그 제조 방법 |
| KR101749240B1 (ko) | 2010-12-17 | 2017-06-21 | 한국전자통신연구원 | 반도체 포토멀티플라이어의 상부 광학 구조 및 그 제작 방법 |
| WO2012083983A1 (en) | 2010-12-21 | 2012-06-28 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Silicon photoelectric multiplier with optical cross-talk suppression due to special properties of the substrate |
| KR101648023B1 (ko) * | 2010-12-21 | 2016-08-12 | 한국전자통신연구원 | 트렌치 분리형 실리콘 포토멀티플라이어 |
| US8368159B2 (en) | 2011-07-08 | 2013-02-05 | Excelitas Canada, Inc. | Photon counting UV-APD |
| KR101283534B1 (ko) * | 2011-07-28 | 2013-07-15 | 이화여자대학교 산학협력단 | 실리콘 광전자 증배 소자의 제조방법 |
| US8871557B2 (en) | 2011-09-02 | 2014-10-28 | Electronics And Telecommunications Research Institute | Photomultiplier and manufacturing method thereof |
| JP5791461B2 (ja) * | 2011-10-21 | 2015-10-07 | 浜松ホトニクス株式会社 | 光検出装置 |
| JP5984617B2 (ja) | 2012-10-18 | 2016-09-06 | 浜松ホトニクス株式会社 | フォトダイオードアレイ |
| JP5963642B2 (ja) | 2012-10-29 | 2016-08-03 | 浜松ホトニクス株式会社 | フォトダイオードアレイ |
| US20140159180A1 (en) * | 2012-12-06 | 2014-06-12 | Agency For Science, Technology And Research | Semiconductor resistor structure and semiconductor photomultiplier device |
| KR101395102B1 (ko) | 2013-02-14 | 2014-05-16 | 한국과학기술원 | Pcb 기판을 이용한 실리콘 광전자증배관의 패키징 방법 |
| JP5925711B2 (ja) | 2013-02-20 | 2016-05-25 | 浜松ホトニクス株式会社 | 検出器、pet装置及びx線ct装置 |
| EP2793273B1 (en) | 2013-04-17 | 2016-12-28 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Silicon photomultiplier with very low optical cross-talk and improved readout |
| US9410901B2 (en) * | 2014-03-17 | 2016-08-09 | Kla-Tencor Corporation | Image sensor, an inspection system and a method of inspecting an article |
| TWI757788B (zh) * | 2014-06-27 | 2022-03-11 | 日商半導體能源研究所股份有限公司 | 攝像裝置及電子裝置 |
| DE102018119710A1 (de) * | 2018-08-14 | 2020-02-20 | Universität Leipzig | Vorrichtung und verfahren zur bestimmung einer wellenlänge einer strahlung |
| CN109276268A (zh) * | 2018-11-21 | 2019-01-29 | 京东方科技集团股份有限公司 | X射线探测装置及其制造方法 |
| US11428826B2 (en) * | 2019-09-09 | 2022-08-30 | Semiconductor Components Industries, Llc | Silicon photomultipliers with split microcells |
| RU2770147C1 (ru) * | 2021-06-21 | 2022-04-14 | Садыгов Зираддин Ягуб оглы | Микропиксельный лавинный фотодиод |
| CN114093962B (zh) * | 2021-11-22 | 2024-04-09 | 季华实验室 | 单光子雪崩二极管和光电探测器阵列 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4586068A (en) * | 1983-10-07 | 1986-04-29 | Rockwell International Corporation | Solid state photomultiplier |
| RU2086047C1 (ru) * | 1996-05-30 | 1997-07-27 | Зираддин Ягуб-оглы Садыгов | Лавинный фотоприемник |
| RU2105388C1 (ru) * | 1996-04-10 | 1998-02-20 | Виктор Михайлович Горловин | Лавинный фотоприемник |
| WO2001078153A2 (en) * | 2000-04-10 | 2001-10-18 | Politecnico Di Milano | Ultrasensitive photodetector with integrated pinhole for confocal microscopes |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2108781B1 (enExample) * | 1970-10-05 | 1974-10-31 | Radiotechnique Compelec | |
| JPS5252593A (en) * | 1975-10-27 | 1977-04-27 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor light receiving diode |
| CA1177148A (en) * | 1981-10-06 | 1984-10-30 | Robert J. Mcintyre | Avalanche photodiode array |
| JPS59119772A (ja) * | 1982-12-24 | 1984-07-11 | Fujitsu Ltd | 半導体受光素子 |
| NL187416C (nl) | 1983-07-14 | 1991-09-16 | Philips Nv | Stralingsgevoelige halfgeleiderinrichting. |
| JPS61154063A (ja) * | 1984-12-26 | 1986-07-12 | Toshiba Corp | 光半導体装置およびその製造方法 |
| JPH0799868B2 (ja) * | 1984-12-26 | 1995-10-25 | 日本放送協会 | 固体撮像装置 |
| JPS63124458A (ja) | 1986-11-12 | 1988-05-27 | Mitsubishi Electric Corp | 受光素子 |
| US5146296A (en) * | 1987-12-03 | 1992-09-08 | Xsirius Photonics, Inc. | Devices for detecting and/or imaging single photoelectron |
| SU1702831A1 (ru) * | 1989-10-11 | 1997-06-27 | Институт ядерных исследований АН СССР | Лавинный фотоприемник |
| US5923071A (en) * | 1992-06-12 | 1999-07-13 | Seiko Instruments Inc. | Semiconductor device having a semiconductor film of low oxygen concentration |
| JPH07240534A (ja) * | 1993-03-16 | 1995-09-12 | Seiko Instr Inc | 光電変換半導体装置及びその製造方法 |
| RU2102821C1 (ru) * | 1996-10-10 | 1998-01-20 | Зираддин Ягуб-оглы Садыгов | Лавинный фотодиод |
| US5844291A (en) * | 1996-12-20 | 1998-12-01 | Board Of Regents, The University Of Texas System | Wide wavelength range high efficiency avalanche light detector with negative feedback |
| JPH1126741A (ja) * | 1997-07-04 | 1999-01-29 | Toshiba Corp | 固体撮像装置 |
| US5880490A (en) * | 1997-07-28 | 1999-03-09 | Board Of Regents, The University Of Texas System | Semiconductor radiation detectors with intrinsic avalanche multiplication in self-limiting mode of operation |
| IT246635Y1 (it) * | 1999-04-09 | 2002-04-09 | Claber Spa | Solenoide di comando per elettrovalvola in particolare per il controllo di impianti di irrigazione |
| US6541836B2 (en) * | 2001-02-21 | 2003-04-01 | Photon Imaging, Inc. | Semiconductor radiation detector with internal gain |
| IES20010616A2 (en) | 2001-06-28 | 2002-05-15 | Nat Microelectronics Res Ct | Microelectronic device and method of its manufacture |
| DE60322233D1 (de) * | 2002-09-19 | 2008-08-28 | Quantum Semiconductor Llc | Licht-detektierende vorrichtung |
| US6838741B2 (en) * | 2002-12-10 | 2005-01-04 | General Electtric Company | Avalanche photodiode for use in harsh environments |
| WO2004100200A2 (en) | 2003-05-01 | 2004-11-18 | Yale University | Solid state microchannel plate photodetector |
| WO2005048319A2 (en) | 2003-11-06 | 2005-05-26 | Yale University | Large-area detector |
| US7160753B2 (en) * | 2004-03-16 | 2007-01-09 | Voxtel, Inc. | Silicon-on-insulator active pixel sensors |
| JP4841834B2 (ja) | 2004-12-24 | 2011-12-21 | 浜松ホトニクス株式会社 | ホトダイオードアレイ |
| EP1875271B1 (en) | 2005-04-22 | 2011-06-22 | Koninklijke Philips Electronics N.V. | Digital silicon photomultiplier for tof-pet |
| GB2426576A (en) | 2005-05-27 | 2006-11-29 | Sensl Technologies Ltd | Light sensor module comprising a plurality of elements in a close-tiled arrangement |
| GB2426575A (en) | 2005-05-27 | 2006-11-29 | Sensl Technologies Ltd | Photon detector using controlled sequences of reset and discharge of a capacitor to sense photons |
| US7268339B1 (en) * | 2005-09-27 | 2007-09-11 | Radiation Monitoring Devices, Inc. | Large area semiconductor detector with internal gain |
| JP2009525619A (ja) | 2006-02-01 | 2009-07-09 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ガイガーモード・アバランシェ・フォトダイオード |
| TWI523209B (zh) | 2006-07-03 | 2016-02-21 | 濱松赫德尼古斯股份有限公司 | 光二極體陣列 |
| US8188563B2 (en) | 2006-07-21 | 2012-05-29 | The Regents Of The University Of California | Shallow-trench-isolation (STI)-bounded single-photon CMOS photodetector |
| GB2446185A (en) | 2006-10-30 | 2008-08-06 | Sensl Technologies Ltd | Optical assembly and method of assembly |
| GB2447264A (en) | 2007-03-05 | 2008-09-10 | Sensl Technologies Ltd | Optical position sensitive detector |
-
2004
- 2004-05-05 RU RU2004113616/28A patent/RU2290721C2/ru not_active IP Right Cessation
-
2005
- 2005-05-05 KR KR1020067025572A patent/KR101113364B1/ko not_active Expired - Fee Related
- 2005-05-05 US US11/568,646 patent/US7759623B2/en not_active Expired - Fee Related
- 2005-05-05 CN CN2005800192481A patent/CN1998091B/zh not_active Expired - Fee Related
- 2005-05-05 AT AT05749398T patent/ATE451720T1/de not_active IP Right Cessation
- 2005-05-05 DE DE602005018200T patent/DE602005018200D1/de not_active Expired - Lifetime
- 2005-05-05 EP EP09013750.6A patent/EP2144287B1/en not_active Expired - Lifetime
- 2005-05-05 EP EP05749398A patent/EP1755171B8/ru not_active Ceased
- 2005-05-05 JP JP2007511306A patent/JP2007536703A/ja active Pending
- 2005-05-05 WO PCT/RU2005/000242 patent/WO2005106971A1/ru not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4586068A (en) * | 1983-10-07 | 1986-04-29 | Rockwell International Corporation | Solid state photomultiplier |
| RU2105388C1 (ru) * | 1996-04-10 | 1998-02-20 | Виктор Михайлович Горловин | Лавинный фотоприемник |
| RU2086047C1 (ru) * | 1996-05-30 | 1997-07-27 | Зираддин Ягуб-оглы Садыгов | Лавинный фотоприемник |
| WO2001078153A2 (en) * | 2000-04-10 | 2001-10-18 | Politecnico Di Milano | Ultrasensitive photodetector with integrated pinhole for confocal microscopes |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008048694A3 (en) * | 2006-02-01 | 2008-07-24 | Koninkl Philips Electronics Nv | Geiger mode avalanche photodiode |
| US7714292B2 (en) | 2006-02-01 | 2010-05-11 | Koninklijke Philips Electronics N.V. | Geiger mode avalanche photodiode |
| EP2040308A4 (en) * | 2006-07-03 | 2012-03-07 | Hamamatsu Photonics Kk | PHOTODIODES GROUP |
| US8610231B2 (en) | 2006-07-03 | 2013-12-17 | Hamamatsu Photonics K.K. | Photodiode array including channel surrounding part |
| EP3002794A1 (en) * | 2006-07-03 | 2016-04-06 | Hamamatsu Photonics K.K. | Photodiode array |
| US9484366B2 (en) | 2006-07-03 | 2016-11-01 | Hamamatsu Phonotics K.K. | Photodiode array |
| US10050069B2 (en) | 2006-07-03 | 2018-08-14 | Hamamatsu Photonics K.K. | Photodiode array |
| US10396107B2 (en) | 2006-07-03 | 2019-08-27 | Hamamatsu Photonics K.K. | Photodiode array |
| RU2437120C2 (ru) * | 2006-07-21 | 2011-12-20 | Конинклейке Филипс Электроникс Н.В. | Способ и система для усовершенствованной реконструкции tof pet |
| JP2010536165A (ja) * | 2007-08-06 | 2010-11-25 | マックス プランク ゲゼルシャフト ツゥアー フェデルゥン デル ヴィッセンシャフテン エー フォー | アバランシェフォトダイオード |
| WO2010080048A1 (en) * | 2009-01-11 | 2010-07-15 | Popova Elena Viktorovna | Semiconductor geiger mode microcell photodiode (variants) |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101113364B1 (ko) | 2012-03-02 |
| EP2144287B1 (en) | 2016-12-07 |
| EP1755171B1 (en) | 2009-12-09 |
| DE602005018200D1 (de) | 2010-01-21 |
| RU2290721C2 (ru) | 2006-12-27 |
| EP1755171A4 (de) | 2008-02-27 |
| EP1755171A1 (en) | 2007-02-21 |
| US20080251692A1 (en) | 2008-10-16 |
| CN1998091B (zh) | 2010-09-29 |
| ATE451720T1 (de) | 2009-12-15 |
| EP2144287A1 (en) | 2010-01-13 |
| US7759623B2 (en) | 2010-07-20 |
| EP1755171B8 (de) | 2010-05-19 |
| JP2007536703A (ja) | 2007-12-13 |
| KR20070051782A (ko) | 2007-05-18 |
| CN1998091A (zh) | 2007-07-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1755171B8 (de) | Silizium-Photovervielfacher mit Zellenmatrix | |
| US8779543B2 (en) | Device having an avalanche photo diode and a method for sensing photons | |
| JP4824826B2 (ja) | モノリシックセンサ、ならびに、それを備えたセンサアレイ、検出器、および電子顕微鏡 | |
| US9728667B1 (en) | Solid state photomultiplier using buried P-N junction | |
| CN114754864B (zh) | 宽频谱光学传感器 | |
| TW543197B (en) | Photodetector circuit, array of photodetector pixel circuit and method of making a photodetector circuit | |
| US5596186A (en) | High sensitivity silicon avalanche photodiode | |
| US4160985A (en) | Photosensing arrays with improved spatial resolution | |
| CN103887362A (zh) | 一种带有深n阱的np型cmos雪崩光电二极管 | |
| US5187380A (en) | Low capacitance X-ray radiation detector | |
| KR20100107995A (ko) | 광 픽업용 광 검출기 집적회로의 포토 다이오드 셀 구조 및그 제조방법 | |
| JP2015177191A (ja) | Cmosイメージセンサ | |
| US20110074283A1 (en) | Silicon photomultiplier tube | |
| CN107895743B (zh) | 单光子雪崩光电二极管探测器的装置和方法 | |
| US3812518A (en) | Photodiode with patterned structure | |
| CN111063702A (zh) | 一种utbb光电探测器像素单元、阵列和方法 | |
| JP6276407B2 (ja) | 表面荷電抑制を有するPiNダイオード構造 | |
| US9853071B2 (en) | Silicon photoelectric multiplier with very low optical cross-talk and fast readout | |
| US10043936B1 (en) | Avalanche diode, and a process of manufacturing an avalanche diode | |
| WO2019082045A1 (en) | INTEGRATED SENSOR OF IONIZING RADIATION AND IONIZING PARTICLES | |
| US20030087466A1 (en) | Phototransistor device | |
| US5583352A (en) | Low-noise, reach-through, avalanche photodiodes | |
| RU2240631C1 (ru) | Фотодетектор | |
| CN109904260B (zh) | 光传感半导体单元、光传感半导体阵列及光感应系统 | |
| RU2528107C1 (ru) | Полупроводниковый лавинный детектор |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 2007511306 Country of ref document: JP |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| WWW | Wipo information: withdrawn in national office |
Country of ref document: DE |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2005749398 Country of ref document: EP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 1020067025572 Country of ref document: KR |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 200580019248.1 Country of ref document: CN |
|
| WWP | Wipo information: published in national office |
Ref document number: 2005749398 Country of ref document: EP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 11568646 Country of ref document: US |