ZA888960B - Titanocenes,the use thereof,and n-substituted fluoranilines - Google Patents
Titanocenes,the use thereof,and n-substituted fluoranilinesInfo
- Publication number
- ZA888960B ZA888960B ZA888960A ZA888960A ZA888960B ZA 888960 B ZA888960 B ZA 888960B ZA 888960 A ZA888960 A ZA 888960A ZA 888960 A ZA888960 A ZA 888960A ZA 888960 B ZA888960 B ZA 888960B
- Authority
- ZA
- South Africa
- Prior art keywords
- substituted
- titanocenes
- membered
- fluoranilines
- gropus
- Prior art date
Links
- 125000002373 5 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000004008 6 membered carbocyclic group Chemical group 0.000 abstract 1
- 125000004070 6 membered heterocyclic group Chemical group 0.000 abstract 1
- MDFFNEOEWAXZRQ-UHFFFAOYSA-N aminyl Chemical class [NH2] MDFFNEOEWAXZRQ-UHFFFAOYSA-N 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 abstract 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 125000001153 fluoro group Chemical group F* 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/34—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/36—Oxygen or sulfur atoms
- C07D207/40—2,5-Pyrrolidine-diones
- C07D207/404—2,5-Pyrrolidine-diones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. succinimide
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/28—Titanium compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
- C07C211/52—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C217/00—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
- C07C217/02—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C217/04—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C217/06—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one etherified hydroxy group and one amino group bound to the carbon skeleton, which is not further substituted
- C07C217/08—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one etherified hydroxy group and one amino group bound to the carbon skeleton, which is not further substituted the oxygen atom of the etherified hydroxy group being further bound to an acyclic carbon atom
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/12—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/12—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
- C07C233/15—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/64—Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings
- C07C233/66—Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/88—Carboxylic acid amides having nitrogen atoms of carboxamide groups bound to an acyclic carbon atom and to a carbon atom of a six-membered aromatic ring wherein at least one ortho-hydrogen atom has been replaced
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/15—Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings
- C07C311/21—Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D205/00—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom
- C07D205/02—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
- C07D205/06—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D205/08—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with one oxygen atom directly attached in position 2, e.g. beta-lactams
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/34—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/36—Oxygen or sulfur atoms
- C07D207/40—2,5-Pyrrolidine-diones
- C07D207/404—2,5-Pyrrolidine-diones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. succinimide
- C07D207/408—Radicals containing only hydrogen and carbon atoms attached to ring carbon atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/44—Iso-indoles; Hydrogenated iso-indoles
- C07D209/48—Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/58—[b]- or [c]-condensed
- C07D209/72—4,7-Endo-alkylene-iso-indoles
- C07D209/76—4,7-Endo-alkylene-iso-indoles with oxygen atoms in positions 1 and 3
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/10—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/14—Radicals substituted by nitrogen atoms not forming part of a nitro radical
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Furan Compounds (AREA)
- Pyrrole Compounds (AREA)
- Indole Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH468287 | 1987-12-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA888960B true ZA888960B (en) | 1989-07-26 |
Family
ID=4280656
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA888960A ZA888960B (en) | 1987-12-01 | 1988-11-30 | Titanocenes,the use thereof,and n-substituted fluoranilines |
Country Status (11)
Country | Link |
---|---|
US (1) | US5026625A (fr) |
EP (1) | EP0318893B1 (fr) |
JP (1) | JP2747831B2 (fr) |
KR (1) | KR0120390B1 (fr) |
AT (1) | ATE100457T1 (fr) |
AU (1) | AU2646388A (fr) |
BR (1) | BR8806308A (fr) |
CA (1) | CA1332951C (fr) |
DE (1) | DE3887294D1 (fr) |
HK (1) | HK1004553A1 (fr) |
ZA (1) | ZA888960B (fr) |
Families Citing this family (164)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU599400B2 (en) * | 1986-08-01 | 1990-07-19 | Ciba-Geigy Ag | Titanocenes and their use |
EP0401167B1 (fr) * | 1989-06-01 | 1994-06-08 | Ciba-Geigy Ag | Procédé pour la préparation de tinanocènes avec ligands o,o'-difluoroaryles |
EP0401165B1 (fr) * | 1989-06-01 | 1994-11-30 | Ciba-Geigy Ag | Titanocènes contenant de l'oxygène et leur emploi |
EP0401166B1 (fr) * | 1989-06-01 | 1995-02-22 | Ciba-Geigy Ag | Titanocènes contenant de l'azote et leur emploi |
JP2551232B2 (ja) * | 1990-11-22 | 1996-11-06 | 日立化成工業株式会社 | 新規な光開始剤系及びこれを用いた光重合性組成物 |
GB9105561D0 (en) * | 1991-03-15 | 1991-05-01 | Coates Brothers Plc | Image formation |
TW237456B (fr) * | 1992-04-09 | 1995-01-01 | Ciba Geigy | |
EP0602552A1 (fr) * | 1992-12-18 | 1994-06-22 | Hoechst Aktiengesellschaft | 2,3,4-trifluor-N-éthylaniline et procédé pour sa préparation |
ES2142426T3 (es) | 1994-06-13 | 2000-04-16 | Targor Gmbh | Compuestos de metales de transicion. |
US5563284A (en) * | 1994-09-09 | 1996-10-08 | Phillips Petroleum Company | Cyclopentadienyl-type ligands, metallocenes, catalyst systems, preparation, and use |
JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
DE19624581C2 (de) * | 1996-06-20 | 1999-02-04 | Targor Gmbh | Übergangsmetallverbindung und ein Verfahren zu ihrer Herstellung, sowie ihre Verwendung |
US5939148A (en) * | 1996-09-13 | 1999-08-17 | Kansai Paint Co., Ltd. | Visible laser-curable composition |
CA2290737A1 (fr) * | 1997-05-27 | 1998-12-03 | First Chemical Corporation | Maleimides aromatiques et leur utilisation comme photoamorceurs |
CN1052487C (zh) * | 1997-09-03 | 2000-05-17 | 中国石油化工总公司 | 茂钛化合物 |
ATE333114T1 (de) | 1998-01-30 | 2006-08-15 | Albemarle Corp | Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung |
JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物 |
JP2001026506A (ja) * | 1999-04-28 | 2001-01-30 | Takeda Chem Ind Ltd | スルホンアミド誘導体 |
US6586617B1 (en) * | 1999-04-28 | 2003-07-01 | Sumitomo Chemical Takeda Agro Company, Limited | Sulfonamide derivatives |
DE19961355A1 (de) | 1999-12-17 | 2001-06-21 | S & C Polymer Silicon & Compos | Photoinitiatorsystem mit Titanocen-Initiatoren |
JP5247959B2 (ja) * | 2000-08-31 | 2013-07-24 | 北興化学工業株式会社 | 2,4−ジフルオロ−n−イソプロピルアニリンの製造方法 |
AR032230A1 (es) * | 2001-01-16 | 2003-10-29 | Sumitomo Chem Takeda Agro Co | Derivado sulfonamida conteniendo una composicion agricola y horticola |
US7259260B2 (en) * | 2001-10-22 | 2007-08-21 | Mitsui Chemicals, Inc. | Imide compound and optical recording media made by using the same |
US6936384B2 (en) | 2002-08-01 | 2005-08-30 | Kodak Polychrome Graphics Llc | Infrared-sensitive composition containing a metallocene derivative |
JP4291638B2 (ja) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版 |
US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
DE102004016694B4 (de) * | 2004-03-31 | 2012-05-16 | Siemens Ag | Verfahren zur Gewinnung medizinisch relevanter Daten aus dem Gastrointestinaltrakt eines Menschen oder eines Tieres sowie eine dafür geeignete Darreichungsform |
EP2246741A1 (fr) | 2004-05-19 | 2010-11-03 | Fujifilm Corporation | Procédé d'enregistrement d'image |
EP2618215B1 (fr) | 2004-05-31 | 2017-07-05 | Fujifilm Corporation | Procédé de fabrication d'une plaque d'impression lithographique |
JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
JP2006021396A (ja) | 2004-07-07 | 2006-01-26 | Fuji Photo Film Co Ltd | 平版印刷版原版および平版印刷方法 |
US7146909B2 (en) | 2004-07-20 | 2006-12-12 | Fuji Photo Film Co., Ltd. | Image forming material |
US7425406B2 (en) | 2004-07-27 | 2008-09-16 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
US20060032390A1 (en) | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
US7745090B2 (en) | 2004-08-24 | 2010-06-29 | Fujifilm Corporation | Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method |
JP2006062188A (ja) | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | 色画像形成材料及び平版印刷版原版 |
JP2006068963A (ja) | 2004-08-31 | 2006-03-16 | Fuji Photo Film Co Ltd | 重合性組成物、それを用いた親水性膜、及び、平版印刷版原版 |
JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
US20060150846A1 (en) | 2004-12-13 | 2006-07-13 | Fuji Photo Film Co. Ltd | Lithographic printing method |
JP2006181838A (ja) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
EP1798031A3 (fr) | 2005-01-26 | 2007-07-04 | FUJIFILM Corporation | Précurseur de plaque d'impression lithographique et procédé d'impression lithographique |
US7858291B2 (en) | 2005-02-28 | 2010-12-28 | Fujifilm Corporation | Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method |
JP4474317B2 (ja) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
JP2006335826A (ja) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
JP4815270B2 (ja) | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | 平版印刷版の作製方法及び作製装置 |
JP4759343B2 (ja) | 2005-08-19 | 2011-08-31 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
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NL2020109B1 (en) | 2017-12-18 | 2019-06-25 | Xeikon Prepress Nv | Method for fixing and treating a flexible plate on a drum, and flexible plate for use therein |
EP3629089A1 (fr) | 2018-09-26 | 2020-04-01 | Flint Group Germany GmbH | Procédé de développement thermique de précurseurs en relief |
NL2027002B1 (en) | 2020-11-27 | 2022-07-04 | Flint Group Germany Gmbh | Photosensitive composition |
NL2027003B1 (en) | 2020-11-27 | 2022-07-04 | Flint Group Germany Gmbh | Photosensitive composition |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1193030B (de) * | 1961-11-11 | 1965-05-20 | Krewel Leuffen Gmbh | Verfahren zur Herstellung von substituierten Fettsaeureaniliden |
US3565934A (en) * | 1964-09-10 | 1971-02-23 | Monsanto Co | Diazadisiletidines and the preparation thereof |
US4120693A (en) * | 1976-07-29 | 1978-10-17 | E. I. Du Pont De Nemours And Company | Substituted isoindoles |
US4548891A (en) * | 1983-02-11 | 1985-10-22 | Ciba Geigy Corporation | Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators |
US4590287A (en) * | 1983-02-11 | 1986-05-20 | Ciba-Geigy Corporation | Fluorinated titanocenes and photopolymerizable composition containing same |
EP0173284A1 (fr) * | 1984-08-30 | 1986-03-05 | The Dow Chemical Company | Phényl-1-méthyl-3 pyrrolidinediones substituées, leur préparation et leur application comme fongicides |
US4713401A (en) * | 1984-12-20 | 1987-12-15 | Martin Riediker | Titanocenes and a radiation-polymerizable composition containing these titanocenes |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
KR910000199B1 (ko) * | 1986-04-15 | 1991-01-23 | 시바-가이기 코오포레이숀 | 액체 광개시제 혼합물 |
CH678897A5 (fr) * | 1986-05-10 | 1991-11-15 | Ciba Geigy Ag | |
EP0256981B1 (fr) * | 1986-08-01 | 1993-02-17 | Ciba-Geigy Ag | Titanocènes et leur usage |
AU599400B2 (en) * | 1986-08-01 | 1990-07-19 | Ciba-Geigy Ag | Titanocenes and their use |
EP0269573B1 (fr) * | 1986-11-26 | 1991-03-27 | Ciba-Geigy Ag | Mélange photo-initiateur liquide |
-
1988
- 1988-11-21 US US07/273,526 patent/US5026625A/en not_active Expired - Lifetime
- 1988-11-28 AT AT88119798T patent/ATE100457T1/de not_active IP Right Cessation
- 1988-11-28 EP EP88119798A patent/EP0318893B1/fr not_active Expired - Lifetime
- 1988-11-28 DE DE88119798T patent/DE3887294D1/de not_active Expired - Lifetime
- 1988-11-29 CA CA000584483A patent/CA1332951C/fr not_active Expired - Fee Related
- 1988-11-30 BR BR888806308A patent/BR8806308A/pt unknown
- 1988-11-30 ZA ZA888960A patent/ZA888960B/xx unknown
- 1988-12-01 KR KR1019880016123A patent/KR0120390B1/ko not_active IP Right Cessation
- 1988-12-01 JP JP63305138A patent/JP2747831B2/ja not_active Expired - Lifetime
- 1988-12-01 AU AU26463/88A patent/AU2646388A/en not_active Abandoned
-
1998
- 1998-04-29 HK HK98103663A patent/HK1004553A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2747831B2 (ja) | 1998-05-06 |
EP0318893B1 (fr) | 1994-01-19 |
KR0120390B1 (ko) | 1997-10-22 |
EP0318893A2 (fr) | 1989-06-07 |
HK1004553A1 (en) | 1998-11-27 |
DE3887294D1 (de) | 1994-03-03 |
US5026625A (en) | 1991-06-25 |
CA1332951C (fr) | 1994-11-08 |
BR8806308A (pt) | 1989-08-15 |
JPH02249A (ja) | 1990-01-05 |
KR890009953A (ko) | 1989-08-05 |
AU2646388A (en) | 1989-06-01 |
ATE100457T1 (de) | 1994-02-15 |
EP0318893A3 (en) | 1990-05-23 |
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