ATE333114T1 - Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung - Google Patents
Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendungInfo
- Publication number
- ATE333114T1 ATE333114T1 AT99904452T AT99904452T ATE333114T1 AT E333114 T1 ATE333114 T1 AT E333114T1 AT 99904452 T AT99904452 T AT 99904452T AT 99904452 T AT99904452 T AT 99904452T AT E333114 T1 ATE333114 T1 AT E333114T1
- Authority
- AT
- Austria
- Prior art keywords
- methods
- compositions containing
- photopolymerizable compositions
- containing maleimide
- compositions
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 title 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 abstract 2
- 239000012965 benzophenone Substances 0.000 abstract 1
- -1 benzophenone compound Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/12—Esters of phenols or saturated alcohols
- C08F22/18—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J151/00—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
- C09J151/08—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7310098P | 1998-01-30 | 1998-01-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE333114T1 true ATE333114T1 (de) | 2006-08-15 |
Family
ID=22111727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99904452T ATE333114T1 (de) | 1998-01-30 | 1999-01-29 | Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung |
Country Status (12)
Country | Link |
---|---|
US (1) | US6555593B1 (de) |
EP (1) | EP1051665B1 (de) |
JP (1) | JP2002502056A (de) |
KR (1) | KR100594956B1 (de) |
CN (1) | CN1295680A (de) |
AT (1) | ATE333114T1 (de) |
AU (1) | AU2485199A (de) |
BR (1) | BR9908044A (de) |
CA (1) | CA2318809A1 (de) |
DE (1) | DE69932320T2 (de) |
TW (1) | TWI238841B (de) |
WO (1) | WO1999039247A1 (de) |
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SE516275C2 (sv) * | 2000-03-13 | 2001-12-10 | Perstorp Flooring Ab | Ny oligomerförening samt användning därav |
ATE414722T1 (de) * | 2000-06-19 | 2008-12-15 | Toagosei Co Ltd | Vernetzbare harzzusammensetzungen |
US7179912B2 (en) * | 2000-09-01 | 2007-02-20 | Icos Corporation | Materials and methods to potentiate cancer treatment |
KR100881301B1 (ko) * | 2001-04-09 | 2009-02-03 | 세키스이가가쿠 고교가부시키가이샤 | 광반응성 조성물 |
US20080103222A1 (en) * | 2002-04-26 | 2008-05-01 | Albemarle Corporation | New Class of Amine Coinitiators in Photoinitiated Polymerizations |
US20040029044A1 (en) * | 2002-08-08 | 2004-02-12 | 3M Innovative Properties Company | Photocurable composition |
JP2006523681A (ja) | 2003-03-24 | 2006-10-19 | ルイトポルド・ファーマシューティカルズ・インコーポレーテッド | Dna−pk阻害剤としてのキサントン、チオキサントンおよびアクリジノン |
US20040198859A1 (en) * | 2003-04-03 | 2004-10-07 | Nguyen Chau K. | Photopolymerization systems and their use |
US20060293404A1 (en) * | 2003-04-24 | 2006-12-28 | Santobianco John G | New class of amine coinitiators in photoinitiated polymerizations |
US20060009539A1 (en) * | 2004-07-12 | 2006-01-12 | Herr Donald E | Maleimide-based radiation curable compositions |
JP4994036B2 (ja) * | 2004-07-15 | 2012-08-08 | 太陽ホールディングス株式会社 | 光硬化性及び熱硬化性樹脂組成物及びその硬化物 |
KR100618864B1 (ko) * | 2004-09-23 | 2006-08-31 | 삼성전자주식회사 | 반도체 소자 제조용 마스크 패턴 및 그 형성 방법과 미세패턴을 가지는 반도체 소자의 제조 방법 |
CN100360504C (zh) * | 2005-12-22 | 2008-01-09 | 上海交通大学 | 含硫可聚合的二苯甲酮光引发剂及其制备方法 |
WO2007092935A1 (en) * | 2006-02-08 | 2007-08-16 | Albemarle Corporation | Hydroxyalkylaminoalkylthioxanthones |
JP5528710B2 (ja) | 2006-02-28 | 2014-06-25 | オリガシス コーポレイション | アクリロイルオキシエチルホスホリルコリン含有ポリマー抱合体及びその製法 |
CN100372832C (zh) * | 2006-04-20 | 2008-03-05 | 上海交通大学 | 一种含硫和二苯甲酮结构的二胺及其制备方法 |
US7709545B2 (en) | 2006-12-05 | 2010-05-04 | The University Of Southern Mississippi | Benzophenone/thioxanthone derivatives and their use in photopolymerizable compositions |
JP2009214428A (ja) * | 2008-03-11 | 2009-09-24 | Fujifilm Corp | 平版印刷版原版および平版印刷方法 |
KR101099691B1 (ko) * | 2008-04-07 | 2011-12-28 | 주식회사 삼양이엠에스 | 음성 레지스트 조성물 |
DE102008054611A1 (de) * | 2008-12-15 | 2010-06-17 | Evonik Röhm Gmbh | Verfahren zur Herstellung von methacrylierten Benzophenonen |
US8765432B2 (en) | 2009-12-18 | 2014-07-01 | Oligasis, Llc | Targeted drug phosphorylcholine polymer conjugates |
WO2011085281A1 (en) * | 2010-01-11 | 2011-07-14 | Isp Investments Inc. | Compositions comprising a reactive monomer and uses thereof |
JP5615600B2 (ja) * | 2010-06-09 | 2014-10-29 | 富士フイルム株式会社 | インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物 |
JP5724298B2 (ja) * | 2010-10-29 | 2015-05-27 | 大日本印刷株式会社 | ガスバリア性フィルムの製造方法及びガスバリア層の形成方法 |
EP3760639A1 (de) | 2013-09-08 | 2021-01-06 | Kodiak Sciences Inc. | Zwitterionische polymerkonjugate |
US9840553B2 (en) | 2014-06-28 | 2017-12-12 | Kodiak Sciences Inc. | Dual PDGF/VEGF antagonists |
KR20210013299A (ko) | 2014-10-17 | 2021-02-03 | 코디악 사이언시스 인코포레이티드 | 부티릴콜린에스테라제 양성이온성 중합체 컨쥬게이트 |
BR112017009711B1 (pt) * | 2014-11-13 | 2021-06-01 | Rhodia Operations | Composições, pasta de dentes, gel dental, dentifrício, pó dental, pasta profilática, enxaguante bucal, solução para enxágue, mousse dental, fio dental, goma de mascar, tira ou filme de cuidados bucais solúveis para aplicação direta ou fixação a uma superfície bucal, composto de fosfato e método de cuidados bucais |
RU2744860C2 (ru) | 2015-12-30 | 2021-03-16 | Кодиак Сайенсиз Инк. | Антитела и их конъюгаты |
US11034669B2 (en) | 2018-11-30 | 2021-06-15 | Nuvation Bio Inc. | Pyrrole and pyrazole compounds and methods of use thereof |
CA3157509A1 (en) | 2019-10-10 | 2021-04-15 | Kodiak Sciences Inc. | Methods of treating an eye disorder |
WO2021096751A1 (en) * | 2019-11-13 | 2021-05-20 | Piedmont Chemical Industries, LLC | Photopolymerization synergist |
US11639398B2 (en) * | 2019-12-30 | 2023-05-02 | Rohm And Haas Electronic Materials Llc | Photosensitive bismaleimide composition |
US11434313B2 (en) * | 2020-12-16 | 2022-09-06 | Canon Kabushiki Kaisha | Curable composition for making cured layer with high thermal stability |
CN114163551A (zh) * | 2021-12-02 | 2022-03-11 | 广东博兴新材料科技有限公司 | 一种水性uv/eb敏感树脂及其制备方法和应用 |
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US5446073A (en) | 1993-03-31 | 1995-08-29 | Fusion Systems Corporation | Photopolymerization process employing a charge transfer complex without a photoinitiator |
WO1998007759A1 (en) * | 1996-08-23 | 1998-02-26 | First Chemical Corporation | Polymerization processes using aliphatic maleimides |
CN1263524A (zh) * | 1997-05-27 | 2000-08-16 | 第一化学公司 | 芳香马来酰亚胺和其使用方法 |
NL1006621C2 (nl) | 1997-07-18 | 1999-01-19 | Dsm Nv | Stralingsuithardbare coatingsamenstelling. |
-
1999
- 1999-01-29 CA CA002318809A patent/CA2318809A1/en not_active Abandoned
- 1999-01-29 WO PCT/US1999/001989 patent/WO1999039247A1/en active IP Right Grant
- 1999-01-29 AT AT99904452T patent/ATE333114T1/de not_active IP Right Cessation
- 1999-01-29 KR KR1020007008321A patent/KR100594956B1/ko not_active IP Right Cessation
- 1999-01-29 US US09/240,020 patent/US6555593B1/en not_active Expired - Fee Related
- 1999-01-29 JP JP2000529640A patent/JP2002502056A/ja active Pending
- 1999-01-29 BR BR9908044-3A patent/BR9908044A/pt not_active IP Right Cessation
- 1999-01-29 DE DE69932320T patent/DE69932320T2/de not_active Expired - Fee Related
- 1999-01-29 AU AU24851/99A patent/AU2485199A/en not_active Abandoned
- 1999-01-29 TW TW088101423A patent/TWI238841B/zh active
- 1999-01-29 EP EP99904452A patent/EP1051665B1/de not_active Expired - Lifetime
- 1999-01-29 CN CN99804722A patent/CN1295680A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
DE69932320T2 (de) | 2007-07-12 |
EP1051665A1 (de) | 2000-11-15 |
JP2002502056A (ja) | 2002-01-22 |
CN1295680A (zh) | 2001-05-16 |
DE69932320D1 (de) | 2006-08-24 |
CA2318809A1 (en) | 1999-08-05 |
TWI238841B (en) | 2005-09-01 |
US6555593B1 (en) | 2003-04-29 |
KR20010040466A (ko) | 2001-05-15 |
KR100594956B1 (ko) | 2006-06-30 |
AU2485199A (en) | 1999-08-16 |
BR9908044A (pt) | 2000-11-28 |
EP1051665B1 (de) | 2006-07-12 |
WO1999039247A1 (en) | 1999-08-05 |
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