WO2008108406A1 - フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法 - Google Patents

フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法 Download PDF

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Publication number
WO2008108406A1
WO2008108406A1 PCT/JP2008/053954 JP2008053954W WO2008108406A1 WO 2008108406 A1 WO2008108406 A1 WO 2008108406A1 JP 2008053954 W JP2008053954 W JP 2008053954W WO 2008108406 A1 WO2008108406 A1 WO 2008108406A1
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Prior art keywords
compound
photoresist
solution
photoresist solution
etching method
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PCT/JP2008/053954
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English (en)
French (fr)
Inventor
Tetsuya Watanabe
Yoshihisa Usami
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Fujifilm Corporation
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Priority claimed from JP2007196756A external-priority patent/JP5078488B2/ja
Priority claimed from JP2007212149A external-priority patent/JP4777313B2/ja
Priority claimed from JP2008047238A external-priority patent/JP5576024B2/ja
Priority claimed from JP2008047130A external-priority patent/JP5401042B2/ja
Priority claimed from JP2008047237A external-priority patent/JP5465393B2/ja
Priority claimed from JP2008047127A external-priority patent/JP5465392B2/ja
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to EP08721374A priority Critical patent/EP2135901A4/en
Priority to US12/530,100 priority patent/US20100104985A1/en
Priority to CN200880007061A priority patent/CN101675117A/zh
Publication of WO2008108406A1 publication Critical patent/WO2008108406A1/ja

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    • C09B29/3634Monoazo dyes prepared by diazotising and coupling from other coupling components from heterocyclic compounds containing only a nitrogen as heteroatom containing a six-membered heterocyclic with only one nitrogen as heteroatom from a pyridine ring from a pyridine ring containing one or more hydroxyl groups (or = O) from diazotized heterocyclic rings
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    • GPHYSICS
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Abstract

本発明は、オキソノール色素骨格を有する化合物、シアニン色素、スチリル色素、メロシアニン色素骨格を有する化合物、フタロシアニン色素骨格を有する化合物、アゾ化合物およびアゾ化合物と金属イオンとの錯体化合物からなる群から選ばれたフォトレジスト用化合物に関する。更に本発明は、上記フォトレジスト用化合物を少なくとも一種含むフォトレジスト液および上記フォトレジスト液を使用する被加工表面のエッチング方法を提供する。
PCT/JP2008/053954 2007-03-05 2008-03-05 フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法 WO2008108406A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08721374A EP2135901A4 (en) 2007-03-05 2008-03-05 CONNECTION FOR PHOTORESIST, PHOTORESIST SOLUTION AND USE OF THIS PROCESS
US12/530,100 US20100104985A1 (en) 2007-03-05 2008-03-05 Compound for photoresist, photoresist liquid, and etching method using the same
CN200880007061A CN101675117A (zh) 2007-03-05 2008-03-05 光致抗蚀用化合物、光致抗蚀液及使用其的蚀刻方法

Applications Claiming Priority (20)

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JP2007054289 2007-03-05
JP2007-054289 2007-03-05
JP2007196756A JP5078488B2 (ja) 2007-03-05 2007-07-27 発光素子およびその製造方法ならびに光学素子およびその製造方法
JP2007-196756 2007-07-27
JP2007-212149 2007-08-16
JP2007212149A JP4777313B2 (ja) 2007-08-16 2007-08-16 光学読取用の情報記録媒体の製造方法
JP2007-267664 2007-10-15
JP2007267665 2007-10-15
JP2007-267665 2007-10-15
JP2007267664 2007-10-15
JP2008047238A JP5576024B2 (ja) 2008-02-28 2008-02-28 フォトレジスト液、およびこれを用いるエッチング方法
JP2008-047127 2008-02-28
JP2008-047130 2008-02-28
JP2008047130A JP5401042B2 (ja) 2008-02-28 2008-02-28 フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
JP2008-047238 2008-02-28
JP2008-047243 2008-02-28
JP2008-047237 2008-02-28
JP2008047237A JP5465393B2 (ja) 2008-02-28 2008-02-28 フォトレジスト液、およびこれを用いるエッチング方法
JP2008047243 2008-02-28
JP2008047127A JP5465392B2 (ja) 2008-02-28 2008-02-28 フォトレジスト液、およびこれを用いるエッチング方法

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WO2010035483A1 (ja) * 2008-09-25 2010-04-01 富士フイルム株式会社 光情報記録媒体、情報記録方法、および、アゾ金属錯体色素
WO2010041470A1 (ja) * 2008-10-10 2010-04-15 富士フイルム株式会社 光情報記録媒体、情報記録方法および光増感剤
JP2010164907A (ja) * 2009-01-19 2010-07-29 Mitsubishi Paper Mills Ltd 感光性組成物および平版印刷版
WO2010116594A1 (ja) * 2009-03-30 2010-10-14 富士フイルム株式会社 フォトレジスト材料およびフォトレジスト膜、これを用いるエッチング方法、ならびに新規アゾ色素化合物
JP2013173848A (ja) * 2012-02-24 2013-09-05 Adeka Corp 着色アルカリ現像性感光性組成物
JP2014534641A (ja) * 2011-11-04 2014-12-18 東京エレクトロン株式会社 スパイクアニールプロセスを制御する方法及びシステム
JP2014237824A (ja) * 2008-03-07 2014-12-18 富士フイルム株式会社 アゾ顔料、該アゾ顔料を含む顔料分散物及び着色組成物

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JP5214696B2 (ja) * 2010-09-27 2013-06-19 富士フイルム株式会社 パタン形成方法、基板製造方法、及びモールド製造方法
KR101556280B1 (ko) 2012-12-07 2015-09-30 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
US10011672B2 (en) 2013-05-16 2018-07-03 Samsung Sdi Co., Ltd. Photosensitive resin composition for color filter and color filter using the same
JP6245495B2 (ja) * 2013-05-23 2017-12-13 オリンパス株式会社 光検出器
KR101819656B1 (ko) 2014-05-13 2018-01-17 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
TWI757545B (zh) * 2017-09-15 2022-03-11 日商關東電化工業股份有限公司 使用酸鹵化物之原子層蝕刻
CN109244198B (zh) * 2018-08-31 2020-07-03 宁波天炬光电科技有限公司 芯片级低成本表面处理方法及一种装置

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