WO2004079061A1 - タンタル酸リチウム結晶の製造方法 - Google Patents
タンタル酸リチウム結晶の製造方法 Download PDFInfo
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- WO2004079061A1 WO2004079061A1 PCT/JP2004/002853 JP2004002853W WO2004079061A1 WO 2004079061 A1 WO2004079061 A1 WO 2004079061A1 JP 2004002853 W JP2004002853 W JP 2004002853W WO 2004079061 A1 WO2004079061 A1 WO 2004079061A1
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/30—Niobates; Vanadates; Tantalates
Definitions
- the present invention relates to a method for producing a lithium tantalate crystal used for forming a pattern with a metal electrode on a wafer such as a surface acoustic wave device and processing an electric signal.
- Lithium tantalate is used for applications that utilize electrical characteristics, such as Saw Depice, which performs signal processing using surface acoustic waves (Saw).
- Lithium tantalate crystals suitable for this application exhibit the piezoelectric response (piezoelectricity) required for SAW devices due to their crystal structure, but lithium tantalate crystals that can be obtained by ordinary methods are piezoelectric In addition to a pyroelectric response (pyroelectricity).
- the piezoelectricity of lithium tantalate crystal is an indispensable property when using lithium tantalate crystal as a SAW device. Pyroelectricity, on the other hand, is observed as a surface charge generated on the outer surface of the lithium tantalate crystal by giving a temperature change to the crystal, and charges the crystal.
- this surface charge causes a spark discharge between metal electrodes formed on the wafer made of the lithium tantalate crystal, and the remarkable property of the SAW device It is said to cause imperfections. For this reason, in the design of SAW devices using lithium tantalate crystals, measures must be taken to prevent surface charges from being generated, to release generated surface charges, or to increase the distance between metal electrodes.
- the incorporation of these innovations has the disadvantage of limiting the design of the SAW device itself.
- the present invention provides a solution to the above-described problem, and generates a surface charge generated by giving a temperature change to a lithium tantalate crystal by improving the conductivity of the lithium tantalate crystal.
- Surface charge without accumulating It is intended to provide a method for producing a lithium tantalate crystal capable of exhibiting effective piezoelectricity while maintaining a single polarization structure.
- the present invention provides a method for producing a conductive material, comprising contacting a substance reduced at a temperature T1 with a lithium tantalate crystal at a temperature T2 lower than the temperature T1 and in a reducing atmosphere.
- a method for producing a lithium tantalate crystal having an increased rate By doing so, the conductivity of the lithium tantalate crystal can be increased at a relatively low temperature by reducing the lithium tantalate with the reduced substance, and as a result, the temperature of the lithium tantalate crystal is changed. Pyroelectric generated at the time can be suppressed.
- the temperature T 1 be set to 700 ° C. or higher. By doing so, the reduction treatment of the aforementioned substance can be performed promptly.
- the reduction treatment at the temperature T1 is preferably performed in a reducing gas containing any of hydrogen, carbon monoxide, and nitrous oxide, or a mixed gas of two or more thereof.
- a substance that has been subjected to a reduction treatment can be obtained with a generally known reducing gas.
- the reduction treatment can be carried out quickly by using hydrogen or carbon monoxide gas as the reducing gas.
- the reduction treatment is performed in an atmosphere in which He, Ne, Ar, or another rare gas, nitrogen, or carbon dioxide, or a mixed gas of two or more thereof is further added to the reducing gas. May go. In this way, the speed and the processing time of the reduction process can be controlled.
- the reducing gas atmosphere be such that the substance to be reduced can be treated as quickly as possible.
- a crystal, a ceramic, a metal, preferably a hydrogen storage alloy can be used as the substance subjected to the reduction treatment at the temperature T1.
- a substance that can reduce lithium tantalate crystal at temperature T 2 is used as the substance that has been reduced at temperature T 1
- lithium tantalate with improved conductivity can be produced. .
- the crystal or the ceramic may be a composite oxide having a non-stoichiometric composition.
- the temperature T 1 thus, a substance effectively reduced is obtained.
- the non-stoichiometric composition has a cation defect, and this defect is considered to be closely related to the reduction treatment.
- lithium tantalate or lithium niobate can be used as the crystal or the ceramic. This is preferred because it is normally used as a material for the Saw Depice, does not contaminate the lithium tantalate crystal as a product, and has sufficient reducibility.
- a single-polarized crystal can be used as the lithium tantalate crystal that is brought into contact with the substance subjected to the reduction treatment at the temperature T1 at the temperature T2. This is preferred because the lithium tantalate crystal obtained in the present invention does not require a single polarization treatment after the reduction treatment at the temperature T2.
- the usual single polarization treatment is performed by applying a voltage at a high temperature equal to or higher than the Curie point of lithium tantalate crystal (about 61 ° C.) and in the air.
- the lithium tantalate crystal whose conductivity has been improved by a reduction treatment or the like loses the improved conductivity at a temperature of 400 ° C. or higher in the atmosphere.
- the conductivity returns to the state before the reduction treatment when a single polarization treatment is performed at a temperature of one point or more of the lily. There is a problem.
- the temperature T2 at which the lithium tantalate crystal is brought into contact with the reduced substance is preferably set to 400 to 600 ° C.
- T 2 is set to a temperature lower than the Curie point of the lithium tantalate crystal as described above, the monopolarized lithium tantalate crystal can maintain the monopolar structure, and the contact takes place in a reducing atmosphere. Therefore, there is no problem that the conductivity is lost.
- the conductivity of the lithium tantalate crystal which has been improved by the treatment at the temperature T 2 can be improved by being exposed to the air. There is no danger of lowering.
- the single-polarized crystal a crystal before slicing can be used, a wafer subjected to slicing processing, or a wafer subjected to lapping processing can be used.
- a crystal before slicing can be used, a wafer subjected to slicing processing, or a wafer subjected to lapping processing can be used.
- the surface area with respect to the volume increases, and the contact area with the reduced substance can be increased, so that the conductivity can be effectively improved.
- the reduction treatment at the temperature T 2 is preferably performed in a reducing gas composed of hydrogen, carbon monoxide, nitrous oxide, or a mixed gas thereof.
- a reduction treatment is performed in a generally known reducing gas, and a lithium tantalate crystal having improved conductivity can be obtained.
- hydrogen or carbon monoxide gas is used as the reducing gas, so that the reduction treatment can be performed quickly.
- the reduction treatment at the temperature T 2 is performed by reducing the reducing gas composed of hydrogen, carbon monoxide, dinitrogen monoxide or a mixture thereof to He, Ne, Ar, or other rare gases, and nitrogen, carbon dioxide, or
- the reduction treatment may be performed in an atmosphere to which an inert gas composed of these mixed gases is added. In this way, the speed and processing time of the reduction process can be controlled.
- the present invention provides, at least, a first base material containing a hydrogen storage metal storing lithium tantalate or lithium niobate or hydrogen that has been heat-treated at a temperature T 1 ′ or higher in a reducing atmosphere at a temperature equal to or higher than the Curie point.
- the conductivity of the single-polarized lithium tantalate crystal is improved by superimposing the single-polarized lithium tantalate crystal on a heat treatment at a temperature T 2 ′ lower than the Curie point in a reducing atmosphere.
- a method for producing a lithium tantalate crystal characterized by the above is provided.
- the first base material has a reducing property
- the first base material is overlapped with a single-polarized lithium tantalate crystal, and heat-treated at a temperature T 2 ′ lower than the Curie point in a reducing atmosphere.
- the single-polarized lithium tantalate crystal can be effectively reduced even at a temperature not lower than one Curie point. Therefore, the electrical conductivity can be efficiently improved while the lithium tantalate crystal remains single-polarized.
- the lithium tantalate crystal obtained by the heat treatment at T 2 ′ is heat-treated at a temperature lower than the Curie point in the atmosphere ⁇ 3, and the lithium tantalate crystal is heated to a temperature higher than the Curie point in a reducing atmosphere.
- the single-polarized lithium tantalate crystal whose conductivity has been improved by the above-described reduction treatment is subjected to a heat treatment at a temperature lower than one point in the atmosphere at a temperature lower than one point of cury, and then the reducing property is reduced.
- the electric conductivity of the lithium tantalate crystal can be surely improved more uniformly.
- the lithium tantalate crystal obtained by the heat treatment in the above item 2 is subjected to a heat treatment at a temperature lower than the Curie point in the atmosphere ⁇ 3, and the lithium tantalate crystal is heated to a temperature lower than the Curie point in a reducing atmosphere. It is preferable to improve the conductivity of the lithium tantalate crystal by performing a heat treatment at 2 ′ ′′.
- the single-polarized lithium tantalate crystal whose conductivity has been improved by the reduction treatment described above is once heat-treated at a temperature ⁇ ⁇ 3 lower than the Curie point in the atmosphere, By performing heat treatment at a temperature lower than the Curie point '2 ′ ′′ in a reducing atmosphere without using the base material, the electrical conductivity of the lithium tantalate crystal can be further improved.
- the temperatures ⁇ 2 ′, ⁇ 2 ′′, and 2 2 ′′ lower than the Curie point be 400 or more. By doing so, the conductivity of the lithium tantalate crystal can be effectively improved.
- the single-polarized lithium tantalate crystal it is preferable to use a wafer that has been subjected to a slicing process or a wafer that has been subjected to a lapping process, as the single-polarized lithium tantalate crystal.
- the surface area with respect to the volume is increased, and the area of superposition with the first or second base material or the area exposed to the reducing atmosphere can be increased, so that the lithium tantalate crystal can be effectively formed.
- the conductivity can be improved uniformly.
- the first or second base material may be lithium tantalate or lithium niobate. It is preferable to use a ceramic or crystal made of a film.
- either ceramics or crystals of lithium tantalate or lithium niobate can be used as the first or second base material. With these materials, contamination and other adverse effects do not occur even when heat treatment is performed by overlapping with lithium tantalate crystals.
- the first or second base material has a large number of cation deficiencies and has a high reducibility, so that the conductivity of the lithium tantalate crystal can be effectively and uniformly improved.
- the first or second base material a wafer on which a crystal made of lithium tantalate or lithium niobate has been sliced or a wafer on which lapping has been performed.
- the surface area with respect to the volume is increased, and the area exposed to the reducing atmosphere can be increased, so that the base material can be effectively reduced.
- the conductivity of the lithium tantalate crystal can be effectively improved.
- the lithium tantalate crystal After the heat treatment at a temperature of ⁇ 2 ′, ⁇ 2 ′′, "2 ′ ′′, the lithium tantalate crystal is preferably exposed to the air at a temperature of 250 ° C. or lower. In this way, the conductivity of the single-polarized lithium tantalate crystal, which has been improved by the heat treatment at the temperature T 2 ′, "2”, ⁇ 2, ”, decreases due to exposure to the atmosphere. There is no danger of it.
- the reducing atmosphere in the heat treatment performed at the temperatures T l ′, ⁇ 1 ”, ⁇ 2 ′, ⁇ 2”, and ⁇ 2 ′ is at least one of hydrogen, carbon monoxide, and nitrous oxide.
- these generally known reducing gases can be used as the reducing atmosphere in the heat treatment performed at any of the above temperatures. .
- an additive gas comprising at least one of a rare gas, nitrogen, and carbon dioxide is further added to the reducing gas. In this way, the speed of the reduction process The degree and processing time can be controlled.
- the conductivity of the crystal is improved, the accumulation of surface charges due to pyroelectricity caused by a temperature change is substantially not observed.
- Monopolarized lithium tantalate crystals can be produced. Therefore, it is possible to produce a lithium tantalate crystal, which maintains piezoelectricity and shows no accumulation of electric charge on the outer surface of the crystal, which is extremely advantageous in producing a SAW device.
- the method of the present invention enables the above-mentioned lithium tantalate crystal to be efficiently produced in an extremely short time, and is an industrially advantageous production method.
- a method of exposing a lithium tantalate crystal to a reducing atmosphere of 500 ° C. or higher has been disclosed as a conventional method for producing a lithium tantalate crystal having improved conductivity.
- the present inventors have proposed a first element having a reducing property, including a hydrogen storage metal storing lithium tantalate or lithium niobate or hydrogen that has been efficiently reduced at a temperature equal to or higher than the Curie point in a reducing atmosphere.
- the material is superimposed on a single-polarized lithium tantalate crystal and heat-treated in a reducing atmosphere to reduce the lithium tantalate crystal through the interface. It has been found that the reduction treatment can be performed effectively even at a lower temperature, the conductivity can be improved, and a single polarization structure can be maintained. In this case, it is considered that this reduction treatment activates the single-polarized lithium tantalate crystal for the reduction reaction.
- the present inventors have proposed that lithium activated tantalate for the above reduction reaction
- the crystal is heat-treated at a temperature lower than the Curie point in the atmosphere, the electrical conductivity decreases and the resistivity increases (resistivity increases), but the activated state is still maintained, so that it has a reducing property.
- Conductivity can be further improved by superimposing the second base material on this or by heat treatment alone at a temperature lower than the Curie point in a reducing atmosphere (resistivity can be further reduced). The inventors have found that the present invention has been completed.
- Examples of the substance to be reduced at the temperature T1 or the first or second base material (hereinafter, sometimes referred to as base material) used in the present invention include ceramics made of lithium tantalate. However, this is obtained by weighing and mixing lithium carbonate and tantalum pentoxide, and heating it to 100 ° C. or more in an electric furnace. Note that ceramics made of lithium diborate can be used because they can be obtained by using niobium pentoxide instead of tantalum pentoxide.
- the ceramic thus obtained is placed in a stainless steel container or quartz container, placed in a sealed furnace, and a reducing gas is supplied at a rate of about 1.5 liters per minute in a sealed furnace.
- the furnace temperature is raised from room temperature to the temperature Tl or the temperature ⁇ 1 'or ⁇ 1 ", which is equal to or higher than the Curie point, for example, from 700 ° C to 1200 ° C, and: After holding for 0 hours, the temperature of the furnace is lowered at a rate of about 6.7 ° C per minute, and the container is taken out of the furnace to obtain the base material, etc.
- the reducing atmosphere which is generally known as a reducing atmosphere, is used.
- the gas may include a reducing gas composed of at least one of hydrogen (H 2 ), carbon monoxide (CO), and nitrous oxide, which are the reducing gases.
- a reducing gas composed of at least one of hydrogen (H 2 ), carbon monoxide (CO), and nitrous oxide, which are the reducing gases.
- H 2 hydrogen
- CO carbon monoxide
- N 2 nitrogen
- N 2 nitrogen
- C 0 2 carbon dioxide
- lithium tantalate or another composite oxide having a non-stoichiometric composition as the above-mentioned ceramics because they have a cation deficiency and have high reducibility.
- a composition deviating from the stoichiometric ratio for example, In the case of lithium tantalate, it is preferable to use a composition in which the composition ratio of lithium and tantalum is out of 50:50, since there are many cation defects.
- lithium tantalate crystal can be cited.
- the above-mentioned ceramics made of lithium tantalate before the reduction treatment is put into a noble metal rutupo, and after heating and melting, seeds are produced.
- Lithium tantalate crystals can be grown by rotational pulling (the so-called Chiyoklarski method) using crystals.
- lithium niobate crystals can be grown in the same manner. The method of reducing the lithium tantalate crystals thus obtained is the same as in the case of the above-mentioned ceramitas, but when the temperature is lowered after the heat treatment, the atmosphere in the furnace is kept at 250 ° C or lower.
- the furnace It is preferable to take out the furnace at a temperature of 30 ° C. or less after introduction. Introducing the air at a temperature higher than 250 is not preferable because the lithium tantalate crystal may be oxidized. Also, as the above crystal, it is preferable to use a composition having a non-stoichiometric composition and deviating from the stoichiometric ratio as in the case of the ceramics.
- Examples of the base material used in the present invention include a slice wafer or a lap wafer made of lithium tantalate crystal, and this is made of the above-described lithium tantalate crystal having a diameter of 100 mm, for example, using a wire saw.
- a wafer having a diameter of 10 Omm and a thickness of 0.5 mm was obtained, and the wafer was further processed by a lapping machine to obtain a diameter of 10 Omm and a thickness of 0.5 mm.
- a wafer wrapped to a thickness of 0.4 mm is obtained.
- one or both sides of the wrapped wafer may be polished to obtain a polished wafer.
- the method of reducing the wafer thus obtained is the same as that of the above crystal.
- the crystal orientation of this wafer can be selected according to the required characteristics. For example, the wafer can be oriented by being rotated by 36 ° in the y direction with respect to the surface normal.
- the color of the lithium tantalate crystal or wafer, which is the base material is changed from white before the treatment to black, and the light absorbing ability is obtained.
- the temperatures T 1, T 1 ′, and T 1 ” are all at or above the Curie temperature of the lithium tantalate crystal, the lithium tantalate crystal or wafer obtained by this process is not suitable for SAW devices. It has an inappropriate multi-domain structure.
- the lithium tantalate crystal or wafer whose conductivity is finally improved in the present invention is obtained by growing and growing a crystal by the Czochralski method similarly to the lithium tantalate crystal or wafer as the base material or the like. It can be prepared by slicing and lapping the crystal. To unipolarize these, a noble metal electrode is placed on the lithium tantalate crystal, and a voltage is applied at a temperature equal to or higher than the Curie point of lithium tantalate, for example, at 65 ° C. Can be processed. A slice or lap wafer is obtained by slicing or lapping the crystal subjected to the single polarization. Alternatively, one or both sides of the lap wafer may be polished to obtain a polished wafer.
- the lithium tantalate crystal that has been subjected to the single polarization treatment as described above is superimposed so as to be in contact with the substance or the first base material that has been subjected to the reduction treatment at the temperature T1, and alternately laminated.
- Placed in a furnace for example, by flowing a reducing gas at a rate of about 1.5 liters per minute, raising the temperature of the furnace from room temperature at a rate of about 6.7 ° C per minute, T 1 After holding at a lower temperature T2, or a temperature T2 'that is lower than the Curie point, e.g., at 400 ° C to 600 ° C for 1 to 50 hours, the furnace is heated to about 6.7 ° C per minute.
- the temperature is lowered at a rate of, and the atmosphere is introduced into the furnace at a temperature of 250 ° C or less.
- a lithium tantalate crystal having a single polarization structure according to the present invention and having improved conductivity can be obtained.
- one of the following two methods can be performed in addition to the above method.
- a lithium tantalate crystal having the above-mentioned single polarization structure and having improved conductivity is placed in a furnace introduced into the atmosphere, and the temperature of the furnace is raised from room temperature to about 6.7 ° C / min.
- the temperature is raised at a rate, and after holding at a temperature T3 lower than the Curie point in the atmosphere, for example, at 400 ° C to 600 ° C for 1 to 50 hours, the furnace is heated at a rate of about 6.7 ° C per minute.
- the temperature is lowered at 30 ° C, and the crystal is taken out of the furnace when the temperature falls below 30 ° C.
- the lithium tantalate crystal becomes white, the electrical conductivity temporarily decreases, and the resistivity increases, but the activated state for the reduction reaction in the crystal is maintained, and A single polarization structure is also maintained.
- a white lithium tantalate crystal heat-treated in the air as described above, and a second base material obtained by heat-treatment at the temperature T 1 "as described above, for example, a black discolored lithium tantalate crystal The wafers are stacked so that they come into contact with each other, stacked alternately, placed in a furnace, and a reducing gas is flowed at a rate of about 1.5 liters per minute, and the temperature of the furnace is changed from room temperature to room temperature. After raising the temperature at a rate of about 6.7 C, and holding at a temperature T 2 '' lower than the Curie point, preferably at 40 O to 600 ° C. for 1 to 50 hours, the furnace is heated at about 6.
- the temperature is lowered at a rate of 7 ° C, the atmosphere is introduced into the furnace at 250 ° C or less, and the crystal is taken out of the furnace when the temperature reaches 30 ° C or less.
- a single-polarized lithium tantalate crystal whose conductivity is more uniformly improved can be surely obtained.
- black lithium tantalate crystals obtained by a single reduction treatment are likely to have color unevenness, but by performing the reduction twice as described above, there is no color unevenness corresponding to the variation in conductivity. Uniform black lithium lithium tantalate crystals can be reliably obtained.
- the second method is described below.
- the white lithium tantalate crystal that has been heat-treated in the above-mentioned atmosphere remains activated for the reduction reaction. Therefore, without using the second base material, the furnace was placed alone in the furnace, reducing gas was flowed at a rate of about 1.5 liters / minute, and the furnace temperature was raised from room temperature to about 6.7 ° / minute. The temperature is raised at a rate of C, and the temperature is kept at a temperature T2 "'lower than the Curie point, preferably at a temperature of 400 to 600 ° C for 1 to 50 hours.
- a heat treatment may be performed in which the temperature is lowered at a rate of 7 ° C, the atmosphere is introduced into the furnace at 250 ° C or lower, and the crystal is taken out of the furnace at 30 ° C or lower. Even with such a heat treatment, a single-polarized black lithium tantalate crystal having a more uniform conductivity and no color unevenness corresponding to the variation in the conductivity can be reliably obtained.
- the conductivity of the single-polarized lithium tantalate crystal having improved conductivity obtained by the present invention is determined as follows.
- the electrical conductivity is the reciprocal of the volume resistivity, and the volume resistivity is, for example, 4 329 AH igh R e sistance Me t'er 4 and 160 008 AR esistivity manufactured by Hewlett-Packard Company.
- the resistance value is measured using C e 11 and can be obtained from the value by the following equation.
- a voltage of 500 volts is applied to the wafer, and the resistance value is measured one minute after the voltage is applied to obtain a stable value.
- the effect of the present invention can also be confirmed by measuring the surface potential of the wafer.
- the surface potential is the amount of charge due to pyroelectricity accumulated on the surface due to the temperature difference, and this is known as a surface potential measurement as a quantitative measurement like static electricity.
- the surface potential can be obtained by measuring the difference in the surface potential that changes during that time.
- Lithium tantalate (LT) wafers used in this example and comparative examples were produced as follows. Lithium tantalate crystal with a diameter of 100 mm and a length of 50 mm oriented at a rotation of 36 ° in the y-direction with respect to the surface normal, using the Chiyoklarski method and conventional fabrication methods (Hereinafter referred to as LT crystal). A platinum electrode was placed on this LT crystal, and a voltage was applied at 65 ° C. to perform a single polarization process. Next, the LT crystal was sliced and wrapped to obtain a double-sided lap wafer having a thickness of 0.4 mm (hereinafter, this wafer is referred to as an LT wrap wafer). One side of this LT wrap wafer was polished to obtain a 0.35 mm thick wafer (hereinafter, this wafer is referred to as an LT polished wafer). This wafer was colorless and translucent. (Examples 1 to 18)
- the LT wrap wafer thus obtained was placed in a sealed furnace through which the reducing gases shown in Table 1 flow at a rate of about 1.5 liters per minute.
- the furnace consisted of a three-zone tubular furnace with a horizontal diameter of 200 mm alumina treatment tube.
- the wafer was supported by an alumina carrier placed in the center of the processing tube.
- the alumina treatment tube extends from ⁇ , so that the end of the alumina treatment tube remains exposed and cooled.
- the O-ring seal on the alumina treatment tube provided a sealed furnace cavity.
- the wafer was placed in a processing tube, which was then sealed with an end cap. Gas flow was started and furnace heating was started.
- the temperature of the furnace was increased from room temperature to a temperature T1 shown in Table 1 at a rate of about 6.7 ° C per minute. After holding for 1 hour at the temperature T1, the furnace was cooled at a rate of about 6.7 ° C./min.
- the atmosphere was introduced into the furnace at 250 ° C or lower, and the wafer was taken out of the furnace at 30 ° C or lower (hereinafter referred to as T1 treated LT wafer).
- T1 treated LT wafer a single-polarized LT-wrapped wafer and a T1-processed T-wafer are alternately stacked so as to contact each other, and a sealed furnace in which hydrogen gas flows at a rate of about 1.5 liters per minute Put it inside.
- This furnace is the same as the temperature T 1 reduction process.
- the furnace temperature was increased from room temperature at a rate of about 6.7 ° C / min.
- the furnace was cooled at a rate of about 6.7 ° C per minute.
- the atmosphere was introduced into the furnace at 250 ° C or lower, and the wafer was taken out of the furnace at 30 ° C or lower (hereinafter referred to as T2 treated LT wafer).
- the conductivity of this T2-treated LT wafer was determined as follows. The conductivity is the reciprocal of the volume resistivity, and the volume resistivity is first measured by using Hewlett Packard's 4 32 9 AH High Resistance Meter 4 and 16 08 AResistivity Cell. The value was measured, and the resistance was obtained from the following equation.
- the surface potential was measured as follows. First, ⁇ 2 treatment LT wafer is heated on a hot plate from 30 ° C to 70 ° C in 1 minute, and changes during that time by using SFM 775 manufactured by Ion Systems. The difference in surface potential was taken as the measured value. Table 1 shows the conductivity and surface potential obtained in this way. In all the tables below, a description of the conductivity, such as “9.3E- 14 ”, means “9.3X10-14”. As a result, in each of Examples 1 to 18, the conductivity was high and the surface potential was low. In order to further increase the electrical conductivity and lower the surface potential, it was preferable to set T1 to 700 ° C. or higher. In each case, since T 2 was at a temperature lower than the Curie point, the single-polarized structure of the two-step processing was maintained. (Examples 19 to 28)
- the LT wrap wafer was placed in a sealed furnace through which hydrogen gas flowed at a rate of about 1.5 liters per minute. It was kept at the temperature T1 shown in Table 2 for 1 hour to obtain a T1 treated LT wafer. Then, the single-polarized LT wrap wafer and the T1 treated T wafer are alternately stacked so as to be in contact with each other, and the reducing gas shown in Table 2 flows at a rate of about 1.5 liters per minute Placed in a sealed furnace. After holding at the temperature T2 shown in Table 2 for 1 hour, the furnace was cooled at a rate of about 6.7 ° C per minute.
- Atmosphere was introduced into the furnace at 250 ° C or lower, and when the temperature became 30 ° C or lower, the wafer was taken out of the furnace to obtain a T2-treated LT wafer.
- Table 2 shows the conductivity and the surface potential measured in the same manner as described above. As a result, the conductivity was high and the surface potential was low in all of Examples 19 to 28. In order to further increase the conductivity and lower the surface potential, it was preferable to set T 2 to 400 ° C. or higher. In each case, since T 2 was at a temperature equal to or lower than the Curie point, the single-polarized structure of the T 2 treated LT wafer could be maintained.
- Table 3 shows the conductivity and surface potential of the LT wrap wafers that were not subjected to any reduction treatment. The conductivity was low and the surface potential was high.
- the LT wrap wafer was placed in a sealed furnace through which hydrogen gas flowed at a rate of about 1.5 liters per minute. After maintaining the temperature at 600 ° C below the temperature of the lily for the time shown in Table 3, the furnace was cooled at a rate of about 6.7 ° C per minute. The atmosphere was introduced into the furnace at 30 ° C or less, the wafer was taken out of the furnace, and a reduced LT wafer was obtained.
- Table 3 shows the conductivity and surface potential measured by the same methods as described above. Regardless of the heat treatment time, the conductivity and the surface potential were almost the same as those of the LT wafer that had not been reduced. Further, no change in the color of the wafer was visually observed.
- the LT wrap wafer was placed in a sealed furnace where hydrogen gas flowed at a rate of about 1.5 liters per minute. It was kept at 1000 ° C. for 10 hours to obtain a T1 treated LT wafer. Then, the LT wafer and the T1 treated LT wafer were alternately stacked so as to be in contact with each other and placed in a sealed furnace in which hydrogen gas flows at a rate of about 1.5 liters per minute. After holding at 550 ° C for 6 hours, the furnace was cooled at a rate of about 6.7 ° C per minute.
- Atmosphere was introduced into the furnace at 250 ° C or lower, and when the temperature became 30 ° C or lower, the wafers were taken out of the furnace to obtain three T2 treated LT wafers.
- two of the T2-treated LT wafers were placed in a furnace into which air was introduced, and kept at 550 ° C for 6 hours to obtain a T3-treated LT wafer.
- one of the T3 treated LT wafers and another T1 treated LT wafer are alternately stacked so as to be in contact with each other, and hydrogen gas flows at a rate of about 1.5 liters per minute. Placed in a sealed furnace.
- the furnace was cooled at a rate of about 6.7 ° C per minute. Atmosphere was introduced into the furnace at 250 ° C or lower, and when the temperature became 30 ° C or lower, the wafer was taken out of the furnace to obtain a T 2 "-processed LT wafer.
- One piece was placed in a sealed furnace through which hydrogen gas flowed at a rate of about 1.5 liters per minute
- the furnace was turned on for about 6.7 minutes per minute
- the temperature was lowered at a rate of ° C.
- the atmosphere was introduced into the furnace at 250 ° C. or lower, and when the temperature reached 30 ° C.
- T2 treated LT wafer, T2, treated LT wafer and T2 "'treated LT wafer measured by the same method as above. Table 4 shows the surface potential. As a result, the conductivity was higher in Examples 30 and 31 than in Example 29, and the surface potential was lower.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
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Priority Applications (3)
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EP20040717771 EP1600531B1 (en) | 2003-03-06 | 2004-03-05 | Process for producing lithium tantalate crystal |
US10/548,098 US7323050B2 (en) | 2003-03-06 | 2004-03-05 | Method of producing lithium tantalate crystal |
JP2005503138A JP4220997B2 (ja) | 2003-03-06 | 2004-03-05 | タンタル酸リチウム結晶の製造方法 |
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US (1) | US7323050B2 (ja) |
EP (1) | EP1600531B1 (ja) |
JP (1) | JP4220997B2 (ja) |
KR (1) | KR20050103515A (ja) |
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- 2004-03-05 WO PCT/JP2004/002853 patent/WO2004079061A1/ja active Application Filing
- 2004-03-05 EP EP20040717771 patent/EP1600531B1/en not_active Expired - Lifetime
- 2004-03-05 CN CNB2004800051332A patent/CN100424235C/zh not_active Expired - Lifetime
- 2004-03-05 TW TW93105968A patent/TWI300448B/zh not_active IP Right Cessation
- 2004-03-05 KR KR1020057016372A patent/KR20050103515A/ko not_active Application Discontinuation
- 2004-03-05 US US10/548,098 patent/US7323050B2/en not_active Expired - Lifetime
- 2004-03-05 JP JP2005503138A patent/JP4220997B2/ja not_active Expired - Lifetime
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005112259A1 (en) * | 2004-05-14 | 2005-11-24 | Iljin Diamond Co., Ltd. | Method of manufacturing lithium tantalate substrate for surface acoustic wave elements and lithium tantalate substrate manufactured by the same |
JP2008500731A (ja) * | 2004-05-25 | 2008-01-10 | クリスタル テクノロジー インコーポレイテッド | ニオブ酸リチウムおよびタンタル酸リチウムの結晶をプリコンディショニングするための凝縮された化学物質の使用 |
WO2006051610A1 (ja) * | 2004-11-15 | 2006-05-18 | Shin-Etsu Chemical Co., Ltd. | タンタル酸リチウム結晶の製造方法 |
JP2007176715A (ja) * | 2005-12-27 | 2007-07-12 | Sumitomo Metal Mining Co Ltd | タンタル酸リチウム基板の製造方法 |
JP2009249254A (ja) * | 2008-04-09 | 2009-10-29 | Shin Etsu Chem Co Ltd | タンタル酸リチウム結晶の製造方法及びタンタル酸リチウム結晶 |
JP2010173865A (ja) * | 2009-01-27 | 2010-08-12 | Shin-Etsu Chemical Co Ltd | タンタル酸リチウム結晶の製造方法及びタンタル酸リチウム結晶からなるウェハ |
JP2010173864A (ja) * | 2009-01-27 | 2010-08-12 | Shin-Etsu Chemical Co Ltd | タンタル酸リチウム結晶の製造方法及びタンタル酸リチウム結晶 |
JP2017122024A (ja) * | 2016-01-07 | 2017-07-13 | 信越化学工業株式会社 | タンタル酸リチウム単結晶基板の製造方法 |
JP2017152494A (ja) * | 2016-02-23 | 2017-08-31 | 株式会社リコー | 圧電体評価装置 |
JP2017165611A (ja) * | 2016-03-16 | 2017-09-21 | 信越化学工業株式会社 | タンタル酸リチウム単結晶基板の製造方法 |
US20200354855A1 (en) * | 2018-02-02 | 2020-11-12 | Fujian Jing' An Optoelectronics Co., Ltd. | Wafer processing method and processed wafer obtained thereby |
US12012669B2 (en) * | 2018-02-02 | 2024-06-18 | Fujian Jing' An Optoelectronics Co., Ltd. | Method of processing a lithium tantalate and/or lithium niobate wafer by subjecting the wafer to heat and a reducing agent |
JP2020026356A (ja) * | 2018-08-09 | 2020-02-20 | 住友金属鉱山株式会社 | タンタル酸リチウム基板の製造方法 |
JP7082317B2 (ja) | 2018-08-09 | 2022-06-08 | 住友金属鉱山株式会社 | タンタル酸リチウム基板の製造方法 |
Also Published As
Publication number | Publication date |
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TW200424369A (en) | 2004-11-16 |
KR20050103515A (ko) | 2005-10-31 |
CN100424235C (zh) | 2008-10-08 |
EP1600531A1 (en) | 2005-11-30 |
EP1600531A4 (en) | 2009-04-01 |
US7323050B2 (en) | 2008-01-29 |
TWI300448B (en) | 2008-09-01 |
CN1754014A (zh) | 2006-03-29 |
US20060169196A1 (en) | 2006-08-03 |
JPWO2004079061A1 (ja) | 2006-06-08 |
EP1600531B1 (en) | 2015-04-22 |
JP4220997B2 (ja) | 2009-02-04 |
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