US9659966B2 - Flexible display substrate, flexible organic light emitting display device and method of manufacturing the same - Google Patents
Flexible display substrate, flexible organic light emitting display device and method of manufacturing the same Download PDFInfo
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- US9659966B2 US9659966B2 US14/106,173 US201314106173A US9659966B2 US 9659966 B2 US9659966 B2 US 9659966B2 US 201314106173 A US201314106173 A US 201314106173A US 9659966 B2 US9659966 B2 US 9659966B2
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- flexible substrate
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/16—Constructional details or arrangements
- G06F1/1613—Constructional details or arrangements for portable computers
- G06F1/1633—Constructional details or arrangements of portable computers not specific to the type of enclosures covered by groups G06F1/1615 - G06F1/1626
- G06F1/1637—Details related to the display arrangement, including those related to the mounting of the display in the housing
- G06F1/1652—Details related to the display arrangement, including those related to the mounting of the display in the housing the display being flexible, e.g. mimicking a sheet of paper, or rollable
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H01L27/3276—
-
- H01L51/0097—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
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- H01L2251/5338—
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- H01L51/5246—
-
- H01L51/5253—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/311—Flexible OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
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- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to a flexible display device, and more particularly, to a flexible display substrate used in a flexible display device capable of relieving stress concentrating on a wire upon bending a substrate.
- Display devices used in monitors of computers, televisions (TVs), and cell phones include organic light emitting display devices (OLEDs) and plasma display panels (PDPs), both of which autonomously emit light, and liquid crystal display devices (LCDs) requiring a separate light source, etc.
- OLEDs organic light emitting display devices
- PDPs plasma display panels
- LCDs liquid crystal display devices
- Flexible display devices capable of being bent or curved have gained much attention as the next-generation display device.
- Flexible display devices offer unique features that conventional rigid display devices do not have. Even with limited flexibility, these devices provide a slimmer form factor, lighter weight, higher durability, and most of all, the freedom of design for portable electronic devices such as cell phones and multimedia players. With enhanced flexibility, a range of revolutionary display and lighting opportunities can be created. These opportunities include new electronics products such as TVs with curvature adjustable screen as well as portable electronics with a rollable display screen.
- ITO indium tin oxide
- conductive polymers or carbon based coatings are used to form the electrodes/wires, mechanical stress (i.e., tensile/compression stresses) remains.
- Embodiments relate to a flexible display substrate including a flexible substrate and a wire.
- the flexible substrate has a curved portion that is bent.
- the wire has a plurality of first wire patterns and a second wire pattern. Each of the plurality of first wire patterns is spaced apart from an adjacent first wire pattern.
- a second wire pattern electrically connects the plurality of first wire patterns.
- a thin film transistor is formed on the flexible substrate to operate a light emitting element formed on the flexible substrate based on a signal transmitted via the wire.
- the second wire pattern overlaps with at least a portion of each of two of the first wire patterns.
- the portion of each first wire pattern overlaps with the second wire pattern and is in physical contact with the second wire pattern.
- the second wire pattern entirely covers at least one first wire pattern.
- the second wire pattern is in physical contact with all of the first wire patterns.
- the flexible display substrate further includes additional second wire patterns.
- Each of the additional second wire patterns may electrically connect at least two of the first wire patterns.
- At least two of the additional second wire patterns have different lengths.
- the second wire pattern has greater flexibility than the plurality of first wire patterns.
- two adjacent first wire patterns are spaced apart by a predetermined distance, and the second wire pattern has a length longer than the predetermined distance.
- the flexible display substrate further includes an insulation layer formed between and formed on each of the plurality of first wire patterns.
- the second wire pattern may be disposed on the insulation layer.
- At least a portion of the wire in the curved portion extends in a direction that is not parallel to a bending direction of the curved portion.
- the second wire pattern includes a plurality of portions. At least one of the plurality of portions extending in a direction that is not parallel to a bending direction of the curved portion.
- the flexible display substrate includes a crack prevention layer disposed on at least one of top and bottom surfaces of the wire.
- Embodiments also relate to a flexible display device including a flexible substrate and a conductive line.
- the flexible substrate includes a substantially flat area extending along a plane, and a bending area adjacent to the substantially flat area and bending away from the plane.
- the conductive line is disposed on the curved portion of the flexible substrate.
- the wire includes a first layer of wire segments and a second layer of wire segments electrically connecting the first layer of wire segments. At least part of the second layer formed on the first layer.
- the flexible display device further includes a passivation layer and a crack prevention layer.
- the passivation layer is formed above the conductive line at an opposite side of the flexible substrate.
- the crack prevention layer is placed between the passivation layer and the conductive line.
- the crack prevention layer includes at least one of a porous material and nanoparticles.
- the flexible display device further includes a display unit having an anode, a cathode, and a plurality of thin-film-transistors (TFT).
- TFT thin-film-transistors
- Each TFT has a source electrode, a drain electrode and a gate electrode.
- the first layer or the second layer is formed of the same material as at least one of the anode, the cathode, the source electrode, the drain electrode and the gate electrode.
- the conductive line is connected to at least one of the anode, the cathode, the source electrode, the drain electrode and the gate electrode.
- the flexible display device further includes a separation layer interposed between the first layer of wire segments and the second layer of wire segments.
- the separation layer has a plurality of contact holes. The first layer is in physically contact with the second layer through the plurality of contact holes.
- the flexible display device further includes a buffer layer interposed between the conductive line and the flexible substrate, and a crack prevention layer interposed between the buffer layer and the conductive line.
- Embodiments also relate to a method of fabricating a flexible display device.
- a plurality of first wire segments that are physically separated on at least a bending area of a flexible substrate are formed.
- a second wire segment is formed to bridge the first wire segments on at least the bending area of the flexible substrate.
- a display unit is formed on a flat area adjacent to the bending area, the display unit having an anode, a cathode, an organic light emitting diode between the anode and the cathode, and a plurality of thin-film-transistors (TFT).
- Each TFT has a source electrode, a drain electrode and a gate electrode.
- the first wire segments or the second wire segment are formed of the same material as any one of the anode, the cathode, the source electrode, the drain electrode and the gate electrode.
- the flexible substrate is bent at the bending area away from a plane along which the flat area of the flexible substrate extends.
- the first wire segments are formed by etching a layer of metal on the flexible substrate.
- FIG. 1A is a top view showing an unbent state of a flexible display substrate according to an exemplary embodiment of the present invention.
- FIG. 1B is a cross-sectional view of the flexible display substrate taken along line Ib-Ib′ shown in FIG. 1A .
- FIG. 1C is an enlarged diagram of an area X shown in FIG. 1A .
- FIG. 1D is a cross-sectional view illustrating an exemplary embodiment of the invention along with a flexible display substrate in a bent state.
- FIGS. 1E and 1F are cross-sectional views of the flexible display substrates according to various exemplary embodiments of the present invention.
- FIG. 1G is a top view showing an unbent state of the flexible display substrate according to another exemplary embodiment of the present invention.
- FIG. 1H is an enlarged diagram of the flexible display substrate according to an exemplary embodiment of the present invention.
- FIG. 1I is a cross-sectional view of the flexible display substrate according to an exemplary embodiment of the present invention.
- FIGS. 2A to 2C are cross-sectional views showing unbent states of flexible organic light emitting display devices according to various exemplary embodiments of the present invention.
- FIG. 2D is an enlarged diagram of an area X shown in FIG. 2A according to an embodiment of the present invention.
- FIG. 3 is a flowchart illustrating a method of manufacturing a flexible organic light emitting display device according to an embodiment of the present invention.
- an organic light emitting display device with a top emission mode refers to an organic light emitting display device, wherein light emitted from the organic light emitting diode radiates from an upper portion of the organic light emitting display device. That is, the organic light emitting display device with a top emission mode refers to an organic light emitting display device, wherein light emitted from the organic light emitting diode radiates in a direction of a top surface of a substrate having a thin film transistor formed therein for driving the organic light emitting display device.
- an organic light emitting display device with a bottom emission mode refers to an organic light emitting display device, wherein light emitted from the organic light emitting diode radiates from a lower portion of the organic light emitting display device. That is, the organic light emitting display device with a bottom emission mode refers to an organic light emitting display device, wherein light emitted from the organic light emitting diode radiates in a direction of a bottom surface of a substrate having a thin film transistor formed therein for driving the organic light emitting display device.
- an organic light emitting display device with a dual emission mode refers to an organic light emitting display device, wherein light emitted from the organic light emitting diode radiates from upper and lower portions of the organic light emitting display device.
- a thin film transistor, an anode, and a cathode may be configured depending on the mode of emission, so that light from the light emitting element is not interfered.
- a flexible display device refers to a display device endowed with flexibility, and may be used to have the same meaning as a bendable display device, a rollable display device, an unbreakable display device, or a foldable display device.
- a flexible organic light emitting display device is one example of various flexible display devices.
- a transparent display device refers to a transparent display device that is at least a part of a screen of a display device viewed by a user.
- transparency of the transparent display device refers to a degree of transparency at which a user at least recognizes an object behind a display device.
- the transparent display device includes a display area and a non-display area.
- the display area is an area on which an image is displayed
- the non-display area is an area on which no image is displayed, such as a bezel area.
- the transparent display device is configured to dispose opaque components, such as a battery, a printed circuit board (PCB), and a metal frame, under the non-display area rather than the display area.
- opaque components such as a battery, a printed circuit board (PCB), and a metal frame
- the transparent display device refers to a display device having transmissivity of, for example, equal to or greater than at least 20%.
- transmissivity means a value obtained by dividing an intensity of light, which passes through the transparent display device except for light which is incident on a transmissive region of the transparent display device and reflected on the interface between respective layers of the transparent display device, by an intensity of the entire incident light.
- front and rear surfaces of the transparent display device are defined based on light emitted from the transparent display device.
- the front surface of the transparent display device means a surface on which light from the transparent display device is emitted
- the rear surface of the transparent display device means a surface opposite to the surface on which the light from the transparent display device is emitted.
- FIG. 1A is a top view showing an unbent state of a flexible display substrate according to one exemplary embodiment of the present invention.
- FIG. 1B is a cross-sectional view of the flexible display substrate taken along line Ib-Ib′ shown in FIG. 1A .
- FIG. 1C is an enlarged diagram of an area X shown in FIG. 1A .
- FIG. 1D is a cross-sectional view showing a bent state of the flexible display substrate according to one exemplary embodiment of the present invention.
- a flexible display substrate 100 A includes a flexible substrate 110 A, a wire 120 A, and a display unit 130 A.
- the flexible substrate 110 A is a substrate configured to support various components of the flexible display.
- the flexible substrate 110 A is endowed with flexibility.
- the flexible substrate 110 A may also be referred to as a flexible substrate, a first flexible substrate, or a flexible member.
- the flexible substrate 110 A may also be referred to as a plastic film, a plastic substrate, or a first flexible substrate.
- FIGS. 1A and 1B show that the flexible substrate 110 A is illustrated in the form of a rectangular shape. However, it should be understood that the flexible substrate 120 may have various shapes, but the present invention is not limited thereto.
- the flexible substrate 110 A may be formed of a flexible material.
- the flexible substrate 110 A may be any one or more of materials including, but not limited to, a polyester-based polymer, a silicone-based polymer, an acrylic polymer, a polyolefin-based polymer, and a copolymer thereof.
- the flexible substrate 110 A may be formed of one or combination of materials such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polysilane, polysiloxane, polysilazane, polycarbosilane, polyacrylate, polymethacrylate, polymethylacrylate, polyethylacrylate, polyethylmethacrylate, a cyclic olefin copolymer (COC), a cyclic olefin polymer (COP), polyethylene (PE), polypropylene (PP), polyimide (PI), polymethylmethacrylate (PMMA), polystyrene (PS), polyacetal (POM), polyether ether ketone (PEEK), polyestersulfone (PES), polytetrafluoroethylene (PTFE), polyvinylchloride (PVC), polycarbonate (PC), polyvinylidenefluoride (PVDF), a perfluoroalkyl polymer
- the flexible substrate 110 A includes a display area DA and a non-display area NA.
- the display area DA of the flexible substrate 110 A refers to an area on which an image is actually displayed, and the non-display area NA of the flexible substrate 110 A refers to an area on which no image is displayed.
- the non-display area NA of the flexible substrate 110 A is an area extending from the display area DA of the flexible substrate 110 A.
- the non-display area NA of the flexible substrate 110 A extends from one side of the display area DA of the flexible substrate 110 A.
- the display area DA of the flexible substrate 110 A may be formed in a polygonal shape, and the non-display area NA of the flexible substrate 110 A may extend from one side of the display area DA of the flexible substrate 110 A.
- FIGS. 1A to 1D show that the non-display area NA of the flexible substrate 110 A extends from one side of the display area DA of the flexible substrate 110 A, but the present invention is not limited thereto.
- the non-display areas NA of the flexible substrate 110 A may extend from a plurality of sides of the display area DA of the flexible substrate 110 A.
- the non-display area NA of the flexible substrate 110 A is positioned at a peripheral or edge portion of the display area DA of the flexible substrate 110 A, and various circuits for displaying an image are disposed on the non-display area NA of the flexible substrate 110 A. Therefore, the non-display area NA of the flexible substrate 110 A may also be referred to as a peripheral area, a peripheral circuit area, an edge area, or a bezel area.
- a display unit 130 A is disposed at all or part of the display area DA of the flexible substrate 110 A.
- the display unit 130 A is an element configured to actually display an image, and may also be referred to as an image display unit or a display panel.
- the display unit 130 A may be used without limitation as long as it can be configured to display an image. In this specification, however, the display unit 130 A that is an organic light emitting diode in which an image is displayed through an organic light emitting layer will be described.
- the elements disposed at the non-display area NA of the flexible substrate 110 A may include various ICs such as gate driver ICs or data driver ICs, and drive circuit units.
- the various ICs and drive circuit units may be embedded in the flexible substrate 110 A using a gate-in-panel (GIP) method, or be connected to the flexible substrate 110 A using a tape-carrier-package (TCP) or chip-on-film (COF) method.
- GIP gate-in-panel
- TCP tape-carrier-package
- COF chip-on-film
- the flexible substrate 110 A includes a substantially flat area, which extends in a plane.
- the flexible substrate 110 A further includes a bending area curved in a bending direction such that it is bending away from the plane. Accordingly, some parts of the display area or non-display area NA of the flexible substrate 110 A may include a curved portion in the bending direction, which may be referred to as a bending area. Since the non-display area NA of the flexible substrate 110 A is not an area on which an image is displayed, an image does not need to be viewed from a top surface of the flexible substrate 110 A, and at least a part of the non-display area NA of the flexible substrate 110 A may be bent. For the sake of convenience of description, FIGS.
- FIG. 1A to 1D illustrate non-display area NA of the flexible substrate 110 A being the bending area BA, but it should be appreciated that the present invention is applicable to any area of the flexible display substrate.
- the non-display area NA of the flexible substrate 110 A may correspond to the bending area.
- FIG. 1A shows that the non-display area NA of the flexible substrate 110 A is slightly narrower than the display area DA of the flexible substrate 110 A.
- the non-display area NA of the flexible substrate 110 A may actually correspond to an area much narrower than the display area DA of the flexible substrate 110 A.
- the bending area that is at least a part of the non-display area NA of the flexible substrate 110 A is formed in a curved shape in a bending direction.
- FIGS. 1A to 1D show that the bending direction is a horizontal direction of the flexible substrate 110 A, and the bending area that is at least a part of the non-display area NA of the flexible substrate 110 A is bent in a horizontal direction of the flexible substrate 110 A.
- a wire 120 A is formed on the flexible substrate 110 A.
- the wire 120 A may electrically connect a display unit 130 A, which may be formed on the display area DA of the flexible substrate 110 A, with a drive circuit unit, a gate driver IC, or a data driver IC, which may be formed on the non-display area NA of the flexible substrate 110 A, to send a signal.
- the wire 120 A includes a plurality of first wire patterns 121 A disposed on at least a part of the non-display area NA of the flexible substrate 110 A and a second wire pattern 122 A disposed on at least a part of the non-display area NA of the flexible substrate 110 A, in which the second wire pattern 122 A is configured to electrically connect at least two of the plurality of first wire patterns 121 A.
- the wire 120 A (i.e., the plurality of first wire patterns 121 A and at least one second wire pattern 122 A) is formed of one or more conductive materials. It is preferred that the wire 120 A is formed of conductive materials, such as gold (Au), silver (Ag) and aluminum (Al), having excellent flexibility so as to minimize generation of cracks upon bending the flexible substrate 110 A.
- the constituent material of the wire 120 A is not particularly limited, and may be formed with one of various conductive materials used in other components/parts of the display unit 130 A.
- the wire 120 A (i.e., the plurality of first wire patterns 121 A and at least one second wire pattern 122 A) may be formed of one of various materials used to manufacture the display unit 130 A, such as molybdenum (Mo), chromium (Cr), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and an alloy of silver (Ag) with magnesium (Mg).
- the wire 120 A i.e., the first wire patterns 121 A and the second wire pattern 122 A
- the wire 120 A may be formed in a multi-layer structure including the various conductive materials as described above.
- the wire 120 A may be formed in a three-layer structure of titanium (Ti), aluminum (Al), and titanium (Ti), but the present invention is not limited thereto. It is sufficient that the first and second wire patterns are formed of conductive material. Accordingly, in the present disclosure, the term “wire pattern” may be referred to as a metal pattern or a conductive pattern.
- the wire 120 A includes a plurality of first wire patterns 121 A formed on at least a part of the non-display area NA of the flexible substrate 110 A, a second wire pattern 122 A formed on at least a part of the non-display area NA of the flexible substrate 110 A and electrically connected with the plurality of first wire patterns 121 A, and a third wire pattern 123 A formed on the display area DA of the flexible substrate 110 A and coming in contact with the plurality of first wire patterns 121 A or the second wire pattern 122 A.
- the third wire pattern 123 A refers to a pattern formed in the wire 120 A at the display area DA of the flexible substrate 110 A.
- the third wire pattern 123 A is illustrated as a separate wire pattern.
- the third wire pattern 123 A can be one of the first wire pattern 121 A having one end electrically connected with the display unit 130 A and the other end electrically connected to another first wire pattern 121 A via the second wire pattern 122 A.
- the third wire pattern 123 A can also be a second wire pattern 122 A having one of its end electrically connected with the display unit 130 A and the other end electrically connected to one of the first wire patterns 121 A. Accordingly, in FIG. 1B , one end of the third wire pattern 123 A comes in contact with the plurality of first wire patterns 121 A. In some other embodiments, however, the third wire pattern 123 A may come in contact with the second wire pattern 122 A.
- the third wire pattern 123 A may be formed of the same material as the plurality of first wire patterns 121 A and/or the second wire pattern 122 A. Also, the third wire pattern 123 A may be formed of the same material as one of the conductive materials used to form the display unit 130 A, and may be formed of a conductive material different from the conductive material used to form the display unit 130 A. In embodiments where the third wire pattern 123 A is not a part of the first wire patterns 121 A or the second wire pattern 122 A, the third wire pattern 123 A can be formed of a material different from the plurality of first wire patterns 121 A and the second wire pattern 122 A.
- the plurality of first wire patterns 121 A is formed on the non-display area NA of the flexible substrate 110 A.
- the plurality of first wire patterns 121 A is discontinuously formed on the flexible substrate 110 A, and is in the form of an island. In other words, each of the first wire patterns 121 A is spaced apart from its adjacent first wire pattern 121 A by a predetermined distance.
- the plurality of first wire patterns 121 A may be formed at the same time with the same material, and may also be formed at the same time as the third wire pattern 123 A connected with a component in the DA. In some exemplary embodiments, may be formed of the same material as one of the conductive materials used to form the display unit 130 A. As mentioned above, the third wire pattern 123 A may be part of the first wire pattern 121 A.
- the second wire pattern 122 A is formed on the first wire patterns 121 A at the non-display area NA of the flexible substrate 110 A, and electrically connected with the first wire patterns 121 A.
- some embodiments of the wire 120 A includes multiple second wire patterns 122 A that are separated from each other.
- Each of the second wire pattern 122 A is formed on some portion of the first wire patterns 121 A being electrically connected via the second wire pattern 122 A so that the portion of each first wire patterns 121 A overlapping with the second wire pattern 122 A is in physical contact with the second wire pattern 122 A. Therefore, the plurality of first wire patterns 121 A and the plurality of second wire patterns 122 A jointly form a wire 120 A.
- each of the plurality of second wire patterns 122 A is electrically connects at least two first wire patterns 121 A
- the second wire patterns 122 A may be longer/shorter than the first wire pattern 121 A, depending on the distance between the first wire patterns 121 A.
- the second wire pattern 122 A may be formed of the same material as one of the components disposed in the display area.
- a wire electrically connecting two points can be formed with multiple conductive patterns in such a way that the conductive patterns are electrically connected with each other to provide electrical channel between two points.
- the tensile stress is distributed to the conductive patterns forming the wire. Since each of the conductive patterns forming the wire is shorter than the original wire (e.g., single wire extending between the two points), each conductive pattern receives less tensile stress. As a result, the chance of wire being cracked or disconnected is greatly reduced. Even when the distance between the two points increases, additional number of conductive patterns can be used to cover the distance without increasing the chance wire breakage.
- FIGS. 1E and 1F are cross-sectional views of the flexible display substrates according to various exemplary embodiments of the present invention.
- a flexible substrate 110 E, a wire 120 E, and a display unit 130 E shown in FIG. 1E are substantially identical to the flexible substrate 110 A, the wire 120 A, and the display unit 130 A shown in FIG. 1A
- a flexible substrate 110 F, a wire 120 F, and a display unit 130 F shown in FIG. 1F are substantially identical to the flexible substrate 110 A, the wire 120 A, and the display unit 130 A, and thus repeated description of the same elements as shown in FIGS. 1E and 1F is omitted for brevity.
- lengths of second wire patterns 122 E and 122 F may be greater than those of a plurality of first wire patterns 121 E and 121 F.
- the second wire pattern 122 E may be in the form of an island, and the second wire pattern 122 E in the form of an island may be formed on parts of surfaces of the plurality of first wire patterns 121 E so that parts of surfaces of the plurality of first wire patterns 121 E can come in contact with a part of a surface of the second wire pattern 122 E.
- some of the first wire patterns 121 E may be entirely overlapped by the second wire pattern 122 E.
- some of the plurality of second wire patterns 122 E may come in contact with two or more first wire patterns 121 E among the plurality of first wire patterns 121 E.
- one of the second wire patterns 122 E may come in contact with three first wire patterns 121 E, and the other one of the second wire patterns 122 E may come in contact with two first wire patterns 121 E, as shown in FIG. 1E . Accordingly, the length of the second wire pattern 122 E may be greater than the length of each of the plurality of first wire patterns 121 E.
- a material constituting the second wire pattern 122 E may have a higher flexibility than a material constituting the plurality of first wire patterns 121 E. As described above, a greater tensile force is applied to the longer wire. Also, the amount of mechanical stress varies depending on the position of the wire patterns. For instance, wire patterns disposed on the outer side of the curvature receives more tensile stress than the wire patterns disposed in the inner side of the curvature. As such, a greater tensile force is applied to the second wire pattern 122 E having a greater length, compared with the plurality of first wire patterns 121 E. Accordingly, the second wire pattern 122 E can be formed with a material having greater flexibility than the first wire patterns 121 E when the second wire pattern 122 E formed to be longer than the first wire patterns 121 E.
- the second wire pattern 122 F may be in the form of a line, and the second wire pattern 122 F in the form of a line may be formed on parts of surfaces of a plurality of first wire patterns 121 F so that each of the plurality of first wire patterns 121 F comes in contact with a part of a surface of the second wire pattern 122 F. Therefore, the second wire pattern 122 F may electrically connect at least all of the plurality of first wire patterns 121 F on the curved portion of the flexible substrate. In this case, the second wire pattern 122 F has greater length than each of the plurality of first wire patterns 121 F.
- a material constituting the second wire pattern 122 F may have greater flexibility than a material constituting the plurality of first wire patterns 121 F.
- a greater tensile force is applied to the wire 120 F.
- a greater tensile force is applied to the second wire pattern 122 F having a greater length, compared with the plurality of first wire patterns 121 F.
- a material constituting the second wire pattern 122 F having a greater length may have greater flexibility than a material constituting the plurality of first patterns.
- FIG. 1G is a top view showing an unbent state of the flexible display substrate according to still another exemplary embodiment of the present invention.
- a flexible display substrate 100 G includes a flexible substrate 110 G, a wire 120 G, and a display unit 130 G.
- the flexible substrate 110 G and the display unit 130 G are substantially identical to the flexible substrate 110 A and the display unit 130 A shown in FIGS. 1A to 1D , and thus repeated description of the flexible substrate 110 G and the display unit 130 G is omitted for brevity.
- the wire 120 G is formed on the flexible substrate 110 G.
- a part of the wire 120 G positioned on at least a part of the non-display area NA of the flexible substrate 110 G is formed in an oblique direction.
- a part of the wire 120 G positioned on the non-display area NA of the flexible substrate 110 G is formed in an oblique direction.
- the term “oblique direction” refers to a direction which is neither parallel with a bending direction nor perpendicular to the bending direction. Since the bending direction refers to a horizontal direction of the flexible substrate 110 G as shown in FIG.
- the oblique direction means a direction which is neither parallel with the horizontal direction of the flexible substrate 110 G nor perpendicular to the horizontal direction of the flexible substrate 110 G.
- FIG. 1G shows that all the wires 120 G formed on the non-display area NA of the flexible substrate 110 G are formed in an oblique direction, but the present invention is not limited thereto.
- some of the wires 120 G formed on the non-display area NA of the flexible substrate 110 G may be formed in an oblique direction.
- the wires 120 G are not formed on the bending area of the flexible substrate 110 G to extend in a bending direction, but at least parts of the wires 120 G may be formed to extend in an oblique direction which is different from the bending direction, thereby reducing the tensile stress applied to the wires 120 G and minimizing breaking of the wires 120 G as well.
- the wire 120 G is substantially identical to the wire 120 A shown in FIGS. 1A to 1D , except that the wire 120 G is formed in an oblique direction, and thus repeated description of the wire 120 G is omitted for brevity.
- the wires 120 G formed on the non-display area NA of the flexible substrate 110 G may be formed in various shapes.
- the plurality of wires 120 G positioned on the non-display area NA of the flexible substrate 110 G may be formed in a trapezoidal wave shape, and also formed in various shapes such as a chopping wave shape, a sawtooth wave shape, a sine wave shape, an omega ( ⁇ ) shape, and a lozenge shape.
- the shape of the wires 120 G may be determined based on the bending direction of the non-display area NA of the flexible substrate 110 G, the width of the non-display area NA, the radius of curvature of the non-display area NA, the widths of the wires 120 G, and the total length of the wires 120 G.
- FIG. 1H is an enlarged diagram of the flexible display substrate according to still another exemplary embodiment of the present invention.
- FIG. 1H is a planar enlarged diagram showing a wire 120 H formed on a non-display area NA of a flexible substrate 110 H according to still another exemplary embodiment of the present invention.
- the wire 120 H is formed on the flexible substrate 110 H.
- the wire 120 H includes a plurality of first wire patterns 121 H formed on at least a part of the non-display area NA of the flexible substrate 110 H, and a second wire pattern 122 H formed on at least a part of the non-display area NA of the flexible substrate 110 H and electrically connected with the plurality of first wire patterns 121 H.
- the second wire pattern 122 H when the second wire pattern 122 H is in the form of a plurality of wire patterns, the second wire pattern 122 H may be in the form of an island.
- the plurality of first wire patterns 121 H and the second wire pattern 122 H may extend in different directions.
- the plurality of first wire patterns 121 H may be formed in a bending direction of the flexible substrate 110 H
- the second wire pattern 122 H may be formed in a direction different from the bending direction of the flexible substrate 110 H, as shown in FIG. 1H .
- the bending direction is a horizontal direction of the flexible substrate 110 H
- the plurality of first wire patterns 121 H may extend in a horizontal direction of the flexible substrate 110 H
- the second wire pattern 122 H may extend in an oblique direction rather than the horizontal direction of the flexible substrate 110 H, as described above.
- the second wire pattern 122 H is formed in a chopping wave shape, but the present invention is not limited thereto.
- the first wire patterns 121 H may extend in the oblique direction.
- the wire patterns may be formed in various shapes such as a sawtooth wave shape and a sine wave shape.
- one wire pattern may include a plurality of portions extending in two different directions.
- the second wire pattern 122 H may be divided into two parts, each of which extends from one end of one first wire pattern 121 H, in different directions, and the two divided parts of the second wire pattern 122 H may be coupled to one end of one first wire pattern 121 H which is electrically connected with another first wire pattern 121 H by means of the second wire pattern 122 H.
- the second wire pattern 122 H may be, for example, formed in various shapes such as a lozenge shape and a circular shape.
- the second wire pattern 122 H may also be formed in a bending direction, and the plurality of first wire patterns 121 H may be formed in a direction different from the bending direction. In some exemplary embodiments, both the plurality of first wire patterns 121 H and the second wire pattern 122 H may be formed in a direction different from the bending direction.
- the wire 120 H is substantially identical to the wire 120 A shown in FIGS. 1A to 1D except for extension directions of the plurality of first wire patterns 121 H and the second wire pattern 122 H, and thus repeated description of the wire 120 H is omitted for brevity.
- FIG. 1I is a cross-sectional view of a flexible display substrate according to yet another exemplary embodiment of the present invention.
- a flexible display substrate 100 I includes a flexible substrate 110 I, a wire 120 I, a separation layer 160 I, and a display unit 130 I.
- the flexible substrate 110 I and the display unit 130 I are substantially identical to the flexible substrate 110 A and the display unit 130 A shown in FIGS. 1A to 1D , and thus repeated description of the flexible substrate 110 I and the display unit 130 I is omitted for brevity.
- the wire 120 I is formed on the flexible substrate 110 I.
- the wire 120 I includes a plurality of first wire patterns 121 I formed on at least a part of a non-display area NA of the flexible substrate 110 I, a second wire pattern 122 I formed on at least a part of the non-display area NA of the flexible substrate 110 I and electrically connected with the plurality of first wire patterns 121 I, and a third wire pattern 123 I formed on a display area DA of the flexible substrate 110 I and coming in contact with the plurality of first wire patterns 121 I or the second wire pattern 122 I.
- the plurality of first wire patterns 121 I and the third wire pattern 123 I are substantially identical to the plurality of first wire patterns 121 A and the third wire pattern 123 A shown in FIGS. 1A to 1D , and thus repeated description of the plurality of first wire patterns 121 I and the third wire pattern 123 I is omitted for brevity.
- the separation layer 160 I is formed on the plurality of first wire patterns 121 I and/or the third wire pattern 123 I.
- the separation layer 160 I may be formed of an insulation material, and also be formed of the same material as one of the insulation materials used to form the display unit 130 I.
- the separation layer 160 I may include a contact hole configured to open a part of each of the plurality of first wire patterns 121 I and/or the third wire pattern 123 I, and the second wire pattern 122 I may be formed on the separation layer 160 I to come in contact with the plurality of first wire patterns 121 I through the contact hole formed in the separation layer 160 I.
- the second wire pattern 122 I is substantially identical to the second wire pattern 122 A shown in FIGS.
- FIG. 2A is a cross-sectional view showing an unbent state of the flexible organic light emitting display device according to one exemplary embodiment of the present invention.
- a flexible organic light emitting display device 200 A includes a flexible substrate 210 A, a wire 220 A, and a display unit 230 A.
- the flexible substrate 210 A is a substrate configured to support various elements of the flexible organic light emitting display device 200 A.
- the flexible substrate 210 A is endowed with flexibility.
- the flexible substrate 210 A may be referred to as a flexible substrate, a first flexible substrate, or a flexible member.
- the flexible substrate 210 A may also be referred to as a plastic film or a plastic substrate.
- the non-display area NA of the flexible substrate 210 A may also be referred to as a peripheral area, a peripheral circuit area, an edge area, or a bezel area.
- the non-display area NA of the flexible substrate 210 A includes a bending area.
- FIG. 2A shows that the entire non-display area NA of the flexible substrate 210 A corresponds to the bending area. However, only a part of the non-display area NA of the flexible substrate 210 A may correspond to the bending area.
- FIG. 2A shows that the flexible substrate 210 A is in an unbent state. However, the bending area, that is, a non-display area NA of the flexible substrate 210 A may be curved in a bending direction, as shown in FIG. 1D .
- the wire 220 A is formed on the flexible substrate 210 A.
- the wire 220 A may electrically connect a display unit 230 A, which may be formed on the display area DA of the flexible substrate 210 A, with a drive circuit unit, a gate driver IC, or a data driver IC, which may be formed on the non-display area NA of the flexible substrate 210 A, to send a signal.
- the wire 220 A may be formed of a conductive material.
- the wire 220 A may be formed of a conductive material having excellent flexibility so as to minimize generation of cracks upon bending the flexible substrate 210 A.
- the wire 220 A is formed of conductive materials, such as gold (Au), silver (Ag) and aluminum (Al), having excellent flexibility so as to minimize generation of cracks upon bending the flexible substrate 210 A.
- the constituent material of the wire 220 A is not particularly limited, and may be formed with one of various conductive materials used in other components/parts of the display unit 230 A.
- the wire 220 A (i.e., the plurality of first wire patterns 221 A and at least one second wire pattern 222 A) may be formed of one of various materials used to manufacture the display unit 130 A, such as molybdenum (Mo), chromium (Cr), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and an alloy of silver (Ag) with magnesium (Mg).
- the wire 220 A i.e., the first wire patterns 221 A and the second wire pattern 222 A
- the wire 220 A may be formed in a multi-layer structure including the various conductive materials as described above.
- the wire 220 A may be formed in a three-layer structure of titanium (Ti), aluminum (Al), and titanium (Ti), but the present invention is not limited thereto. It is sufficient that the first and second wire patterns are formed of conductive material.
- the wire 220 A includes a plurality of first wire patterns 221 A formed on at least a part of the non-display area NA of the flexible substrate 210 A, a second wire pattern 222 A formed on at least a part of the non-display area NA of the flexible substrate 210 A and electrically connected with the plurality of first wire patterns 221 A, and a third wire pattern 223 A formed on the display area DA of the flexible substrate 210 A and coming in contact with the plurality of first wire patterns 221 A or the second wire pattern 222 A.
- FIG. 2A shows that the entire non-display area NA of the flexible substrate 210 A corresponds to the bending area. Accordingly, the plurality of first wire patterns 221 A and the second wire pattern 222 A which are formed on the entire non-display area NA of the flexible substrate 210 A will be described hereinafter.
- the third wire pattern 223 A refers to a pattern formed on the display area DA of the flexible substrate 210 A in the wire 220 A.
- one end of the third wire pattern 223 A is electrically connected with the display unit 230 A, and the other end of the third wire pattern 223 A comes in contact with the plurality of first wire patterns 221 A or the second wire pattern 222 A.
- FIG. 2A shows that the other end of the third wire pattern 223 A comes in contact with the second wire pattern 222 A, but the present invention is not limited thereto.
- the other end of the third wire pattern 223 A may also come in contact with the first wire pattern 221 A.
- the third wire pattern 223 A may be formed of a conductive material.
- the third wire pattern 223 A may be formed of the same material as one of the conductive materials used to form the display unit 230 A.
- constituent materials of the third wire pattern 223 A will be described later in further detail.
- a plurality of first wire patterns 221 A are formed on the non-display area NA of the flexible substrate 210 A.
- the plurality of first wire patterns 221 A is discontinuously formed on the flexible substrate 210 A, and is in the form of an island.
- the plurality of first wire patterns 221 A may be formed of the same material at the same time.
- the first wire patterns 221 A may be formed of a conductive material.
- the first wire patterns 221 A may be formed of the same material as one of the conductive materials used to form the display unit 230 A.
- constituent materials of the first wire pattern 221 A will be described later in further detail.
- the second wire pattern 222 A is formed on the first wire patterns 221 A at the non-display area NA of the flexible substrate 210 A, and electrically connected with the first wire patterns 221 A.
- the second wire pattern 222 A may be in the form of an island.
- the second wire pattern 222 A in the form of an island may be formed on parts of surfaces of the plurality of first wire patterns 221 A so that the parts of surfaces of the plurality of first wire patterns 221 A can come in contact with a part of a surface of the second wire pattern 222 A.
- each of the plurality of second wire patterns 222 A may come in contact with two first wire patterns 221 A of the plurality of first wire patterns 221 A.
- the plurality of second wire patterns 222 A may be formed of the same material at the same time, and may be formed of the same material at the same time as the third wire pattern 223 A coming in contact with the plurality of second wire patterns 222 A.
- the second wire patterns 222 A coming in contact with the third wire pattern 223 A may be formed integrally with the third wire pattern 223 A.
- the second wire patterns 222 A may be formed of a conductive material.
- the second wire patterns 222 A may be formed of the same material as one of the conductive materials used to form the display unit 230 A.
- constituent materials of the second wire patterns 222 A will be described later in further detail.
- the intensity of a tensile force applied to the wires may be reduced, compared with when the wire for connecting two points is formed in one wire pattern.
- the plurality of first wire patterns 221 A and the second wire pattern 222 A configured to electrically connect the plurality of first wire patterns 221 A may be formed on the bending area at the non-display area NA of the flexible substrate 210 A so as to decrease a tensile force applied to the wire 220 A and reduce a risk of breaking the wire 220 A.
- the display unit 230 A is disposed on all or part of the display area DA of the flexible substrate 210 A.
- the display unit 230 A is an element configured to actually display an image, and may also be referred to as an image display unit or a display panel.
- the display unit 230 A includes an organic light emitting diode 250 A and a thin film transistor 240 A.
- a buffer layer 261 A is formed on the flexible substrate 210 A.
- the buffer layer 261 A may serve to prevent penetration of moisture or impurities through the flexible substrate 210 A and planarize a surface of the flexible substrate 210 A.
- the buffer layer 261 A is not an essentially required configuration, and may be selected according to the kind of the flexible substrate 210 A or the kind of the thin film transistor 240 A used in the flexible organic light emitting display device 200 A.
- the buffer layer 261 A may be formed of a silicon oxide film, a silicon nitride film, or a multilayer film thereof.
- the buffer layer 261 A may be formed only on the display area DA of the flexible substrate 210 A so as to ensure the flexibility of the non-display area NA of the flexible substrate 210 A.
- the buffer layer 261 A is formed only on the display area DA of the flexible substrate 210 A and is not formed on the non-display area NA of the flexible substrate 210 A, the elements positioned on an upper portion of the non-display area NA of the flexible substrate 210 A may be susceptible to moisture and oxygen penetrating from a lower portion of the non-display area NA of the flexible substrate 210 A. Therefore, as shown in FIG. 2C , the buffer layer 261 A formed on the non-display area NA of the flexible substrate 210 A may be smaller in thickness than the buffer layer 261 A formed on the display area DA of the flexible substrate 210 A.
- the buffer layer 261 A may be formed on the display area DA and the non-display area NA of the flexible substrate 210 A to have the same thickness, and the buffer layer 261 A having a relatively smaller thickness may then be formed by etching a part of the buffer layer 261 A formed on the non-display area NA of the flexible substrate 210 A.
- the silicon oxide film constituting the buffer layer 261 A has poorer flexibility than a metal, but exhibits more excellent flexibility than the silicon nitride film. Therefore, in the flexible organic light emitting display device according to another exemplary embodiment of the present invention, among the materials constituting the buffer layer 261 A, only the silicon oxide film may be formed on the non-display area NA of the flexible substrate 210 A so as to protect the elements positioned on the non-display area NA of the flexible substrate 210 A from moisture and oxygen penetrating from a lower portion of the non-display area NA of the flexible substrate 210 A.
- An active layer 241 A is formed on the flexible substrate 210 A.
- the active layer 241 A may be directly formed on the flexible substrate 210 A.
- the active layer 241 A may include a channel region configured to form a channel, a source region, and a drain region.
- the source region and the drain region come in contact with a source electrode 243 A and a drain electrode 244 A, respectively.
- the active layer 241 A may include an oxide semiconductor.
- a quaternary metal oxide such as an indium tin gallium zinc oxide (InSnGaZnO)-based material, a ternary metal oxide such as an indium gallium zinc oxide (InGaZnO)-based material, an indium tin zinc oxide (InSnZnO)-based material, an indium aluminum zinc oxide (InAlZnO)-based material, a tin gallium zinc oxide (SnGaZnO)-based material, an aluminum gallium zinc oxide (AlGaZnO)-based material, or a tin aluminum zinc oxide (SnAlZnO)-based material, or a binary metal oxide such as an indium zinc oxide (InZnO)-based material, a tin zinc oxide (SnZnO)-based material, an aluminum zinc oxide (AlZnO)-based material, a zinc magnesium oxide (
- composition ratios of elements included in the above-described material of the oxide semiconductor are not particularly limited and may be adjusted to a wide extent.
- the active layer 241 A including the oxide semiconductor has been described in this specification, but the present invention is not limited thereto.
- a gate insulation layer 245 A is formed on the active layer 241 A.
- the gate insulation layer 245 A serves to insulate the active layer 241 A from a gate electrode 242 A.
- the gate insulation layer 245 A may be formed of a silicon oxide film, a silicon nitride film, or a multilayer film thereof, but the present invention is not limited thereto.
- the gate insulation layer 245 A may be formed of various materials.
- the gate insulation layer 245 A may be formed on an entire front surface of the flexible substrate 210 A including the active layer 241 A. However, the gate insulation layer 245 A may be formed only on the active layer 241 A since the gate insulation layer 245 A serves only to insulate the active layer 241 A from the gate electrode 242 A.
- the gate insulation layer 245 A may be formed on an entire front surface of the flexible substrate 210 A. As shown in FIG. 2A , the gate insulation layer 245 A may also be formed only on the display area DA of the flexible substrate 210 A. In this case, the gate insulation layer 245 A may be formed to have a contact hole configured to open a part of the active layer 241 A, and the contact hole may serve to open parts of source and drain regions of the active layer 241 A.
- the silicon oxide film constituting the gate insulation layer 245 A has poorer flexibility than a metal, but exhibits more excellent flexibility than the silicon nitride film. Therefore, in the flexible organic light emitting display device according to still another exemplary embodiment of the present invention, among the materials constituting the buffer layer 261 A, only the silicon oxide film may be formed on the non-display area NA of the flexible substrate 210 A so as to protect the elements positioned on an upper portion of the non-display area NA of the flexible substrate 210 A from moisture and oxygen penetrating from a lower portion of the non-display area NA of the flexible substrate 210 A.
- the gate electrode 242 A is formed on the gate insulation layer 245 A.
- the gate electrode 242 A overlaps at least a part of the active layer 241 A, particularly, a channel region of the active layer 241 A.
- the gate electrode 242 A may be formed of at least one selected from the group consisting of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and an alloy thereof, but the present invention is not limited thereto.
- the gate electrode 242 A may be formed of various materials.
- the gate electrode 242 A may be composed of multiple layers formed of at least one selected from the group consisting of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and an alloy thereof.
- Mo molybdenum
- Al aluminum
- Cr chromium
- Au gold
- Ti titanium
- Ni nickel
- Nd neodymium
- Cu copper
- the interlayer insulation film 246 A is formed on the gate electrode 242 A.
- the interlayer insulation film 246 A may be formed of the same material as the gate insulation layer 245 A, and may be formed of a silicon oxide film, silicon nitride film, or a multilayer film thereof, but the present invention is not limited thereto.
- the interlayer insulation film 246 A may be formed of various materials.
- the interlayer insulation film 246 A may be formed to have a contact hole configured to open a part of the active layer 241 A, and the contact hole may serve to open parts of source and drain regions of the active layer 241 A.
- the interlayer insulation film 246 A may be formed only on the display area DA of the flexible substrate 210 A as shown in FIG.
- the interlayer insulation film 246 A may be formed on the non-display area NA of the flexible substrate 210 A.
- the source electrode 243 A and the drain electrode 244 A are formed on the interlayer insulation film 246 A.
- the source electrode 243 A and the drain electrode 244 A may be electrically connected respectively to the source and drain regions of the active layer 241 A through the contact hole formed in the interlayer insulation film 246 A and/or gate insulation layer 245 A.
- the source electrode 243 A and the drain electrode 244 A may be formed of at least one selected from the group consisting of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and an alloy thereof, but the present invention is not limited thereto.
- the source electrode 243 A and the drain electrode 244 A may be formed of various materials.
- the source electrode 243 A and the drain electrode 244 A may be composed of multiple layers formed of at least one selected from the group consisting of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and an alloy thereof.
- a passivation film 262 A is formed on the source electrode 243 A and the drain electrode 244 A.
- the passivation film 262 A may be formed to have a contact hole configured to expose the source electrode 243 A or the drain electrode 244 A.
- the passivation film 262 A is a protective layer that may be formed of the same material as the interlayer insulation film 246 A and/or the gate insulation layer 245 A, and may be composed of a single layer or multiple layers formed of at least one selected from the group consisting of a silicon oxide film and a silicon nitride film, but the present invention is not limited thereto.
- the passivation film 262 A may be formed of various materials. FIG.
- the flexible organic light emitting display device 200 A includes the passivation film 262 A, but it is possible to exclude the passivation film 262 A since the passivation film 262 A is not an essentially required configuration.
- the passivation film 262 A may be formed on both the display area DA and the non-display area NA of the flexible substrate 210 A as shown in FIG. 2A , and also be formed on the wires 220 A to protect the wires 220 A from the outside.
- An overcoat layer 264 A may be formed on the source electrode 243 A and the drain electrode 244 A.
- the overcoat layer 264 A may also be referred to as a planarization film.
- the overcoat layer 264 A may be formed on the passivation film 262 A.
- the overcoat layer 264 A serves to planarize an upper surface of the flexible substrate 210 A.
- the overcoat layer 264 A may be formed to have a contact hole configured to expose the source electrode 243 A or the drain electrode 244 A.
- the overcoat layer 264 A may be formed of at least one material selected from the group consisting of an acrylic resin, an epoxy resin, a phenolic resin, a polyamide-based resin, a polyimide-based resin, an unsaturated polyester-based resin, a polyphenylene-based resin, a polyphenylenesulfide-based resin, and benzocyclobutene, but the present invention is not limited thereto.
- the overcoat layer 264 A may be formed of various materials.
- the thin film transistor 240 A includes the active layer 241 A, the gate insulation layer 245 A, the gate electrode 242 A, the interlayer insulation film 246 A, the source electrode 243 A, and the drain electrode 244 A, all of which are formed as described above.
- the thin film transistor 240 A may be formed on every pixel or sub-pixel region of the display area DA of the flexible substrate 210 A, and each pixel or sub-pixel region may be independently driven.
- a configuration of the thin film transistor 240 A is not limited to the exemplary embodiments as described above, and may be widely modified and changed into the known configurations which may be readily practiced by those skilled in the related art.
- the thin film transistor 240 A may be formed on the flexible substrate 210 A to allow an organic light emitting layer 254 A of the organic light emitting diode 250 A to emit light.
- a switching thin film transistor and a driving thin film transistor are used to allow the organic light emitting layer 254 A to emit light using image information of an input data signal according to a scan signal.
- the switching thin film transistor serves to send a data signal from a data wire to a gate electrode of the driving thin film transistor when a scan signal is applied from a gate wire.
- the driving thin film transistor serves to send an electric current, which is transmitted through a power wire by the data signal received from the switching thin film transistor, to an anode, and control light emission of the organic light emitting layer of the corresponding pixels or sub-pixels by the electric current transmitted to the anode.
- the flexible organic light emitting display device 200 A may further include a thin film transistor for compensation circuits, which is designed to prevent abnormal driving of the flexible organic light emitting display device 200 A.
- the thin film transistor having an inverted-staggered structure refers to a thin film transistor having a structure in which a gate electrode is positioned opposite to a source electrode and a drain electrode based on an active layer
- the thin film transistor having a coplanar structure refers to a thin film transistor having a structure in which a gate electrode is positioned on the same plane as a source electrode and a drain electrode based on an active layer.
- the thin film transistor 240 A having a coplanar structure is shown for the sake of convenience of description, but the present invention is not limited thereto.
- the thin film transistor having an inverted-staggered structure may also be used herein.
- the organic light emitting diode 250 A including an anode 251 A, the organic light emitting layer 254 A, and a cathode 255 A is formed on the flexible substrate 210 A.
- the organic light emitting diode 250 A is driven to form an image on a principle that holes provided in the anode 251 A and electrons provided in the cathode 255 A are combined at the organic light emitting layer 254 A to emit light.
- the flexible organic light emitting display device 200 A is an independent drive display device which is driven per each sub-pixel region of the display area DA. Therefore, the thin film transistor 240 A and the organic light emitting diode 250 A as described above may be disposed on each sub-pixel region of the display area DA to allow the thin film transistor 240 A disposed on each sub-pixel region to independently drive the organic light emitting diode 250 A.
- the anode 251 A is formed on the overcoat layer 264 A.
- the anode 251 A may also be referred to as a positive pole, a pixel electrode, or a first electrode.
- the anode 251 A may be formed separately on each sub-pixel region of the display area DA.
- the anode 251 A may be connected to the source electrode 243 A of the thin film transistor 240 A via the contact hole formed in the overcoat layer 264 A. In this specification, under the assumption that the thin film transistor 240 A is an N-type thin film transistor, it is described that the anode 251 A is connected to the source electrode 243 A.
- the anode 251 A may also be connected to the drain electrode 244 A.
- the anode 251 A may come in direct contact with the organic light emitting layer 254 A, or may be in contact and electrically connected to the organic light emitting layer 254 A with a conductive material positioned therebetween.
- the anode 251 A is formed of a conductive material having a high work function since the anode 251 A should provide holes.
- the anode 251 A may include a transparent conductive layer 253 A having a high work function, and the transparent conductive layer 253 A may be formed of a transparent conductive oxide (TCO), for example, indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO), zinc oxide, or tin oxide.
- TCO transparent conductive oxide
- the anode 251 A when the flexible organic light emitting display device 200 A is an organic light emitting display device with a top emission mode, the anode 251 A includes a reflective layer 252 A formed under the transparent conductive layer 253 A.
- the organic light emitting layer 254 A emits light in all directions. However, in the case of the organic light emitting display device with a top emission mode, light emitted from the organic light emitting layer 254 A should be radiated from an upper portion of the organic light emitting display device.
- the anode 251 A when the anode 251 A is composed only of the transparent conductive layer 253 A as described above, the light emitted from the organic light emitting layer 254 A toward the anode 251 A is reflected upward on the other elements positioned below the anode 251 A, but may be lost as the light radiates downward to the flexible substrate 210 A. In this case, optical efficiency of the organic light emitting display device may be lowered. Therefore, the anode 251 A may include a separate low-resistive reflective layer 252 A so as to radiate the light emitted from the organic light emitting layer 254 A toward the anode 251 A from an upper portion of the organic light emitting display device.
- the reflective layer 252 A may be formed of a conductive layer having excellent reflexibility, for example, silver (Ag), nickel (Ni), gold (Au), platinum (Pt), aluminum (Al), copper (Cu), or molybdenum/aluminum neodymium (Mo/AlNd).
- the anode 251 A includes the transparent conductive layer 253 A and the reflective layer 252 A, but it may also be defined that the anode 251 A is composed only of the transparent conductive layer 253 A and the reflective layer 252 A has a separate configuration.
- the anode 251 A is composed of a reflective metal layer and a transparent conductive material having a high work function.
- the anode 251 A itself may be formed of a conductive material having a high work function and exhibiting excellent reflexibility.
- the anode 251 A may be formed of only a transparent conductive material having a high work function, or may also be formed of the transparent conductive material having a high work function together with a semi-transmissive metal layer positioned under the transparent conductive material so as to embody microcavities.
- the transparent conductive layer 253 A may be electrically connected to the source electrode 243 A.
- the reflective layer 252 A is formed on the overcoat layer 264 A, and a contact hole is formed in the overcoat layer 264 A to electrically connect the transparent conductive layer 253 A with the drain electrode 244 A.
- FIG. 2A shows that the transparent conductive layer 253 A is electrically connected to the source electrode 243 A.
- the reflective layer 252 A may be electrically connected to the source electrode 243 A via the contact hole formed in the overcoat layer 264 A, and the transparent conductive layer 253 A may be formed on the reflective layer 252 A to be electrically connected to the source electrode 243 A through the reflective layer 252 A.
- a bank layer 265 A is formed on the anode 251 A and the overcoat layer 264 A.
- the bank layer 265 A serves to distinguish adjacent sub-pixel regions from each other so that the bank layer 265 A can be disposed between the adjacent sub-pixel regions.
- the bank layer 265 A may be formed to open a part of the anode 251 A.
- the bank layer 265 A may be formed of an organic insulation material, for example, one material selected from the group consisting of polyimide, photoacryl, and benzocyclobutene (BCB).
- the bank layer 265 A may be formed in a tapered shape. When the bank layer 265 A is formed in a tapered shape, the bank layer 265 A may be formed using a positive-type photoresist.
- the bank layer 265 A may be formed with a predetermined thickness so as to distinguish the adjacent sub-pixel regions from each other.
- the flexible organic light emitting display device 200 A uses a method of forming an organic light emitting layer that autonomously emits red, green, and blue lights on every sub-pixel region, and a method of forming an organic light emitting layer emitting a white light on all sub-pixel regions and simultaneously applying color filters.
- an organic light emitting layer emitting one of red, green, and blue lights may be formed on the anode formed on each of a red sub-pixel region, a green sub-pixel region, and a blue sub-pixel region, all of which are opened by the bank layer.
- the organic light emitting layers formed on the red sub-pixel region, the green sub-pixel region, and the blue sub-pixel region may be separated.
- a white organic light emitting layer may be formed on the anode formed on each of the red sub-pixel region, the green sub-pixel region, and the blue sub-pixel region, all of which are opened by the bank layer.
- the organic light emitting layers formed on the red sub-pixel region, the green sub-pixel region, and the blue sub-pixel region may be connected to or separated from each other.
- the flexible organic light emitting display device 200 A manufactured using the organic light emitting layer 254 A autonomously emitting the red, green, and blue lights from each of the sub-pixel regions is shown in FIG. 2A . It is also shown that the organic light emitting layers 254 A of the respective sub-pixel regions are not connected to each other, but the present invention is not limited thereto.
- the cathode 255 A is formed on the organic light emitting layer 254 A.
- the cathode 255 A may also be referred to as a negative pole, a common electrode, or a second electrode.
- the cathode 255 A may be connected to a separate voltage wire 220 A to apply the same level of voltage to all the sub-pixel regions of the display area DA.
- the cathode 255 A Since the cathode 255 A should provide electrons, the cathode 255 A is formed of a material having high electric conductivity and a low work function, that is, a material for cathodes. Specific materials constituting the cathode 255 A may be differently selected according to an emission mode of the organic light emitting display device. As shown in FIG. 2A , when the flexible organic light emitting display device 200 A is an organic light emitting display device with a top emission mode, the cathode 255 A may be formed of a metallic material having a very small thickness and a low work function.
- the cathode 255 A when the cathode 255 A is formed of a metallic material having a low work function, a metallic material such as silver (Ag), titanium (Ti), aluminum (Al), molybdenum (Mo), or an alloy of silver (Ag) with magnesium (Mg) may be formed into a thin film having a thickness of several hundreds of ⁇ or less, for example, 200 ⁇ or less so as to form the cathode 255 A. In this case, the cathode 255 A becomes a substantially semi-transmissive layer and then is used as a substantially transparent cathode.
- a metallic material such as silver (Ag), titanium (Ti), aluminum (Al), molybdenum (Mo), or an alloy of silver (Ag) with magnesium (Mg) may be formed into a thin film having a thickness of several hundreds of ⁇ or less, for example, 200 ⁇ or less so as to form the cathode 255 A.
- the cathode 255 A becomes
- the cathode 255 A has such a thickness that the cathode 255 A can become transparent at a certain point of time as the cathode 255 A gets thinner to a thickness equal to or less than a predetermined thickness (for example, 200 ⁇ ).
- the cathode 255 A having such a thickness may be referred to as a substantially transparent cathode.
- carbon nanotube and graphene coming into the spotlight as new materials may also be used as the material for cathodes.
- an encapsulation unit 270 A is formed on the organic light emitting diode 250 A including the cathode 255 A.
- the encapsulation unit 270 A may serve to protect internal elements, such as a thin film transistor 240 A and an organic light emitting diode 250 A, of the flexible organic light emitting display device 200 A from moisture, air, and impact provided from the outside.
- the encapsulation unit 270 A may be formed on a display area DA of the flexible organic light emitting display device 200 A to protect the internal elements of the flexible organic light emitting display device 200 A.
- the encapsulation unit 270 A may have various configurations according to a method of sealing the internal elements, such as a thin film transistor 240 A and an organic light emitting diode 250 A, of the flexible organic light emitting display device 200 A.
- the method of sealing the flexible organic light emitting display device 200 A includes methods such as metal can encapsulation, glass can encapsulation, thin film encapsulation (TFE), and face sealing.
- a pad portion 266 A is formed on the flexible substrate 210 A.
- the pad portion 266 A may be formed on the display area DA of the flexible substrate 210 A.
- FIG. 2A shows that the pad portion 266 A is formed on the gate insulation layer 245 A in the display area DA of the flexible substrate 210 A, but the present invention is not limited thereto.
- the pad portion 266 A may be formed on the flexible substrate 210 A or the buffer layer 261 A.
- the pad portion 266 A shown in FIG. 2A is configured to connect the gate wire 220 A with a gate driver IC configured to apply a gate signal to the gate wire 220 A, and is formed on the same plane as the gate electrode 242 A and made of the same material as the gate electrode 242 A.
- the pad portion 266 A may be formed on the same plane as the source electrode 243 A and the drain electrode 244 A and made of the same material as that of the source electrode 243 A and the drain electrode 244 A.
- the wires 220 A may electrically connect the pad portion 266 A formed on the display area DA of the flexible substrate 210 A with a drive circuit unit, a gate driver IC, or a data driver IC to send a signal.
- a plurality of first wire patterns 221 A may be formed of the same material as one of the gate electrode 242 A, the source electrode 243 A, the drain electrode 244 A, and the reflective layer 252 A, and the second wire pattern 222 A may be formed of the same material as the other one of the source electrode 243 A, the drain electrode 244 A, the reflective layer 252 A and the cathode 255 A, which is different from the material of the first wire pattern 221 A.
- the second wire pattern 222 A is formed of the same material as “the other one” of the source electrode 243 A, the drain electrode 244 A, the reflective layer 252 A, and the cathode 255 A encompasses that the second wire pattern 222 A is formed of the same material as an element different from another element of the display unit 230 A formed of the same material as the plurality of first wire patterns 221 A. Since the second wire pattern 222 A is formed on the plurality of first wire patterns 221 A in the non-display area NA of the flexible substrate 210 A, the plurality of first wire patterns 221 A is first formed, and the second wire pattern 222 A is then formed according to the sequence of manufacturing processes.
- the element of the display unit 230 A formed of the same material as the second wire pattern 222 A is formed on the element of the display unit 230 A formed of the same material as the plurality of first wire patterns 221 A
- the element of the display unit 230 A formed of the same material as the second wire pattern 222 A is formed on the element of the display unit 230 A formed of the same material as the plurality of first wire patterns 221 A according to the sequence of manufacturing processes.
- FIG. 2A shows that the plurality of first wire patterns 221 A are formed of the same material as the gate electrode 242 A, and the second wire pattern 222 A is formed of the same material as the source electrode 243 A and the drain electrode 244 A, but the present invention is not limited thereto.
- the second wire pattern 222 A may be formed of the same material as the reflective layer 252 A or the cathode 255 A having a configuration different from the configuration of the display unit 230 A formed of the same material as the first wire pattern 221 A.
- the first wire pattern 221 A may be formed of a metal which is not etched upon etching an inorganic film.
- the first wire pattern 221 A formed of the same material as the gate electrode 242 A may be formed on the flexible substrate 210 A
- the interlayer insulation film 246 A may be formed on a front surface of the flexible substrate 210 A
- the interlayer insulation film 246 A formed on the first wire pattern 221 A in which it is unnecessary to dispose the interlayer insulation film 246 A may be etched.
- an etchant is used to etch the inorganic film upon etching the interlayer insulation film 246 A.
- the first wire pattern 221 A when the first wire pattern 221 A is etched by an etchant for etching an inorganic film, the first wire pattern 221 A may be damaged.
- the first wire pattern 221 A may be formed of a metal which is not etched upon etching an inorganic film.
- the third wire pattern 223 A may come in contact with the second wire pattern 222 A, and may be formed integrally with the second wire pattern 222 A. Therefore, the third wire pattern 223 A may be formed of the same material as the second wire pattern 222 A.
- FIG. 2A shows that the flexible organic light emitting display device 200 A is an organic light emitting display device with a top emission mode.
- the plurality of first wire patterns 221 A may be formed of the same material as one of the gate electrode 242 A, the source electrode 243 A, the drain electrode 244 A, and the semi-transmissive metal layer
- the second wire pattern 222 A may be formed of the same material as the other one of the source electrode 243 A, the drain electrode 244 A, the semi-transmissive metal layer, and the cathode 255 A, which is different from the material of the plurality of first wire patterns 221 A.
- a separation layer may be formed between the plurality of first wire patterns 221 A and the second wire pattern 222 A.
- the separation layer may be formed of an insulation material, and may also be formed of the same material as one of the insulation material used to form the display unit 230 A.
- the plurality of first wire patterns 221 A is formed of the same material as the gate electrode 242 A
- the second wire pattern 222 A is formed of the same material as the source electrode 243 A and the drain electrode 244 A, as shown in FIG.
- the separation layer may be formed of an insulation material formed between the gate electrode 242 A and the source electrode 243 A and drain electrode 244 A in the display unit 230 A, and may also be formed of the same material as one of the gate insulation layer 245 A and the interlayer insulation film 246 A.
- the separation layer may include a contact hole configured to open a part of the first wire pattern 221 A, and the second wire pattern 222 A may be formed on the separation layer to come in contact with the plurality of first wire patterns 221 A through the contact hole formed in the separation layer.
- FIG. 2B is a cross-sectional view showing an unbent state of the flexible organic light emitting display device according to another exemplary embodiment of the present invention.
- a flexible organic light emitting display device 200 B includes a flexible substrate 210 B, a wire 220 B, and a display unit 230 B.
- the flexible substrate 210 B and the display unit 230 B are substantially identical to the flexible substrate 210 A and the display unit 230 A shown in FIG. 2A , and thus repeated description of the flexible substrate 210 B and the display unit 230 B is omitted for brevity.
- a plurality of first wire patterns 221 B may be formed of the same material as one of a gate electrode 242 B, a source electrode 243 B, a drain electrode 244 B, and a reflective layer 252 B, and a second wire pattern 222 B may be formed of the same material as the other one of the source electrode 243 B, the drain electrode 244 B, the reflective layer 252 B, and the cathode 255 B, which is different from the material of the plurality of first wire patterns 221 B.
- FIG. 2B shows that the plurality of first wire patterns 221 B are formed of the same material as the source electrode 243 B and the drain electrode 244 B, and the second wire pattern 222 B is formed of the same material as the reflective layer 252 B, but the present invention is not limited thereto.
- the second wire pattern 222 B may be formed of the same material as the cathode 255 B.
- the plurality of first wire patterns 221 B may also be formed of the same material as the reflective layer 252 B, and the second wire pattern 222 B may be formed of the same material as the cathode 255 B.
- the third wire pattern 223 B may come in contact with the second wire pattern 222 B, and may be formed integrally with the second wire pattern 222 B. Therefore, the third wire pattern 223 B may be formed of the same material as the second wire pattern 222 B.
- the wire 220 B is substantially identical to the wire 220 A shown in FIG. 2A except for the constituent materials of the wire 220 B, and thus repeated description of the wire 220 B is omitted for brevity.
- FIG. 2C is a cross-sectional view showing an unbent state of the flexible organic light emitting display device according to still another exemplary embodiment of the present invention.
- a flexible organic light emitting display device 200 C includes a flexible substrate 210 C, a wire 220 C, a display unit 230 C, and an organic film 269 C.
- the flexible substrate 210 C, the wire 220 C, and the display unit 230 C are substantially identical to the flexible substrate 210 A, the wire 220 A, and the display unit 230 A shown in FIG. 2A , and thus repeated description of the flexible substrate 210 C, the wire 220 C, and the display unit 230 C is omitted for brevity.
- the organic film 269 C may be formed on the wire 220 C.
- a tensile force is applied to the wire 220 C formed on the flexible substrate 210 C. Accordingly, in the flexible organic light emitting display device 200 C according to still another exemplary embodiment of the present invention, the organic film 269 C is formed on the wire 220 C of the flexible substrate 210 C.
- the organic film 269 C may have the same thickness as the flexible substrate 210 C, or the organic film 269 C may have a greater thickness than the flexible substrate 210 C.
- the organic film 269 C may be formed around the boundary between the display area DA and the non-display area NA of the flexible substrate 210 C, that is, formed only at an area in which the flexible substrate 210 C is bent, but the present invention is not limited thereto.
- the organic film 269 C may be formed on the entire non-display area NA of the flexible substrate 210 C.
- FIG. 2D is an enlarged diagram of an area X shown in FIG. 2A according to another exemplary embodiment of the present invention.
- a crack prevention layer 280 D may be disposed on top and bottom surfaces of a wire 220 D. More particularly, the crack prevention layer 280 D may be disposed between the wire 220 D and a substrate or an insulation layer formed under the wire 220 D in the non-display area NA of the flexible substrate 210 D, or between the wire 220 D and the insulation layer formed under the wire 220 D in the non-display area NA of the flexible substrate 210 D.
- FIG. 1 For the sake of convenience of description, FIG.
- FIG. 2D shows that a buffer layer 261 D is formed as an insulation layer between the wire 220 D and the flexible substrate 210 D, and a passivation film 262 D is formed on a top surface of the wire 220 D, but the present invention is not limited thereto.
- various insulation layers may be formed on the wire 220 D.
- FIG. 2D shows that the prevention layers 280 D are disposed on both the top and bottom surfaces of the wire 220 D, but the present invention is not limited thereto.
- the crack prevention layer 280 D may also be formed on one of the top and bottom surfaces of the wire 220 D.
- the crack prevention layer 280 D may include a crack preventing material 281 D such as a porous material or nanoparticles.
- the crack prevention layer 280 D may have an interlayer structure in which the porous material or nanoparticles are dispersed in a packing layer made of an insulation material.
- the crack prevention layer 280 D may be formed with an interlayer structure including a silica gel.
- the crack prevention layer 280 D may be formed with an interlayer structure including various nanoparticles such as silver (Ag).
- the crack prevention layer 280 D is formed with an interlayer structure in which the porous material or nanoparticles are dispersed in the packing layer made of the insulation material.
- the crack prevention layer 280 D may include only the nanoparticles, and may be formed with a structure in which the nanoparticles are dispersed between the wire 220 D and the insulation layer.
- the crack prevention layer 280 D including the porous material or nanoparticles may be disposed on the top surface and/or the bottom surface of the wire 220 D to allow the crack prevention layer 280 D to absorb stress transferred from an upper or lower portion of the crack prevention layer 280 D. Also, when the elements positioned on or under the crack prevention layer 280 D are cracked, a crack direction is changed to different directions other than a direction perpendicular to the wire 220 D to prevent the wire 220 D from being cracked by cracks caused at the other elements.
- FIG. 3 is a flowchart illustrating a method of manufacturing a flexible organic light emitting display device according to one exemplary embodiment of the present invention.
- a flexible substrate including a display area and a non-display area is prepared (S 30 ).
- Preparation of the flexible substrate is substantially identical to preparation of the flexible substrate shown in FIGS. 1A to 2D , and thus repeated description of the preparation of the flexible substrate is omitted for brevity.
- a display unit including an organic light emitting diode and a thin film transistor is formed on a display area of the flexible substrate (S 31 ). Formation of the display unit is substantially identical to formation of the display unit shown in FIGS. 1A to 2D , and thus repeated description of the formation of the display unit is omitted for brevity.
- the forming of the display unit may include forming a wire electrically connected with the display unit on the display area and a non-display area of the flexible substrate. Since the wire is formed of the same material as one of the conductive materials used to form the display unit, the wire may be formed together with a process of forming a display unit.
- the wires positioned on at least a part of the non-display area of the flexible substrate may include a plurality of discontinuously formed first wire patterns, and a second wire pattern formed on the plurality of first wire patterns and electrically connected with the plurality of first wire patterns.
- the wire formed on at least a part of the non-display area of the flexible substrate may include a portion formed in at least one shape selected from the group consisting of a chopping wave shape, a sawtooth wave shape, a square wave shape, a sine wave shape, an omega ( ⁇ ) shape, a trapezoidal wave shape, and a lozenge shape, and may also include a wire portion formed in an oblique direction. Formation of the wire is substantially identical to formation of the wire shown in FIGS. 1A to 2D , and thus repeated description of the formation of the wire is omitted for brevity.
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Applications Claiming Priority (2)
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Also Published As
Publication number | Publication date |
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WO2014119850A1 (en) | 2014-08-07 |
EP2951870A4 (de) | 2016-10-05 |
CN105144418A (zh) | 2015-12-09 |
KR102222680B1 (ko) | 2021-03-03 |
EP2951870A1 (de) | 2015-12-09 |
US20140217397A1 (en) | 2014-08-07 |
KR20140099139A (ko) | 2014-08-11 |
CN105144418B (zh) | 2017-07-04 |
EP2951870B1 (de) | 2021-03-24 |
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