TWI437690B - 半導體裝置 - Google Patents

半導體裝置 Download PDF

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Publication number
TWI437690B
TWI437690B TW100112417A TW100112417A TWI437690B TW I437690 B TWI437690 B TW I437690B TW 100112417 A TW100112417 A TW 100112417A TW 100112417 A TW100112417 A TW 100112417A TW I437690 B TWI437690 B TW I437690B
Authority
TW
Taiwan
Prior art keywords
region
conductivity type
semiconductor device
main surface
diode
Prior art date
Application number
TW100112417A
Other languages
English (en)
Chinese (zh)
Other versions
TW201208039A (en
Inventor
中村勝光
Original Assignee
三菱電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三菱電機股份有限公司 filed Critical 三菱電機股份有限公司
Publication of TW201208039A publication Critical patent/TW201208039A/zh
Application granted granted Critical
Publication of TWI437690B publication Critical patent/TWI437690B/zh

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • H01L23/3171Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • H10D30/665Vertical DMOS [VDMOS] FETs having edge termination structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165Reinforcing structures
    • H01L2224/02166Collar structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Semiconductor Integrated Circuits (AREA)
TW100112417A 2010-05-26 2011-04-11 半導體裝置 TWI437690B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010120180 2010-05-26
JP2011021828A JP5925991B2 (ja) 2010-05-26 2011-02-03 半導体装置

Publications (2)

Publication Number Publication Date
TW201208039A TW201208039A (en) 2012-02-16
TWI437690B true TWI437690B (zh) 2014-05-11

Family

ID=44924873

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100112417A TWI437690B (zh) 2010-05-26 2011-04-11 半導體裝置

Country Status (6)

Country Link
US (1) US8686469B2 (enExample)
JP (1) JP5925991B2 (enExample)
KR (2) KR101298677B1 (enExample)
CN (2) CN102280493B (enExample)
DE (1) DE102011076243B4 (enExample)
TW (1) TWI437690B (enExample)

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CN102687277B (zh) 2009-11-02 2016-01-20 富士电机株式会社 半导体器件以及用于制造半导体器件的方法
DE112012005981B4 (de) * 2012-03-05 2025-04-30 Mitsubishi Electric Corporation Halbleitervorrichtungen
DE112012006215B4 (de) 2012-04-13 2020-09-10 Mitsubishi Electric Corp. Diode
JPWO2014054121A1 (ja) 2012-10-02 2016-08-25 三菱電機株式会社 半導体装置
WO2014156849A1 (ja) * 2013-03-25 2014-10-02 富士電機株式会社 半導体装置
US9257511B2 (en) * 2013-03-26 2016-02-09 Infineon Technologies Ag Silicon carbide device and a method for forming a silicon carbide device
JP6108451B2 (ja) * 2013-04-05 2017-04-05 ラピスセミコンダクタ株式会社 半導体装置およびその製造方法
CN103208531B (zh) * 2013-04-07 2015-07-15 株洲南车时代电气股份有限公司 一种快恢复二极管frd芯片及其制作方法
CN107768427A (zh) * 2013-06-12 2018-03-06 三菱电机株式会社 半导体装置
KR101764075B1 (ko) * 2013-07-08 2017-08-01 미쓰비시덴키 가부시키가이샤 반도체 장치
TWI614898B (zh) * 2013-12-06 2018-02-11 Diodes Taiwan S.A.R.L. 終止區結構及其製造方法
WO2015114748A1 (ja) * 2014-01-29 2015-08-06 三菱電機株式会社 電力用半導体装置
DE112014006289B4 (de) 2014-01-29 2020-12-24 Mitsubishi Electric Corporation Leistungshalbleitervorrichtung
JP6190740B2 (ja) * 2014-03-11 2017-08-30 新電元工業株式会社 半導体装置及び半導体装置の製造方法
DE102014005879B4 (de) * 2014-04-16 2021-12-16 Infineon Technologies Ag Vertikale Halbleitervorrichtung
DE102014212455B4 (de) * 2014-06-27 2024-07-04 Robert Bosch Gmbh Diode mit einem plattenförmigen Halbleiterelement
JP2016029685A (ja) * 2014-07-25 2016-03-03 株式会社東芝 半導体装置
JP2016100455A (ja) * 2014-11-21 2016-05-30 三菱電機株式会社 半導体装置及びその製造方法
WO2016120999A1 (ja) * 2015-01-27 2016-08-04 三菱電機株式会社 半導体装置
WO2016129041A1 (ja) * 2015-02-09 2016-08-18 三菱電機株式会社 半導体装置
US9576791B2 (en) * 2015-06-01 2017-02-21 GM Global Technology Operations LLC Semiconductor devices including semiconductor structures and methods of fabricating the same
JP6611532B2 (ja) * 2015-09-17 2019-11-27 ローム株式会社 半導体装置および半導体装置の製造方法
JP6662393B2 (ja) 2015-12-28 2020-03-11 三菱電機株式会社 半導体装置、半導体装置の製造方法
JP6846119B2 (ja) * 2016-05-02 2021-03-24 株式会社 日立パワーデバイス ダイオード、およびそれを用いた電力変換装置
JP6820738B2 (ja) 2016-12-27 2021-01-27 三菱電機株式会社 半導体装置、電力変換装置および半導体装置の製造方法
JP6854654B2 (ja) * 2017-01-26 2021-04-07 ローム株式会社 半導体装置
JP6815285B2 (ja) * 2017-06-26 2021-01-20 株式会社東芝 半導体装置
US10361276B1 (en) * 2018-03-17 2019-07-23 Littelfuse, Inc. Embedded field plate field effect transistor
JP6558462B2 (ja) * 2018-03-22 2019-08-14 三菱電機株式会社 半導体装置
JP7052476B2 (ja) * 2018-03-27 2022-04-12 三菱電機株式会社 半導体装置
JP7030637B2 (ja) * 2018-07-23 2022-03-07 三菱電機株式会社 半導体装置の製造方法
JP6964566B2 (ja) 2018-08-17 2021-11-10 三菱電機株式会社 半導体装置およびその製造方法
JP7233256B2 (ja) * 2019-03-12 2023-03-06 三菱電機株式会社 半導体装置及び半導体装置の製造方法
US12477773B2 (en) 2020-09-17 2025-11-18 Rohm Co., Ltd. Semiconductor device including terminal electrodes
JP7580245B2 (ja) 2020-11-02 2024-11-11 三菱電機株式会社 半導体装置および半導体装置の製造方法
US20220140132A1 (en) * 2020-11-04 2022-05-05 Cree, Inc. Passivation structures for semiconductor devices
CN114582864A (zh) * 2020-11-30 2022-06-03 华为技术有限公司 一种功率半导体器件及电子设备
JP7487094B2 (ja) * 2020-12-23 2024-05-20 株式会社 日立パワーデバイス 半導体装置
DE102021000610A1 (de) * 2021-02-08 2022-08-11 3-5 Power Electronics GmbH Stapelförmige III-V-Halbleiterdiode
CN113451137A (zh) * 2021-06-29 2021-09-28 深圳铨力半导体有限公司 晶体管制造方法、设备、计算机可读存储介质与程序产品
JP7504066B2 (ja) * 2021-08-17 2024-06-21 三菱電機株式会社 炭化珪素半導体装置および電力変換装置
JP7558134B2 (ja) * 2021-10-13 2024-09-30 三菱電機株式会社 半導体装置および半導体装置の製造方法
US12363961B2 (en) * 2021-11-15 2025-07-15 Infineon Technologies Ag Semiconductor device
JP7692341B2 (ja) * 2021-12-16 2025-06-13 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP7692875B2 (ja) * 2022-05-16 2025-06-16 三菱電機株式会社 パワー半導体装置およびパワー半導体装置の製造方法
DE102022124385A1 (de) 2022-09-22 2024-03-28 Infineon Technologies Ag Feldeffekttransistor mit randabschlussbereich

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JP3321185B2 (ja) * 1990-09-28 2002-09-03 株式会社東芝 高耐圧半導体装置
JPH05152574A (ja) * 1991-11-29 1993-06-18 Fuji Electric Co Ltd 半導体装置
JPH0936388A (ja) * 1995-07-20 1997-02-07 Mitsubishi Electric Corp 半導体装置
JP3444081B2 (ja) * 1996-02-28 2003-09-08 株式会社日立製作所 ダイオード及び電力変換装置
JP2005057235A (ja) 2003-07-24 2005-03-03 Mitsubishi Electric Corp 絶縁ゲート型バイポーラトランジスタ及びその製造方法、並びに、インバータ回路
US7259440B2 (en) * 2004-03-30 2007-08-21 Ixys Corporation Fast switching diode with low leakage current
JP2006210667A (ja) 2005-01-28 2006-08-10 Mitsubishi Electric Corp 半導体装置
DE102005053487B4 (de) 2005-11-09 2011-06-09 Infineon Technologies Ag Leistungs-IGBT mit erhöhter Robustheit
DE102006025958B3 (de) 2006-06-02 2007-10-11 Infineon Technologies Ag Sanft schaltendes Halbleiterbauelement mit hoher Robustheit und geringen Schaltverlusten
JP4857948B2 (ja) * 2006-06-26 2012-01-18 株式会社デンソー 半導体装置の製造方法
JP2008091705A (ja) * 2006-10-03 2008-04-17 Mitsubishi Electric Corp 半導体装置及びその製造方法
JP5206541B2 (ja) * 2008-04-01 2013-06-12 株式会社デンソー 半導体装置およびその製造方法
JP4743447B2 (ja) * 2008-05-23 2011-08-10 三菱電機株式会社 半導体装置
JP5003598B2 (ja) * 2008-06-05 2012-08-15 富士電機株式会社 半導体装置
JP5381420B2 (ja) * 2008-07-22 2014-01-08 富士電機株式会社 半導体装置
JP2010283132A (ja) 2009-06-04 2010-12-16 Mitsubishi Electric Corp 半導体装置
WO2011027474A1 (ja) 2009-09-07 2011-03-10 トヨタ自動車株式会社 ダイオード領域とigbt領域を有する半導体基板を備える半導体装置

Also Published As

Publication number Publication date
KR101384246B1 (ko) 2014-04-11
US8686469B2 (en) 2014-04-01
DE102011076243A1 (de) 2011-12-01
TW201208039A (en) 2012-02-16
DE102011076243B4 (de) 2015-08-27
KR20130083867A (ko) 2013-07-23
CN102280493B (zh) 2014-02-05
CN103633148A (zh) 2014-03-12
KR20110129817A (ko) 2011-12-02
JP2012009811A (ja) 2012-01-12
CN102280493A (zh) 2011-12-14
JP5925991B2 (ja) 2016-05-25
CN103633148B (zh) 2017-12-08
KR101298677B1 (ko) 2013-08-21
US20110291223A1 (en) 2011-12-01

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