TWI330549B - Cleaning apparatus for slit nozzle - Google Patents

Cleaning apparatus for slit nozzle Download PDF

Info

Publication number
TWI330549B
TWI330549B TW094109435A TW94109435A TWI330549B TW I330549 B TWI330549 B TW I330549B TW 094109435 A TW094109435 A TW 094109435A TW 94109435 A TW94109435 A TW 94109435A TW I330549 B TWI330549 B TW I330549B
Authority
TW
Taiwan
Prior art keywords
nozzle
slit
cleaning liquid
cleaning device
wiping member
Prior art date
Application number
TW094109435A
Other languages
English (en)
Chinese (zh)
Other versions
TW200536615A (en
Inventor
Kazunobu Yamaguchi
Shinji Takase
Hirotsugu Kumazawa
Kazuki Fukutome
Yuki Yamamoto
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd, Tazmo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200536615A publication Critical patent/TW200536615A/zh
Application granted granted Critical
Publication of TWI330549B publication Critical patent/TWI330549B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B05B15/555—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids discharged by cleaning nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Landscapes

  • Coating Apparatus (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW094109435A 2004-03-25 2005-03-25 Cleaning apparatus for slit nozzle TWI330549B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004089253A JP4489480B2 (ja) 2004-03-25 2004-03-25 スリットノズル洗浄装置

Publications (2)

Publication Number Publication Date
TW200536615A TW200536615A (en) 2005-11-16
TWI330549B true TWI330549B (en) 2010-09-21

Family

ID=35171056

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094109435A TWI330549B (en) 2004-03-25 2005-03-25 Cleaning apparatus for slit nozzle

Country Status (3)

Country Link
JP (1) JP4489480B2 (ja)
KR (2) KR101121122B1 (ja)
TW (1) TWI330549B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI405624B (zh) * 2011-03-07 2013-08-21 Toray Eng Co Ltd Cleaning method and cleaning device for cleaning member and coater, and manufacturing method of display member
TWI559994B (ja) * 2012-06-20 2016-12-01 Toray Eng Co Ltd

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100688142B1 (ko) * 2006-05-02 2007-03-02 주식회사 케이씨텍 노즐 세정장치 및 방법
JP4808147B2 (ja) * 2006-12-15 2011-11-02 中外炉工業株式会社 塗布用ダイの清掃装置
TWI309990B (en) 2007-01-26 2009-05-21 Au Optronics Corp Wiping structure of nozzle cleaner
KR100865444B1 (ko) 2007-04-16 2008-10-28 동부일렉트로닉스 주식회사 반도체 에칭 장비의 노즐 세정 장치
KR101346911B1 (ko) * 2007-05-11 2013-12-31 주식회사 케이씨텍 슬릿코터의 노즐 세정장치
KR100863220B1 (ko) * 2007-05-14 2008-10-13 주식회사 케이씨텍 슬릿 노즐의 비드형성장치 및 비드형성방법
JP4857193B2 (ja) * 2007-05-28 2012-01-18 大日本スクリーン製造株式会社 ノズル洗浄装置
JP5518284B2 (ja) * 2007-07-12 2014-06-11 東京応化工業株式会社 ノズル洗浄装置、ノズル洗浄方法、塗布装置及び塗布方法
KR100893670B1 (ko) * 2007-08-10 2009-04-20 주식회사 케이씨텍 노즐 세정장치 및 세정방법
KR200460668Y1 (ko) * 2007-11-30 2012-06-13 주식회사 케이씨텍 노즐 세정장치
JP5352080B2 (ja) * 2007-12-05 2013-11-27 東京応化工業株式会社 ノズル洗浄装置、ノズル洗浄方法、塗布装置及び塗布方法
KR100936735B1 (ko) * 2008-01-08 2010-01-14 김지완 해상구조물의 기둥 도장작업대
KR100989926B1 (ko) * 2008-07-09 2010-10-26 (주)티에스티아이테크 인쇄노즐의 세정장치
JP5697386B2 (ja) * 2010-09-14 2015-04-08 芝浦メカトロニクス株式会社 基板の処理装置及び流体ナイフ
JP5766990B2 (ja) * 2011-03-23 2015-08-19 東レエンジニアリング株式会社 塗布装置
JP5771432B2 (ja) 2011-04-13 2015-08-26 東京応化工業株式会社 塗布装置
JP5841449B2 (ja) * 2012-02-10 2016-01-13 東京エレクトロン株式会社 拭き取りパッド及びこのパッドを用いたノズルメンテナンス装置並びに塗布処理装置
CN103837218B (zh) * 2012-11-22 2016-05-18 万润科技股份有限公司 胶滴量测方法及装置
TWI567368B (zh) * 2012-11-22 2017-01-21 All Ring Tech Co Ltd Method and device for measuring ink droplets
CN103286030B (zh) * 2013-06-28 2016-08-31 深圳市华星光电技术有限公司 一种狭缝喷嘴清洁装置
JP2015060932A (ja) * 2013-09-18 2015-03-30 株式会社東芝 スパイラル塗布装置
KR102157838B1 (ko) * 2013-12-03 2020-09-18 세메스 주식회사 노즐 유닛, 기판 처리 장치, 그리고 노즐 세정 방법
KR20150075368A (ko) * 2013-12-25 2015-07-03 시바우라 메카트로닉스 가부시끼가이샤 접착제 도포 장치, 접착제 도포 부재의 클리닝 방법 및 표시 패널 제조 장치, 표시 패널의 제조 방법
JP6251062B2 (ja) * 2014-01-30 2017-12-20 タツモ株式会社 スリットノズル洗浄装置及びワーク用塗布装置
KR102232667B1 (ko) * 2014-06-12 2021-03-30 세메스 주식회사 기판 처리 장치
JP6465489B2 (ja) * 2015-10-23 2019-02-06 ヒューグル開発株式会社 クリーニングヘッドおよび清掃方法
CN106733358B (zh) * 2017-02-06 2019-10-01 京东方科技集团股份有限公司 喷嘴清洁装置及涂布液涂布设备
JP6845077B2 (ja) * 2017-05-11 2021-03-17 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置、塗布方法およびノズル
CN107224879A (zh) * 2017-06-30 2017-10-03 河南新投环保科技股份有限公司 一种平板膜擦洗装置
CN107450286B (zh) * 2017-08-07 2021-06-01 Tcl华星光电技术有限公司 涂布口金刮拭擦及光阻刮拭装置
CN107694811B (zh) * 2017-09-25 2019-08-20 武汉华星光电技术有限公司 清洁装置
CN107899822B (zh) * 2017-12-10 2020-06-30 天长市金陵电子有限责任公司 一种用于静电喷涂设备中的清洁装置
CN107961931B (zh) * 2017-12-29 2019-06-04 信利（惠州）智能显示有限公司 清洁装置
CN110193481B (zh) * 2019-05-29 2021-03-23 Tcl华星光电技术有限公司 Pm刮拭治具
JP7197525B2 (ja) * 2020-01-22 2022-12-27 株式会社Ｓｃｒｅｅｎホールディングス ノズル清掃装置、塗布装置、ノズル清掃方法、および、スクレーパー
JP7308182B2 (ja) * 2020-12-21 2023-07-13 株式会社Ｓｃｒｅｅｎホールディングス ノズル洗浄装置および塗布装置
JPWO2023112200A1 (ja) * 2021-12-15 2023-06-22
CN116371674A (zh) * 2023-03-17 2023-07-04 上川精密科技(无锡)有限公司 一种用于锂电池双层涂布模头下层涂布面密度的调节结构

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59160576A (ja) * 1983-02-28 1984-09-11 山本　増男 気液混合噴射洗浄装置
JP3306838B2 (ja) * 1993-12-14 2002-07-24 東レ株式会社 カーテンフローコータの口金の清掃方法およびカラーフィルタ用塗膜の製造方法
JP3757992B2 (ja) * 1996-01-18 2006-03-22 東レ株式会社 塗布装置および塗布方法並びにカラーフィルタの製造方法および製造装置
JPH10216598A (ja) * 1997-02-04 1998-08-18 Toray Ind Inc 塗布方法および塗布装置並びにカラーフィルターの製造方法および製造装置
JP2000070811A (ja) * 1998-08-27 2000-03-07 Matsushita Electric Ind Co Ltd ノズルおよび塗布装置
JP3511106B2 (ja) * 1999-04-07 2004-03-29 東京応化工業株式会社 スリットノズルの洗浄装置
JP2002079164A (ja) * 2000-09-07 2002-03-19 Matsushita Electric Ind Co Ltd エクストルージョン型ノズル、塗布装置、並びにプラズマディスプレイパネル前面板の誘電体層の製造方法
JP2002177848A (ja) * 2000-12-15 2002-06-25 Toray Ind Inc 塗布用ダイの清掃装置および清掃方法並びにこれを用いたカラーフィルターの製造装置および製造方法
KR100615170B1 (ko) * 2002-06-22 2006-08-25 삼성에스디아이 주식회사 코팅다이의 세정장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI405624B (zh) * 2011-03-07 2013-08-21 Toray Eng Co Ltd Cleaning method and cleaning device for cleaning member and coater, and manufacturing method of display member
TWI559994B (ja) * 2012-06-20 2016-12-01 Toray Eng Co Ltd

Also Published As

Publication number Publication date
KR101184720B1 (ko) 2012-09-20
JP4489480B2 (ja) 2010-06-23
KR20110118117A (ko) 2011-10-28
TW200536615A (en) 2005-11-16
JP2005270841A (ja) 2005-10-06
KR101121122B1 (ko) 2012-03-19
KR20060044725A (ko) 2006-05-16

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