200536615 ⑴ 九、發明說明 【發明所屬之技術領域】 本發明是有關一種在與移動方向垂直的方向上洗淨具 有開縫狀的塗佈液排出口之開縫式噴嘴的裝置。 【先前技術】 以往是使用開縫式噴嘴，作爲在玻璃基板等基板上， 以一定寬度塗佈成爲抗蝕劑膜或彩色濾光片之塗佈液的裝 置。若使用開縫式噴嘴，則不會浪費塗佈液且可有效進行 塗佈，在成爲寬度較廣時，於噴嘴前端的週邊部，塗佈液 的回流量亦多，這是乾燥時產生大量的異物之原因。 因此，以往已知有在彈性變形的支持部之擦拭面，安 裝布或紗布而構成洗淨噴頭，將該洗淨噴頭的擦拭面抵押 在開縫式噴嘴的排出口而移動的洗淨裝置。（專利文獻1 的段落[003 1 ]) 又，在開縫式噴嘴的長邊方向（沿著縫隙的方向）移動 的板之兩面，安裝表面由鐵氟龍（登錄商標）樹脂或聚氨酯 樹脂等所構成的淸掃構件，藉由彈簧將上述淸掃構件按押 在開縫式噴嘴的排出口而移動的洗淨裝置。（專利文獻2 的段落[0012]) 再者，已知在開口有開縫式噴嘴的下端面，以個別的 .淸掃裝置，淸掃已挾住該下端面之開縫式噴嘴的左右傾斜 面的裝置，該淸掃裝置是由：與開縫式噴嘴的下端面（傾 斜面）接觸的淸掃具、及吸引已淸除之塗佈液的開口部所 -5- (2) (2)200536615 構成的洗淨裝置。（專利文獻3的段落[0027]) 又，在以往的開縫式噴嘴的洗淨裝置中，由於從洗淨 液供給部僅吹附洗淨液與氣體，因此無法完全除去已附著 的抗蝕劑。而且，由於沒有物理性的洗淨手段，故僅以洗 淨液無法簡單的使牢牢黏住的抗蝕劑掉落，因此最後必須 以人工擦拭。 【專利文獻1】日本特開平5-208 1 54號公報 【專利文獻2】日本特開平9- 1 92566號公報 【專利文獻1】日本特開2002-177848號公報 【發明內容】 〔發明所欲解決之課題〕 在以往的開縫式噴嘴洗淨裝置中，由於從洗淨液供給 部僅吹附洗淨液與氣體，因此無法完全除去已附著的抗蝕 劑。又，由於沒有物理性的洗淨手段，故僅以洗淨液無法 簡單使牢牢黏住的抗蝕劑掉落，因此最後必須以人工擦 拭。 又，因爲來自洗淨液供給部的洗淨液的擴展，故洗淨 液無法普及到開縫式噴嘴下端的全域，爲了普及而需要大 量的洗淨液。 〔用以解決課題之手段〕 爲了解決上述課題，本發明的開縫式噴嘴洗淨裝置， 是藉由一邊使擦拭構件接觸開縫式噴嘴的排出口，一邊使 -6- (3) (3)200536615 其沿著開縫式噴嘴的長邊方向相對地移動，以除去附著在 排出口的多餘的塗佈液的開縫式噴嘴洗淨裝置，其特徵在 於：該洗淨裝置，具有：對開縫式噴嘴前端傾斜面供給洗 淨液之洗淨液供給部，該洗淨液供給部設爲可與上述擦拭 構件一起沿著開縫式噴嘴的長邊方向上相對地移動，又具 有：藉由上述開縫式噴嘴前端傾斜面，來防止洗淨液供給 部之開口被封閉的限制部。 又，藉由開縫式噴嘴的前端傾斜面，設置用來防止使 洗淨液供給部的開口之限制部封閉的地方與形狀，例如在 比洗淨液供給部的開口更上方形成凸部。 而且，上述擦拭構件是由：形成讓開縫式噴嘴前端之 V字狀凹部嵌入，或是與開縫式噴嘴前端之排出口接觸的 第1擦拭構件、及與開縫式噴嘴前端之兩傾斜面接觸的第 2擦拭構件所構成者。 再者，上述擦拭構件是以設爲由彈簧等彈性構件，彈 壓在與開縫式噴嘴前端接觸的方向之構造較爲理想。 又，本發明爲了提升霧的擴展與洗淨效果’在開縫式 噴嘴洗淨裝置的洗淨液供給部，設置用來儲留洗淨液之部 分，從其後方吹附氣體。 而且，抑制開縫式噴嘴雨端的排氣流速，此外’爲了 進行自我洗淨的目的，可在開縫式噴嘴洗淨裝置的開縫式 噴嘴之兩端部設計大致相似形狀的虛設區塊。 〔發明的功效〕 -7- (4) 200536615 根據本發明之開縫式噴嘴洗淨裝置，由於將洗淨液供 給至噴嘴前端，且可擦拭掉已附著的塗部液，因此塗佈液 不會凝固，淸掃構件不會在早期就消耗掉，或受損。 又，本發明之洗淨裝置，是在對開縫式噴嘴前端傾斜 面噴附洗淨液時，藉由限制部防止在洗淨液體供給部使 洗淨液供給部的開口封閉，因此具有抑制塗部液的乾燥之 效果。 φ 再者，設計儲留洗淨液的部分，藉著從其後方吹附氣 體，使霧的擴展提升，提升洗淨效果，亦可削減液量。 又，以往在洗淨之後，爲了防止未除乾淨的抗蝕劑乾 燥而成爲塗佈中的異物，對每20片洗淨對象物進行人工 擦拭作業，惟當因氣體與洗淨液的雙流體噴嘴噴附洗淨液 時，藉由接觸式的襯墊之物理性的洗淨手段洗淨噴嘴，可 使洗淨效率提升，可洗淨除去已經乾燥的抗蝕劑，有減少 人工擦拭的頻率之效果。 Φ 而且，在洗淨噴嘴端附近時，沒有與噴嘴略相似形的 虛設區塊時，由於降低排氣效果，使流速落下，因此成爲 洗淨殘餘的原因。在此，藉由在開縫式噴嘴的兩端設計略 相似形的虛設區塊，使噴嘴端的排氣之流速不降低，可均 一的進行洗淨，利用虛設區塊，在洗淨時及/或待機時， 進行噴嘴本身的自行洗淨。 【實施方式】 以下依據添附圖面說明本發明之實施形態。第1圖是 -8- (5) (5)200536615 第1實施例之開縫式噴嘴洗淨裝置的全體斜視圖，第2圖 是該開縫式噴嘴洗淨裝置的平面圖，第3圖是第2圖的 A-A方向剖面圖，第4圖是第3圖的主要部分放大剖面 圖。 開縫式噴嘴洗淨裝置是在軌道1上扣合板2，設置在 板2上的洗淨用區塊3，沿著開縫式噴嘴1 00的長邊方向 設爲可相對地來回移動。該洗淨用區塊3是由：下區塊4 與一對的上區塊5所構成，在形成於下區塊4的上面之凹 部上嵌入上區塊5加以保持。 上述下區塊4藉由安裝在板2上的定位板6位置定 位，又，載置於可旋轉地螺固在板2的保持具7上，成爲 旋轉保持具7且可高調整的構造。 又，上區塊5具有與開縫式噴嘴1 00的傾斜面1 0 1略 平行的傾斜面8，在該傾斜面8形成有朝向傾斜面1 0 1而 供給的洗淨液體供給部9之開口 1 〇，使該開口 1 0的正上 方位置之傾斜面的一部分在傾斜面1 0 1側成爲比開口 1 0 的面更凸的限制部1 1，藉由該限制部1 1即使使傾斜面 1 〇 1與傾斜面8接觸時，開口 1 0亦不會被封閉。 又，一對的上區塊5、5間藉以導引構件12、1 2配置 擦拭構件13。沿著擦拭構件13的開縫式噴嘴100的長邊 方向之長度與形成開口 10的區域重疊。又，擦拭構件13 以海綿、橡膠、樹脂等比較軟的材料構成，在開縫式噴嘴 100下降時，仿照開縫式噴嘴的100的下端部形狀，以某 程度的寬度接觸。 -9- (6) 200536615 此外，以難以彈性變形的材料製作擦拭構件1 3的材 料時，在擦拭構件1 3預先形成仿照開縫式噴嘴丨〇 〇的下 端部形狀之凹部。 以上，從洗淨液供給部9的開口 1 〇朝向傾斜面1 0 1 供給洗淨液，在未圖示的驅動裝置，使板2沿著開縫式噴 嘴100的長邊方向移動，藉由擦拭構件13擦拭附著在開 縫式噴嘴1 00的排出口之塗佈液。 φ 第5圖是第2實施例之該開縫式噴嘴洗淨裝置的平面 圖，第6圖是第5圖的A方向箭號圖，第7圖是第5圖的 B-B方向放大剖面圖，第8圖是第6圖的C-C方向剖面 圖，在該實施例中，是由：使擦拭構件與開縫式噴嘴1 0 0 前端的兩傾斜面1 0 1接觸的第2擦拭構件1 3 1、及與開縫 式噴嘴1 〇〇前端的兩傾斜面1 0 1接觸的第2擦拭構件1 3 2 所構成，第2擦拭構件132在平面觀看，是配置於形成洗 淨液供給部9的開口 10之區域的若干外側上，第1擦拭 # 構件1 3 1則配置在比一方的第2擦拭構件1 3 2更外側。 第1及第2擦拭構件1 3 1、13 2是由海綿、橡膠、樹 脂等所構成，第1擦拭構件1 3 I、1 3 2在側面觀看，構成 略逆U字狀，當開縫式噴嘴1〇〇前端下降，而按押第1擦 拭構件1 3 1時，隨著其變形的彈力與開縫式噴嘴1 00的下 端壓接。又，第2擦拭構件132在正面觀看，構成略逆V 字狀，與開縫式噴嘴1 00的長邊方向分離安裝兩個，一方 的第2擦拭構件1 3 2在右側的上區塊5固接一端，另一方 的第1擦拭構件1 32在左側的上區塊5固接一端，以彎折 -10- (7) 200536615 時的彈力與開縫式噴嘴l 0 0的下端之兩傾斜面1 ο 1、1 0 1 壓接。 第9圖是第3實施例之該開縫式噴嘴洗淨裝置的平面 圖，第10圖是第9圖的A方向箭號圖，第11圖是第9圖 的B-B方向放大剖面圖，第12圖是第10圖的C-C方向剖 面圖。 在該實施例中，從正面觀看，將第2擦拭構件132的 • 形狀設爲五角形的板狀體，使垂直的兩邊中的一邊與下區 塊4的上面抵接，另一方的邊與上區塊5的內側面抵接。 藉著這種構成，可正確進行擦拭構件的位置定位。 第1 3圖是第3實施例之該開縫式噴嘴洗淨裝置的平 面圖，第14圖是第13圖的A-A方向放大剖面圖，第1 5 圖是第13圖的B_B方向放大剖面圖。 在該實施例中，從平面觀看，在形成洗淨液供給部9 的開口 1 〇之區域內，配置第1及第2擦拭構件1 31、 # 132。又，第1及第2擦拭構件131、132皆構成區塊狀， 以彈簧131a、132a彈壓在與開縫式噴嘴1〇〇壓接的方 向。 又，第16圖是第4實施例之擦拭構件的圖，在該實 施例中，前端是尖銳的擦拭構件1 3 3的基部收納於盒體 】34內，藉由彈簧135彈壓在突出方向。 第1 7圖是第5實施例之開縫式噴嘴洗淨裝置的平面 圖，開縫式噴嘴以兩處的擦拭構件201、202擦拭。首 先，以前方的擦拭構件20 1除去已附著的抗鈾劑，然後以 -11 - (8) (8)200536615 後方的擦拭構件202進行洗淨液與擦拭的加工。擦拭部爲 了容易交換，而各安裝於左右，擦拭構件以與噴嘴前端附 近的側面部（附著有抗蝕劑的部分）接觸之方式設置。附著 在噴嘴的抗蝕劑，在以洗淨液膨脹濕潤之後進行擦拭，因 此可增加洗淨效果。在洗淨液供給部設置儲留洗淨液的洗 淨液池部204，從位於其後方之氣體供給部203吹附氣體 207，洗淨液成爲霧狀208，與噴嘴傾斜面接觸而洗淨。 第18圖是上述洗淨裝置的A-A剖面圖，設置洗淨液 池部204作爲在洗淨液供給部儲存洗淨液的部分，藉著從 位於其後方之氣體供給部203吹附氣體，使洗淨液擴展而 霧化。上述霧排出至噴嘴210時，在傾斜面209接觸洗淨 液的面積，與未供給氣體時相比變廣。噴嘴洗淨裝置在洗 淨液供給部與擦拭部進行洗淨，並且從排液兼排氣口 2 0 6 進行排氣。 第19(a)圖是在噴嘴100連接虛設噴嘴3 00之圖。虛 設噴嘴300具有與噴嘴100相同的剖面，如第19(b)圖所 示，與噴嘴1〇〇兩端連接。第19(c)圖是從排出口 301側 觀看的圖。藉由設置虛設噴嘴，在洗淨噴嘴端附近時流速 不會變慢，可均勻洗淨，因此不會產生洗淨殘留，亦可改 善排氣效率。又，利用虛設噴嘴，若在洗淨待機時排出洗 淨液，則可進行噴嘴本身的自行洗靜。 〔產業上利用的可能性〕 在洗淨以半導體製造裝置作爲開始的液體塗佈裝置之 -12- 200536615 Ο) 噴嘴的裝置，特別是可應用在因塗佈液的凝固產生問題的 裝置。藉此’期待藉由降低洗淨作業頻率之製造線全體的 效率化。 【圖式簡單說明】 第1圖是第1實施例之開縫式噴嘴洗淨裝置的全體斜 視圖。 第2圖是第1實施例之該開縫式噴嘴洗淨裝置的平面 圖。 第3圖是第1寳施例之第2圖的Α·Α方向剖面圖。 第4圖是第〗實施例之第3圖的主要部分放大剖面 圖。 第5圖是第2實施例之該開縫式噴嘴洗淨裝置的平面 圖。 第6圖是第5圖的Α方向箭號圖。 第7圖是第5圖的B-B方向放大剖面圖。 第8圖是第6圖的C-C方向剖面圖。 第9圖是第3實施例之該開縫式噴嘴洗淨裝置的平面 圖。 第]〇圖是第9圖的A方向箭號圖。 第1 1圖是第9圖的B-B方向放大剖面圖。 第12圖是第1〇圖的C-C方向剖面圖。 第1 3圖是第3實施例之該開縫式噴嘴洗淨裝置的平 面圖。 -13- (10) 200536615 第14圖是第13圖的A-A方向放大剖面圖。 第15圖是第13圖的B-B方向放大剖面圖。 第1 6圖是第4實施例之洗淨構件的圖。 第17圖是第5實施例之洗淨裝置的上面圖（擦拭構件 在2處的構成倂置2組時）。 第18圖是第17圖的A-A方向放大剖面圖。 第1 9圖是第5實施例之虛設噴嘴的圖。 【主要元件符號說明】 1 軌 道 2 板 3 洗 淨 用 區 袖 4 下 區 塊 5 上 丨品 塊 6 位 置 定 位 板 7 保 持 具 8 傾 斜 面 9 洗 淨 液 供 么A 部 10 洗 淨 液 供 給 用的開口 11 限 制 部 12 導 引 部 13 擦 拭 構 件 100 開 縫 式 噴 嘴 10 1 傾 斜 面 13 1 第 1 擦 拭 構 件 132 第 2 擦 拭 構 件 131; a、 132a 彈 簧 133 擦 拭 構 件 134 盒 體 135 彈 簧 201 擦拭構件（前 方） 202 0 形 環 206 排 液 兼 排 氣 □ 20 7 氣 體 208 霧 209 傾 斜 面 210 噴 嘴 300 虛 設 區 塊 301 排 出 □ -14-200536615 ⑴ IX. Description of the invention [Technical field to which the invention belongs] The present invention relates to a device for cleaning a slit nozzle having a slit-shaped coating liquid discharge port in a direction perpendicular to the moving direction. [Prior Art] Conventionally, a slit-type nozzle has been used as a device for applying a coating liquid to a resist film or a color filter on a substrate such as a glass substrate with a certain width. If a slotted nozzle is used, the coating liquid is not wasted and can be effectively applied. When the width is wide, the return flow of the coating liquid is also large at the peripheral portion of the front end of the nozzle. The cause of the foreign body. Therefore, conventionally, a cleaning device is known in which a cleaning nozzle is attached to a wiping surface of an elastically deformed support portion by installing cloth or gauze, and the wiping surface of the cleaning nozzle is secured to a discharge port of a slotted nozzle and moved. (Paragraph [003 1] of Patent Document 1) In addition, the mounting surfaces of both sides of the plate that moves in the longitudinal direction (along the direction of the slit) of the slotted nozzle are made of Teflon (registered trademark) resin or polyurethane resin. The constructed sweeping member is a cleaning device that moves the sweeping member by a spring while pressing the sweeping member against a discharge port of a slotted nozzle. (Paragraph [0012] of Patent Document 2) Furthermore, it is known that the lower end face of the slotted nozzle having an opening is swept by a separate .sweep device to sweep the left and right sides of the slotted nozzle that has held the lower end face. The sweeping device is composed of a sweeping tool which is in contact with the lower end surface (inclined surface) of the slotted nozzle, and an opening for attracting the removed coating liquid. -5- (2) (2 ) 200536615 cleaning device. (Paragraph [0027] of Patent Document 3) Furthermore, in the conventional cleaning device for a slotted nozzle, since only the cleaning liquid and the gas are blown from the cleaning liquid supply unit, the adhered corrosion cannot be completely removed. Agent. In addition, since there is no physical cleaning means, it is not possible to simply drop the firmly adhered resist with only the cleaning solution, so it must be manually wiped in the end. [Patent Document 1] Japanese Patent Application Laid-Open No. 5-208 1 54 [Patent Literature 2] Japanese Patent Application Laid-Open No. 9-1 92566 [Patent Literature 1] Japanese Patent Application Laid-Open No. 2002-177848 [Content of the Invention] Problem to be Solved] In the conventional slit-type nozzle cleaning device, since only the cleaning liquid and the gas are blown from the cleaning liquid supply unit, the adhered resist cannot be completely removed. In addition, since there is no physical cleaning means, it is not possible to simply drop the firmly adhered resist with only the cleaning solution. Therefore, it is necessary to manually wipe the resist. In addition, due to the expansion of the cleaning liquid from the cleaning liquid supply unit, the cleaning liquid cannot be spread to the entire lower end of the slotted nozzle, and a large amount of cleaning liquid is required for the spread. [Means for solving the problem] In order to solve the above-mentioned problem, the slotted nozzle cleaning device of the present invention is to make -6- (3) (3) while bringing the wiping member into contact with the discharge port of the slotted nozzle. 200536615 A slotted nozzle cleaning device that moves relatively along the longitudinal direction of the slotted nozzle to remove excess coating liquid attached to the discharge port, which is characterized in that the cleaning device has: A cleaning liquid supply unit for supplying a cleaning liquid on the inclined surface of the slit nozzle front end, the cleaning liquid supply unit is configured to be relatively movable along the longitudinal direction of the slotted nozzle together with the wiping member, and has: The inclined portion at the front end of the slit-type nozzle prevents the restricting portion from closing the opening of the cleaning liquid supply portion. In addition, the slotted nozzle has an inclined surface at the front end thereof, which is provided with a place and a shape to prevent the restricting portion of the opening of the cleaning liquid supply portion from being closed. For example, a convex portion is formed above the opening of the cleaning liquid supply portion. In addition, the wiping member is formed by a first wiping member formed by inserting a V-shaped recess at the front end of the slotted nozzle, or in contact with a discharge port at the front end of the slotted nozzle, and two inclination with the front end of the slotted nozzle. The second wiping member is in surface contact. The wiping member is preferably a structure in which an elastic member such as a spring is used to urge the wiping member in a direction in contact with the tip of the slotted nozzle. Further, in the present invention, in order to enhance the spread of the mist and the cleaning effect ', the cleaning liquid supply portion of the slot-type nozzle cleaning device is provided with a portion for storing the cleaning liquid, and a gas is blown from behind it. Furthermore, the exhaust flow velocity at the rain end of the slotted nozzle is suppressed, and for the purpose of self-cleaning, dummy blocks of approximately similar shapes may be designed at both ends of the slotted nozzle of the slotted nozzle cleaning device. [Effect of the Invention] -7- (4) 200536615 According to the slit-type nozzle cleaning device of the present invention, since the cleaning liquid is supplied to the front end of the nozzle and the attached coating liquid can be wiped off, the coating liquid does not It will solidify and the sweeping component will not be consumed or damaged early. In addition, when the cleaning device of the present invention sprays the cleaning liquid on the inclined surface of the front end of the slot-type nozzle, the restricting portion prevents the opening of the cleaning liquid supply portion from being closed by the cleaning liquid supply portion, and therefore has a coating suppression effect. The effect of drying the liquid. φ In addition, the part where the cleaning liquid is stored is designed to blow the gas from the rear to increase the expansion of the mist, improve the cleaning effect, and reduce the amount of liquid. In addition, in the past, after cleaning, in order to prevent the uncleaned resist from drying and becoming a foreign substance in the coating, manual wiping operation was performed for every 20 pieces of cleaning objects. However, due to the dual fluid of gas and cleaning liquid, When the nozzle is sprayed with the cleaning liquid, the nozzle is washed by the physical cleaning method of the contact pad, which can improve the cleaning efficiency, can remove the dried resist, and reduce the frequency of manual wiping. The effect. Φ In addition, when there is no dummy block with a shape similar to that of the nozzle near the end of the cleaning nozzle, the exhaust effect is reduced and the flow velocity drops, which causes the cleaning residue. Here, by designing dummy blocks with slightly similar shapes at both ends of the slotted nozzle, the exhaust flow velocity at the nozzle end is not reduced, and washing can be performed uniformly. Using the dummy blocks, during cleaning and / Or during standby, clean the nozzle itself. [Embodiment] An embodiment of the present invention will be described below with reference to the drawings. Figure 1 is -8- (5) (5) 200536615 The overall perspective view of the slotted nozzle cleaning device of the first embodiment, Figure 2 is a plan view of the slotted nozzle cleaning device, and Figure 3 is FIG. 2 is a cross-sectional view taken along the line AA, and FIG. 4 is an enlarged cross-sectional view of a main part of FIG. 3. The slotted nozzle cleaning device engages the plate 2 on the rail 1, and the washing block 3 provided on the plate 2 is relatively movable back and forth along the longitudinal direction of the slotted nozzle 100. The cleaning block 3 is composed of a lower block 4 and a pair of upper blocks 5, and the upper block 5 is embedded in a recess formed on the upper surface of the lower block 4 and held. The lower block 4 is positioned by a positioning plate 6 mounted on the plate 2 and placed on a holder 7 which is rotatably screwed to the plate 2 to form a highly adjustable structure of the rotating holder 7. In addition, the upper block 5 has an inclined surface 8 which is slightly parallel to the inclined surface 1 0 1 of the slotted nozzle 100. The inclined surface 8 is formed with one of the cleaning liquid supply units 9 which is supplied toward the inclined surface 1 0 1. In the opening 10, a part of the inclined surface immediately above the opening 10 is a restricting portion 11 that is more convex than the surface of the opening 10 on the inclined surface 1 1 1 side. Even if the restricting portion 11 is inclined When the surface 1 〇1 is in contact with the inclined surface 8, the opening 10 will not be closed. In addition, the wiping members 13 are arranged between the upper blocks 5 and 5 of the pair by the guide members 12 and 12. The length in the longitudinal direction of the slit-type nozzle 100 of the wiping member 13 overlaps the area where the opening 10 is formed. The wiping member 13 is made of a relatively soft material such as sponge, rubber, and resin. When the slotted nozzle 100 is lowered, the wiper member 13 follows the shape of the lower end portion of the slotted nozzle 100 and contacts with a certain width. -9- (6) 200536615 In addition, when the wiper member 13 is made of a material that is difficult to elastically deform, a recessed portion is formed in advance on the wiper member 13 in a shape that mimics the shape of the lower end of the slotted nozzle. As described above, the cleaning liquid is supplied from the opening 10 of the cleaning liquid supply unit 9 toward the inclined surface 1 0 1, and the plate 2 is moved along the longitudinal direction of the slotted nozzle 100 by a driving device (not shown) by The wiping member 13 wipes the coating liquid attached to the discharge port of the slotted nozzle 100. φ FIG. 5 is a plan view of the slot-type nozzle cleaning device of the second embodiment, FIG. 6 is an arrow view in the direction A in FIG. 5, and FIG. 7 is an enlarged cross-sectional view in the BB direction in FIG. 5. FIG. 8 is a cross-sectional view in the CC direction of FIG. 6. In this embodiment, the second wiping member 1 3 1 is made by contacting the wiping member with the two inclined surfaces 1 0 1 at the front end of the slotted nozzle 1 0 0. The second wiping member 1 3 2 is in contact with the two inclined surfaces 1 0 1 of the front end of the slotted nozzle 100, and the second wiping member 132 is arranged in an opening forming the cleaning liquid supply portion 9 when viewed in a plan view. On the outer sides of the area of 10, the first wiping member 1 3 1 is disposed more outward than the second wiping member 1 3 2. The first and second wiping members 1 3 1 and 13 2 are made of sponge, rubber, resin, etc. The first wiping members 1 3 I and 1 3 2 are viewed from the side and constitute a slightly inverse U-shape. The front end of the nozzle 100 is lowered, and when the first wiping member 131 is pressed, the elastic force in accordance with the deformation of the first wiping member is brought into pressure contact with the lower end of the slotted nozzle 100. The second wiping member 132 is viewed from the front and has a slightly inverted V-shape. Two second wiping members 132 are separated from the longitudinal direction of the slotted nozzle 100. One second wiping member 1 3 2 is on the right upper block 5 One end is fixed, and the other first wiping member 1 32 is fixed at one end in the upper block 5 on the left side, and is bent by the elastic force at the time of -10- (7) 200536615 and the lower end of the slotted nozzle l 0 0 Face 1 ο 1, 1 0 1 Crimp. FIG. 9 is a plan view of the slotted nozzle cleaning device of the third embodiment, FIG. 10 is an arrow view in the direction A of FIG. 9, and FIG. 11 is an enlarged sectional view in the BB direction of FIG. It is CC sectional drawing of FIG. In this embodiment, when viewed from the front, the shape of the second wiping member 132 is a pentagonal plate-shaped body such that one of the two vertical sides abuts the upper surface of the lower block 4 and the other side is upper The inner side of block 5 abuts. With this configuration, the position of the wiping member can be accurately positioned. Fig. 13 is a plan view of the slit-type nozzle cleaning device of the third embodiment, Fig. 14 is an enlarged sectional view in the direction A-A of Fig. 13 and Fig. 15 is an enlarged sectional view in the direction B_B of Fig. 13. In this embodiment, the first and second wiping members 1 31 and # 132 are disposed in a region where the opening 10 of the cleaning liquid supply portion 9 is formed as viewed from a plane. In addition, the first and second wiping members 131 and 132 are each formed in a block shape, and the springs 131a and 132a are elastically pressed in a direction in which they are in pressure contact with the slotted nozzle 100. Fig. 16 is a diagram of the wiping member of the fourth embodiment. In this embodiment, the base portion having the sharp wiping member 1 3 3 at the front end is housed in the case body 34, and is urged in the protruding direction by a spring 135. Fig. 17 is a plan view of the slit-type nozzle cleaning device of the fifth embodiment, and the slit-type nozzle is wiped with the wiping members 201 and 202 at two places. First, the attached anti-uranium agent is removed by the front wiping member 201, and then the cleaning liquid and wiping are performed by the wiping member 202 at the rear of -11-(8) (8) 200536615. The wiper sections are easily exchangeable, and are mounted on the left and right, and the wiper members are provided in contact with the side surface (the portion to which the resist is attached) near the front end of the nozzle. The resist adhered to the nozzle is wiped after being swollen and wet with a cleaning solution, thereby increasing the cleaning effect. The cleaning liquid supply portion is provided with a cleaning liquid pool portion 204 for storing the cleaning liquid, and a gas 207 is blown from a gas supply portion 203 located behind the cleaning liquid supply portion. The cleaning liquid becomes a mist 208 and comes into contact with the inclined surface of the nozzle for cleaning. FIG. 18 is a cross-sectional view taken along the line AA of the above-mentioned cleaning device. A cleaning liquid tank portion 204 is provided as a portion storing the cleaning liquid in the cleaning liquid supply portion, and the gas is blown from a gas supply portion 203 located behind the cleaning liquid portion to make the The neat liquid expanded and atomized. When the mist is discharged to the nozzle 210, the area where the inclined surface 209 comes into contact with the cleaning liquid is wider than when the gas is not supplied. The nozzle cleaning device cleans the cleaning liquid supply section and the wiping section, and exhausts the liquid from the liquid discharge and exhaust port 2 0 6. FIG. 19 (a) is a diagram in which a dummy nozzle 300 is connected to the nozzle 100. FIG. The dummy nozzle 300 has the same cross section as the nozzle 100, and is connected to both ends of the nozzle 100 as shown in FIG. 19 (b). Fig. 19 (c) is a view viewed from the discharge port 301 side. By providing a dummy nozzle, the flow rate does not slow down when cleaning near the nozzle end, and it can be washed uniformly, so no washing residue is generated, and the exhaust efficiency can be improved. In addition, by using the dummy nozzle, if the cleaning liquid is discharged during the cleaning standby, the nozzle itself can be washed. [Possibility of industrial use] -12-200536615 0) for cleaning liquid coating devices starting with semiconductor manufacturing equipment) Nozzle devices, especially those that cause problems due to solidification of coating liquid. This is expected to improve the efficiency of the entire manufacturing line by reducing the frequency of cleaning operations. [Brief Description of the Drawings] Fig. 1 is an overall perspective view of the slit nozzle cleaning device of the first embodiment. Fig. 2 is a plan view of the slit-type nozzle cleaning device of the first embodiment. Fig. 3 is a cross-sectional view taken along the line AA of Fig. 2 of the first embodiment. Fig. 4 is an enlarged sectional view of a main part of Fig. 3 of the first embodiment. Fig. 5 is a plan view of the slot-type nozzle cleaning device of the second embodiment. FIG. 6 is a view of arrow A in FIG. 5. Fig. 7 is an enlarged cross-sectional view taken along the line B-B in Fig. 5. Fig. 8 is a sectional view taken along the line C-C in Fig. 6. Fig. 9 is a plan view of the slit-type nozzle cleaning device of the third embodiment. Fig. 0 is an arrow diagram in the direction A of Fig. 9. Fig. 11 is an enlarged cross-sectional view taken along the line B-B in Fig. 9. Fig. 12 is a sectional view taken along the line C-C in Fig. 10; Fig. 13 is a plan view of the slit-type nozzle cleaning device according to the third embodiment. -13- (10) 200536615 Figure 14 is an enlarged sectional view in the direction A-A of Figure 13. Fig. 15 is an enlarged cross-sectional view taken along the line B-B in Fig. 13. Fig. 16 is a view of a cleaning member of a fourth embodiment. Fig. 17 is a top view of the cleaning device of the fifth embodiment (when two groups of wiper members are arranged). Fig. 18 is an enlarged cross-sectional view in the direction A-A of Fig. 17. Fig. 19 is a view showing a dummy nozzle according to a fifth embodiment. [Description of main component symbols] 1 Track 2 Plate 3 Washing area sleeve 4 Lower block 5 Upper 丨 block 6 Position positioning plate 7 Holder 8 Inclined surface 9 Cleaning liquid supply A Section 10 Cleaning liquid supply Opening 11 Restriction part 12 Guide part 13 Wiping member 100 Slotted nozzle 10 1 Inclined surface 13 1 First wiping member 132 Second wiping member 131; a, 132a Spring 133 Wiping member 134 Case 135 Spring 201 Wiping member (front ) 202 0 ring 206 discharge and exhaust □ 20 7 gas 208 mist 209 inclined surface 210 nozzle 300 dummy block 301 discharge □ -14-