CN102688830B - Apparatus for coating and coating process - Google Patents

Apparatus for coating and coating process Download PDF

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Publication number
CN102688830B
CN102688830B CN201210046849.3A CN201210046849A CN102688830B CN 102688830 B CN102688830 B CN 102688830B CN 201210046849 A CN201210046849 A CN 201210046849A CN 102688830 B CN102688830 B CN 102688830B
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China
Prior art keywords
coating
cleaning
theta stage
support component
cleaning part
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CN201210046849.3A
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Chinese (zh)
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CN102688830A (en
Inventor
西元美纪
伊藤祯彦
内山悟
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Toray Engineering Co Ltd
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Toray Engineering Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The invention provides a kind of apparatus for coating and coating process, although be effective method with multiple cleaning part wiping outlet for obtaining stable coated film before being coated with by optics coating machine, but change cleaning part during each replacing nozzle and it and each outlet are coincide, this wants spended time, apparatus for coating of the present invention comprises: cleaning unit, and the cleaning part supported by supported member is cleaned; Theta stage, multiple described cleaning unit can be placed in described wiping direction, and has perpendicular to the rotating shaft above it; Wiper unit, comprises the pedestal supporting described theta stage; The described support component and described theta stage of described cleaning unit are formed the height adjusting range for its clamped height adjustment member.

Description

Apparatus for coating and coating process
Technical field
The present invention relates to apparatus for coating and the coating process of the manufacture of the chromatic filter being applicable to colour liquid crystal display device etc., particularly relate to having and to discharge to the applied parts top such as glass substrate when coating fluid limit forms coated film the apparatus for coating of the clearing apparatus that the front end of nozzle is cleaned and coating process.
Background technology
The chromatic filter of colour liquid crystal display device has the three primary colors of thin grid pattern on the glass substrate.First the glass substrate of such grid pattern is formed the coated film of black, be then separately coated with by red, blue, green film and obtain.That is, when manufacturing chromatic filter, be coated with black, red, blue, green coating fluid on the glass substrate, thus the painting process forming these coated film is successively absolutely necessary.Spin coater, rod coater or roll coater etc. are used as existing apparatus for coating in this painting process.But, in recent years, in order to reach the consumption figure and the object improving physical property that reduce coating fluid, use optics coating machine.
For an example of the optics coating machine that such object uses, such as, be disclosed in patent document 1.In patent document 1, optics coating machine has slit die, discharges coating fluid limit form coated film at applied parts such as the films to a direction walking from the outlet limit of this slit die.
But although optics coating machine is applicable in the production in enormous quantities of even spread film, the outlet due to coating fluid is shape of slit, on whole slit, therefore forms the discharge form of uniform coating fluid and be not easy.Particularly, when being then coated with on new applied parts after terminating once coating, the periphery of outlet remains coating fluid etc., and being therefore coated with state can change.More particularly, near residue is residual, coated film thickness or thickening or thinning, thus there is streaky problem in coated film.
In order to solve such problem, comprise cleaning head at the optics coating machine of patent document 1.This cleaning head contacts with the outlet periphery of slit die, and the long dimensional directions simultaneously to this outlet moves, and moves along with this coating fluid wiped accompanying by outlet periphery.
The method of the outlet before coating in the whole length of wiping, is make the uniform effective method of coated film, and also discloses the invention of improvement after this in optics coating machine.The wiping of the outlet before this coating is referred to as the initialization of spreader.
Patent Document 2 discloses the apparatus for coating having and make the stabilising arrangement stable with the sliding action of the spreader of cleaning part, so that also can the coating fluid etc. of wiping residue fully on the spreader (die nozzle) at two ends with rake.At this, cleaning part refers to the parts manufactured by macromolecule resin of the groove being formed with substantially V-like shape above, and the groove of V-shape is formed according to the mode of the shape of the outlet being suitable for wanted wiping.
In addition, Patent Document 3 discloses and there are preparation two cleaning parts, in the cleaning part of front side, coating fluid etc. is stirred, then cleaning fluid is ejected into outlet, with the apparatus for coating of the cleaning part wiping cleaning fluid of rear side.
In addition, Patent Document 4 discloses and there is the situation that wiping ability declines in order to prevent coating fluid from anchoring at the cleaning part of cleaning itself, the apparatus for coating of the device of cleaning cleaning part itself.
Patent document
Patent document 1: Unexamined Patent 05-208154 publication
Patent document 2: Unexamined Patent 09-192566 publication
Patent document 3: Unexamined Patent 10-216598 publication
Patent document 4: Unexamined Patent 11-300261 publication
Summary of the invention
In the coating undertaken by optics coating machine, wiping outlet (initialization) is the effective method obtaining stable coated film before coating.But there is the spreader of various shape or material according to the different coated film on the coating fluid carrying out being coated with or applied parts in spreader (die nozzle).Further, all spreaders can not can initialize by unified wiping method fully only in this way.That is, the cleaning part of institute's wiping must be changed during each replacing spreader.
But each will change cleaning part when changing spreader and be adjusted to fit like a glove with outlet and need the time, result causes the processing time elongated.Particularly, when being configured with multiple cleaning part, each cleaning part Height Adjustment is not easy, and needs to take time.
The present invention is the invention proposed based on above-mentioned problem, and its object is to provides a kind of apparatus for coating and the coating process with the clearing apparatus that easily can adjust multiple cleaning part height.
More particularly, apparatus for coating of the present invention, is characterized in that, comprising: coating liquid supplying device, for supplying coating fluid; Spreader, has and is communicated with described coating liquid supplying device and discharges the outlet of described coating fluid slit-shaped; Mobile device, for making described spreader and applied parts relative movement; Clearing apparatus, the wiping direction to the slit direction along described outlet is moved, and slides on the outlet periphery of described spreader and remove attachment; Wherein, described clearing apparatus comprises: cleaning unit, is cleaned by the cleaning part be supported on support component; Theta stage, for placing multiple described cleaning unit on described wiping direction; Wiper unit, comprises the pedestal supporting described theta stage; The described support component and described theta stage of described cleaning unit are formed the height adjusting range for its clamped height adjustment member.
Apparatus for coating of the present invention, is characterized in that in addition, is configured with vertical direction deviator, and described theta stage is partial on the direction perpendicular to described pedestal.
Apparatus for coating of the present invention has following effect: owing to having the support component and the wiper unit with the theta stage comprised perpendicular to the rotating shaft above it that can carry and support cleaning part as clearing apparatus, having between support component and theta stage can the Height Adjustment face of its clamped height adjustment pad, therefore when installing multiple cleaning part, by clamping the pad of desired height between support component and theta stage, more easily carry out the Height Adjustment of cleaning part.
In addition, pedestal is supported by the vertical deviator being partial to vertical direction relative to pedestal by the theta stage supported, even if therefore wiper unit extruding is abutted on spreader, but the height between the cleaning part that theta stage is arranged still in statu quo keeps.This by wiper unit extruding is abutted to spreader, can prevent the situation that the different cleaning part of set height all contacts with outlet.That is, for multiple cleaning part, can set and some cleaning parts are contacted with outlet, other cleaning part is not contacted with outlet.
Accompanying drawing explanation
Fig. 1 is the figure of the formation representing apparatus for coating of the present invention;
Fig. 2 is the stereogram of gap nozzle;
Fig. 3 is the figure of the formation representing wiper unit of the present invention;
Fig. 4 is the enlarged drawing of cleaning parts;
Fig. 5 is the figure that vertical direction deviator is described;
Fig. 6 is the figure that automatic core-adjusting function is described;
Fig. 7 is the figure of the action that wiper unit is described;
Fig. 8 illustrates the figure utilizing the wiping method of wiper unit.
Drawing reference numeral explanation
1 apparatus for coating
2 base stations
4 guide rails
6 platforms
10 pillars
20 gap nozzles (spreader)
22 anterior lips
24 posterior lips
26 branch manifolds
28 slits
30 outlets
32 pads
34A, 34B lip inclined-plane
36 discharge actinal surface
40 coating liquid supplying devices
42 supply valves
44 aspirating valves
46 filters
50 liquid-feeding pumps
52 liquid feeding devices
54 pistons
56 main bodys
60 supplying flexible pipes
62 attract flexible pipe
64 casees
66 coating fluids
68 compressed air sources
70 oscilaltion unit
72 motors
74 guides
76 ball-screws
78 lifting platforms
80 hang holding station
90 thickness transducers
92 holding station
94 control device
96 operation boards
100 clearing apparatus
102 chassis
104 brackets
106 sliders
108 driver elements
110 pallets
129 pressing plates
120 wiper unit
124 adjustment parts
126 theta stages
130 deflection angle adjusting devices
132 vertical direction deviators
136 position regulators
140 cleaning units
142 solvent nozzle
144 pipe arrangements
The coating fluid of 150 attachments
152 coating fluids flowed out
200 cleaning parts
204V font groove
206 bottom lands
208 recesses
250,251,252 cleaning units
300 pads
302 gaps
Detailed description of the invention
Below, be preferred embodiment described of the present invention with reference to accompanying drawing.In addition, the following description is a form of illustrated embodiment, but can change in the scope not departing from main contents of the present invention.
Fig. 1 represents the formation of apparatus for coating 1 of the present invention.The base station 2 of apparatus for coating 1 is provided with pair of guide rails 4.Guide rail 4 is configured with platform 6, and the mounting table as the substrate A of applied parts placed by this platform 6.Platform 6, by not shown linear motor driven, freely reciprocates by the X-direction that arrow represents in Fig. 1.Become the vacuum suction face be made up of adsorption hole above platform 6, substrate A can be adsorbed and keep.
Base station 2 is configured with the pillar 10 of gate.Pillar 10 comprises oscilaltion unit 70.Oscilaltion unit 70 is provided with the spreader (being later referred to as " gap nozzle ") 20 carrying out being coated with.Therefore, the platform 6 carrying applied parts can relative movement relative to gap nozzle 20, and is referred to as mobile device.
Fig. 2 represents the stereogram of gap nozzle 20.Gap nozzle 20 is, is overlapped in the X direction, and be combined into one by not shown multiple attachment screws along the anterior lip 22 of the Y-direction as the direction (with the direction that the paper of Fig. 1 is vertical) vertical with X-direction and posterior lip 24 by pad 32.Central portion in gap nozzle 20 is formed with branch manifold 26, this branch manifold 26 also extends to the long dimensional directions (Y-direction) of gap nozzle 20.
The slit 28 be connected with branch manifold 26 is formed in the below of branch manifold 26.This slit 28 also extends to the long dimensional directions of gap nozzle 20, and its lower end is at discharge actinal surface 36 opening in the face bottom as gap nozzle 20, thus forms outlet 30.That is, gap nozzle 20 has at it outlet 30 extended to long dimensional directions bottom.This outlet 30 is to discharge actinal surface 36.
In addition, lip inclined-plane 34A, 34B is had as two adjacent surfaces adjacent with the both sides of discharging actinal surface 36.In addition, because slit 28 is formed by pad 32, therefore the gap (X-direction measurement) of slit 28 is identical with the thickness of pad 32.
Again with reference to accompanying drawing 1, the oscilaltion unit 70 that gap nozzle 20 be elevated by by gap nozzle 20 according to its outlet 30 be mode down keep suspension holding station 80, connect suspension holding station 80 one end and the guide 74 of the lifting platform 78 be elevated, vertically guiding lifting platform 78, the ball-screw 76 of rectilinear motion that the rotary motion of motor 72 converted to lifting platform 78 form.
Oscilaltion unit 70 is pair of right and left, to keep the both ends of the long dimensional directions of gap nozzle 20, and each lifting unit 70 can be elevated independently, therefore, it is possible to set arbitrarily the angle of inclination of long dimensional directions relative to level of gap nozzle 20.Thereby, it is possible to make the discharge actinal surface 36 of gap nozzle 20 and substrate A in the whole long dimensional directions of gap nozzle 20 roughly in parallel.Further, gap between substrate A on platform 6 and the discharge actinal surface 36 of gap nozzle 20, namely, the size in gap can be set arbitrarily by this oscilaltion unit 70.
In addition, the upstream side of the branch manifold 26 of gap nozzle 20 is connected with the supplying flexible pipe 60 be communicated with coating liquid supplying device 40 often by not shown inner passage.Thus, coating fluid 66 can be supplied to branch manifold 26 from coating liquid supplying device 40.Coating liquid supplying device 40 is all coating liquid supplying device to comprising supplying flexible pipe 60.The coating fluid flowing into branch manifold 26 spreads equably to the long dimensional directions of gap nozzle 20, and discharges from outlet 30 through slit 28.
In addition, coating liquid supplying device 40 comprises filter 46, supply valve 42, liquid-feeding pump 50, aspirating valve 44, attracts flexible pipe 62, case 64 on supplying flexible pipe 60 upstream side.In case 64, put aside coating fluid 66, and be connected with compressed air source 68, the back pressure of arbitrary size can be applied thus to coating fluid 66.Coating fluid 66 in case 64 is supplied to liquid-feeding pump 50 by aspirating valve 62.
Liquid feeding device 52 and piston 54 are installed on body 56 in liquid-feeding pump 50.At this, piston 54 can freely up and down be moved by not shown drive source.Liquid-feeding pump 50 is, fills coating fluid 66, and extrudes this coating fluid by piston 54, supply the pump of the constant volume type of the component of a coating substrate A to gap nozzle 20 in the liquid feeding device 52 with regulation internal diameter.When filling coating fluid 66 in liquid feeding device 52, open aspirating valve 44, close supply valve 42, and piston 54 is moved downwards.
In addition, when the coating fluid 66 be filled in liquid feeding device 52 is supplied to gap nozzle 20, close aspirating valve 44, open supply valve 42, piston 54 is moved upward, with piston 54, the coating fluid 66 in liquid feeding device 52 is upwards discharged thus.The area of section that the translational speed of piston 54 is multiplied by liquid feeding device is exactly the feed speed of coating fluid 66, i.e. the feed speed of pump.
On the left side of base station 2, the thickness transducer 90 measuring the thickness of substrate A is arranged in holding station 92.Thickness transducer 90 preferably utilizes the sensor of laser.Measured the thickness of substrate A by thickness transducer 90, even if the substrate A to any thickness, the gap as the gap between the discharge actinal surface 36 of gap nozzle 20 and substrate A can be made to remain at particular value.
In the right-hand end of base station 2, be included in the clearing apparatus 100 that front end is fixed with the wiper unit 120 of cleaning part 200 and be movably arranged in the X direction on guide rail 4.Cleaning decoration 100 comprises chassis 102, bracket 104, slider 106, driver element 108, pallet 110 and wiper unit 120, cleaning unit 140.Wiper unit 120 is fixed on bracket 104.
Wiper unit 120 is fixed on chassis 102 by the driver element 108 of slider 106 movement and pallet 110.Pallet 110 is for reclaiming the coating fluid etc. removed by wiper unit 120.Therefore, be connected with not shown discharge system, the liquid such as the coating fluid amassed in inside externally can be discharged and reclaimed thus.Pallet 100 can also be used for reclaiming the coating fluid of being discharged by the method such as to deflate from gap nozzle 20.
Chassis 102 on guide rail 4, and is freely reciprocated to X-direction by not shown linear motor under the guiding of guide rail 4, and therefore, whole wiper unit 120 can reciprocate to X-direction.In addition, carry out the cleaning unit 140 that cleans to wiper member 200 ejection of solvent in the X direction on the right-hand end of base station 2, position non-interference with the long dimensional directions end of gap nozzle 20 in the Y direction, fixed by not shown support.
Cleaning unit 140 is formed as the solvent nozzle 142 of the solvent of cleaning fluid and the never illustrated solvent supply source pipe arrangement 144 to solvent nozzle 142 donor solvent by spraying.In addition, solvent nozzle 142 is, as by solvent with cylindricality, shower shape or fan-shaped spray etc., as long as ejection of solvent just any form can be had.
Based on headed by wiper unit 120, carry out the linear motor of action according to control signal, motor 72, coating liquid supplying device 40 and cleaning unit 140 etc. be all electrically connected with control device 94.Further, according to enrolling the automatic running program of control device 94 to each device sending controling instruction signal, each device is made to carry out predetermined action.In addition, when condition changes, if suitably input change parameter to operation board 96, then this parameters convey is to control device 94, can realize the change of motion with this.
Relative to wiper unit 120, started by the long dimensional directions translational speed or cleaning controlling arbitrarily the gap nozzle 20 of cleaning part 200 and end position etc. can realize required arbitrary cleaning action.Relative to cleaning unit 140, from the jet velocity of solvent nozzle 142 or injecting time, predetermined cleaning action is carried out to cleaning part 200 by controlling arbitrarily solvent.
Fig. 3 represents the detailed formation of wiper unit 120.Wiper unit 120 comprises the support component 128 of pedestal 122, adjustment part 124, theta stage 126, securing cleaning parts 200.In addition, support component 128 and cleaning part 200 are referred to as cleaning unit 250.Pedestal 122 is directly fixed on bracket 104.In order to the unification illustrated, on pedestal cleaning part 200 configure direction as θ axle, bracket 104 along slider 106 direction as X-axis, slider 106 walk direction as Y-axis.X-axis is consistent with the direction of principal axis in the apparatus for coating of Fig. 1 with Y-axis.
Be configured with adjustment part 124 being fixed on above the pedestal 122 of bracket 104.Be described in detail later adjustment part 124, successively lamination be configured with rotate on X-θ face deflection angle adjusting device 130, to vertical direction deflection vertical direction deviator 132, can to the position regulator 136 of X-direction displacement.
In addition, above adjustment part 124, theta stage 126 is configured with.Theta stage 126 is configured with the cleaning part 200 being fixed on support component 128.
Cleaning part 200 is plate-shaped members of the substantially V-shaped with lip inclined-plane 34A, 34B of being suitable for gap nozzle 20.In addition, in order to be suitable for lip inclined-plane 34A, 34B of gap nozzle 20, accurate location, position be carried out, therefore will be formed accurately at the installed surface of support component 128.Remaining shape is not particularly limited.
Fig. 4 represents the example of the shape of cleaning part 200.With reference to Fig. 4 (a), cleaning part 200a is the groove 204 being formed with substantially V-like shape in the top of tabular.The shape of the aperture of V word or the bottom width of groove is formed according to the mode of the front end geometry being appropriate to gap nozzle 20.
Fig. 4 (b) represents the example of other cleaning part.Cleaning part 200b is formed with recess 208 on the bottom land 206 of the groove 204 of identical substantially V-like shape.This recess 208 is liquid falling slots of the attachment or cleaning fluid etc. of coating fluid for effectively discharging institute's wiping etc.The size of recess is not particularly limited, and can be the recess of the size reaching whole groove width 204w degree.In the present invention, can be combinationally used by these multiple cleaning parts, also can be only use a kind of cleaning part.In addition, the type of Fig. 4 (a) is referred to as without recess cleaning part 200a, the type of Fig. 4 (b) has been referred to as recess cleaning part 200b.
The surface of the cleaning part 200 at least groove 204 of substantially V-like shape is made up of macromolecule resin.More particularly, can use the resin of one or more mixing such as polytetrafluoroethylene (PTFE) (registration mark) resin, urethane resin, acrylic resin, mylar, acrylic resin, fluororesin, polybutadiene, nitrile rubber, silicon rubber, ethylene-vinyl acetate copolymer.In addition, EP rubbers, silicon rubber, butyl rubber, FFKM (trade name " Kalrez " etc.) etc. are also preferred, wherein preferably relative to the compactness of gap nozzle 20 or the resin relative to the patience of the solvent be included in coating fluid (METHYLPYRROLIDONE etc.), further excellent durability, most preferably silicon rubber from this viewpoint.
In addition, the part beyond the surface of the groove 204 of the shape of the roughly V of cleaning part 200 can be the macromolecule resin identical with this surface, in addition, can also be that diverse material is formed.In addition, in order to guarantee the compactness with gap nozzle 20 completely, the thickness of cleaning part 200 is set as more than 2mm, guarantees specific hardness.More particularly, about the flexible rubber hardness of expression, measure with C type spring hardness tester, preferably 50 ~ 90 °, more preferably 60 ~ 80 °.
In addition, in order to remove the electrostatic that occurs on the surface of cleaning part 200 and prevent the attachment of dust, for can electroconductive powder be mixed in the macromolecule resin on this surface.As one or more mixture of electroconductive powder preferably conductive carbon, platinum, gold, nickel, silver, copper, cobalt, tin, aluminium and palladium etc., and relative to macromolecule resin, by these electroconductive powders mixing 40 % by weight ~ 100 % by weight degree.
Fig. 4 (c) represents the side view of cleaning unit 250.Cleaning unit 250 comprises cleaning part 200 and support component 128.Cleaning part 200 is by the installed surface 128a of support component 128 fixes with the pressing plate 129 that screw can connect.The installed surface 128a of support component 128 is also identical with the installed surface 201 of cleaning part 200, is formed very accurately.
With reference to Fig. 3 and Fig. 4 (c), support component 128 is, keeps cleaning part 200, has the parts of the plane 128c that can be arranged on above theta stage 126 further at bottom surface 128b.The side view seen from X-direction is roughly pentagon, has the installed surface 128a of cleaning part 200 on top.From the top 128t downward to induce face 128i, front bevel 128f continuous.
Although bottom surface 128b has plane 128c, in order to theta stage 126 be connected accurately can the section of having difference etc., to be fitted together to.The installed surface 128a installing cleaning part 200 about to tilt 10 degree to 15 degree degree relative to bottom surface 128b.This is V-shaped groove 204 and gap nozzle 20 linear contact lay in order to make cleaning part 200.A support component 128 is prepared for a cleaning part 200.Therefore, the support component of each cleaning part 200 can be changed respectively.
In addition with reference to Fig. 3, theta stage 126 is the platforms carrying cleaning unit 250.Entreat rotating shaft 126 θ had above perpendicular to theta stage 126 wherein.Therefore, theta stage 126 rotates along rotating shaft 126 θ.This is to enable the posture of cleaning part 200 adjust to rotating shaft 126 θ direction.Theta stage can freely rotate in the angle of prescribed limit.This is to realize automatic core-adjusting function described later.The rotational steps of theta stage 126 is regulated by fine adjustment screw (not shown).
In addition, theta stage 126 have the plane 126c identical with the plane 128c of the bottom surface 128b of support component 128.That is, if clamp the parallel pad etc. in two sides between the plane 126c on the plane 128c and theta stage 126 of support component 128, then 126a can be regulated above theta stage 126 to the height of support component 128.In addition, the parts such as pad parallel for two sides are referred to as Height Adjustment parts, this plane (126c and 128c) on support component 128 and theta stage 126 is all called Height Adjustment face.
In addition, theta stage 126 has the width of the degree can carrying multiple cleaning unit 250.Method for loading above carries by tandem in the wiping direction (Y direction) of wiper unit 120.This is to carry out multiple wiping.The quantity of the cleaning unit 250 carried does not limit.Practical application carries out wiping with 2 to 3 cleaning parts 200 just enough, therefore also can to carry 2 to 3 cleaning units 250 just passable for theta stage 126.
In wiping, the decision of the installation site of the cleaning part 200 of last wiping and the previous cleaning part 200 of these parts is very important.Therefore, close according to rotating shaft 126 θ with theta stage 126 in wiper unit 120 of the present invention and fasten the mode that can have two positions relative to cleaning unit 250 and be provided with location position device.Location position device is not particularly limited.The simplest method is the boss forming convex form at one of theta stage 126 or support component 128, and the opposing party forms the boss hole takeing in boss.First position be theta stage 126 rotating shaft 126 θ immediately below the first support component desired location of the last support component 128 (cleaning part) of upper configuration.In addition, second position is the second support component desired location in the end above configuring rotating shaft 126 θ between support component and the previous support component of this parts.
First support component desired location orientates main method for loading as with the position of cleaning part 200 fixing on last cleaning unit 250.In addition, the second support component desired location be with on last and previous cleaning unit 250 carry cleaning part 200 all equably position location method for loading.As aftermentioned, in the present invention, by separately using such support component desired location and multiple wiping method can being adopted from the height of theta stage 126 to support component 128.
The position regulator 136 in X-direction (direction perpendicular to wiping direction) is configured with below theta stage 126.Although concrete structure is not particularly limited, preferably can straight line conveying structure, for use in XY platform.Position regulator 136 also can freely move within the limits prescribed.This is to realize automatic core-adjusting function described later.The region moved freely of the position regulator 136 of X-direction also can be adjusted by adjustment screw (not shown).
Vertical direction deviator 132 is configured with in the below of the position regulator 136 of X-direction.The substrate 132b that vertical direction deviator 132 has relative to itself is partial to vertical direction.As concrete structure, the elastomer 132e such as spring can be enumerated and be configured in structure between substrate 132b and compressive plane 132u.
Vertical direction deviator 132 needs when cleaning part 200 is pressed in gap nozzle 20, and angle change does not occur in the front and back of wiping direction (Y-direction).This is because the present invention is for feature with the height that can adjust multiple cleaning part 200.Illustrate in further detail with reference to Fig. 5.
Fig. 5 is the skeleton diagram of the wiper unit 120 seen from X-direction.With reference to Fig. 5 (a), theta stage 126 carries two cleaning units 251,252.The cleaning unit 252 at the rear in wiping direction (Y-direction) clamps pad 300 below support component 128, higher from the height of 126a above theta stage 126 than the cleaning unit 251 in front.The front end of gap nozzle 20 is crushed on such state.If vertical direction deviator 132 can rotate on Y-θ face, then two cleaning units 251,252 all with gap nozzle 20 close contact (Fig. 5 (b)).
As shown in Fig. 5 (c), the rotation of vertical direction deviator 132 of the present invention in Y-θ face is restricted, to make only to be partial to vertical direction relative to substrate 132b (i.e. pedestal 122).Can enumerate as concrete formation, the guide finger 132g before and after setting up in the Y direction, will be that the compressive plane 132u of level is by deflections such as elastomer 132e relative to this guide finger 132g.In addition, vertical direction deviator 132 can not arrange adjustment screw.But, preferably locking mechanism is set, can not move up and down when adjusting the position regulator 136 of X-direction.
Again with reference to Fig. 3, the below of deviator 132 is configured with the deflection angle adjusting device 130 of the angle in adjustment X-θ face in the vertical direction.Concrete formation is not particularly limited.It is the formation supporting upper and lower bracket 130u, 130d with the supporting pin 130p being parallel to Y-axis as the method the most easily realized.Use rotation platform also passable.
Deflection angle adjusting device 130 only with regulation angle from vertical direction (θ direction) in the lateral direction (X-direction) can freely rotate.Freely can be adjusted by deflection angle and start with the position regulator 136 (adding as theta stage 126 described later) of X-direction, even if contact with gap nozzle 20 and chimeric time there are some deviations in the X direction, but cleaning part 200 can contact with lip inclined-plane 34A and 34B suitably with the discharge actinal surface 36 of gap nozzle 20.Be referred to as the automatic core-adjusting function of wiper unit 120.
Further automatic core-adjusting function is described.Fig. 6 represents the gap nozzle 20 and wiper unit 120 seen from Y-direction.Wiper unit 120 represents the position regulator 136 of deflection angle adjusting device 130 and X-direction.That is, theta stage 126 and vertical direction deviator 132 is omitted.In addition, position regulator 136 parts of type making the lower plate 136d that fixes with lower side and can be combined movably between the upper plate 136u fixed with upper side.
With reference to Fig. 6 (a), deflection angle adjusting device 130 becomes state freely within the limits prescribed with position regulator 136.That is, wiper unit 120 tilts to a certain degree in the forward direction X-direction chimeric with gap nozzle 20, and position regulator 136 also moves to the direction tilted.
Then, with reference to Fig. 6 (b), if gap nozzle 20 drops to lower direction (-θ direction), then contact with the cleaning part 200 of wiper unit 120, wiper unit 120 is got up.More particularly, position regulator 136 starts mobile to arrow 280 direction, and deflection angle adjusting device 130 starts to arrow 281 direction to rotate.
Last with reference to Fig. 6 (c), if gap nozzle 20 drops to assigned position, then the groove of the V-shaped of cleaning part 200 is in the chimeric position of lip inclined-plane 34A, the 34B with gap nozzle 20, and position regulator 136 stops, and deflection angle adjusting device 130 also stops the rotation.Further, in fact theta stage 126 also can rotate with the angle of regulation, and therefore the deviation of Y-direction also can absorb within the limits prescribed.
As mentioned above, wiper unit 120 comprises deflection angle adjusting device 130 and position regulator 136, further, theta stage 126 has and freely hangs fixing automatic core-adjusting function within the limits prescribed, even if therefore the position relationship of gap nozzle 20 and wiper unit 120 has some deviations, but the cleaning part 200 of wiper unit 120 can be reliably chimeric with gap nozzle 20.Wiper unit is made up of each key element as above.
Then, the cleaning method utilizing and comprise the clearing apparatus 100 of wiper unit 120 is described with reference to Fig. 1 and Fig. 7.Fig. 7 is the side view that the expression wiper unit 120 seen from X-direction cleans the situation of gap nozzle 20.The cleaning unit 252 that the cleaning unit 251,252 being mounted in wiper unit 120 is configured in rear is configured on the first support component desired location on θ axle.In addition, holding shim 32 between cleaning unit 252 and theta stage 126.Configured like this by cleaning unit is to be made the cleaning unit 252 at rear contact well with gap nozzle 20 by automatic core-adjusting function.
First, clearing apparatus 100 is configured on initial position (right-hand end of the base station 2 of Fig. 1) in the X direction.At this moment, in Y-direction, wiper unit 120 is being cleaned on starting position (Fig. 7 (a)).If start cleaning, whole clearing apparatus 100 is moved, to make arrival immediately below the position that discharge actinal surface 36 and lip inclined-plane 34A, 34B of gap nozzle 20 are combined (Fig. 7 (a)) to X-direction.
Cleaning part 200, immediately below the leading section of gap nozzle 20, if arrive from outlet 30 the cleaning starting position that Y-direction departs from a little, then discharges from the outlet 30 of gap nozzle 20 coating fluid exceeding ormal weight.On the coating fluid discharge actinal surface 36 that is attached to gap nozzle 20 of discharging or lip inclined-plane 34A, 34B, and become the coating fluid 150 (Fig. 7 (b)) of attachment.
Then, gap nozzle 20 is declined and chimeric with cleaning part 200, that is, make gap nozzle 20 contact with cleaning part (Fig. 7 (c)).Now, gap nozzle 20 and cleaning part 200 are fitted like a glove be to catch up with by automatic core-adjusting function state the same.Now, vertical direction deviator 132 makes gap nozzle 20 decline, and preferred down position is the position that 0.5 ~ 5mm shrinks, and preferred down position is the position that 1 ~ 3mm shrinks.If vertical direction deviator 132 shrinks within the scope of this, then cleaning part 200 easily can follow the shift in position of the above-below direction of the leading section of gap nozzle 20.
Then, driver element 108 is driven, its state contacted with lip inclined-plane 34A, 34B with cleaning part 200 and the discharge actinal surface 36 of gap nozzle 20 to the direction of arrow (Y-direction) is moved, remove thus and clean be attached to gap nozzle 20 respectively discharge actinal surface 36 and lip inclined-plane 34A, 34B on coating fluid 150 and other attachment (Fig. 7 (d)).
Here the direction of arrow is the direction that cleaning part 200 carries out movement contact with gap nozzle 20 while, that is, glide direction, this direction of arrow is consistent with the long dimensional directions of Y-direction or gap nozzle 20.In addition, the coating fluid removed and other attachment become the coating fluid 152 that induction face 128i, front bevel 128f along cleaning part 200 or support component 128 flow out, and fall further on pallet 110, reclaim thus.
Cleaning part 200 continues to move to Y-direction, and in the position of the long dimensional directions end by gap nozzle 20, that is, stop in the position of not interfering with the long dimensional directions end of gap nozzle 20.Then, when whole wiper unit 120 moves to the initial position of X-direction, cleaning part 200 stops immediately below cleaning unit 140.When with this state, the solvent supplied by pipe arrangement 144 is sprayed from solvent nozzle 142, thus cleaning part 200 is cleaned (Fig. 7 (e)).Make cleaning part 200 involution to the cleaning starting position of Y-direction after cleaning terminates, repeat such cleaning method when being coated with afterwards at every turn.
Be more than the general introduction about cleaning method, but illustrate in greater detail cleaning method of the present invention with reference to Fig. 8.Fig. 8 is the enlarged drawing of the contact condition of the cleaning part 200 of the gap nozzle 20 and wiper unit of the present invention 120 seen from X-direction.The situation utilizing two cleaning units 251,252 is described with reference to Fig. 8 (a).This is that the cleaning unit 251 in the front of wiping direction (Y-direction) and the cleaning unit 252 at rear are all equipped with the unnotched cleaning part 200a as shown in Fig. 4 (a).Further, the cleaning unit 252 at rear clamps the pad 300 of specific thickness between theta stage 126.Further, the cleaning unit 252 at rear is configured on rotating shaft 126 θ of theta stage 126.That is, the first support component desired location is utilized.
With under such state, gap nozzle 20 is contacted with wiper unit 120, if filled in further, then the cleaning unit 252 at rear contacts with gap nozzle 20.But height low pad 300 height size of the cleaning unit 251 in front, does not therefore contact with gap nozzle 20.With reference to Fig. 8 (a-1), between gap nozzle 20 and cleaning part 200b, there is gap 302.On the other hand, with reference to Fig. 8 (a-2), there is no gap between gap nozzle 20 and cleaning part 200a, become the state of fully wiping.
That is, this cleaning method pushes without recess cleaning part 200a the attachment be attached on gap nozzle 20 with what do not have to contact aside in advance, and carry out the cleaning method of wiping with the cleaning part 200a at rear.Such cleaning method is the effective wiping method when the situation of wiping vestige easily occurs the pipe box of SUS.
In addition, if at this moment use jagged cleaning part 200b, can prevent from pushing aside or the attachment of wiping amasss bottom land (206 of Fig. 4 (b)) in V-shaped, attachment therefore can be prevented to be attached on gap nozzle 20 again.Particularly, when the character of used coating fluid above remains a lot of attachment at the outlet 30 (with reference to 2) of gap nozzle 20, preferably jagged cleaning part 200b is used.
So, when changing the height of multiple cleaning unit 250 and carry out wiping, the apparatus for coating 1 with wiper unit 120 of the present invention can adjust with comparalive ease.If the height relative to slider 106 independently two cleaning units 250 will be adjusted respectively, then to remain the difference in height of a side and the opposing party.But, under the state maintaining the upper and lower tracing ability of whole cleaning part, maintain this relation comparatively difficult.The apparatus for coating 1 with wiper unit 120 of the present invention is very effective in this.
Then with reference to Fig. 8 (b).Also be utilize two cleaning units 251,252 in this situation.Both the unnotched cleaning part 200a as Fig. 7 (a).The collocation method of cleaning unit 251,252 is rotating shaft 126 θ second support component desired locations between the cleaning unit 251 and the cleaning unit 252 at rear in front of theta stage 126.In addition, which cleaning unit also pad is not clamped at.That is, the cleaning part in front is positioned at the height identical with theta stage 126 with the cleaning part at rear.
If extruded with end in contact before this state and gap nozzle 20, then the cleaning part before and after respectively similarly with gap nozzle 20 before end in contact (with reference to Fig. 8 (b-1), (b-2)).If make wiper unit 120 walk with this state, then can carry out the secondary wiping of cleaning part.This is very effective for the pipe box manufactured by superhard alloy.
Even if utilizing the situation of multiple cleaning part 200 equably, the apparatus for coating 1 with wiper unit 120 of the present invention can make cleaning part contact with gap nozzle 20 with comparalive ease.
Then with reference to Fig. 8 (c).This situation carries a cleaning unit 250, identical with existing method on theta stage 126.In this case, cleaning unit 250 is configured in directly over rotating shaft 126 θ of theta stage 126, thus as Fig. 8 (a) contacts with gap nozzle 20, can carry out wiping.
Then the coating process by apparatus for coating 1 utilizing cleaning part of the present invention and cleaning method is explained.First, if make each operating member involution of apparatus for coating 1 to initial point, each operating member will move to position of readiness.Namely, the origin position that platform 6 moves to the left end (position represented by dashed line) of Fig. 1, gap nozzle 20 moves to topmost, and the mode that wiper unit 120 arrives the lower position of gap nozzle 20 according to pallet 110 from initial position (right-hand end of base station 2) moves.Now, cleaning part 200 is positioned at the position immediately below the outlet 30 of gap nozzle 20 in the X direction, but Y-direction as the long dimensional directions of gap nozzle 20 is positioned at the cleaning starting position of departing from a little from outlet 30 as shown in Fig. 7 (a).
At this, filled up coating fluid 66 from case 64 to gap nozzle 20, the operation of discharging the residual air in gap nozzle 20 also terminates.The state of coating liquid supplying device 40 is now, fill coating fluid 66, close aspirating valve 44, open supply valve 42, and piston 54 is positioned at bottom, is in the state that coating fluid 66 can be supplied to gap nozzle 20 at any time to liquid feeding device 52.
At first, make not shown jacking pin rise on the surface of platform 6, installing with not shown unloading is placed into the top of jacking pin by substrate A.Then, decline jacking pin makes substrate A be placed on platform 6, carries out absorption simultaneously and keeps.Meanwhile, coating liquid supplying device 40 is got into smooth, coating fluid 66 liquid-feeding pump 50 (surplus) that preset measured is supplied to gap nozzle 20, is discharged by coating fluid 66 from gap nozzle 20 to pallet 110.
Now, on the position of cleaning part 200 in the Y direction not immediately below outlet 30, the problem that the coating fluid 66 that therefore can not occur to discharge from the outlet 30 of gap nozzle 20 falls and adheres to.After stopping supply coating fluid 66, gap nozzle 20 is made to decline and cleaning part 200 is contacted with lip inclined-plane 34A, 34B with the discharge actinal surface 36 of gap nozzle 20, then make cleaning part 200 slide into the final position of Y-direction, clean as the discharge actinal surface 36 near the outlet 30 of gap nozzle 20 and lip inclined-plane 34A, 34B along the Y direction thus.
By such cleaning, complete and the internal path of gap nozzle 20 is filled up to completely initialization till outlet 30 with coating fluid 66.After cleaning terminates, make gap nozzle 20 rise to origin position, make wiper unit 120 move to X-direction simultaneously, involution is to (right-hand end of base station 2) on initial position.Now, it is cleaned to the cleaning part 200 stopped at immediately below cleaning unit 140 from solvent nozzle 142 ejection of solvent, then, cleaning part 200 is moved to the direction contrary with glide direction, by cleaning part 200 involution on the cleaning starting position of Y-direction.
After confirming that wiper unit 120 moves to initial position, the platform 6 of mounting substrate A starts mobile.Now, gap nozzle 20 is positioned on the origin position higher than the position of carrying out being coated with in the vertical direction, and liquid-feeding pump 50 stops, and is in holding state.Further, substrate A, by measuring substrate thickness during thickness transducer 90, stops platform 6 when the coating start portion of substrate A arrives immediately below the outlet 30 of gap nozzle 20.
Now, the thickness data of the substrate A measured by utilization drives oscilaltion unit 70, and according to the gap between the discharge actinal surface 36 of gap nozzle 20 and substrate A, namely, the mode that gap reaches the value preset makes gap nozzle 20 decline and stop.With the state that gap nozzle 20 and platform 6 stop completely, make the piston 54 of liquid-feeding pump 50 increase with fixing speed, discharge coating fluid 66 from gap nozzle 20 thus.Form pearl B between gap nozzle 20 and substrate A after, make platform 6 start to X-direction mobile with fixing speed, applied coating solution 66 is started to substrate A, forms coated film C thus.
Then, than substrate A coating end position a little before position arrive gap nozzle 20 outlet 30 immediately below after stop piston 54 and stop supply coating fluid 66.Then, when the coating end position of substrate A arrives immediately below the outlet 30 of gap nozzle 20, oscilaltion unit 70 is driven to make gap nozzle 20 increase.Thus, cut off the pearl formed between substrate A and gap nozzle 20 and terminate coating.
Platform 6 continues mobile during this period, stops, then removing the absorption to substrate A behind position of reaching home, and makes jacking pin increase to promote substrate A.Now, kept below substrate A by not shown installation of unloading, and be transported to next operation.Substrate A is transferred to unload installation rear platform 6 make jacking pin decline allow its involution to origin position.After platform 6 involution to origin position, the mode making wiper unit 120 arrive the lower position of the outlet 30 of gap nozzle 20 according to pallet 110 moves.
After mobile end, open aspirating valve 44, close supply valve 42, piston 54 is declined, thus coating fluid 66 is filled in liquid feeding device 52.After end-of-fill, stop piston, close aspirating valve 44, open supply valve 42, wait for the arrival of next substrate A, so repeat identical action.
In addition, as the coating fluid that the present invention can be suitable for, consider from coating, preferably viscosity is 1mPas ~ 100mPas, more preferably 1mPas ~ 50mPas, has Newtonianism (Newtonian), is also suitable for and has thixotropic coating fluid.Especially coating use solvent volatility high, effective when being such as the coating fluid of PGMEA, butyl acetate, ethyl lactate etc.
Specifically, as the example of the coating fluid that can be suitable for, except the black matrix of above-mentioned chromatic filter, RGB color pixel formation coating fluid, also have resist liquid, lagging material becomes material etc. with cylindrical.As the applied parts of substrate, the metallic plates such as aluminium, pottery, silicon chip etc. can also be used except using glass.
Further, as the application conditions that coating speed etc. uses, coating speed is 10mm/s ~ 600mm/s preferably, more preferably 100mm/s ~ 300mm/s, the sliding speed preferably 100mm/s ~ 1000mm/s of cleaning part 200, more preferably 200mm/s ~ 600mm/s, preferably 50 μm ~ 1000 μm, the lip gap of gap nozzle, more preferably 80 μm ~ 200 μm, coating thickness preferably 1 μm ~ 50 μm in a wet state, more preferably 2 μm ~ 20 μm.
The apparatus for coating of the present invention except using when can be used in and manufacture chromatic filter etc., the substrate that can also be used in array base palte, plasma scope panel, optical filter etc. is formed in the manufacture of the various parts of display of even and high-quality coated film.

Claims (4)

1. an apparatus for coating, is characterized in that, this apparatus for coating comprises:
Coating liquid supplying device, for supplying coating fluid;
Spreader, has and is communicated with described coating liquid supplying device and discharges the outlet of described coating fluid slit-shaped;
Mobile device, for making described spreader and applied parts relative movement;
Clearing apparatus, the wiping direction to the slit direction along described outlet is moved, and slides on the outlet periphery of described spreader and remove attachment;
Wherein, described clearing apparatus comprises:
Cleaning unit, is cleaned by the cleaning part be supported on support component;
Theta stage, for placing multiple described cleaning unit on described wiping direction;
Wiper unit, comprises the pedestal supporting described theta stage;
The described support component and described theta stage of described cleaning unit are formed the height adjusting range for its clamped height adjustment member,
Described apparatus for coating is configured with vertical direction deviator, and described theta stage is partial on the direction perpendicular to described pedestal.
2. an apparatus for coating, is characterized in that, this apparatus for coating comprises:
Coating liquid supplying device, for supplying coating fluid;
Spreader, has and is communicated with described coating liquid supplying device and discharges the outlet of described coating fluid slit-shaped;
Mobile device, for making described spreader and applied parts relative movement;
Clearing apparatus, the wiping direction to the slit direction along described outlet is moved, and slides on the outlet periphery of described spreader and remove attachment;
Wherein, described clearing apparatus comprises:
Cleaning unit, is cleaned by the cleaning part be supported on support component;
Theta stage, for placing multiple described cleaning unit on described wiping direction;
Wiper unit, comprises the pedestal supporting described theta stage;
The described support component and described theta stage of described cleaning unit are formed the height adjusting range for its clamped height adjustment member,
Described theta stage has perpendicular to the rotating shaft above it,
This apparatus for coating comprises the position regulator in the direction vertical relative to described wiping direction of described theta stage, and adjustment is relative to the deflection angle adjusting device of the deflection angle in described wiping direction.
3. apparatus for coating according to claim 1 and 2, it is characterized in that, the described theta stage had perpendicular to the rotating shaft above it comprises: the first support component desired location, and described rotating shaft is configured in immediately below the last described cleaning unit in described wiping direction; Second support component desired location, described rotating shaft is configured between the last cleaning unit in wiping direction and the previous cleaning unit of described last cleaning unit.
4. apparatus for coating according to claim 3, it is characterized in that, on described theta stage, two described cleaning units are equipped on described first support component desired location, its clamped height adjustment member between the height adjusting range of the described support component at the rear in described wiping direction and the height adjusting range of described theta stage, on described wiping direction, the support component at described rear is supported higher according to its height than the described support component in front above theta stage, do not contacted with described outlet by the cleaning part of the described support member supports in the front in described wiping direction.
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