CN106607396A - Cleaning head and cleaning method - Google Patents
Cleaning head and cleaning method Download PDFInfo
- Publication number
- CN106607396A CN106607396A CN201610592679.7A CN201610592679A CN106607396A CN 106607396 A CN106607396 A CN 106607396A CN 201610592679 A CN201610592679 A CN 201610592679A CN 106607396 A CN106607396 A CN 106607396A
- Authority
- CN
- China
- Prior art keywords
- foreign body
- suction port
- cleaning
- air suction
- cleaning head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 160
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000007921 spray Substances 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 27
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 210000003128 head Anatomy 0.000 description 20
- 230000032258 transport Effects 0.000 description 9
- 239000000428 dust Substances 0.000 description 7
- 238000007790 scraping Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 239000012634 fragment Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2220/00—Type of materials or objects being removed
- B08B2220/01—Adhesive materials
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides a cleaning head and a cleaning method. The cleaning head has a cleaning function of simply and rapidly removing foreign matters on and around an air attraction port (12) of a head main body, and improves quality of a substrate and reduces manufacturing cost of the substrate. The cleaning head (100) comprises a moving portion (22) and a foreign matter removing portion (23). The moving portion (22) is guided and supported by a guiding supporting portion (21) which is arranged on the head main body (10), and the moving portion moves relative to the length direction of the air attraction port (12) roughly in parallel. The foreign matter removing portion (23) moves together with the moving portion (22), and the foreign matter removing portion removes foreign matters on the air attraction port (12) and around the air attraction port (12) through touch.
Description
Technical field
The present invention relates to have the cleaning head and its cleaning method of the function of being cleaned to air suction port and its surrounding.
Background technology
In the manufacture of the various substrates such as semiconductor wafer, the glass plate of liquid crystal display, thin film (hereinafter referred merely to as substrate)
In operation, need into being about to the dedusting that dust is removed from substrate surface.For example, configure clear above the horizontal transport path of substrate
Clean head, dedusting is carried out by cleaning head to the substrate for being transported.
Air jet and air suction port are formed with the bottom surface of cleaning head.Air jet and air suction port be
Relative to slit long in substrate conveyance direction generally perpendicular direction.The air jet of cleaning head is to the substrate spray for being transported
Penetrate clean air and blow away dust, in addition, air suction port sucks the dust for dispersing together with the air of surrounding from substrate, it is right
Substrate whole surface carries out dedusting.
The fragment of glass or thin film can be sandwiched in the air suction port of the cleaning head, or fragment sticks to sky due to electrostatic
Around gas suction port.The foreign body may cause to damage to the substrate for being transported.In addition, be especially clipped in air in foreign body attracting
In the case of mouthful, captivation weakens at the position, and can not carry out the dedusting at the position.Anchor at air suction port and its surrounding
Foreign body reduce substrate quality, and make the yield penalty of substrate manufacture.
In recent years, with substrate maximization and slimming propulsion, even the naked eyes anchored on cleaning head are difficult to
The less foreign body for confirming is also possible to produce big impact to substrate quality.
Need to carry out foreign body cleaning removing to prevent the reduction of substrate quality, but not can determine that such foreign body is
When set.Therefore, in conventional cleaning work, foreign body set is judged as when generation substrate is bad, operating personnel is led to
Cross wiping to carry out cleaning removing to the foreign body for anchoring at air suction port and its surrounding.
However, there was only several millimeters from transport table to the gap of cleaning head bottom surface, air suction port and its surrounding are in
Narrow position, it is not easy to which the cleaning that foreign body is carried out by wiping is removed.Except there is poor operability in the cleaning work
Beyond problem, also become the main cause of the dust for producing new.
And, if causing the dwell time of manufacturing equipment elongated due to the cleaning work operating difficultiess, have lost
Manufacturing time, and human cost also increases.In such prior art, exist due to foreign body anchor at it is on cleaning head and right
The problem of the manufacturing cost increase that it carries out cleaning removing and causes.
Then, it is proposed that air suction port and its foreign body of surrounding simply and rapidly to cleaning head is mechanically carried out clearly
This problem is gone in cleaning.Currently without the existing skill for finding the device that such air suction port to cleaning head is cleaned
Art.
In the other technologies field different from cleaning head, such as in patent documentation 1 (No. 4773209 publication of special permission)
Disclose the prior art of the device for mechanically being cleaned to foreign body.In the part press device of patent documentation 1, in its figure
Having recorded in 6A, Fig. 6 B, Fig. 3 A, Fig. 3 B etc. makes the cleaning part 21 of brush and sac like with the upper surface of table top 17 and to level side
The construction of foreign body is removed to movement.
In addition, for example disclose in patent documentation 2 (No. 4031625 publication of special permission) mechanically cleaning to foreign body
Device other prior arts.In the device for assembling electronic device of patent documentation 2, in its Fig. 3, Fig. 4 etc. profit is recorded
The construction of the foreign body of the upper surface of bearing-surface is removed with brush 10.
In addition, for example disclose in patent documentation 3 (No. 3757215 publication of special permission) mechanically cleaning to foreign body
Device other prior arts.In the dust arrester of patent documentation 3, record in its Fig. 5 etc. by the second scraper plate 40
The scraping of scraping portion 41 be clipped in dust on the tooth 31 of the first scraper plate 30.
In addition, for example disclose in patent documentation 4 (JP 2014-46502 publication) mechanically carrying out clearly to foreign body
Other prior arts for the device swept.In the liquid injection apparatus of patent documentation 4, especially record in its Fig. 5, Fig. 6
Cleaning part 40 is set to contact with the liquid jet face 12 of jet head liquid 10 and move horizontally to remove foreign body.
In the cleaning head of prior art, due to seldom there is this phenomenon of foreign body set and thing followed problem, institute
Not account for these problems.Therefore, not being conceived to the foreign body mechanically to being attached on cleaning head carries out cleaning removing
This point.
Device described in patent documentation 1~4 carries out cleaning removing by contacting to foreign body, but does not all disclose
The device that the foreign body of the air suction port of cleaning head and its surrounding is removed.
Patent documentation 1:No. 4773209 publication (Fig. 6 A, Fig. 6 B, Fig. 3 A, Fig. 3 B) of (Japan) franchise
Patent documentation 2:No. 4031625 publication (Fig. 3, Fig. 4) of (Japan) franchise
Patent documentation 3:No. 3757215 publication (Fig. 5) of (Japan) franchise
Patent documentation 4:(Japan) JP 2014-46502 publication (Fig. 5, Fig. 6)
The content of the invention
Invent technical problem to be solved
The present invention is made to solve the above-mentioned problem newly noticed, be its object is to, there is provided a kind of cleaning head
And cleaning method, the cleaning of foreign body of the cleaning head with the air suction port and its surrounding for simply and rapidly removing the main body that decaptitates
Function, improves can substrate quality and reduce manufacturing cost.
For solving the technical scheme of technical problem
In order to solve above-mentioned technical problem, the invention described in technical scheme 1 is characterised by,
Cleaning head is equipped with:Head main body, it is formed with the longitudinal direction the air suction port for becoming elongated hole;Clean dress
Put, its air suction port and its surrounding to the head main body is cleaned;
The clearing apparatus possesses:
Guiding support, it is installed on the head main body;
Move portion, it is supported by the guiding support guiding, and relative to the length direction of the air suction port
Move substantially in parallel;
Foreign body removing section, it is moved together with the move portion, and the air suction port and its week are removed by contact
The foreign body for enclosing.
In addition, the invention described in technical scheme 2 is characterised by,
In the cleaning head described in technical scheme 1,
The foreign body removing section is bar-shaped or strip the length almost parallel with the bottom surface for being formed with the air suction port
Shape thing, the elongated thing is contacted with the air suction port and its surrounding and cleaned.
In addition, the invention described in technical scheme 3 is characterised by,
In the cleaning head described in technical scheme 1,
The foreign body removing section is the almost parallel rotary shaft in bottom surface for being pivotally supported on and being formed with the air suction port
On roller, roller rotation, and contact with the air suction port and its surrounding and cleaned.
In addition, the invention described in technical scheme 4 is characterised by,
In the cleaning head described in technical scheme 3,
The roller for antistatic electrostatic roller.
In addition, the invention described in technical scheme 5 is characterised by,
In the cleaning method cleaned using the clearing apparatus described in technical scheme 1,
Cleaned in the state of the attraction from the air suction port is stopped.
In addition, the invention described in technical scheme 6 is characterised by,
In the cleaning method described in technical scheme 5,
Cleaned in the state of the air ejiction opening from the cleaning head sprays clean air.
In addition, the invention described in technical scheme 7 is characterised by,
In the cleaning method cleaned using the clearing apparatus described in technical scheme 1,
The foreign body sensor monitored to the air suction port and its surrounding is configured, based on from foreign body biography
The detection signal of sensor is cleaned when being judged as existing foreign body.
In addition, the invention described in technical scheme 8 is characterised by,
In the cleaning method cleaned using the clearing apparatus described in technical scheme 1,
Transport table is configured to have valve in the underface of the cleaning head, the valve is made when cleaning in unlatching
State, makes the foreign body of removing via the lower section that the transport table is fallen under the valve.
Beneficial effect
In accordance with the invention it is possible to provide a kind of cleaning head and cleaning method, the cleaning head has and simply and rapidly removes
The cleaning function of the foreign body of the air suction port and its surrounding of head main body, improves can substrate quality and drop manufacturing cost
It is low.
Description of the drawings
Fig. 1 (a) and Fig. 1 (b) they are the explanatory diagrams for implementing the cleaning head of the first embodiment of the present invention, wherein, Fig. 1
A () is side view, Fig. 1 (b) is front view.
Fig. 2 (a) and Fig. 2 (b) they are the explanatory diagrams for implementing the cleaning head of second embodiment of the present invention, wherein, Fig. 2
A () is side view, Fig. 2 (b) is front view.
Fig. 3 (a)~Fig. 3 (d) is the explanatory diagram for implementing the use example of the cleaning head of the first embodiment of the present invention,
Wherein, Fig. 3 (a) is the side view of the cleaning head of the state before cleaning, and Fig. 3 (b) is facing for the cleaning head of the state before cleaning
Figure, Fig. 3 (c) is the side view of the cleaning head of the state in cleaning, and Fig. 3 (d) is the front view of the cleaning head of the state in cleaning.
Fig. 4 is the explanatory diagram for implementing the use example of the cleaning head of second embodiment of the present invention.
Fig. 5 (a) and Fig. 5 (b) are for implementing saying for other use examples of the cleaning head of the first embodiment of the present invention
Bright figure, wherein, Fig. 5 (a) is side view, and Fig. 5 (b) is front view.
Fig. 6 (a) and Fig. 6 (b) are for implementing saying for other use examples of the cleaning head of second embodiment of the present invention
Bright figure, wherein, Fig. 6 (a) is side view, and Fig. 6 (b) is front view.
Description of reference numerals
100、200:Cleaning head
10:Head main body
11:Air ejiction opening
12:Air suction port
13:Gas supply part
14:Exhaust portion
20、30:Clearing apparatus
21:Guiding support
22:Move portion
23:Foreign body removing section (elongated thing)
24:Foreign body removing section (roller)
300:Transport table
301:Valve
400:Opposed cleaning head
Specific embodiment
Hereinafter, referring to the drawings, the cleaning head 100 of the first embodiment to being used to implement the present invention is illustrated.Such as Fig. 1
Shown, the cleaning head 100 possesses a main body 10 and clearing apparatus 20.
Head main body 10 is also equipped with air jet 11, air suction port 12, gas supply part 13, exhaust portion 14.Head main body 10
Shape is illustrated as the cuboid formed by six faces.Though it is not illustrated, bottom surface be formed with two it is parallel linear
Elongated hole is air jet 11 and air suction port 12, and the air jet 11 and the air suction port 12 are formed as in head main body
It is long on 10 length direction (left and right directions of Fig. 1 (b)).Spray empty from the cleaning of the supply of gas supply part 13 from air jet 11
Gas.Then, the dust for air suction port 12 being attracted is discharged from exhaust portion 14.
Clearing apparatus 20 also includes:Guiding support 21, move portion 22, foreign body removing section 23.
As shown in Fig. 1 (b), guiding support 21 is formed in the front of a main body 10, for example in the length of head main body 10
Long track on direction (left and right directions of Fig. 1 (b)).It should be noted that in FIG, guiding support 21 is installed in head master
The height and position in the front stage casing of body 10, but it is also possible in order to be arranged on the height of front hypomere near the bottom surface of head main body 10
Position.
Move portion 22 is slided and mobile using one end along guiding support 21.In addition, in the another of the move portion 22
End is provided with foreign body removing section 23.Foreign body removing section 23 and move portion 22 be integrally formed and along guiding support 21 in length
Move on direction (left and right directions of Fig. 1 (b)).
In detail, foreign body removing section 23 is in the length with the air jet 11 and air suction port 12 for becoming elongated hole
Direction generally perpendicular direction, and be in the bottom surface with the head main body 10 for being formed with air jet 11 and air suction port 12
Direction that be substantially parallel bar-shaped or strip the elongated thing of length.In the elongated thing, at least abut with the bottom surface of head main body 10
Side or face be parallel.It should be noted that in FIG, exist between the bottom surface of head main body 10 and foreign body removing section 23
The gap that naked eyes are able to observe that, but this is, for the ease of diagram, to be practically at the state of contact.
The foreign body removing section 23 is formed by harder part, and the harder part has the journey for not damaging air suction port 12
The elasticity of degree.Foreign body removing section 23 is preferably with the air suction port 12 of appropriate power press head main body 10 and its surrounding
Hard.
Foreign body removing section 23 using bar-shaped or strip elongated thing flexibly mounted effect, while with air suction port 12
And its surrounding linear contact lay or face contact are while move, and scrape the foreign body of air suction port 12 and its surrounding.Need explanation
It is, because air jet 11 almost blows away all of foreign body, so the probability of foreign body set is minimum, but foreign body removing section 23
Also air jet 11 can be cleaned, also includes air jet 11 (below, in this explanation around above-mentioned air suction port 12
Similarly it is defined in book).
Then, the principle of the cleaning to being carried out using the cleaning head 100 of the present invention is illustrated.In the sky of cleaning head 100
In the case that gas suction port 12 sandwiches or the foreign bodies such as glass fragment are fixed with around it, from empirically, it is known that by making foreign body
With certain component contact and it is easily fallen, by stopping attraction falling foreign body.These Combination of Methods are carried out
Clean.
Then, the cleaning method of the cleaning head 100 of present embodiment is illustrated.Assume in foreign bodies such as glass fragments
The air suction port 12 or foreign body for being clipped in a main body 10 is attached to around the air suction port 12 of a main body 10 due to electrostatic force
State.First, the injection and the attraction from air suction port 12 from air jet 11 is stopped.Thus, it is being clipped in air suction
Draw the captivation applied on the foreign body of mouth 12 to disappear, easily take out foreign body.Then, in foreign body removing section 23 and air suction port 12
And its in the state of surrounding linear contact lay or face contact, operating personnel moves move portion 22, and foreign body removing section 23 is in length direction
The foreign body of upper movement, the scraping air of foreign body removing section 23 suction port 12 and its surrounding.
Foreign body removing section 23 is adjusted so as to be appropriate power to the pressing force of air suction port 12 and its surrounding, and
And foreign body removing section 23 is in close contact and scrapes taking foreign body.Now, due to stopped attraction, foreign body is easily made from air by contact
Suction port 12 and its surrounding fall.
Then, invert it when foreign body removing section 23 moves to the end of one side of left and right, to the direction of return-to-home position
It is mobile.Finally, foreign body removing section 23 is made to be parked in its initial position of readiness.The cleaning is not carrying out free time of dedusting etc. calmly
Phase is carried out, or is carried out when foreign body is found.According to the cleaning head 100 of such present embodiment, can easily to air
Suction port and its surrounding are cleaned.
Then, referring to the drawings, the cleaning head 200 to being used to implement second embodiment of the present invention is illustrated.Such as Fig. 2
Shown, the cleaning head 200 possesses a main body 10, clearing apparatus 30.
First, compared with the first embodiment illustrated using Fig. 1, in this second embodiment, head main body 10 with
The structure of the first embodiment for illustrating before is identical, but clearing apparatus 30 is different from the structure of first embodiment.The cleaning
Device also includes guiding support 21, move portion 22, foreign body removing section 24.In the present embodiment, only foreign body removing section 24
It is different.
Therefore, correct main body 10, the guiding support 21 of clearing apparatus 30 and move portion 22 mark identical reference
And the repetitive description thereof will be omitted, only the foreign body removing section 24 of different clearing apparatus 30 is illustrated.It should be noted that
In Fig. 2, there is the gap that naked eyes are able to observe that between the bottom surface of head main body 10 and foreign body removing section 24, but this is in order to just
In diagram, the state of contact is practically at.
In detail, the foreign body removing section 24 of clearing apparatus 30 is in the length with air jet 11 or air suction port 12
Degree direction generally perpendicular direction, and be e axle supporting roller on the rotary shaft, the rotary shaft be formed with air jet
11 or the bottom surface of head main body 10 of air suction port 12 direction that be substantially parallel length.The roller is, for example, the cylindrical brush of profile
Son, rubber, sponge are wound with part of cloth etc. on the surface of cylinder.Air suction port is scraped by using such roller
12 and its foreign body of surrounding.
Also, it is preferred that electrostatic roller of the roller for antistatic.By using electrostatic roller, subtract except removing the electrostatic of bottom surface
Beyond weak electrostatic force, the foreign body adhered to due to electrostatic force can also be scraped and cleaned.
In the cleaning carried out using foreign body removing section 24, while move portion 22 is moved, roller is foreign body removing section 24
Rotate and with appropriate pressing force sliding contact relative to suction port 12 and its surrounding, so as to scrape air suction port 12 and its week
The foreign body for enclosing.
Then, the cleaning method of the cleaning head 200 of present embodiment is illustrated.Assume in foreign bodies such as glass fragments
The air suction port 12 or foreign body for being clipped in a main body 10 is sticked to around the air suction port 12 of a main body 10 due to electrostatic force
State.First, the injection and the attraction from air suction port 12 from air jet 11 is stopped.Then, in foreign body removing section
In the state of 24 contact with air suction port 12 and its surrounding, operating personnel moves move portion 22, and foreign body removing section 24 is being grown
Degree side moves up, the foreign body of the scraping air of foreign body removing section 24 suction port 12 and its surrounding.
Foreign body removing section 24 is adjusted so as to be appropriate power to the pressing force of air suction port 12 and its surrounding, it is different
The rotating contact of thing removing unit 24 and scrape taking foreign body.Now, due to stopped attraction, foreign body is easily from air suction port 12 and its week
Enclose and fall.
Then, invert it when foreign body removing section 24 moves to the end of one side of left and right, to the direction of return-to-home position
It is mobile.Finally, foreign body removing section 24 is made to be parked in its initial position of readiness.The cleaning is not carrying out free time of dedusting etc. calmly
Phase is carried out, or is carried out when foreign body is found.According to the cleaning head 200 of such present embodiment, can easily to air
Suction port and its surrounding are cleaned.
It should be noted that in cleaning head, to the embodiment party of foreign body removing section 23 and second using first embodiment
Any one in the foreign body removing section 24 of formula is illustrated, but in addition, for same cleaning head, it is also possible to according to circumstances
Elongated thing i.e. foreign body removing section 23 is installed and becomes the cleaning head 100 of first embodiment, or mounted roller is foreign body removing section
24 cleaning heads 200 for becoming second embodiment, use so as to suitably distinguish.
In addition, in the cleaning head 100,200 of first, second embodiment, stopping the injection from air jet 11
With the attraction from air suction port 12 and cleaned, but it is also possible to make from the attraction of air suction port 12 to stop and from air
Jet 11 is cleaned in the state of spraying.In such a case it is possible to blow away the foreign body of scraping.Alternatively, it is also possible to make from
The injection of air jet 11 stops and is cleaned in the state of attracting from air suction port 12.In such a case it is possible to inhale
Draw the foreign body of scraping.Can according to circumstances and suitably be adopted.
Then, the other embodiment of cleaning method is illustrated.The embodiment is to being said using Fig. 1 before
The cleaning method that the cleaning method of the cleaning head 100 of bright first embodiment is improved.Although not illustrating, possess to clear
The foreign body sensor that the air suction port 12 of clean 100 and its surrounding are monitored.
Such as foreign body sensor is photographic head, image to the air suction port without foreign body and its surrounding and taken
Air suction port and its image of surrounding be compared, be judged to have foreign body to adhere to by the change of image in operating personnel
When, operating personnel starts to clean.Can also be further equipped with being driven move portion 22 control unit of control, control unit is based on
The detection signal of foreign body sensor is driven control to move portion 22, so as to start to clean.In addition it is also possible to by output section with
Control unit connects, and notifies that operating personnel is judged as needing to clean by sound or display.And can also be by the cleaning side
Second cleaning method of the cleaning head 200 of the second embodiment that method is illustrated before being applied to using Fig. 2.Can use all
Such as such cleaning method.
Then, the other embodiment of cleaning method is illustrated.The embodiment is to making for illustrating before
The mode further improved with the cleaning method of the cleaning head 100 of first embodiment.The cleaning method is entered with reference to Fig. 3
Row explanation.As shown in Fig. 3 (a), Fig. 3 (b), substrate is transported in the downside of cleaning head 100 using transport table 300.
Transport table 300 transports successively substrate from upstream side (being right side in Fig. 3 (a)).Then, by cleaning head 100
During lower section, cleaning head 100 carries out dedusting.
Valve 301 is configured with the underface of cleaning head 100.As shown in Fig. 3 (a), when common substrate is transported, valve
301 close, and shown in such as Fig. 3 (b), the move portion 22 of clearing apparatus 20 stops.
When cleaning, stop the injection from air jet 11 and the attraction from air suction port 12, and such as Fig. 3
Shown in (c), valve 301 is set to be in opening.Then, as shown in Fig. 3 (d), made the move portion 22 by clearing apparatus 20
Action and the foreign body that removes are via the lower section that transport table 300 is fallen under valve 301.Thus, the removing of foreign body is carried out.Need explanation
, in the cleaning method, it is also possible to be used together with the cleaning method of above-mentioned use foreign body sensor.
In addition, as shown in Figure 4, it is also possible to the profit for illustrating before will be applied to using the cleaning method of the valve 301
With the cleaning method of the cleaning head 200 of second embodiment.In addition, the cleaning method can also be with above-mentioned use foreign body sensor
Cleaning method be used together.
Then, other embodiment is illustrated.As shown in Fig. 5 (a), Fig. 5 (b), the embodiment is that it advances
The cleaning head 100 of the first embodiment of row explanation is configured in upside, and opposed cleaning head 400 is configured into the enforcement in downside
Mode.In this case, it is narrow space between cleaning head 100 and opposed cleaning head 400, but can configures in the space
The foreign body removing section 23 of cleaning head 100, and air suction port 12 is cleaned.In this case, cleaning head 100 with it is opposed
Cleaning head 400 is attracted simultaneously such that it is able to by attracting from the foreign body up and down to scraping, removed so as to carry out cleaning
Go.Also the cleaning head of the dedusting on such substrate two sides can be applied to.
Then, other embodiment is illustrated.As shown in Fig. 6 (a), Fig. 6 (b), the embodiment is that it advances
The cleaning head 200 of the second embodiment of row explanation is configured in upside, and opposed cleaning head 400 is configured into the enforcement in downside
Mode.In this case, it is narrow space between cleaning head 200 and opposed cleaning head 400, but can configures in the space
The foreign body removing section 24 of cleaning head 200, and air suction port 12 is cleaned.In the case of, cleaning head 200 is clear with opposed
Attracted together for clean 400 such that it is able to by carrying out cleaning removing from the foreign body for attracting to scrape up and down.Also can be suitable for
In the cleaning head of the dedusting on such substrate two sides
More than, the cleaning head and cleaning method of the present invention are illustrated referring to the drawings.It should be noted that envisioning it
Before the cleaning head that illustrates be illustrated for the PV type cleaning heads with an air jet and air suction port, but
Can also be that VPV types cleaning head that an air jet is configured between two air suction ports or an air suction port are matched somebody with somebody
Put the PVP type cleaning heads between two air jets.The present invention can also be implemented in this case.
In addition, as shown in Fig. 1 (b) or Fig. 2 (b), the cleaning head for illustrating configures clearing apparatus 20 in face side before
Guiding support 21, but can not face side and overleaf side it is (not shown) configuration guiding support 21.In such feelings
Under condition, it is also possible to implement the present invention.
These cleaning heads from the description above and cleaning method, inhale with the air simply and rapidly except the main body that decaptitates
Draw the cleaning function of the foreign body of mouth and its surrounding, as a result, improving can substrate quality and reduce manufacturing cost.
Industrial applicibility
The cleaning head and cleaning method of the present invention can be applied to the system of the various substrates used in electric, electronic product
Make.
Claims (8)
1. a kind of cleaning head, it is characterised in that be equipped with:Head main body, it is formed with the longitudinal direction the air for becoming elongated hole
Suction port;Clearing apparatus, its air suction port and its surrounding to the head main body is cleaned;
The clearing apparatus possesses:
Guiding support, it is installed on the head main body;
Move portion, its by it is described guiding support guiding supporting, and relative to the air suction port length direction substantially
It is moved parallel to;
Foreign body removing section, it is moved together with the move portion, and the air suction port and its surrounding are removed by contact
Foreign body.
2. cleaning head as claimed in claim 1, it is characterised in that
The foreign body removing section is bar-shaped or strip the elongated thing almost parallel with the bottom surface for being formed with the air suction port,
The elongated thing is contacted with the air suction port and its surrounding and cleaned.
3. cleaning head as claimed in claim 1, it is characterised in that
The foreign body removing section is to be pivotally supported on and be formed with the almost parallel rotary shaft in the bottom surface of the air suction port
Roller, the roller rotation, and contact with the air suction port and its surrounding and cleaned.
4. cleaning head as claimed in claim 3, it is characterised in that
The roller for antistatic electrostatic roller.
5. a kind of cleaning method, it is characterised in that
Usage right requires that the clearing apparatus described in 1 is cleaned,
Cleaned in the state of the attraction from the air suction port is stopped.
6. cleaning method as claimed in claim 5, it is characterised in that
Cleaned in the state of the air ejiction opening from the cleaning head sprays clean air.
7. a kind of cleaning method, it is characterised in that
Usage right requires that the clearing apparatus described in 1 is cleaned,
The foreign body sensor monitored to the air suction port and its surrounding is configured, based on from the foreign body sensor
Detection signal cleaned when being judged as existing foreign body.
8. a kind of cleaning method, it is characterised in that
Usage right requires that the clearing apparatus described in 1 is cleaned,
Transport table is configured to have valve in the underface of the cleaning head, the valve is made when cleaning in unlatching shape
State, makes the foreign body of removing via the lower section that the transport table is fallen under the valve.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015208587A JP6465489B2 (en) | 2015-10-23 | 2015-10-23 | Cleaning head and cleaning method |
JP2015-208587 | 2015-10-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106607396A true CN106607396A (en) | 2017-05-03 |
Family
ID=58615047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610592679.7A Pending CN106607396A (en) | 2015-10-23 | 2016-07-25 | Cleaning head and cleaning method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6465489B2 (en) |
KR (1) | KR102608681B1 (en) |
CN (1) | CN106607396A (en) |
TW (1) | TW201714676A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107199188A (en) * | 2017-06-12 | 2017-09-26 | 京东方科技集团股份有限公司 | Coating machine, coating system and coating machine clean method |
CN108543671A (en) * | 2018-04-23 | 2018-09-18 | 深圳市华星光电技术有限公司 | A kind of cleaning device, coating machine |
CN111299245A (en) * | 2018-12-11 | 2020-06-19 | 韶阳科技股份有限公司 | Gas circulation device |
US20210129189A1 (en) * | 2019-10-30 | 2021-05-06 | Shenzhen Cannice Technology Co., Ltd. | Earphone storage device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112657946A (en) * | 2020-12-02 | 2021-04-16 | 深圳市华星光电半导体显示技术有限公司 | Cleaning device and exposure machine |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05208154A (en) * | 1991-08-29 | 1993-08-20 | Fuji Photo Film Co Ltd | Method for washing coater edge and apparatus therefor |
JP2004066164A (en) * | 2002-08-08 | 2004-03-04 | Dainippon Printing Co Ltd | Coating head cleaning device and cleaning method |
CN1638033A (en) * | 2004-01-08 | 2005-07-13 | 大日本网目版制造株式会社 | Substrate processing apparatus |
TW200536615A (en) * | 2004-03-25 | 2005-11-16 | Tokyo Ohka Kogyo Co Ltd | Cleaning apparatus for slit nozzle |
CN101091951A (en) * | 2006-06-21 | 2007-12-26 | 修谷鲁电子机器股份有限公司 | Clean head |
CN201008870Y (en) * | 2007-03-05 | 2008-01-23 | 咸阳华清设备科技有限公司 | Screen dust removing device of flat panel display |
CN101653770A (en) * | 2009-09-02 | 2010-02-24 | 友达光电股份有限公司 | Optical technical equipment capable of cleaning outlet of water knife or air knife |
CN103817109A (en) * | 2012-11-16 | 2014-05-28 | 株式会社日藤工业 | Dust collector |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000024607A (en) * | 1998-07-09 | 2000-01-25 | Hitachi Ltd | Method for removing foreign matter |
JP4031625B2 (en) | 2001-07-02 | 2008-01-09 | 芝浦メカトロニクス株式会社 | Electronic component mounting apparatus and electronic component mounting method |
JP3757215B2 (en) | 2003-04-18 | 2006-03-22 | 間機設工業株式会社 | Dust remover |
KR100666347B1 (en) * | 2004-10-15 | 2007-01-11 | 세메스 주식회사 | Apparatus for cleaning a slit nozzle |
JP4773209B2 (en) | 2006-01-12 | 2011-09-14 | パナソニック株式会社 | Component crimping equipment |
JP6056275B2 (en) | 2012-08-30 | 2017-01-11 | セイコーエプソン株式会社 | Liquid ejecting head maintenance method and liquid ejecting apparatus |
-
2015
- 2015-10-23 JP JP2015208587A patent/JP6465489B2/en active Active
-
2016
- 2016-06-17 TW TW105119072A patent/TW201714676A/en unknown
- 2016-06-24 KR KR1020160079155A patent/KR102608681B1/en active IP Right Grant
- 2016-07-25 CN CN201610592679.7A patent/CN106607396A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05208154A (en) * | 1991-08-29 | 1993-08-20 | Fuji Photo Film Co Ltd | Method for washing coater edge and apparatus therefor |
JP2004066164A (en) * | 2002-08-08 | 2004-03-04 | Dainippon Printing Co Ltd | Coating head cleaning device and cleaning method |
CN1638033A (en) * | 2004-01-08 | 2005-07-13 | 大日本网目版制造株式会社 | Substrate processing apparatus |
TW200536615A (en) * | 2004-03-25 | 2005-11-16 | Tokyo Ohka Kogyo Co Ltd | Cleaning apparatus for slit nozzle |
CN101091951A (en) * | 2006-06-21 | 2007-12-26 | 修谷鲁电子机器股份有限公司 | Clean head |
CN201008870Y (en) * | 2007-03-05 | 2008-01-23 | 咸阳华清设备科技有限公司 | Screen dust removing device of flat panel display |
CN101653770A (en) * | 2009-09-02 | 2010-02-24 | 友达光电股份有限公司 | Optical technical equipment capable of cleaning outlet of water knife or air knife |
CN103817109A (en) * | 2012-11-16 | 2014-05-28 | 株式会社日藤工业 | Dust collector |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107199188A (en) * | 2017-06-12 | 2017-09-26 | 京东方科技集团股份有限公司 | Coating machine, coating system and coating machine clean method |
CN107199188B (en) * | 2017-06-12 | 2020-03-27 | 京东方科技集团股份有限公司 | Coating machine, coating system and coating machine cleaning method |
US11338336B2 (en) | 2017-06-12 | 2022-05-24 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Coating machine, coating system and cleaning method for coating machine |
CN108543671A (en) * | 2018-04-23 | 2018-09-18 | 深圳市华星光电技术有限公司 | A kind of cleaning device, coating machine |
CN111299245A (en) * | 2018-12-11 | 2020-06-19 | 韶阳科技股份有限公司 | Gas circulation device |
US20210129189A1 (en) * | 2019-10-30 | 2021-05-06 | Shenzhen Cannice Technology Co., Ltd. | Earphone storage device |
Also Published As
Publication number | Publication date |
---|---|
JP2017084858A (en) | 2017-05-18 |
KR20170048136A (en) | 2017-05-08 |
JP6465489B2 (en) | 2019-02-06 |
KR102608681B1 (en) | 2023-11-30 |
TW201714676A (en) | 2017-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106607396A (en) | Cleaning head and cleaning method | |
JP4491459B2 (en) | Flat display panel substrate cleaning device | |
US6904637B2 (en) | Scrubber with sonic nozzle | |
TW200615056A (en) | Substrate edge part cleaning apparatus and substrate edge part cleaning method | |
CN112492764B (en) | Method for eliminating solder resist ink in through hole of printed circuit board | |
TWI530331B (en) | Substrate end cleaning device | |
JP5303335B2 (en) | Conveying belt cleaning mechanism and inkjet recording apparatus including the same | |
CN101204687A (en) | Sweeping device of coating head for coating | |
JP3442930B2 (en) | How to clean the LCD panel | |
TW201908023A (en) | Cleaning system, cleaning method of transparent substrate, and manufacturing method of electronic device | |
JPH11271704A (en) | Manufacture of liquid crystal display element and dust removing device | |
JP4007303B2 (en) | Substrate rubbing method and rubbing apparatus | |
US20140083456A1 (en) | Method and apparatus for substrate edge cleaning | |
KR20110045961A (en) | Dust removal apparatus of circuit board | |
TW202139803A (en) | Device and method for eliminating foreign substance on substrate | |
JP2512015B2 (en) | Substrate cleaning equipment | |
KR100842462B1 (en) | Substrate edge part cleaning apparatus and substrate edge part cleaning method | |
JP3131258U (en) | Substrate cleaning device | |
KR100415668B1 (en) | Apparatus for returning seal bar in pallet | |
CN110575996A (en) | Substrate cleaning device | |
JP3966267B2 (en) | Substrate rubbing method and rubbing apparatus | |
CN219134105U (en) | A cleanliness control device for rail train sweeps robot | |
EP1685559A4 (en) | Process for restoring magnetic recording tape damaged by s ticky shed" syndrome | |
ES2184414T3 (en) | CLEANING HEAD OF A CLEANING DEVICE FOR WINDOW AND FACADE SURFACES. | |
JP3966266B2 (en) | Substrate rubbing method and rubbing apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170503 |
|
WD01 | Invention patent application deemed withdrawn after publication |