TW201714676A - Cleaning head and cleaning method capable of easily and quickly removing foreign matters at the air suction port and its surroundings of the head body to realize the substrate quality enhancement and the manufacturing cost reduction - Google Patents
Cleaning head and cleaning method capable of easily and quickly removing foreign matters at the air suction port and its surroundings of the head body to realize the substrate quality enhancement and the manufacturing cost reduction Download PDFInfo
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- TW201714676A TW201714676A TW105119072A TW105119072A TW201714676A TW 201714676 A TW201714676 A TW 201714676A TW 105119072 A TW105119072 A TW 105119072A TW 105119072 A TW105119072 A TW 105119072A TW 201714676 A TW201714676 A TW 201714676A
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- cleaning
- foreign matter
- head
- air suction
- suction port
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- 238000004140 cleaning Methods 0.000 title claims abstract description 188
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000000758 substrate Substances 0.000 title abstract description 27
- 238000004519 manufacturing process Methods 0.000 title abstract description 9
- 230000009467 reduction Effects 0.000 title abstract description 3
- 238000002347 injection Methods 0.000 claims description 24
- 239000007924 injection Substances 0.000 claims description 24
- 238000012544 monitoring process Methods 0.000 claims description 3
- 239000000428 dust Substances 0.000 description 15
- 239000011521 glass Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2220/00—Type of materials or objects being removed
- B08B2220/01—Adhesive materials
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
本發明係有關於一種具有清掃空氣吸入口及其周圍之功能的清掃頭及其清掃方法。 The present invention relates to a cleaning head having a function of cleaning an air intake port and its surroundings, and a cleaning method therefor.
半導體晶圓、液晶顯示器之玻璃板、薄膜等之各種基板(以下僅稱為基板)的製程，需要進行從基板之表面除去塵埃的除塵。例如，將清掃頭配置於基板之水平搬運路徑的上方，清掃頭對所搬運之基板進行除塵。 In the process of various substrates (hereinafter simply referred to as substrates) such as a semiconductor wafer, a glass plate of a liquid crystal display, and a film, it is necessary to remove dust from the surface of the substrate. For example, the cleaning head is disposed above the horizontal conveyance path of the substrate, and the cleaning head removes the substrate to be conveyed.
空氣噴射口及空氣吸入口形成於清掃頭的底面。空氣噴射口及空氣吸入口係在對基板之搬運方向大致垂直方向的方向長的狹縫。清掃頭之空氣噴射口係對所搬運之基板噴射清洗空氣，吹掉塵埃，又，空氣吸入口係將從基板所飛散之塵埃與周圍的空氣一起吸入，進行基板整個面的除塵。 The air injection port and the air suction port are formed on the bottom surface of the cleaning head. The air injection port and the air suction port are slits that are long in a direction substantially perpendicular to the conveyance direction of the substrate. The air injection port of the cleaning head ejects the cleaning air to the conveyed substrate to blow off the dust, and the air suction port sucks the dust scattered from the substrate together with the surrounding air to remove dust on the entire surface of the substrate.
可能玻璃或薄膜之碎片卡在此清掃頭的空氣吸入口，或碎片藉靜電黏在空氣吸入口之周圍。此異物係可能損害所搬運之基板。又，尤其在異物卡在空氣吸入口的情況，因為在該處吸力變弱，所以無法進行該處之除塵。固接於空氣吸入口及其周圍之異物係降低基板的品質，而使製造基板之良率變差。 It is possible that pieces of glass or film are stuck in the air intake of the cleaning head, or debris is stuck around the air suction port by static electricity. This foreign matter may damage the substrate being carried. Further, particularly in the case where the foreign matter is caught in the air suction port, since the suction force is weakened there, the dust removal at this place cannot be performed. The foreign matter fixed to the air suction port and its surroundings reduces the quality of the substrate, and the yield of the manufactured substrate is deteriorated.
近年來正進行基板之大形化及薄形化，連固接於清掃頭之難以目視確認之比較小異物也可能對基板之品質有重大 的影響。 In recent years, the substrate has been enlarged and thinned, and relatively small foreign matter that is difficult to visually confirm and is fixed to the cleaning head may have a significant quality to the substrate. Impact.
為了防止基板之品質的降低，需要清掃並除去異物，但是無法特定這種異物何時固接。因此，在以往之清掃作業，在基板發生不良時判斷異物附著，藉由作業員拭除固接於空氣吸入口及其周圍的異物，清掃並除去。 In order to prevent the deterioration of the quality of the substrate, it is necessary to clean and remove the foreign matter, but it is not possible to specify when the foreign matter is fixed. Therefore, in the conventional cleaning operation, when the substrate is defective, it is judged that the foreign matter adheres, and the worker wipes off the foreign matter fixed to the air inlet and its surroundings, and cleans and removes the foreign matter.
可是，從搬運工作台至清掃頭之底面的間隙係僅約數毫米，空氣吸入口及其周圍位於狹隘處，藉拭除難清掃並除去異物。此清掃作業係具有不僅作業性低且成為新的塵埃之產生之要因等的問題。 However, the gap from the transfer table to the bottom surface of the cleaning head is only about a few millimeters, and the air suction port and its surroundings are located at a narrow point, which is difficult to clean and remove foreign matter. This cleaning operation has problems such as low workability and a cause of new dust.
而且，由於此清掃作業困難而製造設備之停止時間變長時，失去製造時間，又，人工費用亦增加。像這樣在習知技術，由於對清掃頭之異物的固接與其清掃、除去，具有製造費用增大的問題。 Moreover, when the cleaning operation is difficult and the stopping time of the manufacturing equipment becomes long, the manufacturing time is lost, and the labor cost is also increased. As described above, in the prior art, since the foreign matter of the cleaning head is fixed and cleaned and removed, there is a problem that the manufacturing cost increases.
因此，發現像機械式地簡單且迅速地清掃並除去清掃頭之空氣吸入口及其周圍之異物的課題。未發現清掃這種清掃頭之空氣吸入口之裝置的先行技術。 Therefore, it has been found that the problem of cleaning and removing the foreign matter of the air inlet of the cleaning head and its surroundings is mechanically and simply and quickly removed. No prior art was found for the apparatus for cleaning the air intake of such a cleaning head.
在與清掃頭係相異之其他的技術領域，機械式地清掃異物之裝置的先行技術被揭示於例如專利文獻1(日本專利第4773209號公報)。在專利文獻1之元件壓接裝置，在其第6A圖、第6B圖、第3A圖、第3B圖等，記載一面使刷狀之清掃元件21與工作台面17的上面接觸，一面使其在水平方向移動，除去異物之構造。 In the other technical field which is different from the cleaning head system, a prior art of a device for mechanically cleaning foreign matter is disclosed in, for example, Patent Document 1 (Japanese Patent No. 4773209). In the element crimping apparatus of Patent Document 1, the brush-like cleaning element 21 is brought into contact with the upper surface of the table surface 17 in the sixth embodiment, the sixth panel, the third panel, the third panel, and the like. Move in the horizontal direction to remove the structure of foreign matter.
又，機械式地清掃異物的裝置之其他的先行技術被揭示於例如專利文獻2(日本專利第4031625號公報)。在專 利文獻2之電子元件組裝裝置，在其第3圖、第4圖等，記載藉刷子10除去支撐面之上面的異物之構造。 Further, another prior art of a device for mechanically cleaning foreign matter is disclosed in, for example, Patent Document 2 (Japanese Patent No. 4031625). In special In the electronic component assembling apparatus of the document 2, the structure in which the foreign matter on the upper surface of the support surface is removed by the brush 10 is described in FIG. 3 and FIG.
又，機械式地清掃異物的裝置之其他的先行技術被揭示於例如專利文獻3(日本專利第3757215號公報)。在專利文獻3之除塵裝置，在其第5圖等，記載藉第2刮刀40的刮除部41刮除卡在第1刮刀30之齒31的塵埃。 Further, another prior art of a device for mechanically cleaning foreign matter is disclosed in, for example, Patent Document 3 (Japanese Patent No. 3757215). In the dust removing device of the third document, the dust removing device 41 of the second scraper 40 scrapes off the dust stuck on the teeth 31 of the first scraper 30.
又，機械式地清掃異物的裝置之其他的先行技術被揭示於例如專利文獻4(特開2014-46502號公報)。在專利文獻4之液體噴射裝置，在其第5圖、第6圖等，尤其記載使清掃構件40一面接觸液體噴射頭10之液體噴射面12一面水平地移動而除去異物。 In addition, for example, Patent Document 4 (Japanese Laid-Open Patent Publication No. 2014-46502). In the liquid ejecting apparatus of Patent Document 4, in particular, the cleaning member 40 is horizontally moved while being in contact with the liquid ejecting surface 12 of the liquid ejecting head 10 to remove foreign matter.
【先行專利文獻】 [Prior patent documents]
【專利文獻】 [Patent Literature]
[專利文獻1]日本專利第4773209號公報(第6A圖、第6B圖、第3A圖、第3B圖) [Patent Document 1] Japanese Patent No. 4773209 (Fig. 6A, Fig. 6B, Fig. 3A, and Fig. 3B)
[專利文獻2]日本專利第4031625號公報(第3圖、第4圖) [Patent Document 2] Japanese Patent No. 4031625 (Fig. 3, Fig. 4)
[專利文獻3]日本專利第3757215號公報(第5圖) [Patent Document 3] Japanese Patent No. 3757215 (Fig. 5)
[專利文獻4]日本特開2014-46502號公報(第5圖、第6圖) [Patent Document 4] Japanese Laid-Open Patent Publication No. 2014-46502 (Fig. 5, Fig. 6)
在習知技術之清掃頭，因為異物附著之現象或所伴隨之問題係很少發生，所以這些問題係未考慮到。因此，亦未著眼於機械式地清掃並除去附著於清掃頭之異物的問題點。 In the cleaning head of the prior art, since the phenomenon of foreign matter attachment or the accompanying problems rarely occur, these problems are not considered. Therefore, attention has not been paid to the problem of mechanically cleaning and removing foreign matter adhering to the cleaning head.
在專利文獻1~4所記載之裝置亦雖然是藉接觸清掃並除去異物者，但是未揭示除去清掃頭之空氣吸入口及其周圍之異物的裝置。 In the devices described in Patent Documents 1 to 4, the foreign matter is removed by contact cleaning, but the device for removing the foreign matter from the air inlet of the cleaning head and its surroundings is not disclosed.
本發明係為了解決如上述所示新著眼之課題而開發的，其目的在於提供一種清掃頭及清掃方法，該清掃頭係具有簡單且迅速地除去頭本體之空氣吸入口及其周圍之異物的清掃功能，而實現基板品質之提高且製造費用之降低。 The present invention has been made in order to solve the problems of the above-mentioned new problems, and an object of the present invention is to provide a cleaning head which has a simple and rapid removal of foreign matter of an air intake port of a head body and its surroundings. The cleaning function improves the quality of the substrate and reduces the manufacturing cost.
為了解決該課題，如申請專利範圍第1項之發明係搭載如下之構件的清掃頭，頭本體，係在長度方向形成長孔之空氣吸入口；及清掃裝置，係清掃該頭本體之空氣吸入口及其周圍，其特徵為：該清掃裝置係包括：導引支撐部，係被安裝於該頭本體；移動部，係藉該導引支撐部所導引支撐，並與該空氣吸入口之長度方向相對地且大致平行地移動；以及異物除去部，係與該移動部一起移動，並對該空氣吸入口及其周圍之異物接觸並除去。 In order to solve the problem, the invention of claim 1 is a cleaning head equipped with a member having an air intake port in which a long hole is formed in a longitudinal direction, and a cleaning device for cleaning the air of the head body. And a periphery thereof, wherein the cleaning device comprises: a guiding support portion mounted on the head body; and a moving portion guided by the guiding support portion and being connected to the air suction port The longitudinal direction moves relatively and substantially in parallel; and the foreign matter removing portion moves together with the moving portion, and contacts and removes the foreign matter to and around the air intake port.
又，如申請專利範圍第2項之發明係在如申請專利範圍第1項之清掃頭，該異物除去部係與形成該空氣吸入口之底面大致平行之棒狀或長方形的長條體，該長條體對該空氣吸入口及其周圍接觸並清掃。 Further, the invention of claim 2 is the cleaning head according to the first aspect of the patent application, wherein the foreign matter removing portion is a rod-shaped or rectangular elongated body substantially parallel to a bottom surface of the air suction port, The strip body contacts and cleans the air intake port and its surroundings.
又，如申請專利範圍第3項之發明係在如申請專利範圍第1項之清掃頭，該異物除去部係由與形成該空氣吸入口之底面大致平行的轉軸所軸支的輥，該輥對該空氣吸入口及其周圍一面轉動一面接觸並清掃。 Further, the invention of claim 3 is the cleaning head according to the first aspect of the patent application, wherein the foreign matter removing portion is a roller supported by a rotating shaft substantially parallel to a bottom surface of the air suction opening, the roller The air intake port and its surroundings are rotated and contacted and cleaned.
又，如申請專利範圍第4項之發明係在如申請專利範圍第3項之清掃頭，該輥係防止帶電用之靜電輥。 Further, the invention of claim 4 is the cleaning head of claim 3, which prevents the electrostatic roller for charging.
又，如申請專利範圍第5項之發明係使用如申請專利範圍第1項之該清掃裝置來清掃的方法，其特徵為：在停止來自空氣吸入口之吸入的狀態清掃。 Further, the invention of claim 5 is a cleaning method using the cleaning device according to the first aspect of the invention, characterized in that the cleaning is stopped in a state where the suction from the air suction port is stopped.
又，如申請專利範圍第6項之發明係在如申請專利範圍第5項之清掃方法，在從該清掃頭之空氣噴射口噴出清洗空氣的狀態清掃。 Further, the invention of claim 6 is the cleaning method according to the fifth aspect of the patent application, in which the cleaning air is ejected from the air ejection port of the cleaning head.
又，如申請專利範圍第7項之發明係使用如申請專利範圍第1項之該清掃裝置來清掃的方法，其特徵為：配置監視該空氣吸入口及其周圍的異物感測器，在根據來自該異物感測器之檢測信號，判斷有異物時，清掃。 Further, the invention of claim 7 is the method of cleaning using the cleaning device according to the first aspect of the patent application, characterized in that: the foreign matter sensor for monitoring the air intake port and its surroundings is arranged, The detection signal from the foreign matter sensor is cleaned when it is determined that there is a foreign matter.
又，如申請專利範圍第8項之發明係使用如申請專利範圍第1項之該清掃裝置來清掃的方法，其特徵為：在該清掃頭之正下將搬運工作台配置成具有開閉器，在清掃時將該開閉器設定成打開之狀態，使所除去之異物經由該開閉器落至該搬運工作台之下。 Further, the invention of claim 8 is a cleaning method using the cleaning device according to the first aspect of the patent application, characterized in that the conveying table is disposed directly with the shutter under the cleaning head. The shutter is set to be opened during cleaning, and the removed foreign matter falls below the transfer table via the shutter.
若依據本發明，可提供一種清掃頭及清掃方法，該清掃頭係具有簡單且迅速地除去頭本體之空氣吸入口及其周圍之異物的清掃功能，而實現基板品質之提高且製造費用之降低。 According to the present invention, it is possible to provide a cleaning head having a cleaning function for simply and quickly removing foreign matter from the air suction port of the head main body and the surroundings thereof, thereby improving the quality of the substrate and reducing the manufacturing cost. .
100、200‧‧‧清掃頭 100, 200‧‧ ‧ cleaning head
10‧‧‧頭本體 10‧‧‧ head body
11‧‧‧空氣噴射口 11‧‧‧Air jet
12‧‧‧空氣吸入口 12‧‧‧Air intake
13‧‧‧供氣部 13‧‧‧Air Supply Department
14‧‧‧排氣部 14‧‧‧Exhaust Department
20、30‧‧‧清掃裝置 20, 30‧‧‧ cleaning device
21‧‧‧導引支撐部 21‧‧‧Guidance support
22‧‧‧移動部 22‧‧‧Mobile Department
23‧‧‧異物除去部(長條體) 23‧‧‧ Foreign body removal department (long body)
24‧‧‧異物除去部(輥) 24‧‧‧ Foreign matter removal section (roller)
300‧‧‧搬運工作台 300‧‧‧Transportation workbench
301‧‧‧開閉器 301‧‧‧Opener
400‧‧‧相對向清掃頭 400‧‧‧relative cleaning head
第1圖係用以實施本發明之第1形態之清掃頭的說明圖， 第1圖(a)係側視圖，第1圖(b)係正視圖。 Fig. 1 is an explanatory view for explaining a cleaning head according to a first aspect of the present invention. Fig. 1(a) is a side view, and Fig. 1(b) is a front view.
第2圖係用以實施本發明之第2形態之清掃頭的說明圖，第2圖(a)係側視圖，第2圖(b)係正視圖。 Fig. 2 is an explanatory view of a cleaning head according to a second aspect of the present invention, wherein Fig. 2(a) is a side view and Fig. 2(b) is a front view.
第3圖係用以實施本發明之第1形態的清掃頭之使用例的說明圖，第3圖(a)係清掃前之狀態之清掃頭的側視圖，第3圖(b)係清掃前之狀態之清掃頭的正視圖，第3圖(c)係清掃途中之狀態之清掃頭的側視圖，第3圖(d)係清掃途中之狀態之清掃頭的正視圖。 Fig. 3 is an explanatory view showing an example of use of a cleaning head according to a first embodiment of the present invention, wherein Fig. 3(a) is a side view of the cleaning head in a state before cleaning, and Fig. 3(b) is before cleaning. The front view of the cleaning head in the state, the third drawing (c) is a side view of the cleaning head in the state of cleaning, and the third drawing (d) is a front view of the cleaning head in the state of cleaning.
第4圖係用以實施本發明之第2形態的清掃頭之使用例的說明圖。 Fig. 4 is an explanatory view showing an example of use of a cleaning head according to a second aspect of the present invention.
第5圖係用以實施本發明之第1形態的清掃頭之其他的使用例的說明圖，第5圖(a)係側視圖，第5圖(b)係正視圖。 Fig. 5 is an explanatory view showing another example of use of the cleaning head according to the first aspect of the present invention, wherein Fig. 5(a) is a side view and Fig. 5(b) is a front view.
第6圖係用以實施本發明之第2形態的清掃頭之其他的使用例的說明圖，第6圖(a)係側視圖，第6圖(b)係正視圖。 Fig. 6 is an explanatory view showing another example of use of the cleaning head according to the second aspect of the present invention, and Fig. 6(a) is a side view and Fig. 6(b) is a front view.
以下，一面參照圖，一面說明用以實施本發明之第1形態的清掃頭100。此清掃頭100係如第1圖所示，包括頭本體10與清掃裝置20。 Hereinafter, the cleaning head 100 for carrying out the first aspect of the present invention will be described with reference to the drawings. The cleaning head 100 includes a head body 10 and a cleaning device 20 as shown in FIG.
頭本體10更包括空氣噴射口11、空氣吸入口12、供氣部13以及排氣部14。頭本體10的形狀舉例表示由六面所形成之長方體。在底面，雖未圖示，以在頭本體10之長度方向(第1圖(b)之左右方向)長的方式形成是平行之兩條直線狀之長孔的空氣噴射口11及空氣吸入口12。從供氣部13所供給之清洗空氣係從空氣噴射口11所噴射。然後，在空氣吸入口12 所吸入之塵埃係從排氣部14所排出。 The head body 10 further includes an air injection port 11, an air intake port 12, an air supply portion 13, and an exhaust portion 14. The shape of the head body 10 is an example of a rectangular parallelepiped formed of six faces. In the bottom surface, although not shown, an air injection port 11 and an air intake port which are two straight parallel long holes are formed so as to be long in the longitudinal direction of the head main body 10 (the left-right direction of FIG. 1(b)). 12. The cleaning air supplied from the air supply unit 13 is injected from the air injection port 11. Then, at the air intake 12 The sucked dust is discharged from the exhaust portion 14.
清掃裝置20更包括導引支撐部21、移動部22以及異物除去部23。 The cleaning device 20 further includes a guiding support portion 21, a moving portion 22, and a foreign matter removing portion 23.
導引支撐部21係如第1圖(b)所示，形成於頭本體10的正面，例如是在頭本體10之長度方向(第1圖(b)之左右方向)長的軌道。此外，導引支撐部21係在第1圖被安裝於頭本體10之正面之中段的高度，但是亦可以接近頭本體10之底面的方式安裝於正面之下段的高度。 The guide support portion 21 is formed on the front surface of the head main body 10 as shown in Fig. 1(b), and is, for example, a track that is long in the longitudinal direction of the head main body 10 (the left-right direction of Fig. 1(b)). Further, the guide support portion 21 is attached to the height of the middle portion of the front surface of the head main body 10 in Fig. 1, but may be attached to the lower surface of the front surface portion so as to be close to the bottom surface of the head main body 10.
移動部22係在其一方的端部一面沿著導引支撐部21滑動一面移動。又，將異物除去部23安裝於此移動部22之另一方的端部。異物除去部23與移動部22以成為一體之方式沿著導引支撐部21在長度方向(第1圖(b)之左右方向)移動。 The moving portion 22 moves while sliding along the guide support portion 21 at one of the end portions. Further, the foreign matter removing portion 23 is attached to the other end portion of the moving portion 22. The foreign matter removing unit 23 and the moving unit 22 move in the longitudinal direction (the horizontal direction of the first drawing (b)) along the guiding support portion 21 so as to be integrated.
異物除去部23係詳細說明之，對長孔之空氣噴射口11或空氣吸入口12之長度方向是大致垂直方向，且與形成空氣噴射口11或空氣吸入口12之頭本體10的底面大致平行方向長之棒狀或長方形的長條體。在此長條體，至少與頭本體10之底面抵接的邊或面是平行。此外，在第1圖，可見之間隙存在於頭本體10的底面與異物除去部23之間，但是這是為了便於觀察圖，實際上成為接觸之狀態。 The foreign matter removing portion 23 is described in detail, and the longitudinal direction of the air injection port 11 or the air intake port 12 of the long hole is substantially perpendicular, and is substantially parallel to the bottom surface of the head body 10 forming the air injection port 11 or the air suction port 12. A long, bar-shaped or rectangular strip. In this elongated body, at least the side or face abutting against the bottom surface of the head body 10 is parallel. Further, in the first drawing, the gap is visible between the bottom surface of the head main body 10 and the foreign matter removing portion 23, but this is a state in which the contact is actually made in order to facilitate the observation.
此異物除去部23係由具有不會傷害空氣吸入口12之程度的彈性，但比較硬質的構件所形成。異物除去部23係為了以適當之力對頭本體10的空氣吸入口12及其周圍推壓，是硬質較佳。 The foreign matter removing portion 23 is formed of a relatively rigid member having elasticity that does not damage the air intake port 12. The foreign matter removing portion 23 is preferably hard in order to press the air suction port 12 of the head main body 10 and its surroundings with an appropriate force.
異物除去部23係利用棒狀或長方形的長條體之彈 性支撐的效果，一面與空氣吸入口12及其周圍進行線接觸或面接觸一面移動，而刮除空氣吸入口12及其周圍的異物。此外，因為空氣噴射口11吹掉大部分之異物，所以異物固接的可能性極小，但是異物除去部23係亦可清掃空氣噴射口11，在上述之空氣吸入口12之周圍，當作亦包含空氣噴射口11(以下，在本專利說明書中係一樣地定義)。 The foreign matter removing portion 23 uses a rod-shaped or rectangular elongated body bullet The effect of the sexual support moves while being in line contact or surface contact with the air intake port 12 and its surroundings, and scrapes off the foreign matter of the air suction port 12 and its surroundings. Further, since the air injecting port 11 blows off most of the foreign matter, the possibility of fixing the foreign matter is extremely small, but the foreign matter removing portion 23 can also clean the air injecting port 11, and around the air inhaling port 12, The air injection port 11 is included (hereinafter, it is defined the same in this patent specification).
接著，說明藉本發明之清掃頭100之清掃的原理。在玻璃之碎片等之異物卡在清掃頭100之空氣吸入口12的情況或固接於其周圍的情況，藉由使其接觸某種構件，異物簡單地掉落，或藉由停止吸入，異物亦掉落，這在經驗上已知。將這些方法組合，進行清掃。 Next, the principle of cleaning by the cleaning head 100 of the present invention will be described. When a foreign matter such as a piece of glass is caught in the air suction port 12 of the cleaning head 100 or is fixed to the periphery thereof, the foreign matter is simply dropped by touching a certain member, or the foreign matter is stopped by stopping the suction. Also dropped, this is known empirically. These methods are combined and cleaned.
接著，說明本形態之清掃頭100的清掃方法。當作是玻璃之碎片等之異物卡在頭本體10之空氣吸入口12、或異物藉靜電力黏在其周圍之狀態。首先，停止來自空氣噴射口11的噴射及來自空氣吸入口12的吸入。藉此，消除作用於卡在空氣吸入口12之異物的吸入力，而易取下異物。然後，在異物除去部23與空氣吸入口12及其周圍進行線接觸或面接觸之狀態，作業員使移動部22移動時，異物除去部23亦在長度方向移動，而異物除去部23刮除空氣吸入口12及其周圍的異物。 Next, a cleaning method of the cleaning head 100 of the present embodiment will be described. A foreign matter such as a piece of glass is caught in the air suction port 12 of the head main body 10, or a foreign matter is adhered to the periphery by an electrostatic force. First, the injection from the air injection port 11 and the suction from the air suction port 12 are stopped. Thereby, the suction force acting on the foreign matter stuck in the air suction port 12 is eliminated, and the foreign matter is easily taken out. Then, when the foreign object removal unit 23 is in line contact or surface contact with the air intake port 12 and its surroundings, when the operator moves the moving unit 22, the foreign matter removing unit 23 also moves in the longitudinal direction, and the foreign matter removing unit 23 scrapes off. Foreign matter in the air intake port 12 and its surroundings.
異物除去部23係被調整成對空氣吸入口12及其周圍的壓住力成為適當的值，異物除去部23密接地接觸，而刮除異物。在此時，因為停止吸入，所以藉接觸而異物從空氣吸入口12及其周圍易落下。 The foreign matter removing portion 23 is adjusted so that the pressing force to the air suction port 12 and its surroundings is an appropriate value, and the foreign matter removing portion 23 is in close contact with each other to scrape off foreign matter. At this time, since the suction is stopped, the foreign matter is easily dropped from the air suction port 12 and its surroundings by the contact.
接著，在異物除去部23移至左右之一方的端部時 使其反轉，使其移動成向原來的方向回去。最後，使異物除去部23停在最初之等待位置。此清掃係在未除塵之空轉時間等定期地進行，又，在發現異物時進行。若依據這種本形態之清掃頭100，可易於清掃空氣吸入口及其周圍。 Next, when the foreign matter removing unit 23 is moved to one of the right and left ends Reverse it so that it moves back in the original direction. Finally, the foreign matter removing unit 23 is stopped at the initial waiting position. This cleaning is performed periodically during the idling time without dust removal, and when foreign matter is found. According to the cleaning head 100 of this aspect, the air intake port and its surroundings can be easily cleaned.
接著，一面參照圖，一面說明用以實施本發明之第2形態的清掃頭200。此清掃頭200係如第2圖所示，包括頭本體10與清掃裝置30。 Next, a cleaning head 200 for carrying out the second aspect of the present invention will be described with reference to the drawings. The cleaning head 200 includes a head body 10 and a cleaning device 30 as shown in FIG.
先與使用第1圖所說明之第1形態比較，在第2形態，頭本體10係與在前面所說明之第1形態的構成相同，但是清掃裝置30係其構成相異。此清掃裝置30係更包括導引支撐部21、移動部22以及異物除去部24。在本形態，僅異物除去部24相異。 First, in comparison with the first aspect described with reference to Fig. 1, in the second embodiment, the head main body 10 is the same as the first embodiment described above, but the cleaning device 30 has a different configuration. The cleaning device 30 further includes a guiding support portion 21, a moving portion 22, and a foreign matter removing portion 24. In the present embodiment, only the foreign matter removing unit 24 is different.
因此，關於頭本體10、或清掃裝置30之導引支撐部21與移動部22，附加相同的符號，並省略重複的說明，而僅說明相異之清掃裝置30的異物除去部24。此外，在第2圖，可見之間隙存在於頭本體10的底面與異物除去部24之間，但是這是為了便於觀察圖，實際上成為接觸之狀態。 Therefore, the head main body 10 or the guide support portion 21 of the cleaning device 30 and the moving portion 22 are denoted by the same reference numerals, and the overlapping description will be omitted, and only the foreign matter removing portion 24 of the dissimilar cleaning device 30 will be described. Further, in Fig. 2, the gap is visible between the bottom surface of the head main body 10 and the foreign matter removing portion 24, but this is in a state of being in contact for the sake of easy viewing.
清掃裝置30之異物除去部24係詳細說明之，對空氣噴射口11或空氣吸入口12之長度方向是大致垂直方向，且是由在與形成空氣噴射口11或空氣吸入口12之頭本體10的底面大致平行方向長之轉軸所軸支並轉動的輥。此輥係例如是外形為圓柱形的刷子、橡膠、海綿、或將布捲繞於筒體之表面者等。藉由使用如這些之輥，可刮除空氣吸入口12及其周圍的異物。 The foreign matter removing portion 24 of the cleaning device 30 is described in detail, and is substantially perpendicular to the longitudinal direction of the air injection port 11 or the air suction port 12, and is formed by the head body 10 that forms the air ejection port 11 or the air suction port 12. The bottom surface of the rotating shaft that is axially supported and rotated in a substantially parallel direction. The roller is, for example, a brush having a cylindrical shape, a rubber, a sponge, or a cloth wound around a surface of a cylinder. By using a roller such as these, the foreign matter of the air suction port 12 and its surroundings can be scraped off.
而且，此輥是防止帶電用之靜電輥較佳。藉由使用靜電輥，不僅對底面之靜電除電而減弱靜電力，而且一面刮除藉靜電力所黏住的異物一面清掃。 Moreover, this roller is preferably an electrostatic roller for preventing electrification. By using the electrostatic roller, not only the static electricity of the bottom surface is removed, but also the electrostatic force is weakened, and the foreign matter adhered by the electrostatic force is scraped off while cleaning.
在藉異物除去部24之清掃，與移動部22之移動同時，對空氣吸入口12及其周圍一面轉動是輥之異物除去部24一面以適當之壓住力滑接，藉此，刮除空氣吸入口12及其周圍的異物。 At the same time as the movement of the moving portion 22, the foreign matter removing portion 24 is swept away by the appropriate pressure of the foreign matter removing portion 24 which is rotated by the air suction port 12 and the periphery thereof, thereby scraping the air. Foreign matter in the suction port 12 and its surroundings.
接著，說明本形態之清掃頭200的清掃方法。當作是玻璃之碎片等之異物卡在頭本體10之空氣吸入口12、或異物藉靜電力黏在其周圍之狀態。首先，停止來自空氣噴射口11的噴射及來自空氣吸入口12的吸入。然後，在異物除去部24與空氣吸入口12及其周圍接觸之狀態，作業員使移動部22移動時，異物除去部24亦在長度方向移動，而異物除去部24刮除空氣吸入口12及其周圍的異物。 Next, a cleaning method of the cleaning head 200 of the present embodiment will be described. A foreign matter such as a piece of glass is caught in the air suction port 12 of the head main body 10, or a foreign matter is adhered to the periphery by an electrostatic force. First, the injection from the air injection port 11 and the suction from the air suction port 12 are stopped. When the foreign matter removing unit 24 is in contact with the air intake port 12 and its surroundings, when the operator moves the moving unit 22, the foreign matter removing unit 24 also moves in the longitudinal direction, and the foreign matter removing unit 24 scrapes the air intake port 12 and Foreign objects around it.
異物除去部24係被調整成對空氣吸入口12及其周圍的壓住力成為適當的值，異物除去部24轉動並接觸，而刮除異物。在此時，因為停止吸入，所以異物從空氣吸入口12及其周圍易落下。 The foreign matter removing portion 24 is adjusted so that the pressing force to the air suction port 12 and its surroundings is an appropriate value, and the foreign matter removing portion 24 is rotated and brought into contact with each other to scrape off foreign matter. At this time, since the suction is stopped, the foreign matter easily falls from the air suction port 12 and its surroundings.
接著，在異物除去部24移至左右之一方的端部時使其反轉，使其移動成向原來的方向回去。最後，使異物除去部24停在最初之等待位置。此清掃係在未除塵之空轉時間等定期地進行，又，在發現異物時進行。若依據這種本形態之清掃頭200，可易於清掃空氣吸入口及其周圍。 Next, when the foreign matter removing portion 24 is moved to one of the left and right end portions, the foreign object removing portion 24 is reversed and moved to return to the original direction. Finally, the foreign matter removing portion 24 is stopped at the initial waiting position. This cleaning is performed periodically during the idling time without dust removal, and when foreign matter is found. According to the cleaning head 200 of this aspect, the air intake port and its surroundings can be easily cleaned.
此外，在清掃頭，說明了使用第1形態之異物除 去部23或第2形態之異物除去部24中的其中一方，但是此外，亦對同一清掃頭，因應於狀況安裝是長條體之異物除去部23，作成第1形態之清掃頭100，又安裝是輥的異物除去部24，作成第2形態之清掃頭200，而適當地靈活地使用。 In addition, in the cleaning head, it is explained that the foreign matter of the first form is used. In the same manner, the cleaning head 100 of the first aspect is formed in the same manner as the foreign matter removing unit 23 of the first embodiment. The foreign matter removing unit 24 which is a roller is attached, and the cleaning head 200 of the second aspect is formed, and is used flexibly as appropriate.
又，在第1、第2形態之清掃頭100、200，都採用停止來自空氣噴射口11之噴射及來自空氣吸入口12之吸入後清掃，但是亦可在停止來自空氣吸入口12之吸入下在從空氣噴射口11噴射之狀態清掃。在此情況，所刮除之異物會被吹散。又，亦可停止來自空氣噴射口11之噴射在從空氣吸入口12吸入之狀態清掃。在此情況，吸入所刮除之異物。可因應於狀況適當地採用。 Further, in the cleaning heads 100 and 200 of the first and second aspects, the injection from the air injection port 11 and the suction from the air intake port 12 are stopped, but the suction from the air intake port 12 may be stopped. The state is cleaned in a state of being ejected from the air ejection port 11. In this case, the scraped foreign matter will be blown away. Moreover, the injection from the air injection port 11 can be stopped and cleaned in a state of being sucked from the air intake port 12. In this case, inhale the foreign matter scraped off. It can be used appropriately according to the situation.
接著，說明清掃方法之其他的形態。本形態係改良在前面使用第1圖所說明之第1形態的清掃頭100之清掃方法的清掃方法。雖未圖示，作成具備監視清掃頭100之空氣吸入口12及其周圍的異物感測器。 Next, other aspects of the cleaning method will be described. This embodiment is a cleaning method for cleaning the cleaning head 100 of the first embodiment described above with reference to Fig. 1 . Although not shown, a foreign matter sensor including the air intake port 12 for monitoring the cleaning head 100 and its surroundings is provided.
例如異物感測器是相機，比較無異物之空氣吸入口及其周圍的影像、與所拍攝之空氣吸入口及其周圍的影像，在根據影像的變化作業員判定異物附著時，作業員開始清掃。進而，亦可具備對移動部22進行驅動控制的控制部，以根據異物感測器之檢測信號開始清掃之方式控制部對移動部22進行驅動控制。此外，亦可作成預先將輸出部與控制部連接，藉聲音或顯示向作業員通知已判斷需要清掃。而且，亦可將此清掃方法應用於在前面使用第2圖所說明之第2形態的清掃頭200之第2清掃方法。可採用如這些所示的清掃方法。 For example, the foreign matter sensor is a camera, which compares the image of the air inlet and its surroundings with no foreign matter, and the image of the air intake port and its surroundings. When the operator determines that the foreign matter adheres according to the change of the image, the operator starts cleaning. . Further, a control unit that drives and controls the moving unit 22 may be provided, and the control unit may drive and control the moving unit 22 so that the cleaning is started based on the detection signal of the foreign object sensor. Further, it is also possible to connect the output unit to the control unit in advance, and notify the operator by sound or display that it is determined that cleaning is required. Further, this cleaning method can also be applied to the second cleaning method of the cleaning head 200 of the second embodiment described above using the second embodiment. A cleaning method as shown in these can be employed.
接著，說明清掃方法之其他的形態。此形態係進一步改良在前面所說明之使用第1形態的清掃頭100之清掃方法的形態。一面參照第3圖一面說明此清掃方法。如第3圖(a)、(b)所示，藉搬運工作台300將基板搬運至清掃頭100的下側。 Next, other aspects of the cleaning method will be described. This aspect further improves the form of the cleaning method using the cleaning head 100 of the first embodiment described above. This cleaning method will be described with reference to Fig. 3. As shown in Fig. 3 (a) and (b), the substrate is transported to the lower side of the cleaning head 100 by the transfer table 300.
搬運工作台300係從上游側(在第3圖(a)為右側)依序搬運基板。然後，在通過清掃頭100之下時，清掃頭100進行除塵。 The transport table 300 sequentially transports the substrates from the upstream side (on the right side in Fig. 3(a)). Then, the cleaning head 100 performs dust removal while passing under the cleaning head 100.
在清掃頭100之正下配置開閉器301。在平常之基板搬運時，如第3圖(a)所示，開閉器301係關閉，如第3圖(b)所示，清掃裝置20之移動部22係停止。 The shutter 301 is disposed directly below the cleaning head 100. When the substrate is transported normally, as shown in Fig. 3(a), the shutter 301 is closed, and as shown in Fig. 3(b), the moving portion 22 of the cleaning device 20 is stopped.
在清掃時，停止來自空氣噴射口11之噴射及來自空氣吸入口12之吸入，如第3圖(c)所示，將開閉器301設定成打開之狀態。然後，如第3圖(d)所示，使清掃裝置20之移動部22動作所刮除的異物經由開閉器301落至搬運工作台300之下。藉此，刮除異物。此外，在此清掃方法，亦可一併地應用使用上述之異物感測器的清掃方法。 At the time of cleaning, the injection from the air injection port 11 and the suction from the air suction port 12 are stopped, and as shown in Fig. 3(c), the shutter 301 is set to be in an open state. Then, as shown in FIG. 3(d), the foreign matter scraped off by the movement of the moving portion 22 of the cleaning device 20 is dropped under the conveyance table 300 via the shutter 301. Thereby, the foreign matter is scraped off. Further, in the cleaning method, the cleaning method using the above-described foreign matter sensor may be applied together.
又，如第4圖所示，亦可對在前面所說明之使用第2形態之清掃頭200的清掃方法，應用使用此開閉器301之清掃方法。又，在此清掃方法，亦可一併地應用使用上述之異物感測器的清掃方法。 Further, as shown in Fig. 4, the cleaning method using the shutter 301 can be applied to the cleaning method using the cleaning head 200 of the second embodiment described above. Further, in the cleaning method, the cleaning method using the above-described foreign matter sensor may be applied together.
接著，說明其他的形態。此形態係如第5圖(a)、(b)所示，是將在前面所說明之第1形態之清掃頭100配置於上側，並將相對向清掃頭400配置於下側的形態。在此情況，清掃頭100與相對向清掃頭400之間係狹隘的空間，但是將清掃 頭100之異物除去部23配置於此空間內，可清掃空氣吸入口12。在此情況，藉由清掃頭100與相對向清掃頭400都吸入，藉來自上下的吸入可清掃並除去已刮除的異物。亦可應用於這種基板雙面之除塵用的清掃頭。 Next, other aspects will be described. As shown in Fig. 5 (a) and (b), the cleaning head 100 of the first embodiment described above is disposed on the upper side, and is disposed on the lower side with respect to the cleaning head 400. In this case, there is a narrow space between the cleaning head 100 and the opposing cleaning head 400, but will be cleaned. The foreign matter removing portion 23 of the head 100 is disposed in this space, and the air intake port 12 can be cleaned. In this case, both the cleaning head 100 and the opposing cleaning head 400 are sucked, and the scraped foreign matter can be cleaned and removed by suction from the upper and lower sides. It can also be applied to a cleaning head for dust removal on both sides of the substrate.
接著，說明其他的形態。此形態係如第6圖(a)、(b)所示，是將在前面所說明之第2形態之清掃頭200配置於上側，並將相對向清掃頭400配置於下側的形態。在此情況，亦清掃頭200與相對向清掃頭400之間係狹隘的空間，但是將清掃頭200之異物除去部24配置於此空間內，可清掃空氣吸入口12。在此情況，藉由清掃頭200與相對向清掃頭400都吸入，藉來自上下的吸入可清掃並除去已刮除的異物。亦可應用於這種基板雙面之除塵用的清掃頭。 Next, other aspects will be described. In this embodiment, as shown in Fig. 6 (a) and (b), the cleaning head 200 of the second embodiment described above is disposed on the upper side, and the cleaning head 400 is disposed on the lower side. In this case, the space between the cleaning head 200 and the cleaning head 400 is narrow. However, the foreign matter removing portion 24 of the cleaning head 200 is disposed in this space, and the air suction port 12 can be cleaned. In this case, both the cleaning head 200 and the opposing cleaning head 400 are sucked, and the scraped foreign matter can be cleaned and removed by suction from the upper and lower sides. It can also be applied to a cleaning head for dust removal on both sides of the substrate.
以上，一面參照圖一面說明了本發明之清掃頭及清掃方法。此外，在前面所說明之清掃頭係設想空氣噴射口及空氣吸入口是一個之PV式的清掃頭所說明，但是亦可是在兩個空氣吸入口之間配置一個空氣噴射口之VPV式的清掃頭或在兩個空氣噴射口之間配置一個空氣吸入口之PVP式的清掃頭。在這種的情況亦可實施本發明。 The cleaning head and the cleaning method of the present invention have been described above with reference to the drawings. In addition, the cleaning head system described above is a description of a PV-type cleaning head in which the air injection port and the air suction port are provided, but a VPV-type cleaning device in which an air injection port is disposed between the two air suction ports may be used. A PVP-type cleaning head with an air intake port between the head or between the two air injection ports. The invention can also be practiced in this case.
又，在前面所說明之清掃頭如第1圖(b)或第2圖(b)所示，將清掃裝置20之導引支撐部21配置於正面側，但是亦可將清掃裝置20之導引支撐部21配置於背面側(未圖示)，而不是正面側。在這種的情況亦可實施本發明。 Further, as shown in FIG. 1(b) or FIG. 2(b), the cleaning head described above is disposed on the front side of the guide support portion 21 of the cleaning device 20. However, the cleaning device 20 may be guided. The lead support portion 21 is disposed on the back side (not shown) instead of the front side. The invention can also be practiced in this case.
若依據以上之所說明的清掃頭及清掃方法，具有簡單且迅速地除去頭本體之空氣吸入口及其周圍之異物的清 掃功能，結果，實現基板品質之提高且製造費用之降低。 According to the cleaning head and the cleaning method described above, it is possible to easily and quickly remove the foreign matter of the air inlet of the head body and the surrounding objects thereof. The sweep function, as a result, achieves an improvement in substrate quality and a reduction in manufacturing cost.
【工業上的可應用性】 [Industrial Applicability]
本發明之清掃頭及清掃方法係可應用於在電性、電子製品所使用之各種基板的製造。 The cleaning head and the cleaning method of the present invention can be applied to the manufacture of various substrates used in electrical and electronic products.
100‧‧‧清掃頭 100‧‧‧ cleaning head
10‧‧‧頭本體 10‧‧‧ head body
11‧‧‧空氣噴射口 11‧‧‧Air jet
12‧‧‧空氣吸入口 12‧‧‧Air intake
13‧‧‧供氣部 13‧‧‧Air Supply Department
14‧‧‧排氣部 14‧‧‧Exhaust Department
20‧‧‧清掃裝置 20‧‧‧ cleaning device
21‧‧‧導引支撐部 21‧‧‧Guidance support
22‧‧‧移動部 22‧‧‧Mobile Department
23‧‧‧異物除去部(長條體) 23‧‧‧ Foreign body removal department (long body)
Claims (8)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015208587A JP6465489B2 (en) | 2015-10-23 | 2015-10-23 | Cleaning head and cleaning method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201714676A true TW201714676A (en) | 2017-05-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW105119072A TW201714676A (en) | 2015-10-23 | 2016-06-17 | Cleaning head and cleaning method capable of easily and quickly removing foreign matters at the air suction port and its surroundings of the head body to realize the substrate quality enhancement and the manufacturing cost reduction |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6465489B2 (en) |
| KR (1) | KR102608681B1 (en) |
| CN (1) | CN106607396A (en) |
| TW (1) | TW201714676A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112657946A (en) * | 2020-12-02 | 2021-04-16 | 深圳市华星光电半导体显示技术有限公司 | Cleaning device and exposure machine |
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| CN107199188B (en) * | 2017-06-12 | 2020-03-27 | 京东方科技集团股份有限公司 | Coating machine, coating system and coating machine cleaning method |
| CN108543671A (en) * | 2018-04-23 | 2018-09-18 | 深圳市华星光电技术有限公司 | A kind of cleaning device, coating machine |
| CN111299245A (en) * | 2018-12-11 | 2020-06-19 | 韶阳科技股份有限公司 | Gas circulation device |
| CN110572740B (en) * | 2019-10-30 | 2020-08-14 | 深圳市科奈信科技有限公司 | Earphone storage device |
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| JP2982092B2 (en) * | 1991-08-29 | 1999-11-22 | 富士写真フイルム株式会社 | Coater edge cleaning method and cleaning device |
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| JP2004066164A (en) * | 2002-08-08 | 2004-03-04 | Dainippon Printing Co Ltd | Coating head cleaning device and cleaning method |
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| KR100666347B1 (en) * | 2004-10-15 | 2007-01-11 | 세메스 주식회사 | Apparatus for cleaning a slit nozzle |
| JP4773209B2 (en) | 2006-01-12 | 2011-09-14 | パナソニック株式会社 | Component crimping equipment |
| JP4771419B2 (en) * | 2006-06-21 | 2011-09-14 | ヒューグルエレクトロニクス株式会社 | Cleaning head |
| CN201008870Y (en) * | 2007-03-05 | 2008-01-23 | 咸阳华清设备科技有限公司 | Screen dust removing device of flat panel display |
| CN101653770B (en) * | 2009-09-02 | 2012-05-23 | 友达光电股份有限公司 | Optical technical equipment capable of cleaning outlet of water knife or air knife |
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| TW201420219A (en) * | 2012-11-16 | 2014-06-01 | Nitto Ind Co Ltd | Dust removal device |
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2015
- 2015-10-23 JP JP2015208587A patent/JP6465489B2/en active Active
-
2016
- 2016-06-17 TW TW105119072A patent/TW201714676A/en unknown
- 2016-06-24 KR KR1020160079155A patent/KR102608681B1/en active IP Right Grant
- 2016-07-25 CN CN201610592679.7A patent/CN106607396A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112657946A (en) * | 2020-12-02 | 2021-04-16 | 深圳市华星光电半导体显示技术有限公司 | Cleaning device and exposure machine |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6465489B2 (en) | 2019-02-06 |
| KR20170048136A (en) | 2017-05-08 |
| JP2017084858A (en) | 2017-05-18 |
| CN106607396A (en) | 2017-05-03 |
| KR102608681B1 (en) | 2023-11-30 |
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