JP2017084858A - Cleaning head and cleaning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning head which has a cleaning function of simply and quickly removing foreign matter in an air suction port of the cleaning head and therearound and which achieves the reduction in manufacturing cost together with improvement in substrate quality, and also to provide a cleaning method.SOLUTION: Disclosed is a cleaning head 100 which includes: a moving part 22 which is induced and supported by an induction support part 21 mounted on a head body 10 and moves relatively and substantially parallel to the longitudinal direction of an air suction port 12; and a foreign matter removal part 23 which moves together with this moving part 22 and removes foreign matter in the air suction port 12 and therearound in a contact state.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a cleaning head having a function of cleaning an air suction port and its surroundings, and a cleaning method thereof.

  In the manufacturing process of various substrates (hereinafter simply referred to as a substrate) such as a semiconductor wafer, a glass plate of a liquid crystal display, and a film, it is necessary to remove dust from the surface of the substrate. For example, a cleaning head is disposed above the horizontal conveyance path of the substrate, and the cleaning head removes dust from the substrate to be conveyed.

  An air ejection port and an air suction port are formed on the bottom surface of the cleaning head. The air injection port and the air suction port are long slits in a direction substantially perpendicular to the substrate transport direction. The air ejection port of the cleaning head ejects cleaning air onto the substrate to be transported to blow away dust, and the air suction port sucks the dust scattered from the substrate together with the surrounding air to remove the dust from the entire surface of the substrate.

  A piece of glass or film may get caught in the air suction port of the cleaning head, or the piece may stick around the air suction port due to static electricity. This foreign matter may damage the substrate to be transported. In particular, when a foreign object is caught in the air suction port, the suction force is weakened at that location, so that dust cannot be removed at that location. The foreign matter adhering to the air suction port and the periphery thereof degrades the substrate quality and deteriorates the yield of substrate manufacture.

  In recent years, the substrate has become larger and thinner, and even a relatively small foreign object that is difficult to visually confirm that is fixed to the cleaning head can have a great influence on the substrate quality.

  In order to prevent deterioration of the substrate quality, it is necessary to clean and remove foreign matter, but it is not possible to specify when such foreign matter is fixed. Therefore, in the conventional cleaning operation, it is determined that a foreign substance has adhered when a substrate defect occurs, and the worker cleans and removes the foreign substance adhering to and around the air suction port.

  However, the gap from the transfer stage to the bottom surface of the cleaning head is only about a few millimeters, and the air suction port and its periphery are in a narrow place, so that it is not easy to clean and remove foreign matter by wiping. This cleaning work has problems such as low workability and new dust generation.

  And if this cleaning operation is difficult, if the stop time of the manufacturing facility becomes long, the manufacturing time is lost and the human cost also increases. As described above, the conventional technique has a problem that the manufacturing cost increases due to the adhesion of foreign matters to the cleaning head and the cleaning and removal thereof.

  Thus, it has been found that the air suction port of the cleaning head and the surrounding foreign matter are mechanically easily and quickly cleaned and removed. The prior art of such an apparatus for cleaning the air suction port of the clean head has not been found.

  In another technical field different from the clean head, the prior art of a device that mechanically cleans foreign matter is disclosed in, for example, Patent Document 1 (Japanese Patent No. 4773209). In the component crimping apparatus of Patent Document 1, the foreign substance is removed by moving the brush-shaped cleaning component 21 in the horizontal direction while contacting the upper surface of the stage surface 17 in FIGS. 6A, 6B, 3A, 3B, and the like. The structure is described.

  Another prior art device that mechanically cleans foreign matter is disclosed in, for example, Patent Document 2 (Japanese Patent No. 4031625). In the electronic component mounting apparatus disclosed in Patent Document 2, FIGS. 3 and 4 and the like describe a structure in which the foreign matter on the upper surface of the backup surface is removed by the brush 10.

  Another prior art device for mechanically cleaning foreign matter is disclosed in, for example, Patent Document 3 (Japanese Patent No. 3757215). In the dust removing device of Patent Document 3, FIG. 5 and the like describe that dust caught between the teeth 31 of the first scraper 30 is scraped by the scraping portion 41 of the second scraper 40.

  Another prior art device for mechanically cleaning foreign matter is disclosed in, for example, Japanese Patent Application Laid-Open No. 2014-46502. In the liquid ejecting apparatus of Patent Document 4, FIGS. 5 and 6, etc. describe that the cleaning member 40 is moved horizontally while contacting the liquid ejecting surface 12 of the liquid ejecting head 10 to remove foreign matters. .

Japanese Patent No. 4773209 (FIG. 6A, FIG. 6B, FIG. 3A, FIG. 3B) Japanese Patent No. 4031625 (FIGS. 3 and 4) Japanese Patent No. 3757215 (FIG. 5) Japanese Patent Laying-Open No. 2014-46502 (FIGS. 5 and 6)

  In the prior art cleaning head, the phenomenon that foreign matter adheres and the problems associated therewith rarely occur, so these problems have not been considered. Accordingly, no attention has been paid to the point of mechanically cleaning and removing foreign matter adhering to the cleaning head.

  The devices described in Patent Documents 1 to 4 also clean and remove foreign matters by contact, but have not been disclosed about an apparatus that removes the air suction port of the cleaning head and surrounding foreign matters.

  The present invention has been made in order to solve the newly noted problem as described above, and its purpose is to provide a cleaning function for easily and quickly removing the air suction port of the head body and the surrounding foreign matter. An object of the present invention is to provide a cleaning head and a cleaning method that improve the substrate quality and reduce the manufacturing cost.

In order to solve the above-mentioned problem, in the invention described in claim 1,
A cleaning head equipped with a head main body in which a long hole air suction port is formed in the longitudinal direction, and a cleaning device for cleaning the air suction port of the head main body and its surroundings,
The cleaning device includes:
A guide support attached to the head body;
A moving part that is guided and supported by the guiding support part and moves relatively and substantially parallel to the longitudinal direction of the air suction port;
The cleaning head is provided with a foreign matter removing portion that moves together with the moving portion and contacts and removes the air suction port and the surrounding foreign matter.

In the invention described in claim 2,
The cleaning head according to claim 1, wherein
The foreign matter removing portion is a rod-like or strip-like long body substantially parallel to the bottom surface on which the air suction port is formed, and the long body comes into contact with and cleans the air suction port and its surroundings. The cleaning head was characterized by this.

In the invention described in claim 3,
The cleaning head according to claim 1, wherein
The foreign matter removing unit is a roller that is supported by a rotation shaft that is substantially parallel to a bottom surface on which the air suction port is formed, and cleaning is performed while the roller rotates and contacts the air suction port and its periphery. The cleaning head is characterized by the above.

In the invention described in claim 4,
The cleaning head according to claim 3.
The roller is an electrostatic roller for preventing static charge.

In the invention described in claim 5,
A method of cleaning using the cleaning device according to any one of claims 1 to 4,
The cleaning method is characterized in that cleaning is performed in a state where suction from the air suction port is stopped.

In the invention described in claim 6,
In the cleaning method of Claim 5,
The cleaning method is characterized in that cleaning is performed in a state where cleaning air is ejected from an air outlet of the cleaning head.

In the invention described in claim 7,
A method of cleaning using the cleaning device according to any one of claims 1 to 4,
A foreign matter sensor for monitoring the air suction port and its surroundings is arranged, and cleaning is performed when it is determined that there is a foreign matter based on a detection signal from the foreign matter sensor.

In the invention described in claim 8,
A method of cleaning using the cleaning device according to any one of claims 1 to 4,
A cleaning method, wherein a transfer stage is arranged so as to have a shutter directly under the cleaning head, the shutter is opened during cleaning, and the removed foreign matter is dropped under the transfer stage via the shutter. It was.

  According to the present invention, there is provided a cleaning head and a cleaning method that have a cleaning function for easily and quickly removing the air suction port of the head main body and the surrounding foreign matter, and improve the substrate quality and reduce the manufacturing cost. can do.

It is explanatory drawing of the cleaning head of the 1st form for implementing this invention, Fig.1 (a) is a side view, FIG.1 (b) is a front view. It is explanatory drawing of the cleaning head of the 2nd form for implementing this invention, Fig.2 (a) is a side view, FIG.2 (b) is a front view. It is explanatory drawing of the usage example of the cleaning head of the 1st form for implementing this invention, Fig.3 (a) is a side view of the cleaning head of the state before cleaning, FIG.3 (b) is the state before cleaning. FIG. 3C is a side view of the cleaning head in the middle of cleaning, and FIG. 3D is a front view of the cleaning head in the middle of cleaning. It is explanatory drawing of the usage example of the cleaning head of the 2nd form for implementing this invention. It is explanatory drawing of the other usage example of the cleaning head of the 1st form for implementing this invention, Fig.5 (a) is a side view, FIG.5 (b) is a front view. It is explanatory drawing of the other usage example of the cleaning head of the 2nd form for implementing this invention, Fig.6 (a) is a side view, FIG.6 (b) is a front view.

  Hereinafter, a cleaning head 100 according to a first embodiment for carrying out the present invention will be described with reference to the drawings. As shown in FIG. 1, the cleaning head 100 includes a head body 10 and a cleaning device 20.

  The head body 10 further includes an air ejection port 11, an air suction port 12, an air supply unit 13, and an exhaust unit 14. The shape of the head body 10 exemplifies a rectangular parallelepiped formed by six surfaces. On the bottom surface, although not shown, an air injection port 11 and an air suction port 12, which are two parallel straight long holes, are elongated in the longitudinal direction of the head body 10 (left and right direction in FIG. 1B). It is formed as follows. The cleaning air supplied from the air supply unit 13 is injected from the air injection port 11. Then, the dust sucked by the air suction port 12 is discharged from the exhaust part 14.

  The cleaning device 20 further includes a guide support portion 21, a moving portion 22, and a foreign matter removing portion 23.

  As shown in FIG. 1B, the guide support portion 21 is formed on the front surface of the head main body 10 and is, for example, a rail that is long in the longitudinal direction of the head main body 10 (left-right direction in FIG. 1B). In FIG. 1, the guide support portion 21 is attached at the middle height of the front face of the head body 10, but may be attached at the lower height of the front face so as to be close to the bottom surface of the head body 10.

  The moving part 22 is configured to move while sliding along the guide support part 21 at one end thereof. In addition, a foreign substance removing unit 23 is attached to the other end of the moving unit 22. The foreign substance removing unit 23 and the moving unit 22 are integrated and move in the longitudinal direction (the left-right direction in FIG. 1B) along the guide support unit 21.

  More specifically, the foreign matter removing unit 23 is substantially perpendicular to the longitudinal direction of the long air jet port 11 and the air suction port 12, and the head body 10 in which the air jet port 11 and the air suction port 12 are formed. It is a rod-like or strip-like long body that is long in a direction substantially parallel to the bottom surface of the plate. In this long body, at least the side or surface that contacts the bottom surface of the head body 10 is parallel. In FIG. 1, there is a visible gap between the bottom surface of the head main body 10 and the foreign matter removing portion 23. This is for easy viewing of the drawing, and is actually in contact.

  The foreign matter removing portion 23 is formed of a relatively hard member that is elastic to the extent that the air suction port 12 is not damaged. The foreign matter removing portion 23 is preferably hard because it presses the air suction port 12 of the head main body 10 and its periphery with an appropriate force.

  The foreign matter removing unit 23 moves while making line contact or surface contact with the air suction port 12 and its surroundings by scraping the air suction port 12 and its surrounding foreign matters by the effect of elastic support by a rod-like or strip-like long body. Will take. Although the air injection port 11 blows off most of the foreign matter, there is very little possibility that the foreign matter will stick. However, the foreign matter removing unit 23 can also clean the air injection port 11, and the air injection port 12 is surrounded by the air injection port 12. The mouth 11 is also included (hereinafter, defined similarly in this specification).

  Next, the principle of cleaning by the cleaning head 100 of the present invention will be described. When a foreign object such as a glass piece is caught in the air suction port 12 of the cleaning head 100 or when it is fixed around it, the foreign object can be easily dropped by contacting any member, or the suction can be stopped. Experience has shown that foreign objects fall. Cleaning is performed by combining these methods.

  Next, a cleaning method for the cleaning head 100 of this embodiment will be described. A foreign object such as a glass piece is sandwiched in the air suction port 12 of the head main body 10, and the foreign object is stuck to the periphery by electrostatic force. First, the injection from the air injection port 11 and the suction from the air suction port 12 are stopped. This eliminates the suction force applied to the foreign matter sandwiched between the air suction ports 12 and facilitates removal of the foreign matter. When the worker moves the moving unit 22 while the foreign matter removing unit 23 is in line contact or surface contact with the air suction port 12 and its surroundings, the foreign matter removing unit 23 is also moved in the longitudinal direction, and the foreign matter removing unit 23 is moved. Scrapes off the air suction port 12 and the surrounding foreign matter.

  The foreign matter removing unit 23 is adjusted so that the pressing force to the air suction port 12 and its surroundings is appropriate, and the foreign matter removing unit 23 comes into close contact and scrapes off the foreign matter. At this time, since the suction is stopped, the foreign matter easily falls from the air suction port 12 and its surroundings by the contact.

  And when the foreign material removal part 23 moves to one edge part of right and left, it is reversed and moved so that it may return to the original direction. Finally, the foreign substance removing unit 23 is stopped at the standby position that was originally there. This cleaning is performed periodically during idle time when dust is not removed, or when a foreign object is found. According to the cleaning head 100 of this embodiment, the air suction port and its surroundings can be easily cleaned.

  Next, a cleaning head 200 according to a second embodiment for carrying out the present invention will be described with reference to the drawings. As shown in FIG. 2, the cleaning head 200 includes a head body 10 and a cleaning device 30.

  Compared to the first embodiment described above with reference to FIG. 1, in the second embodiment, the head body 10 is the same as the configuration of the first embodiment described above, but the cleaning device 30 has the same configuration. Is different. The cleaning device 30 further includes a guide support unit 21, a moving unit 22, and a foreign matter removing unit 24. In this embodiment, only the foreign matter removing unit 24 is different.

  Therefore, the head main body 10 and the guide support portion 21 and the moving portion 22 of the cleaning device 30 are denoted by the same reference numerals and redundant description is omitted, and only the foreign matter removing portion 24 of the different cleaning device 30 will be described. In FIG. 2, there is a visible gap between the bottom surface of the head body 10 and the foreign matter removing portion 24, but this is to make the drawing easier to see and is actually in contact.

  Specifically, the foreign matter removing unit 24 of the cleaning device 30 is substantially perpendicular to the longitudinal direction of the air ejection port 11 and the air suction port 12, and the head body in which the air ejection port 11 and the air suction port 12 are formed. 10 is a roller that is pivotally supported by a rotating shaft that is long in a direction substantially parallel to the bottom surface of 10. The roller is, for example, a brush, rubber, sponge, or a cloth wound around the surface of a cylindrical body. By using such a roller, the air suction port 12 and surrounding foreign matters are scraped off.

  The roller is preferably an electrostatic roller for preventing charging. Using an electrostatic roller, the static electricity on the bottom surface is neutralized to weaken the electrostatic force, and then cleaned while scraping off foreign objects stuck by the electrostatic force.

  In the cleaning by the foreign matter removing unit 24, the air suction port 12 is slidably contacted with an appropriate pressing force while the moving unit 22 is moved and the foreign matter removing unit 24, which is a roller, rotates with respect to the air suction port 12 and its surroundings. 12 and surrounding foreign objects are scraped off.

  Next, a cleaning method for the cleaning head 200 of this embodiment will be described. A foreign object such as a glass piece is sandwiched in the air suction port 12 of the head main body 10, and the foreign object is stuck to the periphery by electrostatic force. First, the injection from the air injection port 11 and the suction from the air suction port 12 are stopped. When the worker moves the moving unit 22 in a state where the foreign matter removing unit 24 is in contact with the air suction port 12 and its surroundings, the foreign matter removing unit 24 is also moved in the longitudinal direction, and the foreign matter removing unit 24 is moved to the air suction port. 12 and the surrounding foreign material are scraped off.

  The foreign matter removing unit 24 is adjusted so that the pressing force to the air suction port 12 and its surroundings is appropriate, and the foreign matter removing unit 24 rotates and scrapes the foreign matter. At this time, since the suction is stopped, the foreign matter easily falls from the air suction port 12 and its surroundings.

  And when the foreign material removal part 24 moved to one end part of right and left, it is reversed and moved so that it may return to the original direction. Finally, the foreign substance removing unit 24 is stopped at the standby position that was originally there. This cleaning is performed periodically during idle time when dust is not removed, or when a foreign object is found. According to the cleaning head 200 of this embodiment, the air suction port and its surroundings can be easily cleaned.

  The cleaning head has been described as using one of the foreign matter removing unit 23 according to the first form or the foreign matter removing unit 24 according to the second form. Depending on the situation, the foreign matter removing section 23 which is a long body is attached to form the cleaning head 100 of the first form, or the foreign matter removing section 24 which is a roller is attached to form the cleaning head 200 of the second form. You may use it properly.

  In the cleaning heads 100 and 200 of the first and second embodiments, both the ejection from the air ejection port 11 and the suction from the air suction port 12 are stopped for cleaning. You may clean in the state injected from the air injection port 11, stopping suction. In this case, the scraped foreign matter is blown off. Moreover, you may clean in the state attracted | sucked from the air suction port 12, stopping the injection from the air injection port 11. FIG. In this case, the scraped foreign matter is sucked. It can be employed as appropriate depending on the circumstances.

  Subsequently, another embodiment of the cleaning method will be described. This embodiment is a cleaning method that improves the cleaning method of the cleaning head 100 of the first embodiment described above with reference to FIG. Although not shown, a foreign matter sensor for monitoring the air suction port 12 of the cleaning head 100 and its surroundings is provided.

  For example, the foreign matter sensor is a camera, and the air suction port without the foreign matter and its surrounding image are compared with the captured air suction port and the surrounding image. The worker starts cleaning when the worker determines. Furthermore, a control unit that drives and controls the moving unit 22 may be provided, and the control unit may drive and control the moving unit 22 so as to start cleaning based on a detection signal of the foreign matter sensor. In addition, an output unit may be connected to the control unit so that the worker is notified by voice or display that it is determined that cleaning is necessary. This cleaning method may be applied to the second cleaning method using the cleaning head 200 according to the second embodiment described above with reference to FIG. It can be set as the cleaning methods like these.

  Next, another embodiment of the cleaning method will be described. In this embodiment, the cleaning method using the cleaning head 100 of the first embodiment described above is further improved. This cleaning method will be described with reference to FIG. As shown in FIGS. 3A and 3B, the substrate is transported by the transport stage 300 below the cleaning head 100.

  The transfer stage 300 sequentially transfers substrates from the upstream side (right side in FIG. 3A). The cleaning head 100 performs dust removal when passing under the cleaning head 100.

  A shutter 301 is disposed immediately below the cleaning head 100. During normal substrate transfer, the shutter 301 is closed as shown in FIG. 3A, and the moving unit 22 of the cleaning device 20 is stopped as shown in FIG. 3B.

  During cleaning, the ejection from the air ejection port 11 and the suction from the air suction port 12 are stopped, and the shutter 301 is opened as shown in FIG. Then, as shown in FIG. 3D, the foreign matter removed by the movement of the moving unit 22 of the cleaning device 20 is dropped under the transfer stage 300 via the shutter 301. Thereby, the foreign matter is removed. In this cleaning method, the cleaning method using the foreign matter sensor may be applied together.

  Further, as shown in FIG. 4, the cleaning method using the shutter 301 may be applied to the cleaning method using the cleaning head 200 of the second embodiment described above. Moreover, you may apply together the cleaning method using said foreign material sensor also in this cleaning method.

  Next, another embodiment will be described. In this embodiment, as shown in FIGS. 5A and 5B, the cleaning head 100 of the first embodiment described above is disposed on the upper side, and the opposing cleaning head 400 is disposed on the lower side. In this case, the space between the cleaning head 100 and the counter cleaning head 400 is a narrow space, but the foreign matter removing portion 23 of the cleaning head 100 is disposed in this space, and the air suction port 12 can be cleaned. In this case, the cleaning head 100 and the counter cleaning head 400 suck together, so that the scraped foreign matter can be cleaned and removed by suction from above and below. The present invention can also be applied to a cleaning head for removing dust on both sides of the substrate.

  Next, another embodiment will be described. In this embodiment, as shown in FIGS. 6A and 6B, the cleaning head 200 of the second embodiment described above is arranged on the upper side and the counter cleaning head 400 is arranged on the lower side. Also in this case, the space between the cleaning head 200 and the counter cleaning head 400 is a narrow space. However, the foreign matter removing unit 24 of the cleaning head 200 is disposed in this space, and the air suction port 12 can be cleaned. . In this case, since the cleaning head 200 and the counter cleaning head 400 suck together, the scraped foreign matter can be cleaned and removed by suction from above and below. The present invention can also be applied to a cleaning head for removing dust on both sides of the substrate.

  The cleaning head and the cleaning method of the present invention have been described above with reference to the drawings. The cleaning head described above is described assuming a PV type cleaning head having one air ejection port and one air suction port. However, one air ejection port is disposed between two air suction ports. A VPV type cleaning head or a PVP type cleaning head in which one air suction port is arranged between two air ejection ports may be used. Even in such a case, the present invention can be implemented.

  In the cleaning head described above, as shown in FIG. 1B and FIG. 2B, the guide support portion 21 of the cleaning device 20 is disposed on the front side. You may arrange | position the guidance support part 21 to not shown. Even in such a case, the present invention can be implemented.

  According to the cleaning head and the cleaning method described above, it has a cleaning function for easily and quickly removing the air suction port of the head main body and the surrounding foreign matter, and as a result, the substrate quality is improved and the manufacturing cost is reduced. To do.

  The cleaning head and the cleaning method of the present invention can be applied to the production of various substrates used in electric / electronic products.

100, 200: Cleaning head 10: Head body 11: Air outlet 12: Air suction port 13: Air supply unit 14: Exhaust unit 20, 30: Cleaning device 21: Guide support unit 22: Moving unit 23: Foreign matter removing unit ( Long body)
24: Foreign matter removing section (roller)
300: Transport stage 301: Shutter 400: Opposing cleaning head

Claims (8)

A cleaning head equipped with a head main body in which a long hole air suction port is formed in the longitudinal direction, and a cleaning device for cleaning the air suction port of the head main body and its surroundings,
The cleaning device includes:
A guide support attached to the head body;
A moving part that is guided and supported by the guiding support part and moves relatively and substantially parallel to the longitudinal direction of the air suction port;
A cleaning head, comprising: a foreign matter removing portion that moves together with the moving portion to contact and remove the air suction port and the surrounding foreign matter. The cleaning head according to claim 1, wherein
The foreign matter removing portion is a rod-like or strip-like long body substantially parallel to the bottom surface on which the air suction port is formed, and the long body comes into contact with and cleans the air suction port and its surroundings. A cleaning head characterized by that. The cleaning head according to claim 1, wherein
The foreign matter removing unit is a roller that is supported by a rotation shaft that is substantially parallel to a bottom surface on which the air suction port is formed, and cleaning is performed while the roller rotates and contacts the air suction port and its periphery. A cleaning head characterized by: The cleaning head according to claim 3.
The cleaning head according to claim 1, wherein the roller is an electrostatic roller for preventing charging. A method of cleaning using the cleaning device according to any one of claims 1 to 4,
A cleaning method, wherein cleaning is performed in a state where suction from the air suction port is stopped. In the cleaning method of Claim 5,
A cleaning method, wherein cleaning is performed in a state where cleaning air is ejected from an air ejection port of the cleaning head. A method of cleaning using the cleaning device according to any one of claims 1 to 4,
A cleaning method, wherein a foreign matter sensor for monitoring the air suction port and its surroundings is disposed, and cleaning is performed when it is determined that there is a foreign matter based on a detection signal from the foreign matter sensor. A method of cleaning using the cleaning device according to any one of claims 1 to 4,
A cleaning method, wherein a transfer stage is arranged so as to have a shutter directly under the cleaning head, the shutter is opened during cleaning, and the removed foreign matter is dropped under the transfer stage via the shutter. .

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