TWI710411B - Cleaning system, cleaning method of transparent substrate, and manufacturing method of electronic device - Google Patents

Abstract

The invention provides a cleaning system, a cleaning method of a transparent substrate, and a manufacturing method of electronic equipment. The cleaning system removes foreign matter attached to the surface of the thin plate, and includes: a conveying device for conveying the thin plate; and a cleaning device having a cleaning section disposed opposite to the surface of the thin plate conveyed by the conveying device. The cleaning device includes a relative movement mechanism, the relative movement mechanism In a state where the cleaning section is directly or indirectly in contact with the surface of the thin plate for cleaning, the cleaning section is made to repeatedly perform relative static and moving operations with respect to the surface of the thin plate. The invention has the advantage of being able to clean the surface of the thin plate efficiently and reliably.

Description

Cleaning system, cleaning method of transparent substrate, and manufacturing method of electronic device

The present invention relates to a cleaning system, a cleaning method of a transparent substrate, and a manufacturing method of an electronic device.

In electronic devices such as portable phones and smart phones, glass substrates are used. In the production line of electronic equipment, as a cleaning system that cleans the surface of a glass substrate, for example, a cleaning system described in JP 2006-272223 A is known. The system described in this publication cleans the surface of the glass substrate by covering the fabric on a squeegee and moving the glass substrate while pressing the cloth on the glass substrate by the squeegee. In the system described in this publication, the operation of relatively moving the squeegee from one end to the other end of the glass substrate is repeated three times.

[Prior Technical Literature]

[Patent Literature]

Patent Document 1: Japanese Patent Application Publication No. 2006-272223.

However, when foreign matter with high viscosity such as an adhesive or the like adheres to the surface of the glass substrate, or when oil or the like adheres to the center of the glass substrate, there is a system described in the above-mentioned gazette. The situation that cannot be erased even after erasing.

In addition, in the system described in the above publication, after the squeegee is relatively moved from one end of the glass substrate to the other end, for the next erasing operation, the squeegee is returned to one end of the glass substrate again and then the erasing operation is performed. Therefore, the work efficiency is poor, and it takes a very long time to erase a large number of glass substrates.

Therefore, the technical problem of the present invention is to provide a cleaning system and a cleaning method that can efficiently and reliably clean the surface of a thin plate, and a manufacturing method of an electronic device.

The invention completed in order to solve the above technical problems is a cleaning system for removing foreign objects attached to the surface of a thin plate. The cleaning system includes: a conveying device for conveying the thin plate; and a cleaning device having and A cleaning part arranged opposite to the surface of the thin plate conveyed by the conveying device; the cleaning device includes a relative movement mechanism that directly or indirectly makes the cleaning part directly or indirectly contact the surface of the thin plate for cleaning Next, the cleaning part is made to repeatedly perform a relative static motion and a moving motion with respect to the surface of the thin plate.

In this cleaning system, by the relative movement mechanism, the relative static motion of the cleaning portion with respect to the surface of the thin plate is repeated in a state where the cleaning portion is directly or indirectly in contact with the surface of the thin plate And moving action, so the cleaning part can efficiently and reliably remove foreign matter on the surface of the sheet. That is, in this cleaning system, with respect to the surface of the thin plate, the cleaning part performs not only a relative movement action but also a static action. Therefore, not only the removal of foreign matter by dynamic friction but also the removal of foreign matter by static friction can be performed reliably Remove foreign objects on the surface of the sheet. Here, the term “direct” means that the contact surface directly contacts the thin plate for erasing. When the cleaning portion has a structure suitable for erasing the thin plate, the cleaning portion directly contacts the thin plate for erasing. The so-called indirect means that one or more other members such as a fabric member are arranged between the contact surface and the thin plate. When the contact surface is not a structure suitable for erasing the thin plate, etc., the cleaning part is indirectly contacted with Wipe thinly.

Preferably, the conveying device conveys the surface of the thin plate in the cleaned state cleaned by the cleaning device in one direction. Thereby, the surface of the thin plate can be cleaned by the cleaning device while conveying the thin plate in one direction by the conveying device.

In this case, it is preferable that the relative movement mechanism moves the cleaning part in the one direction or in the direction opposite to the one direction with respect to the surface of the thin plate during the movement operation. By moving the cleaning part in the one direction at the same speed as the thin plate, a stationary operation of the cleaning part can be obtained, and the removal of foreign matter can be performed by static friction. In addition, by moving the cleaning part in the opposite direction to the one direction, the relative speed of the cleaning part and the thin plate becomes faster, and the foreign matter on the surface of the thin plate can be effectively and reliably removed.

In this case, it is preferable that the relative movement mechanism alternately repeats the movement in one direction and the movement in the opposite direction, and in the movement, the cleaning moved by the relative movement mechanism The maximum moving speed of the part is faster than the moving speed of the surface of the thin plate conveyed by the conveying device. Thereby, the cleaning part can be vibrated in the one direction and the opposite direction by the relative movement mechanism, and the same location on the surface of the thin plate can be cleaned multiple times.

Preferably, the cleaning device further includes a switching mechanism that switches the cleaning portion between a state in which the cleaning portion is in direct or indirect contact with the surface of the thin plate and a state in which it is separated from the surface of the thin plate. Thus, by the switching mechanism, the cleaning operation can be performed with the cleaning unit directly or indirectly in contact with the surface of the thin plate, and the cleaning unit can be moved to the separation position without performing the cleaning operation.

Preferably, the cleaning portion indirectly contacts the surface of the thin plate via a fabric member. Thereby, the fabric member directly contacts the surface of the thin plate, and the foreign matter on the surface of the thin plate can be transferred to the fabric member by the cleaning operation.

Preferably, the cleaning device further includes a supply mechanism that supplies a fabric member to the cleaning part. Thus, when foreign matter on the surface of the thin plate is transferred to the fabric member, (the part of) the new fabric member is supplied to the cleaning section by the supply mechanism, and the cleaning operation can be performed by (the part of) the new fabric member.

Preferably, the cleaning device further includes: a columnar member having the cleaning portion on the front end surface; and a pressing member that presses the fabric member to the columnar member, thereby preventing from the supply mechanism to the The elongated fabric member supplied by the cleaning part is offset with respect to the cleaning part. As a result, it is possible to press the long fabric member toward the side wall surface of the columnar member by the pressing member, and it is difficult to cause the fabric member to deviate from the cleaning part during the cleaning operation (sliding of the fabric member on the cleaning part). , Carry out precise cleaning operations.

In this case, it is preferable that the columnar member has an edge between the front end surface and the side wall surface of the columnar member. Thereby, the foreign matter on the surface of the thin plate can be accurately removed by the fabric member located at the edge. In addition, the term "having an edge" means that the cross-sectional shape in the direction intersecting the front end surface and the side wall surface includes not only the case where the front end surface and the side wall surface are continuous through discontinuities, but also the front end surface and the side end surface through the curvature. When the corners with a radius of 3mm or less are continuous. In addition, the aforementioned radius of curvature is preferably 2 mm or less, and more preferably 1 mm or less.

Preferably, the conveying device further has a supply nozzle for supplying cleaning liquid to the cleaning part. Thus, by supplying the cleaning liquid to the cleaning section by the supply nozzle, cleaning with the cleaning liquid can be performed.

Preferably, the conveying device further has a holding portion that holds the thin plate, and a rail that allows the holding portion to travel in the one direction. As a result, the surface of the thin plate can be cleaned by the cleaning device in a state where the thin plate is held by the holding portion running along the rail.

Preferably, the cleaning system includes: the first conveying device that holds the thin plate from one of the surfaces of the thin plate; the first cleaning device that faces the conveyed by the first conveying device The other side of the thin plate is cleaned; the second conveying device holds the thin plate cleaned on one side by the first cleaning device from the other side; and the second cleaning device is used for the second cleaning device The side of the thin plate conveyed by the conveying device is cleaned. Thereby, the other side of the thin plate can be cleaned by the first cleaning device, one side of the thin plate can be cleaned by the second cleaning device, and both sides of the thin plate can be cleaned by the cleaning system.

Another invention completed in order to solve the above-mentioned technical problems is a cleaning method of a transparent substrate for cleaning the surface of a transparent substrate, wherein the surface of the transparent substrate is cleaned by the cleaning system constituted by the above configuration . Thus, the surface of the transparent substrate can be easily and reliably cleaned by the cleaning system.

In addition, another invention completed in order to solve the above-mentioned technical problems is a manufacturing method of an electronic device that manufactures an electronic device including a transparent substrate, which includes a cleaning step using the cleaning method of the transparent substrate. Thereby, the electronic device using the cleaned transparent substrate can be easily and reliably manufactured.

1A‧‧‧(First) Conveying Device

1B‧‧‧(Second) Conveying Device

3A‧‧‧(First) Cleaning Device

3B‧‧‧(Second) Cleaning Device

5‧‧‧Supply Organization

7‧‧‧Drive roller

9‧‧‧Driven roller

11‧‧‧Cleaning components

13‧‧‧Columnar member

13a‧‧‧cleaning surface (cleaning department)

13b‧‧‧Side wall surface

15‧‧‧Pressing member

17‧‧‧Switching mechanism

19‧‧‧Relative movement mechanism

21‧‧‧Cam

23‧‧‧Transfer member

25‧‧‧Retention Department

27‧‧‧Orbit

29‧‧‧Supply nozzle

100‧‧‧Cleaning System

C‧‧‧Fabric component

P1~P3‧‧‧Position

R‧‧‧Edge

T‧‧‧Arrow

W‧‧‧sheet

Fig. 1 is a schematic front view showing a cleaning system according to an embodiment of the present invention.

Fig. 2 is a schematic front view of a first cleaning device of the cleaning system.

Fig. 3 is a schematic front view of a second cleaning device of the cleaning system.

Fig. 4A is an enlarged schematic perspective view of the main part of the cleaning device.

Fig. 4B is an enlarged schematic front view of the main part of the columnar member of the cleaning device.

Fig. 5 is an enlarged schematic perspective view of the main part of the cleaning device.

6(A) to (D) are explanatory diagrams for explaining the operation of the cleaning device, FIG. 6(A) shows the supply state of the fabric member, and FIG. 6(B) shows the pressing of the fabric by the pressing member In the state of the members, FIG. 6(C) shows the state of supplying the cleaning liquid, and FIG. 6(D) shows the cleaning state.

FIG. 7 is a schematic explanatory diagram for explaining the relationship between the moving speed of the thin plate and the moving speed of the cleaning surface and time when the cleaning operation is performed.

Fig. 8 is an explanatory diagram for explaining the cleaning state by the cleaning device.

[First Embodiment]

Hereinafter, the cleaning system according to an embodiment of the present invention will be described in detail with reference to the drawings as appropriate.

<Cleaning System>

The cleaning system 100 shown in FIG. 1 is a system for cleaning foreign objects in a production line. The foreign objects are attached to glass plates (thin plates W) such as cover glass used in electronic devices such as smart phones and portable phones. surface. In addition, the thin plate W as a cleaning object is not limited to cover glass, and various other substrates can be used as objects. The cleaning system 100 can be suitably used for cleaning a transparent thin plate W having a plan view.

The cleaning system 100 includes: conveying devices 1A, 1B for conveying the thin plate W; and cleaning devices 3A, 3B, having a cleaning surface 13a as a cleaning portion arranged opposite to the surface of the thin plate W conveyed by the conveying devices 1A, 1B (see figure 2). The cleaning system 100 includes two conveying devices 1A, 1B and cleaning devices 3A, 3B, respectively. Specifically, the cleaning system 100 includes: a first conveying device 1A that adsorbs and holds one of the surfaces of the sheet W to convey; a first cleaning device 3A that compares the other of the sheet W conveyed by the first conveying device 1A One side cleaning; the second conveying device 1B, which sucks and holds the other side of the thin plate W cleaned by the first cleaning device 3A, and conveys; and the second cleaning device 3B, which is conveyed by the second conveying device 1B Clean the side of the thin plate W. In addition, if necessary, the following components can also be provided: a removing device that removes dust and the like generated by cleaning the surface of the thin plate W cleaned by the cleaning devices 3A, 3B; a lamination device A protective film or the like is stuck on the surface of the thin plate W cleaned by the cleaning devices 3A and 3B. In addition, the cleaning system 100 further includes a control device (not shown) that controls the operations of various devices such as the conveying devices 1A and 1B and the cleaning devices 3A and 3B.

The first conveying device 1A conveys the sheet W from a position P1 where the sheet W is received by a feeding device (not shown) to a position P2 where the sheet W is transferred to the second conveying device 1B. The first cleaning device 3A is arranged between the position P1 where the sheet W is received and the position P2 where it is transferred. The first cleaning device 3A cleans one surface (lower surface) of the sheet W conveyed by the first conveying device 1A. The first conveying device 1A conveys the surface of the thin plate W in a cleaning state by the first cleaning device 3A in one direction (the direction (X direction) from the position P1 where the thin plate W is received to the position P2 to be transferred). Here, the cleaning state means a state in which the surface of the thin plate W is being cleaned by the cleaning devices 3A and 3B. In addition, the first conveying device 1A conveys the sheet W in one direction (hereinafter, sometimes referred to as a conveying direction) at a constant speed.

The second conveying device 1B conveys the thin plate W from the position P2 where the thin plate W is transferred by the first conveying device 1A to the position P3 where the thin plate W is transferred to a delivery device (not shown). The second cleaning device 3B is arranged between the position P2 where the sheet W is transferred and the position P3 where it is transferred. The second cleaning device 3B cleans the other surface (upper surface) of the thin plate W conveyed by the second conveying device 1B. The second conveying device 1B conveys the surface of the thin plate W in a cleaning state by the second cleaning device 3B in one direction (the direction (X direction) from the position P2 where the thin plate W is received to the position P3 to be transferred). In addition, the second conveying device 1B conveys the thin plate W in one direction at a constant speed.

(First cleaning device)

2, the first cleaning device 3A includes a relative movement mechanism 19 for cleaning, the cleaning surface 13a is directly or indirectly in contact with the surface of the thin plate W in a state where the cleaning surface 13a is repeatedly performed with the thin plate. The surface of W is relatively static and moving. The cleaning surface 13a is indirectly in contact with the surface of the thin plate W via the long fabric member C. As shown in FIG. The fabric member C is selected according to the type of the thin plate W, the friction force with the thin plate W, the degree of absorption of the cleaning liquid, and the like.

As shown in Fig. 2, the first cleaning device 3A further includes a supply mechanism 5 that supplies the fabric member C to the cleaning surface 13a. The feeding mechanism 5 has a driving roller 7 and a driven roller 9 on which a fabric member C is spanned. The rotation of the driving roller 7 winds the fabric member C to the side of the driving roller 7 after the sheet W is cleaned. The roller 9 discharges the unused fabric member C. In addition, the supply mechanism 5 also has various types of rollers that adjust the tension while supplying the long fabric member C.

The supply mechanism 5 supplies the elongated fabric member C to the cleaning surfaces 13a of the two columnar members 13 as described later. The elongated fabric member C is first supplied to the cleaning surface 13a which contacts the thin plate W later, and then is supplied to the cleaning surface 13a which contacts the thin plate W first. In other words, the long fabric member C is conveyed in the direction of arrow T in FIG. 2. That is, the driving roller 7 is provided in the opposite direction (−X direction) of the conveying direction of the sheet W from the driven roller 9.

As shown in FIGS. 2 and 4A, and FIGS. 4B to 6, the first cleaning device 3A includes a pair of cleaning members 11 each having a cleaning surface 13a. Specifically, the cleaning member 11 on the upstream side (-X direction side) in the conveying direction cleans the thin plate W using the cleaning liquid supplied through the supply nozzle 29 described later, and the sheet W is cleaned by the downstream side in the conveying direction (X direction). The cleaning member 11 on the side) wipes off the wiping marks and/or wiping residues attached to the surface of the thin plate W.

Each cleaning member 11 has: a columnar member 13 having a cleaning surface 13a at the tip (the upper surface of the columnar member 13 in FIG. 2); and a pressing member 15 which presses from the side wall surface 13b side of the columnar member 13 The elongated fabric member C supplied by the supply mechanism 5 to the cleaning surface 13a (refer to FIGS. 4A and 4B to 6). In each cleaning member 11, one columnar member 13 is sandwiched by a pair of pressing members 15 from both sides of the fabric member C.

As shown in FIG. 4B, a pair of side wall surfaces 13b are provided substantially perpendicular to the front end surface (cleaning surface 13a) of the columnar member 13, and the columnar member 13 has an edge between the front end surface (cleaning surface 13a) and the side wall surface 13b. R. Specifically, in the cross-sectional shape in the direction intersecting the front end surface and the side wall surface 13b, the front end surface (the cleaning surface 13a) and the side wall surface 13b are continuous through a corner with a radius of curvature of 1 mm or less.

The columnar member 13 extends in a direction (Y direction) orthogonal to both the conveying direction (X direction) of the sheet W and the thickness direction (Z direction) of the sheet W, as shown in FIGS. 4A and 4B and FIG. The length in the orthogonal direction is set to be approximately the same length as the width of the sheet W (the length in the direction orthogonal to the conveying direction). The material of the columnar member 13 is not particularly limited, and a hard resin blade can be used. In addition, the shape of the front end surface (cleaning surface 13a) of the columnar member 13 is set in a direction (Y direction) orthogonal to both the conveying direction (X direction) of the sheet W and the thickness direction (Z direction) of the sheet W. It is a shape corresponding to the thin plate W. Specifically, when the surface shape of the thin plate W is a plane (when the surface shape of the thin plate W is a shape in which a straight line in the Y direction is continuous in the X direction), the front end surface of the columnar member 13 is set as a plane, In addition, when a part of the surface shape of the thin plate W is a shape that is curved in the Z direction as it goes to the Y direction (when the surface shape of the thin plate W is a shape in which the curve in the Y direction is continuous in the X direction), the column The front end surface of the shaped member 13 is formed in a shape (for example, a fish plate shape) in which a curve in the Y direction is continuous.

As shown in FIG. 2, the first cleaning device 3A further includes a switching mechanism 17 that switches each cleaning member 11 indirectly in contact with the surface of the sheet W via the fabric member C and a separated state. Specifically, the switching mechanism 17 is composed of an air cylinder that is connected to each cleaning member 11 (column member 13 and a pair of pressing members 15) to move the cleaning member 11 and the relative movement mechanism 19 up and down. The cleaning member 11 is configured by the switching mechanism. 17 rises, whereby the cleaning surface 13a indirectly contacts the surface of the conveyed sheet W via the fabric member C.

In addition, the switching mechanism 17 is provided so that the cleaning surface 13a can indirectly contact the surface of the holding portion 25 of the first conveying device 1A described later via the fabric member C. That is, in the cleaning system 100, the holding part 25 (refer FIG. 1) which does not hold the thin plate W can be cleaned by the cleaning member 11.

The relative movement mechanism 19 is a mechanism that reciprocates the cleaning member 11 in the conveying direction (X direction). Here, FIG. 7 shows the relationship between the speed of the cleaning member 11 and time. The straight line K in FIG. 7 represents the conveying speed of the sheet W. Therefore, in the area of S1, the thin plate W and the cleaning member 11 move at the same speed. The relative movement mechanism 19 makes the cleaning surface 13a alternately repeat the movement in the conveying direction (X direction) and the opposite direction (-X direction). During the movement, the movement speed of the cleaning surface 13a generated by the relative movement mechanism 19 is higher than that of the first The moving speed of the surface of the sheet W produced by a conveying device 1A is fast (refer to FIG. 7). In other words, the relative movement mechanism 19 in the cleaning indirect contact surface 13a on the surface of the sheet W in a state of the surface of the web W are repeated cleaning of the surface 13a opposite to the opposing stationary operation (S ₁ of FIG. 7) And move action. Therefore, in the relative movement mechanism 19, the static friction force and the dynamic friction force of the fabric member C act on the surface of the thin plate W alternately. In addition, the amplitude width of the reciprocating motion of the cleaning member 11 generated by the relative movement mechanism 19 is from 1/10 to 1/40 of the length of the thin plate W. The relative movement mechanism 19 drives the cleaning member 11 to make it within 1 minute. A predetermined number between 1000 and 2500 reciprocating.

The relative movement mechanism 19 specifically includes: a motor (not shown); a cam 21 that rotates by the rotational force of the motor; and converts the rotational force of the cam 21 into the cleaning member 11 (column member 13 and a The transmission member 23 transmits the driving force of the reciprocating movement of the pressing member 15 to the cleaning member 11. Therefore, the reciprocating movement of the cleaning member 11 is performed by the rotational force of the motor. As the relative movement mechanism 19, specifically, a crank and rocker mechanism can be used, for example.

(The first conveying device)

As shown in FIG. 1, the first conveying device 1A has: a holding portion 25 that holds the sheet W by suction; a rail 27 on which the holding portion 25 runs along the conveying direction (X direction); and a drive to drive the holding portion 25 Department (illustration omitted). Furthermore, the holding portion 25 cleans the surface (lower surface) by the first cleaning device 3A while the sheet W is being transported while traveling along the rail 27 in the transport direction (X direction).

In addition, the first conveying device 1A further has a supply nozzle 29 that supplies the cleaning liquid to the cleaning surface 13a. The supply nozzle 29 supplies the cleaning liquid to the cleaning surface 13a before cleaning the surface of the thin plate W by the cleaning surface 13a. Specifically, the supply nozzle 29 is provided in the holding portion 25 and moves in the conveying direction (X direction) together with the holding portion 25. The supply nozzle 29 supplies the cleaning liquid to the cleaning surface 13a on the upstream side (−X direction side) in the transport direction before the cleaning operation is started when the sheet W is transported. In addition, the supply nozzle 29 may also supply a small amount of cleaning liquid to the cleaning surface 13a on the downstream side (X direction side) in the conveying direction, or it may not be supplied. The supply nozzle 29 is provided on the conveyance direction side (X direction side) of the holding portion 25. In addition, the supply nozzle 29 extends in the Y direction, and the length in the orthogonal direction is set to be substantially the same as the length of the cleaning surface 13a (the length in the Y direction).

The first conveying device 1A has a vertical movement mechanism (not shown) for lowering the holding portion 25 in order to convey the thin plate W at the position P2 where the thin plate W is transferred.

(Second cleaning device)

The second cleaning device 3B includes substantially the same configuration as the first cleaning device 3A, and cleans the surface (upper surface) of the thin plate W opposite to the cleaned surface. In addition, as shown in FIG. 3, the second cleaning device 3B includes a configuration arranged upside down with the first cleaning device 3A. For members having the same configuration or function as the first cleaning device 3A, the same reference numerals are used in FIG. The detailed description is omitted.

(Second conveying device)

The second conveying device 1B is a device that has substantially the same configuration as that of the first conveying device 1A, and conveys the thin plate W cleaned by the second cleaning device 3B. In addition, in the second conveying device 1B, the same reference numerals are used for members having the same configuration or function as the first conveying device 1A, and detailed descriptions are omitted.

The second conveying device 1B has a holding portion 25 on which the sheet W received from the first conveying device 1A is placed. The holding portion 25 is supported from the lower surface of the thin plate W, has suction holes, and holds the thin plate W by suction.

In addition, the second conveying device 1B may have a vertical movement mechanism (illustration omitted) that raises the holding portion 25 in order to receive the thin plate W at the position P2 where the thin plate W is received.

<action>

Next, the operation performed by the cleaning system 100 will be described.

First, the sheet W is transferred from the feeding device to the holding portion 25 of the first conveying device 1A (position P1 in FIG. 1). Then, while the holding portion 25 of the first conveying device 1A moves in the conveying direction (X direction), when the supply nozzle 29 is located on the cleaning surface 13a, from the supply nozzle 29 to the cleaning surface 13a of the first cleaning device 3A (the fabric in contact with it) Part of component C) is supplied with cleaning liquid.

At the time of cleaning, a new part of the fabric member C is supplied to the cleaning surface 13a. Specifically, as shown in FIG. 6(A), in a state where the pair of pressing members 15 are separated (a state where the pressing of the pressing member 15 on the fabric member C to the side wall surface 13b of the columnar member 13 is released ) Next, by the rotation of the driving roller 7 of the supply mechanism 5, the unused fabric member C is discharged from the driven roller 9 and a new part of the fabric member C is supplied to the cleaning surface 13a. Then, as shown in FIG. 6(B), as the pair of pressing members 15 move to the columnar member 13, the pair of pressing members 15 press the fabric member C toward the side wall surface 13b of the columnar member 13. In this state, the fabric member C and the columnar member 13 move as a unit. In other words, the fabric member C does not deviate from the columnar member 13. Next, as described above, the supply nozzle 29 supplies the cleaning liquid to the cleaning surface 13a (see FIG. 6(C)). Then, as shown in (D) of FIG. 6, the cleaning member 11 (the columnar member 13 and the pair of pressing members 15) is moved (lifted) to the conveyed sheet W side by the switching mechanism 17.

At this time, as shown in FIG. 8(A), the cleaning surface 13a is located at the end of the sheet W in the conveying direction. The cleaning member 11 moves in the -X direction from this state. When the cleaning member 11 moves a predetermined distance in the −X direction as shown in FIG. 8(B), the cleaning member 11 moves in the X direction (FIG. 8(C)). Then, after the cleaning member 11 moves a predetermined distance in the X direction, it moves again in the -X direction. During this operation, the sheet W is always conveyed in the X direction at a predetermined speed. In this operation, at the timing when the thin plate W and the cleaning member 11 move in the same direction and speed, the cleaning member 11 causes static friction to act on the thin plate W and the foreign matter on the thin plate W. On the other hand, outside the timing when the static friction force acts, the dynamic friction force acts on the thin plate and the foreign matter on the thin plate W. In this way, the relative movement action of the cleaning member 11 and the cleaning performed by the stationary action are performed. Not only the removal of foreign matter by dynamic friction (wiping action) but also the removal of foreign matter by static friction (wiping action) is performed, and the lowering of the thin plate W Clean the surface.

The thin plate W is continuously moved in the X direction relative to the cleaning member 11, and after the cleaning member 11 is located at the end of the thin plate W in the -X direction (FIG. 8(D)), the cleaning member 11 moves a predetermined distance in the X direction as before ((E) of Fig. 8). Then, the cleaning unit then moves a predetermined distance in the -X direction. After the cleaning member 11 wipes the end of the thin plate W in the −X direction several times, the cleaning member 11 is separated from the thin plate W (FIG. 8(F) and FIG. 8(G)). In addition, Fig. 8(A) to Fig. 8(G) are expressed by a scale different from the actual scale in order to understand the configuration and operation.

The sheet W on which the upper surface has been cleaned by the first cleaning device 3A is transferred from the first conveying device 1A to the second conveying device 1B (position P2 in FIG. 1). Specifically, the holding portion 25 of the first conveying device 1A is moved downward by an air cylinder (W1 in FIG. 1), and at the time when the sheet W held by the holding portion 25 contacts the holding portion 25 of the second conveying device 1B , The suction holding by the holding unit 25 of the first conveying device 1A ends, and the suction holding by the holding unit 25 of the second conveying device 1B starts.

In this way, after the sheet W is transferred from the first conveying device 1A to the second conveying device 1B, the second conveying device 1B and the second cleaning device 3B also communicate with the first conveying device 1A and the first cleaning device 3A. In the same operation, the lower surface of the thin plate W is cleaned. Then, the sheet W on which the lower surface has been cleaned by the second cleaning device 3B is transferred to the delivery device (position P3 in FIG. 1).

On the other hand, the holding portion 25 of the first conveying device 1A that transfers the sheet W to the second conveying device 1B returns to the position P1 in FIG. 1. Similarly, the holding portion 25 of the second conveying device 1B that transfers the thin plate W to the delivery device returns to the position P2 in FIG. 1. The holding part 25 can be cleaned by the cleaning member 11 even when the holding part 25 returns to each position.

<Method of Manufacturing Electronic Equipment>

Next, a method of manufacturing an electronic device using the cleaning system 100 described above will be described. The manufacturing method of this electronic device has a step of cleaning the transparent substrate as the thin plate W using the cleaning system 100. In this cleaning step, the cleaning system 100 is used to clean both sides of the transparent substrate.

<Advantages>

When cleaning with the cleaning system 100, as described above, the cleaning surface 13a not only moves relative to the surface of the thin plate W but also performs a stationary action, so it can not only remove foreign matter caused by dynamic friction but also perform static friction. The removal of foreign matter can reliably remove foreign matter on the surface of the thin plate W. That is, static friction exerts stronger force on foreign matter than dynamic friction, so the foreign matter can be removed more effectively.

In addition, the cleaning surface 13a reciprocates in the conveying direction with respect to the surface of the sheet W, and the cleaning surface 13a moves in both the conveying direction and the opposite direction. Therefore, compared with the case where the force is only applied in one direction, the direction is much different. Forces in each direction act on foreign objects, which can effectively remove foreign objects.

Even when a foreign object with a strong adhesive force is attached to the thin plate W, the edge R of the columnar member 13 can apply an impact force to the foreign object multiple times, so the foreign object with a strong adhesive force can be easily removed.

Furthermore, the cleaning surface 13a moves relative to the surface of the thin plate W in the direction along the conveying direction. Therefore, by adopting the cleaning surface 13a corresponding to the shape of the thin plate W, it can be used for cleaning of various thin plates W. Specifically, for example, even a cleaning object (thin plate W) with terminals provided around the glass such as a liquid crystal panel, a cleaning object (thin plate W) in which a glass substrate is embedded in a frame, and 3D glass with a curved surface (Thin plate W), etc., not only a cleaning object composed of a simple flat plane, but also precise cleaning can be performed by providing the cleaning surface 13a along the shape. In particular, the cleaning devices 3A and 3B include the switching mechanism 17. Therefore, by making the cleaning surface 13a contact the thin plate W only at the part of the object to be cleaned, and then separating it, the thin plate W with a special shape can also be accurately applied to the cleaning object. The part is cleaned.

[Other embodiments]

The embodiments disclosed this time should be regarded as illustrative in all aspects and not restrictive. The scope of the present invention is not limited to the configuration and numerical values of the above-mentioned embodiments, and is expressed by the scope of patent application, and its meaning includes the meaning equivalent to the scope of patent application and all changes (substitution, addition, and deletion of the configuration) within the scope.

That is, in the above-mentioned embodiment, the case where the supply nozzle for supplying the cleaning liquid is provided in the conveying device has been described, but the present invention is not limited to this. For example, the supply nozzle may be provided in the cleaning device. Specifically, the supply nozzle may be provided to supply the cleaning liquid to the fabric member between the pair of cleaning parts. In addition, when the supply nozzle is provided in the holding part of the conveying device, it is not limited to the provision of the supply nozzle on the conveying direction side of the holding part, and can also be provided on the opposite side of the conveying direction (-X direction side). .

In addition, in the above-mentioned embodiment, the use of a resin blade as the columnar member is described, but instead of resin, metal or the like can be used, and a member such as resin, rubber, etc. covering the tip surface, or as a column The shape member uses a backing plate or the like.

Furthermore, a groove may be formed in the front end surface (cleaning surface) of the columnar member, and a structure such as frictional force may be easier to act than when the front end surface is a flat surface.

In the above-mentioned embodiment, the reciprocating motion of the cleaning surface has been described, but it is also possible to effect a configuration in which the cleaning surface is intermittently moved in one direction, that is, repeated in one direction and stopped. Furthermore, the moving direction of the cleaning surface is not limited to the conveying direction (X direction) of the sheet W and/or the opposite direction, and it may be moved in other directions. In other words, it may be moved in three directions. The structure moves in the direction above the direction. In this case, forces in different directions act on the foreign matter, so it is easier to remove the foreign matter.

In the above embodiment, the structure in which the cleaning surface reciprocates while the sheet W is conveyed at a constant speed to erase the surface of the sheet W has been described, but the sheet member 13 may be moved without conveying the sheet W in the cleaning state. constitute.

In the above-mentioned embodiment, the two cleaning members 11 are moved (reciprocating) in the X direction and the −X direction in both directions, but the present invention is not limited to this. The cleaning member 11 on the rear side in the transport direction of the sheet W may not be reciprocated. In the case of reciprocating movement, there is a possibility that wiping marks and the like remain at the site where the static friction acts, but this configuration can prevent the wiping marks from remaining.

In the above-mentioned embodiment, the amplitude width of the reciprocating motion of the cleaning member 11 moved by the relative movement mechanism 19 is described as 1/10 to 1/40 of the length of the thin plate W, and the relative movement mechanism 19 is in 1 minute. The cleaning member 11 is driven to reciprocate a predetermined number between 1,000 and 2,500, but the present invention is not limited to this. The amplitude width may be about one-fifth or about one-fifth of the thin plate W, and the number of reciprocations in one minute may be about 500 or about 3000. When it is moved quickly, the force acting on the foreign body becomes larger, so it is effective, but the more frequent the static friction force acts, the foreign body is easier to remove. It is preferable to determine the most suitable conditions based on the material of the sheet and/or the cleaning environment.

In addition, in the above-mentioned embodiment, the cleaning of both sides of the thin plate was described, but only one side of the thin plate may be cleaned. In this case, the first cleaning device and the first conveying device, or the second cleaning device and the second conveying device may be used.

In the above-mentioned embodiment, the conveying device conveys the sheet W while adsorbing and holding it. However, the present invention is not limited to this, and other technical solutions may also be used to maintain the conveyance. For example, it is also possible to use mechanical and physical holding of the sheet W. constitute.

In the above-mentioned embodiment, the structure in which the thin plate is cleaned by the cleaning surface is adopted, but the present invention is not limited to this, and a structure in which the thin plate is cleaned by contacting the thin plate in a linear or dotted manner can also be adopted.

In the above embodiment, the case of cleaning a flat sheet is described, but the present invention is not limited to this, and can also be applied to an object in which a member that does not need to be cleaned is arranged around the part as the cleaning object When cleaning, it is not a flat plate but a thin plate provided with protruding parts.

Furthermore, in the above-described embodiment, the columnar member has been described having a length approximately the same as the width of the thin plate, but the present invention is not limited to this. For example, the columnar member may have a length larger than the width of the thin plate. In this case, cleaning can be performed with respect to thin plates of various widths. Furthermore, when cleaning a thin plate of a shape protruding at both ends in the width direction, by using a columnar member having a length shorter than the width of the thin plate, the protrusion can be avoided or the cleaning surface can be cleaned while erasing the protrusion.

The cleaning system of the present invention and the transparent plate cleaning system of the present invention can be suitably used for cleaning transparent plates such as glass substrates used in display devices of portable devices.

1A‧‧‧(First) Conveying Device

1B‧‧‧(Second) Conveying Device

3A‧‧‧(First) Cleaning Device

3B‧‧‧(Second) Cleaning Device

25‧‧‧Retention Department

27‧‧‧Orbit

29‧‧‧Supply nozzle

100‧‧‧Cleaning System

P1~P3‧‧‧Position

W‧‧‧sheet

Claims (14)

A cleaning system for removing foreign objects attached to the surface of a thin plate. The cleaning system includes: a conveying device for conveying the thin plate; and a cleaning device having a cleaning section arranged opposite to the surface of the thin plate conveyed by the conveying device The cleaning device includes a relative movement mechanism, and the relative movement mechanism causes the cleaning portion to repeatedly perform a relative static motion with respect to the surface of the thin plate in a state where the cleaning portion directly or indirectly contacts the surface of the thin plate for cleaning And move action. The cleaning system according to claim 1, wherein the conveying device conveys the surface of the thin plate in the cleaning state cleaned by the cleaning device in one direction. The cleaning system according to claim 2, wherein the relative movement mechanism moves the cleaning portion relative to the surface of the thin plate in the one direction, or in the direction opposite to the one direction during the movement operation. The cleaning system according to claim 3, wherein the relative movement mechanism alternately repeats the movement in one direction and the movement in the opposite direction; in the movement, the cleaning unit moved by the relative movement mechanism The maximum moving speed of is faster than the moving speed of the surface of the thin plate conveyed by the conveying device. The cleaning system according to claim 1, wherein the cleaning device further includes a switching mechanism that switches the cleaning portion between a state in which the cleaning portion is in direct or indirect contact with the surface of the thin plate and a state in which it is separated from the surface of the thin plate. The cleaning system according to claim 1, wherein the cleaning section indirectly contacts the surface of the thin plate via a fabric member. The cleaning system according to claim 6, wherein the cleaning device further includes a supply mechanism that supplies the fabric member to the cleaning section. The cleaning system according to claim 7, wherein the cleaning device further includes: a columnar member having the cleaning portion on the front end surface of the columnar member; and a pressing member for pressing the fabric member to the columnar member This prevents the elongated fabric member supplied from the supply mechanism to the cleaning section from deviating from the cleaning section. The cleaning system according to claim 8, wherein the columnar member has an edge between the front end surface and the side wall surface. The cleaning system according to claim 1, wherein the conveying device further has a supply nozzle for supplying cleaning liquid to the cleaning unit. The cleaning system according to claim 2, wherein the conveying device further has a holding part that holds the thin plate, and a rail that makes the holding part travel in the one direction. The cleaning system according to claim 1, wherein the cleaning system further includes: a first conveying device for holding the thin plate from one side of the thin plate; and the first cleaning device for the first conveying device conveyed by the first conveying device The other side of the thin plate is cleaned; the second aforementioned conveying device holds the aforementioned thin plate cleaned by the first aforementioned cleaning device from the other side of the aforementioned thin plate; and the second aforementioned cleaning device treats the conveyed by the second aforementioned conveying device Clean one side of the aforementioned thin plate. A cleaning method of a transparent substrate is used for cleaning the surface of the transparent substrate. In the cleaning method of the transparent substrate, the surface of the transparent substrate is cleaned by the cleaning system as described in claim 1. A method of manufacturing an electronic device for manufacturing an electronic device including a transparent substrate. The manufacturing method of the aforementioned electronic device has a cleaning step using the transparent substrate cleaning method described in claim 13.

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