CN109248892A - The manufacturing method of purging system, the cleaning method of transparent substrate and electronic component - Google Patents
The manufacturing method of purging system, the cleaning method of transparent substrate and electronic component Download PDFInfo
- Publication number
- CN109248892A CN109248892A CN201810738124.8A CN201810738124A CN109248892A CN 109248892 A CN109248892 A CN 109248892A CN 201810738124 A CN201810738124 A CN 201810738124A CN 109248892 A CN109248892 A CN 109248892A
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- China
- Prior art keywords
- cleaning
- thin plate
- purging system
- conveying device
- component
- Prior art date
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- 238000004140 cleaning Methods 0.000 title claims abstract description 171
- 238000010926 purge Methods 0.000 title claims abstract description 49
- 239000000758 substrate Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 230000007246 mechanism Effects 0.000 claims abstract description 57
- 230000033001 locomotion Effects 0.000 claims abstract description 37
- 230000009471 action Effects 0.000 claims abstract description 21
- 230000003068 static effect Effects 0.000 claims abstract description 16
- 239000004744 fabric Substances 0.000 claims description 48
- 238000003825 pressing Methods 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 5
- 239000000203 mixture Substances 0.000 description 18
- 239000011521 glass Substances 0.000 description 16
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000010408 sweeping Methods 0.000 description 4
- 239000006059 cover glass Substances 0.000 description 2
- 239000006210 lotion Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
A kind of purging system, the cleaning method of transparent substrate and the manufacturing method of electronic component can clean thin sheet surface to high efficient and reliable.Purging system removes the foreign matter for being attached to thin sheet surface, comprising: conveys the conveying device of thin plate；And clearing apparatus, with the cleaning part for being opposed to configuration with the thin sheet surface conveyed by conveying device, clearing apparatus includes relative moving mechanism, static movement and the shift action which makes cleaning part that the relativity opposite with thin sheet surface be repeated in the state of making cleaning part directly or indirectly be contacted with thin sheet surface to clean.It is preferred that conveying device utilizes the thin sheet surface of the cleaning state of clearing apparatus to direction conveying, the shift action in a direction and the shift action of opposite direction is alternately repeated in relative moving mechanism, in shift action, the movement speed of mobile thin sheet surface of the maximum movement speed than being conveyed by conveying device in the cleaning part moved by relative moving mechanism is fast.
Description
Technical field
The present invention relates to the manufacturing methods of purging system, the cleaning method of transparent substrate and electronic component.
Background technique
In the electronic equipments such as portable phone, smart phone, glass substrate is used.In the production line of electronic equipment, make
The purging system cleaned for the surface to glass substrate, it is known to which for example Japanese Unexamined Patent Publication 2006-272223 bulletin is remembered
The purging system of load.System documented by the bulletin is the covering fabric on scraper plate, passes through scraper plate on one side for fabric (cloth)
Being pressed on glass substrate on one side keeps glass substrate mobile, thus cleans to the surface of glass substrate.Remembered in the bulletin
In the system of load, 3 movements for relatively moving scraper plate from one end of glass substrate to the other end are repeated.
Patent document 1: Japanese Unexamined Patent Publication 2006-272223 bulletin
But when be attached with the sticky higher foreign matter like that such as bonding agent on the surface in glass substrate the case where, oil etc.
In the case where the center for being attached to glass substrate, exists and only wiped also not by 3 times the system as documented by above-mentioned bulletin
The case where capable of wiping.
In addition, scraper plate is being moved from one end of glass substrate to the other end is opposite in the system documented by above-mentioned bulletin
After dynamic, for next erasing move, erasing move is carried out after scraper plate to be returned to one end of glass substrate again, so operation is imitated
Rate is poor, in order to carry out erasing operation to a large amount of glass substrate, the time for needing to grow very much.
Summary of the invention
Therefore, technical problem of the invention is to provide a kind of purging system that can clean to high efficient and reliable thin sheet surface
And the manufacturing method of cleaning method and electronic equipment.
In order to solve the above-mentioned technical problem the invention completed is a kind of purging system, will be attached to the foreign matter of thin sheet surface
Removal, the purging system include:
Conveying device conveys the thin plate；And
Clearing apparatus has the cleaning part that configuration is opposed to the thin sheet surface conveyed by the conveying device,
The clearing apparatus includes relative moving mechanism, and the relative moving mechanism makes the cleaning part to clean
Directly or indirectly being contacted in the state of the thin sheet surface is repeated the cleaning part relative to the thin sheet surface
Relativity static movement and shift action.
In the purging system, by the relative moving mechanism, institute is directly or indirectly contacted in the cleaning part
State the static movement and shifting that the cleaning part is repeated relative to the relativity of the thin sheet surface in the state of thin sheet surface
Movement, so the foreign matter of thin sheet surface can efficiently and reliably be removed by cleaning part.That is, in the purging system, phase
For thin sheet surface, the shift action that cleaning part not only carries out relativity also carries out static movement, so can not only be by dynamic
The removal that friction carries out foreign matter can also carry out the removal of foreign matter by static friction, can reliably remove the different of thin sheet surface
Object.Herein, so-called direct, it is meant that contact surface is directly contacted with thin plate and is wiped, and is thin suitable for wiping in cleaning part
In the case where the composition of plate, cleaning part is directly contacted with thin plate and is wiped.It is so-called indirectly, it is meant that contact surface with it is thin
Configured with the situation that the other component of component of the fabric etc. 1 or multiple is such between plate, it is not adapted for wiping thin plate in contact surface
The case where composition, is inferior, and cleaning part is contacted with thin plate indirectly and wipes.
It is preferred that the sheet for the cleaning state that the conveying device is cleaned to direction conveying by the clearing apparatus
Face.The surface progress that thereby, it is possible to pass through clearing apparatus to thin plate while passing through conveying device and conveying thin plate to a direction
It cleans.
In such a situation it is preferred that the relative moving mechanism makes the cleaning part relative to described in the shift action
Thin sheet surface to the party to or to the party to and the party to opposite direction it is mobile.By making cleaning part
To the party to speed identical as thin plate movement, the static movement of the cleaning part can be obtained, static friction can be passed through
Carry out the removal of foreign matter.In addition, by make cleaning part to the party to opposite direction it is mobile, cleaning part and thin plate it is opposite
Speed becomes faster, and can efficiently and securely remove the foreign matter of thin sheet surface.
In such a situation it is preferred that the relative moving mechanism be alternately repeated the party to shift action and
The shift action of the opposite direction, in the shift action, the cleaning part moved by the relative moving mechanism
The movement speed of the thin sheet surface of the maximum movement speed than being conveyed by the conveying device is fast.Thereby, it is possible to by opposite
Mobile mechanism make cleaning part the party to and the opposite direction on vibrate, can repeatedly clean the identical of thin sheet surface
Position.
It is preferred that the clearing apparatus further includes switching mechanism, the switching mechanism make the cleaning part with the sheet
Switch between state that face directly or indirectly contacts and the state separated with the thin sheet surface.Pass through switching mechanism, energy as a result,
It is enough that cleaning work is carried out in the state of making cleaning part directly or indirectly be contacted with thin sheet surface, without cleaning work
In the case of cleaning part can be made to be moved to disengaged position.
It is preferred that the cleaning part is contacted with the thin sheet surface via component of the fabric indirectly.Component of the fabric is straight as a result,
It is contacted with thin sheet surface, the foreign matter of thin sheet surface can be made to be transferred to component of the fabric by cleaning work.
It is preferred that the clearing apparatus further includes the feed mechanism to cleaning part supply component of the fabric.Sheet as a result,
When the foreign matter in face has been transferred to component of the fabric, new component of the fabric (part) is supplied to cleaning part by feed mechanism, it can
Cleaning work is carried out by new component of the fabric (part).
It is preferred that the clearing apparatus further include: cylindrical component has the cleaning part on front end face；And pressing structure
Component of the fabric is pressed into the cylindrical component by part, to prevent the length supplied from the feed mechanism to the cleaning part
The component of the fabric of strip is deviated relative to the cleaning part.Thereby, it is possible to pass through side wall of the above-mentioned pressing member to cylindrical component
Surface side presses the component of the fabric of strip, and the offset (cleaning for generating component of the fabric relative to cleaning part is difficult in cleaning work
The sliding of component of the fabric in portion), carry out accurate cleaning work.
In such a situation it is preferred that the cylindrical component has side between the front end face and side wall surface of the cylindrical component
Edge.Thereby, it is possible to the foreign matters that the component of the fabric by being located at edge accurately removes thin sheet surface.In addition, so-called " have side
Edge ", it is meant that not only include front end face and side wall surface on the cross sectional shape in the direction intersected with front end face and side wall surface
The situation continuous via discontinuity point, it is also continuous via the angle below radius of curvature 3mm comprising front end face and side end face
The case where.In addition, above-mentioned radius of curvature is preferably 2mm hereinafter, more preferably 1mm or less.
It is preferred that the conveying device also has the supply nozzle to cleaning part supply cleaning solution.Pass through utilization as a result,
Supply nozzle supplies cleaning solution to cleaning part, is able to carry out the cleaning using cleaning solution.
It is preferred that the conveying device also has the maintaining part for keeping the thin plate and makes the maintaining part to the party to row
The track walked.Thereby, it is possible to pass through clearing apparatus to thin in the state of by keeping thin plate along the maintaining part of track travel
Plate surface is cleaned.
It is preferred that in the purging system, comprising: the first conveying device, described in the one side holding in thin sheet surface
Thin plate；First clearing apparatus cleans the another side of the thin plate by the first conveying device conveying；
Second conveying device keeps the thin plate that one side has been cleaned by the first clearing apparatus from another side；And
Second clearing apparatus, to cleaning on one side for the thin plate by the second conveying device conveying.As a result, can
It is enough cleaned, can be carried out by one side of second clearing apparatus to thin plate by another side of first clearing apparatus to thin plate
It cleans, can be cleaned by two sides of the purging system to thin plate.
In order to solve the above-mentioned technical problem the other invention completed is cleaned to the surface for cleaning transparent substrate
Transparent substrate cleaning method, wherein pass through the surface by above-mentioned purging system constituted to the transparent substrate
It is cleaned.Thereby, it is possible to the surface of transparent substrate is to easily and reliably cleaned by the purging system.
In addition, the in order to solve the above-mentioned technical problem other invention of completion, is the electronics that manufacture includes transparent substrate
The manufacturing method of the electronic equipment of equipment, wherein there is the cleaning process of the cleaning method using the transparent substrate.As a result, can
Enough to easily and reliably manufactures have used the electronic equipment of the transparent substrate after being cleaned.
Detailed description of the invention
Fig. 1 is the schematic elevational view for indicating the purging system of an embodiment of the invention.
Fig. 2 is the schematic elevational view of the first clearing apparatus of purging system.
Fig. 3 is the schematic elevational view of the second clearing apparatus of purging system.
Fig. 4 A is the schematic perspective view for amplifying the major part of clearing apparatus.
Fig. 4 B is the schematic elevational view for amplifying the major part of the cylindrical component of clearing apparatus.
Fig. 5 is the schematic perspective view for amplifying the major part of clearing apparatus.
(A) to (D) of Fig. 6 is the explanatory diagram being illustrated for the movement to clearing apparatus, and (A) of Fig. 6 indicates fabric
The supply state of component, (B) of Fig. 6 indicate the state that component of the fabric is pressed by pressing member, and (C) of Fig. 6 indicates that supply is clear
(D) of the state of washing lotion, Fig. 6 indicates cleaning state.
The movement speed of thin plate when Fig. 7 is for progress cleaning work and movement speed and the time for cleaning face
The outline figure that relationship is illustrated.
Fig. 8 is the explanatory diagram for being illustrated to the cleaning state using clearing apparatus.
Description of symbols
W: thin plate, C: component of the fabric, the 1A: the first conveying device, the 1B: the second conveying device, the 3A: the first clearing apparatus, 3B:
Second clearing apparatus, 5: feed mechanism, 13: 13a: cylindrical component cleans face (cleaning part), 15: pressing member, and 17: switching machine
Structure, 19: relative moving mechanism, 25: maintaining part, 27: track, 100: purging system.
Specific embodiment
[first embodiment]
Purging system involved in an embodiment of the invention is described in detail hereinafter, suitably referring to attached drawing.
< purging system >
Purging system 100 shown in FIG. 1 is the system for being cleaned in production line to foreign matter, which is attached to
The surface of the glass plates such as cover glass used in the electronic equipments such as smart phone, portable phone (thin plate W).In addition, conduct
The thin plate W for cleaning object is not limited to cover glass, other various substrates can be set as object, which can
Suitably it is used in the cleaning for overlooking the transparent thin plate W of square shape.
Purging system 100 includes: conveying device 1A, 1B for conveying thin plate W；And clearing apparatus 3A, 3B, have and passes through
The cleaning face 13a as cleaning part configured to the opposing surface of the thin plate W of conveying device 1A, 1B conveying (referring to Fig. 2).It cleans
System 100 respectively includes 2 conveying devices 1A, 1B and clearing apparatus 3A, 3B.Specifically, purging system 100 includes:
One conveying device 1A, absorption keep the one side in the surface of thin plate W and are conveyed；First clearing apparatus 3A, to passing through
The another side of the thin plate W of first conveying device 1A conveying is cleaned；Second conveying device 1B, absorption keep clear by first
Sweeping device 3A has cleaned the another side of the thin plate W of one side and has been conveyed；And the second clearing apparatus 3B, to defeated by second
The thin plate W's for sending device 1B to convey is cleaned on one side.In addition, in the case of necessary, following components etc. can also be arranged: going
Except device, the removal such as the dust that the cleaning on the face of the thin plate W after being cleaned by clearing apparatus 3A, 3B is generated；Stacking dress
It sets, bonding protective film etc. on the face of the thin plate W after being cleaned by clearing apparatus 3A, 3B.In addition, the purging system 100 is also
Control device including controlling the movement of the various devices such as conveying device 1A, 1B and clearing apparatus 3A, 3B (diagram is omitted).
Thin plate W is transported to from the position P1 for receiving thin plate W from feeder (not shown) to by the first conveying device 1A
The position P2 of two conveying device 1B transmitting thin plate W.First is equipped between the position P2 of the position P1 and transmitting that receive thin plate W
Clearing apparatus 3A.First clearing apparatus 3A carries out the one side (lower surface) of the thin plate W by the first conveying device 1A conveying clear
It sweeps.First conveying device 1A is defeated to a direction (from the direction (X-direction) of the position P2 for the position P1 direction transmitting for receiving thin plate W)
Send the surface of the thin plate W of the cleaning state using the first clearing apparatus 3A.Herein, so-called cleaning state, it is meant that leading to
Cross the state that clearing apparatus 3A, 3B clean the surface of thin plate W.In addition, the first conveying device 1A is with certain speed to a direction
(hereinafter, occasionally referred to as conveying direction) conveying thin plate W.
Thin plate W is transported to from from the position P2 of the first conveying device 1A transmitting thin plate W to submitting by the second conveying device 1B
The position P3 of device transmitting thin plate W (not shown).Second is equipped between the position P2 of transmitting thin plate W and the position P3 of transmitting
Clearing apparatus 3B.Second clearing apparatus 3B carries out the another side (upper surface) of the thin plate W by the second conveying device 1B conveying
It cleans.Second conveying device 1B to a direction (from receive the position P2 of thin plate W towards transmitting position P3 direction (X-direction))
Conveying utilizes the surface of the thin plate W of the cleaning state of the second clearing apparatus 3B.In addition, the second conveying device 1B is with certain speed
Thin plate W is conveyed to a direction.
(the first clearing apparatus)
Referring to Fig. 2, the first clearing apparatus 3A includes relative moving mechanism 19, the relative moving mechanism 19 in order to clean and
Making cleaning face 13a that cleaning face 13a be repeated and thin plate W
The opposite relativity in surface static movement and shift action.Cleaning face 13a is via the component of the fabric C of strip and indirectly
It is contacted with the surface of thin plate W.Component of the fabric C is according to the type of thin plate W and frictional force, degree of absorption of cleaning solution of thin plate W etc.
And it selects.
As shown in Fig. 2, the first clearing apparatus 3A further includes to the feed mechanism 5 for cleaning face 13a supply component of the fabric C.For
There is the drive roll 7 and driven voller 9 for being provided with component of the fabric C to mechanism 5, pass through the cleaning for being rotated in thin plate W of drive roll 7
Component of the fabric C is wound up into 7 side of drive roll afterwards, is accompanied by this from driven voller 9 and not used component of the fabric C is discharged.In addition, supply
Mechanism 5 also has adjustment tension while supplying a variety of rollers of the component of the fabric C of strip.
Feed mechanism 5 is as described later to the component of the fabric C for cleaning face 13a supply strip of two cylindrical components 13.
The component of the fabric C of strip is contacted with the cleaning face 13a of thin plate W after being fed into first, be then fed to and contact at first
In the cleaning face 13a of thin plate W.In other words, strip component of the fabric C is conveyed by the direction of from the arrow T to Fig. 2.That is, drive roll
7 are set lower than driven voller 9 by the opposite direction (-X direction) of the conveying direction of thin plate W.
As shown in Fig. 2 and Fig. 4 A and Fig. 4 B to Fig. 6, the first clearing apparatus 3A includes be respectively provided with cleaning face 13a one
To cleaning component 11.Specifically, being used by the cleaning component 11 of the upstream side (-X direction side) of conveying direction by aftermentioned
Supply nozzle 29 supply cleaning solution and thin plate W is cleaned, pass through the cleaning in the downstream side (X-direction side) of conveying direction
Component 11 will be attached to wiping trace and/or the wiping residue erasing on the surface of thin plate W.
Each component 11 that cleans includes cylindrical component 13, has in front end (upper surface of the cylindrical component 13 in Fig. 2) clear
Surface sweeping 13a；And pressing member 15, to the pressing of the side side wall surface 13b of cylindrical component 13 from feed mechanism 5 to cleaning face 13a
The component of the fabric C of the strip of supply is (referring to Fig. 4 A and Fig. 4 B to Fig. 6).In each cleaning component 11, make a cylindrical component 13
Pass through a pair of of pressing member 15 from two sides and clamps component of the fabric C.
As shown in Figure 4 B, a pair of sidewalls is generally perpendicularly equipped with relative to the front end face of cylindrical component 13 (cleaning face 13a)
Face 13b, cylindrical component 13 have edge R between front end face (cleaning face 13a) and side wall surface 13b.Specifically, with front end
On the cross sectional shape in the direction that face and side wall surface 13b intersect, front end face (cleaning face 13a) and side wall surface 13b are via curvature
The angle below radius 1mm and it is continuous.
Cylindrical component 13 as shown in Fig. 4 A and Fig. 4 B and Fig. 5, with the conveying direction of thin plate W (X-direction) and thin plate W
The orthogonal direction (Y-direction) of thickness direction (Z-direction) both sides on extend, the length in the orthogonal direction is configured to and thin plate
The width (length in the direction orthogonal with conveying direction) of W is of approximately equal length.The material of cylindrical component 13 is not particularly limited,
It is able to use the scraper plate of the resin of hard.In addition, the shape of the front end face (clean face 13a) of cylindrical component 13 with thin plate W
Conveying direction (X-direction) and thin plate W the orthogonal direction (Y-direction) of thickness direction (Z-direction) both sides on, be set as with it is thin
The corresponding shape of plate W.Specifically, (surface shape of thin plate W is the side Y in the case where the surface shape of thin plate W is plane
To straight line in the X direction in the case where continuous shape), the front end face of cylindrical component 13 is set as plane, in addition, in thin plate
A part of the surface shape of W is with towards Y-direction and to the (surface shape of thin plate W in the case where the curved shape of Z-direction
For the curve in the X direction in the case where continuous shape of Y-direction), the front end face of cylindrical component 13 is set as the curve of Y-direction
Continuous shape (for example, fish plate shape).
First clearing apparatus 3A is as shown in Fig. 2, further include switching mechanism 17, the switching mechanism 17 makes each cleaning component 11
It is contacted between the state on the surface of thin plate W and isolated state and switches indirectly via component of the fabric C.Specifically, cutting
Change planes structure 17 by be linked to each cleaning component 11 (cylindrical component 13 and a pair of of pressing member 15), make to clean component 11 and
The cylinder that relative moving mechanism 19 moves up and down is constituted, and is cleaned component 11 and is risen by switching mechanism 17, thus cleans face 13a
It is contacted with the surface of transported thin plate W indirectly via component of the fabric C.
In addition, switching mechanism 17 is configured to, after cleaning face 13a can be made to be contacted with indirectly via component of the fabric C
The surface of the maintaining part 25 of the first conveying device 1A stated.It, can be by cleaning component 11 to not having that is, in purging system 100
There is the maintaining part 25 (referring to Fig.1) for keeping thin plate W to be cleaned.
Relative moving mechanism 19 is to make to clean the mechanism that component 11 is moved back and forth along conveying direction (X-direction).Herein,
Fig. 7 indicates to clean the speed and the relationship of time of component 11.Straight line K in Fig. 7 indicates the conveying speed of thin plate W.Therefore, in S1
Position, thin plate W with to clean component 11 mobile with identical speed.Relative moving mechanism 19 make cleaning face 13a alternately repeatedly into
The shift action of row conveying direction (X-direction) and its opposite direction (-X direction), in shift action, relative moving mechanism
Fast (the reference of movement speed on surface of the movement speed than the first conveying device 1A thin plate W generated of the 19 cleaning face 13a generated
Fig. 7).In other words, relative moving mechanism 19 is making cleaning face 13a in the state of being contacted with the surface of thin plate W indirectly clearly
Static movement (S1 of Fig. 7) and the shift action of the relativity opposite with the surface of thin plate W is repeated in surface sweeping 13a.Therefore, exist
In relative moving mechanism 19, the surface of thin plate W is alternately acted on the stiction and kinetic force of friction of component of the fabric C.Separately
Outside, relative moving mechanism 19 generate cleaning component 11 reciprocating motion amplitude width be thin plate W 1 to 40/10ths/
1 length, the driving of relative moving mechanism 19 clean component 11, make it between reciprocal 1000 to 2500 in 1 minute time
Predetermined number.
Relative moving mechanism 19 is specifically, comprising: motor (diagram is omitted)；It is rotated by the rotary force of motor
Cam 21；Make to clean component 11 (cylindrical component 13 and a pair of of pressing member 15) with the rotary force of the cam 21 is converted to
The driving force of reciprocating motion and to clean component 11 transmit transmission member 23.Therefore, it is carried out by the rotary force of motor clear
Sweep the reciprocating motion of component 11.As the relative moving mechanism 19, it is specifically able to use such as crank and rocker mechanism.
(the first conveying device)
First conveying device 1A is as shown in Figure 1, comprising: the maintaining part 25 of thin plate W is kept by absorption；Along conveying side
The track 27 walked to (X-direction) setting maintaining part 25；With the driving portion for making maintaining part 25 walk (diagram is omitted).Moreover, protecting
It holds portion 25 and passes through the first cleaning while thin plate W is conveyed while walking in conveying direction (X-direction) along track 27
Device 3A cleans surface (lower surface).
In addition, the first conveying device 1A also has to the supply nozzle 29 for cleaning face 13a supply cleaning solution.The supply nozzle
29 supply cleaning solution to cleaning face 13a before cleaning the cleaning on surface for the thin plate W that face 13a is carried out.Specifically, supply nozzle
29 are arranged at maintaining part 25, move in conveying direction (X-direction) together with maintaining part 25.The supply nozzle 29 is in thin plate W
Conveying when start to cleaning work before conveying direction upstream side (-X direction side) cleaning face 13a supply cleaning solution.Separately
Outside, supply nozzle 29 can also be also supplied with micro cleaning solution to the cleaning face 13a in the downstream side (X-direction side) of conveying direction,
In addition it can not also supply.Supply nozzle 29 is arranged at the conveying direction side (X-direction side) of maintaining part 25.In addition, supply spray
Mouth 29 extends in the Y direction, and the length in the orthogonal direction is arranged to and cleans the length (length of Y-direction) of face 13a greatly
Cause equal length.
First conveying device 1A has in the position P2 of transmitting thin plate W declines maintaining part 25 in order to transmit thin plate W
Up-down mechanism (diagram is omitted).
(the second clearing apparatus)
Second clearing apparatus 3B includes the composition substantially same with the first clearing apparatus 3A, is finished to the cleaning of thin plate W
The opposing face (upper surface) in face is cleaned.In addition, the second clearing apparatus 3B is as shown in figure 3, include and the first clearing apparatus 3A
The composition configured upside down uses the component with composition identical as the first clearing apparatus 3A or function in Fig. 3
Same reference numerals, detailed description are omitted.
(the second conveying device)
Second conveying device 1B be include the composition substantially same with the first conveying device 1A, to by the second clearing apparatus
The device that the thin plate W that 3B is cleaned is conveyed.In addition, in the second conveying device 1B, for having and the first conveying device 1A
The component of identical composition or function uses same reference numerals, and detailed description is omitted.
Second conveying device 1B has the maintaining part 25 being placed with from the first conveying device 1A thin plate W received.The holding
Portion 25 has adsorption hole, keeps thin plate W by absorption from the following table surface bearing of thin plate W.
In addition, the second conveying device 1B can also have in the position P2 for receiving thin plate W to be made to keep to receive thin plate W
The up-down mechanism that portion 25 rises (diagram is omitted).
< acts >
Next, the movement carried out to purging system 100 is illustrated.
Firstly, transmitting thin plate W (the position P1 of Fig. 1) from feeder to the maintaining part 25 of the first conveying device 1A.Then,
While the maintaining part 25 of first conveying device 1A is mobile to conveying direction (X-direction), it is located at cleaning face 13a in supply nozzle 29
When cleaning face 13a (a part for the component of the fabric C being in contact with it) supply from from supply nozzle 29 to the first clearing apparatus 3A it is clear
Washing lotion.
During cleaning, to the new part for cleaning face 13a supply component of the fabric C.Specifically, as shown in (A) of Fig. 6,
In the isolated state of a pair of of pressing member 15 (side wall to cylindrical component 13 to component of the fabric C for carrying out pressing member 15
The state that the pressing of the face side 13b releases) under, it is rotated by the drive roll 7 of feed mechanism 5, not used knit is discharged from driven voller 9
Component of thing C, to the new part for cleaning face 13a supply component of the fabric C.Then, as shown in (B) of Fig. 6, structure is pressed by a pair
Part 15 is mobile to cylindrical component 13, is pressed component of the fabric C to the side side wall surface 13b of cylindrical component 13 from a pair of of pressing member 15
Pressure.In this state, component of the fabric C is moved with cylindrical component 13 as one.In other words, component of the fabric C will not be opposite
It is deviated in cylindrical component 13.Next, as described above, supply nozzle 29 supplies cleaning solution (referring to Fig. 6's to face 13a is cleaned
(C)).Then, it as (D) of Fig. 6, cleans component 11 (cylindrical component 13 and a pair of of pressing member 15) and passes through switching mechanism
17 and it is mobile (rising) to the side transported thin plate W.
At this time as (A) of Fig. 8, the conveying direction end that face 13a is located at thin plate W is cleaned.Component 11 is cleaned from the shape
State is mobile to -X direction.Cleaned (B) such as Fig. 8 component 11 to -X direction it is mobile it is scheduled apart from when, clean component
11 is mobile ((C) of Fig. 8) to X-direction.Then, it after cleaning component 11 moves preset distance to X-direction, is moved again to -X direction
It is dynamic.Thin plate W is conveyed to X-direction at a predetermined velocity always between the movement.In the movement, in thin plate W and component is cleaned
11 timings mobile with the same direction and speed, by cleaning component 11, friction of rest power is acted on to thin plate W and thin plate
Foreign matter on W.On the other hand, other than the timing of stiction effect, kinetic force of friction acts on different on thin plate and thin plate W
Object.Thus the cleaning that the opposite shift action and static movement for carrying out cleaning component 11 carry out not only carries out rubbing using dynamic
The removal (erasing move) of the foreign matter of wiping also carries out the removal (erasing move) of the foreign matter using static friction, to the following table of thin plate W
Face is cleaned.
Thin plate W is constantly moved relative to cleaning component 11 to X-direction, is located at the -X direction side of thin plate W in cleaning component 11
Behind end ((D) of Fig. 8), preset distance ((E) of Fig. 8) is moved to X-direction with component 11 equally, is cleaned before this.Then, later
Preset distance is moved to -X direction in cleaning part.After cleaning component 11 and wiping the -X direction end of thin plate W several times, component is cleaned
11 separate ((F) of Fig. 8 and (G) of Fig. 8) from thin plate W.In addition, (G) of (A) to Fig. 8 of Fig. 8 is constituted and is moved to understand
Make and is expressed by the scale bar different from actual scale bar.
The thin plate W of the cleaning of upper surface has been carried out by defeated to second from the first conveying device 1A by the first clearing apparatus 3A
Device 1B is sent to transmit (the position P2 of Fig. 1).Specifically, the maintaining part 25 of the first conveying device 1A is moved downwards by cylinder
Dynamic (W1 of Fig. 1), is contacted with the time point of the maintaining part 25 of the second conveying device 1B in the thin plate W kept by maintaining part 25, the
The absorption holding that the maintaining part 25 of one conveying device 1A carries out terminates, and the maintaining part 25 for starting simultaneously at the second conveying device 1B carries out
Absorption keep.
So, it after transmitting thin plate W to the second conveying device 1B from the first conveying device 1A, is filled by the second conveying
1B and the second clearing apparatus 3B is set, also carries out similarly acting with the first conveying device 1A and the first clearing apparatus 3A, into
The cleaning of the lower surface of row thin plate W.Moreover, having carried out the thin plate W of the cleaning of lower surface by sending by the second clearing apparatus 3B
Device transmitting (the position P3 of Fig. 1) out.
On the other hand, the maintaining part 25 that thin plate W is transmitted to the first conveying device 1A of the second conveying device 1B returns to
The position P1 of Fig. 1.Equally, the maintaining part 25 that thin plate W is transmitted to the second conveying device 1B of carrying device returns to the position of Fig. 1
Set P2.When maintaining part 25 returns to each position also maintaining part 25 can be cleaned by cleaning component 11.
The manufacturing method > of < electronic equipment
Next, being illustrated to the manufacturing method for the electronic equipment for using above-mentioned purging system 100.The electronic equipment
Manufacturing method have use 100 pairs of processes cleaned as the transparent substrate of thin plate W of purging system.In the cleaning process
In, using purging system 100, the two sides of transparent substrate is cleaned.
< advantage >
Using purging system 100 cleaning when, as described above clean face 13a not only relative to the surface of thin plate W into
The shift action of row relativity also carries out static movement, so the removal for being not only able to carry out foreign matter caused by dynamic friction can also
The removal for enough carrying out foreign matter caused by static friction, can reliably remove the foreign matter of thin plate W surface.That is, static friction is in foreign matter
Upper effect power more stronger than dynamic friction, so foreign matter can be removed more effectively.
It is moved back and forth relative to the surface of thin plate W along conveying direction in addition, cleaning face 13a, cleans face 13a to conveying side
To and its opposite direction both sides it is mobile, so compared with the case where acting on power to a direction, to different multiple sides
To power act on foreign matter, foreign matter can be effectively removed.
Even if can also pass through the edge R of cylindrical component 13 in the case where the stronger foreign matter of adhesion strength is attached to thin plate W
Repeatedly apply impact force to foreign matter, so easily removing the stronger foreign matter of adhesion strength.
In turn, it cleans surface of the face 13a on the direction along conveying direction relative to thin plate W to move, so by adopting
With cleaning face 13a corresponding with the shape of thin plate W, it is able to use in the cleaning of various thin plate W.Even specifically, for example,
Cleaning object (thin plate W) of the liquid crystal display panel like that around glass equipped with terminal, glass substrate is embedded into it is clear in frame
Sweep object (thin plate W), 3D glass (thin plate W) with curved curved surface etc. like that, be not only by simple flat surfaces structure
At cleaning object, also can accurately be cleaned by being arranged along the cleaning face 13a of its shape.In particular, clear
Sweeping device 3A, 3B include switching mechanism 17, thus by make cleaning face 13a only clean object part be contacted with thin plate W, so
After make its separation, to the thin plate W with special shape also can accurately to clean object part clean.
[other embodiments]
Embodiment of disclosure should be considered as be in all aspects illustrate rather than it is restrictive.Of the invention
The composition and numerical value that range is not limited to the above embodiment, are indicated by claims, and meaning includes to want with right
Ask the meaning of book equalization and all changes (displacement of composition, additional and deletion) in range.
That is, in the above-described embodiment, to the case where progress that is arranged at conveying device of the supply nozzle of supply cleaning solution
Explanation, but the present invention is not limited to this.For example, supply nozzle can be set in clearing apparatus, specifically, can also incite somebody to action
Supply nozzle is arranged to the supply cleaning solution of the component of the fabric between a pair of of cleaning part.In addition, defeated supply nozzle to be set to
In the case where the maintaining part for sending device, also it is not limited to for supply nozzle to be set to the conveying direction side of maintaining part, also can
It is set to the opposite direction side (-X direction side) of conveying direction.
In addition, using the scraper plate of resin to be illustrated to as cylindrical component in the above-described embodiment, but also can
It enough is covered in component as front end face without using resin and using metal etc. and by resin, rubber etc., or as column structure
Part is using backing plate etc..
In turn, slot can also be formed, and is set as frictional force on the front end face (clean face) of cylindrical component etc. and compare front end face
The composition of effect is easier in the case where for plane.
The scheme moved back and forth in the above-described embodiment to cleaning face is illustrated, but also cleaning face can be made interrupted
Ground is mobile to a direction, is repeated to a direction is mobile and the composition of stopping is acted on.In turn, the movement in face is cleaned
Direction is not limited to the conveying direction (X-direction) and/or its opposite direction of thin plate W, it can also be made to move to other directions
It is dynamic, in other words, or make its composition mobile to directions more than 3 directions.In this case, different direction
Power acts on foreign matter, so being easier removal foreign matter.
Thin plate W is wiped to face reciprocating motion is cleaned while conveying thin plate W with certain speed in the above-described embodiment
The composition on surface be illustrated, but may be not convey thin plate W under cleaning state and the mobile structure of cylindrical component 13
At.
In the above-described embodiment, make 2 11 twocouese X-directions of cleaning component and -X direction mobile (reciprocating motion),
But the present invention is not limited to this.It is also possible to not make the cleaning component 11 of the rear side on the conveying direction of thin plate W back and forth to transport
Dynamic composition.In the case where moving back and forth it, has and wipes trace etc. the site residues of static friction effect a possibility that,
But wiping trace residual can be prevented by this composition.
In the above-described embodiment, the vibration of the reciprocating motion of the cleaning component 11 moved by relative moving mechanism 19 is illustrated
Breadth degree is 1/1 to 40th/10ths length of thin plate W, relative moving mechanism 19 within 1 minute time reciprocal 1000
The mode of predetermined number between to 2500 drives the composition for cleaning component 11, but the present invention is not limited to this.Amplitude width
Can be 1/5th or so or 1/50th or so of thin plate W, the reciprocal time in 1 minute time may be 500 or so or
3000 or so.When fast moving it, the power for acting on foreign matter becomes larger, so effectively, but the number of stiction effect is more
One side easily removes foreign matter.It is preferred that determining most suitable condition by the material of thin plate and/or cleaning environment etc..
In addition, in the above-described embodiment, carrying out cleaning to the two sides to thin plate and being illustrated, but can also be only to thin
Plate is cleaned on one side.It is filled in such a case it is possible to be cleaned using the first clearing apparatus and the first conveying device or second
It sets and the second conveying device.
In the above-described embodiment, conveying device conveys thin plate W while adsorbing and keeping, but the present invention is not limited to
This, can also keep conveying by other technical solutions, for example, also can using it is mechanical, physically keep thin plate W's
It constitutes.
In the above-described embodiment, using by cleaning face clean thin plate composition, but the present invention is not limited to this,
It also can be using the composition for being contacted with thin plate linearly or dotted and cleaning.
In the above-described embodiment, it is illustrated to the case where cleaning flat thin plate, but the present invention does not limit
In this, also can be suitable for as clean object position circumferential arrangement have do not need clean component object into
The case where row cleans, the thin plate for not being plate and being equipped with protrusion.
In turn, in the above-described embodiment, to cylindrical component have the scheme of approximately equal length with the width of thin plate into
Explanation is gone, but the present invention is not limited to this.For example, can also be set as cylindrical component with the length bigger than the width of thin plate
Scheme can be cleaned in this case relative to the thin plate of various width.In turn, two distal process of width direction is being cleaned
When the thin plate of shape out, by using the length cylindrical component shorter than the width of thin plate, protrusion can be avoided, or on one side
Erasing protrusion on one side cleans cleaning face.
Purging system of the invention, transparent panel purging system of the invention can suitably be used in the expression of portable equipment
The cleaning of the transparent panels such as glass substrate used in device.
Claims (14)
1. a kind of purging system, removal is attached to the foreign matter of thin sheet surface, and the purging system includes:
Conveying device conveys the thin plate；And
Clearing apparatus has the cleaning part that configuration is opposed to the thin sheet surface conveyed by the conveying device,
The clearing apparatus includes relative moving mechanism, and the relative moving mechanism keeps the cleaning part direct to clean
Or being contacted in the state of the thin sheet surface indirectly makes the cleaning part that the phase relative to the thin sheet surface be repeated
To the static movement of property and shift action.
2. purging system according to claim 1, wherein
The thin sheet surface for the cleaning state that the conveying device is cleaned to direction conveying by the clearing apparatus.
3. purging system according to claim 2, wherein
The relative moving mechanism makes the cleaning part relative to the thin sheet surface to the party in the shift action
To or to the party to and the party to opposite direction it is mobile.
4. purging system according to claim 3, wherein
The relative moving mechanism be alternately repeated the party to shift action and the opposite direction movement
Movement,
In the shift action, the maximum movement speed ratio for the cleaning part moved by the relative moving mechanism is by described
The movement speed of the thin sheet surface of conveying device conveying is fast.
5. purging system according to claim 1, wherein
The clearing apparatus further includes switching mechanism, the switching mechanism make the cleaning part with the thin sheet surface directly or
Switch between the state contacted indirectly and the state separated with the thin sheet surface.
6. purging system according to claim 1, wherein
The cleaning part is contacted with the thin sheet surface across component of the fabric indirectly.
7. purging system according to claim 6, wherein
The clearing apparatus further includes the feed mechanism to cleaning part supply component of the fabric.
8. purging system according to claim 7, wherein
The clearing apparatus further include:
Cylindrical component has the cleaning part on the front end face of the cylindrical component；And pressing member, component of the fabric is pressed
Be pressed onto the cylindrical component and prevent the component of the fabric of the strip supplied from the feed mechanism to the cleaning part with it is described
Deviate cleaning part.
9. purging system according to claim 8, wherein
The cylindrical component has edge between the front end face and side wall surface.
10. purging system according to claim 1, wherein
The conveying device also has the supply nozzle to cleaning part supply cleaning solution.
11. purging system according to claim 2, wherein
The track that the conveying device also has the maintaining part for keeping the thin plate and makes the maintaining part to the party to walking.
12. purging system according to claim 1, wherein
The purging system includes:
First conveying device keeps the thin plate from the one side of thin plate；
First clearing apparatus cleans the another side of the thin plate by the first conveying device conveying；
Second conveying device keeps the institute that one side has been cleaned by the first clearing apparatus from the another side of the thin plate
State thin plate；And
Second clearing apparatus, to cleaning on one side for the thin plate by the second conveying device conveying.
13. a kind of cleaning method of transparent substrate, cleans the surface of transparent substrate,
In the cleaning method of the transparent substrate, by purging system according to claim 1 to the transparent substrate
Surface cleaned.
14. the manufacturing method of a kind of electronic equipment, manufacture includes the electronic equipment of transparent substrate,
The manufacturing method of the electronic equipment has the clear of the cleaning method for utilizing transparent substrate according to claim 13
Sweep process.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210300842.3A CN114669568A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
| CN202110502212.XA CN113172066A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-136464 | 2017-07-12 | ||
| JP2017136464A JP2019018127A (en) | 2017-07-12 | 2017-07-12 | Cleaning system, cleaning method of transparent substrate, and manufacturing method of electronic component |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210300842.3A Division CN114669568A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
| CN202110502212.XA Division CN113172066A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109248892A true CN109248892A (en) | 2019-01-22 |
| CN109248892B CN109248892B (en) | 2022-04-15 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110502212.XA Pending CN113172066A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
| CN201810738124.8A Active CN109248892B (en) | 2017-07-12 | 2018-07-06 | Cleaning system, method for cleaning transparent substrate, and method for manufacturing electronic component |
| CN202210300842.3A Pending CN114669568A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202110502212.XA Pending CN113172066A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202210300842.3A Pending CN114669568A (en) | 2017-07-12 | 2018-07-06 | Cleaning system |
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| JP (1) | JP2019018127A (en) |
| CN (3) | CN113172066A (en) |
| TW (1) | TWI710411B (en) |
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| CN112478555B (en) | 2019-02-25 | 2022-01-25 | 牧今科技 | Support, transfer robot and container |
| JP7448759B2 (en) | 2020-08-05 | 2024-03-13 | 株式会社Ｊｖｃケンウッド | Foreign matter removal device and foreign matter removal method |
| CN115672915B (en) * | 2022-12-29 | 2023-03-10 | 聚宝盆(苏州)特种玻璃股份有限公司 | High-efficient photovoltaic glass coating film belt cleaning device |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201908023A (en) | 2019-03-01 |
| JP2019018127A (en) | 2019-02-07 |
| CN114669568A (en) | 2022-06-28 |
| CN109248892B (en) | 2022-04-15 |
| TWI710411B (en) | 2020-11-21 |
| CN113172066A (en) | 2021-07-27 |
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