KR100842462B1 - Substrate edge part cleaning apparatus and substrate edge part cleaning method - Google Patents

Abstract

The present invention provides a substrate edge cleaning device that determines the degree of cleaning of each glass substrate when cleaning the edges of the glass substrate used in the liquid crystal display.

This board | substrate edge cleaning apparatus 100 is equipped with the cleaning head which wash | cleans by wiping the edge of the board | substrate for display A, moving linearly, This board | substrate edge cleaning apparatus moves to a board | substrate by moving with a cleaning head. And a camera 117 for capturing an image near the edge of the color filter disposed. This camera 117 obtains the surface state information of the cleaned board | substrate part, and the board | substrate edge part washing | cleaning apparatus 100 also includes the cleaning degree determination part 306 which determines the cleaning degree based on surface state information.

Description

Substrate edge cleaning device and substrate edge cleaning method {SUBSTRATE EDGE PART CLEANING APPARATUS AND SUBSTRATE EDGE PART CLEANING METHOD}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning an LCD substrate, and more particularly, to a substrate edge cleaning apparatus for cleaning by wiping the edge of the substrate with a cloth.

Recently, LCDs are widely used as computer monitors and television screens, and various demands for such LCDs are rapidly increasing. Under these circumstances, there is a strong demand for good price and quality improvement of LCDs. Therefore, it is very important to improve mounting quality and yield in the process of mounting electronic components on LCD substrates.

In order to improve the mounting quality and the like, in order to improve the mounting quality and the like, the terminal setting region of the substrate is cleaned before the electronic component is mounted on the substrate of the LCD. Thus, poor connection of such an electronic component is improved.

Regarding the cleaning of the edge portion of the LCD substrate, an automatic cleaning device for cleaning such edge portions has been developed by wiping the edge portions on which terminals are disposed with a cloth containing a cleaning liquid or the like. Moreover, such an apparatus is proposed by invention (for example, patent document 1: Unexamined-Japanese-Patent No. 3445709).

Such automatic cleaning device for LCDs has a very high cleaning efficiency and greatly contributes to the improvement of mounting quality. However, the environment surrounding such devices is changing, i.e. not sufficient to meet the performance requirements for modern substrates for LCDs.

The first reason is a problem described below. As the mounting density of electronic components becomes high, it is necessary to maintain a high degree of cleaning of the substrate surface. Nevertheless, insufficient cleaning operations are carried out in due course. This is because while the cleaning operation is repeated over a long time interval, the degree of cleaning of the substrate surface decreases to a value below the standard value, but the degree of cleaning is evaluated only according to empirical rules. As a result, the yield of the final product is deteriorated.

The present invention has been made to solve the above-mentioned problem. A first object of the present invention is to provide a substrate edge cleaning apparatus capable of evaluating the degree of cleaning of the edge portion of a substrate and a cleaning method performed by the substrate edge portion cleaning apparatus.

The second reason is the problem described below. Since no image is displayed on the LCD border, it is required to make the LCD frame as narrow as possible. However, conventional cleaning devices cannot clean such narrow frames with sufficient accuracy of position.

Here, as shown in Fig. 1, the LCD substrate includes a glass substrate B having a frame on which an electronic component is mounted, and a color filter C slightly smaller than the glass substrate B.

In addition, in order to narrow such a frame, it is required that the glass substrate B is made as small as possible and mounted close to the color filter C where electronic components are possible. By stretching, in order to improve the mounting quality of the electronic component, the frame of the LCD substrate A must be cleaned closest to the color filter C having a high accuracy of position.

However, as shown in Fig. 1, the conventional cleaning apparatus is positioned between the substrate A and the cleaning head E by pressing three pins D mounted on the edge portion of the glass substrate B to the cleaning apparatus. Determine the relationship. However, when the set tolerance between the glass substrate B and the color filter C is large, that is, the color filter C in which the positional relationship between the glass substrate B and the cleaning head E is determined is the glass substrate ( The embodiment displaced from B) does not mean that the positional relationship between the color filter C and the cleaning head E is completely determined. As such, it is difficult to clean the edges as close to the color filter C as possible. It is possible to clean the edge portion having a predetermined width in the glass substrate B. FIG. However, when a part of the color filter C is displaced in the edge portion, the color filter C is damaged in the cleaning operation.

The present invention has also been made to solve the above-mentioned problems. The second object of the present invention is to (a) clean the edges of the glass substrate B as close to the color filter C as possible when the color filter C is displaced from the correct setting position on the glass substrate B. It is providing the board | substrate edge part washing | cleaning apparatus which exists, and (b) a board | substrate edge part washing method.

In order to achieve the above object, the present invention is a substrate edge cleaning device having a cleaning head for cleaning by wiping the edge of the display substrate while moving in a linear manner, the apparatus comprising a color filter disposed on the substrate by moving with the cleaning head. It includes a camera that captures images near the edges.

In the first aspect of the present invention, in the substrate edge cleaning apparatus, the camera obtains surface state information of the cleaned substrate portion, and the substrate edge portion cleaning apparatus further determines the degree of cleaning based on the surface state information. It is preferable to include a part.

This makes it possible to determine the degree of cleaning of the surface state. As such, it is possible to improve the yield by grasping the time to replace the wipe cloth and detecting insufficient cleaning.

Moreover, in the 2nd aspect of this invention, the board | substrate edge part washing | cleaning apparatus is an edge detection part which detects the edge position of the color filter arrange | positioned on a board | substrate based on the surface state information obtained from the camera, and the positional information detected by the edge detection part. And a substrate holding portion for grasping the positional relationship between the edge of the color filter and the cleaning head, and a substrate holding portion for adjusting the position of the substrate based on the positional relationship information grasped by the substrate positioning portion.

This allows the substrate position to be adjusted by directly grasping the positional relationship between the edge of the color filter and the cleaning head. Therefore, it is possible to get as close as possible to the color filter C to clean the substrate.

In a third aspect of the present invention, the substrate edge cleaning apparatus further includes a camera disposed forwards and backwards in the cleaning direction of the cleaning head, wherein the pre-cleaning information storage unit is obtained from the camera disposed forward in the cleaning direction. The surface state information is stored, the post-cleaning information storage section stores the surface state information obtained from the camera disposed rearward in the cleaning direction, and the cleaning degree determining section determines the cleaning degree step by step while the cleaning operation of the cleaning head is in progress.

This makes it possible to step-by-step the degree of cleaning of the substrate surface during the cleaning operation. Therefore, it is possible to grasp the occurrence of insufficient cleaning in real time, and to cope with insufficient cleaning without adversely affecting the following process.

Moreover, in order to achieve the said objective, this invention provides the board | substrate holding part which hold | maintains a display board, the cleaning head which wash | cleans by wiping the edge of a board | substrate while moving linearly, and the color arrange | positioned to a board | substrate moving with a cleaning head, A substrate edge cleaning method applied to a substrate edge cleaning apparatus including a camera capturing an image near the edge of a filter, wherein the camera obtains surface state information of the cleaned substrate portion, and the substrate edge portion cleaning method includes surface state information. Determining the degree of cleaning on the basis of the;

This makes it possible to determine not only the adjustment of the substrate position but also the degree of cleaning of the substrate surface. It is possible to improve the yield by grasping the time to replace the wipe cloth and detecting insufficient cleaning.

Moreover, in order to achieve the said objective, the board | substrate edge part cleaning method of this invention is the board | substrate holding part which hold | maintains a display substrate, the cleaning head which wash | cleans by wiping the edge part of a board | substrate, moving linearly the edge part of the said board | substrate; A substrate edge cleaning method applied to a substrate edge cleaning device including a camera for capturing an image near the edge of a color filter disposed on a substrate while moving with a cleaning head, the substrate edge cleaning method comprising: a substrate based on surface state information obtained from a camera; Detecting the position of the edge of the color filter disposed on the substrate; determining the positional relationship between the edge of the color filter and the cleaning head based on the positional relationship information; and positioning the substrate based on the positional information obtained in the determining step. Adjusting the substrate position by driving the substrate holding portion to adjust the It should.

This makes it possible to adjust the substrate position by directly grasping the positional relationship between the color filter edge and the cleaning head. Therefore, it is possible to clean the edges of the LCD substrate as close to the color filter C as possible.

The present invention allows the camera to clean the substrate as close to the color filter as possible by locating the color filter edges.

In addition, it is possible to detect insufficient cleaning for each substrate by determining the degree of cleaning.

Additional information regarding the technical background of the present application

The disclosure of Japanese Patent Application No. 2004-257553, filed September 3, 2004, including the specification, drawings, and claims, is hereby incorporated by reference in its entirety.

These and other objects, advantages and features of the present invention are apparent from the following detailed description, taken in conjunction with the accompanying drawings which illustrate certain embodiments of the invention.

1 is a plan view showing a positioning state of a conventional substrate for LCD.

It is a perspective view which shows a part of board | substrate edge part washing | cleaning apparatus which concerns on embodiment of this invention.

3 is an enlarged perspective view showing a part contributing to cleaning performed by the substrate edge cleaning device.

4 is a block diagram showing a cleaning control unit that controls the substrate edge cleaning apparatus during the cleaning operation.

5 is a flowchart showing a cleaning operation of the substrate edge cleaning device.

It is a flowchart which shows the operation | movement of the board | substrate edge part washing | cleaning apparatus which concerns on other embodiment of this invention.

7 is a plan view showing a part of the LCD substrate to be cleaned.

8 is a plan view showing a state where a conventional substrate for LCD is disposed at a predetermined position.

9 is a block diagram for visualizing image information of a substrate edge.

(First embodiment)

EMBODIMENT OF THE INVENTION Next, embodiment of this invention is described with reference to drawings.

2 is a partial perspective view showing the substrate edge cleaning device 100 according to the embodiment of the present invention.

As shown in the figure, the substrate edge cleaning apparatus 100 cleans the edge of the LCD substrate shown in Fig. 7 by wiping the edge for mounting the electronic component with the connection terminal F with a tape cloth. . The substrate edge cleaning device includes a loader 101, a substrate holding unit 102, a backup 103, and a cleaning head 110.

The loader 101 holds the LCD substrate as the substrate edge cleaning device 100. The loader 101 can pass the substrate to the substrate holding unit 102 by mounting the LCD substrate A on the slider 104 from the outside of the substrate edge cleaning device 100 and sliding the slider 104. .

The substrate holding unit 102 maintains the supported substrate A at the cleaning position, passes the substrate A through an unloader (not shown), and moves the position of the substrate A to the cleaning head 110 at the cleaning position. Can be adjusted. The substrate holding part 102 includes a panel stage 121 that forms a substrate holding means capable of rotating the supported substrate A in the horizontal direction, and an XY table capable of moving the panel stage 121 in the horizontal direction ( 122).

The backup 103 is an apparatus for holding from below the entire edge of the substrate A disposed at the cleaning position. In the backup 103, the flexible accordion pad 105 connected to the vacuum pump is set in the longitudinal direction at equal intervals. These accordion pads 105 suck the substrate A mounted on the backup 103 by vacuum suction, pull the edge of the substrate A to the backup 103, and back up the edge of the substrate A ( Adhesion to the surface of 103). The back-up 103 with these accordion pads 105 holds the substrate A during the cleaning operation so that the substrate A is wiped with a cloth to clean it. As such, the color filter C, which causes sequential damage to the color filter C, can be prevented from moving. In addition, insufficient cleaning of the edge portion of the substrate can be prevented.

In addition, the backup 103 also corrects the surge by pulling the edge of the substrate A to the surface of the backup 103, that is, by sucking the edge of the substrate A using the accordion pad 105. can do. When the substrate A is large, this surge becomes large at the edge portion of the substrate A. Such surges can cause insufficient cleaning. As such, the cleaning efficiency can be improved in particular by the backup 103 in this case.

3 is an enlarged perspective view showing a part contributing to cleaning performed by the substrate edge cleaning device 100.

As shown in the figure, the cleaning head 110 wipes and cleans the edges of the substrate while moving a predetermined straight line on the main body of the substrate edge cleaning device 100. Since the cleaning head 110 is set on the rail 111 disposed in parallel with the backup 103, the cleaning head 110 can slide freely. The cleaning head 110 is supplied from a supply reel 112 for supplying a wipe cloth 114 for wiping, a collection reel 113 for winding up the use portion of the tape cloth 114, and a supply reel 112. An adjusting roller 116 for linearly contacting the contact between the cloth 114 and the substrate A by adjusting the tension of the pressure roller 115 for pressing the supplied tape-shaped cloth 114 and the tension of the tape-shaped cloth 114. It includes. In addition, the cleaning head 110 includes a supply reel 112, a collection reel 113, a pressure roller 115, and an adjustment roller 116 on the rear surface of the substrate A in order to clean the rear surface of the substrate. The same set of rollers.

The pressure roller 115 is detachable from the substrate A. FIG. When the pressure roller 115 is supported while being separated from the substrate A, the cleaning head 110 may be slid without wiping the substrate A with the cloth 114.

Moreover, the camera 117 is arrange | positioned before and after each in the washing | cleaning direction of the washing head 110. As shown in FIG. These cameras 117 capture an image of an edge portion of the substrate A, that is, capture an edge portion of the color filter C disposed on the substrate A. These cameras 117 can move together with the cleaning head 110, grasp the edges of the color filter C mounted on the surface of the substrate A, and also connect the terminal F mounted on the glass substrate B. The edge part of the containing board | substrate A is grasped | ascertained.

Note that the cleaning head 110 includes two cameras 117 arranged side by side in the moving direction of the cleaning head 110. Of these two cameras 117, the camera 117 disposed forward in the moving direction of the cleaning head 110 serves as the front camera 118 and is disposed rearward in the moving direction of the cleaning head 110 ( 117 functions as a rear camera 119. That is, the function of the camera 117, the front camera 118 or the rear camera 119 depends on the moving direction of the cleaning head 110.

4 is a block diagram showing a cleaning control unit 300 that controls the substrate edge cleaning apparatus 100 during the cleaning operation.

The cleaning control unit 300 shown in the drawing is a processing unit embedded in the substrate edge of the cleaning apparatus 100. The cleaning control unit 300 includes a camera 117 installed in the cleaning head 110, a substrate holding unit 102 that can adjust the position of the substrate A to the cleaning head 110, and various kinds of information such as information on the degree of cleaning. It is connected to the display apparatus 301 which can display a kind of information.

In addition, the cleaning control unit 300 includes a pre-cleaning information storage unit 302, a post-cleaning information storage unit 303, a substrate positioning unit 304, a substrate holding unit control unit 305, and a cleaning degree plate. A government 306.

The display device 301 is, for example, a liquid crystal monitor capable of displaying a determination made by the washing degree determining unit 306.

The pre-cleaning information storage unit 302 stores image information of the surface before cleaning at the edge of the substrate A, and this image is captured by the front camera 118.

Similarly, the post-cleaning information storage unit 303 stores image information of the post-cleaning surface at the edge portion of the substrate A, and this image is captured by the rear camera 119.

The substrate positioning unit 304 analyzes the position information from the front camera 118 and the image information of the edge of the color filter C captured by the front camera 118. Identify location information. The substrate positioning unit 304 may determine an edge line connecting two corners of the color filter C, and may determine a positional relationship between the line and the line of the movement trajectory of the cleaning head 110. That is, the substrate positioning unit 304 determines whether (a) an edge line connecting two corners of the color filter C is parallel to a line of the moving trajectory of the cleaning head 110, and (b) these lines are mutually different. If they are not parallel, the angle formed by these two lines can be determined. In addition, the substrate positioning unit 304 grasps the distance between the edge of the cleaning head 110 and the edge connecting the two corners of the color filter C.

The substrate holding part control part 305 holds a board | substrate so that the positional relationship between the washing | cleaning head 110 and the color filter C may correspond to a predetermined range based on the board | substrate position information grasped | ascertained by the board position grasping part 304. The unit 102 is controlled. More specifically, in the present embodiment, the substrate holding part control unit 305 is a substrate in such a manner that the border line of the moving track of the cleaning head 110 is parallel to the border line connecting two corners of the color filter C. The panel stage 121 holding (A) is driven. Then, as shown in FIG. 8, the board | substrate holding part control part 305 uses the XY table 122 so that the distance t between the edge part of the wiping tape-shaped cloth and the edge part of the color filter C may be 0.3 mm. To drive.

The cleaning degree determining unit 306 determines the cleaning degree by analyzing the image information. The cleaning degree determining unit 306 cleans the edges of the substrate A based on the pre-cleaning information stored in the pre-cleaning information storage unit 302 and the post-cleaning information stored in the post-cleaning information storage unit 303. After calculating the occupancy of the fine particles before washing and the occupancy of the fine particles after washing on the basis of the surface state before and after, the occupancy ratio of fine particles such as dust is compared based on the image information. When it is determined that the occupancy rate of the fine particles has not decreased below the predetermined value, the cleaning degree determining unit 306 displays a warning on the display device 301.

Specific examples for calculating the occupancy rate of the fine particles will be described below.

The image information of the surface state stored in the post-cleaning information storage unit 303 is visualized in FIG. 9. 9 provides image information for identifying the fine particles 602 on the cleaning area 601, which is an edge of the substrate A. FIG. Thereafter, the cleaning degree determining unit 306 specifies the visible field 603 based on this image information, and determines the cleaning degree of the visible field 603. That is, the cleaning degree determining unit 306 executes a binarize process of the cleaning region 601 and the fine particles 602 in the visible field 603, and fine particles on the surface of the substrate A according to the binarization image information. The total area size of the particulates 602 is calculated by extracting 602.

 Similarly, the total area size of the fine particles 602 is calculated based on the image information of the surface state stored in the pre-clean information storage unit 302.

Thereafter, a warning is displayed if the calculated total area size of the particulates 602 after cleaning does not decrease to 50 percent or less of the total area size of the particulates before cleaning, for example.

In addition, a warning may be displayed if the maximum size of the microparticles 602 after cleaning is, for example, at least 10-20 microns or less than the spacing between the lead wires on the substrate.

Next, the operation of the substrate edge cleaning apparatus 100 will be described with reference to the drawings.

5 is a flowchart showing a cleaning operation of the substrate edge cleaning device 100.

The board | substrate edge part washing | cleaning apparatus 100 accommodates the board | substrate A hold | maintained from upstream in the process of mounting an electronic component on an LCD board | substrate using the loader 101. FIG. Thereafter, the loader 101 mounts the substrate A on the panel stage 121 of the substrate holding unit 102 moved to the stored position. After storing the board | substrate A, the board | substrate holding part 102 carries in the board | substrate A to the position where the board | substrate A is wash | cleaned (step 401).

Subsequently, the edge portion of the substrate A is mounted on the backup 103, and the backup 103 vacuum-adsorbs the edge portion adjacent to the substrate A using the accordion pad 105. In this manner, the substrate A is continuously maintained while correcting the surge at the edge of the substrate A (step 402).

Subsequently, the substrate edge cleaning apparatus 100 is a state in which the pressure roller 115 of the cleaning head 110 is separated from the substrate A, that is, the tape-shaped cloth 114 does not wipe the substrate A. Uses the front camera 118 to determine the corner G1 of the color filter C mounted on the substrate A. FIG. Subsequently, the substrate positioning unit 304 analyzes the image information and grasps the absolute position of the corner G1 (position to the main body of the substrate edge cleaning apparatus 100) (step 403).

  Subsequently, the substrate edge cleaning apparatus 100 uses the front camera 118 while sliding the cleaning head 110 while the tape-shaped cloth 114 does not wipe the substrate A as in the case described above. After grasping the surface state of the edge portion of the substrate A, the pre-cleaning information storage unit 302 stores the surface state before cleaning (step 404).

Subsequently, when reaching the corner G2 of the substrate A, the front camera 118 grasps the corner G2 of the color filter C. As shown in FIG. Thereafter, as in the case described above, the substrate positioning unit 304 analyzes the image information and grasps the absolute position of the corner G2 (position to the main body of the substrate edge cleaning apparatus 100) (step 405 ).

Subsequently, the substrate positioning unit 304 is (a) an edge line obtained by connecting the two corners G1 and G2 to each other and indicating the edge of the color filter, and (b) the cleaning head 110 (straight line) of the Calculate the relationship between the moving trajectories. In order to adjust the position of the substrate A, the substrate edge cleaning apparatus 100 releases the suction support by the backup 103 (step 420), and then the two straight lines are parallel to each other based on the calculated relationship. The substrate holding control unit 305 drives the panel stage 121. Then, as shown in FIG. 8, the board | substrate holding part control part 305 is XY table 122 so that the distance t between the edge of the tape-shaped cloth 114 and the edge of the color filter C may be 0.3 mm. ) And adjust the positional relationship between the cleaning head 110 and the substrate A (step 406).

When the adjustment is completed, the substrate edge cleaning apparatus 100 suction-supports the substrate again by the backup 103 (step 421), and the tape-shaped cloth 114 contacts the wiped area of the substrate A. In order to close the pressure roller 115 of the cleaning head 110 to the substrate A, the edge of the substrate A is cleaned by sliding the cleaning head 110 (step 407).

In addition, the substrate edge cleaning apparatus 100 grasps the surface state of the substrate A after cleaning by using the rear camera 119 mounted to the rear in the cleaning direction, and the information storage unit 303 after cleaning Record the surface condition (step 408).

After the cleaning operation on one surface of the substrate A is completed, the cleaning degree determining unit 306 calculates the occupancy rate of the fine particles such as dust by analyzing the image information of the surface of the edge of the substrate stored in the information storage unit 302 before cleaning. do. Similarly, the cleaning degree determining unit 306 calculates the occupancy rate of the fine particles obtained from the image information of the same area of the edge portion of the substrate stored in the post-cleaning information storage unit 303 in order to compare with the result obtained initially. When it is determined that the occupancy rate of the fine particles does not decrease below the threshold, that is, when it is determined that the cleaning degree is not good (step 409: N), the cleaning degree determining unit 306 displays a warning on the display device 301 ( Step 410).

On the other hand, when the cleaning degree determining unit 306 determines that the cleaning degree is good (step 409: Y), the cleaning operation on one surface of the substrate A is considered to be finished. Thereafter, the substrate A is rotated 90 degrees to clean the other side of the substrate A, and then the next substrate is loaded.

As described so far, the substrate edge cleaning apparatus 100 according to the present embodiment accurately grasps the positional relationship between the edge of the color filter and the cleaning head 110 using the camera 117, and then the substrate A You can adjust the position of. Therefore, since the substrate edge cleaning apparatus 100 can arrange the tape-shaped cloth 114 until immediately before the edge of the color filter C, regardless of the setting tolerances of the substrate A and the color filter C, The wiping operation may be performed while maintaining the distance between the cleaning head 110 and the color filter C.

In addition, a positioning camera is used as a washing degree determination camera. This can reduce the cost of the substrate edge cleaning apparatus because the number of parts attached to the frequently moving cleaning head 110 can be reduced. In addition, by simplifying the cleaning process, it is possible to reduce the tact time for cleaning.

Although this embodiment describes the case where the degree of cleaning is determined by comparing the surface state before cleaning with the surface state after cleaning, the determination of the cleaning degree according to the present invention is not limited to the above-described method.

For example, the degree of cleaning can be determined by the following method. After cleaning, the surface state of the substrate A is grasped, an image of the fine particles is extracted from the surface image, and after the size of the fine particles or the occupancy rate of the fine particles is calculated, the degree of cleaning is determined based on the calculated values.

This method is suitable when the degree of cleanliness is evaluated based on absolute criteria.

(2nd embodiment)

Next, another embodiment of this invention is described below with reference to drawings. Since the structure of the apparatus of this embodiment is the same as the previous embodiment, the description is omitted here.

6 is a flowchart showing the operation of the substrate edge cleaning device 100 of the present embodiment.

The loading operation (step 401) of the substrate A is the same as in the previous embodiment.

Subsequently, the substrate edge cleaning apparatus is an area that is a corner (G1, G2 in FIG. 7) of the substrate A at which the cleaning operation starts using the front camera 118 mounted forward in the cleaning direction of the cleaning head 110. (Step 501).

In addition, the image of the surface before cleaning of the substrate A is captured by the front camera 118 and the image information generated is stored in the pre-cleaning information storage unit 302 (step 502).

After the corner G is grasped by the front camera 118, the substrate positioning unit 304 grasps the distance between the edge of the color filter C and the cleaning head 110 by analyzing the image information. If the distance between the edge of the color filter C and the cleaning head 110 does not fall within a predetermined distance range (step 503: N), the substrate positioning unit 304 may use the substrate holding unit control unit 305. Since the substrate holding unit 102 is controlled, the distance is adjusted to a value within a predetermined distance range (step 504).

Subsequently, the edge of the substrate A is wiped by advancing the cleaning head 110 in the cleaning direction (step 505).

Subsequently, the cleaned region of the substrate A is captured by the rear camera 119 mounted rearward in the cleaning direction of the cleaning head 110 (step 506). Thereafter, the image information of the cleaned region of the substrate A is stored in the post-cleaning information storage unit 303 (step 507).

Subsequently, the cleaning degree determining unit 306 analyzes the image information of the pre-washing part and the post-cleaning part of the surface, calculates the occupancy rate of the fine particles of each part, and then compares both occupancy rates. When the cleaning degree determining unit 306 determines that the cleaning degree is not good (step 508: N), the fact is displayed on the display device 301 (step 509), and the cleaning is finished.

On the other hand, when the cleaning degree determination unit 306 determines that the cleaning degree is good (step 508: Y), the process is repeated from the grasp by the front camera 118 (step 501) to the determination of the cleaning degree (step 508). Continue cleaning.

When the cleaning head 110 reaches the cleaning end position (step 510: Y), the cleaning operation ends.

As described so far, the substrate edge cleaning apparatus 100 can adjust the substrate A in stages as the cleaning head 110 is positioned and wiped. This can eliminate the job of grasping the position of the substrate A in advance, thereby improving the delay time for the cleaning operation. Moreover, since a camera is arrange | positioned back and front in a washing | cleaning direction, a washing degree can be determined as a washing | cleaning operation advances. Inadequate cleaning can be detected early during the cleaning operation, thus eliminating the waste of the operation.

While some exemplary embodiments of the invention have been described in detail above, those skilled in the art will readily appreciate that various modifications may be made to the exemplary embodiments without departing from the novel disclosure and advantages of the invention. Accordingly, all modifications are included within the scope of the present invention.

The present invention can be applied to a cleaning apparatus for cleaning an edge of an LCD substrate, in particular, a cleaning apparatus or the like as one line in an electronic component mounting process that may be embedded in an LCD substrate.

Claims (13)

A substrate edge cleaning device having a cleaning head for cleaning by wiping the edges of a display substrate while moving linearly, And a camera for capturing an image near the edge of the color filter disposed on the substrate by moving with the cleaning head. The method according to claim 1, The camera obtains surface state information of the cleaned substrate portion, And the substrate edge cleaning apparatus further comprises a cleaning degree determination portion operable to determine a cleaning degree based on surface state information. The method according to claim 2, The camera obtains surface state information of the portion of the substrate being cleaned, The substrate edge cleaning device further includes a pre-clean information storage unit operable to store pre-clean surface state information obtained from the camera; A post-cleaning information storage section operable to store post-cleaning surface state information obtained from said camera, And the cleaning degree determining unit is operable to determine the cleaning degree by comparing the pre-cleaning information and the post-cleaning information. The method according to claim 3, Further comprising a camera disposed in front and rear in the cleaning direction of the cleaning head, The pre-clean information storage section is operable to store surface state information obtained from the camera disposed forward in the cleaning direction, The post-cleaning information storage section is operable to store surface state information obtained from the camera disposed rearward in the cleaning direction, And the cleaning degree determining unit is operable to determine the cleaning degree step by step while a cleaning operation of the cleaning head is in progress. The method according to claim 1, An edge detector operable to detect an edge position of a color filter disposed on a substrate based on surface state information obtained from the camera; A substrate positioning unit operable to determine a positional relationship between the edge of the color filter and the cleaning head based on the positional information detected by the edge detecting unit; And a substrate holding portion operable to adjust the substrate position based on the positional relationship information grasped by the substrate positioning portion. The method according to claim 5, The substrate positioning unit is operable to derive position information of the entire edge of the color filter from position information of two corners of the color filter obtained by the edge detecting unit, And the substrate holding portion is operable to adjust the substrate position based on (a) the positional information of the entire edge of the color filter and (b) the positional relationship between the edge of the color filter and the cleaning head. The method according to claim 5, The substrate positioning unit is operable to grasp the positional relationship between the edge of the color filter and the cleaning head in a step while performing the cleaning operation, And the substrate holding unit is operable to adjust the substrate position step by step during the cleaning operation based on the positional relationship information identified by the substrate positioning unit. A substrate holding part for holding a display substrate, a cleaning head for cleaning by wiping the edge of the substrate while moving linearly, and a camera for capturing an image near the edge of the color filter disposed on the substrate while moving with the cleaning head; A substrate edge cleaning method applied to a substrate edge cleaning device, The camera obtains surface condition information of the cleaned substrate portion, The substrate edge cleaning method further comprises the step of determining the degree of cleaning based on the surface state information. The method according to claim 8, The camera obtains surface condition information of the portion of the substrate being cleaned, The substrate edge cleaning method includes storing pre-cleaning surface state information obtained from a camera, and storing post-cleaning surface state information obtained from a camera, And determining the cleaning degree by comparing the pre-cleaning information with the post-cleaning information. The method according to claim 8, Two cameras are used which are arranged in front and rear in the cleaning direction of the cleaning head, The substrate edge cleaning method, Storing surface state information obtained from a camera disposed forward in the cleaning direction; Storing surface state information obtained from a camera disposed rearward in the cleaning direction, And the determining step is a step of determining the degree of cleaning step by step while the cleaning operation of the cleaning head. A substrate holding part for holding a display substrate, a cleaning head for cleaning by wiping the edge of the substrate while moving linearly, and a camera for capturing an image near the edge of the color filter disposed on the substrate while moving with the cleaning head; A substrate edge cleaning method applied to a substrate edge cleaning device, Detecting the edge position of the color filter disposed on the substrate based on the surface state information obtained from the camera; Determining the positional relationship between the edge of the color filter and the cleaning head based on the positional relationship information; And adjusting the substrate position by driving the substrate holding portion to adjust the substrate position based on the positional information obtained in the grasping step. The method according to claim 11, The determining may include obtaining position information of two corners of the color filter by moving the cleaning head without executing the cleaning operation, and identifying position information of the entire edge of the color filter based on the position information of the two corners. Include, And adjusting the substrate position based on (a) the position information of the entire edge of the color filter and (b) the information of the positional relationship between the edge of the color filter and the cleaning head. The method according to claim 11, The step of grasping is a step of grasping the positional relationship between the edge of the color filter and the cleaning head while the cleaning operation is performed. And the adjusting step is a step of adjusting the substrate position step by step based on the obtained positional relationship.

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