1330549 * » 九、發明說明 【發明所屬之技術領域】 本發明是有關一種在與移動方向垂直的方向上洗淨具 有開縫狀的塗佈液排出口之開縫式噴嘴的裝置。 【先前技術】 以往是使用開縫式噴嘴，作爲在玻璃基板等基板上， 以一定寬度塗佈成爲光阻膜或彩色濾光片之塗佈液的裝置 。若使用開縫式噴嘴，則不會浪費塗佈液且可有效進行塗 佈.，在成爲寬度較廣時，於噴嘴前端的周邊部，塗佈液的 附著量變多，這是乾燥時產生大量的異物之原因。 因此，以往已知有在彈性變形的支持部之擦拭面，安 裝布或紗布而構成洗淨噴頭，將該洗淨噴頭的擦拭面抵押 在開縫式噴嘴的排出口而移動的洗淨裝置。（專利文獻1 的段落[0 0 3 1 ]) 又，在開縫式噴嘴的長邊方向（沿著縫隙的方向）移動 的板之兩面，安裝表面由鐵氟龍（登錄商標）樹脂或聚氨酯 樹脂等所構成的清掃構件，藉由彈簧將上述清掃構件按押 在開縫式噴嘴的排出口而移動的洗淨裝置。（專利文獻2 的段落[0012]) 再者，已知在開口有開縫式噴嘴的下端面，以個別的 清掃裝置，清掃已挾住該下端面之開縫式噴嘴的左右傾斜 面的裝置，該清掃裝置是由：與開縫式噴嘴的下端面（傾 斜面）接觸的清掃具、及吸引已清除之塗佈液的開口部所 -5- 1330549 構成的洗淨裝置。（專利文獻3的段落[0027]) 又，在以往的開縫式噴嘴的洗淨裝置中，由於從洗淨 液供給部僅吹附洗淨液與氣體，因此無法完全除去已附著 的光阻。而且，由於沒有物理性的洗淨手段，故僅以洗淨 液無法簡單的使牢牢黏住的光阻掉落，因此最後必須以人 工擦拭。 【專利文獻1】日本特開平5-208154號公報 【專利文獻2】日本特開平9-1 92566號公報 【專利文獻1】日本特開2002-177848號公報 【發明內容】 〔發明所欲解決之課題〕 在以往的開縫式噴嘴洗淨裝置中，由於從洗淨液供給 部僅吹附洗淨液與氣體，因此無法完全除去已附著的光阻 。又，由於沒有物理性的洗淨手段，故僅以洗淨液無法簡 單使牢牢黏住的光阻掉落，因此最後必須以人工擦拭。 又，因爲來自洗淨液供給部的洗淨液的擴展範圍小， 故洗淨液無法普及到開縫式噴嘴下端的全域，爲了普及而 需要大量的洗淨液。 〔用以解決課題之手段〕 爲了解決上述課題，本發明的開縫式噴嘴洗淨裝置， 是藉由一邊使擦拭構件接觸開縫式噴嘴的排出口，一邊使 其沿著開縫式噴嘴的長邊方向相對地移動，以除去附著在 -6- 1330549 特徵在 供給洗 述擦拭 ，又具 給部之 供給部 淨液供 前端之 接觸的 觸的第 件，彈 〇 開縫式 液之部 ，爲了 開縫式 排出口的多餘的塗佈液的開縫式噴嘴洗淨裝置， 於：該洗淨裝置，具有：對開縫式噴嘴前端傾斜面 淨液之洗淨液供給部，該洗淨液供給部設爲可與上 構件一起沿著開縫式噴嘴的長邊方向上相對地移動 有：防止上述開縫式噴嘴前端傾斜面封閉洗淨液供 開口的限制部。 又’防止開縫式噴嘴的前端傾斜面封閉洗淨液 的開口之限制部的設置位置與形狀，例如是在比洗 給部的開口更上方形成凸部。 而且，上述擦拭構件是由：形成讓開縫式噴嘴 V字狀凹部嵌入，或是與開縫式噴嘴前端之排出口 第1擦拭構件' 及與開縫式噴嘴前端之兩傾斜面接 2擦拭構件所構成者。 再者，上述擦拭構件是以設爲由彈簧等彈性構 壓在與開縫式噴嘴前端接觸的方向之構造較爲理想 又，本發明爲了提升霧的擴展與洗淨效果，在 噴嘴洗淨裝置的洗淨液供給部，設置用來儲留洗淨 分，從其後方吹附氣體。 而且，抑制開縫式噴嘴兩端的排氣流速，此外 進行自我洗淨的目的，可在開縫式噴嘴洗淨裝置的 噴嘴之兩端部設計大致相似形狀的虛設區塊。 〔發明的功效〕 根據本發明之開縫式噴嘴洗淨裝置，由於將洗淨液供 1330549 給至噴嘴前端，且可擦拭掉已附著的塗佈液，因此塗佈液 不會凝固，清掃構件不會在早期就消耗掉，或受損。 又，本發明之洗淨裝置，是在對開縫式噴嘴前端傾斜 面噴附洗淨液時，藉由洗淨液體供給部的限制部來防止洗 淨液供給部的開口被封閉，因此具有抑制塗佈液乾燥之效 果。 再者，設計儲留洗淨液的部分，藉著從其後方吹附氣 體，使霧的擴展提升，提升洗淨效果，亦可削減液量。 又，以往在洗淨之後，爲了防止未除乾淨的光阻乾燥 而成爲塗佈中的異物，對每20片洗淨對象物進行人工擦 拭作業，惟當因氣體與洗淨液的雙流體噴嘴噴附洗淨液時 ，藉由接觸式的襯墊之物理性的洗淨手段洗淨噴嘴，可使 洗淨效率提升，可洗淨除去已經乾燥的光阻，有減少人工 擦拭的頻率之效果。 而且，在洗淨噴嘴端部附近時，若沒有設置與噴嘴略 相似形的虛設區塊，排氣效果會降低而使流速減少，因此 成爲洗淨不足的原因。在此，藉由在開縫式噴嘴的兩端設 計略相似形的虛設區塊，使噴嘴端的排氣之流速不降低， 可均一的進行洗淨，利用虛設區塊，在洗淨時及/或待機 時，可進行噴嘴本身的自行洗淨。 【實施方式】 以下依據添附圖面說明本發明之實施形態。第1圖是 第1實施例之開縫式噴嘴洗淨裝置的全體斜視圖，第2圖 1330.549 - 是該開縫式噴嘴洗淨裝置的平面圖，第3圖是第2圖的 A-A方向剖面圖，第4圖是第3圖的主要部分放大剖面圖 〇 • 開縫式噴嘴洗淨裝置是在軌道1上扣合板2，設置在 . 板2上的洗淨用區塊3，沿著開縫式噴嘴100的長邊方向 設爲可相對地來回移動。該洗淨用區塊3是由：下區塊4 與一對的上區塊5所構成，在形成於下區塊4的上面之凹 部上嵌入上區塊5加以保持。 上述下區塊4藉由安裝在板2上的定位板6位置定位 ，又，載置於可旋轉地螺固在板2的保持具7上，成爲旋 轉保持具7且可高調整的構造。 又，上區塊5具有與開縫式噴嘴100的傾斜面101略 . 平行的傾斜面8，在該傾斜面8形成有朝向傾斜面1 0 1而 - 供給的洗淨液體供給部9之開口 1 0，使該開口 1 0的正上 方位置之傾斜面的一部分在傾斜面1 0 1側成爲比開口 1 0 的面更凸的限制部1 1，藉由該限制部1 1即使使傾斜面 1 〇 1與傾斜面8接觸時，開口 1 0亦不會被封閉。 又，一對的上區塊5、5間藉以導引構件1 2、1 2配置 擦拭構件13。沿著擦拭構件13的開縫式噴嘴100的長邊 方向之長度與形成開口 10的區域重疊。又，擦拭構件13 以海綿 '橡膠、樹脂等比較軟的材料構成，在開縫式噴嘴 100下降時，仿照開縫式噴嘴的100的下端部形狀，以某 程度的寬度接觸。 此外，以難以彈性變形的材料製作擦拭構件13的材 -9- 1330549 料時，在擦拭構件13預先形成仿照開縫式噴嘴1〇〇的下 端部形狀之凹部。 以上，從洗淨液供給部9的開口 10朝向傾斜面101 供給洗淨液’在未圖示的驅動裝置，使板2沿著開縫式噴 嘴100的長邊方向移動，藉由擦拭構件13擦拭附著在開 縫式噴嘴100的排出口之塗佈液。 第5圖是第2實施例之該開縫式噴嘴洗淨裝置的平面 圖，第6圖是第5圖的A方向箭號圖，第7圖是第5圖的 B-B方向放大剖面圖，第8圖是第6圖的C-C方向剖面圖 ，在該實施例中，是由：使擦拭構件與開縫式噴嘴1 0 0前 端的兩傾斜面101接觸的第2擦拭構件131、及與開縫式 噴嘴1〇〇前端的兩傾斜面101接觸的第2擦拭構件132所 構成，第2擦拭構件132在平面觀看，是配置於形成洗淨 液供給部9的開口 10之區域的若干外側上，第1擦拭構 件1 3 1則配置在比一方的第2擦拭構件1 3 2更外側。 第1及第2擦拭構件131、132是由海綿、橡膠、樹 脂等所構成，第1擦拭構件13 1、132在側面觀看，構成 略逆U字狀，當開縫式噴嘴100前端下降，而按押第1擦 拭構件131時，隨著其變形的彈力與開縫式噴嘴100的下 端壓接。又，第2擦拭構件132在正面觀看，構成略逆V 字狀，與開縫式噴嘴1〇〇的長邊方向分離安裝兩個，一方 的第2擦拭構件132在右側的上區塊5固接一端’另一方 的第1擦拭構件132在左側的上區塊5固接一端’以彎折 時的彈力與開縫式噴嘴1〇〇的下端之兩傾斜面101、101 -10- 1330549 • · 壓接。 第9圖是第3實施例之該開縫式噴嘴洗淨裝置的平面 圖，第10圖是第9圖的A方向箭號圖，第11圖是第9圖 的B-B方向放大剖面圖，第12圖是第10圖的C-C方向剖 面圖。 在該實施例中，從正面觀看，將第2擦拭構件132的 形狀設爲五角形的板狀體，使垂直的兩邊中的一邊與下區 塊4的上面抵接，另一方的邊與上區塊5的內側面抵接。 藉著這種構成，可正確進行擦拭構件的位置定位。 第13圖是第3實施例之該開縫式噴嘴洗淨裝置的平 面圖，第14圖是第13圖的A-A方向放大剖面圖，第15 圖是第13圖的B-B方向放大剖面圖。 在該實施例中，從平面觀看，在形成洗淨液供給部9 的開口 1 0之區域內，配置第1及第2擦拭構件1 3 1、1 3 2 。又，第1及第2擦拭構件131、132皆構成區塊狀，以 彈簧l3la、l32a彈壓在與開縫式噴嘴1〇〇壓接的方向。 又，第16圖是第4實施例之擦拭構件的圖，在該實 施例中，前端是尖銳的擦拭構件133的基部收納於盒體 134內，藉由彈簧135彈壓在突出方向。 第17圖是第5實施例之開縫式噴嘴洗淨裝置的平面 圖，開縫式噴嘴以兩處的擦拭構件201、202擦拭。首先 ，以前方的擦拭構件20 1除去已附著的光阻，然後以後方 的擦拭構件202進行洗淨液與擦拭的加工。擦拭部爲了容 易交換，而各安裝於左右’擦拭構件以與噴嘴前端附近的BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for washing a slotted nozzle having a slit-shaped coating liquid discharge port in a direction perpendicular to a moving direction. [Prior Art] Conventionally, a slit nozzle has been used as a device for applying a coating liquid of a photoresist film or a color filter to a substrate such as a glass substrate with a constant width. When the slit nozzle is used, the coating liquid is not wasted and the coating can be effectively applied. When the width is wide, the amount of the coating liquid adhered to the peripheral portion of the tip end of the nozzle increases, which is a large amount during drying. The reason for the foreign body. For this reason, conventionally, there has been known a cleaning device in which a wiping surface of an elastically deformable supporting portion is attached to a cloth or a gauze to form a washing head, and the wiping surface of the washing head is priced at a discharge port of the slit nozzle. (Paragraph [0 0 3 1 ] of Patent Document 1) Further, the mounting surface is made of Teflon (registered trademark) resin or polyurethane on both sides of the plate that moves in the longitudinal direction of the slit nozzle (in the direction along the slit). A cleaning device in which a cleaning member made of a resin or the like is moved by a spring to push the cleaning member to a discharge port of the slit nozzle. (Paragraph [0012] of Patent Document 2) Further, it is known that a device for cleaning the left and right inclined surfaces of the slit nozzle that has caught the lower end surface by an individual cleaning device is provided on the lower end surface of the slotted nozzle. The cleaning device is a cleaning device comprising a cleaning device that is in contact with a lower end surface (inclined surface) of the slit nozzle, and an opening portion that attracts the removed coating liquid, -5 to 1330549. (Paragraph [0027] of the Patent Document 3) In the conventional cleaning apparatus for a slit type nozzle, since only the cleaning liquid and the gas are blown from the cleaning liquid supply unit, the attached photoresist cannot be completely removed. . Moreover, since there is no physical cleaning means, it is not possible to simply drop the firmly adhered photoresist with the cleaning liquid, and therefore it must be manually wiped. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Problem] In the conventional slotted nozzle cleaning device, since only the cleaning liquid and the gas are blown from the cleaning liquid supply unit, the adhered photoresist cannot be completely removed. Moreover, since there is no physical cleaning means, only the cleaning liquid cannot simply drop the firmly adhered photoresist, so that it must be manually wiped. In addition, since the range of expansion of the cleaning liquid from the cleaning liquid supply unit is small, the cleaning liquid cannot be spread over the entire lower end of the slit nozzle, and a large amount of cleaning liquid is required for the spread. [Means for Solving the Problem] In order to solve the above problems, the slit type nozzle cleaning device of the present invention is formed along the slit nozzle while contacting the wiping member with the discharge port of the slit nozzle. The long-side direction is relatively moved to remove the first piece of the contact that is attached to the -6-1330549 feature and is supplied with the cleaning and wiping, and the contact portion of the supply portion of the supply portion is contacted with the front end, and the portion of the open-mouth type liquid is In the slit type nozzle cleaning device for the excess coating liquid of the slit type discharge port, the cleaning device includes: a cleaning liquid supply unit for the inclined surface cleaning liquid of the slit type nozzle, the cleaning liquid The supply unit is configured to be movable relative to the upper member in the longitudinal direction of the slit nozzle: a restricting portion that prevents the slit end tip inclined surface from closing the cleaning liquid supply opening. Further, the position and shape of the regulating portion for preventing the opening of the opening of the cleaning liquid from the inclined surface of the slit of the slit nozzle are formed, for example, by forming a convex portion above the opening of the washing portion. Further, the wiping member is formed by inserting a V-shaped concave portion of the slit type nozzle, or connecting the first wiping member ' with the discharge port tip end of the slit nozzle and the inclined surface of the slit nozzle tip. The constituents. Further, the wiping member is preferably a structure that is elastically pressed by a spring or the like in a direction in contact with the tip end of the slit nozzle, and the nozzle cleaning device is used in the present invention to enhance the expansion and cleaning effect of the mist. The cleaning liquid supply unit is provided to store the washing fraction and to blow the gas from the rear side. Further, the exhaust flow rate at both ends of the slit nozzle is suppressed, and the purpose of self-cleaning is to design a dummy block having a substantially similar shape at both ends of the nozzle of the slit nozzle cleaning device. [Effect of the Invention] According to the slit type nozzle cleaning device of the present invention, since the cleaning liquid is supplied to the tip end of the nozzle, and the applied coating liquid can be wiped off, the coating liquid does not solidify, and the cleaning member is cleaned. It won't be consumed or damaged at an early stage. Further, in the cleaning apparatus of the present invention, when the cleaning liquid is sprayed on the inclined surface of the slit tip end, the opening of the cleaning liquid supply unit is prevented from being closed, thereby preventing the opening of the cleaning liquid supply unit from being closed. The effect of drying the coating liquid. Further, by designing the portion in which the cleaning liquid is stored, the gas is blown from the rear side to increase the expansion of the mist, thereby improving the washing effect and reducing the amount of liquid. In addition, in the past, after cleaning, in order to prevent the uncleaned photoresist from drying and becoming a foreign matter during coating, a manual wiping operation is performed for every 20 cleaning objects, but a two-fluid nozzle for gas and cleaning liquid is used. When the cleaning solution is sprayed, the nozzle can be cleaned by the physical cleaning means of the contact pad, so that the cleaning efficiency can be improved, the dried photoresist can be removed by washing, and the frequency of manual wiping can be reduced. . Further, when the vicinity of the end portion of the cleaning nozzle is provided, if the dummy block having a shape slightly similar to the nozzle is not provided, the exhaust effect is lowered and the flow velocity is reduced, so that the cleaning is insufficient. Here, by designing a dummy block of a slightly similar shape at both ends of the slit nozzle, the flow rate of the exhaust gas at the nozzle end is not lowered, and the washing can be uniformly performed, using the dummy block, during washing and/or Or the nozzle itself can be washed by itself during standby. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Fig. 1 is a perspective view of the slit nozzle cleaning device of the first embodiment. Fig. 2 is a plan view of the slit nozzle cleaning device, and Fig. 3 is a cross-sectional view taken along line AA of Fig. 2. Figure 4 is an enlarged cross-sectional view of the main part of Fig. 3. The slotted nozzle cleaning device is a fastening plate 2 on the rail 1, and a cleaning block 3 disposed on the board 2, along the slit The longitudinal direction of the nozzle 100 is set to be relatively movable back and forth. The cleaning block 3 is composed of a lower block 4 and a pair of upper blocks 5, and the upper block 5 is embedded in a concave portion formed on the upper surface of the lower block 4 to be held. The lower block 4 is positioned by the positioning plate 6 attached to the plate 2, and is placed on the holder 7 rotatably screwed to the plate 2 to be a rotating holder 7 and can be highly adjusted. Further, the upper block 5 has an inclined surface 8 which is parallel to the inclined surface 101 of the slit nozzle 100, and the inclined surface 8 is formed with an opening of the washing liquid supply portion 9 supplied toward the inclined surface 110 10, a part of the inclined surface of the position immediately above the opening 10 is made to be a convex portion 1 that is more convex than the surface of the opening 10 on the inclined surface 10 1 side, and even the inclined surface is made by the regulating portion 1 1 When the 〇1 is in contact with the inclined surface 8, the opening 10 is not closed. Further, the wiping members 13 are disposed between the upper blocks 5 and 5 of the pair by the guiding members 1 2, 1 2 . The length along the longitudinal direction of the slit nozzle 100 of the wiping member 13 overlaps with the region where the opening 10 is formed. Further, the wiping member 13 is made of a relatively soft material such as a sponge rubber or a resin, and when the slit nozzle 100 is lowered, it follows the shape of the lower end portion of the slit nozzle 100 and is in contact with a certain width. Further, when the material of the wiping member 13 is made of a material which is difficult to be elastically deformed, a recessed portion which is shaped like a lower end portion of the slit nozzle 1 is formed in advance in the wiping member 13. As described above, the cleaning liquid is supplied from the opening 10 of the cleaning liquid supply unit 9 toward the inclined surface 101. The driving device is not shown, and the plate 2 is moved along the longitudinal direction of the slit nozzle 100 by the wiping member 13 The coating liquid adhering to the discharge port of the slit nozzle 100 is wiped. Fig. 5 is a plan view of the slit nozzle cleaning device of the second embodiment, Fig. 6 is an arrow diagram of the A direction of Fig. 5, and Fig. 7 is an enlarged sectional view of the BB direction of Fig. 5, Fig. 6 is a cross-sectional view taken along the line CC in Fig. 6, and in this embodiment, the second wiping member 131 and the slit type which bring the wiping member into contact with the inclined surfaces 101 at the tip end of the slit nozzle 100; The second wiping member 132 that is in contact with the inclined surfaces 101 at the tip end of the nozzle 1 is formed, and the second wiping member 132 is disposed on the outer side of the region where the opening 10 of the cleaning liquid supply portion 9 is formed, as viewed in plan. 1 The wiping member 1 3 1 is disposed outside the second wiping member 1 3 2 . The first and second wiping members 131 and 132 are made of sponge, rubber, resin, or the like, and the first wiping members 13 1 and 132 are viewed from the side, and have a slightly inverted U shape, and the tip end of the slit nozzle 100 is lowered. When the first wiping member 131 is pressed, the elastic force of the deformation is pressed against the lower end of the slit nozzle 100. Further, the second wiping member 132 is viewed from the front side and has a slightly inverted V shape, and is provided separately from the longitudinal direction of the slit nozzle 1A, and one of the second wiping members 132 is fixed to the upper block 5 on the right side. One end of the first wiping member 132 is attached to the upper end block 5 on the left side, and the elastic force at the time of bending and the lower end of the slotted nozzle 1 倾斜 are inclined surfaces 101, 101 -10- 1330549. · Crimp. Fig. 9 is a plan view showing the slit nozzle cleaning device of the third embodiment, Fig. 10 is an arrow diagram of the A direction of Fig. 9, and Fig. 11 is an enlarged sectional view of the BB direction of Fig. 9, No. 12 The figure is a cross-sectional view in the CC direction of Fig. 10. In this embodiment, the shape of the second wiping member 132 is a pentagonal plate-like body as viewed from the front, and one of the two sides is perpendicular to the upper surface of the lower block 4, and the other side and the upper portion are abutted. The inner side of the block 5 abuts. With this configuration, the positional positioning of the wiping member can be performed correctly. Fig. 13 is a plan view showing the slit nozzle cleaning device of the third embodiment, Fig. 14 is an enlarged cross-sectional view taken along line A-A of Fig. 13, and Fig. 15 is an enlarged cross-sectional view taken along line B-B of Fig. 13. In this embodiment, the first and second wiping members 1 3 1 and 1 3 2 are disposed in a region where the opening 10 of the cleaning liquid supply portion 9 is formed as viewed in plan. Further, the first and second wiping members 131 and 132 are formed in a block shape, and are spring-loaded in the direction in which the slit nozzles 1 are pressed by the springs 13a and 132a. Further, Fig. 16 is a view showing the wiping member of the fourth embodiment. In this embodiment, the base portion of the sharp wiping member 133 at the distal end is housed in the casing 134, and is biased in the protruding direction by the spring 135. Fig. 17 is a plan view showing the slit type nozzle cleaning device of the fifth embodiment, and the slit type nozzle is wiped by the wiping members 201, 202 at two places. First, the adhered photoresist is removed by the front wiping member 20 1 , and then the cleaning liquid and the wiping process are performed by the rear wiping member 202. The wiping portions are attached to the left and right 'wiping members to be adjacent to the front end of the nozzle for easy exchange.
S -11 - 1330549 側面部（附著有光阻的部分）接觸之方式設置。附著在噴嘴 的光阻，在以洗淨液膨脹濕潤之後進行擦拭，因此可增加 洗淨效果。在洗淨液供給部設置儲留洗淨液的洗淨液池部 204，從位於其後方之氣體供給部203吹附氣體207，洗淨 液成爲霧狀208，與噴嘴傾斜面接觸而洗淨。 第18圖是上述洗淨裝置的A-A剖面圖，設置洗淨液 池部2 04作爲在洗淨液供給部儲存洗淨液的部分，藉著從 位於其後方之氣體供給部203吹附氣體，使洗淨液擴展而 霧化。上述霧排出至噴嘴210時，在傾斜面209接觸洗淨 液的面積，與未供給氣體時相比變廣。噴嘴洗淨裝置在洗 淨液供給部與擦拭部進行洗淨，並且從排液兼排氣口 2 0 6 進行排氣。 第19(a)圖是在噴嘴100連接虛設區塊300之圖。虛 設區塊300具有與噴嘴100相同的剖面，如第19(b)圖所 示，與噴嘴1〇〇兩端連接。第19(c)圖是從排出口 301側 觀看的圖。藉由設置虛設區塊，在洗淨噴嘴端附近時流速 不會變慢，可均勻洗淨，因此不會產生洗淨殘留，亦可改 善排氣效率。又’利用虛設區塊，若在洗淨待機時排出洗 淨液，則可進行噴嘴本身的自行洗靜。 〔產業上利用的可能性〕 在洗淨以半導體製造裝置作爲開始的液體塗佈裝置之 噴嘴的裝置，特別是可應用在因塗佈液的凝固產生問題的 裝置。藉此’期待藉由降低洗淨作業頻率之製造線全體的 -12- 1330549 • 效率化。 【圖式簡單說明】 第1圖是第1實施例之開縫式噴嘴洗淨裝置的全體斜 視圖。 第2圖是第1實施例之該開縫式噴嘴洗淨裝置的平面 圖。 第3圖是第1實施例之第2圖的A-A方向剖面圖。 第4圖是第1實施例之第3圖的主要部分放大剖面圖 〇 第5圖是第2實施例之該開縫式噴嘴洗淨裝置的平面 圖。 第6圖是第5圖的A方向箭號圖。 第7圖是第5圖的B-B方向放大剖面圖。 第8圖是第6圖的C-C方向剖面圖。 第9圖是第3實施例之該開縫式噴嘴洗淨裝置的平面 圖。 第10圖是第9圖的A方向箭號圖。 第11圖是第9圖的B-B方向放大剖面圖。 第12圖是第10圖的C-C方向剖面圖。 第13圖是第3實施例之該開縫式噴嘴洗淨裝置的平 面圖。 第14圖是第13圖的A-A方向放大剖面圖。 第15圖是第13圖的B-B方向放大剖面圖。 -13- 1330549 第16圖是第4實施例之洗淨構件的圖。 第17圖是第5實施例之洗淨裝置的上面圖（擦拭構件 在2處的構成倂置2組時）。 第18圖是第17圖的A-A方向放大剖面圖。 第19圖是第5實施例之虛設區塊的圖。 主要元件符號說明】 I 軌道 3 洗淨用區塊 5 上區塊 7 保持具 9 洗淨液供給部 II 限制部 13 擦拭構件 1 〇 1傾斜面 1 3 2第2擦拭構件 1 3 3擦拭構件 135 彈簧 2 0 2 Ο形環 207氣體 209傾斜面 3 〇 〇虛設區塊 2 板 4 下區塊 6 位置定位板 8 傾斜面 1〇 洗淨液供給用的開口 12 導引部 100開縫式噴嘴 1 3 1第1擦拭構件 131a、 132a 彈簧 134盒體 201擦拭構件（前方） 206排液兼排氣口 20 8霧 2 1 0 噴嘴 3 〇 1排出口S -11 - 1330549 The side part (the part with the photoresist attached) is set in contact. The photoresist attached to the nozzle is wiped after being swollen with the cleaning liquid, so that the cleaning effect can be increased. In the cleaning liquid supply unit, the cleaning liquid pool portion 204 in which the cleaning liquid is stored is provided, and the gas 207 is blown from the gas supply unit 203 located at the rear side thereof, and the cleaning liquid is in a mist 208, and is washed in contact with the inclined surface of the nozzle. Fig. 18 is a cross-sectional view of the cleaning device taken along the line AA, and the cleaning liquid pool unit 208 is provided as a portion for storing the cleaning liquid in the cleaning liquid supply unit, and the gas is supplied from the gas supply unit 203 located at the rear side thereof. The cleaning solution expands and atomizes. When the mist is discharged to the nozzle 210, the area where the inclined surface 209 contacts the cleaning liquid becomes wider than when the gas is not supplied. The nozzle cleaning device is cleaned by the cleaning liquid supply unit and the wiping unit, and is exhausted from the liquid discharge/exhaust port 2 0 6 . Figure 19(a) is a diagram in which the nozzle 100 is connected to the dummy block 300. The dummy block 300 has the same cross section as the nozzle 100, and is connected to both ends of the nozzle 1 as shown in Fig. 19(b). Fig. 19(c) is a view as seen from the side of the discharge port 301. By setting the dummy block, the flow rate does not become slower when the nozzle end is washed, and it can be uniformly washed, so that no washing residue is generated, and the exhaust efficiency can be improved. Further, by using the dummy block, if the cleaning liquid is discharged during the washing standby, the nozzle itself can be self-washed. [Case of Industrial Use] The apparatus for washing the nozzle of the liquid application apparatus which is a semiconductor manufacturing apparatus as a starting point is particularly applicable to a device which causes problems due to solidification of the coating liquid. Therefore, it is expected that the efficiency of the entire manufacturing line, which reduces the frequency of cleaning operations, will be -12-1330549. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view of the entire slit nozzle cleaning apparatus of the first embodiment. Fig. 2 is a plan view showing the slit nozzle cleaning device of the first embodiment. Fig. 3 is a cross-sectional view taken along line A-A of Fig. 2 of the first embodiment. Fig. 4 is an enlarged cross-sectional view showing a main portion of a third embodiment of the first embodiment. Fig. 5 is a plan view showing the slit nozzle cleaning device of the second embodiment. Fig. 6 is an arrow diagram of the A direction in Fig. 5. Fig. 7 is an enlarged cross-sectional view taken along line B-B of Fig. 5. Fig. 8 is a cross-sectional view taken along line C-C of Fig. 6. Fig. 9 is a plan view showing the slit nozzle cleaning device of the third embodiment. Fig. 10 is an arrow diagram of the A direction in Fig. 9. Fig. 11 is an enlarged cross-sectional view taken along line B-B of Fig. 9. Fig. 12 is a cross-sectional view taken along line C-C of Fig. 10. Fig. 13 is a plan view showing the slit nozzle cleaning device of the third embodiment. Fig. 14 is an enlarged cross-sectional view taken along line A-A of Fig. 13. Figure 15 is an enlarged cross-sectional view taken along line B-B of Figure 13; -13- 1330549 Fig. 16 is a view showing the cleaning member of the fourth embodiment. Fig. 17 is a top view of the cleaning apparatus of the fifth embodiment (when the wiping members are arranged in two sets at two places). Fig. 18 is an enlarged cross-sectional view taken along line A-A of Fig. 17. Fig. 19 is a view showing a dummy block of the fifth embodiment. Explanation of main component symbols] I Rail 3 Cleaning block 5 Upper block 7 Holder 9 Cleaning liquid supply portion II Restricting portion 13 Wiping member 1 〇1 inclined surface 1 3 2 Second wiping member 1 3 3 wiping member 135 Spring 2 0 2 Ο ring 207 gas 209 inclined surface 3 〇〇 dummy block 2 plate 4 lower block 6 position positioning plate 8 inclined surface 1 开口 opening for supply of cleaning liquid guide portion 100 slotted nozzle 1 3 1 first wiping members 131a, 132a spring 134 box 201 wiping member (front) 206 drain and exhaust port 20 8 mist 2 1 0 nozzle 3 〇 1 discharge port
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