JP4857193B2 - Nozzle cleaning device - Google Patents

Description

  The present invention relates to a nozzle cleaning device for cleaning a processing liquid supply nozzle that discharges a processing liquid from a slit-like discharge port formed at a lower end portion of a long slit nozzle.

  In a coating apparatus for applying a processing liquid such as a photoresist to a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display panel, or a mask substrate for a semiconductor manufacturing apparatus, a slit shape formed at the lower end of a long slit nozzle The processing liquid is applied to the surface of the substrate by discharging the processing liquid from the discharge port. In this coating apparatus, the nozzle contaminated by the application of the treatment liquid is cleaned by the nozzle cleaning apparatus.

  As such a nozzle cleaning device, for example, as described in Patent Document 1, a nozzle cleaning device that supplies a cleaning liquid to the lower end of the nozzle to clean the nozzle is used.

Further, as described in Patent Document 2, a nozzle cleaning device that cleans a nozzle using a wiping member made of a porous material supplied with a cleaning liquid has also been proposed.
JP 2005-262127 A JP 2004-122065 A

  As described in Patent Document 1, when the configuration in which the nozzle is cleaned only with the cleaning liquid is employed, the nozzle may not be sufficiently cleaned depending on the type of the processing liquid. Moreover, when the wiping member which consists of porous materials as described in patent document 2 is used, the problem that a wiping member is damaged by contact with a nozzle arises.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a nozzle cleaning device that can clean a nozzle sufficiently cleanly over a long period of time.

  The invention according to claim 1 is a nozzle cleaning device for cleaning a processing liquid supply nozzle for discharging a processing liquid from a slit-like discharge port formed at a lower end portion of a long slit nozzle, wherein the slit A lower surface cleaning member that can contact the lower surface of the lower end of the nozzle, a right side cleaning member that can contact the lower surface of the slit nozzle in the longitudinal direction of the slit nozzle, and the right side of the slit nozzle in the longitudinal direction A cleaning block having a left side cleaning member disposed at a position different from the surface cleaning member and capable of contacting the left side surface of the lower end portion in the longitudinal direction of the slit nozzle; A cleaning region that moves while cleaning the lower end portion of the slit nozzle by the member, the right side cleaning member, and the left side cleaning member, the lower surface cleaning member, the right side cleaning member, and the left side A movement mechanism that reciprocates between a cleaning position and a standby position separated from the slit nozzle; and the right side cleaning member across the slit nozzle in the cleaning block when the cleaning block is disposed in the cleaning area; A first nozzle that is disposed at an opposing position and that can discharge a cleaning liquid toward the right side cleaning member, and the slit nozzle in the cleaning block is sandwiched between the first nozzle and the cleaning block when the cleaning block is disposed in the cleaning region. A second nozzle disposed at a position facing the left side cleaning member and capable of discharging a cleaning liquid toward the left side cleaning member; when the cleaning block is moving in the cleaning region; And a cleaning liquid supply unit configured to supply a cleaning liquid to the first nozzle and the second nozzle when arranged at a position.

  A second aspect of the present invention is the first aspect of the present invention, further comprising a third nozzle capable of discharging a cleaning liquid toward the lower surface cleaning member, wherein the cleaning liquid supply unit includes a cleaning block in the cleaning area. And when the cleaning block is disposed at the standby position, the cleaning liquid is supplied to the third nozzle.

  According to a third aspect of the present invention, in the first or second aspect of the present invention, the cleaning block is disposed behind the right side cleaning member in the moving direction and cleaned by the right side cleaning member. The right side gas jetting means for jetting gas to the right side of the lower end of the slit nozzle, and the rear side in the moving direction of the left side cleaning member in the cleaning block, and cleaned by the left side cleaning member Further provided is a gas jetting means for the left side surface that jets gas to the left side surface of the lower end of the slit nozzle.

  The invention according to claim 4 is the invention according to claim 3, wherein the gas jetting means for the right side surface and the gas jetting means for the left side surface each jet gas toward the lower end portion of the slit nozzle. It has a slit-like gas ejection hole.

  According to a fifth aspect of the present invention, in the invention according to any one of the first to fourth aspects, when the cleaning block moves to the standby position, a cleaning liquid splash prevention cover that covers an upper portion of the cleaning block is provided. Is further provided.

  [6] In the invention according to any one of [1] to [5], the lower surface cleaning member, the right side surface cleaning member, and the left side surface cleaning member are brushes.

  According to the invention of claim 1, when the cleaning block is moving in the cleaning region, the slit nozzle can be cleaned sufficiently cleanly by the lower surface cleaning member, the right side cleaning member and the left side cleaning member, Further, when the cleaning block is disposed at the standby position, the lower surface cleaning member, the right side surface cleaning member, and the left side surface cleaning member can be cleaned with the cleaning liquid. At this time, since the right side cleaning member and the left side cleaning member are disposed at different positions with respect to the longitudinal direction of the slit nozzle, the cleaning liquid discharged from the first nozzle and the second nozzle were discharged from the second nozzle. Collision with the cleaning liquid can be prevented.

  According to the second aspect of the present invention, the lower surface cleaning member can be sufficiently cleaned even when the cleaning liquid discharged from the first nozzle and the second nozzle does not sufficiently reach the lower surface cleaning member.

  According to invention of Claim 3, it becomes possible to remove the washing | cleaning liquid adhering to the lower end part of a nozzle with gas.

  According to the fourth aspect of the present invention, the cleaning liquid adhering to the lower end portion of the nozzle can be more sufficiently removed by the slit-like gas.

  According to the fifth aspect of the present invention, when the lower surface cleaning member, the right side surface cleaning member, and the left side surface cleaning member are cleaned with the cleaning liquid at the standby position, it is possible to effectively prevent the cleaning liquid from splashing outside. It becomes.

  According to the sixth aspect of the present invention, the slit nozzle can be sufficiently cleaned with the brush, and the life can be extended.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view of a coating apparatus to which a nozzle cleaning apparatus according to the present invention is applied, and FIG. 2 is a side view thereof. In FIG. 1, the pre-dispensing mechanism 2 and the nozzle cleaning device 6 are not shown. In FIG. 2, the carriage 4 and the like are not shown.

  This coating apparatus is for applying, for example, a resist containing a pigment called a color resist to a rectangular glass substrate (hereinafter referred to as “substrate”) W for a liquid crystal panel.

  The coating apparatus includes a stage 3 for holding the substrate W. The stage 3 is made of stone having a rectangular parallelepiped shape, and the upper surface thereof is a horizontal surface, which serves as a holding surface 30 for the substrate W. A large number of vacuum suction ports (not shown) are formed on the holding surface 30 in a distributed manner, and the substrate W is sucked and held in the coating apparatus. In addition, as schematically shown in FIG. 1, the holding surface 30 is provided with a plurality of lift pins 39 that can be moved up and down by driving means (not shown) at appropriate intervals. The lift pins 39 support the substrate W from below and lift it upward from the surface of the stage 3 when the substrate W is loaded and unloaded.

  Above the stage 3, a carriage 4 is provided that extends substantially horizontally from both sides of the stage 3. The carriage 4 includes a nozzle support portion 40 for supporting the slit nozzle 41 and a pair of left and right lifting mechanisms 43 for supporting both ends of the nozzle support portion 40. In addition, a pair of traveling rails 31 extending in parallel to the substantially horizontal direction are disposed at both ends of the stage 3. These traveling rails 31 guide the both ends of the carriage 4 to reciprocate the carriage 4 in the X direction shown in FIG.

  A pair of AC coreless linear motors (hereinafter simply referred to as “linear motors”) each provided with a stator (stator) 50a and a mover 50b along the edges on both sides of the stage 3 are provided on both sides of the stage 3 and the carriage 4. Abbreviated.) 50 is fixed. A pair of linear encoders 52 each having a scale portion and a detector are fixed to both sides of the stage 3 and the carriage 4. The linear encoder 52 detects the position of the carriage 4.

  As shown in FIG. 2, a pre-dispensing mechanism 2 is disposed on the side of the holding surface 30 in the stage 3. The pre-dispensing mechanism 2 includes a pre-dispensing roller 22 in which a part thereof is immersed in the cleaning liquid stored in the storage tank 21 and a doctor blade 23. The pre-dispensing roller 22 and the doctor blade 23 have a length equal to or greater than that of the slit nozzle 41 in the Y direction. The pre-dispensing roller 22 is rotated by driving a motor (not shown).

  In this coating apparatus, before performing the processing operation, a small amount of resist is discharged from the slit nozzle 41 moved above the pre-dispensing roller 22, thereby removing the resist containing cleaning liquid in the nozzle cleaning process described later. The process of removing from 41 is performed.

  As shown in FIG. 2, the nozzle cleaning device 6 according to the present invention is disposed on the side of the holding surface 30 in the stage 3. The nozzle cleaning device 6 includes a cleaning block 61 and a standby pod 62. The configuration of the nozzle cleaning device 6 will be described later.

  FIG. 3 is an explanatory view schematically showing the resist supply operation by the slit nozzle 41, and FIG. 4 is a front view showing the slit nozzle 41 with a part thereof broken.

  The slit nozzle 41 has a slit-like discharge port 44 extending in the longitudinal direction (direction perpendicular to the paper surface in FIG. 3 / left-right direction in FIG. 4). The length of the ejection port 44 in the longitudinal direction is equal to or longer than the length of the short side of the rectangular element formation portion of the substrate W. The resist 45 supplied by the resist supply pipe 46 is supplied to the surface of the substrate W through the slit-like discharge port 44 as shown in FIG.

  A coating operation for coating a resist on the substrate W by the coating apparatus will be described. In a state before the resist coating operation is performed, the slit nozzle 41 is disposed at a position facing the nozzle cleaning device 6 according to the present invention. The state of the slit nozzle 41 and the like at this time will be described in detail later.

  In this state, when the resist coating operation is started, the slit nozzle 41 is moved to the upper part of the pre-dispensing mechanism 2 from the state in which the slit nozzle 41 is waited above the nozzle cleaning device 6, and the pre-dispensing operation is executed.

  Next, after the slit nozzle 41 is moved horizontally above one end of the substrate W, the slit nozzle 41 is disposed at a coating position on the substrate W by a pair of left and right lifting mechanisms. At this time, the distance between the surface of the substrate W and the discharge port 44 of the slit nozzle 41 is a predetermined value suitable for resist application.

  In this state, the resist is discharged from the slit-like discharge port 44 in the slit nozzle 41, and the slit nozzle 41 is moved horizontally along the surface of the substrate W. In this state, as shown in FIG. 3, the resist 45 discharged from the slit-shaped discharge ports 44 in the slit nozzle 41 is applied to the surface of the substrate W in a thin film shape.

  When the slit-like discharge port 44 in the slit nozzle 41 moves to a position facing the other end of the substrate W, the resist nozzle discharge is stopped from the slit-like discharge port 44 in the slit nozzle 41 and the slit nozzle 41 is moved to the nozzle. Move to above the cleaning device 6. Thereafter, a nozzle cleaning step described later is executed.

  Next, the configuration of the nozzle cleaning device 6 according to the present invention will be described. FIG. 5 is a side view showing the nozzle cleaning device 6 according to the present invention together with the slit nozzle 41.

  The nozzle cleaning device 6 reciprocally rotates a bracket 64 movable along a rail 63 disposed in parallel with the slit nozzle 41 described above and a synchronous belt 65 connected to the bracket 64, thereby moving the bracket 64. A motor 66 that reciprocates in parallel with the slit nozzle 41 and the above-described cleaning block 61 disposed above the bracket 64 are provided. The cleaning block 61 is for wiping the vicinity of the slit-like discharge port 44 in the slit nozzle 41. The cleaning block 61 reciprocates between a position indicated by a solid line and a position indicated by a two-dot chain line in FIG.

  Here, a position indicated by a solid line in FIG. 5 is a standby position where a lower surface cleaning brush 82, a right side surface cleaning brush 83, and a left side surface cleaning brush 81 described later are separated from the slit nozzle 41. Further, the position on the right side of this standby position in FIG. 5 is a cleaning area in which the lower end portion of the slit nozzle 41 is cleaned by the lower surface cleaning brush 82, the right side surface cleaning brush 83 and the left side surface cleaning brush 81. A scattering prevention cover 71 is disposed above the cleaning block 61 that has moved to the standby position.

  On the other hand, the standby pod 62 is for preventing the resist in the vicinity of the slit-like discharge port 44 in the slit nozzle 41 from being dried and denatured in a state where no resist is applied. For example, a solvent for dissolving the resist is stored in the standby pod 62. The standby pod 62 is driven by the air cylinder 67, and the upper end opening portion shown by a two-dot chain line in FIG. 5 is opposed to the slit-like discharge port 44 in the slit nozzle 41, and the lowering position shown by a solid line. It can be moved up and down. For this reason, when the standby pod 62 takes the raised position in a state where the slit nozzle 41 is kept waiting above the nozzle cleaning device 6, the discharge port 44 of the slit nozzle 41 is exposed to the space closed by the standby pod 62. Become. At this time, since the space is filled with the atmosphere containing the solvent vapor, the resist in the vicinity of the discharge port 44 is prevented from being dried.

  Next, the configuration of the cleaning block 61 described above will be described. FIG. 6 is a plan view of the cleaning block 61. FIG. 7 is an exploded perspective view showing the cleaning block 61. Further, FIG. 8 is a schematic diagram showing a state in which the slit nozzle 41 is cleaned by the cleaning block 61. In addition, illustration of the partition plate 74 is abbreviate | omitted in FIG.

  The cleaning block 61 includes a pair of scattering prevention plates 73, four inert gas ejection blocks 75 including inert gas ejection slits 77, 78, a partition plate 74, and a support member 79 (see FIG. 8). ) Supported by the lower surface cleaning brush 82, the right side surface cleaning brush 83, and the left side surface cleaning brush 81, and a pair of nozzle blocks 76 that support the first nozzle 87, the second nozzle 84, and the third nozzles 85, 86. Prepare. The cleaning block 61 is supported by a support arm 72, and a drain 96 for recovering cleaning liquid and the like is disposed below the cleaning block 61. The above-described support member 79 is fixed to the support arm 72 via an automatic alignment spring portion 80.

  As shown in FIG. 8, the lower surface cleaning brush 82 is applied to the lower surface of the lower end of the slit nozzle 41, that is, the region where the discharge port 44 shown in FIG. 3 is formed when the cleaning block 61 is arranged in the cleaning region. It is possible to contact. Further, the right side cleaning brush 83 can come into contact with the lower right side surface in the longitudinal direction of the slit nozzle 41 (the traveling direction of the cleaning block 61) when the cleaning block 61 is arranged in the cleaning region. Yes. Furthermore, the left side cleaning brush 81 can come into contact with the left side surface of the lower end portion in the longitudinal direction of the slit nozzle 41 when the cleaning block 61 is arranged in the cleaning region.

  9 and 10 are perspective views of the lower surface cleaning brush 82.

  As the lower surface cleaning brush 82, a linear brush as shown in FIG. 9 may be used, or an embedded brush as shown in FIG. 10 may be used. Generally, when the resist attached to the slit nozzle 41 is difficult to remove, it is preferable to use a linear brush shown in FIG. Moreover, when importance is attached to durability, it is preferable to use the embedded brush shown in FIG. As the material of the brush portion, it is preferable to use a solvent-resistant fluororesin-based material. By using a brush having such a brush portion, it is possible to improve its durability as compared with the case where a wiping member made of a porous material as described in Patent Document 2 is used. . The right side cleaning brush 83 and the left side cleaning brush 81 also have the same configuration as the lower surface cleaning brush 82.

  The first nozzle 87 is disposed at a position facing the right side cleaning brush 83 across the slit nozzle 41 when the cleaning block 61 is disposed in the cleaning region. The second nozzle 84 is disposed at a position facing the left side cleaning brush 81 with the slit nozzle 41 interposed therebetween when the cleaning block 61 is disposed in the cleaning region. Further, the third nozzles 85 and 86 are arranged at positions facing the lower surface cleaning brush 82.

  FIG. 11 is a front view showing a discharge state of the cleaning liquid by the first nozzle 87, the second nozzle 84, and the third nozzles 85, 86, and FIG. 12 is a plan view thereof.

  The first nozzle 87 discharges the cleaning liquid toward the right cleaning brush 83 and the lower surface cleaning brush 82. The second nozzle 84 discharges the cleaning liquid toward the left cleaning brush 81 and the lower surface cleaning brush 82. The third nozzles 85 and 86 discharge the cleaning liquid toward the lower surface cleaning brush 82. As shown in FIG. 12, the first, second, and third cleaning nozzles 87, 84, 85, and 86 are arranged in a staggered manner. Therefore, it is possible to effectively prevent the cleaning liquid discharged from the first, second, and third cleaning nozzles 87, 84, 85, and 86 from colliding with each other and scattering around.

  As shown in FIG. 8, when the cleaning block 61 is disposed in the cleaning region, the lower surface cleaning brush 82 faces the lower surface of the lower end of the slit nozzle 41 and the right side surface cleaning brush 83 faces the longitudinal direction of the slit nozzle 41. The lower right side surface and the left side surface cleaning brush 81 are disposed at positions where they can abut on the lower end left side surface in the longitudinal direction of the slit nozzle 41, respectively. Therefore, the cleaning liquid discharged from the first, second, and third cleaning nozzles 87, 84, 85, 86 is also supplied to the lower end portion of the slit nozzle 41.

  As shown in FIG. 6, the first, second, and third cleaning nozzles 87, 84, 85, 86 are connected to the cleaning liquid supply unit 100. The cleaning liquid supply unit 100 receives a command from the control unit of the nozzle cleaning device, and controls the operation of supplying the cleaning liquid to the first, second, and third cleaning nozzles 87, 84, 85, 86. Normally, the cleaning liquid is supplied from the cleaning liquid control unit 100 to the first, second, and third cleaning nozzles 87, 84, 85, and 86. However, when the degree of contamination of the slit nozzle 41 is high, the cleaning liquid You may make it supply the mixed fluid with which the inert gas was mixed.

  Inert gas ejection slits 77 and 78 formed in the inert gas ejection block 75 are supplied from the first, second and third cleaning nozzles 87, 84, 85 and 86 and remain at the lower end of the slit nozzle 41. The treatment liquid to be blown is blown off with nitrogen gas. When the cleaning block 61 moves in the Y + direction shown in FIG. 6, the inert gas jets located behind the inert gas jet slits 77 and 78 in the moving direction of the right side brush 83 and the left side brush 81. Only the slits 77 and 78 (Y-side inert gas ejection slits 77 and 78 in FIG. 6) are used, and when the cleaning block 61 moves in the Y-direction shown in FIG. 77 and 78, the inert gas ejection slits 77 and 78 located behind the right side brush 83 and the left side brush 81 in the moving direction (inactive gas ejection slits 77 and 78 on the Y + side in FIG. 6). Only) is used.

  In the above-described embodiment, the inert gas ejection slits 77 and 78 formed in the inert gas ejection block 75 are shaped so that the longitudinal direction thereof is perpendicular to the moving direction of the cleaning block 61. ing. However, as shown in FIGS. 13 and 14, inert gas ejection slits 91 and 92 having the same inclination angle θ in the side view and the inclination angle θ of the edge of the slit nozzle 41 may be used. In this case, the liquid draining action in the vicinity of the edge of the slit nozzle 41 can be improved.

  Further, as shown in FIG. 15, in addition to the above-described inert gas ejection slits 77, 78, 91, and 92, the inert gas ejection for ejecting an inert gas toward the lower surface other than the tip portion of the slit nozzle 41. A nozzle 93 may be provided.

  Next, the cleaning operation of the slit nozzle 41 by the nozzle cleaning device having the above-described configuration will be described.

  When the cleaning operation of the slit nozzle 41 is started, the cleaning block 61 is disposed at a standby position indicated by a solid line in FIG. Further, at this time, the slit nozzle 41 is disposed at a position where the lower end thereof is separated from the lower surface cleaning brush 82, the right side cleaning brush 83, and the left side cleaning brush 81 by the action of the lifting mechanism 43 shown in FIG. Yes.

  In this state, the cleaning liquid is discharged from the first, second, and third cleaning nozzles 87, 84, 85, 86 under the control of the cleaning liquid supply unit 100. Thereafter, the slit nozzle 41 is lowered by the action of the elevating mechanism 43, and the lower end portion of the slit nozzle 41 is brought into contact with the lower surface cleaning brush 82, the right side cleaning brush 83, and the left side cleaning brush 81. In this state, the cleaning block 61 is moved in the right direction shown in FIG. 5 (for example, the Y + direction in FIG. 6). In this state, the lower end portion of the slit nozzle 41 includes the cleaning liquid discharged from the first, second, and third cleaning nozzles 87, 84, 85, and 86, the lower surface cleaning brush 82, the right side cleaning brush 83, and the left side cleaning brush. By the action of 81, it is sufficiently washed.

  When the cleaning block 61 moves to the end of the cleaning area, the movement of the cleaning block 61 is stopped. Then, the slit nozzle 41 is raised by the action of the elevating mechanism 43 to separate the lower end portion of the slit nozzle 41 from the lower surface cleaning brush 82, the right side surface cleaning brush 83, and the left side surface cleaning brush 81. Thereafter, the cleaning block 61 is moved in the opposite direction (Y-direction in FIG. 6). As a result, the final cleaning of the lower end portion of the slit nozzle 41 is performed by the cleaning liquid discharged from the first, second, and third cleaning nozzles 87, 84, 85, 86.

  At this time, the inert gas is ejected from the inert gas ejection slits 77 and 78 located behind the right side brush 83 and the left side brush 81 in the movement direction of the inert gas ejection slits 77 and 78. . Thereby, the cleaning liquid remaining in the slit nozzle 41 is blown off and removed from the slit nozzle 41.

  When the cleaning block 61 returns to the standby position indicated by the solid line in FIG. 5, the cleaning liquid is discharged from the first, second, and third cleaning nozzles 87, 84, 85, and 86, and the inert gas ejection slits 77 and 78. Stop the injection of inert gas from

  If the cleaning operation of the slit nozzle 41 is completed as described above, cleaning of the lower surface cleaning brush 82, the right side surface cleaning brush 83, and the left side surface cleaning brush 81 is performed next.

  In the state where the cleaning block 61 has returned to the standby position indicated by the solid line in FIG. 5, as shown in FIGS. 5 and 16, a scattering prevention cover 71 is disposed above the cleaning block 61. In this state, the cleaning liquid is discharged from the first, second, and third cleaning nozzles 87, 84, 85, and 86 again. Accordingly, as shown in FIGS. 11 and 12, the lower surface cleaning brush 82, the right side surface cleaning brush 83, and the left side surface cleaning brush 81 are discharged from the first, second, and third cleaning nozzles 87, 84, 85, 86. It is cleaned with a cleaning solution.

  In the embodiment described above, the cleaning liquid discharged from the first, second, and third cleaning nozzles 87, 84, 85, and 86, the lower surface cleaning brush 82, and the right side surface cleaning when the cleaning block 61 moves from the standby position. Cleaning is performed using the brush 83 and the left side cleaning brush 81, and only the cleaning liquid discharged from the first, second and third cleaning nozzles 87, 84, 85 and 86 when the cleaning block 61 returns to the standby position. The used cleaning is performed. However, in order to more reliably clean the slit nozzle 41, the cleaning liquid discharged from the first, second, and third cleaning nozzles 87, 84, 85, and 86 and the lower surface cleaning are performed while the cleaning block 61 is reciprocated a plurality of times. After cleaning using the brush 82, the right side cleaning brush 83 and the left side cleaning brush 81, only the cleaning liquid discharged from the first, second and third cleaning nozzles 87, 84, 85 and 86 is used. Then, finish cleaning may be executed.

It is a perspective view of the coating device to which the nozzle cleaning apparatus concerning this invention is applied. It is a side view of the coating device to which the nozzle cleaning device concerning this invention is applied. 5 is an explanatory diagram schematically showing a resist supply operation by a slit nozzle. FIG. FIG. 4 is a front view showing a slit nozzle 41 with a part thereof broken. 2 is a side view showing the nozzle cleaning device 6 according to the present invention together with a slit nozzle 41. FIG. 3 is a plan view of a cleaning block 61. FIG. FIG. 4 is an exploded perspective view showing a cleaning block 61. It is a schematic diagram which shows the state which wash | cleans the slit nozzle 41 with the washing | cleaning block 61. FIG. 5 is a perspective view of a lower surface cleaning brush 82. FIG. 5 is a perspective view of a lower surface cleaning brush 82. FIG. FIG. 7 is a front view showing a cleaning liquid ejection state by a first nozzle 87, a second nozzle 84, and third nozzles 85 and 86. FIG. 5 is a plan view showing a cleaning liquid discharge state by a first nozzle 87, a second nozzle 84, and third nozzles 85 and 86. It is a perspective view of the inert gas ejection block which concerns on other embodiment. 6 is an explanatory diagram showing a relationship between an inclination angle θ of an edge of the slit nozzle 41 and inert gas ejection slits 91 and 92. FIG. 3 is a side view showing an inert gas ejection nozzle 93 together with a slit nozzle 41. FIG. It is explanatory drawing which shows the scattering prevention cover 71 arrange | positioned above the washing | cleaning block 61. FIG.

Explanation of symbols

6 Nozzle Cleaning Device 41 Slit Nozzle 44 Discharge Port 61 Cleaning Block 62 Standby Pod 71 Splash Prevention Cover 73 Splash Prevention Plate 74 Partition Plate 79 Support Member 80 Automatic Centering Spring Part 81 Left Side Cleaning Brush 82 Lower Side Cleaning Brush 83 Right Side Cleaning Brush 84 Second nozzle 85 Third nozzle 86 Third nozzle 87 First nozzle 96 Drain 100 Cleaning liquid supply unit W substrate

Claims (6)

A nozzle cleaning device for cleaning a processing liquid supply nozzle that discharges a processing liquid from a slit-like discharge port formed at the lower end of a long slit nozzle,
A lower surface cleaning member that can contact the lower surface of the lower end of the slit nozzle, a right side cleaning member that can contact the lower right surface of the slit nozzle in the longitudinal direction of the slit nozzle, and the longitudinal direction of the slit nozzle A cleaning block having a left side cleaning member disposed at a position different from the right side cleaning member and capable of coming into contact with the left side of the lower end portion in the longitudinal direction of the slit nozzle,
A cleaning area for moving the cleaning block while cleaning the lower end portion of the slit nozzle with the lower surface cleaning member, the right side surface cleaning member, and the left side surface cleaning member, and the lower surface cleaning member, the right side surface cleaning member, and the left side surface cleaning. A moving mechanism for reciprocally moving the member between a standby position separated from the slit nozzle;
When the cleaning block is disposed in the cleaning region, the cleaning block is disposed at a position facing the right side cleaning member across the slit nozzle in the cleaning block, and the cleaning liquid can be discharged toward the right side cleaning member. A first nozzle;
When the cleaning block is disposed in the cleaning region, the cleaning block is disposed at a position facing the left side cleaning member across the slit nozzle in the cleaning block, and the cleaning liquid can be discharged toward the left side cleaning member. A second nozzle;
A cleaning liquid supply unit configured to supply a cleaning liquid to the first nozzle and the second nozzle when the cleaning block is moving in the cleaning region and when the cleaning block is disposed at the standby position;
A nozzle cleaning device comprising: The nozzle cleaning device according to claim 1,
A third nozzle capable of discharging a cleaning liquid toward the lower surface cleaning member;
The cleaning liquid supply unit is a nozzle cleaning apparatus that supplies the cleaning liquid to the third nozzle when the cleaning block is moving in the cleaning area and when the cleaning block is disposed at the standby position. In the nozzle cleaning device according to claim 1 or 2,
A right-side gas jetting unit that is arranged on the rear side in the moving direction of the right-side cleaning member in the cleaning block and jets gas to the right side of the lower end of the slit nozzle washed by the right-side cleaning member;
A gas jetting means for left side that is arranged on the rear side in the moving direction of the left side cleaning member in the cleaning block and jets gas to the left side of the lower end of the slit nozzle cleaned by the left side cleaning member;
A nozzle cleaning device further comprising: The nozzle cleaning device according to claim 3,
The right side gas jetting means and the left side gas jetting means each have a slit-like gas jetting hole for jetting gas toward the lower end of the slit nozzle. In the nozzle cleaning apparatus in any one of Claims 1 thru | or 4,
A nozzle cleaning apparatus, further comprising: a cleaning liquid splash prevention cover that covers an upper portion of the cleaning block when the cleaning block moves to the standby position. The nozzle cleaning device according to any one of claims 1 to 5,
The lower surface cleaning member, the right side surface cleaning member, and the left side surface cleaning member are nozzle cleaning devices that are brushes.