JP3823074B2 - Development device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a developing device that develops a substrate for a color filter in, for example, a liquid crystal color display.
[0002]
[Prior art]
In a color filter in a liquid crystal color display, it is necessary to form a colored pattern of R, G, B on a glass substrate. Such a colored pattern is formed by, for example, a photolithography method. As an example, a colored resin made of a photosensitive resin is used for each of R, G, and B, and a pattern is formed by repeating the coating-exposure-development processing steps for R, G, and B three times.
[0003]
By the way, in the above development process, a negative type development process is performed in which a pattern is formed by removing an unexposed portion of the photosensitive resin with a developer. For example, it is required to eject the developer at a high pressure against the substrate. For this reason, as a method for supplying the developer onto the substrate, it is conceivable to use a shower method in which the developer pressurized by a pump or the like is sprayed and sprayed onto the substrate.
[0004]
[Problems to be solved by the invention]
However, when the developer is sprayed at a high pressure using the shower method, there is a problem that the developer drifts in the atmosphere and causes mist. On the other hand, when the developer is sprayed at a low pressure to suppress the generation of mist, there is a problem that a sufficient impact force cannot be applied to the substrate, causing a pattern defect or a development defect. One of the causes of such pattern defects and development defects is that the developer is not discharged uniformly over the entire substrate and is not developed uniformly.
[0005]
The present invention has been made to solve the above-described problems, and can suppress the generation of mist while giving a sufficient impact force to the substrate with the developer, and can uniformly develop the developer on the entire surface of the substrate. It is an object of the present invention to provide a developing device capable of discharging the toner.
[0006]
[Means for Solving the Problems]
In order to solve this problem, a developing device according to the present invention draws a continuous rotating shape in the form of a curtain on a holding rotation unit that rotates while holding a rectangular substrate, and a substrate surface rotated by the holding rotation unit. And a plurality of nozzles that discharge the developer so as to spread in a conical shape, and the developer discharged from the plurality of nozzles is arranged in a straight line so as to overlap each other between adjacent nozzles. The range in which the developer is discharged from the plurality of nozzles is on the track of the corner of the substrate rotating at one end and on the track of the center of one side of the substrate rotating at the other end.及beauty, wherein the one end and the other end, characterized in that in a position straddling the center of the rotating substrate.
[0007]
In the present invention, since the developer is discharged so as to draw a continuous flow in a curtain shape on the surface of the rectangular substrate, the developer does not drift in the atmosphere, and mist is generated. Can be suppressed. Further, since the developer is discharged while rotating the substrate in addition to such ejection, a sufficient impact force can be applied to the substrate by the developer. Further, in the present invention, each nozzle discharges the developer so as to spread in a conical shape, and the developer discharged from these nozzles is arranged in a straight line so as to overlap each other between adjacent nozzles. The liquid can give an average and stronger impact force to the substrate. Further, in the present invention, the range is on the straight line developer from a plurality of nozzles are ejected, one end Oyobi in orbit corners of the substrate to be rotated, the orbit of the central portion of one side of the substrate to which the other end is rotated in及beauty, the one end and the other end, since as a position straddling the center of the rotating substrate, can be discharged uniformly developer entire surface of the substrate of the rectangle rotated, the developer Waste can be eliminated. For example, when the form of the nozzle is to supply liquid from corner to corner, the liquid discharged to the area without the substrate becomes mist as it is, but according to the present invention, generation of such mist is suppressed as much as possible. be able to.
In one embodiment of the present invention, the rectangular substrate is a rectangle having a long side and a short side perpendicular to each other, and the range on the straight line where the developer is discharged from the plurality of nozzles is rotated at one end. It extends on the track of the corner of the substrate and the track on the substantially central portion of the long side of the substrate where the other end rotates.
[0008]
One aspect of the present invention is a high-pressure cleaning unit that jets a cleaning liquid at a high pressure so as to draw a continuous flow shape in a curtain shape on a substrate surface held by the holding and rotating unit and spread in a conical shape. Is further provided. By ejecting the cleaning liquid in this manner, residues on the substrate can be efficiently removed by continuous processing.
[0009]
In one embodiment of the present invention, the plurality of nozzles discharge the developer at a discharge pressure of 1.5 to 2.5 (kg / cm · cm). Since the discharge pressure of the developer is 1.5 to 2.5 (kg / cm · cm), sufficient development can be performed as necessary. That is, when it is smaller than 1.5 (kg / cm · cm), a sufficient impact force cannot be given to the substrate by the developer, and when it is larger than 2.5 (kg / cm · cm). Has more mist and more impact than necessary.
[0010]
In one embodiment of the present invention, the holding and rotating means rotates the substrate at a speed of 200 to 300 (rpm). Since the substrate is rotated at a speed of 200 to 300 (rpm), sufficient development can be performed if necessary. That is, when it is smaller than 200 (rpm), a sufficient impact force cannot be given to the substrate by the developer, and when it is larger than 300 (rpm), the mist increases and the impact is more than necessary. It becomes power.
[0011]
The developing method according to the present invention is a developing method in which a developer is discharged onto a substrate while rotating a rectangular substrate. The developing method spreads in a conical shape so as to draw a continuous flow shape on a substrate surface. In this way, the developer is discharged by a plurality of nozzles arranged in a straight line, and the range in which the developer is discharged is on the track of the corner of the substrate where one end rotates , and the other end is及beauty in orbit of the central portion of one side of the substrate to be rotated, said the one end and the other end, characterized in that in a position straddling the center of the rotating substrate.
In one embodiment of the present invention, the rectangular substrate is a rectangle having a long side and a short side orthogonal to each other, and the range on the straight line where the developer is discharged is a corner portion of the substrate where one end rotates. And the other end extends over a substantially central portion of the long side of the substrate rotating.
[0012]
In one embodiment of the present invention, after the developer is discharged onto the substrate surface, the cleaning liquid is ejected at a high pressure so as to draw a continuous flow shape in a curtain shape and spread in a conical shape. .
[0013]
One embodiment of the present invention is to supply a rinsing liquid to the substrate surface after jetting a cleaning liquid to the substrate surface at a high pressure.
[0014]
In one embodiment of the present invention, after the rinsing liquid is supplied to the substrate surface, the substrate is rotated and shaken and dried.
[0015]
A developing method according to another aspect of the present invention includes a holding rotation unit that rotates while holding a rectangular substrate, and a plurality of support pins that support the substrate held by the holding rotation unit. A step of performing a developing process by continuously supplying a developing solution at a predetermined pressure between at least a central portion and a part of the peripheral edge of the rectangular substrate while the held substrate is rotated; and the holding rotation In a state where the rectangular substrate supported by the means and the plurality of support pins is stationary, the cleaning liquid is continuously applied so as to cover the short direction of the rectangular substrate and to scan in the longitudinal direction of the rectangular substrate. And a cleaning process by supplying the developer at a pressure higher than the pressure for supplying the developer.
[0016]
In one embodiment of the present invention, a region for supporting the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process.
[0017]
In one embodiment of the present invention, a container facing a side of the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0019]
FIG. 1 is a perspective view of a coating / development processing system according to an embodiment of the present invention.
[0020]
As shown in FIG. 1, a loader / unloader unit 2 is provided in front of the coating / development processing system 1 to carry a substrate, for example, a glass substrate G for a color filter, into and out of the coating / development processing system 1. It has been. In this loader / unloader section 2, for example, a cassette mounting table 3 on which a cassette C containing 25 glass substrates G, for example, is aligned and placed at a predetermined position, and a glass substrate G to be processed are taken out from each cassette C. In addition, a loader / unloader 4 is provided for returning the glass substrate G that has been processed in the coating / development processing system 1 to each cassette C. The loader / unloader 4 shown in the drawing moves in the direction of arrangement of the cassette C as the main body 5 travels. The substrate G is returned. Further, on both sides of the tweezers 6, substrate alignment members 7 that perform alignment while holding the four corners of the glass substrate G are provided.
[0021]
In the central part of the coating / development processing system 1, corridor-like transport paths 10, 11 arranged in the longitudinal direction are provided in a straight line via the first transfer section 12. Various processing devices for performing each processing on the glass substrate G are arranged on both sides of the glass substrate G.
[0022]
In the illustrated coating / development processing system 1, for example, two scrubber units 16 for cleaning the glass substrate G by brushing and cleaning with high-pressure jet water are arranged in parallel on one side of the conveyance path 10. . Further, two developing devices 17 are arranged in parallel on the opposite side of the conveyance path 10, and two heating devices 18 are stacked next to each other.
[0023]
A cooling device 20 for cooling is arranged in two stages on one side of the conveyance path 11. Next to these cooling devices 20, two heating devices 22 are stacked in two rows. Further, two coating apparatuses that form a colored resin film made of a photosensitive resin on the surface of the glass substrate G by applying a colored resin made of a photosensitive resin to the glass substrate G on the opposite side across the conveyance path 11 23 are arranged in parallel. Although not shown, the side portions of these coating devices 23 are used for exposing a predetermined fine pattern to a colored resin film made of a photosensitive resin formed on the glass substrate G via the second delivery unit 28. An exposure device or the like is provided. The second delivery unit 28 includes a carry-in / out tweezers 29 for carrying in and out the glass substrate G and a delivery table 30.
[0024]
Each of the above processing apparatuses 15 to 18 and 20 to 23 is disposed on both sides of the transport paths 10 and 11 with the entrance / exit of the glass substrate G facing inward. The first transport device 25 moves on the transport path 10 to transport the glass substrate G between the loader / unloader unit 2, the processing devices 15 to 18 and the first delivery unit 12, and the second transport The apparatus 26 moves on the transfer path 26 in order to transfer the glass substrate G between the first transfer section 12, the second transfer section 28, and the processing apparatuses 20 to 23. Each of the transfer devices 25 and 26 has a pair of upper and lower arms 27 and 27. When accessing each of the processing devices 15 to 18 and 20 to 23, the one arm 27 performs processing from the chamber of each processing device. The glass substrate G that has already been processed is carried out, and the glass substrate G before processing is carried into the chamber by the other arm 27.
[0025]
2 is a front view of the developing device 17, and FIG. 3 is a plan view thereof.
[0026]
As shown in FIGS. 2 and 3, a spin chuck 32 configured to be rotatable by a drive motor 31 and movable up and down is provided at the center of the developing device 17. The upper surface of the spin chuck 32 is configured to suck and hold the glass substrate G in a horizontal state by vacuum suction or the like.
[0027]
A lower container 33 is disposed below the spin chuck 32. An outer cup 34 is disposed so as to surround the outer periphery of the spin chuck 32, and an inner cup 35 is disposed between the lower container 33 and the outer cup 34.
[0028]
The outer cup 34 and the inner cup 35 are connected by a connecting member 36, and the outer cup 34 and the inner cup 35 are moved up and down by a lifting cylinder 38 based on a command from the control unit 37. The upper parts of the outer cup 34 and the inner cup 35 are inclined inward so as to become narrower as they go upward, the diameter of the upper end opening of the outer cup 34 is larger than that of the inner cup 35, and The diameters of these upper end openings are formed such that the glass substrate G can be lowered and accommodated in the cup while keeping the glass substrate G in a horizontal state.
[0029]
The lower container 33 includes an inclined portion 39 that is inclined downward from the center portion toward the outside, and a saucer portion 40 disposed on the outer periphery thereof. A plurality of, for example, four support pins 41 for holding the back surface of the glass substrate G are arranged on the inclined portion 39. The height of the tip of the support pin 41 is a position where the tip of the support pin 41 contacts the back surface of the glass substrate G when the glass substrate G held by the spin chuck 32 is lowered to the lowest position. . In addition, a cylindrical upright wall 42 is provided on the bottom surface of the tray portion 40, and the upright wall 42 is interposed between the outer cup 34 and the inner cup 35. Further, the inclined portion of the inner cup 35 extends beyond the standing wall 42 to the outer periphery of the standing wall 42. Thereby, the fluid flowing through the inclined portion of the inner cup 35 flows into the outer chamber 43 partitioned by the standing wall 42 of the tray portion 40.
[0030]
An exhaust port 44 for exhausting the inside of the cup is provided on the back side of the inclined portion 39 of the lower container 33, and an exhaust pump (not shown) is connected to the exhaust port 44. A drain port 46 is formed in the lower part of the inner chamber 45 partitioned by the standing wall 42 of the tray part 40, and a drain port 47 is formed in the lower part of the outer chamber 43. A regeneration processing mechanism 49 that regenerates the used developer is connected to the drain port 46 via a recovery pipe 48. The regeneration processing mechanism 49 includes a gas-liquid separation mechanism 50 that performs gas-liquid separation and an impurity removal mechanism 51 that removes impurities in the used developer, and is connected to the developer storage tank 52. The drain port 47 is connected to a collection tank (not shown).
[0031]
A developer discharge mechanism 53 for discharging developer to the surface of the glass substrate G is disposed on one side of the upper portion of the cup, and a cleaning solution is sprayed to the surface of the glass substrate G at a high pressure on the other side. A rinse liquid supply mechanism 55 for supplying a rinse liquid to the high pressure cleaning mechanism 54 and the surface of the glass substrate G is disposed. Also, transport rails 56 and 57 are provided in front of and behind the upper portion of the cup. Conveying motors 58 and 59 are attached to the developer discharge mechanism 53 and the high-pressure washing mechanism 54, respectively, and the developer discharging mechanism 53 and the high-pressure washing mechanism are driven by driving the conveyance motors 58 and 59 under the control of the control unit 37. 54 is conveyed along the conveying rails 56 and 57 to the upper part in the cup.
[0032]
The developer is supplied from the developer storage tank 52 to the developer discharge mechanism 53 via the pump 62 under the control of the control unit 37. A heating device 63 for heating the developer is interposed between the developer discharge mechanism 53 and the pump 62. For example, when the atmosphere is 23 (° C.), the heating device 63 heats the developer to 25 to 27 (° C.). Thereby, the developing speed can be improved. The cleaning liquid is supplied from the cleaning liquid tank 65 to the high-pressure cleaning mechanism 54 via the pump 64 under the control of the control unit 37. Similarly, the rinsing liquid is supplied from the rinsing liquid tank 67 to the rinsing liquid supply mechanism 55 via the pump 66 under the control of the control unit 37.
[0033]
4A and 4B are explanatory views of the developer discharge mechanism 53, wherein FIG. 4A is a front view and FIG. 4B is a conceptual plan view.
[0034]
As shown in FIG. 4, in the developer discharge mechanism 53, a plurality of, for example, about 5 to 7 spray nozzles 69 are attached to a holding rod 68 arranged in the horizontal direction. As shown in FIG. 5, each spray nozzle 69 hits an inclined wall surface 71 provided on the opposing surface, and the developer discharged horizontally from the discharge port 70 draws a continuous flow shape in a curtain shape, In addition, the developer is discharged so as to spread in a conical shape. Further, the developer discharged from the spray nozzles 69 overlaps between the adjacent spray nozzles 69, and the range in which the developer is discharged extends to almost the corner (1) of the glass substrate G. The space between the spray nozzles 69, 69 is provided so that the other reaches almost the center (2) of the long side of the glass substrate G. With such a configuration of the spray nozzle 69, the developer can be uniformly ejected over the entire surface of the rotated substrate, so that development failure can be prevented and waste of the developer can be prevented.
[0035]
Each spray nozzle 69 discharges the developer at a discharge pressure of 1.5 to 2.5 (kg / cm · cm), more preferably 2.0 (kg / cm · cm). For example, when the discharge pressure of the spray nozzle is 0.8 (kg / cm · cm), the surface of the glass substrate G that could not be peeled off after 30 seconds is 2.0 (kg / cm · cm). By doing so, the entire surface could be peeled off within this time. Moreover, the space | interval h of each spray nozzle 69 and the glass substrate G is 50-100 (mm), More preferably, it is the range of 75-100 (mm). With such a setting, the developing speed can be increased. Furthermore, at the time of development, the developer discharge mechanism 53 stops at substantially the center of the glass substrate G, and the glass substrate G held by the spin chuck 32 is rotated at a speed of 200 to 300 (rpm). Thereby, sufficient impact force can be given to the glass substrate G by the developer.
[0036]
6A and 6B are explanatory views of the high-pressure cleaning mechanism 54, where FIG. 6A is a front view and FIG. 6B is a planar conceptual diagram.
[0037]
As shown in FIG. 6, in the high-pressure cleaning mechanism 54, a plurality of, for example, about 5 to 7 high-pressure cleaning nozzles 73 are attached to the holding bars 72 arranged in the horizontal direction. Each of the high pressure cleaning nozzles 73 spreads in a conical shape and discharges the cleaning liquid so that the cleaning liquid discharged from the high pressure cleaning nozzle 73 overlaps between the adjacent high pressure cleaning nozzles 73.
[0038]
The cleaning liquid is discharged from the high-pressure spray nozzle 73 at a discharge pressure of 5 (kg / cm · cm), for example. Thereby, the residue on the glass substrate G after development can be sufficiently removed. At the time of cleaning, the glass substrate G held by the spin chuck 32 is in a stationary state, and the high-pressure cleaning mechanism 54 is scanned in the longitudinal direction of the glass substrate G. Thereby, the high-pressure washing mechanism 54 can be made short.
[0039]
FIG. 7 is an explanatory view of the rinsing liquid supply mechanism 55, wherein (a) is a front view and (b) is a planar conceptual diagram.
[0040]
As shown in FIG. 7, in the rinse liquid supply mechanism 55, the rinse liquid supply nozzle 75 attached to the tip of the arm 74 is held by the spin chuck 32 by rotating the arm 74 by a rotation mechanism (not shown). The glass substrate G is positioned substantially at the center. During the rinsing process, the glass substrate G held by the spin chuck 32 is rotated at about 200 to 300 (rpm), and the rinsing liquid supply nozzle 75 is in a stationary state almost at the center of the glass substrate G.
[0041]
Next, the operation will be described.
[0042]
FIG. 8 shows a processing flow in the developing device 17.
[0043]
As shown in FIG. 9, the glass substrate G carried into the developing device 17 and held by the spin chuck 32 is lowered to a position where it does not contact the support pins 41, and the outer cup 34 and the inner cup 35 reach the highest position. Then, the developer discharge mechanism 53 is conveyed to almost the center of the glass substrate G and stops. Then, the glass substrate G held by the spin chuck 32 is rotated, and the developer is discharged from the developer discharge mechanism 53 to the glass substrate G (step 801). The developer splashed from the outer periphery of the glass substrate G hits the inside of the inner cup 35 and is collected from the drain port 46 and reused.
[0044]
Next, as shown in FIG. 10, the glass substrate G held by the spin chuck 32 is lowered to a position where it abuts on the support pins 41, and the outer cup 34 and the inner cup 35 are lowered to the lowest position. Then, the glass substrate G held by the spin chuck 32 is brought into a stationary state, the high-pressure cleaning mechanism 54 is scanned in the longitudinal direction of the glass substrate G, and the cleaning liquid is discharged from the high-pressure cleaning mechanism 54 to the glass substrate G. (Step 802). The cleaning liquid splashed from the outer periphery of the glass substrate G passes between the inner cup 35 and the outer cup 34 and is discarded from the drain port 47. Further, since the glass substrate G is supported from the back surface by the support pins 41 during the high-pressure cleaning, the glass substrate G is not deformed.
[0045]
Next, as shown in FIG. 11, the glass substrate G held by the spin chuck 32 is raised to a position where it does not contact the support pins 41, and the outer cup 34 and the inner cup 35 are lowered to the lowest position. Then, the rinsing liquid supply mechanism 55 is transported to almost the center of the glass substrate G. Then, the glass substrate G held by the spin chuck 32 is rotated, and the rinse liquid is supplied to the glass substrate G from the rinse liquid supply mechanism 55 (step 803). The rinsing liquid splashing from the outer periphery of the glass substrate G passes between the inner cup 35 and the outer cup 34 and is discarded from the drain port 47.
[0046]
Finally, the rinsing liquid supply mechanism 55 is transported out of the cup from the state of FIG. 11, and the glass substrate G held by the spin chuck 32 is rotated at a high speed for drying off (step 804).
[0047]
As described above, according to this embodiment, since the developing solution is discharged so as to draw a continuous flow shape on the glass substrate G in a curtain shape, the developing solution seems to float in the atmosphere in a mist form. There is nothing that can be done and the occurrence of mist can be suppressed. At that time, since the developer is discharged while rotating the glass substrate G, a sufficient impact force can be applied to the glass substrate G by the developer, and development defects, residues on the surface of the glass substrate G, etc. No longer remains.
[0048]
Further, the spray nozzle 69 of the present embodiment is such that the developer discharge range is such that one extends substantially at the corners of the substrate G and the other extends approximately at the center of one side of the substrate G. The developer can be uniformly discharged over the entire surface of the rotated substrate, so that the development failure can be prevented and the waste of the developer can be prevented. This also makes it possible to suppress the generation of mist as much as possible.
[0049]
The present invention is not limited to the embodiment described above.
[0050]
For example, the present invention is naturally applicable not only to the glass substrate G for color filters but also to other LCD substrates and other substrates that require development.
[0051]
【The invention's effect】
As described above, according to the present invention, generation of mist can be suppressed and uniform development can be performed while applying a sufficient impact force to the substrate by the developer.
[Brief description of the drawings]
FIG. 1 is a perspective view of a coating / developing system according to an embodiment of the present invention.
FIG. 2 is a front view of the developing device shown in FIG.
FIG. 3 is a plan view of the developing device shown in FIG.
4 is an explanatory diagram of the developer discharge mechanism shown in FIGS. 2 and 3. FIG.
FIG. 5 is a cross-sectional view of the spray nozzle shown in FIG.
6 is an explanatory diagram of the high-pressure cleaning mechanism shown in FIGS. 2 and 3. FIG.
7 is an explanatory diagram of the rinsing liquid supply mechanism shown in FIGS. 2 and 3. FIG.
FIG. 8 is a processing flow in the developing device in the present embodiment.
FIG. 9 is a state diagram of the developing device corresponding to step 801 shown in FIG.
FIG. 10 is a state diagram of the developing device corresponding to step 802 shown in FIG.
11 is a state diagram of the developing device corresponding to step 803 shown in FIG.
[Explanation of symbols]
17 Developing Device 31 Drive Motor 32 Spin Chuck 53 Developer Discharge Mechanism 54 High Pressure Washing Mechanism 55 Rinse Solution Supply Mechanism 63 Heating Device 69 Spray Nozzle G Glass Substrate G

Claims (10)

Holding and rotating means for rotating while holding the rectangular substrate;
A plurality of nozzles for discharging a developing solution so as to draw a continuous flow shape in a curtain shape and spread in a conical shape on the substrate surface rotated by the holding and rotating means,
The developer discharged from the plurality of nozzles is arranged in a straight line so as to overlap each other between adjacent nozzles,
Range on the line to be discharged from the developing solution wherein the plurality of nozzles has an end Oyobi in orbit corners of the rotating substrate,及in orbit of the central portion of one side of the substrate to which the other end is rotated And
The developing device according to claim 1, wherein the one end and the other end are located across the center of the rotating substrate . The developing device according to claim 1,
The rectangular substrate is a rectangle having a long side and a short side perpendicular to each other,
The range in which the developer is discharged from the plurality of nozzles is on the track of the corner portion of the substrate rotating at one end and on the track of the substantially central portion of the long side of the substrate rotating at the other end. A developing device characterized by that. The developing device according to claim 1 or 2,
It further comprises high-pressure cleaning means for jetting a cleaning liquid at a high pressure so as to draw a continuous flow shape in a curtain shape on the substrate surface held by the holding rotation means and spread in a conical shape. Developing device. The developing device according to any one of claims 1 to 3, wherein
The developing device, wherein the plurality of nozzles discharge the developer at a discharge pressure of 1.5 to 2.5 (kg / cm · cm). The developing device according to any one of claims 1 to 4 ,
The developing device, wherein the holding and rotating means rotates the substrate at a speed of 200 to 300 (rpm). A developing method for discharging a developer onto a substrate while rotating a rectangular substrate,
With respect to the substrate surface, so as to draw a flow type continuous curtain-like, and discharging a developer by a plurality of nozzles arranged in a straight line so as to spread conically, the one straight to the developing liquid is discharged range in line is one end Oyobi in orbit corners of the rotating substrate,及beauty in orbit of the central portion of one side of the substrate to which the other end is rotated, said one end and said other end, said rotating A development method characterized by being in a position straddling the center of the substrate . The developing method according to claim 6, wherein
The rectangular substrate is a rectangle having a long side and a short side orthogonal to each other,
The range on the straight line to which the developer is discharged extends on the track of the corner of the substrate rotating at one end and on the track of the central portion of the long side of the substrate rotating at the other end. Development method characterized. The developing method according to claim 6 or 7, wherein
A developing method characterized in that after the developer is discharged onto the surface of the substrate, the cleaning solution is ejected at a high pressure so as to draw a continuous flow in a curtain shape and spread in a conical shape. The development method according to claim 8, wherein
A developing method comprising: supplying a rinsing liquid to the substrate surface after spraying a cleaning liquid onto the substrate surface at a high pressure. The development method according to claim 9, wherein
A developing method comprising: supplying a rinsing liquid to the surface of the substrate;

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