CN111190330B - DES (data encryption standard) line developing device and developing method - Google Patents
DES (data encryption standard) line developing device and developing method Download PDFInfo
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- CN111190330B CN111190330B CN202010044733.0A CN202010044733A CN111190330B CN 111190330 B CN111190330 B CN 111190330B CN 202010044733 A CN202010044733 A CN 202010044733A CN 111190330 B CN111190330 B CN 111190330B
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- developing
- developing chamber
- nozzles
- printed circuit
- nozzle
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/068—Apparatus for etching printed circuits
Abstract
The invention discloses a DES line developing device, which comprises a first developing chamber, a second developing chamber and a third developing chamber which are arranged in series, wherein the first developing chamber is provided with a plurality of rows of fan-shaped first nozzles, and the mounting heights of two adjacent rows of first nozzles are different; a plurality of rows of conical second nozzles are arranged in the second developing chamber, and the second nozzles of two adjacent rows are arranged in a staggered manner; a disc is arranged at the top of the third developing chamber, a plurality of cylindrical third nozzles are uniformly arranged on the disc, an exhaust pipe is arranged on the side wall of the third developing chamber, and a liquid discharge pipe is arranged at the bottom of the third developing chamber; the first nozzle bottom is provided with the shrouding, has seted up the slit on the shrouding, is provided with a plurality of shower nozzle on the shrouding, and the shower nozzle center is provided with a sprue, and the lateral wall of sprue evenly is connected with a plurality of secondary flow way. The invention can improve the defects of the prior art and improve the contact sufficiency and the contact uniformity of the developing solution and the oil film.
Description
Technical Field
The invention relates to the technical field of printed circuit boards, in particular to a DES (data encryption standard) line developing device and a developing method.
Background
The DES line is a production line of printed circuit boards for performing continuous production of development, etching, and stripping of acid etching of inner or outer layers. In the developing process, the key point for influencing the developing quality is that the sprayed developing solution and an oil film are subjected to full and uniform contact reaction.
Disclosure of Invention
The invention aims to provide a DES line developing device and a DES line developing method, which can overcome the defects of the prior art and improve the contact sufficiency and uniformity of a developing solution and an oil film.
In order to solve the technical problems, the technical scheme adopted by the invention is as follows.
A DES line developing device comprises a first developing chamber, a second developing chamber and a third developing chamber which are arranged in series, wherein the first developing chamber is provided with a plurality of rows of fan-shaped first nozzles, and the mounting heights of two adjacent rows of first nozzles are different; a plurality of rows of conical second nozzles are arranged in the second developing chamber, and the second nozzles of two adjacent rows are arranged in a staggered manner; a disc is arranged at the top of the third developing chamber, a plurality of cylindrical third nozzles are uniformly arranged on the disc, an exhaust pipe is arranged on the side wall of the third developing chamber, and a liquid discharge pipe is arranged at the bottom of the third developing chamber; the nozzle comprises a first nozzle and a second nozzle, wherein a sealing plate is arranged at the bottom of the first nozzle, a slit is formed in the sealing plate, a plurality of spray heads are arranged on the sealing plate, a main flow channel is arranged at the center of each spray head, a plurality of auxiliary flow channels are uniformly connected to the side wall of the main flow channel, the included angle between each auxiliary flow channel and the axis of the main flow channel is 20-45 degrees, a groove is formed in the bottom of each spray head, an adjusting plug is in threaded connection with the inner side of the groove, a plurality of through holes are formed in the adjusting plug in an annular mode, a core column is arranged at the center of the adjusting plug, the core column is located in the main flow channel, and the core column is in clearance fit with the main flow channel.
Preferably, a first buffer groove is arranged at the joint of the auxiliary channel and the main channel, and an included angle between the axis of the outlet of the auxiliary channel and the axis of the outlet of the main channel is 10-20 degrees.
Preferably, the top of the stem is provided with a second buffer groove.
Preferably, a plurality of guide grooves are arranged on the inner side of the second nozzle.
Preferably, the side wall of the third developing chamber is provided with a plurality of exhaust pipes, and the exhaust pipes and the interface of the third developing chamber are arranged in a spiral line shape.
Preferably, a conical filter screen is arranged at the interface of the exhaust pipe and the third developing chamber.
A developing method of the DES line developing device comprises the following steps:
A. the printed circuit substrate enters a first developing chamber, and a first nozzle sprays developing solution to the printed circuit substrate;
B. the printed circuit substrate enters the second developing chamber from the first developing chamber, and the second nozzle sprays developing solution to the printed circuit substrate;
C. the printed circuit substrate enters a third developing chamber from the second developing chamber, the exhaust pipe vacuumizes the third developing chamber, the third nozzle sprays the developing solution to the printed circuit substrate, and the liquid discharge pipe discharges the developing solution dripped from the printed circuit substrate in real time.
Adopt the beneficial effect that above-mentioned technical scheme brought to lie in: the invention uses three-stage tandem developing device to carry out developing treatment. The fan-shaped first nozzle is staggered in height, so that the substrate to be developed is fully contacted with liquid medicine, the conical second nozzle is staggered left and right, the ink in the hole and on the surface expanded can be effectively flushed away, the third nozzle is used for developing in vacuum, the effect of compensating development is achieved, a vacuum method is adopted, the water pool effect is avoided, and the uniformity of development is guaranteed. The shower nozzle of installation can realize the multi-angle and spray on the first nozzle, through rotatory adjusting plug, realizes adjusting the reciprocating of stopper, on the one hand through changing the volume of the cavity that forms between recess and the adjusting plug, realizes going out the adjustment of spraying the state to the through-hole, and on the other hand through changing the relative position of stem and vice runner, realizes the adjustment to vice runner spraying state. The first buffer groove is used for reducing the turbulent flow of the developing solution in the secondary flow passage, and the oblique injection angle of the secondary flow passage is matched with the through hole, so that the rotary diffusion of the developing solution injected by the spray head is realized. The second buffer groove is used for improving the uniformity of diffusion and flow of the developing solution after the developing solution is contacted with the top of the core column. The flow guide groove is used for improving the consistency of the direction of the liquid flow sprayed by the second nozzle. The arrangement mode of the exhaust pipes can improve the discharge efficiency of bubbles on the printed circuit substrate, and the conical filter screen is used for separating and filtering micro liquid drops in air flow.
Drawings
FIG. 1 is a block diagram of one embodiment of the present invention.
FIG. 2 is a block diagram of a first nozzle in accordance with one embodiment of the present invention.
Fig. 3 is a structural view of a head according to an embodiment of the present invention.
FIG. 4 is a block diagram of a second nozzle in accordance with an embodiment of the present invention.
In the figure: 1. a first developing chamber; 2. a second developing chamber; 3. a third developing chamber; 4. a first nozzle; 5. a second nozzle; 6. a disc; 7. a third nozzle; 8. an exhaust pipe; 9. a liquid discharge pipe; 10. closing the plate; 11. a slit; 12. a spray head; 13. a main flow channel; 14. a secondary flow passage; 15. a groove; 16. an adjusting plug; 17. a through hole; 18. a stem; 19. a first buffer tank; 20. a second buffer tank; 21. a diversion trench; 22. a conical filter screen.
Detailed Description
Referring to fig. 1-4, one embodiment of the present invention includes a first developing chamber 1, a second developing chamber 2, and a third developing chamber 3, which are arranged in series, where the first developing chamber 1 is provided with a plurality of rows of fan-shaped first nozzles 4, and the mounting heights of two adjacent rows of first nozzles 4 are different; a plurality of rows of conical second nozzles 5 are arranged in the second developing chamber 2, and the second nozzles 5 of two adjacent rows are arranged in a staggered manner; a disc 6 is arranged at the top of the third developing chamber 3, a plurality of cylindrical third nozzles 7 are uniformly arranged on the disc 6, an exhaust pipe 8 is arranged on the side wall of the third developing chamber 3, and a liquid discharge pipe 9 is arranged at the bottom of the third developing chamber 3; 4 bottoms of first nozzle are provided with shrouding 10, slit 11 has been seted up on the shrouding 10, be provided with a plurality of shower nozzle 12 on the shrouding 10, shower nozzle 12 center is provided with a sprue 13, sprue 13's lateral wall evenly connected with a plurality of runner 14, runner 14 is 30 with sprue 13's axis contained angle, shower nozzle 12 bottom is provided with recess 15, the inboard threaded connection of recess 15 has regulating plug 16, the ring shape is provided with a plurality of through-hole 17 on the regulating plug 16, regulating plug 16 center is provided with stem 18, stem 18 is located sprue 13, stem 18 and sprue 13 clearance fit. The invention uses three-stage tandem developing device to carry out developing treatment. The fan-shaped first nozzles 4 are arranged in a staggered mode in height, so that the substrate to be developed is fully contacted with liquid medicine, the conical second nozzles 5 are arranged in a staggered mode in left and right, ink in holes and on the surface of the holes can be effectively flushed away, the third nozzles 7 are used for developing in vacuum, the effect of compensating development is achieved, meanwhile, a vacuum method is adopted, the water pool effect is avoided, and the uniformity of development is guaranteed. The spray head 12 arranged on the first nozzle 4 can realize multi-angle spraying, the adjusting plug 16 can move up and down by rotating the adjusting plug 16, on one hand, the spraying state of the through hole 17 can be adjusted by changing the volume of a cavity formed between the groove 15 and the adjusting plug 16, and on the other hand, the spraying state of the auxiliary flow channel 14 can be adjusted by changing the relative position of the core column 18 and the auxiliary flow channel 14. A first buffer groove 19 is arranged at the joint of the auxiliary flow passage 14 and the main flow passage 13, and the included angle between the axis of the outlet of the auxiliary flow passage 14 and the axis of the outlet of the main flow passage 13 is 15 degrees. The first buffer groove 19 is used for reducing the turbulence of the developing solution in the secondary flow passage 14, and the oblique spraying angle of the secondary flow passage 14 is matched with the through hole 17, so that the rotary diffusion of the developing solution sprayed by the spray head 12 is realized. The top of the stem 18 is provided with a second buffer groove 20. The second buffer groove 20 is used to improve the uniformity of the diffusion flow of the developing solution after contacting the top of the stem 18. A plurality of diversion trenches 21 are arranged at the inner side of the second nozzle 5. The guiding grooves 21 are used for improving the consistency of the direction of the liquid flow sprayed by the second nozzles 5. The side wall of the third developing chamber 3 is provided with a plurality of exhaust pipes 8, the exhaust pipes 8 and the interface of the third developing chamber 3 are arranged in a spiral line shape, and the exhaust efficiency of bubbles on the printed circuit substrate can be improved. A conical filter screen 22 is arranged at the interface of the exhaust pipe 8 and the third developing chamber 3, and the conical filter screen 22 can effectively separate and filter micro liquid drops in the airflow.
A developing method of the DES line developing device comprises the following steps:
A. the printed circuit substrate enters the first developing chamber 1, and the first nozzle 4 sprays developing solution to the printed circuit substrate;
B. the printed circuit substrate enters the second developing chamber 2 from the first developing chamber 1, and the second nozzle 5 sprays developing solution to the printed circuit substrate;
C. the printed circuit substrate enters the third developing chamber 3 from the second developing chamber 2, the exhaust pipe 8 vacuumizes the third developing chamber 3, the third nozzle 7 sprays the developing solution to the printed circuit substrate, and the drain pipe 9 discharges the developing solution dripped from the printed circuit substrate in real time.
In the description of the present invention, it is to be understood that the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, are merely for convenience of description of the present invention, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
The foregoing shows and describes the general principles and broad features of the present invention and advantages thereof. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (7)
1. A DES line developing device includes a first developing chamber (1), a second developing chamber (2), and a third developing chamber (3) arranged in series, characterized in that: the first developing chamber (1) is provided with a plurality of rows of fan-shaped first nozzles (4), and the mounting heights of two adjacent rows of first nozzles (4) are different; a plurality of rows of conical second nozzles (5) are arranged in the second developing chamber (2), and the second nozzles (5) in two adjacent rows are arranged in a staggered manner; a disc (6) is arranged at the top of the third developing chamber (3), a plurality of cylindrical third nozzles (7) are uniformly arranged on the disc (6), an exhaust pipe (8) is arranged on the side wall of the third developing chamber (3), and a liquid discharge pipe (9) is arranged at the bottom of the third developing chamber (3); the bottom of the first nozzle (4) is provided with a sealing plate (10), a slit (11) is formed in the sealing plate (10), a plurality of spray heads (12) are arranged on the sealing plate (10), a main flow channel (13) is arranged at the center of the spray heads (12), a plurality of auxiliary flow channels (14) are evenly connected to the side wall of the main flow channel (13), the included angle between the auxiliary flow channels (14) and the axis of the main flow channel (13) is 20-45 degrees, a groove (15) is formed in the bottom of the spray heads (12), an adjusting plug (16) is in threaded connection with the inner side of the groove (15), a plurality of through holes (17) are annularly arranged in the adjusting plug (16), a stem (18) is arranged at the center of the adjusting plug (16), the stem (18) is located in the main flow channel (13), and the stem (18) is in clearance fit with the main flow channel (13).
2. The DES line developing device according to claim 1, wherein: a first buffer groove (19) is arranged at the joint of the auxiliary flow passage (14) and the main flow passage (13), and the included angle between the axis of the outlet of the auxiliary flow passage (14) and the axis of the outlet of the main flow passage (13) is 10-20 degrees.
3. The DES line developing device according to claim 2, wherein: and a second buffer groove (20) is arranged at the top of the core column (18).
4. The DES line developing device according to claim 1, wherein: a plurality of diversion trenches (21) are arranged on the inner side of the second nozzle (5).
5. The DES line developing device according to claim 1, wherein: the side wall of the third developing chamber (3) is provided with a plurality of exhaust pipes (8), and the exhaust pipes (8) and the interface of the third developing chamber (3) are arranged in a spiral line shape.
6. The DES line developing device according to claim 5, wherein: and a conical filter screen (22) is arranged at the interface of the exhaust pipe (8) and the third developing chamber (3).
7. A developing method of the DES line developing device according to any one of claims 1 to 6, characterized by comprising the steps of:
A. the printed circuit substrate enters a first developing chamber (1), and a first nozzle (4) sprays developing solution to the printed circuit substrate;
B. the printed circuit substrate enters a second developing chamber (2) from the first developing chamber (1), and the second nozzle (5) sprays developing solution to the printed circuit substrate;
C. the printed circuit substrate enters the third developing chamber (3) from the second developing chamber (2), the exhaust pipe (8) vacuumizes the third developing chamber (3), the third nozzle (7) sprays the developing solution to the printed circuit substrate, and the liquid discharge pipe (9) discharges the developing solution dripped from the printed circuit substrate in real time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010044733.0A CN111190330B (en) | 2020-01-16 | 2020-01-16 | DES (data encryption standard) line developing device and developing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010044733.0A CN111190330B (en) | 2020-01-16 | 2020-01-16 | DES (data encryption standard) line developing device and developing method |
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| Publication Number | Publication Date |
|---|---|
| CN111190330A CN111190330A (en) | 2020-05-22 |
| CN111190330B true CN111190330B (en) | 2023-03-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010044733.0A Active CN111190330B (en) | 2020-01-16 | 2020-01-16 | DES (data encryption standard) line developing device and developing method |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111586991B (en) * | 2020-05-27 | 2021-08-20 | 生益电子股份有限公司 | Circuit board developing processing system and method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3823074B2 (en) * | 2002-08-09 | 2006-09-20 | 東京エレクトロン株式会社 | Development device |
| CN202649670U (en) * | 2012-06-20 | 2013-01-02 | 艾威尔电路（深圳）有限公司 | Spray device of solder resist developing machine |
| CN202995257U (en) * | 2012-11-12 | 2013-06-12 | 昆山允升吉光电科技有限公司 | Novel developing spraying mechanism |
| CN103698986B (en) * | 2013-12-23 | 2016-04-27 | 清华大学深圳研究生院 | A kind of sharp mouth slit goes out flow structure technique nozzle |
| CN105404102B (en) * | 2014-09-04 | 2018-09-21 | 东京毅力科创株式会社 | Developing method and developing apparatus |
| CN206115138U (en) * | 2016-10-22 | 2017-04-19 | 广州市万亿达电子设备有限公司 | PCB development production line |
| KR102125793B1 (en) * | 2018-04-20 | 2020-06-25 | 세메스 주식회사 | substrate processing apparatus |
| CN208673045U (en) * | 2018-08-09 | 2019-03-29 | 信丰福昌发电子有限公司 | A kind of welding resistance developing nozzle device |
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