JP2003122022A - Developing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device and method for development which can suppress the production of mist and apply a sufficient impulsive force to a substrate with a developer, and further perform uniform development by jetting the developer uniformly to the entire surface of the substrate. SOLUTION: A developer jetting mechanism 53 is fitted with a plurality of spray nozzles 69 on a horizontally arranged holding rod 68. The respective spray nozzles 69 draw flow shapes which succeed downward in a curtain shape and jet the conically spreading developers. The developers jetted by those nozzles 69 overlap among the adjacent spray nozzles 69 and each developer is jetted so that one extends nearly to a corner part (1) of a glass substrate G and the other extends almost to the center part (2) of the long side of the glass substrate G.

Description

Detailed Description of the Invention

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing device for developing a substrate for a color filter in a liquid crystal color display, for example.

2. Description of the Related Art In a color filter for a liquid crystal color display, it is necessary to form R, G, B colored patterns on a glass substrate. Such a coloring pattern
For example, it is formed by a photolithography method. As an example, a colored resin made of a photosensitive resin is used for each of R, G, and B, and a coating-exposure-developing process is repeated three times for R, G, and B to form a pattern. By the way, in the above-mentioned development processing step, a negative type development processing is performed in which an unexposed portion of the photosensitive resin is removed with a developing solution to form a pattern. For example, it is required to eject the developing solution at a high pressure onto the substrate.
Therefore, as a method of supplying the developing solution onto the substrate, it is conceivable to use a shower system in which the developing solution pressurized by a pump or the like is atomized and sprayed onto the substrate.

However, when the developer is sprayed at a high pressure using the shower method, there is a problem that the developer drifts in the atmosphere and causes mist. On the other hand, when the developing solution is sprayed at a low pressure in order to suppress the generation of mist, a sufficient impact force cannot be applied to the substrate, which causes a pattern defect or a development defect. Such pattern defects and development defects are
One of the causes is that the developing solution is not uniformly discharged on the entire substrate and is not uniformly developed. The present invention has been made in order to solve the above problems, and can suppress the generation of mist while giving a sufficient impact force to a substrate by a developing solution, and further, to uniformly develop the developing solution on the entire surface of the substrate. It is an object of the present invention to provide a developing device capable of ejecting.

In order to solve such a problem, a developing device according to the present invention is configured so that a holding / rotating means for rotating while holding a rectangular substrate and a substrate surface rotated by the holding / rotating means. A plurality of nozzles for ejecting the developing solution so as to draw a continuous flow in a curtain shape and to spread in a conical shape, and the developing solutions ejected from the plurality of nozzles are mutually adjacent to each other. Are arranged in a straight line so that the developing solution is discharged from the plurality of nozzles, one of which extends substantially at a corner of the substrate and the other of which extends substantially at the center of one side of the substrate. . In the present invention, since the developing solution is discharged onto the surface of a rectangular substrate so as to draw a continuous flow in a curtain shape, the developing solution does not drift like mist in the atmosphere, and mist is generated. Can be suppressed. Further, in addition to such jetting, the developing solution is discharged while rotating the substrate, so that the developing solution can give a sufficient impact force to the substrate. Further, in the present invention, since each nozzle ejects the developing solution so as to spread in a conical shape, and the developing solutions ejected from these nozzles are arranged in a straight line so as to overlap each other between adjacent nozzles, The liquid can give an average and stronger impact force to the substrate. Further, according to the present invention, the developing solution is ejected from the plurality of nozzles so that one of the nozzles extends substantially at a corner of the substrate and the other of the nozzles extends substantially at the center of one side of the substrate. The developing solution can be uniformly ejected onto the entire surface of the substrate, and waste of the developing solution can be eliminated. For example, when the nozzle is configured to supply the liquid from the corners to the corners, the liquid discharged to the region without the substrate becomes mist as it is, but according to the present invention, the generation of such mist is suppressed as much as possible. be able to. One mode of the present invention is a high-pressure cleaning means for ejecting a cleaning liquid at a high pressure so as to draw a continuous flow in a curtain shape and spread in a conical shape on the surface of the substrate held by the holding and rotating means. Is further provided. By jetting the cleaning liquid in this manner, the residue on the substrate can be efficiently removed by continuous processing. One aspect of the present invention is
The plurality of nozzles are 1.5 to 2.5 (kg / cm · c
The developer is discharged with the discharge pressure of m). Since the discharge pressure of the developing solution is set to 1.5 to 2.5 (kg / cm · cm), necessary and sufficient development can be performed. That is, 1.5
If it is smaller than (kg / cm · cm), the developer cannot give sufficient impact force to the substrate,
If it is greater than 2.5 (kg / cm · cm), the mist will increase and the impact force will be unnecessarily high. In one aspect of the present invention, the holding / rotating means is 200 to 300 (r
The substrate is rotated at a speed of pm). Substrate 200-300
Since it was rotated at a speed of (rpm), necessary and sufficient development can be performed. That is, if it is less than 200 (rpm), sufficient impact force cannot be applied to the substrate by the developing solution, and if it is more than 300 (rpm), mist increases and more impact than necessary. Become power. A developing method according to the present invention is a developing method in which a rectangular substrate is rotated and a developing solution is discharged so as to draw a continuous stream in a curtain shape and spread in a conical shape on a substrate surface. The developing solution is ejected in such a manner that one of them extends to a substantially corner portion of the substrate and the other extends to a substantially central portion of one side of the substrate. According to one aspect of the present invention, after the developing solution is discharged onto the surface of the substrate, the cleaning solution is jetted at a high pressure so as to draw a continuous flow in a curtain shape and spread in a conical shape. . One aspect of the present invention is
The cleaning liquid is sprayed onto the surface of the substrate at a high pressure, and then the rinse liquid is supplied to the surface of the substrate. According to one aspect of the present invention, after the rinse liquid is supplied to the surface of the substrate, the substrate is rotated and shaken off to dry.
A developing method according to another aspect of the present invention includes a holding and rotating unit that rotates while holding a rectangular substrate, and a plurality of support pins that support the substrate held by the holding and rotating unit. A step of performing a developing process by continuously supplying a developing solution at a predetermined pressure between at least a central portion and a part of a peripheral edge of the rectangular substrate while the held substrate is rotated; Means and while the rectangular substrate supported by the plurality of support pins is stationary, the cleaning liquid is continuously applied so as to cover the lateral direction of the rectangular substrate and scan in the longitudinal direction of the rectangular substrate. A step of supplying the developing solution at a pressure higher than the pressure for supplying the developing solution to perform the cleaning process. According to one aspect of the present invention, a region for supporting the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process. In one embodiment of the present invention, the container facing the side of the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process.

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a coating / developing processing system according to an embodiment of the present invention. As shown in FIG. 1, in front of the coating / developing system 1, a substrate,
For example, a loader / unloader unit 2 for loading / unloading a glass substrate G for a color filter to / from a coating / developing processing system 1 is provided. The loader / unloader unit 2 has a cassette mounting table 3 on which the cassettes C each containing, for example, 25 glass substrates G are aligned and mounted at predetermined positions.
Further, there is provided a loader / unloader 4 for taking out the glass substrate G to be processed from each cassette C and returning the processed glass substrate G to each cassette C in the coating / developing processing system 1. Illustrated loader unloader 4
Moves in the arrangement direction of the cassettes C as the main body 5 travels, takes out the glass substrates G from each cassette C by the plate-like tweezers 6 mounted on the main body 5, and returns the glass substrates G to each cassette C. It has become. Also,
Substrate alignment members 7 that hold the four corners of the glass substrate G for alignment are provided on both sides of the tweezers 6. In the central portion of the coating / developing processing system 1, corridor-shaped transport paths 10 and 11 arranged in the longitudinal direction are provided in a straight line via a first transfer section 12, and these transport paths 10 and 11 are provided. Various processing devices for performing each processing on the glass substrate G are arranged on both sides of the. In the coating / developing processing system 1 shown in the figure, for example, two scrubber units 16 for brush-cleaning the glass substrate G and cleaning with high-pressure jet water are provided side by side on one side of the transport path 10. . Further, two developing devices 17 are arranged in parallel on the opposite side of the transport path 10 and two heating devices 18 are stacked next to each other. In addition, a cooling device 20 for cooling is installed on one side of the transport path 11.
It is arranged in columns. In addition, these cooling devices 20
The heating devices 22 are arranged next to each other by stacking two heating devices 22 in two rows. Further, two coating devices for forming a colored resin film made of a photosensitive resin on the surface of the glass substrate G by applying a colored resin made of a photosensitive resin to the glass substrate G on the opposite side with the transport path 11 interposed therebetween. 23 are juxtaposed. Although not shown, the side parts of these coating devices 23 are
An exposure device and the like for exposing a predetermined fine pattern to the colored resin film made of a photosensitive resin formed on the glass substrate G via the second transfer part 28 is provided. The second delivery unit 28 includes a loading / unloading tweezers 29 and a delivery table 30 for loading and unloading the glass substrate G. The above processing devices 15 to 18 and 20 to 23
Are arranged on both sides of the transport paths 10 and 11 with the entrance and exit of the glass substrate G facing inward. The first transfer device 25 is the loader / unloader unit 2, each processing device 15
To 18 and the first transfer unit 12, the second transfer device 26 moves on the transfer path 10 to transfer the glass substrate G, and the second transfer unit 26 transfers the first transfer unit 12 and the second transfer unit 2.
8 and each of the processing devices 20 to 23 are moved on the transfer path 26 to transfer the glass substrate G. Each of the transfer devices 25 and 26 has a pair of upper and lower arms 27 and 27, and one arm 27 is used when accessing each of the processing devices 15 to 18 and 20 to 23.
The processed glass substrate G is unloaded from the chamber of each processing apparatus, and the unprocessed glass substrate G is loaded into the chamber by the other arm 27. 2 is a front view of the developing device 17, and FIG. 3 is a plan view thereof. Figure 2
Further, as shown in FIG. 3, a spin chuck 32 configured to be rotatable and vertically movable by a drive motor 31 is provided at the center of the developing device 17. The upper surface of the spin chuck 32 is configured to suck and hold the glass substrate G in a horizontal state by vacuum suction or the like.
A lower container 33 is arranged below the spin chuck 32. An outer cup 34 is disposed so as to surround the outer circumference of the spin chuck 32, and the lower container 33 and the outer cup 34 are disposed.
An inner cup 35 is arranged between them. Outer cup 34
The inner cup 35 and the inner cup 35 are connected by a connecting member 36, and the outer cup 34 and the inner cup 35 are moved up and down by an elevating cylinder 38 based on a command from the controller 37. The upper portions of the outer cup 34 and the inner cup 35 are provided so as to be inclined inward so as to become narrower as they go upward, and the diameter of the upper end opening of the outer cup 34 is larger than that of the inner cup 35, and The diameters of these upper end openings are formed such that the glass substrate G can be lowered and accommodated in the cup while the glass substrate G is kept horizontal. The lower container 33 includes an inclined portion 39 that is inclined downward from the center toward the outside, and a saucer portion 40 arranged on the outer periphery thereof. A plurality of, for example, four support pins 41 for holding the back surface of the glass substrate G are arranged on the inclined portion 39.
The height of the tip of the support pin 41 is set to a position where the tip of the support pin 41 contacts the back surface of the glass substrate G when the glass substrate G held by the spin chuck 32 is lowered to the lowest position. . Further, a cylindrical standing wall 42 is provided on the bottom surface of the tray portion 40, and the standing wall 42 is interposed between the outer cup 34 and the inner cup 35. The inclined portion of the inner cup 35 extends beyond the standing wall 42 and extends to the outer periphery of the standing wall 42. As a result, the fluid flowing through the inclined portion of the inner cup 35 flows into the outer chamber 43 partitioned by the standing wall 42 of the tray 40. An exhaust port 44 for exhausting the inside of the cup is provided on the back surface side of the inclined portion 39 of the lower container 33, and an exhaust pump ((not shown)) is connected to the exhaust port 44. The drainage port 4 is provided in the lower part of the inner chamber 45 partitioned by the standing wall 42 of the saucer portion 40.
6 is formed, and the drain port 4 is formed in the lower part of the outer chamber 43.
7 are formed. Then, the recovery pipe 48 is attached to the drainage port 46.
Regeneration processing mechanism 4 for reprocessing used developer via
9 is connected. The regeneration processing mechanism 49 is composed of a gas-liquid separation mechanism 50 for gas-liquid separation and an impurity removal mechanism 51 for removing impurities in the used developer, and is connected to the developer storage tank 52. The drain port 47 is connected to a recovery tank (not shown). A developing solution ejecting mechanism 53 for ejecting a developing solution to the surface of the glass substrate G is arranged on one side of the upper part of the cup, and a cleaning solution is ejected to the surface of the glass substrate G on the other side at high pressure. High pressure cleaning mechanism 5
4 and a rinse liquid supply mechanism 55 for supplying a rinse liquid to the surface of the glass substrate G. In addition, rails 56 and 57 for transportation are provided in front of and behind the upper portion of the cup. Transport motors 58 and 59 are attached to the developer discharge mechanism 53 and the high-pressure cleaning mechanism 54, respectively, and the transport motor 5 is controlled under the control of the controller 37.
By driving 8 and 59, the developing solution discharge mechanism 53 and the high-pressure cleaning mechanism 54 are transported to the upper part of the cup along the transport rails 56 and 57. Developer discharging mechanism 53
Under the control of the controller 37, the developing solution is supplied from the developing solution storage tank 52 via the pump 62. A heating device 63 that heats the developing solution is inserted between the developing solution discharge mechanism 53 and the pump 62. For example, when the atmosphere is 23 (° C.), the heating device 63 supplies the developing solution with 25 to 2
Warm to 7 (° C). Thereby, the developing speed can be improved. Further, the high-pressure cleaning mechanism 54 is controlled by the controller 37, and the cleaning liquid tank 6 is supplied via the pump 64.
The cleaning liquid is supplied from 5. Similarly, the rinse liquid supply mechanism 55 is also supplied with the rinse liquid from the rinse liquid tank 67 via the pump 66 under the control of the controller 37. 4A and 4B are explanatory views of the developing solution discharge mechanism 53. FIG. 4A is a front view and FIG. 4B is a plan conceptual view. As shown in FIG.
In the developer discharge mechanism 53, a plurality of, for example, about 5 to 7 spray nozzles 69 are provided on the holding bar 68 arranged in the horizontal direction.
Is attached. Each spray nozzle 69 is shown in FIG.
As shown in FIG. 5, the developer discharged horizontally from the discharge port 70 hits the inclined wall surface 71 provided on the facing surface, draws a downward continuous curtain-like flow shape, and spreads in a conical shape. The developer is discharged. Further, the developer discharged from these spray nozzles 69 overlaps with each other between the adjacent spray nozzles 69, and the discharge range of the developer extends to one corner of the glass substrate G.
The space between the spray nozzles 69, 69 is provided so that the other extends substantially to the center of the long side of the glass substrate G. With such a structure of the spray nozzle 69, the developing solution can be uniformly ejected onto the entire surface of the rotated substrate, so that the defective development can be prevented and the waste of the developing solution can be prevented. Each spray nozzle 69 is 1.5 to 2.5
(Kg / cm · cm), more preferably 2.0 (kg / cm
The developing solution is discharged at a discharge pressure of (cm · cm). For example, when the discharge pressure of the spray nozzle is 0.8 (kg / cm · cm), the one in which the entire surface of the glass substrate G could not be peeled off after 30 seconds was 2.0 (kg / cm · cm). By doing so, it became possible to peel off the entire surface within this time. Further, the distance h between each spray nozzle 69 and the glass substrate G is 50 to 50.
100 (mm), more preferably 75 to 100 (mm)
Has been in the range. By such setting, the developing speed can be increased. Further, at the time of development, the developing solution discharge mechanism 53 stands still at substantially the center of the glass substrate G, and the glass substrate G held by the spin chuck 32 has a thickness of 200-3.
It is rotated at a speed of 00 (rpm). As a result, a sufficient impact force can be applied to the glass substrate G by the developing solution. 6A and 6B are explanatory views of the high pressure cleaning mechanism 54. FIG. 6A is a front view and FIG. 6B is a plan conceptual view.
As shown in FIG. 6, in the high-pressure cleaning mechanism 54, a plurality of, for example, 5 to 7 high-pressure cleaning nozzles 73 are attached to the holding rod 72 arranged in the horizontal direction. Each high-pressure cleaning nozzle 73 spreads in a conical shape, and the high-pressure cleaning nozzle 7
The high-pressure cleaning nozzle 73 adjacent to the cleaning liquid discharged from No. 3
The cleaning liquid is discharged so as to overlap each other. From the high pressure spray nozzle 73, for example, 5 (kg / c
The cleaning liquid is discharged at a discharge pressure of (m · cm). As a result, the residue and the like on the glass substrate G after development can be sufficiently removed. During cleaning, the glass substrate G held by the spin chuck 32 is in a stationary state, and the high-pressure cleaning mechanism 54 scans the glass substrate G in the longitudinal direction. As a result, the high pressure cleaning mechanism 54 can have a short length. FIG. 7 is an explanatory diagram of the rinse liquid supply mechanism 55,
(A) is a front view, (b) is a planar conceptual diagram. As shown in FIG. 7, in the rinse liquid supply mechanism 55, the arm 74 is rotated by a rotation mechanism (not shown),
The rinse liquid supply nozzle 75 attached to the tip of the nozzle 4 is located almost at the center of the glass substrate G held by the spin chuck 32. During the rinse process, the glass substrate G held by the spin chuck 32 is rotated at about 200 to 300 (rpm), and the rinse liquid supply nozzle 75 is in a stationary state at almost the center of the glass substrate G. Next, the operation will be described. FIG. 8 shows a processing flow in the developing device 17. As shown in FIG. 9, the glass substrate G carried into the developing device 17 and held by the spin chuck 32 is lowered to a position where it does not come into contact with the support pins 41, and the outer cup 34 and the inner cup 35.
Is raised to the highest position, and the developing solution discharge mechanism 53 is conveyed to almost the center of the glass substrate G and stands still. Then, the glass substrate G held by the spin chuck 32
Is rotated, and the developing solution is ejected from the developing solution ejecting mechanism 53 onto the glass substrate G (step 801). The developer scattered from the outer periphery of the glass substrate G hits the inside of the inner cup 35 and is collected from the drainage port 46 and reused. Next, as shown in FIG. 10, the glass substrate G held by the spin chuck 32 is lowered to a position where it abuts the support pins 41, and the outer cup 34 and the inner cup 35 are lowered to the lowest position. Then, the glass substrate G held by the spin chuck 32 is made stationary, the high-pressure cleaning mechanism 54 scans the glass substrate G in the longitudinal direction, and the high-pressure cleaning mechanism 54 discharges the cleaning liquid onto the glass substrate G. (Step 802). The glass substrate G
The cleaning liquid scattered from the outer circumference of the inner cup 35 and the outer cup 3
4 and is discarded from the drain port 47. Further, since the glass substrate G is supported from the back surface by the support pins 41 during the high pressure cleaning, the glass substrate G is not deformed. Next, as shown in FIG. 11, the glass substrate G held by the spin chuck 32 is raised to a position where it does not come into contact with the support pins 41, and the outer cup 34
The inner cup 35 is lowered to the lowest position, and the rinse liquid supply mechanism 55 is conveyed to almost the center of the glass substrate G. Then, the glass substrate G held by the spin chuck 32 is rotated, and the rinse liquid supply mechanism 55.
The rinse liquid is supplied to the glass substrate G (step 803). The rinse liquid scattered from the outer periphery of the glass substrate G passes between the inner cup 35 and the outer cup 34 and is discarded from the drain port 47. Finally, from the state of FIG. 11, the rinse liquid supply mechanism 55 is conveyed to the outside of the cup, the glass substrate G held by the spin chuck 32 is rotated at high speed, and shaken off and dried (step 80).
4). As described above, according to this embodiment, the developing solution is discharged onto the glass substrate G so as to draw a continuous flow shape like a curtain, so that the developing solution drifts in the mist state in the atmosphere. Nothing happens, and the generation of mist can be suppressed. Further, at that time, since the developing solution is ejected while rotating the glass substrate G, a sufficient impact force can be applied to the glass substrate G by the developing solution, resulting in poor development, residue on the surface of the glass substrate G, etc. Will no longer remain. Furthermore, the spray nozzle 69 of the present embodiment is
The developing solution is ejected in such a manner that one of the areas covers the corner of the substrate G and the other extends to the center of one side of the substrate G. It is possible to discharge, it is possible to prevent development failure and waste of the developing solution. Further, this can suppress the generation of mist as much as possible. The present invention is not limited to the above embodiment. For example, as the substrate, not only the glass substrate G for the color filter but also another LC
The present invention can of course be applied to the D substrate and other substrates that require development.

As described above, according to the present invention,
While giving sufficient impact force to the substrate with the developer,
Generation of mist can be suppressed, and further uniform development can be performed.

[Brief description of drawings]

FIG. 1 is a perspective view of a coating / developing processing system according to an embodiment of the present invention.

FIG. 2 is a front view of the developing device shown in FIG.

3 is a plan view of the developing device shown in FIG. 1. FIG.

FIG. 4 is an explanatory view of the developer discharge mechanism shown in FIGS. 2 and 3.

5 is a cross-sectional view of the spray nozzle shown in FIG.

FIG. 6 is an explanatory view of the high-pressure cleaning mechanism shown in FIGS. 2 and 3.

FIG. 7 is an explanatory diagram of the rinse liquid supply mechanism shown in FIGS. 2 and 3.

FIG. 8 is a processing flow in the developing device in this embodiment.

9 is a state diagram of the developing device corresponding to step 801 shown in FIG.

10 is a state diagram of the developing device corresponding to step 802 shown in FIG.

11 is a state diagram of the developing device corresponding to step 803 shown in FIG.

[Explanation of symbols]

17 Developing device 31 Drive motor 32 Spin chuck 53 Developer discharge mechanism 54 High pressure cleaning mechanism 55 Rinsing liquid supply mechanism 63 Heating device 69 spray nozzle G glass substrate G

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[Procedure amendment]

[Submission date] August 12, 2002 (2002.8.1)
2)

[Procedure Amendment 1]

[Document name to be amended] Statement

[Name of item to be amended] Detailed explanation of the invention

[Correction method] Change

[Correction content]

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing device for developing a substrate for a color filter in a liquid crystal color display, for example.

[0002]

2. Description of the Related Art In a color filter for a liquid crystal color display, it is necessary to form R, G, B colored patterns on a glass substrate. Such a coloring pattern
For example, it is formed by a photolithography method. As an example, a colored resin made of a photosensitive resin is used for each of R, G, and B, and a coating-exposure-developing process is repeated three times for R, G, and B to form a pattern.

By the way, in the above-mentioned development processing step, a negative type development processing is carried out in which an unexposed portion of the photosensitive resin is removed by a developing solution to form a pattern. Mechanical impact, for example, high-pressure jetting of the developing solution onto the substrate is required. Therefore, as a method of supplying the developing solution onto the substrate, it is conceivable to use a shower system in which the developing solution pressurized by a pump or the like is atomized and sprayed onto the substrate.

[0004]

However, when the developer is sprayed at a high pressure using the shower method, there is a problem that the developer drifts in the atmosphere and causes mist. On the other hand, when the developing solution is sprayed at a low pressure in order to suppress the generation of mist, a sufficient impact force cannot be applied to the substrate, which causes a pattern defect or a development defect. Such pattern defects and development defects are
One of the causes is that the developing solution is not uniformly discharged on the entire substrate and is not uniformly developed.

The present invention has been made in order to solve the above problems, and it is possible to suppress the generation of mist while giving a sufficient impact force to a substrate by a developer.
Moreover, it is an object of the present invention to provide a developing device capable of uniformly discharging the developing solution over the entire surface of the substrate.

[0006]

In order to solve such a problem, a developing device according to the present invention is configured so that a holding / rotating means for rotating while holding a rectangular substrate and a substrate surface rotated by the holding / rotating means. A plurality of nozzles for ejecting the developing solution so as to draw a continuous flow in a curtain shape and to spread in a conical shape, and the developing solutions ejected from the plurality of nozzles are mutually adjacent to each other. Are arranged in a straight line so that the developing solution is discharged from the plurality of nozzles, one of which extends substantially at a corner of the substrate and the other of which extends substantially at the center of one side of the substrate. .

In the present invention, since the developing solution is discharged onto the surface of the rectangular substrate so as to draw a continuous flow in a curtain shape, the developing solution does not drift like mist in the atmosphere. Generation of mist can be suppressed. Further, in addition to such jetting, the developing solution is discharged while rotating the substrate, so that the developing solution can give a sufficient impact force to the substrate. Further, in the present invention, each nozzle discharges the developing solution so as to spread in a conical shape,
Since the developing solutions discharged from these nozzles are arranged in a straight line so that the adjacent nozzles overlap each other,
The developer can give an average and stronger impact force to the substrate. Further, according to the present invention, the developing solution is ejected from the plurality of nozzles so that one of the nozzles extends substantially at a corner of the substrate and the other of the nozzles extends substantially at the center of one side of the substrate. The developing solution can be uniformly ejected onto the entire surface of the substrate, and waste of the developing solution can be eliminated. For example, when the nozzle is configured to supply the liquid from the corners to the corners, the liquid discharged to the region without the substrate becomes mist as it is, but according to the present invention, the generation of such mist is suppressed as much as possible. be able to.

According to one aspect of the present invention, the cleaning liquid is jetted at a high pressure so as to draw a continuous flow in a curtain shape and spread in a conical shape on the surface of the substrate held by the holding and rotating means. It further comprises a high-pressure washing means. By jetting the cleaning liquid in this manner, the residue on the substrate can be efficiently removed by continuous processing.

According to one aspect of the present invention, the plurality of nozzles discharge the developing solution at a discharge pressure of 1.5 to 2.5 (kg / cm · cm). The discharge pressure of the developer is 1.5 to 2.5 (k
g / cm · cm), it is possible to perform necessary and sufficient development. That is, 1.5 (kg / cm · cm)
If it is smaller than 2.5 (kg / cm.multidot.cm), the developer cannot give sufficient impact force to the substrate.
If it is larger than cm, mist increases and the impact force becomes larger than necessary.

According to one aspect of the present invention, the holding and rotating means rotates the substrate at a speed of 200 to 300 (rpm). Since the substrate was rotated at a speed of 200 to 300 (rpm), necessary and sufficient development can be performed. That is, when it is less than 200 (rpm), the developer cannot give a sufficient impact force to the substrate,
If it is greater than 300 (rpm), the mist will increase and the impact force will be unnecessarily high.

The developing method according to the present invention is a developing method in which a rectangular substrate is rotated and a developing solution is discharged so as to draw a curtain-shaped continuous flow shape and spread in a conical shape on the substrate surface. That is, the developing solution is ejected in such a manner that one of the areas extends to a substantially corner portion of the substrate and the other extends to a substantially central portion of one side of the substrate.

According to one aspect of the present invention, after the developing solution is discharged onto the surface of the substrate, the cleaning solution is jetted at a high pressure so as to draw a continuous flow in a curtain shape and spread in a conical shape. It is a thing.

According to one aspect of the present invention, a rinsing liquid is supplied to the substrate surface after a cleaning liquid is jetted at a high pressure onto the substrate surface.

According to one aspect of the present invention, after the rinse liquid is supplied to the surface of the substrate, the substrate is rotated and shaken off to dry.

A developing method according to another aspect of the present invention has a holding / rotating means for holding and rotating a rectangular substrate, and a plurality of support pins for supporting the substrate held by the holding / rotating means. A step of performing a developing process by continuously supplying a developing solution at a predetermined pressure between at least a central portion and a part of a peripheral edge of the rectangular substrate while the substrate held by the rotating means is rotated; While the rectangular substrate supported by the holding / rotating means and the plurality of support pins is stationary, the cleaning liquid is continuously supplied so as to cover the lateral direction of the rectangular substrate and scan in the longitudinal direction of the rectangular substrate. Specifically, the cleaning solution is supplied at a pressure higher than the pressure for supplying the developing solution.

According to an aspect of the present invention, a region for supporting the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process.

In one embodiment of the present invention, a container facing a side of the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process.

[0018]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a perspective view of a coating / developing processing system according to an embodiment of the present invention.

As shown in FIG. 1, in front of the coating / developing processing system 1, a substrate, for example, a glass substrate G for a color filter, is loaded and unloaded into / from the coating / developing processing system 1. Two are provided. In the loader / unloader unit 2, for example, a cassette mounting table 3 on which a cassette C containing, for example, 25 glass substrates G at a predetermined position is arranged and mounted, and a glass substrate G to be processed is taken out from each cassette C, Further, in the coating / developing processing system 1, there is provided a loader / unloader 4 for returning the processed glass substrate G to each cassette C.
The illustrated loader / unloader 4 moves in the arrangement direction of the cassettes C by the traveling of the main body 5, takes out the glass substrate G from each cassette C by the plate-like tweezers 6 mounted on the main body 5, and also transfers glass to each cassette C. The substrate G is returned. Further, on both sides of the tweezers 6, there are provided substrate alignment members 7 for holding the four corners of the glass substrate G and performing alignment.

At the center of the coating / developing system 1,
The corridor-shaped transport paths 10 and 11 arranged in the longitudinal direction are first
Is provided in a straight line through the delivery section 12 of
Various processing devices for performing each processing on the glass substrate G are arranged on both sides of the transport paths 10 and 11.

In the coating / developing processing system 1 shown in the figure, for example, two scrubber units 16 for cleaning the glass substrate G with a brush and cleaning with high-pressure jet water are provided side by side on one side of the transport path 10. Has been done. Further, two developing devices 17 are arranged in parallel on the opposite side of the transport path 10 and two heating devices 18 are stacked next to each other.

Further, cooling devices 20 for cooling are arranged in two stages on one side of the transport path 11. In addition, next to the cooling devices 20, two heating devices 22 are arranged in a two-row stack. Further, two coating devices for forming a colored resin film made of a photosensitive resin on the surface of the glass substrate G by applying a colored resin made of a photosensitive resin to the glass substrate G on the opposite side with the transport path 11 interposed therebetween. 23 are juxtaposed. Although not shown, a side portion of the coating device 23 is provided with a second transfer portion 28 for exposing a colored resin film made of a photosensitive resin formed on the glass substrate G with a predetermined fine pattern. An exposure device and the like are provided. The second delivery unit 28 includes a loading / unloading tweezers 29 and a delivery table 30 for loading and unloading the glass substrate G.

Each of the above processing devices 15-18 and 20-
23 is arranged on both sides of the transport paths 10 and 11 with the entrance and exit of the glass substrate G facing inward. First
Of the transfer device 25 moves on the transfer path 10 to transfer the glass substrate G among the loader / unloader unit 2, the processing devices 15 to 18 and the first transfer unit 12, and the second transfer device 26. Is configured to move on the transfer path 26 to transfer the glass substrate G among the first transfer unit 12, the second transfer unit 28, and the processing devices 20 to 23. Each of the transfer devices 25 and 26 has a pair of upper and lower arms 27 and 27, and each of the processing devices 15 to 18 is provided.
And 20 to 23, one arm 27 carries out the processed glass substrate G from the chamber of each processing apparatus, and the other arm 27 carries out the unprocessed glass substrate G.
Is configured to be loaded into the chamber.

FIG. 2 is a front view of the developing device 17, and FIG. 3 is a plan view thereof.

As shown in FIGS. 2 and 3, the developing device 17
A spin chuck 32 that is rotatable and vertically movable by a drive motor 31 is provided at the center of the. The upper surface of the spin chuck 32 is configured to suck and hold the glass substrate G in a horizontal state by vacuum suction or the like.

A lower container 33 is arranged below the spin chuck 32. An outer cup 34 is arranged so as to surround the outer circumference of the spin chuck 32, and an inner cup 35 is arranged between the lower container 33 and the outer cup 34.

The outer cup 34 and the inner cup 35 are connected by a connecting member 36, and the outer cup 34 and the inner cup 35 are moved up and down by an elevating cylinder 38 in response to a command from the controller 37. The upper portions of the outer cup 34 and the inner cup 35 are provided so as to be inclined inward so as to become narrower as they go upward, and the diameter of the upper end opening of the outer cup 34 is larger than that of the inner cup 35, and The diameters of these upper end openings are formed such that the glass substrate G can be lowered and accommodated in the cup while the glass substrate G is kept horizontal.

The lower container 33 is provided with an inclined portion 39 which inclines downward from the center toward the outside, and a saucer portion 40 arranged on the outer periphery thereof. On the inclined portion 39, the glass substrate G
A plurality of support pins 41 for holding the back surface of the
Book is arranged. The height of the tip of the support pin 41 is set to a position where the tip of the support pin 41 contacts the back surface of the glass substrate G when the glass substrate G held by the spin chuck 32 is lowered to the lowest position. . Further, a cylindrical standing wall 42 is provided on the bottom surface of the saucer portion 40,
The upright wall 42 is interposed between the outer cup 34 and the inner cup 35. The inclined portion of the inner cup 35 extends beyond the standing wall 42 and extends to the outer periphery of the standing wall 42. As a result, the fluid flowing through the inclined portion of the inner cup 35 flows into the outer chamber 43 partitioned by the standing wall 42 of the tray 40.

An exhaust port 44 for exhausting the inside of the cup is provided on the back surface side of the inclined portion 39 of the lower container 33.
An exhaust pump ((not shown)) is connected to the exhaust port 44. A drain port 46 is formed in the lower part of the inner chamber 45 partitioned by the standing wall 42 of the tray part 40, and a drain port 47 is formed in the lower part of the outer chamber 43. Then, a recycle processing mechanism 49 for reprocessing the used developer is connected to the drain port 46 via a recovery pipe 48. The regeneration processing mechanism 49 is composed of a gas-liquid separation mechanism 50 for gas-liquid separation and an impurity removal mechanism 51 for removing impurities in the used developer, and is connected to the developer storage tank 52.
The drain port 47 is connected to a recovery tank (not shown).

A developing solution ejecting mechanism 53 for ejecting the developing solution to the surface of the glass substrate G is arranged on one side of the upper part of the cup, and a cleaning solution is ejected on the other side to a high pressure on the surface of the glass substrate G. A high-pressure cleaning mechanism 54 for cleaning and a rinse liquid supply mechanism 55 for supplying a rinse liquid to the surface of the glass substrate G are arranged. In addition, rails 56 and 57 for transportation are provided in front of and behind the upper portion of the cup.
Transport motors 58 and 59 are attached to the developer discharge mechanism 53 and the high-pressure cleaning mechanism 54, respectively, and the developer discharge mechanism 53 and the high-pressure cleaning mechanism are driven by driving the transport motors 58 and 59 under the control of the controller 37. 54 is transported to the upper part of the cup along the transport rails 56 and 57.

The developer discharge mechanism 53 is supplied with the developer from the developer storage tank 52 via the pump 62 under the control of the controller 37. Developer discharge mechanism 53 and pump 62
A heating device 63 for heating the developing solution is interposed between and. The heating device 63 has, for example, an atmosphere of 23 (° C).
If so, the developer is heated to 25 to 27 (° C). Thereby, the developing speed can be improved.
Further, the high-pressure cleaning mechanism 54 has a control unit under the control of the control unit 37.
The cleaning liquid is supplied from the cleaning liquid tank 65 via the pump 64. Similarly, the rinse liquid supply mechanism 55 also includes the control unit 3
Under the control of No. 7, the rinse liquid tank 67 via the pump 66.
More rinse liquid is supplied.

4A and 4B are explanatory views of the developing solution discharge mechanism 53. FIG. 4A is a front view and FIG. 4B is a plan conceptual view.

As shown in FIG. 4, in the developing solution discharge mechanism 53, a plurality of, for example, five, holding rods 68 arranged in the horizontal direction are provided.
About to 7 spray nozzles 69 are attached. As shown in FIG. 5, each spray nozzle 69 hits the inclined wall surface 71 provided on the facing surface with the developer horizontally discharged from the discharge port 70, and draws a downward continuous curtain-shaped flow shape. Moreover, the developer is discharged so as to spread in a conical shape. Further, the developing solutions discharged from the spray nozzles 69 overlap with each other between the adjacent spray nozzles 69, and the developing solution is discharged in such a range that one is almost at a corner of the glass substrate G and the other is a glass. Board G
Of the spray nozzle 6 so as to cover almost the center of the long side of the
There is a space between 9 and 69. With such a structure of the spray nozzle 69, the developing solution can be uniformly ejected onto the entire surface of the rotated substrate, so that the defective development can be prevented and the waste of the developing solution can be prevented.

Each spray nozzle 69 is 1.5 to 2.5.
(Kg / cm · cm), more preferably 2.0 (kg / cm
The developing solution is discharged at a discharge pressure of (cm · cm). For example, when the discharge pressure of the spray nozzle is 0.8 (kg / cm · cm), the one in which the entire surface of the glass substrate G could not be peeled off after 30 seconds was 2.0 (kg / cm · cm). By doing so, it became possible to peel off the entire surface within this time. Further, the distance h between each spray nozzle 69 and the glass substrate G is 50 to 50.
100 (mm), more preferably 75 to 100 (mm)
Has been in the range. By such setting, the developing speed can be increased. Further, at the time of development, the developing solution discharge mechanism 53 stands still at substantially the center of the glass substrate G, and the glass substrate G held by the spin chuck 32 has a thickness of 200-3.
It is rotated at a speed of 00 (rpm). As a result, a sufficient impact force can be applied to the glass substrate G by the developing solution.

6A and 6B are explanatory views of the high pressure cleaning mechanism 54. FIG. 6A is a front view and FIG. 6B is a plan conceptual view.

As shown in FIG. 6, in the high-pressure cleaning mechanism 54, a plurality of, for example, five, holding rods 72 arranged horizontally are provided.
About to 7 high pressure washing nozzles 73 are attached. Each high-pressure cleaning nozzle 73 spreads in a conical shape, and
The cleaning liquid is discharged so that the cleaning liquid discharged from the high pressure cleaning nozzle 73 overlaps with the adjacent high pressure cleaning nozzle 73.

From the high pressure spray nozzle 73, for example, 5
The cleaning liquid is discharged at a discharge pressure of (kg / cm · cm).
As a result, the residue and the like on the glass substrate G after development can be sufficiently removed. When cleaning, spin chuck 32
The glass substrate G held by is in a stationary state, and the high-pressure cleaning mechanism 54 scans the glass substrate G in the longitudinal direction. As a result, the high pressure cleaning mechanism 54 can have a short length.

7A and 7B are explanatory views of the rinse liquid supply mechanism 55. FIG. 7A is a front view and FIG. 7B is a conceptual plan view.

As shown in FIG. 7, a rinse liquid supply mechanism 55.
Then, the arm 74 is rotated by a rotation mechanism (not shown) so that the rinse liquid supply nozzle 75 attached to the tip of the arm 74 is positioned substantially at the center of the glass substrate G held by the spin chuck 32. Has become. During the rinse process, the glass substrate G held by the spin chuck 32 is rotated at about 200 to 300 (rpm), and the rinse liquid supply nozzle 75 is in a stationary state at almost the center of the glass substrate G.

Next, the operation will be described.

FIG. 8 shows a processing flow in the developing device 17.

As shown in FIG. 9, the glass substrate G carried into the developing device 17 and held by the spin chuck 32 is lowered to a position where it does not come into contact with the support pins 41, and the outer cup 34 and the inner cup 35 are moved to the highest position. The developing solution discharging mechanism 53 is raised to a high position, is transported to almost the center of the glass substrate G, and stands still. Then, the glass substrate G held by the spin chuck 32 is rotated, and the developing solution is ejected from the developing solution ejecting mechanism 53 onto the glass substrate G (step 801). The developer scattered from the outer periphery of the glass substrate G hits the inside of the inner cup 35 and is collected from the drainage port 46 and reused.

Next, as shown in FIG. 10, the glass substrate G held by the spin chuck 32 has the support pins 41.
The outer cup 34 and the inner cup 35 are lowered to the lowest position. Then, the glass substrate G held by the spin chuck 32 is made stationary, the high-pressure cleaning mechanism 54 scans the glass substrate G in the longitudinal direction, and the high-pressure cleaning mechanism 54 discharges the cleaning liquid onto the glass substrate G. (Step 802). In addition,
The cleaning liquid scattered from the outer periphery of the glass substrate G is in the inner cup 35.
It passes through between the outer cup 34 and the outer cup 34, and is discarded from the drain port 47. Further, since the glass substrate G is supported from the back surface by the support pins 41 during the high pressure cleaning, the glass substrate G is not deformed.

Next, as shown in FIG. 11, the glass substrate G held by the spin chuck 32 has the support pins 41.
The outer cup 34 and the inner cup 35 are lowered to the lowest position, and the rinse liquid supply mechanism 55 is conveyed to almost the center of the glass substrate G. Then, the glass substrate G held by the spin chuck 32 is rotated, and the rinse liquid is supplied from the rinse liquid supply mechanism 55 to the glass substrate G (step 80).
3). The rinse liquid scattered from the outer periphery of the glass substrate G passes between the inner cup 35 and the outer cup 34 and is discarded from the drain port 47.

Finally, from the state shown in FIG. 11, the rinse liquid supply mechanism 55 is conveyed to the outside of the cup, and the glass substrate G held by the spin chuck 32 is rotated at a high speed to be shaken off and dried (step 804).

As described above, according to this embodiment,
Since the developing solution is discharged so as to draw a continuous flow shape like a curtain on the glass substrate G, the developing solution does not drift in the atmosphere in a mist state, and the generation of mist can be suppressed. . Further, at that time, since the developing solution is discharged while rotating the glass substrate G, a sufficient impact force can be applied to the glass substrate G by the developing solution,
Defective development and no residue left on the surface of the glass substrate G are eliminated.

Further, the spray nozzle 6 according to the present embodiment.
No. 9 is such that the developing solution is discharged on one side substantially at the corner of the substrate G and on the other side substantially at the center of one side of the substrate G. It is possible to discharge the developing solution, prevent defective development, and prevent waste of the developing solution. Further, this can suppress the generation of mist as much as possible.

The present invention is not limited to the above embodiment.

For example, as the substrate, the present invention is naturally applicable not only to the glass substrate G for the color filter but also to other LCD substrates and other substrates requiring development.

[0051]

As described above, according to the present invention,
While giving sufficient impact force to the substrate with the developer,
Generation of mist can be suppressed, and further uniform development can be performed.

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Omori Den             Kumamoto Prefecture Kikuchi-gun Otsu Town Large character Takao character Heisei 272             No. 4 Tokyo Electron Kyushu Co., Ltd.             Otsu Office F term (reference) 2H096 AA28 GA29 GA30 GA31 LA16                 5F046 LA03 LA04 LA06 LA13

Claims (11)

[Claims] 1. A holding and rotating means for rotating a rectangular substrate while holding it, and a curtain-like continuous flow shape with respect to the surface of the substrate rotated by the holding and rotating means, and to spread in a conical shape. A plurality of nozzles for ejecting the developing solution, and the developing solutions ejected from the plurality of nozzles are arranged in a straight line so that the adjacent nozzles overlap each other, and the developing solution is ejected from the plurality of nozzles. The developing device is characterized in that one extends substantially to a corner portion of the substrate and the other extends to a substantially central portion of one side of the substrate. 2. The developing device according to claim 1, wherein the surface of the substrate held by the holding and rotating means is shaped like a curtain-shaped continuous flow and spreads in a conical shape. A developing device further comprising high-pressure cleaning means for ejecting a cleaning liquid at high pressure. 3. The developing device according to claim 1, wherein the plurality of nozzles are 1.5 to 2.5 (kg / cm · c).
A developing device which discharges the developing solution at a discharge pressure of m). 4. Any one of claims 1 to 3
The developing device as described in the item 1, wherein the holding and rotating unit rotates the substrate at a speed of 200 to 300 (rpm). 5. A developing method of ejecting a developing solution onto a substrate while rotating a rectangular substrate, wherein the developing is performed so as to draw a continuous stream shape like a curtain on the surface of the substrate and to spread in a conical shape. A developing method in which a liquid is discharged and the developing liquid is discharged in such a manner that one of the liquids is discharged to a substantially corner portion of the substrate and the other is discharged to a substantially central portion of one side of the substrate. 6. The developing method according to claim 5, wherein after the developing solution is discharged onto the surface of the substrate, a continuous flow shape is drawn in a curtain shape and spread in a conical shape. A developing method characterized in that a cleaning liquid is ejected at a high pressure. 7. The developing method according to claim 6, wherein a rinsing liquid is supplied to the substrate surface after the cleaning liquid is jetted at a high pressure to the substrate surface. 8. The developing method according to claim 7, wherein after the rinse liquid is supplied to the surface of the substrate, the substrate is rotated and shaken off to dry. 9. A holding / rotating unit that rotates while holding a rectangular substrate, and a plurality of support pins that support the substrate held by the holding / rotating unit, and rotate the substrate held by the holding / rotating unit. In this state, a developing solution is continuously supplied at a predetermined pressure between at least the central portion and a part of the peripheral edge of the rectangular substrate to perform a developing process; With the rectangular substrate supported by the pin stationary, a cleaning liquid is supplied continuously from the pressure for supplying the developing liquid so as to cover the lateral direction of the rectangular substrate and scan in the longitudinal direction of the rectangular substrate. And a step of performing a cleaning process by supplying with a large pressure. 10. The developing method according to claim 9, wherein a region for supporting the rectangular substrate is different between the step of performing the developing process and the step of performing the cleaning process. 11. The developing method according to claim 9, wherein the container facing the side of the rectangular substrate is different between the developing process and the cleaning process. Characteristic development method.