JP2000035681A - Developing device and developing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a developing device and a developing method in which the occurrence of mist is restrained and sufficient impact is given to a base plate by developer. SOLUTION: In a developer discharge mechanism 53, plural spray nozzles 69 are attached to a holding bar 68 arranged in a horizontal direction. The respective spray nozzles 69 draw flow shape continuous like a curtain in a downward direction and discharge the developer so as to conically spread. The spray nozzles 69 are set so that the developer discharged from the spray nozzles 69 may be mutually superposed between the adjacent spray nozzles 69 and either side of a range where the developer is discharged may reach almost the angle part (1) of the glass base plate G and the other side may reach almost the center part (2) of the long side of the base plate G.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a developing apparatus and a developing method for developing a substrate for a color filter in a liquid crystal color display, for example.

[0002]

2. Description of the Related Art In a color filter of a liquid crystal color display, it is necessary to form R, G, B colored patterns on a glass substrate. Such a coloring pattern,
For example, it is formed by a photolithography method. As an example, a colored resin made of a photosensitive resin is used for each of R, G, and B, and a coating-exposure-development process is repeated three times for R, G, and B to form a pattern.

In the above developing process, a negative type developing process is performed in which an unexposed portion of the photosensitive resin is removed with a developing solution to form a pattern. Therefore, it is required to eject a developer at a high pressure to a mechanical shock, for example, a substrate. For this reason, as a method of supplying the developing solution onto the substrate, it is conceivable to use a shower system in which the developing solution pressurized by a pump or the like is sprayed and sprayed onto the substrate.

[0004]

However, when the developer is sprayed at a high pressure using a shower system, there is a problem that the developer drifts in the atmosphere and causes mist. In addition, there is also a problem that a sufficient impact force cannot be obtained, which causes a pattern failure and a development failure.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and a developing apparatus and a developing method capable of suppressing generation of mist and giving a sufficient impact force to a substrate by a developing solution. It is intended to provide.

[0006]

According to a first aspect of the present invention, there is provided a developing device according to the first aspect of the present invention, comprising: a holding and rotating unit that rotates while holding a substrate; and a substrate that is rotated by the holding and rotating unit. Discharging means for discharging the developing solution so as to draw a continuous flow in a curtain shape on the surface.

According to a second aspect of the present invention, there is provided a developing device comprising:
The discharge means is a plurality of nozzles for discharging the developer so as to spread in a conical shape, and the nozzles arranged in a straight line so that the developer discharged from these nozzles overlap each other between adjacent nozzles. Have

According to a third aspect of the present invention, there is provided a developing device comprising:
The substrate has a rectangular shape, and a range in which the developing solution is discharged from the plurality of nozzles extends substantially to a corner of the substrate and the other extends substantially to a center of one side of the substrate.

According to a fourth aspect of the present invention, there is provided a developing device comprising:
1.5 to 2.5 (kg / cm · cm)
The developer is discharged at a discharge pressure of.

According to a fifth aspect of the present invention, there is provided a developing device comprising:
The holding and rotating means rotates the substrate at a speed of 200 to 300 (rpm).

According to a sixth aspect of the present invention, there is provided the developing device according to the first aspect.
The image forming apparatus further includes a heating unit for heating the developer discharged from the discharging unit.

According to a seventh aspect of the present invention, there is provided the developing device according to the first aspect.
The heating means heats the developing solution to 25 to 27 (° C) for an atmosphere of 23 (° C).

The developing device according to the present invention according to claim 8 is:
The apparatus further comprises high-pressure cleaning means for jetting a cleaning liquid at a high pressure onto the surface of the substrate held by the holding and rotating means.

According to a ninth aspect of the present invention, there is provided the developing device according to the first aspect.
Rinsing liquid supply means for supplying a rinsing liquid to the surface of the substrate held by the holding and rotating means is further provided.

According to a tenth aspect of the present invention, the substrate is a substrate for a color filter using a photosensitive colored resin.

According to the eleventh aspect of the present invention, the developing solution is discharged while rotating the substrate so as to draw a continuous flow in a curtain shape on the surface of the substrate.

According to a twelfth aspect of the present invention, after the developing solution is discharged to the substrate surface, a cleaning liquid is jetted at a high pressure to the substrate surface.

According to a thirteenth aspect of the present invention, after the cleaning liquid is jetted at a high pressure onto the substrate surface,
A rinsing liquid is supplied to the substrate surface.

According to a fourteenth aspect of the present invention, in the method of the present invention, after supplying the rinsing liquid to the substrate surface, the substrate is rotated to shake off and dry.

According to the first and eleventh aspects of the present invention, since the developing solution is discharged to the substrate surface so as to draw a continuous flow in a curtain shape, the developing solution drifts in the atmosphere as a mist. This eliminates the occurrence of mist, and since the developer is discharged while rotating the substrate in addition to such ejection, a sufficient impact force is applied to the substrate by the developer. Will be able to do it.

According to the second aspect of the present invention, each nozzle discharges the developing solution so as to spread in a conical shape, and the developing solutions discharged from these nozzles are aligned in a straight line so that the adjacent nozzles overlap each other. Since they are arranged, an average and stronger impact force can be applied to the substrate by the developer.

According to the third aspect of the present invention, the range in which the developing solution is discharged from the plurality of nozzles extends substantially to the corners of the substrate and the other extends substantially to the center of one side of the substrate. Therefore, the developer can be uniformly discharged onto the entire surface of the rotating rectangular substrate, and the waste of the developer can be eliminated.

In the present invention, since the discharge pressure of the developer is set to 1.5 to 2.5 (kg / cm.cm), necessary and sufficient development can be performed. That is,
When it is smaller than 1.5 (kg / cm · cm), a sufficient impact force cannot be given to the substrate by the developer, and when it is larger than 2.5 (kg / cm · cm), Mist is increased and the impact force is more than necessary.

According to the fifth aspect of the present invention, the substrate is
Since rotation was performed at a speed of 00 to 300 (rpm), necessary and sufficient development can be performed. That is, 200 (r
pm), a sufficient impact force cannot be given to the substrate by the developing solution, and 300 (rpm)
If it is larger than m), the mist increases and the impact force is more than necessary.

In the present invention according to claim 6, since the developer is heated, the development processing can be accelerated and the development time can be shortened.

According to the present invention, the developer is supplied at 25 to 27 (° C.) while the atmosphere is substantially at 23 (° C.).
, The development time can be shortened.

According to the eighth and twelfth aspects of the present invention, since the cleaning liquid is jetted at high pressure onto the substrate surface, residues on the substrate can be efficiently removed by continuous processing.

According to the ninth and thirteenth aspects of the present invention, since the rinsing liquid is supplied to the surface of the substrate, the chemical liquid or the like on the substrate can be efficiently removed by continuous processing.

In the present invention according to the tenth aspect, since the above-described processing is performed on a substrate for a color filter using a photosensitive colored resin, development processing can be performed with a short processing time and with a high yield. it can.

In the present invention according to the fourteenth aspect, since the substrate is rotated to be shaken off and dried after supplying the rinsing liquid, the substrate can be efficiently dried by a continuous process.

[0031]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a coating / developing processing system according to an embodiment of the present invention. As shown in FIG. 1, a substrate,
For example, a loader / unloader unit 2 that carries a glass substrate G for a color filter into and out of the coating / developing processing system 1 is provided. The loader / unloader unit 2 has a cassette mounting table 3 on which a cassette C containing, for example, 25 glass substrates G is aligned and mounted at a predetermined position.
And a loader / unloader 4 for taking out the glass substrate G to be processed from each cassette C and returning the processed glass substrate G to each cassette C in the coating / developing processing system 1. Loader unloader 4 shown
Moves in the direction of arrangement of the cassettes C by the movement of the main body 5, takes out the glass substrates G from each cassette C by the piece-like tweezers 6 mounted on the main body 5, and returns the glass substrates G to each cassette C. It has become. Also,
On both sides of the tweezers 6, there are provided substrate positioning members 7 for holding and positioning the four corners of the glass substrate G.

At the center of the coating and developing system 1,
Corridor-like transport paths 10, 11 arranged in the longitudinal direction are the first.
Are provided in a straight line via the transfer unit 12 of
Various processing apparatuses for performing each processing on the glass substrate G are arranged on both sides of the transport paths 10 and 11.

In the coating / development processing system 1 shown in the drawing, for example, two scrubber units 16 for cleaning the glass substrate G by brush and high-pressure jet water are provided on one side of the transport path 10. Have been. Further, two developing devices 17 are provided side by side on the opposite side of the transport path 10, and two heating devices 18 are provided adjacent to the two developing devices.

Further, cooling devices 20 for cooling are arranged in two stages on one side of the transport path 11. In addition, adjacent to the cooling devices 20, two heating devices 22 are arranged in two rows. Two coating apparatuses for forming a colored resin film made of a photosensitive resin on the surface of the glass substrate G by applying a colored resin made of a photosensitive resin to the glass substrate G on the opposite side of the conveyance path 11. 23 are juxtaposed. Although not shown, a side portion of the coating device 23 is provided with a second transfer portion 28 for exposing a predetermined fine pattern to a colored resin film made of a photosensitive resin formed on the glass substrate G. An exposure device and the like are provided. The second transfer unit 28 includes a loading / unloading tweezers 29 for loading and unloading the glass substrate G, and a delivery table 30.

The above processing units 15 to 18 and 20 to
23 is disposed on both sides of the transport paths 10 and 11 with the entrance of the glass substrate G facing inward. First
Transfer device 25 moves on the transfer path 10 to transfer the glass substrate G between the loader / unloader unit 2, each of the processing devices 15 to 18, and the first transfer unit 12, and the second transfer device 26 Moves on the transfer path 26 to transfer the glass substrate G between the first transfer unit 12, the second transfer unit 28, and each of the processing devices 20 to 23. Each of the transfer devices 25 and 26 has a pair of upper and lower arms 27 and 27, respectively.
When accessing the glass substrates G, the processed glass substrate G is unloaded from the chamber of each processing apparatus by one arm 27 and the glass substrate G before processing is accessed by the other arm 27.
Is loaded into the chamber.

FIG. 2 is a front view of the developing device 17, and FIG. 3 is a plan view thereof. As shown in FIGS. 2 and 3, a spin chuck 32, which is rotatable by a drive motor 31 and can be moved up and down, is provided at the center of the developing device 17. The upper surface of the spin chuck 32 is configured to hold the glass substrate G in a horizontal state by vacuum suction or the like.

A lower container 33 is disposed below the spin chuck 32. An outer cup 34 is arranged so as to surround the outer periphery of the spin chuck 32, and an inner cup 35 is arranged between the lower container 33 and the outer cup 34.

The outer cup 34 and the inner cup 35 are connected by a connecting member 36, and the outer cup 34 and the inner cup 35 are moved up and down by an elevating cylinder 38 based on a command from a controller 37. The upper portions of the outer cup 34 and the inner cup 35 are inclined inward so as to become narrower as going upward, and the diameter of the upper end opening of the outer cup 34 is larger than that of the inner cup 35, and The diameters of these upper openings are formed to be large enough to be lowered into the cup while the glass substrate G is kept horizontal.

The lower container 33 has an inclined portion 39 inclined downward from the center to the outside, and a tray portion 40 disposed on the outer periphery thereof. The glass substrate G
Support pins 41 for holding the back surface of
Book is arranged. The height of the tip of the support pin 41 is set to a position where the tip of the support pin 41 contacts the back surface of the glass substrate G when the glass substrate G held by the spin chuck 32 is lowered to the lowest position. . A cylindrical upright wall 42 is provided on the bottom surface of the tray 40,
The upright wall 42 is interposed between the outer cup 34 and the inner cup 35. The inclined portion of the inner cup 35 extends beyond the upright wall 42 to the outer periphery of the upright wall 42. Thus, the fluid flowing through the inclined portion of the inner cup 35 flows into the outer chamber 43 partitioned by the upright wall 42 of the tray 40.

On the back side of the inclined portion 39 of the lower container 33, an exhaust port 44 for exhausting the inside of the cup is provided.
An exhaust pump (not shown) is connected to the exhaust port 44. A drain port 46 is formed at a lower portion of the inner chamber 45 partitioned by the upright wall 42 of the tray section 40, and a drain port 47 is formed at a lower portion of the outer chamber 43. A regenerating mechanism 49 for regenerating used developer is connected to the drain port 46 via a collecting pipe 48. The regeneration processing mechanism 49 includes a gas-liquid separation mechanism 50 for gas-liquid separation and an impurity removal mechanism 51 for removing impurities in the used developer, and is connected to the developer storage tank 52.
The drain port 47 is connected to a collection tank (not shown).

A developing solution discharging mechanism 53 for discharging the developing solution to the surface of the glass substrate G is disposed on one side of the upper portion of the cup, and a cleaning solution is jetted at a high pressure on the surface of the glass substrate G on the other side. And a rinsing liquid supply mechanism 55 for supplying a rinsing liquid to the surface of the glass substrate G. Further, transport rails 56 and 57 are provided in front of and behind the upper portion of the cup.
Transport motors 58 and 59 are attached to the developer discharge mechanism 53 and the high-pressure cleaning mechanism 54, respectively, and the developer discharge mechanism 53 and the high-pressure cleaning mechanism are driven by driving the transport motors 58 and 59 under the control of the control unit 37. 54 is conveyed along the conveying rails 56 and 57 to the upper part in the cup.

The developing solution is supplied from the developing solution storage tank 52 to the developing solution discharging mechanism 53 via the pump 62 under the control of the control unit 37. Developer discharge mechanism 53 and pump 62
A heating device 63 for heating the developer is interposed between the heating device 63 and the heating device 63. The heating device 63 has, for example, an atmosphere of 23 (° C.).
In this case, the developer is heated to 25 to 27 (° C.). Thereby, the developing speed can be improved.
Further, the high-pressure cleaning mechanism 54 has a control unit 37
A cleaning liquid is supplied from a cleaning liquid tank 65 via a pump 64. Similarly, the rinsing liquid supply mechanism 55 also has the control unit 3
7, a rinsing liquid tank 67 via a pump 66
A more rinsing liquid is supplied.

FIGS. 4A and 4B are explanatory views of the developing solution discharge mechanism 53. FIG. 4A is a front view, and FIG. 4B is a conceptual plan view.
As shown in FIG. 4, in the developer discharge mechanism 53, a plurality of, for example, about 5 to 7 spray nozzles 69 are attached to a holding rod 68 arranged in the horizontal direction. As shown in FIG. 5, each spray nozzle 69 has an inclined wall surface 71 on which a developer discharged horizontally from a discharge port 70 is provided.
In this case, a developing solution is discharged so as to draw a continuous flow shape in a curtain shape in a downward direction and spread in a conical shape. Further, the developer discharged from these spray nozzles 69 mutually overlap between the adjacent spray nozzles 69,
In addition, the range in which the developer is discharged is such that one of the
Are provided so as to extend substantially to the corners and the other to approximately the center of the long side of the glass substrate G.

Each spray nozzle 69 has a size of 1.5 to 2.5.
(Kg / cm · cm), more preferably 2.0 (kg / cm
(cm · cm). For example, when the discharge pressure of the spray nozzle is 0.8 (kg / cm · cm), the case where the entire surface of the glass substrate G cannot be peeled even after 30 seconds is 2.0 (kg / cm · cm). By doing so, the entire surface could be peeled off within this time. The distance h between each spray nozzle 69 and the glass substrate G is 50 to
100 (mm), more preferably 75 to 100 (mm)
Has been in the range. With such a setting, the developing speed can be increased. Further, at the time of development, the developer discharge mechanism 53 is stopped almost at the center of the glass substrate G, and the glass substrate G held by the spin chuck 32 is 200 to 3 times.
It is rotated at a speed of 00 (rpm). Thus, a sufficient impact force can be applied to the glass substrate G by the developer.

FIGS. 6A and 6B are explanatory diagrams of the high-pressure cleaning mechanism 54, wherein FIG. 6A is a front view and FIG. 6B is a conceptual plan view. As shown in FIG. 6, in the high-pressure cleaning mechanism 54, a plurality of, for example, about 5 to 7 high-pressure cleaning nozzles 73 are attached to a holding rod 72 arranged in a horizontal direction. Each high-pressure cleaning nozzle 73 extends conically, and
The cleaning liquid is discharged so that the discharged cleaning liquid overlaps between the adjacent high-pressure cleaning nozzles 73.

From the high pressure spray nozzle 73, for example, 5
The cleaning liquid is discharged at a discharge pressure of (kg / cm · cm).
This makes it possible to sufficiently remove the residue on the glass substrate G after the development. At the time of cleaning, the spin chuck 32
Is held stationary, and the high-pressure cleaning mechanism 54 is scanned in the longitudinal direction of the glass substrate G. Thereby, the high-pressure cleaning mechanism 54 can be shortened.

FIGS. 7A and 7B are explanatory views of the rinsing liquid supply mechanism 55. FIG. 7A is a front view and FIG. 7B is a conceptual plan view. As shown in FIG. 7, in the rinsing liquid supply mechanism 55, the rinsing liquid supply nozzle 75 attached to the tip of the arm 74 is held by the spin chuck 32 by rotating the arm 74 by a rotation mechanism (not shown). The glass substrate G is located substantially at the center. During the rinsing process, the glass substrate G held by the spin chuck 32 is rotated at about 200 to 300 (rpm), and the rinsing liquid supply nozzle 75 is in a stationary state at almost the center of the glass substrate G.

Next, the operation will be described. FIG. 8 shows a processing flow in the developing device 17. As shown in FIG. 9, the spin chuck 32 is carried into the developing device 17 and
The glass substrate G held by the first and second cups is lowered to a position where it does not come into contact with the support pins 41, and the outer cup 34 and the inner cup 3
5 is raised to the highest position, and the developer discharge mechanism 53 is conveyed to almost the center of the glass substrate G and stands still. Then, the glass substrate G held by the spin chuck 32
Is rotated, and the developing solution is discharged from the developing solution discharging mechanism 53 onto the glass substrate G (step 801). The developer scattered from the outer periphery of the glass substrate G hits the inside of the inner cup 35, is collected from the drainage port 46, and is reused.

Next, as shown in FIG. 10, the glass substrate G held by the spin chuck 32 is
The outer cup 34 and the inner cup 35 are lowered to the lowest position. Then, the glass substrate G held by the spin chuck 32 is brought into a stationary state, the high-pressure cleaning mechanism 54 is scanned in the longitudinal direction of the glass substrate G, and the cleaning liquid is discharged from the high-pressure cleaning mechanism 54 onto the glass substrate G. (Step 802). In addition,
The cleaning solution scattered from the outer periphery of the glass substrate G is
And between the drain cup 47 and the outer cup 34. Further, at the time of high-pressure cleaning, since the glass substrate G is supported from the back surface by the support pins 41, the glass substrate G is not deformed.

Next, as shown in FIG. 11, the glass substrate G held by the spin chuck 32 is
The outer cup 34 and the inner cup 35 are lowered to the lowest position, and the rinsing liquid supply mechanism 55 is transported almost to the center of the glass substrate G. Then, the glass substrate G held by the spin chuck 32 is rotated, and the rinse liquid is supplied to the glass substrate G from the rinse liquid supply mechanism 55 (Step 80).
3). The rinsing liquid scattered from the outer periphery of the glass substrate G passes between the inner cup 35 and the outer cup 34 and is discarded from the drain port 47.

Finally, the rinsing liquid supply mechanism 55 is conveyed out of the cup from the state shown in FIG. 11, and the glass substrate G held by the spin chuck 32 is rotated at a high speed to perform shake-off drying (step 804).

As described above, according to this embodiment,
Since the developing solution is discharged so as to draw a continuous flow in a curtain shape on the glass substrate G, the developing solution does not drift in the mist in the atmosphere, and the generation of mist can be suppressed. . Also, at this time, since the developing solution is discharged while rotating the glass substrate G, a sufficient impact force can be given to the glass substrate G by the developing solution,
Developing defects and residue on the surface of the glass substrate G do not occur.

The present invention is not limited to the above embodiment. For example, the present invention can naturally be applied not only to a glass substrate G for a color filter, but also to other LCD substrates and other substrates requiring development.

[0054]

As described above, according to the first and eleventh aspects of the present invention, the developer does not drift in the atmosphere as a mist, and the generation of mist can be suppressed. Further, a sufficient impact force can be given to the substrate by the developer.

According to the second aspect of the present invention, an average and stronger impact force can be applied to the substrate by the developer.

According to the third aspect of the present invention, the developing solution can be uniformly discharged onto the entire surface of the rotating rectangular substrate, and the waste of the developing solution can be eliminated.

According to the present invention according to claims 4 and 5,
Necessary and sufficient development can be performed.

According to the sixth and seventh aspects of the present invention,
The development process can be accelerated, and the development time can be shortened.

According to the eighth and twelfth aspects of the present invention, residues on the substrate can be efficiently removed by continuous processing.

According to the ninth and thirteenth aspects of the present invention, a chemical solution or the like on a substrate can be efficiently removed by continuous processing.

According to the tenth aspect of the present invention, development processing can be performed with a short processing time and a high yield.

According to the fourteenth aspect of the present invention, the substrate can be dried efficiently by a continuous process.

[Brief description of the drawings]

FIG. 1 is a perspective view of a coating and developing system according to an embodiment of the present invention.

FIG. 2 is a front view of the developing device shown in FIG.

FIG. 3 is a plan view of the developing device shown in FIG.

FIG. 4 is an explanatory diagram of the developing solution discharging mechanism shown in FIGS. 2 and 3.

FIG. 5 is a sectional view of the spray nozzle shown in FIG. 4;

FIG. 6 is an explanatory diagram of the high-pressure cleaning mechanism shown in FIGS. 2 and 3;

FIG. 7 is an explanatory diagram of the rinsing liquid supply mechanism shown in FIGS. 2 and 3;

FIG. 8 is a processing flow in the developing device in the present embodiment.

FIG. 9 is a state diagram of the developing device corresponding to step 801 shown in FIG.

FIG. 10 is a state diagram of the developing device corresponding to step 802 shown in FIG.

FIG. 11 is a state diagram of the developing device corresponding to step 803 shown in FIG.

[Description of Signs] 17 Developing device 31 Drive motor 32 Spin chuck 53 Developing solution discharging mechanism 54 High pressure cleaning mechanism 55 Rinse liquid supply mechanism 63 Heating device 69 Spray nozzle G Glass substrate G

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA45 2H091 FC01 FC10 FC24 FC29 LA12 2H096 AA30 GA18 GA21 GA23 GA26 GA29 GA30 5F046 LA01 LA04 LA14

Claims (14)

[Claims] 1. A holding and rotating means for rotating while holding a substrate, and a discharging means for discharging a developing solution so as to draw a continuous flow in a curtain shape on a substrate surface rotated by the holding and rotating means. A developing device, comprising: 2. The developing device according to claim 1, wherein said discharge means includes a plurality of nozzles for discharging the developer so as to spread in a conical shape, and the developer discharged from these nozzles is adjacent to the nozzle. A developing device comprising: nozzles arranged in a straight line so as to overlap each other between the nozzles. 3. The developing device according to claim 2, wherein the substrate has a rectangular shape, and a range in which the developing solution is discharged from the plurality of nozzles is substantially a corner of the substrate, and the other is a substrate. A developing device which extends substantially to the center of one side of the developing device. 4. One of claims 1 to 3
3. The developing device according to claim 1, wherein the discharge unit is 1.5 to 2.5 (kg / cm · cm).
A developing solution that discharges the developer at a discharge pressure of: 5. The method according to claim 1, wherein
3. The developing device according to claim 1, wherein the holding and rotating unit rotates the substrate at a speed of 200 to 300 (rpm). 6. One of claims 1 to 5
3. The developing device according to claim 1, further comprising a heating unit configured to heat the developer discharged from the discharging unit. 7. The developing device according to claim 6, wherein said heating means heats the developing solution to 25 to 27 (° C.) with respect to an atmosphere of approximately 23 (° C.). Developing device. 8. One of claims 1 to 7
3. The developing device according to claim 1, further comprising a high-pressure cleaning unit that jets a cleaning liquid at a high pressure onto the surface of the substrate held by the holding and rotating unit. 9. One of claims 1 to 8
3. The developing device according to claim 1, further comprising a rinsing liquid supply unit that supplies a rinsing liquid to the surface of the substrate held by the holding and rotating unit. 10. The developing device according to claim 1, wherein the substrate is a substrate for a color filter using a photosensitive colored resin. apparatus. 11. A developing method, wherein a developing solution is discharged onto a substrate surface while rotating the substrate so as to draw a continuous flow in a curtain shape. 12. The developing method according to claim 11, wherein after discharging the developing solution to the substrate surface, a cleaning liquid is jetted at a high pressure to the substrate surface. 13. The developing method according to claim 12, wherein a rinsing liquid is supplied to the substrate surface after a cleaning liquid is jetted at a high pressure onto the substrate surface. 14. The developing method according to claim 13, wherein after supplying a rinsing liquid to the substrate surface, the substrate is rotated to shake off and dry.