經濟部智慧財農局員工消費合作杜印袁 4484 73 A7 -------B7____ 五、發明說明（1 ) [發明背景] 本發明是有關對如液晶顯示器（Liquid Crystal Display :LCD)中使用的玻璃基板實施顯像處理的顯像方法及顯 像裝置。 製造LCD的工序與製造半導體的工序—樣，為了在用 於LCD中的玻璃基板上形成iT〇(indium Tin Oxide)薄膜或 電路圖形，需要利用光刻法技術。此光刻法技術需要在基 板表面塗附光阻液、然後對其進行曝光、實施顯像處理。 一般的說，在上述顯像處理工序中，需要向玻璃基板 供給顯像液。以往，為了提高顯像速度及消除顯像中的不 良因素，採用了向玻璃基板表面喷塗霧狀顯像液等顯像方 法。 [發明概要] 但是，以往所採用的顯像方法，很難說是在弄清楚了 顯像機構本質後而採用的技術，因此，不能肯定地說它是 一種恰當的方法0 本發明者是在弄清楚了顯像機構本質後，提出的更恰 當的手段。即本發明目的是提供一種能夠提高顯像速度及 象控.二性的新式且恰當的顯像方法及顯像裝置。 為了解決該問題，本發明的顯像方法具有：以第i噴 出速度向被處理體喷射顯像液的第〗工序；以及在完成上 述第1工序後，以比第I噴出速度快的第2喷出速度向上述 被處理體噴射顯像液的第2工序。 本發明的顯像方法具有：以與被處理體呈第丨喷出角 (請先閱讀背面之注意事項再填寫本頁) 叙！ 1訂i !線_Consumption Cooperation of Employees of the Smart Finance and Agriculture Bureau of the Ministry of Economic Affairs Du Yinyuan 4484 73 A7 ------- B7____ V. Description of the Invention (1) [Background of the Invention] The present invention is related to liquid crystal display (LCD) A development method and a development apparatus for performing development processing on a used glass substrate. The process of manufacturing an LCD is similar to the process of manufacturing a semiconductor. In order to form an iT0 (indium tin oxide) film or a circuit pattern on a glass substrate used in the LCD, a photolithography technique is required. This photolithography technique requires coating a photoresist on the surface of the substrate, then exposing it and performing development processing. Generally, in the above-mentioned development processing step, it is necessary to supply a development liquid to a glass substrate. In the past, in order to increase the development speed and eliminate the unfavorable factors in the development, a development method such as spraying a mist-shaped developer on the surface of a glass substrate has been used. [Summary of the Invention] However, it is difficult to say that the imaging method used in the past is a technique adopted after clarifying the essence of the imaging mechanism. Therefore, it cannot be said with certainty that it is an appropriate method. After clarifying the nature of the imaging mechanism, a more appropriate method was proposed. That is, the purpose of the present invention is to provide a new and appropriate developing method and developing device capable of improving the developing speed and image control. In order to solve the problem, the developing method of the present invention includes a first step of ejecting the developing liquid to the object at an i-th ejection speed, and a second step faster than the first ejection speed after completing the first step. The second step of ejecting the developing liquid to the object to be processed at a discharge speed. The developing method of the present invention has: a first ejection angle with the object to be treated (please read the precautions on the back before filling in this page)! 1 order i! Line_
經濟部%慧財產局員Η消費合作板印製 Α7 Β7 五、發明說明（2 ) 度喷射顯像液的第1工序：以及在完成上述第〖工序後，採 用比上述被處理體與第丨喷出角度小的第2噴出角度喷出顯 像液的第2工序。 本發明的顯像方法具有：向被處理體喷射顯像液的第 1工序，以及在完成上述第丨工序後，向上述被處理體喷吹 氣體的第2工序。 本發明的顯像方法具有：向被處理體喷射顯像液的第 1工序；以及在完成上述第1工序後，採用攪拌鏟對上述被 處理體進行攪拌的第2工序。 本發明的顯像方法具有：向被處理體喷射顯像液的第 1工序；以及在完成上述第丨工序後’在比第1工序的顯像 液喷射见圍窄的區域内，向上述被處理體喷射顯像液的第 2工序。 本發明的顯像裝置具有：托持被處理體的托持手段； 向利用上述托持方法托持的被處理體噴射顯像液的噴射手 段，在利用上述噴射手段以第丨噴射速度噴出顯像液後’ 以比第1噴出速度快的第2噴出速度向被處理體喷射顯像液 的控制手段。 本發明的顯像裝置具有：柁持被處理體的托持手段： 向利用上述托持手段托持的被處理體噴射顯像液的噴射手 奴，利用上述噴射手段向被處理體以可變噴射角度噴射的 、角度變換手段：在利用上述手段以第【噴出角度嘴射顯像 夜後，以比上述第！噴出角度小的第2嘴出角度向被處理體 噴射顯像:夜的控制角度變換的控制手段。 -------------裝·-------訂-- -----線 ί請先閱讀背面之注意事項再填寫本頁)Member of the Ministry of Economic Affairs, Bureau of Intellectual Property, printed on the consumer cooperation board A7 B7 V. Description of the invention (2) The first step of spraying the imaging liquid: and after completing the aforementioned step, use The second step of ejecting the developing solution at a second ejection angle having a small ejection angle. The developing method of the present invention includes a first step of injecting a developing solution onto a subject, and a second step of blowing a gas onto the subject after completing the first step. The developing method of the present invention includes a first step of spraying a developing solution on a subject, and a second step of stirring the subject by using a stirring blade after the first step is completed. The developing method of the present invention includes a first step of injecting a developing solution to a subject; and after completing the first step, in a region narrower than that of the developing solution in the first step, spraying to the subject is performed. The second step of ejecting the developing solution by the processing body. The developing device of the present invention includes: a holding means for holding the object to be treated; and an ejecting means for ejecting the developing liquid to the object to be treated by the holding method, and the developing means ejects the developing liquid at the first ejection speed by using the above-mentioned ejecting means. After the image liquid 'A control means for ejecting the developing liquid to the subject at a second ejection speed faster than the first ejection speed. The developing device of the present invention includes a holding means for holding the object to be treated: a spray slave that ejects a developing liquid to the object to be treated held by the holding means, and uses the above-mentioned ejecting means to change the object to the object to be treated. Spraying angle spraying and angle conversion means: After using the above-mentioned method to shoot the night with the spraying nozzle at the spraying angle, it is better than the first! The second nozzle with a small ejection angle is ejected to the object to be treated. Imaging: a control means that controls the angle conversion at night. ------------- Installation -------- Order ------- line ί Please read the precautions on the back before filling this page)
4484 73 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（3 ) 本發明的顯像裝置具有：托持被處理體的托持手段； 向利用上述托持手段托持.的被處理體噴射顯像液的噴射手 段；向上述被處理體喷吹氣體的噴射手段；利用上述噴射 手段喷射顯像液後，且在利用上述喷射手段噴射顯像液的 同時噴射氣體的控制手段= 本發明的顯像裝置具有：托持被處理體的托持手段： 向利用上述托持手段托持的被處理體喷射顯像液的噴射手 段；攪拌喷射到上述被處理體表面顯像液的攪拌鏟；利用 上述喷射手段噴出顯像液後，且在利用上述噴射手段噴射 顯像液的同時利用上述攪拌鏟攪拌顯像液的控制手段。 第10圖為說明顯像機構的示意圖，該圖表示了玻璃基 板G上的膜105表面經曝光後，形成正片型光阻劑層1〇〇的 狀態。符號1 0 1表示未曝光部分，在這部分中，光阻劑層1 〇〇 的一部分因與碱性的顯像液反應而產生了偶氬化合物難溶 化層102 °符號103表示原本應該溶解的曝光部分。 在此狀態下進行顯像液供給時，由於曝光部分1 〇3與 顯像液反應的速度比未曝光部分1 〇 1的快，且被曝光部分 103的溶解速度變快’因此在供給顯像液的初期，也就是 在反應的初期狀態中’在曝光部分103的表面同樣也形成 一層因與碱性的顯像液反應而產生的很薄的偶氮化合物難 溶解層104。 如上所述，由於在曝光部分103表面形成了難溶解薄 層104 ’因此會造成顯像速度減慢，未曝光部分内部發生 溶解，使顯像的均一性發生紊亂^ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I I - I--pll — l— lv ' I I I II — — I——— — — — — — ^Γν '- (請先Μ讀背面之注意事項再填寫本頁) 6 經濟部智慧財產局員工消費合作社印繫 A7 B7___ 五、發明說明（4 ) 本發明就是基於上述出現的現象，在進行一定程度的 顯像處理後’並且在積極地除去上述曝光部分1〇3表面形 成的難溶解薄層1 〇4的同時，繼續進行顯像處理的方法。 採用這種方法’在除去上述難溶解的薄層以外，還消除了 在溶解部分與顯像液的反應而產生的局部濃度變化，從而 進行均一的顯像。即採用：以比第1速度快的第2速度向被 處理體喷射顯像液、以比第1角度小的第2角度向被處理體 喷射顯像液、向被處理體噴射顯像液的同時喷吹氣體、向 被處理體噴射顯像液的同時利用攪拌鏟對顯像液實行攪拌 、或採用上述的不同組合方式，在除去上述曝光部分1〇3 表面形成的難溶解薄層1 〇4的同時進行顯像處理。 [發明的實施形態] 下面，根據附圖對本發明的實施形態加以說明。 第1圖為與本發明第一實施形態相關的塗附·顯像處 理系統的斜視圖。4484 73 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (3) The imaging device of the present invention has: a holding means for holding the object to be processed; A spraying means for injecting a developing liquid into a processing body; a spraying means for injecting a gas to the object to be processed; a control means for injecting a gas while injecting a developing liquid using the above-mentioned jetting means and injecting a developing liquid using the above-mentioned jetting means = The developing device of the present invention includes: a holding means for holding the object to be processed; a spraying means for spraying a developing solution on the object to be processed that is held by the holding means; A stirring shovel; a control means for agitating the developing solution with the stirring blade after the developing solution is ejected by using the spraying means, and the developing solution is ejected by using the spraying means. Fig. 10 is a schematic diagram illustrating a developing mechanism, which shows a state where a positive type photoresist layer 100 is formed after the surface of the film 105 on the glass substrate G is exposed. The symbol 1 0 1 indicates an unexposed portion. In this portion, a part of the photoresist layer 1 100 reacts with a basic developing solution to generate an insoluble layer of an argon compound. 102 ° The symbol 103 indicates that it should be dissolved. Exposure part. When the developing solution is supplied in this state, the exposed portion 1 03 reacts with the developing solution faster than the unexposed portion 1 01 and the dissolution rate of the exposed portion 103 becomes faster. In the initial stage of the liquid, that is, in the initial state of the reaction, a thin azo compound insoluble layer 104 formed on the surface of the exposed portion 103 by reaction with a basic developing solution is also formed. As mentioned above, the hardly soluble thin layer 104 'is formed on the surface of the exposed portion 103, which will cause the development speed to slow down, and the interior of the unexposed portion will dissolve, causing the uniformity of the development image to be disturbed. (CNS) A4 specification (210 X 297 mm) II-I--pll — l— lv 'III II — — I — — — — — — — ^ Γν'-(Please read the precautions on the back first (Fill in this page) 6 Department of Economics, Intellectual Property, Employees' Cooperatives, Department of Printing, A7 B7___ 5. Description of the Invention (4) The present invention is based on the above-mentioned phenomenon, after a certain degree of development processing, and actively removes the above exposure Part of the 103 surface formed by the insoluble thin layer 104, while continuing the development process. In this method ', in addition to the thin layer which is difficult to dissolve, the local concentration change caused by the reaction between the dissolved portion and the developing solution is eliminated, and a uniform development is performed. That is, a method in which the developer is ejected to the subject at a second speed faster than the first speed, the developer is ejected to the subject at a second angle smaller than the first angle, and the developer is ejected to the subject. Simultaneously spray gas, spray the developing solution on the subject while stirring the developing solution with a stirring blade, or use the different combinations described above to remove the hardly soluble thin layer 1 formed on the surface of the exposed portion 103. 4 simultaneous development processing. [Embodiments of the invention] Embodiments of the invention will be described below with reference to the drawings. Fig. 1 is a perspective view of an application and development processing system according to a first embodiment of the present invention.
第1圖所不，在這個塗附.顯像處理系統1的前面，設 有向塗附·顯像處理系統1實施玻璃基板G搬進搬出的裝 載·卸載部2。在裝載•卸載部2上，設有以規定位置排列 的可收納如25枚基板G的基板箱c的裝載台3、和用於從基 板相C中取出將要處理的玻璃基板G或者將在塗附•顯像 處理系統1中處理好的玻璃基板G送回基板箱c的裝載•卸 載裝置4 =圖中所示的裝載•卸載裝置4是利用本體5沿基 板箱C的排列方向移動，然後由本體5上裝配的板片狀的 托架6將玻璃基板G從基板_c中取出，或者將玻璃 G 本紙張（度適财關家標準（CNS)A4規格C 297公^ II I — —— — — — — — — — ' I ---I I I 訂 -------- (請先閱讀背面之泫意事項再填寫本頁>As shown in Fig. 1, a loading / unloading unit 2 for carrying in and out of the glass substrate G to the coating and developing processing system 1 is provided in front of the coating and developing processing system 1. The loading / unloading unit 2 is provided with a loading table 3 arranged in a predetermined position and capable of storing, for example, a substrate box c of 25 substrates G, and a glass substrate G to be processed from the substrate phase C or to be coated. Attachment • Loading / unloading device 4 of the glass substrate G processed in the development processing system 1 and returning it to the substrate box c = the loading / unloading device 4 shown in the figure is moved by the main body 5 in the arrangement direction of the substrate box C, and The glass substrate G is taken out of the substrate _c by a plate-shaped bracket 6 mounted on the main body 5, or the glass G is a paper (CNS) A4 specification C 297 public II I — — — — — — — — — — — 'I --- III Order -------- (Please read the notice on the back before filling this page >
&、發明說明（5 ) 送入基板箱C中。另外’在托架6的兩側，設有調整並保 持玻璃基板G四角位置的調整構件7。 {請先Μ讀背面之沒意事項再填寫本頁) 在塗附•顯像處理系統1的中央部，沿長邊方向設有 走廊式的搬送通道10、11，這兩條搬送通道經由第1中轉 部12連在一條直線上。在搬送通道1〇、n的兩側，配有用 於對玻璃基板G實施各種處理的處理裝置。 在圖示塗附•顯像處理系統〗中，沿搬送通道1 〇的一 側’並列配有如2台可對玻璃基板G進行刷洗及高壓喷水 清洗的清洗裝置16。在搬送通道10的另一側，配有並列放 置的2台顯像裝置17’在顯像裝置17的旁邊，配有兩台以 上下層方式放置的加熱裝置18。 經濟部智慧財產局員工消費合作社印製 另外’搬送通道11的一側’配有分上下兩層形式安裝 的裝置，上層為用於對光阻液塗附前的玻璃基板G實施疏 水性處理的黏著性處理裝置20，黏著性處理裝置20的下層 為用於冷卻的冷卻裝置21。在黏著性處理裝置20與冷卻裝 置21的旁邊’安裝有兩列以上下兩層方式配置的加熱裝置 22。另外’在搬送通道1丨的另一側，配有在玻璃基板g表 面塗附光阻液並在其表面形成光阻膜的光阻液塗附裝置23 。靠近塗附裝置23的一側，經由第2中轉部28，配有對玻 璃基板G上所形成的光阻膜，以所規定微細圖案實施曝光 的曝光裝置（圖中未表示）。在第2中轉部28上，除配有將 玻璃基板G搬入、搬出的托架29外，還配有中轉台30。 以上所述的各種處理裝置15〜18以及20〜23，全部配 置在搬送通道10、11的兩侧，且玻璃基板G的進出口均朝 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消费合作社印製 A7 _____B7 五、發明說明（6 ) 向内側。第1搬送裝置2 5沿搬送通道1 〇移動，完成在裝載 .卸載部2、各處理裝置15〜18以及第1中轉部12間的玻璃 基板G搬送工作。第2搬送裝置26沿搬送通道〗3移動，完 成在第1中轉部12，第2中轉部28以及各處理裝置20〜23間 的玻璃基板G搬送工作。 搬送裝置25、26，分別配有一對上、下機械手27、27 。採用了這種構造，可以在對各種處理裝置15〜18以及2〇 〜23進行存取操作時，利用其中一個機械手27，從各種處 理裝置的工作室中’將處理完的玻璃基板G搬出：利用另 一個機械手27，將待處理的玻璃基板g搬入工作室。 第2、3、4囿分別為上述顯像裝置17的斷面圖、平面 圖、側面圖。 如圊所示’在顯像裝置1 7的中心部，設有用馬達3丨驅 動使其旋轉並上下移動的旋轉吸盤32。在該旋轉吸盤32上 面’托*持有玻璃基板G，並且利用真空吸附等手段使玻璃 基板G保持在水平的狀態。 在該旋轉吸盤32下面’配置有下容器33及罩在旋轉吸 盤32外周的外罩34，和處在下容器33與外罩34之間的内罩 35 = 外罩34與内罩35利用連接構件36相連接。外罩34與内 罩3 5利用控制部3 7向升降液壓缸3 8發布指令，實現升降動 作。外罩34與内罩3 5的上部，各自向内側斜上方傾斜，外 罩34的上開口部直徑比内罩35的上開口部直徑大，且它們 的上開〇部直徑均大於處於水平狀態的玻璃基板G .以便 本紙張尺度適用中國國家標準（CNTS)A4規格（2〗0 X 297公釐） --------- - - ---敦-------丨訂--------線 C靖先閱讀背面之注意事項再填寫本頁> 9 4484 73 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（7 ) 使保持在水平狀態的玻璃基板G能夠穿過這些上開口降至 罩内。 下容器33由從中心部向外側斜下方傾斜的傾斜部39及 在其外周配置的底盤40组成。底盤40上設有筒狀壁42，且 筒狀壁42介於外罩34與内罩35之間。内罩35的傾斜部越過 筒狀壁42的高度’並延伸到筒狀壁42的外周。藉此，經内 罩35的傾斜部流下的液體’被導入由底盤4〇和筒狀壁42割 開的外側室43内。 在下容器33的傾斜部39内側，設有排出罩内氣體的排 氣口44’排氣口44與排氣泵相連（圖中省略在由底盤4〇 之筒狀壁42所割開的内側室45下部，設有排液口46，外側 室43的下部設有排液口 47。排液口 46利用回收管48與對使 用過的顯像液進行再生處理的再生處理機構49相連。再生 處理機構49是由：氣液分離機構50;及，對使用過的顯像 液進行除雜質處理的雜質除去機構51所組成，並與顯像液 收容罐52相連。排液口 47與回收罐相連（圖中未表示）。 在罩的上方一側，設有對玻璃基板G表面喷塗顯像液 的顯像液喷塗裝置53 ;另一側，設有用洗淨液對玻璃基板 G表面實施喷射洗淨處理的洗淨裝置54，及設有向玻璃基 板G表面實施漂洗液供給的漂洗液供給裝置55。在罩上部 的前方與後方，設有移動軌道56、57。顯像液喷塗裝置53 及高壓洗淨裝置54 ’分別裝有移動用馬達58、59。利用控 制部37驅動馬達58、59，從而實現顯像液喷塗裝置53及高 壓洗淨裝置54沿罩上部移動軌道的移動。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） I1IIIIIIIII1 — — —— — — II 1111111 V (請先W讀背面之注意事項再填寫本頁) 10 A7 B7 五、發明說明（8 顯像液噴塗裝置53受控制部37的控制，經由泵62，將 顯像液存儲罐52中的顯像液抽出’實施顯像液供給。另外 ，同壓洗淨裝置54受控制部37的控制，經由泵64，將洗淨 液存儲罐6:>中的洗淨液抽出，實施洗淨液供給。同樣’漂 洗液供給裝置55也受控制部37的控制，經由泵66 ,將漂洗 ’夜存儲罐67中的漂洗液抽出，實施漂洗液供給。 如第2及4圖所示，顯像液噴塗裝置53設有在水平固定 臂68上並排安裝的多個顯像液噴嘴乃、以及在該等顯像液 噴嘴71的旁邊及其行走方向上安裝的多個氣體噴嘴72。 虱體噴嘴72用於向保持在旋轉吸盤上的玻璃基板G表 面噴射惰性氣體，如：氮氣。 下面對操作動作進行說明。 第5圖為顯像裝置17的處理流裎圖。 玻璃基板G被搬入顯像裝置π内，吸附在旋轉吸盤32 上的玻璃基板G開始下降，這時外罩34與内罩35被升至最 高的位置，顯像液噴塗裝置53在被移到玻璃基板G中心附 近後’處於靜止狀態。之後，使吸附在旋轉吸盤32上的玻 璃基板G旋轉，如第6(a)圖所示，由顯像液喷塗裝置53上 的顯像液喷嘴71，以第一噴出速度向玻璃基板(5噴塗顯像 液（步驟50丨）。此時，喷出氮氣的空氣噴嘴72處於停止狀 態。另外，飛濺到玻璃基板G外的顯像液撞到内罩35内側 上.經排液口 46回收再利用。 經過特定時間後，如第6(b)圖所示.由顯像液噴塗裝 置53上的顯像液噴嘴71，以比第一喷出速度快的第二噴出 -----------I I ^---------------^ C請先Μ讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印衮 1) 4484 73 經濟部智慧財產局貝工消費合作社印數 A7 B7 五、發明說明（9 ) 速度向玻璃基板G喷塗顯像液，與此同時開始由空氣喷嘴 72噴出氮氣（步驟502)。 接著’使吸附在旋轉吸盤32上的玻璃基板G下降，且 ’外罩34與内罩35降至最低的位置。而且，使吸附在旋轉 银盤32上的玻璃基板G保持在靜止狀態，此時洗淨裝置54 沿玻璃基板G長邊方向掃描，並由洗淨裝置54向玻璃基板 G噴射洗淨液（步驟503)。飛濺到玻璃基板G外的洗淨液， 經内罩3 5與外罩34之間的排液口 47排出並廢棄。 然後，漂洗液供給裝置5 5被移到玻璃基板G的中心附 近，之後’使吸附在旋轉吸盤32上的玻璃基板G旋轉，由 漂洗液供給裝置55對玻璃基板G實施漂洗處理（步驟504 )。另外，飛濺到玻璃基板G外的漂洗液，經内罩35與外 罩34之間的排液口 47排出並廢棄。 最後’將漂洗液供給裝置55移到罩外之後，使吸附在 旋轉吸盤32上的玻璃基板g高速旋轉，實施甩干處理（步 驟 505)。 如果採用上述的實施形態，在顯像處理工序中，由於 採用了首先利用顯像液喷嘴71以第一噴出速度向玻璃基板 G喷塗顯像液，之後’利用顯像液噴嘴7〖以比第一喷出速 度快的第二喷出速度向玻璃基板G喷塗顯像液，同時，利 用空氣喷嘴72喷出氮氣的步驟，因此，能夠達到除去曝光 部分103表面黏附的難溶解薄膜1〇4(如第1〇圖所示），同時 實現顯像處理。而且能夠提高顯像速度及顯像的均勾性。 另外’在上述顯像處理中，採用了使玻璃基板G旋轉 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） — — — ml — — — — —— illll — 1 ^·! — — —--I I ^ A V. {請先M讀背面之注意事項再填寫本頁) 12& Invention Description (5) is sent to the substrate box C. In addition, on both sides of the bracket 6, there are provided adjustment members 7 for adjusting and maintaining the four corner positions of the glass substrate G. {Please read the unintentional matter on the back before filling in this page.) In the center of the coating and development processing system 1, there are corridor-type transport channels 10 and 11 along the long side. The 1 transition section 12 is connected in a straight line. Processing devices for carrying out various processes on the glass substrate G are provided on both sides of the transport channels 10 and n. In the illustrated coating and development processing system, two cleaning devices 16 capable of brushing and high-pressure water jet cleaning of the glass substrate G are arranged in parallel along one side of the conveying path 10 ′. On the other side of the conveying path 10, there are provided two developing devices 17 'arranged side by side. Next to the developing device 17, two heating devices 18 are arranged on the upper and lower floors. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Another side of the conveying path 11 is equipped with two layers of upper and lower layers. The upper layer is used for hydrophobic treatment of the glass substrate G before the photoresist coating. The adhesive processing device 20 has a cooling device 21 for cooling the lower layer of the adhesive processing device 20. Next to the adhesive treatment device 20 and the cooling device 21, heating devices 22 arranged in two or more rows and two lower layers are installed. In addition, on the other side of the conveying path 1 丨, a photoresist liquid application device 23 for applying a photoresist liquid on the surface of the glass substrate g and forming a photoresist film on the surface is provided. An exposure device (not shown in the figure) for exposing the photoresist film formed on the glass substrate G to the predetermined fine pattern through the second intermediate portion 28 is provided on the side close to the coating device 23. In addition to the bracket 29 for carrying in and out the glass substrate G, the second intermediate section 28 is also provided with an intermediate table 30. The above-mentioned various processing devices 15 to 18 and 20 to 23 are all arranged on both sides of the conveying channels 10 and 11, and the import and export of the glass substrate G are adapted to the paper standard to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _____B7 V. Description of Invention (6) Inward. The first transfer device 25 moves along the transfer path 10 to complete the glass substrate G transfer between the loading / unloading section 2, the processing devices 15 to 18, and the first transfer section 12. The second transfer device 26 moves along the transfer path 3 and completes the glass substrate G transfer operation between the first relay section 12, the second relay section 28, and each of the processing devices 20 to 23. The conveying devices 25 and 26 are respectively provided with a pair of upper and lower manipulators 27 and 27. With this structure, when accessing various processing devices 15 to 18 and 20 to 23, one of the robots 27 can be used to 'unload the processed glass substrate G from the working room of each processing device. : Using another robot hand 27, carry the glass substrate g to be processed into the working room. Numbers 2, 3, and 4th are a cross-sectional view, a plan view, and a side view of the developing device 17, respectively. As shown in 圊 ', at the center of the developing device 17 is provided a rotary chuck 32 which is driven by a motor 3 丨 to rotate and move up and down. A glass substrate G is held on the top of the rotary chuck 32, and the glass substrate G is held horizontally by means such as vacuum suction. Below this rotary suction cup 32, a lower container 33 and an outer cover 34 covering the outer periphery of the rotary suction cup 32 and an inner cover 35 between the lower container 33 and the outer cover 34 are arranged. The outer cover 34 and the inner cover 35 are connected by a connecting member 36. . The outer cover 34 and the inner cover 35 use the control unit 37 to issue a command to the lifting hydraulic cylinder 38 to realize the lifting operation. The upper portions of the outer cover 34 and the inner cover 35 are inclined obliquely upwards inward. The diameter of the upper opening of the outer cover 34 is larger than the diameter of the upper opening of the inner cover 35, and the diameters of the upper openings are larger than the glass substrate in a horizontal state. G. In order for this paper size to apply the Chinese National Standard (CNTS) A4 specification (2〗 0 X 297 mm) -------------- -------------- Order- ------ Line C Jing first read the precautions on the back before filling in this page> 9 4484 73 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (7) Glass to keep it horizontal The substrate G can be lowered into the cover through these upper openings. The lower container 33 is composed of an inclined portion 39 inclined obliquely downward from the center to the outside, and a chassis 40 disposed on the outer periphery thereof. The chassis 40 is provided with a cylindrical wall 42, and the cylindrical wall 42 is interposed between the outer cover 34 and the inner cover 35. The inclined portion of the inner cover 35 extends over the height of the cylindrical wall 42 and extends to the outer periphery of the cylindrical wall 42. Thereby, the liquid 'flowing down through the inclined portion of the inner cover 35 is introduced into the outer chamber 43 separated by the chassis 40 and the cylindrical wall 42. Inside the inclined portion 39 of the lower container 33, an exhaust port 44 'for exhausting the gas in the hood is provided, and the exhaust port 44 is connected to an exhaust pump (not shown in the figure, the inner chamber cut by the cylindrical wall 42 of the chassis 40) The lower part 45 is provided with a liquid discharge port 46, and the lower part of the outer chamber 43 is provided with a liquid discharge port 47. The liquid discharge port 46 is connected to the regeneration processing mechanism 49 for regenerating the used developing solution through a recovery pipe 48. Regeneration processing The mechanism 49 is composed of: a gas-liquid separation mechanism 50; and, an impurity removing mechanism 51 for removing impurities from the used developing solution, and is connected to the developing solution storage tank 52. The drain port 47 is connected to the recovery tank (Not shown in the figure). On the upper side of the cover, a developing liquid spraying device 53 for spraying a developing liquid on the surface of the glass substrate G is provided; on the other side, a cleaning liquid is provided on the surface of the glass substrate G. A cleaning device 54 that performs a spray cleaning process, and a rinsing liquid supply device 55 that supplies a rinsing liquid to the surface of the glass substrate G. Moving tracks 56, 57 are provided in front and rear of the upper part of the cover. Coating device 53 and high-pressure cleaning device 54 'are each equipped with a moving motor 5 8. 59. The control unit 37 is used to drive the motors 58 and 59, thereby realizing the movement of the developing liquid spraying device 53 and the high-pressure cleaning device 54 along the moving track of the cover. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 public love) I1IIIIIIIII1 — — — — — — II 1111111 V (please read the precautions on the back before filling out this page) 10 A7 B7 V. Description of the invention (8 developer spraying device 53 controlled part 37 The control is performed by pumping out the developing solution from the developing solution storage tank 52 via the pump 62 to supply the developing solution. The co-pressure washing device 54 is controlled by the control unit 37 and the washing solution is supplied via the pump 64. The washing liquid in the storage tank 6: > is drawn out, and the washing liquid is supplied. Similarly, the 'rinsing liquid supply device 55 is also controlled by the control unit 37, and the washing liquid in the rinsing' night storage tank 67 is pumped out via the pump 66. As shown in Figs. 2 and 4, the developing solution spraying device 53 is provided with a plurality of developing solution nozzles installed side by side on the horizontal fixed arm 68, and the developing solution nozzles 71 A plurality of gas nozzles 72 installed in the side and its walking direction. The body nozzle 72 is used to inject an inert gas, such as nitrogen gas, onto the surface of the glass substrate G held on the rotating chuck. The operation is described below. FIG. 5 is a process flow diagram of the developing device 17. The glass substrate G is When it is carried into the developing device π, the glass substrate G adsorbed on the rotary chuck 32 starts to descend. At this time, the outer cover 34 and the inner cover 35 are raised to the highest position. After the developing liquid spraying device 53 is moved near the center of the glass substrate G, 'It is in a stationary state. Then, the glass substrate G adsorbed on the rotary chuck 32 is rotated. As shown in FIG. 6 (a), the developing solution nozzle 71 on the developing solution spraying device 53 The spraying speed sprays the imaging liquid onto the glass substrate (5) (step 50). At this time, the air nozzle 72 that ejects nitrogen is stopped. In addition, the developing liquid splashed out of the glass substrate G hits the inside of the inner cover 35, and is recovered and reused through the liquid discharge port 46. After a certain time has elapsed, as shown in FIG. 6 (b). From the developer nozzle 71 on the developer spraying device 53, a second ejection is performed at a faster speed than the first ejection speed -------- --- II ^ --------------- ^ C Please read the precautions on the back before filling out this page) Seal of the Consumer Consumption Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1) 4484 73 Economy The Intellectual Property Bureau of the Ministry of Intellectual Property, Shellfish Consumer Cooperatives Co., Ltd. Printed A7 B7 V. Description of the Invention (9) The glass substrate G is sprayed with the developing liquid at a speed, and at the same time, the nitrogen gas is ejected from the air nozzle 72 (step 502). Next, "the glass substrate G adsorbed on the rotary chuck 32 is lowered, and the outer cover 34 and the inner cover 35 are lowered to the lowest position. Furthermore, the glass substrate G adsorbed on the rotating silver disc 32 is kept in a stationary state. At this time, the cleaning device 54 scans the glass substrate G in a long side direction, and the cleaning device 54 sprays a cleaning liquid onto the glass substrate G (step 503). The washing liquid splashed out of the glass substrate G is discharged through a liquid discharge port 47 between the inner cover 35 and the outer cover 34 and discarded. Then, the rinsing liquid supply device 55 is moved to the vicinity of the center of the glass substrate G, and then the glass substrate G adsorbed on the rotary chuck 32 is rotated, and the glass substrate G is rinsed by the rinsing liquid supply device 55 (step 504) . The rinsing liquid splashed out of the glass substrate G is discharged through a liquid discharge port 47 between the inner cover 35 and the outer cover 34 and discarded. Finally, after the rinse liquid supply device 55 is moved outside the cover, the glass substrate g adsorbed on the rotary chuck 32 is rotated at a high speed to perform a spin-drying process (step 505). If the above-mentioned embodiment is adopted, in the developing processing step, since the developing liquid nozzle 71 is first used to spray the developing liquid on the glass substrate G at the first discharge speed, and then the developing liquid nozzle 7 is used. The step of spraying the developing liquid onto the glass substrate G at the second jetting speed with the first jetting speed and spraying the nitrogen gas with the air nozzle 72 at the same time makes it possible to remove the insoluble film 1 stuck on the surface of the exposed portion 103. 4 (as shown in Fig. 10), and simultaneously realize development processing. In addition, the development speed and the uniformity of development can be improved. In addition, in the above development process, the glass substrate G is rotated. The paper size is adapted to the Chinese National Standard (CNS) A4 specification (210 X 297 public love) — — — ml — — — — — — illll — 1 ^ · ! — — — --II ^ A V. {Please read the notes on the back before filling this page) 12
經濟部智慧財產局員工消費合作社印製 的同時喷塗顯像液的方法果採用使玻璃基板G處於靜 止狀態’利用顯像液噴塗裝置68在靜止的玻璃基板G上進 行掃描喷塗的方法也是可行的。 下面’對第二實施形態進行說明。 第7圖為與第二實施形態有關的說明圖。 如第7圖所示在第一實施形態中，顯像液嗜嘴<71能 夠轉動這一點與第一實施形態不同。於此，顯像處理中， 玻璃基板G處於靜止狀態，顯像液噴塗裝置68在靜止的玻 璃基板G上進行掃描噴塗。 接著，如第7(a)圖所示’在顯像處理工序中，首先使 顯像液喷嘴71與玻璃基板G呈大約9〇。角的狀態，且用該 顯像液喷嘴71向玻璃基板g噴塗顯像液。 之後’如第7(b)圖所示’使顯像液噴嘴7丨轉動，使其 與玻璃基板G(玻璃基板的前進方向>呈大約約45。角的狀 態，且用該顯像液噴嘴7丨向玻璃基板(3喷塗顯像液。 如-果採用上述的實施形態的話，在顯像處理工序中， 由於採用了首先利用與玻璃基板G呈第一角度的顯像液噴 嘴71喷塗顯像液，之後，利用與玻璃基板G呈第二角度的 且第二角度小於第一角度的顯像液喷嘴7丨噴塗顯像液的步 驟’因此’能夠達到除去曝光部分1〇3表面黏附的薄膜1〇4( 如第10圖所示），同時實現顯像處理。而且能夠提高顯像 速度及顯像的均勻性= 下面，對第三實施形態進行說明。 第8圖為與第三實施形態有關的說明圖。 本纸張义度適用中國國家標準（CNS)A4規格（210x 297公釐） ------^----------------- (請先閲讀背面之注意事項再填寫本頁) 13 4484 73 A7 B7 五、發明說明（11) 如第8圖所示，在第三實施形態中，顯像液喷嘴71的 旁邊裝有可升降的攪拌鏟73,該攪拌鏟用於攪拌玻璃基板 G上的顯像液。當攪拌鏟73下降時，它的端部與玻璃基板 G表面上的顯像液相接觸而不與玻璃基板g接觸。 而且’如第8(a)圖所示，在顯像處理工序中，首先在 使攪拌鏟73處於上升狀態的情況下，由顯像液噴嘴71向玻 璃基板G喷塗顯像液。 之後’如第8(b)圖所示’使攪拌鏟73下降並與玻璃基 板G上的顯像液接觸’由顯像液噴嘴7〖向玻璃基板^噴塗 顯像液。 如果採用上述的實施形態的話，在顯像處理工序中， 由於採用了首先由顯像液噴嘴71向玻璃基板G噴塗顯像液 ，之後，由顯像液噴嘴71向玻璃基板ο喷塗顯像液的同時 ，利用授拌鏟73搜拌顯像液的步驟，因此，能夠達到除去 曝光部分103表面黏附的難溶解薄膜丨〇4(如第1〇圖所示）， 同時實現顯像處理。並且能夠提高顯像速度及顯像的均勻 性。 此外，本發明並不限於上述實施形態。 經濟部智慧財產局員工消費合作社印製 (請先Μ讀背面之注t事項再填寫本頁) 例如，基板並不僅局限於LCD基板，本發明同樣也適 用半導體晶圓等基板。 另外，有關顯像液喷嘴，如果採用如第9圖所示的£2 型噴嘴91 (在開口處裝有—排噴出孔的喷嘴）也是可行的 〇 下面，對第四實施形態進行說明。 本紙張尺度過用中國國家標举·S)A4祕⑵0 x 297公€ 14 經濟部智慧財產局員工消費合作社印裳 A7 ---------— R7____ 五、發明說明（12 ) 第π圖為與第四實施形態有關的說明圖。 如第11圖所示，在第四實施形態中，顯像液噴塗裝置 53上的顯像液噴嘴71向玻璃基板G表面噴塗顯像液的順序 3首先，第一工序，使顯像液噴塗裝置53從第ll(a)圖所 不的位置按箭頭所指的又方向移動，並將顯像液噴塗裝置 w移到第11(b)圖所示的位置。此時，冑像液喷塗裝置 上的所有顯像液噴嘴71，均向第丨顯像液供給區域，如整 個基板表面喷塗顯像液。 之後，在第二工序，使顯像液噴塗裝置53從第u(c) 圖所示的位置按箭頭所指的X方向移動，並㈣像液” 裝置53移到第1物圖所示的位置。此時，使顯像液喷塗 裝置53上的顯像液喷嘴71的其中一部分喷嘴，例如，僅使 用在⑽區域的顯像液噴嘴噴塗顯像液，而在198區域的顯 像液嘴嘴則不喷塗顯像液„利用選定的顯像液喷嘴區域及 顯像液嗔塗的時機，在比上述第1顯像液供給區域范圍狹 小的區域内，例如，僅在玻璃基板⑽中央區域喷塗 液。 α 述，如果在部分區域内分數次噴塗顯像液 如在採用喷塗2遍顯像液時，m域上第2遍喷塗的蔡 液’由於表面張力等的作用，向玻璃基板〇周邊方心 二擴散。因此’能夠達到除去曝光部㈣3表面黏附* 溶解薄膜104(如第1G圖所示）’同時實現顯像處理。立 還旎夠提高顯像速度及顯像的均勻性= -------------ί I ---—訂--— — —— — — — 1 (請先閱讀背面之注意事項再填寫本頁) 另外 '作為促進攪拌效果的方法之一' 如第肖The method of spraying the developing solution while printing by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs adopts the method of making the glass substrate G in a stationary state. The method of scanning and spraying on the stationary glass substrate G using the developing solution spraying device 68 is also used. feasible. Next, a second embodiment will be described. Fig. 7 is an explanatory diagram related to the second embodiment. As shown in Fig. 7, the first embodiment is different from the first embodiment in that the developing solution mouthpiece < 71 can be rotated. Here, in the developing process, the glass substrate G is in a stationary state, and the developing liquid spraying device 68 performs scanning coating on the stationary glass substrate G. Next, as shown in Fig. 7 (a) ', in the developing process step, the developing liquid nozzle 71 and the glass substrate G are first set to approximately 90 °. And the developing liquid is sprayed on the glass substrate g by the developing liquid nozzle 71. Then, as shown in FIG. 7 (b), the developing liquid nozzle 7 is rotated so that the developing liquid nozzle 7 and the glass substrate G (the direction of advancement of the glass substrate) are at an angle of about 45 °, and the developing liquid is used. The nozzle 7 sprays the developing liquid onto the glass substrate (3. If the above-mentioned embodiment is adopted, in the developing processing step, since the developing liquid nozzle 71 is first used, the developing liquid is at a first angle with the glass substrate G. The developer is sprayed, and then the developer is sprayed with the developer liquid nozzle 7 at a second angle to the glass substrate G and the second angle is smaller than the first angle. The surface-adhered film 104 (shown in Fig. 10) realizes the development processing at the same time. Moreover, it can improve the development speed and the uniformity of the development = The third embodiment will be described below. An explanatory diagram related to the third embodiment. The meaning of this paper applies to the Chinese National Standard (CNS) A4 specification (210x 297 mm) ------ ^ ---------------- -(Please read the notes on the back before filling this page) 13 4484 73 A7 B7 V. Description of the invention (11) As shown in Figure 8 In the third embodiment, an elevating stirring blade 73 is provided next to the developing solution nozzle 71, and the stirring blade is used for stirring the developing solution on the glass substrate G. When the stirring blade 73 is lowered, its end portion and The developing liquid phase on the surface of the glass substrate G is in contact with the glass substrate g without being in contact with the glass substrate g. As shown in FIG. 8 (a), in the development processing step, first, the stirring blade 73 is raised. The developing liquid is sprayed on the glass substrate G from the developing liquid nozzle 71. Then, as shown in FIG. 8 (b), the stirring blade 73 is lowered and brought into contact with the developing liquid on the glass substrate G. The nozzle 7 sprays a developing solution on the glass substrate ^. If the above-mentioned embodiment is adopted, in the developing processing step, since the developing solution is first sprayed on the glass substrate G from the developing solution nozzle 71, While the imaging liquid nozzle 71 sprays the imaging liquid on the glass substrate, the step of searching for the imaging liquid with the mixing blade 73 is used, so that it is possible to remove the hardly soluble film adhered on the surface of the exposed portion 103. (4) 〇 shown in the figure), while realizing development processing, and can improve Image speed and uniformity of development. In addition, the present invention is not limited to the above embodiments. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (please read the note on the back before filling out this page) For example, the substrate is not only The invention is also limited to LCD substrates, and the present invention is also applicable to substrates such as semiconductor wafers. In addition, as for the developing liquid nozzle, if a £ 2 type nozzle 91 as shown in FIG. 9 is used (a nozzle with a row of ejection holes is installed at the opening). ) It is also feasible. Below, the fourth embodiment will be described. This paper has been marked by the Chinese national standard. S) A4 secret 0 x 297 public € 14 Yin Sang A7, Consumer Consumption Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs ---- -----— R7____ 5. Description of the invention (12) Figure π is an explanatory diagram related to the fourth embodiment. As shown in FIG. 11, in the fourth embodiment, the developing solution nozzle 71 on the developing solution spraying device 53 sprays the developing solution onto the surface of the glass substrate G. 3 First, the first step is to spray the developing solution. The device 53 is moved from the position shown in FIG. 11 (a) in the direction indicated by the arrow and moves the developing liquid spraying device w to the position shown in FIG. 11 (b). At this time, all the developing liquid nozzles 71 on the imaging liquid spraying device spray the developing liquid to the first developing liquid supply area, such as the entire substrate surface. After that, in the second step, the developing liquid spraying device 53 is moved from the position shown in the u (c) figure in the X direction indicated by the arrow, and the imaging liquid device 53 is moved to the one shown in the first object picture. At this time, a part of the nozzles of the developing solution nozzle 71 on the developing solution spraying device 53 is sprayed with the developing solution, for example, using the developing solution nozzle only in the ⑽ region, and the developing process is performed in the 198 region. The liquid nozzle does not spray the imaging liquid „Using the selected imaging liquid nozzle area and the timing of the imaging liquid coating, in a narrower area than the first imaging liquid supply area, for example, only on the glass substrate ⑽Spray liquid in the central area. α said that if the imaging liquid is sprayed in several times in a part of the area, for example, when the imaging liquid is sprayed twice, the Cai liquid sprayed on the second pass in the m domain is applied to the periphery of the glass substrate due to surface tension and the like. Square heart II spread. Therefore, 'the surface adhesion of the exposed part ㈣3 * can be removed *, and the dissolving film 104 (as shown in FIG. 1G)' can be simultaneously developed. It is also enough to improve the development speed and development uniformity = ------------- ί I ----- Order --------1 (Please read the back first (Please note this page before filling out this page) In addition, 'as one of the methods to promote the effect of stirring' as Di Shao
15 A7 B7 4484 73 五、發明說明（ ，在旋轉吸盤32的内部裝入壓電元件202，此壓電元件202 與作為電力供給裝置的直流電源203連接。 以控制直流電源203為例，如第13圖所示，使該電源 從上述第一工序開始經過第二工序直至整個顯像處理過程 結束之間的規定時間段内處於ON狀態。 電源開始ON的時間，可以根據的處理過程條件的不 同採取對應的開始時機，從而促進攪拌的效果。如：可以 疋在第一工序後及/或第二工序後、也可以是在第一工序 途中及/或第二工序途中的指定時間、還可以是在第—工 序則及/或第二工序前使電源處於ON的狀態。 以下，對有關攪拌的其他實施形態進行說明。 如第14圓所示，將絕緣狀態的第〗電極2〇6埋入旋轉吸 盤32内，將第2電極207配置於玻璃基板〇的上方，連接作 為電力供給裝置的交流電源2〇8至該等電極。 該交流電源208的工作時序與上述時序相同，根據對 應玻璃基板G的處理過程而設定的。利用該方法所產生的 電场’能夠達到與上述同樣的授拌效果。另外，並不限於 利用電場的方法，也可利用磁場進行攪拌。 以下，對有關櫈拌的另一實施形態進行說明。 如第15圖所示，該撥拌方法是在第2工序後，將旋轉 吸盤3!按箭頭所指的方向轉㈣角。該轉動可以按正反方 向轉動A可以僅按一個方向轉動。利用該方法進行授掉 可以達到和上述同樣的效果。另外，也可以在直線方向按 箭頭所指的Y方向運動而進行攪掉。 1----".1------訂---i I ί請先W讀背面之注$項再填寫本頁> 線r 經濟部智慧財產局員工消費合作社印¾ 16 A7 A7 經濟部智慧財產局員Η消費合作社印製 五、發明說明（！4 以下，對有關攪拌的另一實施形態進行說明。 如第16圖所示，該搜拌方法是在第2工序後，利用振 動器在玻璃基板G的下方位置接近基板。例如，使帶有超 音波振子的振動板210，接近玻璃基板〇的其中一部分區 域，如周邊區域。藉此，有促進處於如第2工序中的、在 玻璃基板G中央區域的顯像液向周邊區域的擴散及攪拌效 果，亚彌補和提高顯像困難部分的顯像處理效果。從而能 夠達到對玻璃基板G整個表面進行均勻的顯像處理。 根據以上所說明的本發明，在進行一定程度的顯像處 理之後，利用下述方法：以比第i噴出速度快的第2噴出速 度喷出顯像液、或以比第β出角度小的第2喷出角度喷出 顯像液、或在對被處理體喷塗顯像液的同時喷射氣體、或 在對被處理體噴塗顯像液的同時利用攪拌鏟攪拌顯像液、 或組合上述方式，積極地除去曝光表面的黏著的難溶解薄 膜，同時進行顯像處理’且提高顯像速度及顯像處理的均 勻性。 [圖式之簡要說明] 第1圓為與本發明的第1實施形態相關的塗附.顯像處 理系統的斜視圖。 第2圖為第1圖所示的顯像裝置的斷面圖。 第3圖為第1圖所示的顯像裝置的平面圖。 第4圖為第丨圖所示的顯像裝置的側面圖。 第）圖為第一實施形態的處理流程圖。 第6圖為與第丨貫施形態相關的動作說明圖 1? — lit — — — — — — — — — — — — — — — II ^ ' — — — — — I! <請先閱讀背面之注意事項再填寫本頁> ' 44847315 A7 B7 4484 73 V. Description of the invention (, a piezoelectric element 202 is installed inside the rotating chuck 32, and this piezoelectric element 202 is connected to a DC power source 203 as a power supply device. Take the control of the DC power source 203 as an example, as As shown in Figure 13, the power supply is turned on for a predetermined period of time from the first step to the second step until the end of the entire development processing process. The time when the power supply is turned on can be based on different processing process conditions Take the corresponding start timing to promote the effect of stirring. For example, it can be after the first step and / or after the second step, or at a specified time during the first step and / or the second step, or The power supply is turned on before the first step and / or the second step. Hereinafter, other embodiments related to the stirring will be described. As shown in the fourteenth circle, the second electrode 206 in an insulated state is buried. The second electrode 207 is placed above the glass substrate 0 into the rotating chuck 32, and an AC power source 208 serving as a power supply device is connected to the electrodes. Operation of the AC power source 208 The sequence is the same as the above sequence, and is set according to the processing process corresponding to the glass substrate G. The electric field generated by this method can achieve the same mixing effect as above. In addition, it is not limited to the method using an electric field, and it can also be used. Magnetic field stirs. Next, another embodiment of stool mixing will be described. As shown in FIG. 15, after the second step, the stirring method is to rotate the suction cup 3! In the direction indicated by the arrow. The rotation can be turned in the forward and reverse directions. A can be turned in only one direction. Using this method, the same effect can be achieved as the above. In addition, you can also move in the straight direction and move in the Y direction indicated by the arrow to stir. 1 ---- " .1 ------ Order --- i I ί Please read the note on the back and fill in this page first> Thread r Printed by the Consumer Consumption Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs ¾ 16 A7 A7 Printed by a member of the Intellectual Property Bureau of the Ministry of Economic Affairs and a Consumer Cooperative. V. Invention Description (! 4 Below, another embodiment of agitation is explained. As shown in Figure 16, the search and mixing method is after the second step. , Using a vibrator in glass The lower position of the glass substrate G is closer to the substrate. For example, the vibrating plate 210 with an ultrasonic transducer is brought closer to a part of the glass substrate 0, such as a peripheral region. This promotes the presence of glass in the second step as described above. The diffusion and stirring effect of the developing solution in the central region of the substrate G to the peripheral region can make up for and improve the development processing effect of the difficult part of the development. Thus, it can achieve uniform development processing on the entire surface of the glass substrate G. According to the above In the illustrated invention, after a certain degree of development processing is performed, the developing solution is ejected at a second ejection speed faster than the i-th ejection speed, or the second ejection is performed at a second ejection angle smaller than the β-th ejection speed. Spraying the developing solution at an angle, or spraying the gas while spraying the developing solution on the object, or stirring the developing solution with a stirring blade while spraying the developing solution on the object, or combining the above methods, actively It removes the adherent hardly soluble film on the exposed surface at the same time, and performs the development process at the same time, and improves the development speed and the uniformity of the development process. [Brief description of the drawings] The first circle is a perspective view of a coating and developing processing system according to the first embodiment of the present invention. Fig. 2 is a sectional view of the developing device shown in Fig. 1. Fig. 3 is a plan view of the developing device shown in Fig. 1. FIG. 4 is a side view of the developing device shown in FIG. (F) Figure is a processing flowchart of the first embodiment. Fig. 6 is a description of the operation related to the first embodiment. Fig. 1 — — lit — — — — — — — — — — — — — II ^ '— — — — — I! Please read the back Notes before filling out this page > '448473
第7圖為與第2實施形態相關的動作說明®。 第8圖為與第3實施形態相關的動作說明闽。 第9圖為本發明之一變形例子的斜視圊。 第10圖為說明發明原理的示意圖。 第11圖為與第4實施形態相關的動作說明圖 第12圖為有關攪拌的其他實施形態說明圖。 第13圖為第12圖的攪拌動作說明圖。 第14圈為有關攪拌的其他實施形態說明圖。 第15圖為有關攪拌的其他實施形態說明圊。 第16圖為有關攪拌的其他實施形態說明囷。 [符號說明] 經濟部智慧財產局員工消費合作社印數 1-··塗附.顯像處理系統 22…加熱裝置 2···裝載·卸載部 23…塗附裝置 3…裝載台 25、26…搬送裝置 4···裝載·卸載裝置 27…機械手 5…本體 28…第2中轉部 6…托架 29…托架 7…調整構件 30···中轉台 10、11…搬送通道 31…馬達 16…清洗裝置 32…旋轉吸盤 17…顯像裝置 33…下容器 18…加熱裝置 34…外單 20…黏著性處理裝置 3 5…内罩 21…冷卻裝置 36…連接構件 本紙張尺度適用中國國家標準（CNS)A4規格<210 X 297公釐） 18 -------------裝---------訂---------線 (請先閲讀背面.之泫t事項再填寫本頁) 4484 73 A7 經濟部智慧財產局員工消費合作社印*'1衣 五、發明說明（16 ) 37…控制部 38…升降液壓缸 39…傾斜部 40…底盤 42···筒狀壁 43…外側室 44."排氣口 45…内側室 4 6、47…排液口 48…回收—管 49…再生處理機構 50.··氣液處理機構 51…雜質除去機構 52…顯像液收容罐 53…顯像液喷塗裝置 54…洗淨裝置 55···漂洗液供給裝置 56、57…移動軌道 58、59···移動馬達 62、64、66…系 65…洗淨液儲存罐 67…漂洗液儲存罐 68···水平固定臂 71…現像液喷嘴Fig. 7 is an explanation of the operation according to the second embodiment. Fig. 8 is a diagram for explaining operations according to the third embodiment. Fig. 9 is a squint line of a modified example of the present invention. Fig. 10 is a schematic diagram illustrating the principle of the invention. Fig. 11 is an explanatory diagram of the operation related to the fourth embodiment. Fig. 12 is an explanatory diagram of another embodiment related to the stirring. FIG. 13 is an explanatory diagram of the stirring operation of FIG. 12. The fourteenth circle is an explanatory diagram of another embodiment regarding agitation. Fig. 15 is a diagram illustrating another embodiment of stirring. Fig. 16 is a diagram for explaining another embodiment of stirring. [Explanation of Symbols] Employee Cooperative Cooperative Stamp of the Intellectual Property Bureau of the Ministry of Economic Affairs 1- ·· Coating. Development Processing System 22… Heating Device 2 ··· Loading · Unloading Section 23… Coating Device 3… Loading Tables 25, 26… Transfer device 4 ... Loading / unloading device 27 ... Robot 5 ... Main body 28 ... Second relay section 6 ... Bracket 29 ... Bracket 7 ... Adjusting member 30 ... Transfer platform 10, 11 ... Transfer channel 31 ... Motor 16 ... Cleaning device 32 ... Rotary suction cup 17 ... Development device 33 ... Lower container 18 ... Heating device 34 ... Outer sheet 20 ... Adhesive processing device 3 5 ... Inner cover 21 ... Cooling device 36 ... Connecting member This paper size applies to China National Standard (CNS) A4 Specification < 210 X 297 mm) 18 ------------- Installation --------- Order --------- Line (Please read the items on the back. Please fill out this page before filling out this page.) 4484 73 A7 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs * '1. V. Invention Description (16) 37 ... Control unit 38 ... Lifting hydraulic cylinder 39 ... Tilt Section 40 ... Chassis 42 ... Tubular wall 43 ... Outer chamber 44. "Exhaust port 45 ... Inner chamber 4 6, 47 ... Drain port 48 ... Recovery-pipe 49 ... Regeneration process Structure 50 ... Gas-liquid processing mechanism 51 ... Impurity removing mechanism 52 ... Developing liquid storage tank 53 ... Developing liquid spraying device 54 ... Washing device 55 ... Washing liquid supply device 56, 57 ... Moving rail 58 , 59 ... Moving motors 62, 64, 66 ... 65 ... Washing liquid storage tank 67 ... Rinse liquid storage tank 68 ... Horizontal fixing arm 71 ... Imaging liquid nozzle
72…氣體喷嘴 73…攪拌鏟 G…玻璃基板 100···光阻劑層 1(Π…未曝光部分 102、104…難溶化層 10 3…曝光部分 104…薄膜 202…壓電元件 203…直流電源 206…第1電極 207…第2電極 208…交流電源 210…振動板 (請先閲讀背面之江意事項再填寫本頁) i裝--------訂-----------線 本紙張尺度適用中國國家標準（CNS)A4規格（210 * 297公釐） 1S-172 ... Gas nozzle 73 ... Stirring shovel G ... Glass substrate 100 ... Photoresist layer 1 (II ... Unexposed portions 102, 104 ... Insoluble layer 10 3 ... Exposed portion 104 ... Film 202 ... Piezo element 203 ... DC Power supply 206 ... First electrode 207 ... Second electrode 208 ... AC power supply 210 ... Vibration plate (please read this page on the back before filling this page) ----- The paper size of the paper is applicable to China National Standard (CNS) A4 (210 * 297 mm) 1S-1